JPH0470837A - Production of photosensitive planographic printing plate - Google Patents

Abstract

PURPOSE:To obtain printing plates hardly undergoing a change in the sensitivity, having high strength of the coating films and not causing sticking when the plates are piled up without interposing slip sheets by applying a photosensitive compsn. and drying it with a heating roll so that the amt. of the residual solvent is reduced to <=50mg/m<2>. CONSTITUTION:A photosensitive compsn. is applied and dried by contact with a heating roll 2 at 100-300 deg.C for 0.5-5sec so that the amt. of the residual solvent is reduced to <=50mg/m<2>. The pref. diameter of the roll 2 is 10-200cm and the roll 2 may be made of any material capable of being heated and kept at 100-300 deg.C, e.g., Cr plated steel. The proper contact pressure is 2-200g/m<2>. In the case where the amt. of the residual solvent is increased to 50-200mg/m<2>, baking sensitivity is reduced by 20-40%. In the case where the residual solvent is present by >=200mg/m<2>, the strength of the resulting coating film is low and the photosensitive film is liable to scratch at the time of development. When 500-1,000 photosensitive planographic printing plates are piled up without interposing slip sheets in the case where the residual solvent is present by >=100mg/m<2>, the rear sides of the plates stick and the plates cannot be transferred with an automatic plate making machine.

Description

[Detailed description of the invention] : Industrial application field: The present invention relates to a method for producing a photosensitive lithographic printing plate, and more specifically, it relates to a method for producing a photosensitive lithographic printing plate, which has a small sensitivity change, a strong coating film, and a plate that can be produced without sandwiching a mount. 1. When stacking, the plates do not stick together. ) This relates to a method for producing a photosensitive lithographic printing plate.

2. Prior Art] A method for producing a photosensitive lithographic printing plate has been widely known in which a photosensitive composition dissolved or dispersed in an organic solvent is coated on a strip-shaped support and dried by blowing hot air.

However, since these photosensitive coating solutions contain organic solvents with high boiling points, such as n-butyl alcohol, ethylene glycol monomethyl ether, etc., there is a large amount of residual solvent even though they appear dry.

Further, the amount of residual solvent varies depending on the width and thickness of the support, the amount of coating liquid, etc. Furthermore, the amount of residual solvent changes with time after coating and drying.

If the amount of residual solvent is large or fluctuates, the quality of the photosensitive lithographic printing plate deteriorates or fluctuates. For example, as the residual solvent increases from 50 mg/m' to 200 mg/m', the seizure sensitivity decreases by 20-40%.

In addition, residual solvent is present in an amount of 200 mg/m2 or more, the strength of the coating is low, and the photoresist film is easily scratched during development. Furthermore, if residual solvent is present in excess of 100 mg/m', the interleaving paper will be 17500-1000.
If pressure is applied from above to prevent the plates from collapsing or stacking, the surface of the photosensitive layer and the back side of the photosensitive lithographic printing plates that are in contact with it will become tense, making it impossible to transport the plate using an automatic plate making machine.

In order to improve this problem, only low boiling point organic solvents are used, which causes unevenness during drying and reduces the strength of the coating film. Furthermore, if an organic solvent with a high boiling point is used and hot air is dried at high temperature for a long period of time, the photosensitive material will decompose and the binder will crystallize, resulting in printing stains.

[Problems to be Solved by the Invention] The present invention provides a method for producing a photosensitive lithographic printing plate that has little sensitivity change, a strong coating film, and no sticking between plates when the plates are stacked without sandwiching a mount. The goal is to provide the following.

, - Means for Solving the Problem 2 As a result of various studies, the present inventors have discovered that after applying a photosensitive composition, it is brought into contact with a heated roll at 100 to 300°C for 0.5 to 5 seconds to remove the residual solvent. It has been discovered that the above object can be achieved by drying to below mg/m', and the present invention has been achieved.

The heating roll used in the present invention preferably has a diameter of 10 to 200 cm and may be made of any material as long as it can raise and maintain a temperature of 1.00 to 300°C. ). For example, one made of chrome-plated steel can be used. Preferably, the heating control can be changed as appropriate depending on the type of support, running speed, and type of organic solvent. Particularly preferred is one in which the contact time between the lithographic printing plate 1 and the heating roll 2 can be varied by upper and lower swing rolls 3.4. The contact pressure of the heating roll is 2 to 200 g/cff.
l is appropriate.

