JPH0477399A - Manufacturing method of SiC whiskers - Google Patents
Manufacturing method of SiC whiskersInfo
- Publication number
- JPH0477399A JPH0477399A JP18999390A JP18999390A JPH0477399A JP H0477399 A JPH0477399 A JP H0477399A JP 18999390 A JP18999390 A JP 18999390A JP 18999390 A JP18999390 A JP 18999390A JP H0477399 A JPH0477399 A JP H0477399A
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- Prior art keywords
- reaction
- reaction vessel
- sic
- raw material
- whiskers
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Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、複合強化材として有用なSiCウィスカーの
製造方法に係り、とくに良好な伸直性と高アスペクト比
を有するSiCウィスカーを工業的に生産するために有
利な方法に関する。Detailed Description of the Invention [Industrial Application Field] The present invention relates to a method for manufacturing SiC whiskers useful as composite reinforcing materials, and in particular to industrially producing SiC whiskers having good straightness and high aspect ratio. Concerning an advantageous method for producing.
(従来の技術〕
SiCの針状単結晶で構成されるウィスカーは、比強度
、比弾性率、耐熱性、化学的安定性などの面で卓越した
性能特性を有することから各種のプラスチック材、金属
材あるいはセラミックス材の複合強化材として実用され
ている。(Prior art) Whiskers composed of acicular single crystals of SiC have excellent performance characteristics in terms of specific strength, specific modulus of elasticity, heat resistance, chemical stability, etc., and are therefore used in various plastic materials and metals. It is used as a composite reinforcing material for ceramic materials.
SiCウィスカーの生成手段には、使用する原料状態の
相違により気相原料系と固相原料系とに分類されるが、
このうち現状において量産技術とされているのは固相原
料系による製造方法(例えば、特公昭60−44280
号公報、特開昭61−102416号公報、同62−3
099号公報など)である。これら固相原料系による製
造技術は、珪素源と炭材とを粉末状態で触媒成分と共に
混合し、この原料系を非酸化性雰囲気下で加熱反応させ
るプロセスが基本工程となる。この際、原料系は密閉状
の反応容器に充填して加熱反応に供され、加熱反応の手
段は、反応容器を固定式のアチソン炉に詰めておこなう
方法または反応容器を管状炉内にブツシャ−を介して押
し込み、間歇的にスライド移送させながらおこなう方法
が採られる。Means for producing SiC whiskers are classified into gas-phase raw material systems and solid-phase raw material systems, depending on the state of the raw materials used.
Among these, the mass production technology currently available is a manufacturing method using a solid phase raw material system (for example, Japanese Patent Publication No. 60-44280
No. 61-102416, JP-A No. 62-3
No. 099, etc.). The basic steps of manufacturing techniques using these solid-phase raw material systems include a process in which a silicon source and a carbonaceous material are mixed together with a catalyst component in a powder state, and the raw material system is heated and reacted in a non-oxidizing atmosphere. At this time, the raw material system is packed into a closed reaction container and subjected to a heating reaction.The heating reaction can be carried out by packing the reaction container into a fixed Acheson furnace or by shuffling the reaction container into a tube furnace. A method is adopted in which the material is pushed through the material and moved intermittently by sliding.
従来、前記の反応容器としては、黒鉛材もしくはアルミ
ナ、ムライトのようなセラミックス材によって形成され
たものが使用されている。Conventionally, the reaction vessel has been made of graphite or a ceramic material such as alumina or mullite.
反応容器は、直接に加熱されて内部に充填された原料系
を反応温度域に保持する必要があるため、材質的に高度
の耐熱性ならびに熱伝導性が要求される。従来から使用
されている黒鉛、アルミナ、ムライトなどの材料は、い
ずれも高度の耐熱性を備えているが、熱伝導性の点では
黒鉛材料が最も優れている。Since the reaction vessel must be directly heated to maintain the raw material system filled therein within the reaction temperature range, the material is required to have high heat resistance and thermal conductivity. Conventionally used materials such as graphite, alumina, and mullite all have a high degree of heat resistance, but graphite materials have the best thermal conductivity.
