JPH047103B2 - - Google Patents

Info

Publication number
JPH047103B2
JPH047103B2 JP57072578A JP7257882A JPH047103B2 JP H047103 B2 JPH047103 B2 JP H047103B2 JP 57072578 A JP57072578 A JP 57072578A JP 7257882 A JP7257882 A JP 7257882A JP H047103 B2 JPH047103 B2 JP H047103B2
Authority
JP
Japan
Prior art keywords
bonding
semiconductor chip
intermediate electrode
support base
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57072578A
Other languages
Japanese (ja)
Other versions
JPS58191459A (en
Inventor
Hitoshi Matsuzaki
Shuroku Sakurada
Hideo Hirayama
Masahiro Murakami
Shigeo Sunai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57072578A priority Critical patent/JPS58191459A/en
Publication of JPS58191459A publication Critical patent/JPS58191459A/en
Publication of JPH047103B2 publication Critical patent/JPH047103B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W76/00Containers; Fillings or auxiliary members therefor; Seals
    • H10W76/10Containers or parts thereof
    • H10W76/12Containers or parts thereof characterised by their shape
    • H10W76/13Containers comprising a conductive base serving as an interconnection
    • H10W76/132Containers comprising a conductive base serving as an interconnection having other interconnections through an insulated passage in the conductive base
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/015Manufacture or treatment of bond wires
    • H10W72/01551Changing the shapes of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07521Aligning
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07541Controlling the environment, e.g. atmosphere composition or temperature
    • H10W72/07551Controlling the environment, e.g. atmosphere composition or temperature characterised by changes in properties of the bond wires during the connecting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/753Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between laterally-adjacent chips
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/754Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Wire Bonding (AREA)

Description

【発明の詳細な説明】 本発明はGTO(ゲートターンオフ)サイリス
タ、またはパワートランジスタなどの半導体装置
に関し、特に、リード線のボンデイング作業性を
改善することのできる半導体装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor device such as a GTO (gate turn-off) thyristor or a power transistor, and more particularly to a semiconductor device that can improve lead wire bonding workability.

数10A以上の電流をオン・オフするGTOサイ
リスタなどの場合、そのパツケージ内のボンデイ
ングワイヤは、大きな電流を流すため、通常は複
数本が並列に接続される。
In the case of GTO thyristors that turn on and off currents of several tens of amperes or more, the bonding wires inside the package are usually connected in parallel to allow large currents to flow.

すなわち、カソードに接続されるボンデイング
ワイヤは、大きな主電流を流すため、複数本並列
接続されることが必要であり、また、ゲートに接
続されるボンデイングワイヤは、特に大きなカツ
トオフ遮断耐量をもたせるために複数本必要であ
る。
In other words, the bonding wires connected to the cathode must be connected in parallel to allow a large main current to flow, and the bonding wires connected to the gate must be connected in parallel in order to have a particularly large cut-off withstand capacity. Multiple copies are required.

このようなGTOサイリスタを、いわゆるトラ
ンジスタ型パツケージに組込む場合、通常のトラ
ンジスタ型パツケージでは、外部リードのボンデ
イング部の面積が小さいため、全てのボンデイン
グワイヤを直接外部リードに接続することはでき
ない。
When such a GTO thyristor is incorporated into a so-called transistor-type package, all bonding wires cannot be directly connected to the external leads in a normal transistor-type package because the area of the bonding part of the external lead is small.

第1図および第2図に、従来のGTOサイリス
タのパツケージ内のリード配線構造を示す。第1
図は平面図、第2図はその−線断面図であ
る。
Figures 1 and 2 show the lead wiring structure inside the package of a conventional GTO thyristor. 1st
The figure is a plan view, and FIG. 2 is a cross-sectional view taken along the - line.

これらの図において、10は半導体チツプ
(GTOサイリスタ)、11はその上に前記半導体
チツプが固定される支持ベース、12および13
はガラス等の絶縁材12A,13Aを介して前記
支持ベース11に植立された外部リード、16お
よび17は前記半導体チツプ10に隣接して、前
記支持ベース11に固着された中間電極用絶縁台
である。
In these figures, 10 is a semiconductor chip (GTO thyristor), 11 is a support base on which the semiconductor chip is fixed, 12 and 13
16 and 17 are external leads planted on the support base 11 via insulating materials 12A and 13A such as glass, and 16 and 17 are insulating stands for intermediate electrodes fixed to the support base 11 adjacent to the semiconductor chip 10. It is.

