JPH0477322A - Glass blank for optical element manufacturing - Google Patents
Glass blank for optical element manufacturingInfo
- Publication number
- JPH0477322A JPH0477322A JP18714890A JP18714890A JPH0477322A JP H0477322 A JPH0477322 A JP H0477322A JP 18714890 A JP18714890 A JP 18714890A JP 18714890 A JP18714890 A JP 18714890A JP H0477322 A JPH0477322 A JP H0477322A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- blank
- coating
- glass blank
- molding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B40/00—Preventing adhesion between glass and glass or between glass and the means used to shape it, hold it or support it
- C03B40/02—Preventing adhesion between glass and glass or between glass and the means used to shape it, hold it or support it by lubrication; Use of materials as release or lubricating compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明はレンズ等の光学素子のプレス成形において成形
用素材として用いられるガラスブランクに関し、特にプ
レス時の型部材との反応を防止し且つ密着力及び摩擦力
を低下させ冷却過程でのワレ発生を防止して良好な光学
素子を得るためのガラスブランクに関する。Detailed Description of the Invention [Industrial Application Field] The present invention relates to a glass blank used as a molding material in press molding of optical elements such as lenses, and in particular, to a glass blank that prevents reaction with mold members during pressing and has a material that adheres tightly. The present invention relates to a glass blank for obtaining good optical elements by reducing force and frictional force and preventing cracking during the cooling process.
[従来の技術及び発明が解決しようとする課題〕従来、
ガラスのリヒートプレスにおいて良好な成形品を得るた
めには、成形用素材ガラスと成形用型部材との間の融着
を防止することが大きな課題であった。このため、従来
、型部材を改良する各種の技術が提案されており、また
近年では更に上記融着防止のため、成形用素材の改良が
提案されはじめている。この様な成形用素材の改良に関
する提案としては、例えば、特公平2−1778号公報
、特公平2−1779号公報、特公平2−1780号公
報及び特公昭61−29890号公報に、ガラス基体の
表面に該ガラス基体よりもガラス転移点温度の高いガラ
スの被覆、酸化ケイ素被覆または炭素被覆を付与するこ
とが開示されている。また、特開平1−264937号
公報には、ガラス基体の表面に有機物の薄層を配置する
ことが開示されている。[Prior art and problems to be solved by the invention] Conventionally,
In order to obtain a good molded product in glass reheat pressing, it has been a major issue to prevent fusion between the molding material glass and the molding die member. For this reason, various techniques for improving mold members have been proposed in the past, and in recent years, improvements in molding materials have begun to be proposed in order to further prevent the above-mentioned fusion. Proposals for improving such molding materials include, for example, Japanese Patent Publication No. 2-1778, Japanese Patent Publication No. 2-1779, Japanese Patent Publication No. 2-1780, and Japanese Patent Publication No. 61-29890. It is disclosed that a coating of glass having a glass transition temperature higher than that of the glass substrate, a silicon oxide coating, or a carbon coating is applied to the surface of the glass substrate. Further, Japanese Patent Application Laid-Open No. 1-264937 discloses disposing a thin layer of an organic material on the surface of a glass substrate.
以上の様な改良により、型部材との融着防止の効果はあ
るが、しかし上記公報に開示の方法には、以下の様な問
題点がある。Although the above-mentioned improvements have the effect of preventing fusion with the mold member, the method disclosed in the above-mentioned publication has the following problems.
(イ)ガラス基体の表面に該ガラス基体よりもガラス転
移点温度の高いガラスの被覆を付与した場合には、プレ
ス圧で被覆ガラス層がヒビワレを生じここから基体ガラ
スかにじみ出て表面に部分的なくもりが発生したり部分
的に型部材との融着を生じたり、あるいは冷却過程でガ
ラスブランクと型部材との摩擦力が大きくなりガラスに
ワレが発生することがある。(b) When a glass coating with a glass transition temperature higher than that of the glass substrate is applied to the surface of the glass substrate, the coating glass layer cracks due to the press pressure and oozes into the substrate glass, causing partial damage to the surface. Clouding may occur, partial fusion may occur with the mold member, or the frictional force between the glass blank and the mold member may increase during the cooling process, causing cracks in the glass.