このように黒鉛が反応容器の構成材料として好適である
ことは認められているが、反応および生成物との関係で
反応容器の材質組織について検討された例はない。Although it has been recognized that graphite is suitable as a constituent material for reaction vessels, there has been no study of the material structure of reaction vessels in relation to reactions and products.
固相原料系によるSiCウィスカーの生成反応は、通常
、SingとCとの反応によるS10ガスによるV L
S (Vapor−Liquid−5olid)機構
を介して進行すると見られているが、本発明者らはこの
過程で副生ずるCOガスの反応系内における濃淡が生成
反応に影響を与えることに着目して研究を重ねたところ
、黒鉛反応容器内にCOガスが充満するとSiCへの反
応が阻害されて曲がりや節のある低アスペクト比の針状
結晶が多く生成するが、反応容器を多孔組織にして余分
なCOガスを反応系外に逃すと伸直性の良好なアスペク
ト比の高い高品質のSiCウィスカーを生成させること
ができる事実を確認した。The SiC whisker production reaction using a solid phase raw material system is usually a V L reaction using S10 gas due to the reaction between Sing and C.
Although it is thought that the process proceeds via the S (Vapor-Liquid-Solid) mechanism, the present inventors focused on the fact that the concentration of CO gas, which is produced as a by-product in this process, in the reaction system affects the production reaction. After repeated research, we found that when a graphite reaction vessel is filled with CO gas, the reaction to SiC is inhibited and many needle-shaped crystals with low aspect ratios with bends and knots are produced. It was confirmed that high-quality SiC whiskers with good stretchability and a high aspect ratio can be produced by releasing CO gas out of the reaction system.
本発明は上記の知見に基づいて開発されたもので、この
目的とするところは、黒鉛反応容器を生成反応に好適な
多孔質の組織または形状とすることによって高性状のS
iCウィスカーを工業的に製造する方法を提供するにあ
る。The present invention has been developed based on the above findings, and its purpose is to produce high-quality S
An object of the present invention is to provide a method for industrially manufacturing iC whiskers.
上記の目的を達成するための本発明によるSiCウィス
カーの製造方法は、珪素源原料と炭材との粉末混合原料
に金属系触媒を添加して反応容器番こ充填し、これを1
500〜1900″Cの温度と非酸化雰囲気に保持され
た反応炉内において加熱反応させ7SjCウイスカーを
生成させる方法において、通気特性が500〜2000
af/h HC1,” H+nmAqの範囲にある多
孔性黒鉛材により形成した密閉円筒状の反応容器を用い
ることを構成上の特徴とする。The method for producing SiC whiskers according to the present invention to achieve the above object includes adding a metal catalyst to a powder mixture of a silicon source material and a carbon material, and filling the mixture into a reaction vessel.
In a method of generating 7SjC whiskers by a heating reaction in a reactor maintained at a temperature of 500 to 1900"C and a non-oxidizing atmosphere, the air permeability is 500 to 2000".
The structure is characterized by the use of a closed cylindrical reaction vessel made of porous graphite material in the range of af/h HC1,''H+nmAq.
本発明に用いられる珪素源原料としては、シリカゲル、
珪砂、石英粉、無機珪酸塩、有機珪素化合物など珪素成
分を含有する種々の物質を挙げることができ、中でもS
in、を主成分とするシリカゲル、石英粉、珪砂等の使
用が有効である。The silicon source materials used in the present invention include silica gel,
Various substances containing silicon components can be mentioned, such as silica sand, quartz powder, inorganic silicates, and organic silicon compounds, among which S
It is effective to use silica gel, quartz powder, silica sand, etc. whose main component is in.