14および15は、それぞれ、前記中間電極用
絶縁台16および17上に固着され、その一端が
前記各外部リード12,13に導電接続され、実
質上、長方形のボンデイング領域を備えた中間電
極、18および19は半導体チツプ10の電極領
域と前記各中間電極14,15とを接続するボン
デイングワイヤ(アルミニウム)である。
Intermediate electrodes 18, 14 and 15 are fixed on the intermediate electrode insulating stands 16 and 17, respectively, one end of which is conductively connected to each of the external leads 12 and 13, and has a substantially rectangular bonding area. and 19 are bonding wires (aluminum) connecting the electrode region of the semiconductor chip 10 and each of the intermediate electrodes 14, 15.

図から明らかなように従来のGTOサイリスタ
では、その電極領域は中間電極14,15を介し
て外部リード12,13に接続されていた。ま
た、半導体チツプ10の電極領域と中間電極1
4,15とはボンデイングワイヤ18,19等で
接続され、中間電極14,15と外部リード1
2,13とは溶接で接続される。
As is clear from the figure, in the conventional GTO thyristor, its electrode regions are connected to external leads 12, 13 via intermediate electrodes 14, 15. Further, the electrode region of the semiconductor chip 10 and the intermediate electrode 1
4 and 15 are connected with bonding wires 18 and 19, etc., and the intermediate electrodes 14 and 15 are connected to the external lead 1.
2 and 13 are connected by welding.

数10A以上の電流を流すため、ボンデイングワ
イヤとしては、複数本の0,3mmφ程度のAl(ア
ルミ)線が通常用いられる。ボンデイングワイヤ
18,19と半導体チツプ電極領域および中間電
極との接着は、超音波ボンデイングで行なわれる
のが普通である。
In order to pass a current of several tens of amperes or more, a plurality of Al (aluminum) wires with a diameter of about 0.3 mm are usually used as bonding wires. Bonding wires 18, 19 and semiconductor chip electrode regions and intermediate electrodes are usually bonded by ultrasonic bonding.

中間電極用絶縁台16,17は、この超音波ボ
ンデイング作業時、中間電極14,15が動かな
いように固定する目的と、単に前記中間電極を支
持する目的のために必要である。前述したパツケ
ージ内のリード配線構造は、通常のトランジスタ
型パツケージに比べ部品点数が多く、また、以下
に詳述するように、Al超音波ボンデイング領域
が、半導体チツプ10からみて、反対側に2方向
にわかれるため、作業性が悪いという欠点があ
る。
The intermediate electrode insulating stands 16 and 17 are necessary for the purpose of fixing the intermediate electrodes 14 and 15 so that they do not move during this ultrasonic bonding work, and for the purpose of simply supporting the intermediate electrodes. The lead wiring structure inside the package described above has a larger number of parts than a normal transistor type package, and as will be described in detail below, the Al ultrasonic bonding area is arranged in two directions on the opposite side when viewed from the semiconductor chip 10. It has the disadvantage of poor workability because it separates into two parts.

すなわち、通常のAl超音波ボンデイングでは、
第一ボンドと第二ボンドの条件が異なるため、第
一ボンドはチツプ側、第二ボンドは電極側という
ように、それぞれ分けて行なわれる。また、第一
ボンドと第二ボンドの方向は、ボンデイング装置
により一定の方向に決まつている。
In other words, in normal Al ultrasonic bonding,
Since the conditions for the first bond and the second bond are different, the first bond is performed separately on the chip side, and the second bond is performed on the electrode side. Further, the directions of the first bond and the second bond are determined to be a fixed direction by the bonding device.

