JPH0471896B2 - - Google Patents
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- Publication number
- JPH0471896B2 JPH0471896B2 JP26399587A JP26399587A JPH0471896B2 JP H0471896 B2 JPH0471896 B2 JP H0471896B2 JP 26399587 A JP26399587 A JP 26399587A JP 26399587 A JP26399587 A JP 26399587A JP H0471896 B2 JPH0471896 B2 JP H0471896B2
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- Prior art keywords
- tertiary
- para
- butoxystyrene
- reaction
- general formula
- Prior art date
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Description
【発明の詳細な説明】
イ) 発明の目的
(産業上の利用分野)
本発明は、医農薬の中間体として使用されるフ
エノール化合物の前駆体として有用な、また、レ
ジスト材料やエポキシ硬化触媒として使用される
ポリーパラ−ヒドロキシスチレンを得るための原
料モノマーとして有用なパラ−第三級−ブトキシ
スチレンの新規な合成法に関する。[Detailed Description of the Invention] A) Purpose of the Invention (Field of Industrial Application) The present invention is useful as a precursor of a phenol compound used as an intermediate for medicines and agrochemicals, and also as a resist material and an epoxy curing catalyst. The present invention relates to a novel method for synthesizing para-tertiary-butoxystyrene useful as a raw material monomer for obtaining the polypara-hydroxystyrene used.
本発明の目的化合物であるパラ−第三級−ブト
キシスチレンは単独重合や共重合によりポリ−パ
ラ−第三級−ブトキシスチレンに、また、パラ−
第三級−ブトキシスチレンのビニル基に種々の反
応剤を作用させて誘導体にそれぞれ導くことがで
きる。そして、これらの化合物は酸触媒により特
異的に第三級−ブチル基が脱離するため、前記の
ポリ−パラ−ヒドロキシスチレンやフエノール類
に容易に変換できる。 Para-tertiary-butoxystyrene, which is the object compound of the present invention, can be converted into poly-para-tertiary-butoxystyrene by homopolymerization or copolymerization.
The vinyl group of tertiary-butoxystyrene can be reacted with various reactants to lead to derivatives. Since the tertiary-butyl group of these compounds is specifically eliminated by an acid catalyst, they can be easily converted into the above-mentioned poly-para-hydroxystyrene or phenols.
(従来の技術)
本発明の目的化合物であるパラ−第三級−ブト
キシスチレンは既知である。そして、この化合物
の従来の合成法は、米国特許第4603101号明細書
及び特開昭59−199705号公報において、パラ−ブ
ロモスチレンあるいはパラ−クロロスチレンのグ
リニヤール試薬に過安息香酸−第三級−ブチルエ
ステルを反応させて行われる。しかし、これらの
公報に記載の方法によれば、パラ−第三級−ブト
キシスチレンの収率は20%と極めて低い(米国特
許第4603101号明細書)。(Prior Art) Para-tertiary-butoxystyrene, which is the object compound of the present invention, is known. The conventional method for synthesizing this compound is described in U.S. Pat. It is carried out by reacting butyl ester. However, according to the methods described in these publications, the yield of para-tertiary-butoxystyrene is extremely low at 20% (US Pat. No. 4,603,101).
また、本発明の目的化合物の異性体であるパラ
−n−ブトキシスチレンは、パラ−n−ブトキシ
フエネチルアルコールをアルカリ条件下で脱水反
応させれば得られる。しかし、このパラ−n−ブ
トキシスチレンの脱n−ブチル基反応は、きわめ
て困難をともなうため、これからポリ−パラ−ヒ
ドロキシスチレンやフエノール類を得られない。 Moreover, para-n-butoxystyrene, which is an isomer of the object compound of the present invention, can be obtained by subjecting para-n-butoxyphenethyl alcohol to a dehydration reaction under alkaline conditions. However, this reaction to remove the n-butyl group from para-n-butoxystyrene is extremely difficult, and therefore poly-para-hydroxystyrene and phenols cannot be obtained from it.
(発明が解決しようとする問題点)
従来のパラ−第三級−ブトキシスチレンの合成
法は、原料の一つとして、入手が困難で、かつ高
価であり、しかも操作上の安全性でも問題のある
過安息香酸−第三級−ブチルエステルを第三級−
ブトキシ化剤として使用するため、工業規模の合
成法としては好ましくない。したがつて、本発明
は、このような問題点がなく、工業的規模での合
成に適したパラ−第三級−ブトキシスチレンの新
規な合成法を提供することを目的とするものであ
る。(Problems to be Solved by the Invention) The conventional method for synthesizing para-tertiary-butoxystyrene is difficult to obtain as one of the raw materials, is expensive, and has problems in terms of operational safety. A certain perbenzoic acid tertiary-butyl ester is converted into a tertiary-butyl ester.