炭材としては、カーボンブランク、コークス粉、黒鉛粉
、粉末活性炭などが使用できるが、最も好適な炭材はカ
ーボンブラックである。カーボンブラックを通用する場
合には、ファー不スブラ・ツク、チャンネルブラック、
アセチレンブラック等の品種は問わないが、とくにDB
P吸油量が100d/100g以上の特性を有するもの
が有効に使用される。As the carbon material, carbon blank, coke powder, graphite powder, powdered activated carbon, etc. can be used, but the most suitable carbon material is carbon black. When carbon black is used, fur fusubura tsuku, channel black,
Any type of acetylene black etc., but especially DB
Those having a P oil absorption of 100d/100g or more are effectively used.
金属系触媒は、Fe、Co Ni Caおよびこれ
らの合金または酸化物の粉粒体から選択される。The metal catalyst is selected from powders of Fe, Co Ni Ca, and alloys or oxides thereof.
原料成分の配合割合は、珪素源原料に対し炭材を60〜
200重量%の範囲とし、金属系触媒の配合量は珪素源
原料中のSi1モル当たり金属として0.01〜0.1
5モルに設定される。The blending ratio of raw material components is 60% to 60% carbon material to silicon source material.
The range is 200% by weight, and the amount of metal catalyst is 0.01 to 0.1 as metal per mole of Si in the silicon source material.
It is set to 5 moles.
上記の原料系は黒鉛材からなる密閉円筒状の反応容器に
軽(充填して加熱反応に供される。形状を密閉円筒状と
するのは、充填した原料粉末が均等に加熱され、かつ外
部に漏出飛散することがないようにするためで、通常は
円筒黒鉛管の両端に黒鉛円盤の落し蓋を嵌めて密閉状態
とする構造に形成される。The above raw material system is filled into a closed cylindrical reactor made of graphite material and subjected to a heating reaction. This is to prevent leakage and scattering, and a cylindrical graphite tube is usually formed with a structure in which a drop cap made of graphite disks is fitted to both ends to seal it.
本発明における重要な要件は、上記密閉円盤状の反応容
器として通気特性が500〜2000a+F!/h H
cm2・mmAqの範囲にある多孔性黒鉛材を用いて形
成したものを適用することである。該通気特性が、50
0d/h−cm2 ・−mAqを上廻る場合には通気
性が不十分で、容器内に充満する余分なCOガスが円滑
に排出されないため高性状なSiCウィスカーが生成さ
れ難くなり、他方2000d/h−cm” ・mmA
qを越えると容器自体の組織が脆弱となるためハンドリ
ング面で問題となり、また穿設により孔を形成するケー
スでは加工孔が大きくなって原料粉末が通過してしまう
不都合を招く。An important requirement in the present invention is that the closed disc-shaped reaction vessel has ventilation characteristics of 500 to 2000 a+F! /h H
The method is to apply a material formed using a porous graphite material in the range of cm2/mmAq. The ventilation characteristics are 50
If it exceeds 0 d/h-cm2 ・-mAq, the ventilation is insufficient and the excess CO gas filling the container cannot be smoothly discharged, making it difficult to generate high quality SiC whiskers. h-cm”・mmA
If q is exceeded, the structure of the container itself becomes fragile, which poses a problem in terms of handling, and in the case where the hole is formed by drilling, the hole becomes large, causing the inconvenience that the raw material powder passes through.
このような通気特性500−2000d/h−cm”
−mtaAqの範囲にある多孔性黒鉛材の反応容器は
、嵩密度0.3〜1.4g/ccの多孔質組織を備える
黒鉛材料を加工することによって形成することができる
。Such ventilation characteristics 500-2000d/h-cm”
A reaction vessel of porous graphite material in the range -mtaAq can be formed by processing a graphite material with a porous structure having a bulk density of 0.3 to 1.4 g/cc.
