JPH0463634U - - Google Patents
Info
- Publication number
- JPH0463634U JPH0463634U JP10732490U JP10732490U JPH0463634U JP H0463634 U JPH0463634 U JP H0463634U JP 10732490 U JP10732490 U JP 10732490U JP 10732490 U JP10732490 U JP 10732490U JP H0463634 U JPH0463634 U JP H0463634U
- Authority
- JP
- Japan
- Prior art keywords
- liquid tank
- cleaning liquid
- replenishment pipe
- cleaning
- chemical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Description
第１図は本考案の一実施例の模式断面図、第２
図は従来例の模式断面図である。
１……洗浄液槽、２……洗浄液供給配管、３…
…洗浄液排液配管、４……過酸化水素水補充配管
、５……アンモニア水補充配管、６……エア式駆
動弁制御装置、７……エア式駆動弁。
Figure 1 is a schematic sectional view of one embodiment of the present invention;
The figure is a schematic cross-sectional view of a conventional example. 1...Cleaning liquid tank, 2...Cleaning liquid supply piping, 3...
...Washing liquid drain pipe, 4...Hydrogen peroxide water replenishment pipe, 5...Ammonia water replenishment pipe, 6...Air-driven valve control device, 7...Air-driven valve.
Claims (1)
の補充配管とを備えた半導ウエーハの洗浄装置に
おいて、洗浄液槽内の前記補充配管に複数の薬液
注入口を設けたことを特徴とする半導体ウエーハ
の洗浄装置。 A semiconductor wafer cleaning apparatus comprising a cleaning liquid tank and a chemical replenishment pipe provided in the cleaning liquid tank, characterized in that the replenishment pipe in the cleaning liquid tank is provided with a plurality of chemical liquid inlets. Wafer cleaning equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10732490U JPH0463634U (en) | 1990-10-12 | 1990-10-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10732490U JPH0463634U (en) | 1990-10-12 | 1990-10-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0463634U true JPH0463634U (en) | 1992-05-29 |
Family
ID=31853781
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10732490U Pending JPH0463634U (en) | 1990-10-12 | 1990-10-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0463634U (en) |
-
1990
- 1990-10-12 JP JP10732490U patent/JPH0463634U/ja active Pending