Since it is used as a butoxylating agent, it is not preferred for industrial scale synthesis. Therefore, an object of the present invention is to provide a new method for synthesizing para-tertiary-butoxystyrene which is free from such problems and is suitable for synthesis on an industrial scale.
ロ) 発明の構成
(問題を解決するための手段)
本発明者らは、かかる問題点を解決するために
種々の合成法について鋭意検討を重ねた。その結
果、下記の知見を得て極めて有用なパラ−第三級
−ブトキシスチレンの新規な合成法を発明するに
至つた。すなわち、パラ−第三級−ブトキシフエ
ニルハライドを金属マグネシウムと反応させてパ
ラ−第三級−ブトキシフエニルマグネシウムハラ
イドとし、これをニツケルホスフイン錯体触媒の
存在下に、ビニルハライドを作用させることによ
り、パラ−第三級−ブトキシスチレンを高純度、
高収率で得る合成法を完成した。B) Structure of the Invention (Means for Solving the Problems) The present inventors have made extensive studies on various synthesis methods in order to solve these problems. As a result, the following knowledge was obtained and an extremely useful new method for synthesizing para-tertiary-butoxystyrene was invented. That is, para-tertiary-butoxyphenyl halide is reacted with metallic magnesium to produce para-tertiary-butoxyphenylmagnesium halide, and this is reacted with vinyl halide in the presence of a nickel phosphine complex catalyst. This process produces high purity para-tertiary-butoxystyrene.
A synthetic method with high yield was completed.
本発明におけるパラ−第三級−ブトキシスチレ
ンの合成方法を反応式で示せば、次のとおりであ
る。 The reaction formula of the method for synthesizing para-tertiary-butoxystyrene in the present invention is as follows.
(式中、X1、X2は同一または異なるハロゲン
原子を示す)
本発明のパラ−第三級−ブトキシスチレン
()は、パラ−ハロゲノフエノールのヒドロキ
シル基を第三級−ブチル基で保護したパラ−第三
級−ブトキシフエニルハライド()を金属マグ
ネシウムと反応させ、グリニヤール試薬であるパ
ラ−第三級−ブトキシマグネシウムハライド
()とし、これにニツケルホスフイン錯体触媒
の存在下で塩化ビニル、臭化ビニルなどのビニル
ハライドとのクロスカツプリング反応により目的
とするパラ−第三級−ブトキシスチレンを合成で
きる。 (In the formula, X 1 and X 2 represent the same or different halogen atoms.) The para-tertiary-butoxystyrene () of the present invention is obtained by protecting the hydroxyl group of para-halogenophenol with a tertiary-butyl group. Para-tertiary-butoxyphenyl halide () is reacted with metallic magnesium to form para-tertiary-butoxymagnesium halide (), which is a Grignard reagent, which is then reacted with vinyl chloride, The desired para-tertiary-butoxystyrene can be synthesized by a cross-coupling reaction with a vinyl halide such as vinyl bromide.
以下、本発明の合成法をさらに詳細に説明す
る。 The synthesis method of the present invention will be explained in more detail below.
a) パラ−第三級−ブトキシフエニルマグネシ
ウムハライドの合成法[一般式()の化合
物]
一般式()の化合物は、次の方法により容易
に合成しうる。すなわち、活性化した金属マグネ
シウムを無水テトラヒドロフラン中でかきまぜつ
つ、一般式()の化合物を20℃ないし溶媒の還
流温度で滴下し、さらに、1〜8時間撹拌するこ
とによつて得られる。a) Synthesis method of para-tertiary-butoxyphenylmagnesium halide [Compound of general formula ()] The compound of general formula () can be easily synthesized by the following method. That is, it is obtained by stirring activated metallic magnesium in anhydrous tetrahydrofuran, adding the compound of general formula () dropwise at 20° C. to the reflux temperature of the solvent, and further stirring for 1 to 8 hours.
反応に使用する金属マグネシウムは、市販のテ
ープ状あるいは削り状物を一般式()の化合物
に対して1〜3倍モル程度を使用する。 The metallic magnesium used in the reaction is a commercially available tape or shavings in an amount of about 1 to 3 times the molar amount of the compound of general formula ().