Oil, molten metal, heated steam, etc. are used as a heat medium for the heating roll.

Contact with a heating roll: This may be done immediately after coating, but in consideration of safety, it is preferable to do so after drying by blowing hot air or by drying with radiant heat.

It is preferable to reduce the residual solvent to a range of 200 mg/c or less by blowing hot air or drying with radiant heat.
It may be the photosensitive @ side or the back side (support side) of the photosensitive planographic printing plate.

The photosensitive composition used in the present invention includes the following.

(A) Photosensitive layer consisting of an o-quinonediazide compound: A preferred o-quinonediazide compound is an o-naphthoquinonediazide compound, for example, as described in U.S. Patent No. 2.766, 1
No. 18, No. 2.767, No. 092, No. 2.772.
No. 972, No. 2.859.112, No. 2.907
．． No. 665, No. 3, No. 046.110, No. 3.04
6.111, 3.046.115, 3.0
No. 46.118, No. 3.046.119, No. 3,
No. 046.120, No. 3.046.121, No. 3
．． 046.122, 3.046.123, 3.081.430, 3, 102.809, 3.106.4.65, 3.635.709 No. 3,647,443, and many other publications, and these can be suitably used. Among these, in particular, 0-naphthoquinone diazide sulfonic acid ester or o-naphthoquinone diazide carboxylic acid ester of an aromatic hydroquine compound, and 0-naphthoquinone diazide sulfonic acid amide or 0-naphthoquinone diazide carboxylic acid of an aromatic amino compound. Amides are preferred, especially U.S. Patent No. 3.635.70
A product obtained by reacting a condensate of pyrrol and acetone described in Specification No. 9 with 0-naphthoquinone diazide sulfonic acid to form an ester, US↑￥￥4.028.111
British Patent No. 1,494.043 describes a polyester having a hydroxyl group at the end described in the specification, which is obtained by ester reaction with 0-naphthoquinonediazide sulfonic acid or 0-naphthoquinonediazidecarboxylic acid. A copolymer of p-hydroxystyrene with homopoly 7- or other copolymerizable sulfonic acid, such as ○-naphthoquinonediazide sulfonic acid or 0-
Ester-reacted naphthoquinone diacid carboxylic acids, copolymers of p-aminostyrene and other copolymerized substances as described in U.S. Pat. No. 3,759,711. 0-naphthoquinone diazide sulfonic acid or ○-naphthoquinone cyasitocarboxylic acid subjected to amide reaction, as described in Japanese Patent Application No. 2-30473;
Naphthoquinone diacid-4-sulfonic acid ester is excellent.

Although these ○-quinonediazide compounds can be used alone, it is preferable to use them in combination with an alkali-soluble resin. Suitable alkali-soluble resins include novolak-type phenolic resins, and specifically include phenol formaldehyde resins, 0-cresol formaldehyde resins, m-cresol formaldehyde resins, and the like. Furthermore, as described in U.S. Pat. No. 4,123,279, along with the above-mentioned phenolic resins,
It is even more preferable to use a phenol substituted with an alkyl group having 3 to 8 carbon atoms, such as t-butylphenol formaldehyde resin, or a condensate of cresol and formaldehyde in combination. In addition, resins having a disulfonamide group as described in JP-A No. 2-866) and vinyl polymers having phenolic hydroxyl groups as described in JP-A No. 296-758) are also available. Preferred as an alkali-soluble resin. The alkali-soluble resin is about 50% based on the total weight of the composition constituting the photosensitive layer.
~85% by weight, more preferably 60-80% by weight.

A photosensitive composition comprising an 0-quinonediaside compound has the following properties:
If necessary, further dyes and plasticizers, such as British Patent Box 1.
401.463, U.S. Patent No. 1.039.475, U.S. Patent No. 3.969.118, JP-A-6036
Additives such as components that provide printout performance as described in Patent Publications No. 26 and No. 63-58440 can be added.