また、1.5g/cc以上の嵩密度をもつ通常の黒鉛材
を加工成形した反応容器の端部(蓋部)および/または
円筒部等の周辺に直径1〜5mmの孔を多数個穿設する
ことによって、通気特性500〜2000m1!/h−
c+mz−mmAqの範囲にある多孔性黒鉛材の反応容
器を形成することもできる。この場合に穿設する孔の数
は、例えば反応容器の内径が40〜200m−1長さが
100〜500mmの寸法範囲で10〜30個が好適で
ある。孔の穿設位置は、反応容器の長さが200mm以
下の形状では両端部(蓋部)のみに設置し、長さが20
0m5を越える形状では円筒部の中心付近に設置するこ
とが好ましい。 パ原料系を充填した反応容器は、窒
素、アルゴン等の非酸化性雰囲気に保持された加熱炉で
反応温度域に加熱される。加熱炉としては、通常の電気
抵抗加熱炉、アチソン炉またはプッシャー式管状炉など
が適用される。加熱反応の条件は昇温速度を5〜40°
C/sin、 、反応温度を1500〜1900°Cに
設定される。より好適な条件は、昇温速度10〜30°
C/sin、 、反応度1550〜1700°Cの範囲
にすることである。In addition, a large number of holes with a diameter of 1 to 5 mm are bored around the end (lid) and/or cylindrical part of a reaction vessel made of ordinary graphite material with a bulk density of 1.5 g/cc or more. By doing so, the ventilation characteristics are 500~2000m1! /h-
It is also possible to form the reaction vessel of porous graphite material in the range c+mz-mmAq. In this case, the number of holes to be drilled is preferably 10 to 30, for example, in a reaction vessel having an inner diameter of 40 to 200 m and a length of 100 to 500 mm. If the length of the reaction container is 200 mm or less, the holes should be installed only at both ends (lid).
For shapes exceeding 0 m5, it is preferable to install it near the center of the cylindrical part. A reaction vessel filled with a raw material system is heated to a reaction temperature range in a heating furnace maintained in a non-oxidizing atmosphere such as nitrogen or argon. As the heating furnace, a normal electric resistance heating furnace, Acheson furnace, pusher type tube furnace, etc. are used. The heating reaction conditions are a heating rate of 5 to 40°.
C/sin, the reaction temperature is set at 1500-1900°C. More suitable conditions are a heating rate of 10 to 30°
C/sin, reactivity should be in the range of 1550 to 1700°C.
昇温速度が5°C/win未満であると径大のSiCウ
ィスカーを生成することが困難となり、40°Cノll
l1nを1廻る場合には原料組織中の温度勾配が大きく
なるため、生成ウィスカー形状に異形化およびバラツキ
が増大する傾向を招く。また、反応温度が1500°C
未満ではSiCウィスカーの生成が円滑に進行しなくな
る上に珪素源原料の残留が多くなり、1900’Cを越
える高温域ではウィスカー形状の異形化が増大し、同時
にウィスカーの粒状化が始まってショットの混在が増え
る。If the temperature increase rate is less than 5°C/win, it will be difficult to generate large-diameter SiC whiskers;
When the material goes around l1n once, the temperature gradient in the raw material structure increases, which tends to increase the irregular shape and variation in the shape of the generated whiskers. In addition, the reaction temperature is 1500°C
If the temperature is below 1,900°C, the generation of SiC whiskers will not proceed smoothly, and a large amount of silicon source material will remain.In the high temperature range exceeding 1900'C, the shape of the whiskers will increase, and at the same time, the whiskers will begin to become granular, resulting in a problem with the shot. Mixing will increase.
反応後、反応容器中に残留する未反応の炭材成分を焼却
処理によって除去する。After the reaction, unreacted carbonaceous components remaining in the reaction vessel are removed by incineration.
このようにして得られるSiCウィスカーは、淡緑白色
を呈する格子欠陥のない5iCO針状単結晶で、優れた
伸直性と高いアスペクト比を備える高性状のものである
。The SiC whiskers thus obtained are 5iCO acicular single crystals having a pale greenish-white color and no lattice defects, and are of high quality with excellent straightness and a high aspect ratio.
固体原料系によるSiCウィスカーの生成は、下式の反
応を介して進行する。Generation of SiC whiskers using a solid raw material system proceeds through the reaction of the following formula.
S i Ox 十C−+S i o+c。S i Ox 10C-+S i o+c.