この反応の開始に先立つて金属マグネシウムを
活性化させるために、窒素雰囲気あるいは減圧条
件で加熱してかきまぜたり、微量のヨウ素あるい
はヨウ化メチル、臭化エチル、ジブロモエタンな
どを添加することは、グリニヤール反応を円滑に
進める上で有効である。 In order to activate metallic magnesium prior to the start of this reaction, heating and stirring in a nitrogen atmosphere or reduced pressure conditions, or adding trace amounts of iodine, methyl iodide, ethyl bromide, dibromoethane, etc. It is effective in promoting the reaction smoothly.
この反応で使用しうる化合物()のハロゲン
化合物としては、塩化物あるいは臭化物の使用が
望ましい。 As the halogen compound of compound () that can be used in this reaction, it is desirable to use chloride or bromide.
一般式()の化合物の合成時の溶媒は、テト
ラヒドロフランやジエチルエーテルなどの単独系
のほか、これらと不活性な溶媒、例えば、ベンゼ
ンやトルエンなどとの混合溶媒の系であつても同
様に有効に使用でき、特に、一般式()のハラ
イドが臭化物の場合は、ジエチルエーテル溶媒中
でも容易にグリニヤール試薬を得ることができ
る。 The solvent used during the synthesis of the compound of general formula () may be a single solvent such as tetrahydrofuran or diethyl ether, or a mixed solvent of these and an inert solvent such as benzene or toluene, which are equally effective. In particular, when the halide of general formula () is a bromide, the Grignard reagent can be easily obtained even in diethyl ether solvent.
なお、一般式()においてX1が塩素である
パラ−第三級−ブトキシフエニルマグネシウムク
ロリドは新規化合物である。 Note that para-tertiary-butoxyphenylmagnesium chloride in which X 1 is chlorine in the general formula () is a new compound.
b) パラ−第三級−ブトキシスチレンの合成法
[一般式()の化合物]
一般式()の化合物は、グリニヤール試薬
()にニツケルホスフイン錯体触媒の存在下で、
ビニルハライド、例えば、塩化ビニルや臭化ビニ
ルとのクロスカツプリング反応により得られる。b) Synthesis method of para-tertiary-butoxystyrene [compound of general formula ()] A compound of general formula () is prepared by adding a Grignard reagent () to a nickel phosphine complex catalyst in the presence of a nickel phosphine complex catalyst.
Obtained by cross-coupling reaction with vinyl halides, such as vinyl chloride and vinyl bromide.
このクロスカツプリング反応の触媒として用い
られるニツケルホスフイン錯体は、二座配位ホス
フイン錯体、例えば、ジクロロ{1,2−ビス
(ジフエニルホスフイノ)エタン}ニツケル、ジ
クロロ{1,3−ビス(ジフエニルホスフイノ)
プロパン}ニツケル等が有効である。 The nickel phosphine complex used as a catalyst for this cross-coupling reaction is a bidentate phosphine complex, such as dichloro{1,2-bis(diphenylphosphino)ethane}nickel, dichloro{1,3-bis( Diphenylphosphino)
Propane}nickel etc. are effective.
触媒の使用量は、グリニヤール試薬()に対
して10-4〜10-2倍モル、好ましくは5×10-4〜5
×10-3倍モル程度の使用が望ましい。 The amount of catalyst to be used is 10 -4 to 10 -2 times the mole of Grignard reagent (), preferably 5 x 10 -4 to 5
It is desirable to use approximately ×10 -3 times the mole amount.
クロスカツプリング反応を行うには、上記方法
により合成したグリニヤール試薬()の温度を
0℃〜70℃、好ましくは30〜40℃に保ち、これに
ビニルハライドを吹込むか、これを溶媒に溶解し
て滴下して、さらに、1〜5時間の撹拌を続け
る。 To perform the cross-coupling reaction, maintain the temperature of the Grignard reagent () synthesized by the above method at 0°C to 70°C, preferably 30 to 40°C, and blow vinyl halide into it or dissolve it in a solvent. Add dropwise and continue stirring for 1 to 5 hours.