(B) Photosensitive layer consisting of diazo resin and binder: As a negative-working photosensitive cyanide compound, US Pat. No. 2.06
Diphenylamine, which is a reaction product of the diazonium salt disclosed in No. 3.631, No. 2.667, and No. 415, and an organic condensing agent containing a reactive carbonyl group such as aldol or acecool. A condensation product of p-diazonium salt and formaldebide (so-called photosensitive diazo resin) is preferably used. Other useful condensed diazo compounds are disclosed in Japanese Patent Publication No. 49-48001 and Japanese Patent Publication No. 49-48001.
It is disclosed in publications such as No. 45322 and No. 49-45323. These types of photosensitive diazo compounds are usually obtained in the form of water-soluble inorganic salts and can therefore be coated from aqueous solution. Further, these water-soluble diazo compounds are reacted with an aromatic or aliphatic compound having one or more phenolic hydroxyl groups, sulfonic acid groups, or both by the method disclosed in Japanese Patent Publication No. 47-1167, The reaction product, a substantially water-insoluble photosensitive diazo resin, can also be used.

It can also be used as a reaction product with hexafluorophosphate or tetrafluoroborate as described in JP-A-56-121031.

Examples of reactants with phenolic hydroxyl groups include diphenolic acids such as hydroquinepentuphenone, 44-bis(4'-hydroxyphenyl)pentanoic acid, resorcinol, or cylesolunol, which may further contain substituents. 5). Hydroxybenzophenone includes 2゜4-dihydroxybenzophenone, 2-
Hydroxy-4-methoxybenzophenone, 2.2'
-dihydroxy-4,4'-dimethoxybenzophenone or 2,2',4,4'-tetrahydroxybenzophenone. Preferred sulfonic acids include aromatic sulfonic acids such as sulfonic acids such as benzene, toluene, xylene, naphthalene, phenol, naphthol and benzophenone, or soluble salts thereof, such as ammonium and alkali metal salts. Sulfonic acid group-containing compounds generally include lower alkyl,
(optionally substituted with a nitride, a halo group, and/or another sulfonic acid group). Preferred examples of such compounds include pensene sulfonic acid, toluenesulfonic acid, naphthalene sulfonic acid, 2゜5-dimethylbenzene sulfonic acid, sodium pensene sulfonate, naphthalene-2-sulfonic acid, Naphthol-2 (or 4)-sulfonic acid, 24-dinitro-1-naphthol-
7-sulfonic acid, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid, 4-dodecylbenzenesulfonic acid, sodium m-(p'-anilinophenylazo)benzenesulfonate, alisarinsulfonic acid, 0-)
Examples include cyidine-m-sulfonic acid and ethanesulfonic acid. Sulfonic esters of alcohols and their salts are also useful. Such compounds are usually readily available as anionic surfactants. Examples include lauryl sulfate, alkylaryl sulfate, p
Examples include ammonium or alkali metals such as -nonylphenyl sulfate, 2-phenylethyl sulfate, and isooctylphenoxyjethoxyethyl sulfate.

These substantially water-insoluble photosensitive diazo resins are isolated as a precipitate by mixing a water-soluble photosensitive diazo resin and an aqueous solution of the aromatic or aliphatic compound, preferably in approximately equal amounts. It will be done.

Also preferred are diazo resins described in British Patent No. 1.312.925 and JP-A-2-29650 (5).

The appropriate content of the diazo resin in the photosensitive layer is 5 to 50% by weight. As the amount of diazo resin decreases, photosensitivity naturally increases, but stability over time decreases. The optimum amount of diazo resin is about 8-20% by weight.

