JPH0477739A - Manufacture of pellicle - Google Patents
Manufacture of pellicleInfo
- Publication number
- JPH0477739A JPH0477739A JP2191245A JP19124590A JPH0477739A JP H0477739 A JPH0477739 A JP H0477739A JP 2191245 A JP2191245 A JP 2191245A JP 19124590 A JP19124590 A JP 19124590A JP H0477739 A JPH0477739 A JP H0477739A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- supporting frame
- solvent
- support frame
- pellicle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 239000010409 thin film Substances 0.000 claims abstract description 38
- 239000002904 solvent Substances 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 11
- 239000010408 film Substances 0.000 claims 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 abstract description 12
- 238000005520 cutting process Methods 0.000 abstract description 7
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 abstract description 3
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 abstract description 3
- 229940011051 isopropyl acetate Drugs 0.000 abstract description 3
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 abstract description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 229920000742 Cotton Polymers 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- -1 etc. Chemical class 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 241000270281 Coluber constrictor Species 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 229940043232 butyl acetate Drugs 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000011243 crosslinked material Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- OQZCSNDVOWYALR-UHFFFAOYSA-N flurochloridone Chemical compound FC(F)(F)C1=CC=CC(N2C(C(Cl)C(CCl)C2)=O)=C1 OQZCSNDVOWYALR-UHFFFAOYSA-N 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、ペリクルの製造法に関するものであり、詳し
くは製造工程において支持枠の外側にはみ出している部
分の薄膜を切り除いた後の支持枠端面より飛散の恐れの
ある残留した薄膜片を溶解し支持枠端をなめらかに仕上
げる製造方法に関する。Detailed Description of the Invention (Industrial Field of Application) The present invention relates to a method for manufacturing a pellicle, and more specifically, the present invention relates to a method for manufacturing a pellicle. This invention relates to a manufacturing method for smoothing the edge of a support frame by dissolving remaining thin film pieces that may be scattered from the edge of the frame.
（従来技術）
ペリクルは、高集積半導体製造においてウニ／λ−の回
路パターンを焼き付けを行なう露光工程で使用されるマ
スク及びレチクルのパターン面に異物が付着するのを防
止するために、マスクに装着されるものである。(Prior art) A pellicle is attached to a mask to prevent foreign matter from adhering to the pattern surface of the mask and reticle used in the exposure process to print a uni/λ- circuit pattern in the production of highly integrated semiconductors. It is something that will be done.
ペリクルの製造方法は、通常平滑なガラスあるいは石英
板上でスピン塗布ないしは流延して薄膜を形成する。薄
膜を仮枠に移し取り、これをペリクルの支持枠に貼り付
る。支持枠より外側の薄膜を切り除くことによって行な
われる。The method for manufacturing a pellicle is usually to form a thin film by spin coating or casting on a smooth glass or quartz plate. The thin film is transferred to a temporary frame and attached to the pellicle support frame. This is done by cutting away the thin film outside the support frame.
支持枠より外側の薄膜の切断は、普通カッターやレーザ
ー等で行なわれている。Cutting of the thin film outside the support frame is usually performed using a cutter, laser, or the like.
切断した後支持枠の端面にわずかにても薄膜か残留すれ
ばペリクルの取り扱い中に、薄膜片か飛散しマスクある
いはレチクルの回路パターン上に落下し欠陥になる恐れ
があった。If even a small amount of thin film remains on the end face of the support frame after cutting, there is a risk that the thin film pieces will fly off and fall onto the circuit pattern of the mask or reticle during handling of the pellicle, resulting in defects.
（発明が解決しようとする課題）
本発明は、高度な発塵防止対策が必要とされるペリクル
の製造工程において支持枠の外側にはる出している部分
の薄膜を切り除いた後の支持枠端面にわずかに残留した
飛散の恐れのある薄膜片を無くすることのできる方法を
提供しようとするものである。(Problems to be Solved by the Invention) The present invention provides a solution to the support frame after removing the thin film protruding outside the support frame in the pellicle manufacturing process that requires advanced dust prevention measures. It is an object of the present invention to provide a method that can eliminate thin film fragments that remain slightly on the end face and may be scattered.