従つて、第1,2図に示したリード配線構造の
Al超音波ボンデイングを行なう場合、一方のAl
ボンデイングワイヤ18のボンデイングを第1図
の方向で行なつたとすれば、反対側のAlボンデ
イングワイヤ19のボンデイングを行なう時は、
第一ボンドと第二ボンドとの方向を、同じ方向に
させるため、支持ベース11を180°回転させる必
要が生じる。
Therefore, the lead wiring structure shown in Figs.
When performing Al ultrasonic bonding, one Al
If the bonding wire 18 is bonded in the direction shown in FIG. 1, then when bonding the Al bonding wire 19 on the opposite side,
In order to align the first bond and the second bond in the same direction, it is necessary to rotate the support base 11 by 180 degrees.

ボンデイング動作中に、このように支持ベース
11を回転させることは、作業性を非常に悪くし
ており、生産能率を低下させるので、製作上の大
きな問題点であつた。
Rotating the support base 11 in this manner during the bonding operation greatly impairs work efficiency and reduces production efficiency, which is a major problem in manufacturing.

同様の問題は、大容量のパワートランジスタな
どのパツケージの場合にも生じている。
Similar problems occur with packages such as large capacity power transistors.

本発明の目的は、構造が簡単で、かつ製作時の
作業性を良好に保持することが容易なパツケージ
ング構造を備えたGTOサイリスタやパワートラ
ンジスタなどの半導体装置を提供することにあ
る。
An object of the present invention is to provide a semiconductor device, such as a GTO thyristor or a power transistor, which has a simple structure and a packaging structure that makes it easy to maintain good workability during manufacturing.

前記目的を達成するために、本発明では、中間
電極を、半導体チツプからみて同じ方向にすなわ
ち、半導体チツプの一側に配置すると共に、半導
体チツプから離れている方の中間電極を、半導体
チツプに近い方の中間電極よりも高い位置に取り
付けるようにして、ボンデイングワイヤと中間電
極との不要な接触の防止を図つている。また、本
発明では、Al超音波ボンデイング時に、中間電
極と支持ベースとの間にスペーサを介在させるよ
うにしたことにより、中間電極用絶縁台を省略で
きるようにし、パツケージ内リード配線構造の簡
単化と作業性の容易化を図つている。
In order to achieve the above object, in the present invention, the intermediate electrodes are arranged in the same direction as viewed from the semiconductor chip, that is, on one side of the semiconductor chip, and the intermediate electrode that is away from the semiconductor chip is placed on the side of the semiconductor chip. By attaching it at a higher position than the closer intermediate electrode, unnecessary contact between the bonding wire and the intermediate electrode is prevented. Furthermore, in the present invention, by interposing a spacer between the intermediate electrode and the support base during Al ultrasonic bonding, the insulating stand for the intermediate electrode can be omitted, and the lead wiring structure inside the package can be simplified. We aim to make the work easier.

第3図および第4図に本発明の一実施例を示
す。第3図は平面図、第4図はその−線断面
図である。これらの図において、第1,第2図と
同一の符号は同一または同等部分をあらわしてい
る。
An embodiment of the present invention is shown in FIGS. 3 and 4. FIG. FIG. 3 is a plan view, and FIG. 4 is a sectional view taken along the line -2. In these figures, the same reference numerals as in FIGS. 1 and 2 represent the same or equivalent parts.

この実施例は、第1,第2図の従来例との比較
から明らかなように、実質上、長方形のボンデイ
ング領域を備えた中間電極14,15を半導体チ
ツプ10に対して同一の側に配置し、かつ、これ
ら中間電極14,15をそれぞれ外部リード1
2,13に固着して支持したものである。
As is clear from a comparison with the conventional example shown in FIGS. 1 and 2, in this embodiment, intermediate electrodes 14 and 15 having substantially rectangular bonding regions are arranged on the same side with respect to the semiconductor chip 10. In addition, these intermediate electrodes 14 and 15 are connected to external leads 1, respectively.
2 and 13 for support.

この場合、例えば中間電極14,15は、外部
リード12,13に銀ろー付によつて固着され、
かつ支持されている。
In this case, for example, the intermediate electrodes 14 and 15 are fixed to the external leads 12 and 13 by silver brazing,
and supported.

このように、中間電極14,15が半導体チツ
プ10からみて同一の側にあるため、必要な全て
のAl超音波ボンデイングが、第一ボンドと第二
ボンドとで、その方向が一致する。すなわち、ボ
ンデイング作業中に支持ベース11を回転させる
必要がなくなるので、ボンデイングの作業性が著
しく向上する。
In this way, since the intermediate electrodes 14 and 15 are on the same side as viewed from the semiconductor chip 10, all the necessary Al ultrasonic bonding is done in the same direction for the first bond and the second bond. That is, since there is no need to rotate the support base 11 during the bonding work, the workability of the bonding work is significantly improved.