(ロ)ガラス基体の表面に酸化ケイ素被覆を付与した場
合には、上記(イ)と同様であり、特に酸化ケイ素は型
部材とのなじみがよいために冷却過程でワレが発生しや
すく、また酸化ケイ素は熱膨張係数がガラス基体を構成
する通常の光学ガラスに比べて著しく低いために加熱時
に被覆がヒビワレを生じやすい。(b) When a silicon oxide coating is applied to the surface of the glass substrate, the same problem as in (a) above occurs; in particular, silicon oxide is easy to crack during the cooling process because it blends well with mold members; Silicon oxide has a thermal expansion coefficient significantly lower than that of ordinary optical glass constituting the glass substrate, so the coating tends to crack when heated.
(ハ)ガラス基体の表面に炭素被覆を必要以上に厚く付
与した場合には、炭素は還元剤であるためにガラス中の
酸素とも反応してガラス成分を還元し、ガラスを茶色に
着色させる。特に、ガラス基体として鉛含有ガラスを用
いる場合には、該ガラス中のPbOが還元されて、着色
が著しく、透過率が低下する。(c) When a carbon coating is applied to the surface of a glass substrate to be thicker than necessary, since carbon is a reducing agent, it also reacts with oxygen in the glass to reduce the glass components and color the glass brown. In particular, when a lead-containing glass is used as the glass substrate, PbO in the glass is reduced, resulting in significant coloring and a decrease in transmittance.
(ニ)ガラス基体の表面に有機物薄層を配置する場合に
は、該有機物薄層が加熱時に分解し、場合によっては腐
食性のガス(例えば、塩素ガスやフッ素ガス)を発生し
て、プレス成形装置を汚染し型部材を含む装置の耐久性
を損ないやすいという問題がある。また、上記分解は部
分的にランダムに発生するため、表面精度が低下するこ
とがある。(d) When a thin organic layer is placed on the surface of a glass substrate, the thin organic layer decomposes during heating and may generate corrosive gas (e.g. chlorine gas or fluorine gas), causing There is a problem in that it tends to contaminate the molding equipment and impair the durability of the equipment including the mold member. Furthermore, since the above-mentioned decomposition occurs locally and randomly, the surface precision may deteriorate.
そこで、本発明は、上記従来技術の問題点に鑑みて、ガ
ラスブランクと型部材との反応を防止して成形品の(も
りを防止することに加えて、成形品と型部材との融着を
阻止するとともに、ワレ及び着色を防止することを目的
とするものである。Therefore, in view of the above-mentioned problems of the prior art, the present invention aims to prevent the reaction between the glass blank and the mold member to prevent the molded product from forming, and also to prevent the fusion between the molded product and the mold member. The purpose is to prevent cracking and discoloration.
[課題を解決するための手段]
本発明によれば、上記目的を達成するものとして、
プレス成形により光学素子を製造する際に成形用素材と
して用いられるガラスブランクであって、ガラス基体の
少なくとも光学機能面が形成される表面に反応防止被覆
及び炭化水素被覆がこの順に付されていることを特徴と
する、光学素子製造用ガラスブランク、
が提供される。[Means for Solving the Problems] According to the present invention, the above object is achieved by providing a glass blank used as a molding material when manufacturing an optical element by press molding, which comprises at least an optical fiber of a glass substrate. Provided is a glass blank for manufacturing an optical element, characterized in that a reaction prevention coating and a hydrocarbon coating are applied in this order to the surface on which a functional surface is formed.
ここで、上記反応防止被覆は、成形温度において、ガラ
スブランクと型部材とが反応してガラスブランクがくも
る現象を防止するために、ガラスブランクよりも融点の
高い物質が有効であり、例えばAlx 03.5iOa
、MgFzまたは蒸着用ガラスである。また、上記反
応防止被覆の厚さは、成形温度においてガラス成分が反
応防止被覆層を拡散して型部材表面に達しない膜厚を下
限とし、成形時にクラックの発生しない膜厚を上限し、
例えば100〜500人である。Here, in order to prevent the glass blank from reacting with the mold member at the molding temperature and causing the glass blank to become cloudy, the reaction prevention coating is preferably made of a substance having a higher melting point than the glass blank, such as Alx 03. .5iOa
, MgFz or vapor deposition glass. In addition, the thickness of the reaction prevention coating has a lower limit of the thickness at which the glass component does not diffuse through the reaction prevention coating layer and reaches the surface of the mold member at the molding temperature, and an upper limit of the thickness at which no cracks occur during molding.
