JPH0473951A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH0473951A
JPH0473951A JP2187660A JP18766090A JPH0473951A JP H0473951 A JPH0473951 A JP H0473951A JP 2187660 A JP2187660 A JP 2187660A JP 18766090 A JP18766090 A JP 18766090A JP H0473951 A JPH0473951 A JP H0473951A
Authority
JP
Japan
Prior art keywords
wiring
signal wiring
dummy
signal
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2187660A
Other languages
Japanese (ja)
Inventor
Kazuhiro Kobayashi
一博 小林
Yukihiko Ishikawa
幸彦 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC IC Microcomputer Systems Co Ltd
Original Assignee
NEC IC Microcomputer Systems Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC IC Microcomputer Systems Co Ltd filed Critical NEC IC Microcomputer Systems Co Ltd
Priority to JP2187660A priority Critical patent/JPH0473951A/en
Publication of JPH0473951A publication Critical patent/JPH0473951A/en
Pending legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To decrease parasitic capacitance generated between an arbitrary signal wiring and a semiconductor substrate having the ground potential and to achieve the high speed in a semiconductor device by arranging a dummy wiring which is connected to the signal wiring through a buffer circuit and has the same phase in potential in parallel with the specified signal wiring. CONSTITUTION:A dummy wiring 4 is arranged in parallel with a specified signal wiring 2. The wiring 4 is connected to the signal wiring 2 through a buffer circuit. The wiring 4 has the same potential phase as that of the wiring 2. For example, the signal wiring 2 and the dummy wiring 4 are connected to the output end of a logic circuit 1. The output of the logic circuit 1 is separated through an inverter, and the signals in the same phase are supplied to the signal wiring 2 and the dummy wiring 4 which are provided in parallel. The signal wiring 2 is connected to a logic circuit 3 in the next stage. The end of the dummy wiring 4 is opened. At this time, the dummy wiring 4 is formed between a semiconductor substrate 5 and the signal wiring 2 which is provided on an insulating film 6 that is provided on the semiconductor substrate 5. The signal in the same phase is supplied to the dummy wiring 4 through the insulating film 6. In this way, the potential difference is not generated between the signal wiring 2 and the dummy wiring 4, and the generation of parasitic capacitance is suppressed.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体装置に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a semiconductor device.

〔従来の技術〕[Conventional technology]

従来の半導体装置は第3図に示すように論理回路1と論
理回路3との間を信号用配線2で接続する場合、第4図
に示すように半導体基板5の上に設けた絶縁膜6の上に
アルミニウム層等の金属配線からなる信号用配線2を接
続していた。その際信号用配線2には半導体基板5等の
接地電位との間に配線容量が寄生的に発生し、論理回路
間の信号伝達速度に遅延をもたらす要因となっていた。
In a conventional semiconductor device, when a logic circuit 1 and a logic circuit 3 are connected by a signal wiring 2 as shown in FIG. 3, an insulating film 6 provided on a semiconductor substrate 5 as shown in FIG. A signal wiring 2 made of metal wiring such as an aluminum layer was connected thereon. At this time, wiring capacitance is parasitic generated between the signal wiring 2 and the ground potential of the semiconductor substrate 5, etc., which causes a delay in the signal transmission speed between logic circuits.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来の半導体装置は、信号用配線と電位の異な
る半導体基板等の間に配線容量が寄生的に生じ、この為
、信号伝達速度に遅延をもたらし高速化に悪影響を及ぼ
すという欠点がある。
The conventional semiconductor device described above has a drawback in that wiring capacitance is parasiticly generated between the signal wiring and the semiconductor substrate having a different potential, which causes a delay in the signal transmission speed and adversely affects speeding up.

〔課題を解決するための手段〕[Means to solve the problem]

本発明の半導体装置は、所定の信号用配線に平行して、
該信号用配線にバッファ回路を介して接続した電位的に
同相のダミー配線を有している。
In the semiconductor device of the present invention, in parallel to the predetermined signal wiring,
A dummy wiring that is electrically in phase with the signal wiring is connected to the signal wiring via a buffer circuit.

〔実施例〕〔Example〕

次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.

第1図は本発明の一実施例を示すブロック図、第2図は
本発明の一実施例の模式的断面図である。第1図に示す
ように、論理回路1の出力端に接続されて平行に設けた
信号用配線2及びダミー配線4は論理回路1の出力をイ
ンバータで各々分離して得られた同相の信号が供給され
、信号用配線2は次段の論理回路2に接続され、ダミー
配線4の末端は開放されている。
FIG. 1 is a block diagram showing one embodiment of the present invention, and FIG. 2 is a schematic sectional view of one embodiment of the present invention. As shown in FIG. 1, the signal wiring 2 and dummy wiring 4 connected to the output end of the logic circuit 1 and provided in parallel receive in-phase signals obtained by separating the output of the logic circuit 1 with an inverter. The signal wiring 2 is connected to the next stage logic circuit 2, and the end of the dummy wiring 4 is open.