On the other hand, various polymer compounds can be used as the binder, but in the present invention, hydroxy, amino,
Carboxylic acids, amides, sulfonamides, activated methylene,
Those containing groups such as thioalcohol and epoxy are desirable. Such preferred binders include British Patent No. L
350.521, UK Pat. No. 460.978 and U.S. Pat. No. 4.
Polymers containing hydroquine ethyl acrylate units or hydroquine ethyl acrylate units as the main repeating unit as described in U.S. Pat. No. 3,751,257 phenolic resins as described in British Patent No. 1.074.392 and polyvinyl acetal resins such as polyvinyl formal resins, polyvinyl butyral resins, US Pat. No. 3.660.
Linear polyurethane resin described in specification No. 097,
Phthalated resins of polyvinyl alcohol, epoxy resins condensed from bisphenol A and epichlorohydrin, polymers containing amino groups such as polyaminostyrene and polyalkylamino (meth)acrylates, cellulose acetate, cellulose alkyl ethers, cellulose acetophthalates, etc. Cellulose derivative, JP-A-61
-267042, 62-58242, 61-1
Polyvinyl acetal resin described in No. 28123, JP-A-62-123453, JP-A-62-12345
Polyurethane resins listed in No. 2 are included.

The composition of diazo resin and binder may further contain a pH indicator as described in British Patent No. L 041,463, phosphoric acid as described in U.S. Pat. No. 3,236,646, Additives such as dyes as described in JP-A-5153902 and oil-sensitizing agents as described in JP-A-62-60701 and JP-A-63262-642 can be added.

(C) A photosensitive layer consisting of an azide compound and a binder.

For example, British Patent No. 1.235.281, British Patent No. 1495
．． Specifications of No. 861 and JP-A No. 5132331,
In addition to compositions comprising an azide compound and a water-soluble or alkali-soluble polymer compound described in JP-A-51-36128, etc., JP-A-505102 and JP-A-50-843
Included are compositions comprising a polymer containing an azide group and a polymer compound as a binder, which are described in the following publications: No. 02, No. 5084303, and No. 5:3-12984.

(0) Other photosensitive resin layers: For example, polyester compounds disclosed in JP-A-52-96696, British Patent No. 1.112.277,
Polyvinyl cinnamate resins described in U.S. Patent No. 1.313.390, U.S. Patent No. 1.341.004, U.S. Pat.
The photopolymerizable photopolymer compositions described in the specifications of No. 8 and No. 4.072.527 are included. It also includes the case where an electrophotographic light-sensitive material disclosed in JP-A-60-107042 is used.

These photosensitive compositions are dissolved in a suitable solvent and applied. Preferred solvents include n-butyl alcohol, iso-butyl alcohol, methyl n-propyl ketone, methyl-n-butyl ketone, methyl iso-butyl ketone, diethyl ketone, toluene, m-xylene, p-xylene,
n-propyl acetate, n-butyl acetate, iso-butyl acetate, nibutyl acetate, n-butyl formate, amyl formate, methyl butyrate, ethyl butyrate, monochlorobenzene, dioxane, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, Examples include ethylene glycol diethyl ether, propylene glycol monoethyl ether, propylene glycol monoethyl ether, methyl lactate, and water. These solvents can be used alone or in combination. Furthermore, low-boiling solvents such as methyl alcohol, ethyl alcohol, n-propyl alcohol, iso-propyl alcohol, sec-butyl alcohol, acetone, methyl ethyl ketone, benzene, cyclohexanone, methyl acetate, ethyl acetate, iso-propyl acetate, ethyl formate , propyl formate, isobutyl formate, methyl propionate, ethyl propionate, chloroform, carbon tetrachloride, methylene dichloride, ethylene dichloride, 1, 1. 1-Trichloroethane, isopropyl ether, tetrahydrofuran, tetrahydropyran, ethylene glycol dimethyl ether, etc. may be mixed. Also, high boiling point solvents with a boiling point of about 150°C or higher, such as ethyl lactate, methyl n-amyl ketone, methyl n-
Hexyl ketone, shisobutyl ketone, cyclohexanone, methylcyclohexanone, diacetone alcohol, acetonyl acetone, methoxybutyl acetate, cyclohexyl acetate, methyl acetoacetate, n-butyl butyrate, isoamyl acetate, ethylene glycol monoethyl ether acetate, ethylene glycol diacetate Butyl ether, diethylene glycol methyl ether, T-butyrolactone, T-valerolactone, dimethyl sulfoxide, and the like may be mixed.