For example, 100 to 500 people.
また、上記炭化水素被覆は、極く微量の反応ガス層を型
部材とガラスブランクとの界面に形成することにより、
型部材とガラスブランクとの密着力を低下させ、融着及
びワレを防止するものである。この目的のために、炭化
水素被覆層の厚さは、例えば10〜50人である。該炭
化水素被覆層の厚さが薄すぎると十分な密着力低下効果
が得られず、また該炭化水素被覆層の厚さが厚すぎると
成形品の着色が著しくなり透過率低下を生ずる。このた
め、厚さを厚くしすぎると、成形後にガラスブランクの
表面に残存する炭化水素膜及び炭化水素膜とガラスとの
反応物を、後工程例えばアニール処理工程により、除去
することが必要となる。In addition, the above-mentioned hydrocarbon coating is achieved by forming an extremely small amount of reactive gas layer at the interface between the mold member and the glass blank.
This reduces the adhesion between the mold member and the glass blank to prevent fusion and cracking. For this purpose, the thickness of the hydrocarbon coating layer is, for example, from 10 to 50 mm. If the thickness of the hydrocarbon coating layer is too thin, a sufficient effect of reducing adhesion cannot be obtained, and if the thickness of the hydrocarbon coating layer is too thick, the molded article will be significantly colored and the transmittance will be lowered. Therefore, if the thickness is made too thick, it becomes necessary to remove the hydrocarbon film remaining on the surface of the glass blank after molding and the reaction product between the hydrocarbon film and the glass in a post-process, such as an annealing process. .
炭化水素被覆層は、炭素被覆層に比較して、同一膜厚で
は膜中にCH2が多量に含まれているため、ガラスブラ
ンクの透過率をあまり低下させることがなく、しかも融
着及びワレを防止する効果は極薄層(10〜50人厚)
でも十分である。Compared to a carbon coating layer, a hydrocarbon coating layer contains a large amount of CH2 at the same thickness, so it does not significantly reduce the transmittance of the glass blank, and it also prevents fusion and cracking. The prevention effect is an extremely thin layer (10 to 50 people thick)
But it's enough.
また、炭化水素被覆層を形成する方法は、炭化水素ガス
の高周波放電処理、イオンガン処理あるいは直流放電処
理等の、ガラスブランクに対してつき回りの良好な方法
を用いることができ、且つ上記方法は低コストの処理方
法であるという利点がある。Further, as a method for forming the hydrocarbon coating layer, a method that has good coverage for the glass blank, such as high frequency discharge treatment of hydrocarbon gas, ion gun treatment, or direct current discharge treatment, can be used; It has the advantage of being a low-cost treatment method.
[実施例]
以下、図面を参照しながら本発明の具体的実施例を説明
する。[Example] Hereinafter, specific examples of the present invention will be described with reference to the drawings.
第1図は本発明によるガラスブランクの一実施例を示す
断面図である。本実施例は、光学素子が両凸レンズであ
る例を示す。FIG. 1 is a sectional view showing an embodiment of a glass blank according to the present invention. This example shows an example in which the optical element is a biconvex lens.
第1図において、2はプレス成形の素材たるガラス基体
である。該ガラス基体としては、所望の光学的特性のレ
ンズを得るために必要な屈折率値及び分散値をもつ光学
ガラスを用いる。上記ガラス基体2は目的とするレンズ
形状に近似の形状及び寸法に仕上げられている。In FIG. 1, numeral 2 denotes a glass substrate which is a material for press molding. As the glass substrate, an optical glass having a refractive index value and dispersion value necessary to obtain a lens with desired optical characteristics is used. The glass substrate 2 is finished to have a shape and dimensions that approximate the shape of the intended lens.
