JPH0476526B2 - - Google Patents
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- Publication number
- JPH0476526B2 JPH0476526B2 JP13975385A JP13975385A JPH0476526B2 JP H0476526 B2 JPH0476526 B2 JP H0476526B2 JP 13975385 A JP13975385 A JP 13975385A JP 13975385 A JP13975385 A JP 13975385A JP H0476526 B2 JPH0476526 B2 JP H0476526B2
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- line
- conductor
- capacitance
- electrode
- width
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- 239000010410 layer Substances 0.000 claims description 13
- 239000002356 single layer Substances 0.000 claims description 10
- 239000004020 conductor Substances 0.000 description 42
- 238000000034 method Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
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Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は立ち上がり時間1ns以下の超高速信号
を扱う小型の分布定数型の電磁遅延線に係り、特
に、遅延時間の増大が用意で特性の良好な電磁遅
延線に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a compact distributed constant type electromagnetic delay line that handles ultra-high-speed signals with a rise time of 1 ns or less. Concerning good electromagnetic delay lines.
従来、分布定数型電磁遅延線としては、第7図
および第8図に示されるように、細長い接地電極
1の外周に誘電体層3を形成し、この誘電体層3
の外周に導線路5を単層ソレノイド状に形成して
インダクタンス素子7を構成してなるものが提案
されている。
Conventionally, as a distributed constant type electromagnetic delay line, as shown in FIGS. 7 and 8, a dielectric layer 3 is formed around the outer periphery of an elongated ground electrode 1.
It has been proposed that an inductance element 7 is constructed by forming a conductive line 5 in the shape of a single layer solenoid around the outer periphery of the inductance element 7.
このような電磁遅延線は超高速信号の扱いに適
し、誘電体層3の厚み方向で対向する導線路5の
中心間の間隔T(以下同じ)および導線路5のピ
ツチPの比T/Pを、特に0<T/P<1の範囲
の選定すれば、良好な遅延特性が得られる。 Such an electromagnetic delay line is suitable for handling ultrahigh-speed signals, and has a distance T between the centers of conductive lines 5 facing each other in the thickness direction of the dielectric layer 3 (the same applies hereinafter) and a ratio T/P of the pitch P of the conductive lines 5. In particular, if T/P is selected in the range of 0<T/P<1, good delay characteristics can be obtained.
しかし、このような電磁遅延線において、単位
体積当たりの遅延時間を増加させるとともにより
小型化を図るには、ピツチPを小さくして高密度
化すればよいと考えるのが一般的であるが、その
場合ピツチPの寸法を小さくすると、上述したピ
ツチPと間隔Tの関係から間隔Tも小さくせねば
良好な特性が得られなくなるおそれがある。 However, in such an electromagnetic delay line, it is generally considered that in order to increase the delay time per unit volume and to achieve further miniaturization, it is sufficient to reduce the pitch P and increase the density. In that case, if the size of the pitch P is reduced, there is a risk that good characteristics may not be obtained unless the distance T is also made smaller, based on the relationship between the pitch P and the distance T described above.
また、導線路5の幅Wに関しては、幅Wが小さ
い程、導線路5の単位長さ当たりのインダクタン
ス分が増加するが、幅Wが小さい程、導線路5の
単位長さ当たりの接地電極との静電容量が減少す
る。 Regarding the width W of the conducting line 5, the smaller the width W, the more the inductance per unit length of the conducting line 5 increases, but the smaller the width W, the more the ground electrode per unit length of the conducting line 5. The capacitance between and decreases.
従つて、導線路5の幅Wは、主にインダクタン
ス素子7の特性インピーダンスZoを所定の値に
するために選定されていた。なお、特性インピー
ダンスZoは、導線路5の単位長さ当たりのイン
ダクタンスLと静電容量CからZo=√で
求められる。 Therefore, the width W of the conductive line 5 has been selected mainly to set the characteristic impedance Zo of the inductance element 7 to a predetermined value. Note that the characteristic impedance Zo is determined from the inductance L and capacitance C per unit length of the conductive line 5 as Zo=√.
