JPH0473951A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPH0473951A JPH0473951A JP2187660A JP18766090A JPH0473951A JP H0473951 A JPH0473951 A JP H0473951A JP 2187660 A JP2187660 A JP 2187660A JP 18766090 A JP18766090 A JP 18766090A JP H0473951 A JPH0473951 A JP H0473951A
- Authority
- JP
- Japan
- Prior art keywords
- wiring
- signal wiring
- dummy
- signal
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 24
- 239000000758 substrate Substances 0.000 abstract description 12
- 230000003071 parasitic effect Effects 0.000 abstract description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000008054 signal transmission Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体装置に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a semiconductor device.
従来の半導体装置は第3図に示すように論理回路1と論
理回路3との間を信号用配線2で接続する場合、第4図
に示すように半導体基板5の上に設けた絶縁膜6の上に
アルミニウム層等の金属配線からなる信号用配線2を接
続していた。その際信号用配線2には半導体基板5等の
接地電位との間に配線容量が寄生的に発生し、論理回路
間の信号伝達速度に遅延をもたらす要因となっていた。In a conventional semiconductor device, when a logic circuit 1 and a logic circuit 3 are connected by a signal wiring 2 as shown in FIG. 3, an insulating film 6 provided on a semiconductor substrate 5 as shown in FIG. A signal wiring 2 made of metal wiring such as an aluminum layer was connected thereon. At this time, wiring capacitance is parasitic generated between the signal wiring 2 and the ground potential of the semiconductor substrate 5, etc., which causes a delay in the signal transmission speed between logic circuits.
上述した従来の半導体装置は、信号用配線と電位の異な
る半導体基板等の間に配線容量が寄生的に生じ、この為
、信号伝達速度に遅延をもたらし高速化に悪影響を及ぼ
すという欠点がある。The conventional semiconductor device described above has a drawback in that wiring capacitance is parasiticly generated between the signal wiring and the semiconductor substrate having a different potential, which causes a delay in the signal transmission speed and adversely affects speeding up.
本発明の半導体装置は、所定の信号用配線に平行して、
該信号用配線にバッファ回路を介して接続した電位的に
同相のダミー配線を有している。In the semiconductor device of the present invention, in parallel to the predetermined signal wiring,
A dummy wiring that is electrically in phase with the signal wiring is connected to the signal wiring via a buffer circuit.
次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第1図は本発明の一実施例を示すブロック図、第2図は
本発明の一実施例の模式的断面図である。第1図に示す
ように、論理回路1の出力端に接続されて平行に設けた
信号用配線2及びダミー配線4は論理回路1の出力をイ
ンバータで各々分離して得られた同相の信号が供給され
、信号用配線2は次段の論理回路2に接続され、ダミー
配線4の末端は開放されている。FIG. 1 is a block diagram showing one embodiment of the present invention, and FIG. 2 is a schematic sectional view of one embodiment of the present invention. As shown in FIG. 1, the signal wiring 2 and dummy wiring 4 connected to the output end of the logic circuit 1 and provided in parallel receive in-phase signals obtained by separating the output of the logic circuit 1 with an inverter. The signal wiring 2 is connected to the next stage logic circuit 2, and the end of the dummy wiring 4 is open.
第2図に示すように、半導体基板5と、半導体基板5の
上に設けた絶縁膜6の上に設けた信号用配線2との間に
互に絶縁膜6を介して同相の信号が供給されるダミー配
線4を形成することにより、信号用配線2とダミー配線
4との間に電位差が生じなくなり寄生容量の発生を抑制
する事ができる。この為半導体基板5と信号用配線2と
の間の配線容量が削減され、信号伝達速度が速くなり半
導体装置の高速化を図ることができる。As shown in FIG. 2, signals of the same phase are supplied between the semiconductor substrate 5 and the signal wiring 2 provided on the insulating film 6 provided on the semiconductor substrate 5 through the insulating film 6. By forming the dummy wiring 4, no potential difference occurs between the signal wiring 2 and the dummy wiring 4, and the generation of parasitic capacitance can be suppressed. Therefore, the wiring capacitance between the semiconductor substrate 5 and the signal wiring 2 is reduced, the signal transmission speed is increased, and the speed of the semiconductor device can be increased.
尚、ダミー配線4は信号用配線2の断面の周囲を絶縁膜
を介して同心状に取巻くように設けても良い。Note that the dummy wiring 4 may be provided so as to concentrically surround the cross section of the signal wiring 2 with an insulating film interposed therebetween.
以上説明したように本発明は、所定の信号用配線に平行
して該信号用配線にバッファ回路を介して接続した電位
的に同相なダミー配線を配置することにより、任意の信
号用配線と接地電位を有する半導体基板との間に生じる
寄生容量が削減できる。この為半導体装置の高速化に大
きな効果をもたらす。As explained above, the present invention can connect arbitrary signal wiring and grounding by arranging a dummy wiring that is electrically in phase and connected to a predetermined signal wiring via a buffer circuit in parallel with a predetermined signal wiring. Parasitic capacitance generated between the semiconductor substrate and the semiconductor substrate having a potential can be reduced. This has a great effect on increasing the speed of semiconductor devices.