ガラス基体2の光学機能面が形成される表面(上下両面
)には、反応防止被覆3及び炭化水素被覆4がこの順に
付されている。A reaction prevention coating 3 and a hydrocarbon coating 4 are applied in this order to the surfaces (upper and lower surfaces) of the glass substrate 2 on which the optically functional surfaces are formed.
上記反応防止被覆3としては、例えばAt。As the reaction prevention coating 3, for example, At.
Os 、5ins 、MgFaまたは蒸着用ガラスを用
いることができる。該反応防止被覆3の厚さは、例えば
100〜500人である。該反応防止被覆3は、真空蒸
着等の薄膜堆積技術を用いて形成することができる。Os, 5ins, MgFa or vapor deposition glass can be used. The thickness of the anti-reaction coating 3 is, for example, 100 to 500 mm. The anti-reaction coating 3 can be formed using thin film deposition techniques such as vacuum evaporation.
上記炭化水素被覆の厚さは、例えば10〜50人、好ま
しくは15〜35人である。該炭化水素被覆の厚さは薄
すぎると効果が十分でなく、また厚すぎると成形品の透
過率低下が著しくなり、アニール工程が必要になる。該
炭化水素被覆4は、プラズマ処理やイオンガン処理等の
簡単な薄膜堆積技術を用いて形成することができる。該
炭化水素被覆4における炭素:水素の原子比は、例えば
10/6〜1010.5であり、特に1o15〜10/
1が好ましい。The thickness of the hydrocarbon coating is, for example, 10-50, preferably 15-35. If the thickness of the hydrocarbon coating is too thin, the effect will not be sufficient, and if it is too thick, the transmittance of the molded article will be significantly reduced and an annealing step will be required. The hydrocarbon coating 4 can be formed using simple thin film deposition techniques such as plasma treatment or ion gun treatment. The carbon:hydrogen atomic ratio in the hydrocarbon coating 4 is, for example, 10/6 to 1010.5, particularly 10/15 to 10/10/1.
1 is preferred.
第2図は上記実施例のガラスブランクの製造に用いられ
る薄膜堆積装置の概略構成を示す模式図である。以下、
本図を参照しながらブランク製造の例を説明する。FIG. 2 is a schematic diagram showing the general configuration of a thin film deposition apparatus used for manufacturing the glass blank of the above embodiment. below,
An example of blank manufacturing will be explained with reference to this figure.
第2図において、12は真空槽であり、14は該真空槽
に形成されている排気口である。該排気口は不図示の真
空排気源に接続されている。16は上記真空槽12内へ
ガスを導入するためのガス導入口である。該ガス導入口
は不図示のガス源に接続されている。In FIG. 2, 12 is a vacuum chamber, and 14 is an exhaust port formed in the vacuum chamber. The exhaust port is connected to a vacuum exhaust source (not shown). 16 is a gas introduction port for introducing gas into the vacuum chamber 12. The gas inlet is connected to a gas source (not shown).
上記真空槽重2内には、下部に蒸発源18及びシャッタ
20が配置されており、上部にガラス基体保持のための
ドーム状ホルダ22、ガラス基体を加熱するためのヒー
タ24及び被覆厚測定のための水晶膜厚モニタ26が配
置されている。28は高周波印加用アンテナである。尚
、30は上記ホルダ22に保持されているガラス基体で
ある。In the vacuum chamber 2, an evaporation source 18 and a shutter 20 are arranged at the bottom, and a dome-shaped holder 22 for holding the glass substrate, a heater 24 for heating the glass substrate, and a coating thickness measuring device are arranged at the top. A crystal film thickness monitor 26 is arranged for this purpose. 28 is a high frequency application antenna. Note that 30 is a glass substrate held by the holder 22.
上記ガラス基体30 (2)の表面に反応防止被覆3及
び炭化水素被覆4をこの順に付する際には、上記排気口
14から排気を行い、真空槽12内を減圧した後に、蒸
発源18から反応防止被覆形成材料を蒸発させ、次いで
ガス導入口16から炭化水素ガスを例えば5X10−”
〜5X10−’Torrとなるまで導入し、高周波印加
用アンテナ28に例えば100〜500Wの高周波を印
加して、炭化水素プラズマを形成する。When applying the anti-reaction coating 3 and the hydrocarbon coating 4 to the surface of the glass substrate 30 (2) in this order, exhaust the air from the exhaust port 14 to reduce the pressure inside the vacuum chamber 12, and then remove the evaporation source 18 from the evaporation source 18. The anti-reaction coating forming material is evaporated, and then hydrocarbon gas is introduced from the gas inlet 16, for example, 5×10-”
A high frequency of 100 to 500 W, for example, is applied to the high frequency application antenna 28 to form hydrocarbon plasma.