この反応において発生するCOガスが反応容器内に滞留
し、次第に充満してくるとSiC針状結晶の真直的な成
長を阻害する現象を起こす。When the CO gas generated in this reaction stays in the reaction vessel and gradually fills up, a phenomenon occurs that inhibits the straight growth of SiC needle crystals.
この現象は、本発明に基づいて通気特性500〜200
0d/h−CIIlz−IIIIIAqの範囲にある多
孔性黒鉛材により形成した密閉円筒状の反応容器に原料
粉末を充填して加熱反応に供すると、その多孔組織もし
くは穿設孔から余分なCOガスが優先的に外部に除去さ
れる作用により効果的に解消する。したがって、反応容
器内に伸直性のある高アスペクト性の結晶が成長しえる
環境が与えられ、常に高性状のSiCウィスカーが生成
することになる。This phenomenon is based on the present invention with air permeability of 500 to 200.
When raw material powder is filled into a closed cylindrical reaction vessel made of porous graphite material in the range of 0d/h-CIIlz-IIIIIIAq and subjected to heating reaction, excess CO gas is released from the porous structure or drilled holes. It is effectively eliminated by preferential removal to the outside. Therefore, an environment is provided in the reaction vessel in which straight, high aspect ratio crystals can grow, and SiC whiskers of high quality are always produced.
(実施例)
以下、本発明の実施例を比較例と対比しながら説明する
。(Example) Hereinafter, examples of the present invention will be described while comparing them with comparative examples.
実施例1
珪素源原料として粒度200メツシユ以下の石英粉末を
用い、そのSi1モルに対し0.03モルに相当する量
のFe粉末を触媒として混合した。これにカーボンブラ
ック炭材を珪素源原料に対し180重量%の割合で配合
し、均一に攪拌混合した。炭材用のカーボンブラックに
は、DBP吸油1130m1!/100g 、よう素吸
着量104mg/gの特性を有するファーネスブラック
〔東海カーボン■製、“’5EAST5H”]を用いた
。Example 1 Quartz powder with a particle size of 200 mesh or less was used as a silicon source material, and Fe powder was mixed as a catalyst in an amount equivalent to 0.03 mol per 1 mol of Si. Carbon black carbonaceous material was added thereto at a ratio of 180% by weight based on the silicon source material, and the mixture was stirred and mixed uniformly. Carbon black for charcoal materials has DBP oil absorption of 1130ml! Furnace black [manufactured by Tokai Carbon ■, "'5EAST5H"] having the characteristics of iodine adsorption amount of 104 mg/g and iodine adsorption amount of 104 mg/g was used.
この粉末混合原料を、嵩密度1.8g/CCの多孔質黒
鉛材を加工して形成した内径5011Il、長さ150
mmの管状部と両端に嵌入する円盤蓋からなる密閉円筒
状の反応容器に軽く充填した。この反応容器の通気特性
は、750 ml/h−cm” ・+u+Aqであっ
た。A porous graphite material with a bulk density of 1.8 g/CC was formed from this powder mixed raw material with an inner diameter of 5011 Il and a length of 150 Il.
A closed cylindrical reaction vessel consisting of a mm-thick tubular portion and a disk lid fitted at both ends was lightly filled. The ventilation characteristics of this reaction vessel were 750 ml/h-cm".+u+Aq.
反応容器を窒素ガス雰囲気に保持された電気抵抗加熱炉
に入れ、10℃/sin、の昇温速度で1640℃まで
上昇させ、2時間保持して反応生成させた。The reaction vessel was placed in an electric resistance heating furnace maintained in a nitrogen gas atmosphere, and the temperature was raised to 1640° C. at a rate of 10° C./sin, and maintained for 2 hours to generate a reaction.
加熱反応後、反応容器から内容物を回収し、大気中で6
00°Cの温度に熱処理して残留する炭材成分を焼却除
去した。After the heating reaction, the contents were collected from the reaction vessel and heated in the atmosphere for 6 hours.
The remaining carbonaceous components were removed by heat treatment at a temperature of 00°C by incineration.