そのため、遅延時間を増大させるためには導線
路5のピツチPを小さくするしかなかつたが、上
述したようにピツチPとともに間隔Tも小さくす
る必要があり、それら双方を小さくして高密度化
するには限界があつた。 Therefore, in order to increase the delay time, there was no choice but to reduce the pitch P of the conducting lines 5, but as mentioned above, it is necessary to reduce the pitch P and the interval T, so it is necessary to reduce both of them to increase the density. had its limits.
本発明はこのような状況の下になされたもの
で、単層ソレノイド状に形成されたインダクタン
ス素子のピツチPおよび間隔Tの寸法を小さくす
ることなく、大きな遅延時間および良好な遅延特
性の得られる小型の分布定数型電磁遅延線を得ら
ものである。
The present invention was made under these circumstances, and it is possible to obtain a large delay time and good delay characteristics without reducing the pitch P and interval T of an inductance element formed in the shape of a single-layer solenoid. A small distributed constant type electromagnetic delay line is obtained.
このような問題点を解決するために本発明の電
磁遅延線は、導線路を実質的に単層ソレノイド状
に形成してインダクタンス素子を構成し、その導
線路に誘電体層を介して接地電極を対向させ、そ
の導線路の複数個所でその導線路の側部から容量
補償電極を接地電極に対向して延設されてなるも
のである。
In order to solve these problems, the electromagnetic delay line of the present invention has a conductive line formed into a substantially single-layer solenoid shape to constitute an inductance element, and a ground electrode is connected to the conductive line through a dielectric layer. are arranged to face each other, and capacitance compensation electrodes are extended from the sides of the conductive line at a plurality of locations to face the ground electrode.
このような手段により本発明の電磁遅延線は、
導線路の幅を狭くしてそのインダクタンス分を増
大させることが可能であるとともに、導線路の幅
を狭くすることによる静電容量の不足分もしくは
それ以上をその導線路の途中に形成された容量補
償電極によつて補償することが容易となる。
By such means, the electromagnetic delay line of the present invention can be
It is possible to increase the inductance by narrowing the width of the conducting line, and to compensate for the lack of capacitance due to narrowing the width of the conducting line, or to compensate for the capacitance formed in the middle of the conducting line. Compensation electrodes facilitate compensation.
以下本発明の実施例を説明する。 Examples of the present invention will be described below.
第1図および第2図は本発明の電磁遅延線の一
実施例を示す部分正面図およびその側面図であ
る。 1 and 2 are a partial front view and a side view of an embodiment of the electromagnetic delay line of the present invention.
両図において、薄く細長い接地電極9の外側に
は誘電体層11が形成され、誘電体層11の外周
にはこの誘電体層11を偏平なボビンとして幅W
の導体条13がピツチPで単層ソレノイド状に形
成され、誘電体層11を介して接地電極9と対向
している。 In both figures, a dielectric layer 11 is formed on the outside of the thin and elongated ground electrode 9, and the dielectric layer 11 is formed into a flat bobbin on the outer periphery of the dielectric layer 11 with a width W.
A conductor strip 13 is formed in the shape of a single layer solenoid with a pitch P, and faces the ground electrode 9 with a dielectric layer 11 in between.
導体条13には一定の間隔で一方の側面から複
数のL字形の切込み15が各々同方向に形成され
ている。換言すれば、幅Wより狭い幅W′の導線
路17の側面から方形の電極19が狭作部21を
介して延設されている。 A plurality of L-shaped cuts 15 are formed from one side of the conductor strip 13 at regular intervals in the same direction. In other words, the rectangular electrode 19 extends from the side surface of the conductive path 17 having a width W' narrower than the width W via the narrow section 21.
このように複数の切込み15を有する導体条1
3は、高周波電流が専ら導線路17を流れてこの
導線路17がインダクタンス分を有する導体とし
て機能する一方、各電極19は接地電極9との間
で後述する容量補償電極として機能する。 The conductor strip 1 having a plurality of cuts 15 in this way
3, the high-frequency current flows exclusively through the conductive line 17, and this conductive line 17 functions as a conductor having an inductance, while each electrode 19 functions as a capacitance compensation electrode, which will be described later, between it and the ground electrode 9.