The concentration (solid content) of the coating liquid is preferably 2 to 50% by weight, and a surfactant is used to improve coating properties, such as a fluorine-based interface as described in JP-A-62-170950. Preferably, an activator is added. The amount added is 0.01 to 1% by weight of the total photosensitive composition (solid content).
, more preferably 0.05 to 0.5% by weight.

A suitable support for the photosensitive lithographic printing plate of the invention is a dimensionally stable plate. Such dimensionally stable plate-like materials include those conventionally used as supports for printing plates, and they can be suitably used in the present invention. Such supports include paper, paper laminated with plastics (eg, polyethylene, polypropylene, polystyrene, etc.), plates of metals such as aluminum (including aluminum alloys), zinc, copper, etc., cellulose diacetate, triacetate, etc. Cellulose acetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate, cellulose nitrate,
Films of plastics such as polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc., and paper or plastic films laminated or vapor-deposited with the metals mentioned above are included. Among these supports, aluminum plates are particularly preferred because they are extremely stable both dimensionally and thermally, and are inexpensive.

Particularly preferred as a support for use in the present invention is a roughened aluminum plate, which can be manufactured in a variety of ways. For example, wire brush craning, brush grading, which roughens the surface with a nylon brush while pouring a slurry of abrasive particles, and ball fraying.
The surface is grained using chemical graining, electrolytic graining, or a composite graining method that combines these roughening methods. Next, if necessary, a strong passive film can be formed on the aluminum surface by anodizing in sulfuric acid, phosphoric acid, oxalic acid, boric acid, chromic acid, sulfamic acid, or a mixed acid thereof using a DC or AC power supply. preferable. Although the aluminum surface is made hydrophilic by such a passive film itself, if necessary, it is possible to make the aluminum surface hydrophilic.
silicate treatment (sodium silicate, potassium silicate) as described in US Pat. No. 3,181,461; potassium zirconate treatment, phosphomolybdate treatment as described in U.S. Pat. No. 3,201.247, polyacrylic acid treatment as described in German Patent No. 1.091.433, National Patent No. 1, 134.093 Specification and British Patent No. L 230
．． Polyvinylphosphonic acid treatment described in No. 447, phosphonic acid treatment described in Japanese Patent Publication No. 44-6409, US Patent No. 3.307. ! Phytic acid treatment described in F1 specification, JP-A-581
6893 and JP-A No. 38-18291, '3) composite treatment consisting of a hydrophilic organic polymer compound and a divalent metal, or by undercoating with a water-soluble polymer having a sulfonic acid group. Particularly preferred are those that have been subjected to hydrophilic treatment. Other hydrophilic treatment methods include U.S. Patent No. 3
．． Mention may also be made of the silicate electrodeposition described in US Pat. No. 658.662.

In the present invention, the coating amount of the photosensitive composition applied on the roughened aluminum plate is 0.3 to 0.3 as solid content.
5 g/m' is preferable, more preferably 0.5~
3.5 g/m'. The solid content concentration of the photosensitive composition that provides such a coating amount is suitably 1 to 50% by weight, preferably 2 to 20% by weight. As a method for applying the photosensitive composition solution onto the aluminum plate, conventionally known methods such as roll coating, bar coating, spray coating, curtain coating, spin coating, etc. can be used.

As a plate-making method for producing a lithographic printing plate from the photosensitive lithographic printing plate of the present invention, a conventional method can be used as is. That is, when exposed to light and then treated with a developer, the photosensitive layer in non-image areas is removed. Suitable light sources used during exposure include mercury lamps, xenon lamps,
Chemical lamps, metal halide lamps, strobes, etc. are used. Further, as a developer, an appropriate developer may be used depending on the composition of the photosensitive layer. For example, for a photosensitive layer consisting of a diazo compound and an organic polymer binder,
U.S. Patent No. 3.475.171, U.S. Patent No. 3.669.6
An aqueous alkaline developer described in No. 60, No. 4.186.006, etc. is used.

<Examples> Hereinafter, the present invention will be explained in detail based on Examples, but the embodiments of the present invention are not limited by these examples5)
. The percentages in the examples are percentages by weight unless otherwise specified.

Synthesis Example-1 m-Fresol 100g, 3”, % formalin aqueous solution 4
Three 5.0 g and 15 g of uric acid were charged into a flask, heated to 100 t with stirring, and reacted for 7 hours.