真空槽12内に導入される炭化水素ガスとしては、例え
ばメタン、エタン、プロパン、エチレン、プロピレン、
アセチレンなどが例示できる。Examples of the hydrocarbon gas introduced into the vacuum chamber 12 include methane, ethane, propane, ethylene, propylene,
Examples include acetylene.
炭化水素被覆4における炭素:水素の原子比は堆積条件
によって変化するので、所望の原子比が得られる様に条
件を設定する。Since the carbon:hydrogen atomic ratio in the hydrocarbon coating 4 changes depending on the deposition conditions, the conditions are set so as to obtain the desired atomic ratio.
次に、以上の様な装!を用いて上記実施例のガラスブラ
ンクを製造した実例を説明する。Next, wear something like the above! An example in which the glass blank of the above example was manufactured using the following will be described.
フリント系光学ガラス(SF8)を所定の形状に研摩仕
上げしてなるガラス基体30を洗浄し、ホルダ22にセ
ットした。ヒータ24で300℃に加熱し、真空槽12
内の真空度がlXl0””Torr以下になるまで排気
口14から排気した後、ガス導入016からArガスを
5X10−’Torrになるまで導入した。そして、高
周波印加用アンテナ28に300Wの高周波を印加して
、高周波放電を行い、ガラス基体30のプラズマクリー
ニングを行った。その後、Arガスの導入を停止し、l
Xl0−’Torrの真空度に戻して、蒸発源18から
蒸着用ガラスを蒸発させ、約300入庫の反応防止被覆
(蒸着用ガラス層)3を形成した。次に、蒸発源18か
らの蒸発を停止させ、ガス導入口16からCH,ガスを
lXl0−”Torrになるまで導入した。そして、高
周波印加用アンテナ28に400Wの高周波を印加して
高周波放電を行い、約30入庫の炭化水素被覆4を形成
した。尚、上記炭化水素被覆4における炭素:水素の原
子比は、赤外分光分析による測定の結果、約10/2で
あった。A glass substrate 30 made of flint-based optical glass (SF8) polished into a predetermined shape was cleaned and set in the holder 22. Heating to 300°C with heater 24, vacuum chamber 12
After evacuating through the exhaust port 14 until the degree of vacuum inside became 1X10"" Torr or less, Ar gas was introduced from the gas introduction 016 until the vacuum level reached 5X10-'Torr. Then, a high frequency of 300 W was applied to the high frequency application antenna 28 to generate high frequency discharge, and plasma cleaning of the glass substrate 30 was performed. After that, the introduction of Ar gas was stopped, and l
The vacuum level was returned to Xl0-'Torr, and the glass for deposition was evaporated from the evaporation source 18 to form a reaction prevention coating (glass layer for deposition) 3 of about 300 ml. Next, evaporation from the evaporation source 18 was stopped, and CH and gas were introduced from the gas inlet 16 until the temperature reached lXl0-''Torr. Then, a high frequency of 400 W was applied to the high frequency application antenna 28 to generate high frequency discharge. The atomic ratio of carbon to hydrogen in the hydrocarbon coating 4 was approximately 10/2 as measured by infrared spectroscopy.
第3図は以上の様にして得られたガラスブランクを用い
てプレス成形が実施される装置の一例を示す断面図であ
る。FIG. 3 is a sectional view showing an example of an apparatus in which press molding is performed using the glass blank obtained as described above.
第3図において、32は真空槽本体であり、34はその
蓋である。36,38.40はそれぞれレンズをプレス
成形するための上型部材、下型部材及び胴型部材である
。42は型ホルダであり、44は上型部材押えである。In FIG. 3, 32 is the vacuum chamber body, and 34 is its lid. Reference numerals 36, 38, and 40 are an upper mold member, a lower mold member, and a body mold member for press-molding lenses, respectively. 42 is a mold holder, and 44 is an upper mold member presser.