反応終了後は、反応液に塩化アンモニウム水溶
液を加えて生成した塩を溶解し、有機層を分離し
て水洗後、芒硝で脱水する。次に、溶媒を蒸留し
て、これに第三級−ブチルカテコール等の重合防
止剤を添加して減圧蒸留することにより、目的と
するパラ−第三級−ブトキシスチレン()を得
る。 After the reaction is completed, an aqueous ammonium chloride solution is added to the reaction solution to dissolve the generated salt, and the organic layer is separated, washed with water, and then dehydrated with sodium sulfate. Next, the solvent is distilled, a polymerization inhibitor such as tertiary-butylcatechol is added thereto, and the mixture is distilled under reduced pressure to obtain the desired para-tertiary-butoxystyrene ().
次に実施例を示して本発明をさらに具体的に説
明する。 Next, the present invention will be explained in more detail with reference to Examples.
実施例 1
パラ−第三級−ブトキシスチレンの合成(パラ
−第三級−ブトキシクロロベンゼンから)
窒素雰囲気で置換した1容量の4径フラスコ
に金属マグネシウム片29.2g(1.2モル)と、溶
媒としてテトラヒドロフラン30mlを入れ、臭化メ
チル1mlを加えた。金属マグネシウム表面での発
泡と反応の開始を確認した後、パラ−第三級−ブ
トキシクロロベンゼン184.7g(1.0モル)をテト
ラヒドロフラン370mlに溶かした溶液を還流温度
(86℃)で約2時間を要して滴下した。さらに、
4時間還流(86℃)を続け、グリニヤール試薬を
得た。この反応におけるグリニヤール試薬への転
換率は99.8%であつた。Example 1 Synthesis of para-tertiary-butoxystyrene (from para-tertiary-butoxychlorobenzene) In a 1-volume 4-diameter flask purged with nitrogen atmosphere, 29.2 g (1.2 mol) of metallic magnesium pieces and tetrahydrofuran were used as a solvent. 30 ml was added, and 1 ml of methyl bromide was added. After confirming foaming and the start of reaction on the surface of metallic magnesium, a solution of 184.7 g (1.0 mol) of para-tertiary-butoxychlorobenzene dissolved in 370 ml of tetrahydrofuran was heated to reflux temperature (86°C) for about 2 hours. dripped. moreover,
Refluxing (86°C) was continued for 4 hours to obtain a Grignard reagent. The conversion rate to Grignard reagent in this reaction was 99.8%.
上記の操作によつて得られたグリニヤール試薬
の上澄液を窒素雰囲気下で1容量の4径フラス
コに移して、触媒としてジクロロ{1,3−ビス
(ジフエニルホスフイノ)プロパン}ニツケル2.7
g(0.005モル)を入れ、冷却して30〜40℃を保
ちながらビニルクロライド93.8g(1.5モル)を
約1.5時間を要して吹込んだ。そして、さらに、
同温度で1時間撹拌を続けた。 The supernatant liquid of the Grignard reagent obtained by the above operation was transferred to a 1-volume 4-diameter flask under a nitrogen atmosphere, and dichloro{1,3-bis(diphenylphosphino)propane}nickel 2.7 was added as a catalyst.
g (0.005 mol) was added thereto, and 93.8 g (1.5 mol) of vinyl chloride was blown thereinto over about 1.5 hours while cooling and maintaining the temperature at 30 to 40°C. And furthermore,
Stirring was continued at the same temperature for 1 hour.
反応終了後は、反応液に塩化アンモニウム水溶
液を加えて生成した塩を溶解し、有機層を分離し
て水洗後、無水芒硝で脱水した。 After the reaction was completed, an aqueous ammonium chloride solution was added to the reaction solution to dissolve the generated salt, and the organic layer was separated, washed with water, and then dehydrated with anhydrous sodium sulfate.
さらに、溶媒を留去し、これに第三級−ブチル
カテコール等の重合防止剤を添加し、減圧条件で
蒸留して、沸点63℃/2mmHgの留分を163.7g
(収率93.0%)を得た。これを以下に示す方法で
分析し、同定した結果、パラ−第三級−ブトキシ
スチレンであることを確かめた。 Furthermore, the solvent was distilled off, a polymerization inhibitor such as tertiary-butylcatechol was added, and the mixture was distilled under reduced pressure to obtain 163.7g of a fraction with a boiling point of 63℃/2mmHg.
(yield 93.0%). This was analyzed and identified by the method shown below, and as a result, it was confirmed that it was para-tertiary-butoxystyrene.
分析値および物性値は以下のとおりであつた。 The analytical values and physical property values were as follows.
(1) ガスクロマトグラフイーによる分析純度は
100%であつた。(1) Analytical purity by gas chromatography is
It was 100%.