そして、導体条13が単層ソレノイド状に形成
されているから導線路17も同様に単層ソレノイ
ド状に形成され、接地電極9と対向するインダク
タンス素子23が構成されて分布定型の電磁遅延
線となつている。 Since the conductor strip 13 is formed in the shape of a single-layer solenoid, the conductor line 17 is also formed in the shape of a single-layer solenoid, and the inductance element 23 facing the ground electrode 9 is configured to form a distributed electromagnetic delay line. It's summery.
このような電磁遅延線は、例えば導体条13の
幅Wを従来例の導線路5と同じにして切込み15
によつて電極19を形成するとともに導体条13
より細い幅W′の導線路17を形成すると、導線
路17の単位長さ当たりのインダクタンス分が増
大する。 Such an electromagnetic delay line is constructed by, for example, making the width W of the conductor strip 13 the same as that of the conventional conductor strip 5 and making the cut 15.
The electrode 19 is formed by the conductor strip 13.
When the conducting line 17 is formed to have a narrower width W', the inductance per unit length of the conducting line 17 increases.
しかも、導線路17にはこれから延設された電
極19があるから、導線路17自体の静電容量は
小さいが、電極19による容量分が付加されて容
量が補償された状態となり、導線路17の単位長
さ当たりの遅延時間が増大する。すなわち、電極
19は容量補償電極として機能する。 Moreover, since the conductive line 17 has an electrode 19 extending from it, the capacitance of the conductive line 17 itself is small, but the capacitance due to the electrode 19 is added and the capacitance is compensated, and the conductive line 17 The delay time per unit length increases. That is, the electrode 19 functions as a capacitance compensation electrode.
なお、導線路17の特性インピーダンスZoは、
上述したようにZo=√で決まるから高く
なる。 Note that the characteristic impedance Zo of the conducting line 17 is
As mentioned above, it is determined by Zo=√, so it will be high.
そのため、導線路17のピツチPおよび間隔T
を従来の寸法に保つたままでも、そのインダクタ
ンス分と静電容量の両方とも大きくすることが容
易で、遅延時間が増大して特性が向上するし、小
型化も可能である。 Therefore, the pitch P and the interval T of the conductor line 17 are
It is easy to increase both the inductance and capacitance while keeping the conventional dimensions, increasing the delay time, improving the characteristics, and making it possible to reduce the size.
もちろん、例えば導体条13の幅Wを大きくす
る等して、導線路17で不足する静電容量以上の
容量を容量補償電極19で補償することも可能で
あり、この場合にはより大きな遅延時間が得られ
る。 Of course, it is also possible, for example, to increase the width W of the conductor strip 13 to compensate for the capacitance that is more than the insufficient capacitance in the conductor line 17 with the capacitance compensation electrode 19, and in this case, a larger delay time can be used. is obtained.
この点、従来例では導線路5のインダクタンス
分と静電容量の両方がその幅Wに関係していたの
で、電磁遅延線の設計時における寸法選択の自由
度が低かつた。しかし、本発明では、導線路17
の幅W′とこの導線路17を形成する導体条13
の幅Wを独立して選択できるので、設計の自由度
が大きくなる。 In this regard, in the conventional example, both the inductance and the capacitance of the conducting line 5 were related to its width W, so there was a low degree of freedom in selecting dimensions when designing the electromagnetic delay line. However, in the present invention, the conducting line 17
width W' and the conductor strip 13 forming this conductor line 17.
Since the width W can be selected independently, the degree of freedom in design is increased.
次に本発明の他の実施例を示す。第3図および
第4図は本発明の他の実施例を示す正面図および
その断面図である。 Next, other embodiments of the present invention will be shown. FIGS. 3 and 4 are a front view and a sectional view showing another embodiment of the present invention.