得られた生成物につきχ線回折をおこなったところ、β
−3iCの原子開路82.15人、1.54人の波長位
置に明確なピークが現出し、5iChやCに相当する回
折線は確認されなかった。When the obtained product was subjected to chi-ray diffraction, it was found that β
Clear peaks appeared at wavelength positions of -3iC atomic open circuits of 82.15 and 1.54, and no diffraction lines corresponding to 5iCh or C were confirmed.
生成した各SiCウィスカーの平均径、アスペクト比お
よび形状等を、用いた反応容器の通気特性と対比させて
表1に示した。The average diameter, aspect ratio, shape, etc. of each SiC whisker produced are shown in Table 1 in comparison with the ventilation characteristics of the reaction vessel used.
なお、性状、形状の評価は、SiCウィスカーをSEM
写真で拡大して観察するとともに、そのうち100本に
つき直径、長さを測定する方法によった。In addition, the properties and shapes were evaluated using SEM of SiC whiskers.
In addition to observing them with enlarged photographs, we also measured the diameter and length of 100 of them.
実施例2
実施例1と同一の原料粉末を、嵩密度0.4g/ccの
黒鉛材を加工して形成した実施例1と同形状の反応容器
に軽く充填した。この反応容器の通気特性は、1520
d/h−cta!1mAqであった。Example 2 The same raw material powder as in Example 1 was lightly filled into a reaction vessel having the same shape as in Example 1 and formed by processing graphite material with a bulk density of 0.4 g/cc. The ventilation characteristics of this reaction vessel are 1520
d/h-cta! It was 1 mAq.
反応容器を窒素ガス雰囲気に保持された電気抵抗加熱炉
に入れ、実施例1と同一条件により加熱反応させ、残留
炭材成分を焼却除去した。The reaction vessel was placed in an electric resistance heating furnace maintained in a nitrogen gas atmosphere, and a heating reaction was carried out under the same conditions as in Example 1 to remove residual carbonaceous components by incineration.
得られたSiCウィスカーの性状、形状などを表1に併
載した。The properties, shape, etc. of the obtained SiC whiskers are also listed in Table 1.
比較例1
実施例1と同一の原料粉末を、嵩密度1.51/ccの
黒鉛材を加工して形成した実施例1と同形状の反応容器
に軽く充填した。この反応容器の通気特性は、450
Id/h −cm” ・−*Aqであった。Comparative Example 1 The same raw material powder as in Example 1 was lightly filled into a reaction vessel having the same shape as in Example 1 and formed by processing graphite material with a bulk density of 1.51/cc. The ventilation characteristics of this reaction vessel are 450
Id/h −cm” ·−*Aq.
反応容器を窒素ガス雰囲気に保持された電気抵抗加熱炉
に入れ、実施例1と同一条件により加熱反応させ、残留
炭材成分を焼却除去した。The reaction vessel was placed in an electric resistance heating furnace maintained in a nitrogen gas atmosphere, and a heating reaction was carried out under the same conditions as in Example 1 to remove residual carbonaceous components by incineration.
得られたSiCウィスカーの性状、形状などを表1に併
載した。The properties, shape, etc. of the obtained SiC whiskers are also listed in Table 1.
実施例3
実施例1と同一の原料粉末を、嵩密度1.7g/ccの
黒鉛材を加工した内径50mm、長さ150II11の
管状部1と両端に直径2非の孔3を5個穿設した円盤蓋
2とからなる第1図(断面図)および第2図(円盤蓋の
平面図)に示したような反応容器に軽く充填した。この
反応容器の通気特性は、1100I11/h・0m2・
mIIIAqであった。Example 3 The same raw material powder as in Example 1 was processed into a graphite material with a bulk density of 1.7 g/cc, and a tubular part 1 with an inner diameter of 50 mm and a length of 150mm was drilled with 5 holes 3 with a diameter of 2 mm at both ends. A reaction vessel as shown in FIG. 1 (cross-sectional view) and FIG. 2 (plan view of the disk lid) consisting of a disc lid 2 was lightly filled with the mixture. The ventilation characteristics of this reaction vessel are 1100I11/h・0m2・
It was mIIIAq.