第2図に示すように、半導体基板5と、半導体基板5の
上に設けた絶縁膜6の上に設けた信号用配線2との間に
互に絶縁膜6を介して同相の信号が供給されるダミー配
線4を形成することにより、信号用配線2とダミー配線
4との間に電位差が生じなくなり寄生容量の発生を抑制
する事ができる。この為半導体基板5と信号用配線2と
の間の配線容量が削減され、信号伝達速度が速くなり半
導体装置の高速化を図ることができる。
As shown in FIG. 2, signals of the same phase are supplied between the semiconductor substrate 5 and the signal wiring 2 provided on the insulating film 6 provided on the semiconductor substrate 5 through the insulating film 6. By forming the dummy wiring 4, no potential difference occurs between the signal wiring 2 and the dummy wiring 4, and the generation of parasitic capacitance can be suppressed. Therefore, the wiring capacitance between the semiconductor substrate 5 and the signal wiring 2 is reduced, the signal transmission speed is increased, and the speed of the semiconductor device can be increased.

尚、ダミー配線4は信号用配線2の断面の周囲を絶縁膜
を介して同心状に取巻くように設けても良い。
Note that the dummy wiring 4 may be provided so as to concentrically surround the cross section of the signal wiring 2 with an insulating film interposed therebetween.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は、所定の信号用配線に平行
して該信号用配線にバッファ回路を介して接続した電位
的に同相なダミー配線を配置することにより、任意の信
号用配線と接地電位を有する半導体基板との間に生じる
寄生容量が削減できる。この為半導体装置の高速化に大
きな効果をもたらす。
As explained above, the present invention can connect arbitrary signal wiring and grounding by arranging a dummy wiring that is electrically in phase and connected to a predetermined signal wiring via a buffer circuit in parallel with a predetermined signal wiring. Parasitic capacitance generated between the semiconductor substrate and the semiconductor substrate having a potential can be reduced. This has a great effect on increasing the speed of semiconductor devices.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例を示すブロック図、第2図は
本発明の一実施例の模式的断面図、第3図は従来の半導
体装置の一例を示すブロック図、第4図は従来の半導体
装1の一例を示す断面図である。 1.3・・・論理回路、2・・・信号用配線、4・・・
ダミー配線、5・・・半導体基板、6・・・絶縁膜。
FIG. 1 is a block diagram showing an embodiment of the present invention, FIG. 2 is a schematic sectional view of an embodiment of the present invention, FIG. 3 is a block diagram showing an example of a conventional semiconductor device, and FIG. 4 is a block diagram showing an example of a conventional semiconductor device. 1 is a cross-sectional view showing an example of a conventional semiconductor device 1. FIG. 1.3...Logic circuit, 2...Signal wiring, 4...
Dummy wiring, 5... semiconductor substrate, 6... insulating film.

Claims (1)

【特許請求の範囲】[Claims]  所定の信号用配線に平行して該信号用配線にバッファ
回路を介して接続した電位的に同相のダミー配線が配置
されていることを特徴とする半導体装置。
1. A semiconductor device characterized in that a dummy wiring having the same potential phase is arranged in parallel with a predetermined signal wiring and connected to the signal wiring via a buffer circuit.
JP2187660A 1990-07-16 1990-07-16 Semiconductor device Pending JPH0473951A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2187660A JPH0473951A (en) 1990-07-16 1990-07-16 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2187660A JPH0473951A (en) 1990-07-16 1990-07-16 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH0473951A true JPH0473951A (en) 1992-03-09

Family

ID=16209957

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2187660A Pending JPH0473951A (en) 1990-07-16 1990-07-16 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH0473951A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0926537A3 (en) * 1997-12-26 1999-07-14 Sharp Kabushiki Kaisha Liquid crystal display device
JP2000174017A (en) * 1998-07-31 2000-06-23 Stmicroelectronics Inc Apparatus and method for reducing propagation delay in conductors
US6348723B1 (en) 1995-04-28 2002-02-19 Sharp Kabushiki Kaisha Semiconductor device with a dummy wire positioned to prevent charging/discharging of the parasitic capacitance of a signal wire
US7469396B2 (en) 2004-06-11 2008-12-23 Panasonic Corporation Semiconductor device and layout design method therefor

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6348723B1 (en) 1995-04-28 2002-02-19 Sharp Kabushiki Kaisha Semiconductor device with a dummy wire positioned to prevent charging/discharging of the parasitic capacitance of a signal wire
EP0926537A3 (en) * 1997-12-26 1999-07-14 Sharp Kabushiki Kaisha Liquid crystal display device
US6333771B1 (en) 1997-12-26 2001-12-25 Sharp Kabushiki Kaisha Liquid crystal display device capable of reducing the influence of parasitic capacities
US6608655B2 (en) 1997-12-26 2003-08-19 Sharp Kabushiki Kaisha Liquid crystal display device including identical shape dummy wire surrounding each pixel and capable of reducing the influence of parasitic capacities
JP2000174017A (en) * 1998-07-31 2000-06-23 Stmicroelectronics Inc Apparatus and method for reducing propagation delay in conductors
EP0977263A3 (en) * 1998-07-31 2002-07-10 STMicroelectronics, Inc. Apparatus and method for reducing propagation delay in a conductor
US6842092B2 (en) 1998-07-31 2005-01-11 Stmicroelectronics, Inc. Apparatus and method for reducing propagation delay in a conductor
US7495526B2 (en) 1998-07-31 2009-02-24 Stmicroelectronics, Inc. Apparatus and method for reducing propagation delay in a conductor system selectable to carry a single signal or independent signals
US7469396B2 (en) 2004-06-11 2008-12-23 Panasonic Corporation Semiconductor device and layout design method therefor
US8319257B2 (en) 2004-06-11 2012-11-27 Panasonic Corporation Semiconductor device and layout design method therefor

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