接地電極25を挟んで薄い2枚の誘電体板27
a,27bを重ねた3層のプリント基体29の上
面には、複数の細長い単位導体(以下上面側単位
導体とする)31がピツチPで平行に形成されて
いる。なお、プリント基体29は実施例の説明に
最低限必要な部分を示している。 Two thin dielectric plates 27 sandwiching the ground electrode 25
A plurality of elongated unit conductors (hereinafter referred to as upper surface side unit conductors) 31 are formed in parallel at a pitch P on the upper surface of the three-layer printed substrate 29 in which layers a and 27b are stacked. Note that the printed substrate 29 shows the minimum necessary part for explaining the embodiment.
各上面側単位導体31の一方の端部(図中上
側)は第1の接続部31aとなつており、各上面
側単位導体31の他方の端部(図中下側)は第2
の接続部31bとなつている。 One end of each upper unit conductor 31 (upper side in the figure) is a first connection part 31a, and the other end of each upper unit conductor 31 (lower side in the figure) is a second connection part 31a.
The connecting portion 31b is connected to the connecting portion 31b.
この各上面側単位導体31には、第1の接続部
31aの付近の側面からL字形の切込み33が形
成されており、この切込み33の先端は第2の接
続部31bの近傍まで延び、各上面側単位導体3
1において上述した第1図の導線路17と同じ機
能の導線路35がこの1個の切込み33にて形成
されるとともに、容量補償電極36が導線路35
の第2の接続部31bから延設された状態となつ
ている。 In each of the upper unit conductors 31, an L-shaped notch 33 is formed from the side surface near the first connecting portion 31a, and the tip of this notch 33 extends to the vicinity of the second connecting portion 31b. Top side unit conductor 3
1, a conductive line 35 having the same function as the conductive line 17 shown in FIG.
It is extended from the second connecting portion 31b.
プリント基体29の下面には、上面側単位導体
31と同様な幅の複数の単位導体(下面側単位導
体とする)37が、上面側単位導体31の第1の
接続部31aと、隣合う上面側単位導体31の第
2の接続部31bの間とを結ぶように、すなわち
上面側単位導体31に対して斜めに形成されてい
る。なお、詳細な図示はしないが、下面側単位導
体37にも上面側単位導体31と同様に容量補償
電極が形成されている。 On the lower surface of the printed circuit board 29, a plurality of unit conductors (referred to as lower surface unit conductors) 37 having the same width as the upper surface side unit conductor 31 are connected to the first connecting portion 31a of the upper surface side unit conductor 31 and the adjacent upper surface. It is formed obliquely with respect to the upper surface side unit conductor 31 so as to connect between the second connecting portions 31b of the side unit conductor 31. Although not shown in detail, a capacitance compensation electrode is formed on the lower unit conductor 37 as well as on the upper unit conductor 31.
下面側単位導体37の一方の端部(図中上側)
は、第1の接続部37aとなつて上面側単位導体
31の第1の接続部31aと重なるように対向し
ており、下面側単位導体37の他方の端部(図中
下側)は、第1の接続部37aと同様の第2の接
続部37bとなつて上面側単位導体31の第2の
接続部31bと重なるように対向している。 One end of the lower unit conductor 37 (upper side in the figure)
serves as a first connecting portion 37a and faces so as to overlap with the first connecting portion 31a of the upper unit conductor 31, and the other end (lower side in the figure) of the lower unit conductor 37 is A second connection portion 37b similar to the first connection portion 37a faces and overlaps with the second connection portion 31b of the upper unit conductor 31.
プリント基体29には、第4図に示すように、
各上面側単位導体31の第1の接続部31aと下
面側単位導体37の第1の接続部37aおよび、
上面側単位導体31の第2の接続部31bと下面
側単位導体37の第2の接続部37bを貫通する
ようにスルーホール39が各々形成されている。
各スルーホール39には、対向する第1の接続部
31aと37a、第2の接続部31bと37bが
スルーホールメツキ部41で接続されている。 The printed substrate 29 has, as shown in FIG.
A first connecting portion 31a of each upper unit conductor 31 and a first connecting portion 37a of each lower unit conductor 37,
Through holes 39 are formed so as to penetrate through the second connecting portion 31b of the upper unit conductor 31 and the second connecting portion 37b of the lower unit conductor 37, respectively.