46はヒータであり、48は上言己下型部材を突き上げ
るための突き上げ棒であり、50は該突き上げ棒を作動
させるシリンダである。52は真空排気ポンプであり、
54.56,58.60はバルブであり、62は窒素ガ
ス等の非酸化性ガス導入のためのパイプであり、64は
リークパイプであり、66はバルブである。68は温度
センサであり、70は水冷バイブである。72は真空槽
支持部材である。46 is a heater, 48 is a push-up rod for pushing up the lower mold member, and 50 is a cylinder for operating the push-up rod. 52 is a vacuum pump;
54, 56, 58, 60 are valves, 62 is a pipe for introducing non-oxidizing gas such as nitrogen gas, 64 is a leak pipe, and 66 is a valve. 68 is a temperature sensor, and 70 is a water-cooled vibrator. 72 is a vacuum chamber support member.
上記上型部材36、下型部材38及び胴型部材40とし
ては、例えば、超硬合金、S l * N4+SiC,
サイアロン、サーメット、Alz Os 。The upper mold member 36, the lower mold member 38, and the body mold member 40 are made of, for example, cemented carbide, S l * N4+SiC,
Sialon, Cermet, Alz Os.
Zr0z 、Cry Ox等からなる母材に必要に応じ
て表面にSix N4 、TiN、TaN、BN。Six N4, TiN, TaN, BN is applied to the surface of the base material made of Zr0z, Cry Ox, etc. as necessary.
AIN、SiC,TaC,WC+ 白金合金等のコーテ
ィングを施したものを用いることができる。A material coated with AIN, SiC, TaC, WC+platinum alloy, etc. can be used.
次に、以上の様な装置において上記実施例のガラスブラ
ンクを用いてプレス成形した実例を説明する。Next, an example in which the glass blank of the above embodiment was press-molded using the above-described apparatus will be described.
上型部材36及び下型部材38として5ixN4製のも
のを用い、これら型部材の光学機能面形成のための表面
を面精度ニュートン3本以内且つ中心線平均表面粗さ0
.02μm以内とした。The upper mold member 36 and the lower mold member 38 are made of 5ixN4, and the surfaces of these mold members for forming optical functional surfaces have a surface accuracy of 3 newtons or less and a center line average surface roughness of 0.
.. It was set within 0.02 μm.
型内にガラスブランクを配置し、真空槽内な1XIO−
”Torr以下になるまで排気し、次いで真空槽内に窒
素ガスを導入した。Place the glass blank in the mold, and place the 1XIO- in the vacuum chamber.
``The vacuum chamber was evacuated until the pressure became below Torr, and then nitrogen gas was introduced into the vacuum chamber.
530℃まで加熱した後に、シリンダ50を作動させて
100Kg/am”の圧力で5分間プレスした。その後
、200℃以下まで徐々に冷却した。After heating to 530° C., the cylinder 50 was activated to press at a pressure of 100 Kg/am” for 5 minutes. Thereafter, the temperature was gradually cooled to 200° C. or lower.
そして、真空槽内に空気を導入し、型を開いて成形品を
取出した。Then, air was introduced into the vacuum chamber, the mold was opened, and the molded product was taken out.
以上の様にして100個のレンズを成形した。100 lenses were molded in the manner described above.
得られたレンズの機能面を3750倍の走査型電子顕微
鏡で観察したところ表面欠陥は認められず、両面とも着
色やくもりのないものであった。When the functional surface of the obtained lens was observed with a scanning electron microscope at a magnification of 3750 times, no surface defects were observed, and both surfaces were free from coloration and cloudiness.
また、型部材との融着は全く発生せず、成形品ワレは全
く生じなかった。更に、レンズ両面の表面精度は良好で
あった。Moreover, no fusion occurred with the mold member, and no cracking of the molded product occurred. Furthermore, the surface precision of both surfaces of the lens was good.