(2) 元素分析値
C H
計算値 81.8% 9.1%
実測値 81.9% 9.1%
(3) NMRスペクトル
δ1.32(9H,s,Ha)
δ5.12(1H,q,Hf)
δ5.60(1H,q,Hd)
δ6.64(1H,q,He)
δ6.90(2H,d,Hb)
δ7.28(2H,d,Hc)
(4) 赤外吸収スペクトル
1620cm-1 C=C 伸縮
実施例 2
パラ−第三級−ブトキシスチレンの合成(パラ
−第三級−ブトキシブロモベンゼンから)
窒素雰囲気で置換した1容量の4径フラスコ
に金属マグネシウム片29.2g(1.2モル)と溶媒
として無水ジエチルエーテル30mlを入れ、臭化エ
チル2mlを加えた。金属マグネシウム表面での発
泡と反応の開始を確認した後、パラ−第三級−ブ
トキシブロモベンゼン229.1g(1.0モル)をジエ
チルエーテル600mlに溶かした溶液を還流温度で
約2時間を要して滴下した。さらに、熟成を2時
間続け、グリニヤール試薬を得た。この反応にお
けるグリニヤール試薬への転換率は99.8%であつ
た。(2) Elemental analysis value C H Calculated value 81.8% 9.1% Actual value 81.9% 9.1% (3) NMR spectrum δ1.32 (9H, s, H a ) δ5.12 (1H, q, H f ) δ5.60 (1H, q, H d ) δ6.64 (1H, q, H e ) δ6.90 (2H, d, H b ) δ7.28 (2H, d, H c ) (4) Infrared absorption spectrum 1620 cm -1 C=C Stretching Example 2 Synthesis of para-tertiary-butoxystyrene (para-tertiary- (from butoxybromobenzene) 29.2 g (1.2 mol) of magnesium metal pieces and 30 ml of anhydrous diethyl ether as a solvent were placed in a 1-volume 4-diameter flask purged with nitrogen atmosphere, and 2 ml of ethyl bromide was added. After confirming foaming and the start of reaction on the surface of metallic magnesium, a solution of 229.1 g (1.0 mol) of para-tertiary-butoxybromobenzene dissolved in 600 ml of diethyl ether was added dropwise at reflux temperature over about 2 hours. did. Furthermore, aging was continued for 2 hours to obtain a Grignard reagent. The conversion rate to Grignard reagent in this reaction was 99.8%.
上記の操作によつて得られたグリニヤール試薬
を窒素雰囲気下で1容量の4径フラスコに移し
て、触媒としてジクロロ{1,2−ビス(ジフエ
ニルホスフイノ)エタン}ニツケル2.6g(0.005
モル)を入れ、30〜40℃を保つため、冷却しつつ
ビニルブロマイド138.2g(1.3モル)を約1.5時間
を要して吹き込み、さらに、同温度で1時間の撹
拌を続けた。 The Grignard reagent obtained by the above operation was transferred to a 1-volume 4-diameter flask under a nitrogen atmosphere, and 2.6 g (0.005
138.2 g (1.3 mol) of vinyl bromide was blown into the mixture over a period of about 1.5 hours while cooling to maintain the temperature at 30 to 40° C., and stirring was continued for 1 hour at the same temperature.
反応終了後は、反応液に塩化アンモニウム水溶
液を加えて生成した塩を溶解し、有機層を分離し
て水洗後、無水芒硝で脱水した。さらに、溶媒を
留去して第三級−ブチルカテコール等の重合防止
剤を添加し、減圧条件で蒸留して、沸点63℃/2
mmHgの留分を167.2g(収率95.0%)を得た。こ
れを実施例1と同様の方法で分析し、同定した結
果、パラ−第三級−ブトキシスチレンであること
を確認した。 After the reaction was completed, an aqueous ammonium chloride solution was added to the reaction solution to dissolve the generated salt, and the organic layer was separated, washed with water, and then dehydrated with anhydrous sodium sulfate. Furthermore, the solvent was distilled off, a polymerization inhibitor such as tertiary-butylcatechol was added, and the boiling point was 63℃/2.
167.2 g (yield 95.0%) of mmHg fraction was obtained. This was analyzed in the same manner as in Example 1, and as a result of identification, it was confirmed that it was para-tertiary-butoxystyrene.
分析値及び物性値は実施例1と同じであつた。
ガスクロマトグラフイーによる分析純度は99.9%
であつた。 The analytical values and physical property values were the same as in Example 1.
Analytical purity by gas chromatography is 99.9%
It was hot.