また、本発明では、各中間電極14,15のボ
ンデイング領域が互いに平行に並設して配置され
るようにしたので、ボンデイングワイヤ18,1
9を平行かつ各ボンデイング領域とほぼ垂直とな
るように配置すれば、本実施例のように、ボンデ
イングワイヤ18によつて一方の中間電極14と
接続される半導体チツプの電極領域の両側に、ボ
ンデイングワイヤ19によつて他方の中間電極1
5と接続される2つの電極領域が配置されるよう
な構造においても、ボンデイングワイヤ同士の短
絡が防止される。
Further, in the present invention, since the bonding regions of the intermediate electrodes 14 and 15 are arranged parallel to each other, the bonding wires 18 and 1
9 are arranged parallel to each other and substantially perpendicular to each bonding region, bonding can be performed on both sides of the electrode region of the semiconductor chip connected to one intermediate electrode 14 by the bonding wire 18, as in this embodiment. The other intermediate electrode 1 is connected by a wire 19.
Even in a structure in which two electrode regions connected to the bonding wires 5 are arranged, short circuits between the bonding wires can be prevented.

さらに、このような構成では、第6図に示した
ように、2つの中間電極14,15が、それぞれ
対応する外部リード12,13に、ほヾ同じ高さ
に、ほヾ平行に固着されていると、ボンデイング
ワイヤ18が中間電極15に接触したり、あるい
はボンデイングワイヤ18,19が互いに接触し
たりするおそれがある。
Furthermore, in such a configuration, as shown in FIG. 6, the two intermediate electrodes 14 and 15 are fixed to the corresponding external leads 12 and 13 at approximately the same height and approximately in parallel. If so, there is a risk that the bonding wire 18 may come into contact with the intermediate electrode 15 or the bonding wires 18 and 19 may come into contact with each other.

そこで、本実施例では、2つの中間電極14,
15を外部リード12,13に固着する際、半導
体チツプ10から、はなれている方の中間電極1
4が、半導体チツプ10に近い方の、他の中間電
極15より高い位置に取り付けられるようにし
た。
Therefore, in this embodiment, two intermediate electrodes 14,
15 to the external leads 12 and 13, the intermediate electrode 1 that is separated from the semiconductor chip 10
4 is attached at a position closer to the semiconductor chip 10 and higher than the other intermediate electrodes 15.

このように、2つの中間電極14,15の取り
付け高さに差を設けることにより、ボンデイング
ワイヤ18と中間電極15間の距離が長くなる。
それ故に、これらの相互接触の危険性が減少し、
作業性が向上する。また、ボンデイングワイヤ1
8および19の相互間の接触の可能性も減少す
る。
In this way, by providing a difference in the mounting heights of the two intermediate electrodes 14 and 15, the distance between the bonding wire 18 and the intermediate electrode 15 becomes longer.
Therefore, the risk of their mutual contact is reduced and
Improves work efficiency. Also, bonding wire 1
The possibility of contact between 8 and 19 is also reduced.

なお、超音波ボンデイング作業時には、第5図
に示したように、中間電極14,15のそれぞれ
と、支持ベース11との間に、なるべくは金属製
のスペーサ54を挿入、配置しておくのがよい。
Note that during ultrasonic bonding work, it is recommended to insert and arrange spacers 54, preferably made of metal, between each of the intermediate electrodes 14, 15 and the support base 11, as shown in FIG. good.

これによつて、ボンデイング時の荷重に起因し
て中間電極14,15が下方に屈曲、変形するこ
とが防止され、良好なボンデイングが達成され
る。
This prevents the intermediate electrodes 14 and 15 from being bent or deformed downward due to the load during bonding, and good bonding is achieved.

このようなスペーサの利用により、中間電極用
絶縁台(第1図の16,17)が不要となり、部
品点数が減少し、パツケージング構造が簡素化さ
れる。
Use of such a spacer eliminates the need for intermediate electrode insulating stands (16, 17 in FIG. 1), reduces the number of parts, and simplifies the packaging structure.