Each through-hole 39 is connected to opposing first connecting portions 31a and 37a and second connecting portions 31b and 37b through a through-hole plating portion 41.
そのため、プリント基板29には、上面側単位
導体31と下面側単位導体37が交互に直列接続
されて単層ソレノド状のインダクタンス素子43
が形成れており、このインダクタンス素子43が
誘電体板27a,27bを介して接地電極25と
対向して分布定数型の電磁遅延線が構成されてい
る。 Therefore, the printed circuit board 29 has a single-layer solenoid-shaped inductance element 43 in which the upper unit conductors 31 and the lower unit conductors 37 are alternately connected in series.
The inductance element 43 faces the ground electrode 25 via the dielectric plates 27a and 27b to form a distributed constant electromagnetic delay line.
なお、接地電極25はスルーホールメツキ部4
1に接触しないように形成されている。 Note that the ground electrode 25 is connected to the through-hole plated portion 4.
It is formed so that it does not come into contact with 1.
ところで、本発明の電磁遅延線における容量補
償電極の形成手法は、上述したものに限定され
ず、任意である。 By the way, the method of forming the capacitive compensation electrode in the electromagnetic delay line of the present invention is not limited to the above-mentioned method, and may be any method.
例えば、図示はしないが、第1図の実施例にお
いてL字形の切込み15の代わりに直線状の切込
みを形成しても本発明の目的達成が可能である
が、導線路17のインダクタンス分をある程度確
保するには、直線状の切込みの形成間隔を狭める
等することが好ましい。 For example, although not shown, it is possible to achieve the object of the present invention by forming a straight cut in place of the L-shaped cut 15 in the embodiment shown in FIG. To ensure this, it is preferable to narrow the interval between the linear cuts.
そして、導線路17のインダクタンス分をある
程度以上に増大させる一方、容量補償電極のイン
ダクタンス分を抑えるには、第5図に示すよう
に、T字形の切込み45を複数設けて容量補償電
極47を形成し、狭作部を介して容量補償電極を
形成した方がより好ましい効果が得られると考え
られる。 In order to increase the inductance of the conductive line 17 beyond a certain level while suppressing the inductance of the capacitive compensation electrode, as shown in FIG. However, it is considered that a more favorable effect can be obtained by forming the capacitance compensation electrode through the narrow part.
さらに、容量補償電極は導線路の片側に形成す
る場合に限定されない。第6図のように、導体条
13の両側から交互にL字形および直線状の切込
み15,49を形成して導線路51および容量補
償電極53を構成してもよい。この場合には、導
線路51の長さも長くなつてそのインダクタンス
分がより増大する。 Furthermore, the capacitance compensation electrode is not limited to being formed on one side of the conductive line. As shown in FIG. 6, L-shaped and linear cuts 15 and 49 may be formed alternately from both sides of the conductor strip 13 to form the conductive line 51 and the capacitive compensation electrode 53. In this case, the length of the conducting line 51 also becomes longer, and its inductance increases further.
また、上述した各実施例では、導体条13や上
面側単位導体31から切込み15,33,45,
49によつて容量補償電極19,36,53を形
成する例を示したが、本発明では導線路から延設
された容量補償電極が形成されていればよく、そ
の形成手法は任意である。本発明の導線路とは、
実質的に高周波電流の流れる部分を言う。 Further, in each of the embodiments described above, the cuts 15, 33, 45,
Although an example has been shown in which the capacitance compensation electrodes 19, 36, and 53 are formed using the capacitance compensation electrodes 19, 36, and 53, in the present invention, it is sufficient that the capacitance compensation electrodes are formed extending from the conductive line, and any method of forming the capacitance compensation electrodes may be used. What is the conductive line of the present invention?
This refers to the part where high-frequency current flows.