（課題を解決するだめの手段）
本発明は薄膜を溶解する溶剤により支持枠端面にわずか
に残留した飛散の恐れのある薄膜片を溶解せしめること
にある。すなわち本発明は薄膜を支持枠に均一な緊張状
態で貼り付けたペリクルを製造する工程において、支持
枠の外側にはみ出している薄膜を切り除いた後薄膜を溶
解する溶剤で薄膜片の飛散のない様になめらかに支持枠
端面を仕上げることを特徴とするペリクルの製造方法を
提供することにある。(Another Means for Solving the Problems) The present invention is to dissolve thin film fragments that remain slightly on the end face of the support frame and are likely to scatter using a solvent that dissolves the thin film. That is, in the process of manufacturing a pellicle in which a thin film is affixed to a support frame under uniform tension, the present invention removes the thin film protruding from the support frame and then uses a solvent that dissolves the thin film to prevent scattering of thin film pieces. To provide a method for manufacturing a pellicle, which is characterized by finishing the end face of a support frame as smoothly as possible.
ペリクルの製造は、樹脂溶液をガラス或いは石英板上に
スピン塗布ないしは流延して薄膜を形成し、薄膜を仮枠
に移しとり、これをペリクル支持枠に緊張状態で貼り付
ける。支持枠より外側にはろたした薄膜を切り除くこと
によって行われる。To manufacture a pellicle, a resin solution is spin-coated or cast onto a glass or quartz plate to form a thin film, the thin film is transferred to a temporary frame, and this is attached under tension to a pellicle support frame. This is done by cutting away the filtered thin film outside the support frame.
支持枠より外側にはみたした薄膜の切断はカッタやレー
サーで行う。The thin film extending outside the support frame is cut using a cutter or racer.
薄膜を溶解する溶剤で支持枠端面の仕上げる方法は、溶
剤を含有できるスポンジ状物に溶剤を含有させて支持枠
端面を軽く擦ることにより行なわれる。擦りは、溶剤を
含有したスポンジ状物を支持枠の端面に沿って動かして
もよいし、逆にスポンジ状物を固定しておき支持枠を回
してもよい。The method of finishing the end surface of the support frame with a solvent that dissolves the thin film is carried out by applying a sponge-like material that can contain the solvent to a sponge and lightly rubbing the end surface of the support frame. For rubbing, a sponge-like material containing a solvent may be moved along the end surface of the support frame, or conversely, the sponge-like material may be fixed and the support frame may be rotated.
使用される溶剤は、ペリクル膜を溶解させるものであれ
ばいずれのものでも可能である。更に薄膜の溶解性を調
整するために水あるいは非溶剤を混合することも可能で
ある。Any solvent can be used as long as it dissolves the pellicle membrane. Furthermore, it is also possible to mix water or a non-solvent in order to adjust the solubility of the thin film.
薄膜が硝化綿の時は、エステル類、酢酸エチル、酢酸イ
ソプロピル、酢酸ブチル、酢酸アミル等、ケトン類とし
てはアセ］・ン、メチルエチルケトン、メチルイソブチ
ルケトン、ンクロヘキザノン、その他セロソルブアセテ
ート、ジアセトンアルコル等使用できる。さらにトルエ
ン、キシレン、あるいは水を混合してもよい。薄膜か酢
酸綿てはアセトン、メチルエチルケトン、メチレンクロ
ライドかある。エチルセルロースの場合は、トルエン、
キシレン等かある。When the thin film is nitrified cotton, use esters such as ethyl acetate, isopropyl acetate, butyl acetate, amyl acetate, etc., and ketones such as acetate, methyl ethyl ketone, methyl isobutyl ketone, nclohexanone, cellosolve acetate, diacetone alcohol, etc. can. Furthermore, toluene, xylene, or water may be mixed. Thin film or acetic acid cotton can be used with acetone, methyl ethyl ketone, or methylene chloride. For ethylcellulose, toluene,
There's xylene, etc.