上記のように、本発明によれば、構造が簡単
で、かつ作業性に優れたGTOサイリスタのパツ
ケージ構造が提供される。なお、以上では、本発
明をGTOサイリスタに適用した場合を例に述べ
たが、パワートランジスタに適用した場合におい
ても全く同様の効果が得られることは明らかであ
ろう。
As described above, the present invention provides a GTO thyristor package structure that is simple in structure and has excellent workability. In addition, although the case where the present invention is applied to a GTO thyristor has been described above as an example, it is clear that exactly the same effect can be obtained when applied to a power transistor.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の半導体装置を示す平面図、第2
図はその−線にそう断面図、第3図は本発明
の一実施例を示す平面図、第4図はその−線
にそう断面図、第5図は第3図の装置の製造法を
説明するための断面図、第6図は本発明の効果を
説明するための断面図である。 10……半導体チツプ、11……支持ベース、
12,13……外部リード、12A,13A……
絶縁材、14,15……中間電極、16,17…
…中間電極用絶縁台、18,19……ボンデイン
グワイヤ、54……スペーサ。
Figure 1 is a plan view showing a conventional semiconductor device, Figure 2 is a plan view showing a conventional semiconductor device;
The figure is a sectional view taken along the - line, FIG. 3 is a plan view showing an embodiment of the present invention, FIG. 4 is a sectional view taken along the - line, and FIG. FIG. 6 is a cross-sectional view for explaining the effects of the present invention. 10...Semiconductor chip, 11...Support base,
12, 13...External lead, 12A, 13A...
Insulating material, 14, 15... Intermediate electrode, 16, 17...
... Insulation stand for intermediate electrode, 18, 19 ... Bonding wire, 54 ... Spacer.

Claims (1)

【特許請求の範囲】 1 半導体チツプがその上に固定載置された支持
ベースと、 前記支持ベースから電気的に絶縁して、これに
植立された少なくとも2本の外部リードと、 実質的に長方形のボンデイング領域を有し、前
記半導体チツプからみて同じ側で、各々のボンデ
イング領域が互いに平行に並設配置されるように
前記外部リードのそれぞれに固着支持された中間
電極と、 半導体チツプの電極領域および前記中間電極の
ボンデイング領域を電気的に接続するように超音
波ボンデイングされた複数本のボンデイングワイ
ヤとを具備し、 半導体チツプから遠い方の中間電極と支持ベー
スとの距離は、近い方の中間電極と支持ベースと
の距離よりも大であることを特徴とする半導体装
置。 2 各中間電極は、支持ベースから離れて支持さ
れていることを特徴とする前記特許請求の範囲第
1項記載の半導体装置。
[Scope of Claims] 1. A support base on which a semiconductor chip is fixedly mounted; at least two external leads electrically insulated from the support base and planted on the support base; an intermediate electrode having a rectangular bonding area and fixedly supported on each of the external leads so that the bonding areas are arranged parallel to each other on the same side as viewed from the semiconductor chip; and an electrode of the semiconductor chip. and a plurality of bonding wires ultrasonically bonded so as to electrically connect the bonding area of the intermediate electrode and the bonding area of the intermediate electrode, and the distance between the intermediate electrode farther from the semiconductor chip and the supporting base is the same as that of the supporting base. A semiconductor device characterized in that the distance is greater than the distance between an intermediate electrode and a support base. 2. The semiconductor device according to claim 1, wherein each intermediate electrode is supported apart from the support base.
JP57072578A 1982-05-01 1982-05-01 Semiconductor device Granted JPS58191459A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57072578A JPS58191459A (en) 1982-05-01 1982-05-01 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57072578A JPS58191459A (en) 1982-05-01 1982-05-01 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS58191459A JPS58191459A (en) 1983-11-08
JPH047103B2 true JPH047103B2 (en) 1992-02-07

Family

ID=13493401

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57072578A Granted JPS58191459A (en) 1982-05-01 1982-05-01 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS58191459A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54159266U (en) * 1978-04-27 1979-11-07

Also Published As

Publication number Publication date
JPS58191459A (en) 1983-11-08

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