第1図は本発明の一実施例を示すブロック図、第2図は
本発明の一実施例の模式的断面図、第3図は従来の半導
体装置の一例を示すブロック図、第4図は従来の半導体
装1の一例を示す断面図である。
1.3・・・論理回路、2・・・信号用配線、4・・・
ダミー配線、5・・・半導体基板、6・・・絶縁膜。FIG. 1 is a block diagram showing an embodiment of the present invention, FIG. 2 is a schematic sectional view of an embodiment of the present invention, FIG. 3 is a block diagram showing an example of a conventional semiconductor device, and FIG. 4 is a block diagram showing an example of a conventional semiconductor device. 1 is a cross-sectional view showing an example of a conventional semiconductor device 1. FIG. 1.3...Logic circuit, 2...Signal wiring, 4...
Dummy wiring, 5... semiconductor substrate, 6... insulating film.
Claims (1)
回路を介して接続した電位的に同相のダミー配線が配置
されていることを特徴とする半導体装置。1. A semiconductor device characterized in that a dummy wiring having the same potential phase is arranged in parallel with a predetermined signal wiring and connected to the signal wiring via a buffer circuit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2187660A JPH0473951A (en) | 1990-07-16 | 1990-07-16 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2187660A JPH0473951A (en) | 1990-07-16 | 1990-07-16 | Semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0473951A true JPH0473951A (en) | 1992-03-09 |
Family
ID=16209957
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2187660A Pending JPH0473951A (en) | 1990-07-16 | 1990-07-16 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0473951A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0926537A3 (en) * | 1997-12-26 | 1999-07-14 | Sharp Kabushiki Kaisha | Liquid crystal display device |
| JP2000174017A (en) * | 1998-07-31 | 2000-06-23 | Stmicroelectronics Inc | Apparatus and method for reducing propagation delay in conductors |
| US6348723B1 (en) | 1995-04-28 | 2002-02-19 | Sharp Kabushiki Kaisha | Semiconductor device with a dummy wire positioned to prevent charging/discharging of the parasitic capacitance of a signal wire |
| US7469396B2 (en) | 2004-06-11 | 2008-12-23 | Panasonic Corporation | Semiconductor device and layout design method therefor |
-
1990
- 1990-07-16 JP JP2187660A patent/JPH0473951A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6348723B1 (en) | 1995-04-28 | 2002-02-19 | Sharp Kabushiki Kaisha | Semiconductor device with a dummy wire positioned to prevent charging/discharging of the parasitic capacitance of a signal wire |
| EP0926537A3 (en) * | 1997-12-26 | 1999-07-14 | Sharp Kabushiki Kaisha | Liquid crystal display device |
| US6333771B1 (en) | 1997-12-26 | 2001-12-25 | Sharp Kabushiki Kaisha | Liquid crystal display device capable of reducing the influence of parasitic capacities |
| US6608655B2 (en) | 1997-12-26 | 2003-08-19 | Sharp Kabushiki Kaisha | Liquid crystal display device including identical shape dummy wire surrounding each pixel and capable of reducing the influence of parasitic capacities |
| JP2000174017A (en) * | 1998-07-31 | 2000-06-23 | Stmicroelectronics Inc | Apparatus and method for reducing propagation delay in conductors |
| EP0977263A3 (en) * | 1998-07-31 | 2002-07-10 | STMicroelectronics, Inc. | Apparatus and method for reducing propagation delay in a conductor |
| US6842092B2 (en) | 1998-07-31 | 2005-01-11 | Stmicroelectronics, Inc. | Apparatus and method for reducing propagation delay in a conductor |
| US7495526B2 (en) | 1998-07-31 | 2009-02-24 | Stmicroelectronics, Inc. | Apparatus and method for reducing propagation delay in a conductor system selectable to carry a single signal or independent signals |
| US7469396B2 (en) | 2004-06-11 | 2008-12-23 | Panasonic Corporation | Semiconductor device and layout design method therefor |
| US8319257B2 (en) | 2004-06-11 | 2012-11-27 | Panasonic Corporation | Semiconductor device and layout design method therefor |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6465892B1 (en) | Interconnect structure for stacked semiconductor device | |
| US7602049B2 (en) | Capacitive techniques to reduce noise in high speed interconnections | |
| KR20170056774A (en) | Semiconductor device and semiconductor package | |
| US4654690A (en) | Capacitive elements with reduced stray capacitance | |
| JPH0473951A (en) | Semiconductor device | |
| KR19980044215A (en) | Wiring Structure of Semiconductor Device and Formation Method | |
| JP3774243B2 (en) | Improved signal line routing mechanism | |
| JPS629697A (en) | wiring board | |
| JPH05226500A (en) | Mounting circuit board | |
| JPS62229958A (en) | Semiconductor device | |
| JPH06120413A (en) | Multichip module | |
| JPH0348455A (en) | Semiconductor device | |
| JPS61230333A (en) | Integrated circuit | |
| JPH03138962A (en) | Semiconductor integrated circuit | |
| KR950021412A (en) | Power Line Formation Method of Semiconductor Device | |
| JPH0447974B2 (en) | ||
| JPH0683473A (en) | Semiconductor integrated circuit | |
| KR960006103B1 (en) | Semiconductor device fabrication process | |
| KR940008047A (en) | Method and apparatus for removing metal blanks in metal lines of semiconductor devices | |
| JPH01143230A (en) | Semiconductor device | |
| JPS58143565A (en) | Semiconductor circuit wiring body | |
| JPH01140744A (en) | Semiconductor integrated circuit | |
| JPS59188942A (en) | Ic with high withstand voltage | |
| JPH08306773A (en) | Semiconductor device | |
| JPH01109739A (en) | Semiconductor integrated circuit |