ハ) 発明の効果
パラ−第三級−ブトキシスチレンの合成法にお
いて、本発明の合成法は従来の合成法に比べ、次
の点ですぐれた効果がもたらされる。C) Effects of the Invention In the synthesis method of para-tertiary-butoxystyrene, the synthesis method of the present invention provides the following advantages over conventional synthesis methods.
すなわち、本発明の合成法は、従来の合成法で
は、高価であり、原料の一つとして入手困難であ
り、しかも操作上の安全性でも問題のある過安息
香酸−第三級−ブチルエステルを使用するのに対
し、使用する原料が安価であり、容易な操作で目
的物を高純度、高収率で得ることができる。 That is, the synthesis method of the present invention uses perbenzoic acid tertiary-butyl ester, which is expensive and difficult to obtain as a raw material, and which has operational safety problems, which conventional synthesis methods use. In contrast, the raw materials used are inexpensive, and the target product can be obtained with high purity and high yield through easy operations.
Claims (1)
ラ−第三級−ブトキシフエニルハライドを金属マ
グネシウムと反応させ、 一般式 で表わされるパラ−第三級−ブトキシフエニルマ
グネシウムハライドとし、これをニツケルホスフ
イン錯体触媒の存在下に、 一般式 CH2=CHX2 (X2はハロゲン原子を示す)で表わされるビ
ニルハライドを作用させることを特徴とする、 で表わされるパラ−第三級−ブトキシスチレンの
合成法。[Claims] 1. General formula Para-tertiary-butoxyphenyl halide represented by (X 1 represents a halogen atom) is reacted with metallic magnesium, and the general formula A para-tertiary-butoxyphenylmagnesium halide represented by is used, and a vinyl halide represented by the general formula CH 2 =CHX 2 (X 2 represents a halogen atom) is converted into a para-tertiary-butoxyphenylmagnesium halide in the presence of a nickel phosphine complex catalyst. characterized by causing A method for synthesizing para-tertiary-butoxystyrene represented by
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26399587A JPH01106835A (en) | 1987-10-21 | 1987-10-21 | Method for synthesizing p-tertiary-butoxystyrene |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26399587A JPH01106835A (en) | 1987-10-21 | 1987-10-21 | Method for synthesizing p-tertiary-butoxystyrene |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01106835A JPH01106835A (en) | 1989-04-24 |
| JPH0471896B2 true JPH0471896B2 (en) | 1992-11-16 |
Family
ID=17397082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26399587A Granted JPH01106835A (en) | 1987-10-21 | 1987-10-21 | Method for synthesizing p-tertiary-butoxystyrene |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01106835A (en) |
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|---|---|---|---|---|
| JP3585277B2 (en) * | 1994-12-05 | 2004-11-04 | 本州化学工業株式会社 | Method for producing styrene derivative |
| US6472567B2 (en) | 1998-01-30 | 2002-10-29 | Tosoh Corporation | Process for the production of styrene compound, and styrene compound free from biphenyl |
| US6479709B1 (en) * | 1998-01-30 | 2002-11-12 | Tosoh Corporation | Process for the production of styrene derivative |
| US6433118B1 (en) | 1998-10-15 | 2002-08-13 | Mitsui Chemicals, Inc. | Copolymer, a manufacturing process therefor and a solution containing thereof |
| JP4238405B2 (en) * | 1999-02-09 | 2009-03-18 | 東ソー株式会社 | Method for producing substituted styrene derivative or substituted biaryl derivative |
| JP2003055285A (en) * | 2001-08-09 | 2003-02-26 | Hokko Chem Ind Co Ltd | 4-tert-butoxy-4'-halogenobiphenyl and method for producing the same, and method for producing 4-halogeno-4'-hydroxybiphenyl |
| JP2007084563A (en) * | 2006-11-06 | 2007-04-05 | Tosoh Corp | Method for distillation of oxystyrene derivatives |
| JP7509573B2 (en) * | 2019-08-27 | 2024-07-02 | 東ソー・ファインケム株式会社 | Method for producing oxystyrene compounds having polysubstituted ether substituents |
-
1987
- 1987-10-21 JP JP26399587A patent/JPH01106835A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4546050A1 (en) | 2023-10-23 | 2025-04-30 | Valstybinis Moksliniu Tyrimu Institutas Fiziniu Ir Technologijos Mokslu Centras | Method for patterning graphene layers through photolithography for a scalable fabrication of graphene devices |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01106835A (en) | 1989-04-24 |
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