反応容器を窒素ガス雰囲気に保持された電気抵抗加熱炉
に入れ、実施例1と同一条件で加熱反応させ、残留炭材
成分を焼却除去した。The reaction vessel was placed in an electric resistance heating furnace maintained in a nitrogen gas atmosphere, and a heating reaction was carried out under the same conditions as in Example 1 to remove residual carbonaceous components by incineration.
得られたSiCウィスカーの性状、形状などを表1に併
載した。The properties, shape, etc. of the obtained SiC whiskers are also listed in Table 1.
比較例2
実施例1と同一の原料粉末を、嵩密度1 、7g/cc
の黒鉛材から加工した実施例3と同形状であって孔を穿
設しない反応容器に軽く充填した。この反応容器の通気
特性は、20R1/h−cm” ・IIlmAqであ
った。Comparative Example 2 The same raw material powder as in Example 1 was used at a bulk density of 1 and 7 g/cc.
A reaction vessel having the same shape as in Example 3 and having no holes was lightly filled with the reaction vessel, which was made from graphite material. The ventilation characteristics of this reaction vessel were 20R1/h-cm".IImAq.
反応容器を窒素ガス雰囲気に保持された電気抵抗加熱炉
に入れ、実施例1と同一条件で加熱反応させ、残留炭材
成分を焼却除去した。The reaction vessel was placed in an electric resistance heating furnace maintained in a nitrogen gas atmosphere, and a heating reaction was carried out under the same conditions as in Example 1 to remove residual carbonaceous components by incineration.
得られたSiCウィスカーの性状、形状などを表1に併
載した。The properties, shape, etc. of the obtained SiC whiskers are also listed in Table 1.
表 1
表1の結果から、本発明で特定した通気特性を備える反
応容器を用いた実施例1〜3による場合には良好な伸直
性と高度のアスペクト比を有するSiCウィスカーが製
造されることが認められた。Table 1 From the results in Table 1, SiC whiskers having good straightness and a high aspect ratio are produced in Examples 1 to 3 using reaction vessels having the ventilation characteristics specified in the present invention. was recognized.
以上のとおり、本発明によれば特定の通気特性を有する
多孔性黒鉛材から構成された反応容器を適用することに
より、優れた伸直性と高いアスペクト比をもつSiCウ
ィスカーを操業性よく製造することができる。As described above, according to the present invention, SiC whiskers with excellent straightness and high aspect ratio can be manufactured with good operability by applying a reaction vessel made of a porous graphite material having specific air permeability properties. be able to.
したがって、各種マトリックス材を対象とする高品質の
複合強化材を量産することが可能となる。Therefore, it becomes possible to mass-produce high-quality composite reinforcement materials for various matrix materials.
図は実施例3で用いた黒鉛反応容器を示したもので、第
1図は断面図、第2図は円盤蓋部分の平面図である。
l・・・管状部 2・・・円盤蓋3・・・孔
出願人 東海カーボン株式会社
代理人 弁理士 高 畑 正 也
手続補正書(自発)
(1)明細書第1O頁12行目の「・・・粒度200メ
ツシユ・・・」を、「・・・粒度200μm・・・」に
補正する。
平成2年9月11日
(2)明細書第11頁13行目の「・・・原子間距離2
.15人、・・・」を「・・・面間隔2.51人、・・
・」に補正す平成2年特許願第189993号
2、発明の名称
SiCウィスカーの製造方法
3゜
4゜
補正をする者
事件との関係 特許出願人
住 所 東京都港区北青山−丁目2番3号名称 東海
カーボン株式会社
取締役社長 三文字 昌 久The figures show the graphite reaction vessel used in Example 3, with FIG. 1 being a sectional view and FIG. 2 being a plan view of the disk lid portion. 1...Tubular part 2...Disc lid 3...Bore Applicant Tokai Carbon Co., Ltd. Agent Patent Attorney Masaya Takahata Procedural Amendment (Voluntary) (1) ``In the specification, page 1, line 12'' ... Particle size 200 mesh..." is corrected to "...Particle size 200 μm...". September 11, 1990 (2) Page 11, line 13 of the specification, “... interatomic distance 2
.. 15 people,..." to "...plane spacing 2.51 people,...