[発明の効果J
以上説明した様に、本発明によれば、ガラス基体の少な
(とも光学機能面が形成される表面に反応防止被覆及び
炭化水素被覆をこの順に付することにより、ガラスブラ
ンクと型部材との反応を防止して融着を阻止することに
加えて、成形品にくもりや着色やワレや表面精度低下が
発生するのを防止することができる。[Effect of the Invention J As explained above, according to the present invention, by applying a reaction prevention coating and a hydrocarbon coating in this order to a small portion of a glass substrate (both surfaces on which an optically functional surface is formed), a glass blank can be formed. In addition to preventing reaction with mold members and preventing fusion, it is possible to prevent cloudiness, coloring, cracking, and deterioration of surface precision in the molded product.
30ニガラス基体。30 Ni glass substrate.
Claims (4)
素材として用いられるガラスブランクであって、ガラス
基体の少なくとも光学機能面が形成される表面に反応防
止被覆及び炭化水素被覆がこの順に付されていることを
特徴とする、光学素子製造用ガラスブランク。(1) A glass blank used as a molding material when manufacturing optical elements by press molding, in which a reaction prevention coating and a hydrocarbon coating are applied in this order to at least the surface on which the optical functional surface of the glass substrate is formed. A glass blank for manufacturing optical elements, which is characterized by:
、MgF_2または蒸着用ガラスである、請求項1に記
載の光学素子製造用ガラスブランク。(2) The reaction prevention coating is Al_2O_3, SiO_2
, MgF_2 or vapor deposition glass, according to claim 1 .
る、請求項1に記載の光学素子製造用ガラスブランク。(3) The glass blank for manufacturing optical elements according to claim 1, wherein the reaction prevention coating has a thickness of 100 to 500 Å.
請求項1に記載の光学素子製造用ガラスブランク。(4) the thickness of the hydrocarbon coating is 10 to 50 Å;
The glass blank for manufacturing an optical element according to claim 1.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18714890A JPH0745330B2 (en) | 1990-07-17 | 1990-07-17 | Glass blank for optical element manufacturing |
| US07/727,071 US5168404A (en) | 1990-07-17 | 1991-07-09 | Optical element and glass blank for producing the optical element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18714890A JPH0745330B2 (en) | 1990-07-17 | 1990-07-17 | Glass blank for optical element manufacturing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0477322A true JPH0477322A (en) | 1992-03-11 |
| JPH0745330B2 JPH0745330B2 (en) | 1995-05-17 |
Family
ID=16200962
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18714890A Expired - Fee Related JPH0745330B2 (en) | 1990-07-17 | 1990-07-17 | Glass blank for optical element manufacturing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0745330B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5340373A (en) * | 1992-02-18 | 1994-08-23 | Canon Kabushiki Kaisha | Method for producing optical element by press molding a blank having a component removed layer and a hydrocarbon coating |
| JP2005255487A (en) * | 2004-03-12 | 2005-09-22 | Hoya Corp | Method for manufacturing preform for use in precision press molding, and method for manufacturing optical element |
| JP2007334707A (en) * | 2006-06-16 | 2007-12-27 | Hitachi Omron Terminal Solutions Corp | Biometric authentication apparatus and method for authenticating with a plurality of biometric information |
| AT514631B1 (en) * | 2012-03-12 | 2016-06-15 | Athena Automation Ltd | Cooling of injection molded parts after molding |
-
1990
- 1990-07-17 JP JP18714890A patent/JPH0745330B2/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5340373A (en) * | 1992-02-18 | 1994-08-23 | Canon Kabushiki Kaisha | Method for producing optical element by press molding a blank having a component removed layer and a hydrocarbon coating |
| JP2005255487A (en) * | 2004-03-12 | 2005-09-22 | Hoya Corp | Method for manufacturing preform for use in precision press molding, and method for manufacturing optical element |
| JP2007334707A (en) * | 2006-06-16 | 2007-12-27 | Hitachi Omron Terminal Solutions Corp | Biometric authentication apparatus and method for authenticating with a plurality of biometric information |
| AT514631B1 (en) * | 2012-03-12 | 2016-06-15 | Athena Automation Ltd | Cooling of injection molded parts after molding |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0745330B2 (en) | 1995-05-17 |
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|---|---|---|---|
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