使用するスポンジは、溶剤に溶解しない材質てあれば使
用可能であり、ポリエステル、ポバール架橋物、ウレタ
ン等か使用できる。The sponge to be used can be made of any material that does not dissolve in the solvent, such as polyester, poval crosslinked material, urethane, etc.
以下実施例により詳細に説明する。This will be explained in detail below using examples.
実施例−１
硝化綿製薄膜を支持枠にエポキシ樹脂で貼り付け８時間
硬化後カッターで切り出す。切り出したペリクルの支持
枠の端面に沿って酢酸イソプロピルを含有したポリエス
テル製スポンジ片を軽く擦りつける。Example 1 A thin film made of nitrified cotton was pasted on a support frame with epoxy resin, cured for 8 hours, and then cut out with a cutter. Lightly rub a piece of polyester sponge containing isopropyl acetate along the edge of the support frame of the cut out pellicle.
実施例−２
硝化綿製薄膜を支持枠にエポキシ樹脂で貼り何け８時間
硬化後カッターで切り出す。切り出したペリクルの支持
枠の端面をエチルセロソルブアセテート及び水を含有し
たポバール架橋体に回転させながら軽く擦りつける。Example 2 A thin film made of nitrified cotton was pasted on a support frame with epoxy resin, cured for 8 hours, and then cut out with a cutter. The end face of the support frame of the cut out pellicle is lightly rubbed against a poval crosslinked body containing ethyl cellosolve acetate and water while rotating.
実施例−３
酢酸セルロース製薄膜を支持枠にエポキシ樹脂で貼り付
け８時間硬化後カッターで切り出す。切り出したペリク
ルの支持枠の端面をメチルエチルケトンを含有したポリ
エステル製スポンジに回転させながら軽く擦りつける。Example 3 A thin film made of cellulose acetate was pasted on a support frame with epoxy resin, cured for 8 hours, and then cut out with a cutter. The end face of the support frame of the cut out pellicle was lightly rubbed against a polyester sponge containing methyl ethyl ketone while rotating.
比較例 実施例−１と同様てカッタ をペリクルとした。Comparative example Cutter as in Example-1 was used as a pellicle.
て切りｉｌｌ Ｌ を二もの
（発明の効果）
本発明によるペリクルは支持枠端面より飛散の恐れのあ
る残留した薄膜片かなく、滑らかな支持枠端面を持った
ものである。(Effects of the Invention) The pellicle according to the present invention has a smooth end face of the support frame without any remaining thin film pieces that may be scattered from the end face of the support frame.
Claims (1)
製造する工程において、支持枠の外側にはみ出している
薄膜を切り除いた後薄膜を溶解する溶剤で薄膜片の飛散
のない様になめらかに支持枠端面を仕上げることを特徴
とするペリクルの製造方法。In the process of manufacturing a pellicle, in which a thin film is affixed to a support frame under uniform tension, the thin film that protrudes outside the support frame is removed, and then smoothed with a solvent that dissolves the thin film to prevent any pieces of the film from scattering. A method for manufacturing a pellicle, characterized by finishing the end face of a support frame.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2191245A JPH0477739A (en) | 1990-07-19 | 1990-07-19 | Manufacture of pellicle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2191245A JPH0477739A (en) | 1990-07-19 | 1990-07-19 | Manufacture of pellicle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0477739A true JPH0477739A (en) | 1992-03-11 |
Family
ID=16271318
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2191245A Pending JPH0477739A (en) | 1990-07-19 | 1990-07-19 | Manufacture of pellicle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0477739A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008193910A (en) * | 2007-02-08 | 2008-08-28 | Kubota Corp | Threshing device leakage structure |
| JP2020166063A (en) * | 2019-03-28 | 2020-10-08 | 三井化学株式会社 | How to make pellicle |
-
1990
- 1990-07-19 JP JP2191245A patent/JPH0477739A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008193910A (en) * | 2007-02-08 | 2008-08-28 | Kubota Corp | Threshing device leakage structure |
| JP2020166063A (en) * | 2019-03-28 | 2020-10-08 | 三井化学株式会社 | How to make pellicle |
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