Then, the temperature was slowly raised to 200° C. to remove water, and the pressure was then reduced to 1 to 2 mmHg to remove unreacted particles. The weight average molecular weight and number average molecular weight of the obtained Novolank resin were measured using gel permeation chromatography (polystyrene standard $) and found to be 2.000 and 1.300, respectively.

120 g of this m-cresol-formaldehyde novolac resin and 1,2-naphthoquinone-2diazide-4-
133.6 g of sulfonyl chloride was dissolved in 800 d of tetrahydrofuran. 50.5 g of triethylamine was added dropwise while keeping the temperature of the reaction solution below 30°C. After the addition was completed, the mixture was further stirred at room temperature for 2 hours, and then the reaction solution was stirred and poured into 10A of distilled water. The precipitated solid was collected by filtration and dried under reduced pressure to obtain 190 g of the target naphthoquinone diazide compound (esterification rate: 45%).

Example 1 A strip-shaped aluminum plate with a thickness of 0.3 mm was degreased by immersing it in a 7% aqueous solution of IJum (liquid temperature 60°C) for 3 minutes, and after washing with water, a pumice was applied to the surface. The grain was sanded by rubbing with a nylon brush while casting water in which it was suspended. This strip-shaped aluminum plate was subjected to electrolytic graining in dilute nitric acid and composite graining, and then anodized in 20% sulfuric acid at IOA/dm2 for 24 seconds and washed with water.

A positive photosensitive liquid having the following composition was applied to the strip-shaped aluminum plate continuously treated as described above using a bar coating method at a rate of 3.5 g/
m' (dry weight) was applied, dried for 60 seconds by blowing hot air at 100°C, and then brought into contact with a heating roll (made of chrome-plated copper, diameter 50cm) at 140°C for 1 second at a contact pressure of 40 g/cnf to remove the remaining solvent. A photosensitive lithographic printing plate E A = mg/m' was obtained.

Esterified product of 1,2 naphthoquinone-2-diazide 4-sulfonyl chloride obtained in positive photosensitive liquid synthesis example-1 and m-talesol formaldehyde resin Cresol formaldehyde resin 1.9 g Phthalic anhydride 0.2 g 4-Cp- N
-(p-Hydroxybenzoyl)aminophenylco2.6-bis(trichloromethyl)-5-)riazine 0.9g 0.02g Fluorinated surfactant) Methyl ethyl ketone 0.006g 5g Sensitivity determination results Table 1> Shown below.

Diethylene glycol dimethyl [ether 1,33 For comparison, residual solvent that does not come into contact with the heating roll 200
A photosensitive lithographic printing plate [B] of mg/m' was obtained.

On the other hand, a mount was sandwiched between photosensitive lithographic printing plate CA 1 and the plate was left indoors for 30 days to obtain a photosensitive lithographic printing plate [C] containing 15 mg/m' of residual solvent.

Furthermore, a photosensitive lithographic printing plate [131 with a mount in between, 3
The plate was left indoors for 0 days to obtain a photosensitive lithographic printing plate [D] containing 40 mg/m' of residual solvent.

The sensitivity of the photosensitive lithographic printing plates [A], [B], [C], and [DI was determined by the following method.

40 using Fuji Film PS Light (Toshiba Metal Halide Lamp MU-2000-2-OL type 3kw) via Daley Scale (Fuji Photo Film Step Guide)
Exposure for seconds, developer DP-4 (manufactured by Fuji Photo Film)
The sample was diluted to a diluted volume of 1.8 and developed by immersion at 25° C. for 30 seconds.

<Table-1> Example 2 In the same manner as in Example-1, a grained, electrolytically grained, and anodized belt-shaped aluminum plate was silicified with IJum (S).
102/Na20 = 3.1 to 3.3 molar) 5
% aqueous solution (liquid temperature 70°C) for 10 to 60 seconds and washed with water.

