JPH0472548U

JPH0472548U -

Info

Publication number: JPH0472548U
Application number: JP11555890U
Authority: JP
Priority date: 1990-11-02
Filing date: 1990-11-02
Publication date: 1992-06-25

Description

[Brief explanation of drawings]

第１Ａ図は、本考案の平面型・カソードの配置
を示す概略図、第１Ｂ図は、本考案の円筒型・カ
ソードの配置を示す概略図、第２図は、本考案の
円筒型・カソードを用いた電子ビーム源の構成図
、第３図は、各種放電ガスによる放電開始電圧と
ガス圧×電極間距離の関係を示す図、第４図は、
従来のカソードの正面断面図、第５図は、従来の
ドライエツチング装置の構成図である。符号の説明、１０，２０，５０……筒状密封容
器、１１，２３，２３′，２３″，６３，６３′
，６３″，６３″′……貫通孔、１２，２４，５
８……第１の中間電極、１３，３０，６０……カ
ソード室、１４，１４′……ホウ化ランタン・フ
イラメント、１５，１５′……加熱電源、１６，
１６′……絶縁フランジ、１７……イオン流、１
８，３２，４０……放電ガス導入孔、２１，５１
……カソード、２２，５４……ホルダ、２５，５
２……アノード、２６，５３……電子ビーム加速
電極、２７，５５……放電領域、２８，５６……
電子ビーム加速領域、２９，５７……被処理領域
、３１，６２……アノード室、３３，６５……被
処理ガス導入孔、３４，３４′，６４，６４′，
６４″……排気孔、５９……第２の中間電極、６
１……中間室、４１……補助カソード、４２……
主カソード、４３……絶縁支持部材、４４……円
筒状部材。 Figure 1A is a schematic diagram showing the planar type cathode arrangement of the present invention, Figure 1B is a schematic diagram showing the cylindrical type cathode arrangement of the present invention, and Figure 2 is a cylindrical type cathode arrangement of the present invention. A configuration diagram of an electron beam source using
FIG. 5, which is a front sectional view of a conventional cathode, is a block diagram of a conventional dry etching apparatus. Explanation of symbols, 10, 20, 50... Cylindrical sealed container, 11, 23, 23', 23'', 63, 63'
, 63″, 63″′...Through hole, 12, 24, 5
8...First intermediate electrode, 13,30,60...Cathode chamber, 14,14'...Lanthanum boride filament, 15,15'...Heating power source, 16,
16'...Insulating flange, 17...Ion flow, 1
8, 32, 40...Discharge gas introduction hole, 21, 51
...Cathode, 22,54 ...Holder, 25,5
2...Anode, 26,53...Electron beam accelerating electrode, 27,55...Discharge region, 28,56...
Electron beam acceleration region, 29, 57...Processing region, 31, 62...Anode chamber, 33, 65...Processing gas introduction hole, 34, 34', 64, 64',
64″...Exhaust hole, 59...Second intermediate electrode, 6
1... Intermediate chamber, 41... Auxiliary cathode, 42...
Main cathode, 43... Insulating support member, 44... Cylindrical member.

Claims

[Claims for Utility Model Registration] 1. An intermediate electrode 24 having a through hole 23, an anode 25 having a through hole 23', and an electron beam accelerating electrode 26 having a through hole 23'' are surrounded by aligning these through holes. The closed upstream end of the enclosure and the intermediate electrode 24 form a cathode chamber 30 which contains a cathode 21 with an external heating source and which is supplied with a discharge gas. The intermediate electrode 24 and the anode 25 form an anode chamber 31, and the anode 25 and the electron beam acceleration electrode 26 form an acceleration region 2.
8, this region has an exhaust hole 34, and the cathode 21 is arranged with its thermionic emission surface separated from the line in which the through holes are aligned. Electron beam source. 2. The electron beam source for plasma generation according to claim 1, wherein the cathode is a planar cathode made of a lanthanum boride filament. 3. The electron beam source for plasma generation according to claim 1, wherein the cathode is a cylindrical cathode made of a lanthanum boride filament, and the center of the cylinder is aligned with a line in which the through holes are aligned.