Patent Application No. 189993 of 1990 amended to 2, title of invention: Process for manufacturing SiC whiskers 3゜4゜Relationship with the case of the person making the amendment Patent Applicant Address: 2-3 Kita-Aoyama-chome, Minato-ku, Tokyo Name: Tokai Carbon Co., Ltd. President Masahisa Sanmonji
Claims (1)
添加して反応容器に充填し、これを1500〜1900
℃の温度と非酸化性雰囲気に保持された反応炉内におい
て加熱反応させてSiCウィスカーを生成させる方法に
おいて、通気特性が500〜2000ml/h・cm^
2・mmAqの範囲にある多孔性黒鉛材により形成した
密閉円筒状の反応容器を用いることを特徴とするSiC
ウィスカーの製造方法。 2、密閉円筒状の反応容器が、嵩密度0.3〜1.4g
/ccの多孔質黒鉛材によって構成される請求項1記載
のSiCウィスカーの製造方法。 3、密閉円筒状の反応容器が、嵩密度1.5g/cc以
上の黒鉛材で形成した反応容器の周辺に直径1〜5mm
の孔を多数個穿設することにより構成される請求項1記
載のSiCのウイスカーの製造方法。[Claims] 1. A metal catalyst is added to a powdered mixed raw material of a silicon source raw material and a carbonaceous material, and the mixture is filled into a reaction vessel.
In the method of producing SiC whiskers by heating reaction in a reactor maintained at a temperature of ℃ and a non-oxidizing atmosphere, the air permeability is 500 to 2000 ml/h cm^
SiC characterized by using a closed cylindrical reaction vessel made of porous graphite material in the range of 2 mmAq
How to make whiskers. 2. The closed cylindrical reaction container has a bulk density of 0.3 to 1.4 g.
The method for producing a SiC whisker according to claim 1, wherein the SiC whisker is made of a porous graphite material of /cc. 3. A closed cylindrical reaction container with a diameter of 1 to 5 mm is placed around the reaction container made of graphite material with a bulk density of 1.5 g/cc or more.
2. The method of manufacturing a SiC whisker according to claim 1, wherein the method comprises drilling a large number of holes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18999390A JPH0477399A (en) | 1990-07-17 | 1990-07-17 | Manufacturing method of SiC whiskers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18999390A JPH0477399A (en) | 1990-07-17 | 1990-07-17 | Manufacturing method of SiC whiskers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0477399A true JPH0477399A (en) | 1992-03-11 |
Family
ID=16250600
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18999390A Pending JPH0477399A (en) | 1990-07-17 | 1990-07-17 | Manufacturing method of SiC whiskers |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0477399A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6266762B1 (en) | 1995-01-06 | 2001-07-24 | Ricoh Company, Ltd. | Information processing apparatus |
| US6497764B2 (en) * | 1998-07-13 | 2002-12-24 | Siemens Aktiengesellschaft | Method for growing SiC single crystals |
| CN105780123A (en) * | 2016-02-04 | 2016-07-20 | 武汉科技大学 | Hafnium-carbide nanometer whiskers and preparing method thereof |
-
1990
- 1990-07-17 JP JP18999390A patent/JPH0477399A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6266762B1 (en) | 1995-01-06 | 2001-07-24 | Ricoh Company, Ltd. | Information processing apparatus |
| US6497764B2 (en) * | 1998-07-13 | 2002-12-24 | Siemens Aktiengesellschaft | Method for growing SiC single crystals |
| CN105780123A (en) * | 2016-02-04 | 2016-07-20 | 武汉科技大学 | Hafnium-carbide nanometer whiskers and preparing method thereof |
| CN105780123B (en) * | 2016-02-04 | 2018-02-09 | 武汉科技大学 | A kind of hafnium carbide nano whisker and preparation method thereof |
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