A negative photosensitive liquid having the following composition was applied to the strip-shaped aluminum plate continuously treated as described above using a bar coating method at a rate of 3.5 g/
m' (dry weight) was applied, dried for 60 seconds by blowing hot air at 100°C, and then brought into contact with a heating oven at 140°C for 1 second to form a photosensitive lithographic printing plate JEI with a residual solvent of 40 mg/m'. Obtained.

Photosensitive liquid/2-hydroxyethyl methacrylate copolymer (as described in Example 1 of U.S. Pat. No. 4,123,276) 5.00 gp-
2-Methoxy-4 hydroxy-5-benzoylbenzene sulfonate, a condensate of diazodiphenylaminmint halaformaldehyde 0.50 g “Oil Blue #603” Phosphite Megafac F-177 (manufactured by Dainippon Ink & Chemicals ■0.05 g Fluorine surfactant) 0.005 g Methyl ethyl ketone 30 g l-Methoxy-2 Propatool 50 g' Methyl lactate 20 g For comparison, residual solvent that does not come in contact with the heating roll 180 mg/
m' photosensitive lithographic printing plate IFI and after coating, it was dried by blowing hot air at 150°C for 5 minutes, and the residual solvent was 40mg/m
A photosensitive lithographic printing plate 202 was obtained. Furthermore, the coating solvent of the photosensitive liquid was applied using only methyl ethyl ketone,
It was dried by blowing hot air at 100°C for 60 seconds to obtain a photosensitive lithographic printing plate iI H3 with a residual solvent concentration of 40 mg/m'.

Photosensitive lithographic printing plates εE:, gF], CGI, [H] were prepared using Fujifilm PS Lite (Toshiba Metal Halide Lamp M
U2000-2-〇L type 3kw) was exposed for 40 seconds through a negative film, diluted developer DN-3C (Fuji Photo Film Wa) 1:1, immersed at 7.25℃ for 60 seconds, and then exposed with a nylon brush. I rubbed it 10 times.

There were many scratches caused by the nylon brush in the image area of the lithographic printing plates [IF] and [HI, while the image areas of the lithographic printing plates [E2 and HI] had many scratches caused by the nylon brush.
, [There were no scratches in the image area of GI.

After pattern printing, lithographic printing plate H + H1 2F], 2G = 1, HHH
was attached to Heidelberg's AKOR-D printing machine and the result was :E;, IF? For JGl and LHI, good prints with no stains were obtained, but for JGl and LHI, the non-image areas were stained and good prints could not be obtained. AI,
[B], [E], I F 1 were stacked with 1,000 pieces of interleaf paper, covered with polysheet, and then wrapped with pressure applied from above to prevent the package from collapsing, at 45℃/75%.
It was left in a constant temperature and humidity chamber for 15 days. Then 90 from the top
The 0th to 950th sheets were automatically plate-made using a PS plate automatic plate-making machine FNR401 manufactured by Fuji Photo Film ■. Photosensitive planographic printing plate [A
], [E] could be transported one sheet at a time and automatic plate making could be performed without any problems, whereas photosensitive lithographic printing plates 7B], JF] could not be made automatically because the plates stuck together. As can be seen in 1, 2, and 3, keeping the residual solvent in contact with a heating roll at 50 mg/m' or less does not degrade other properties, there is little change in sensitivity, and the coating film is maintained. It is possible to produce a photosensitive lithographic printing plate that is strong and has low adhesion between plates when stacked without sandwiching a mount.

[Brief explanation of drawings]

Figures 1 (a), (b), (c), (d:l) are drawings showing examples of the method of the present invention. 1... Photosensitive planographic printing plate, 2...・Heating roll, 3.4... Swing roll. Fig. 1 (a) (b) (c) (d) Date of Heisei 1, Indication of incident Patent Application No. 184967, 1990 4, Agent 5, date of amendment order 6, correct "Cff1" in line 6, page 5 of the detailed description of the detailed description of the invention in the detailed description to be amended, to -m'.

Claims (1)

[Claims] In a method for producing a photosensitive lithographic printing plate by applying a photosensitive composition to a support and drying it, the residual solvent is removed by contacting it with a heated roll at 100 to 300°C for 0.5 to 5 seconds after application.
A method for producing a photosensitive lithographic printing plate, characterized in that it is dried to a level of mg/m^2 or less.