そして、インダクタンス素子にあつても、上述
した第1図の実施例の如く、導線路17が対向す
る2面を交互に通つて単層ソレノイド状に形成さ
れる場合以外に、導線路が実質的に単層ソレノイ
ド状に形成されかつ誘電体層を介して接地電極に
対向するものであればよい。 Even in the case of an inductance element, the conductive line 17 is not substantially formed in a single-layer solenoid shape by passing alternately through two opposing surfaces as in the embodiment shown in FIG. Any type of solenoid may be used as long as it is formed in the shape of a single-layer solenoid and faces the ground electrode with a dielectric layer interposed therebetween.
以上説明したように本発明の電磁遅延線は、イ
ンダクタンス素子の導線路の複数個所から容量補
償電極を延設したので、導線路の幅を狭くしてイ
ンダクタンス分を増大させかつ静電容量を補償す
ることが容易となり、インダクタンス素子のピツ
チPおよび間隔Tの寸法を小さくすることなく、
遅延時間の増大および小型化を図ることができる
し、良好な特性が得られる。
As explained above, in the electromagnetic delay line of the present invention, capacitance compensation electrodes are extended from multiple locations on the conductive path of the inductance element, so the width of the conductive path is narrowed to increase the inductance and compensate for the capacitance. without reducing the pitch P and interval T of the inductance element.
The delay time can be increased and the size can be reduced, and good characteristics can be obtained.
第1図および第2図は本発明の電磁遅延線の一
実施例を示す部分正面図およびその側面図、第3
図および第4図は本発明の電磁遅延線の他の実施
例を示す正面図および第3図中Y−Y間の断面
図、第5図および第6図は本発明の電磁遅延線に
おける容量補償電極の他の例を示す図、第7図お
よび第8図は従来の電磁遅延線を示す部分正面図
である。
1,9,25……接地電極、3,11……誘電
体層、5,17,35,51……導線路、7,2
3,43……インダクタンス素子、13……導体
条、15,33,45,49……切込み、19,
36,47,53……容量補償電極、27a,2
7b……誘電体層(誘電体板)、29……プリン
ト基板、31……上面側単位導体、37……下面
側単位導体。
1 and 2 are a partial front view and a side view of an embodiment of the electromagnetic delay line of the present invention, and FIG.
4 and 4 are front views showing other embodiments of the electromagnetic delay line of the present invention, and sectional views taken along Y-Y in FIG. Figures 7 and 8 showing other examples of compensation electrodes are partial front views showing conventional electromagnetic delay lines. 1, 9, 25... Ground electrode, 3, 11... Dielectric layer, 5, 17, 35, 51... Conductive line, 7, 2
3, 43... Inductance element, 13... Conductor strip, 15, 33, 45, 49... Notch, 19,
36, 47, 53...capacitance compensation electrode, 27a, 2
7b... Dielectric layer (dielectric plate), 29... Printed circuit board, 31... Upper surface side unit conductor, 37... Lower surface side unit conductor.
Claims (1)
てインダクタンス素子を構成し、前記導線路に誘
導体層を介して接地電極を対向させてなる分布定
数型の電磁遅延線において、 前記導線路の複数個所から容量補償電極が前記
接地電極に対向して延設されてなることを特徴と
する電磁遅延線。[Claims] 1. A distributed constant electromagnetic delay line in which a conductive line is formed substantially in the shape of a single-layer solenoid to constitute an inductance element, and a ground electrode is opposed to the conductive line via a dielectric layer. An electromagnetic delay line, characterized in that capacitance compensation electrodes are extended from a plurality of locations of the conductive path to face the ground electrode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13975385A JPS62114A (en) | 1985-06-26 | 1985-06-26 | Electromagnetic delay line |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13975385A JPS62114A (en) | 1985-06-26 | 1985-06-26 | Electromagnetic delay line |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62114A JPS62114A (en) | 1987-01-06 |
| JPH0476526B2 true JPH0476526B2 (en) | 1992-12-03 |
Family
ID=15252585
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13975385A Granted JPS62114A (en) | 1985-06-26 | 1985-06-26 | Electromagnetic delay line |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62114A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02112016U (en) * | 1989-02-22 | 1990-09-07 |
-
1985
- 1985-06-26 JP JP13975385A patent/JPS62114A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62114A (en) | 1987-01-06 |
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