JPH0480080B2 - - Google Patents
Info
- Publication number
- JPH0480080B2 JPH0480080B2 JP31178786A JP31178786A JPH0480080B2 JP H0480080 B2 JPH0480080 B2 JP H0480080B2 JP 31178786 A JP31178786 A JP 31178786A JP 31178786 A JP31178786 A JP 31178786A JP H0480080 B2 JPH0480080 B2 JP H0480080B2
- Authority
- JP
- Japan
- Prior art keywords
- ammonium fluoride
- aqueous solution
- mold
- saturated aqueous
- nitric acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004140 cleaning Methods 0.000 claims description 30
- 230000002378 acidificating effect Effects 0.000 claims description 24
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims description 23
- 239000007864 aqueous solution Substances 0.000 claims description 22
- 239000011521 glass Substances 0.000 claims description 21
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 19
- 229910017604 nitric acid Inorganic materials 0.000 claims description 19
- 229920006395 saturated elastomer Polymers 0.000 claims description 19
- 239000007788 liquid Substances 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical class [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 claims 1
- 238000000465 moulding Methods 0.000 description 18
- 239000000243 solution Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 10
- 239000005304 optical glass Substances 0.000 description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 8
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 6
- 229910010271 silicon carbide Inorganic materials 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000004506 ultrasonic cleaning Methods 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 230000004580 weight loss Effects 0.000 description 2
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 206010013786 Dry skin Diseases 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000306 component Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
Landscapes
- Detergent Compositions (AREA)
Description
[産業上の利用分野]
本発明は、ガラスレンズをプレス成形するため
の成形型の洗浄に用いられる洗浄液に関する。
[従来の技術]
近年、光学ガラス部品、中でも光学ガラスレン
ズは、光学機器のレンズ系の構成の簡略化とレン
ズ部分の軽量化の両方を同時に達成し得る非球面
化の傾向にある。この非球面レンズの製造には、
従来の光学レンズ製造方法である研磨法では加工
性及び量産化が困難であり、直接プレス成形法が
有望視されている。
この直接プレス成形法というのは、あらかじめ
所望の面品質及び面精度に仕上げた成形型の上
で、光学ガラスの塊状物を加熱した後プレス成形
するかあるいはあらかじめ加熱した光学ガラスの
塊状物をプレス成形して、プレス成形後、それ以
上の研磨とかの磨き工程などの後工程を必要とせ
ず光学レンズを製造する方法である。このような
方法で光学レンズを得るには、所望の高い形状精
度と光学鏡面に仕上げられた成形型が必要となる
ことはもちろんであるが、成形型の成形面上に、
ガラス屑あるいはその他の異物が付着すると所望
のレンズを得られなくなるので、このような場
合、その付着物をすみやかに取り除くことが必要
である。
この目的のために、特開昭61−72633号公報に
は、プレス成形後の型の成形面に、非酸化性ガス
を吹きつけ、成形面上のガラス屑や異物を吹き飛
ばし取り除く方法が開示されている。
[発明が解決しようとする問題点]
前記した従来の洗浄方法では、成形面上に付着
したガラス屑や異物が取り除けずに成形面上に残
る場合があり、ガス吹きつよりもより確実にガラ
ス屑や異物を取り除く方法が望まれていた。
従つて本発明の目的は、成形型の成形面上に付
着したガラス屑、付着或いは堆積した鉛などの異
物、その他の汚れを容易に取り除き、成形面上を
洗浄化することができる洗浄液を提供することに
ある。
[問題点を解決するための手段]
本発明は、上記の目的を達成するためになされ
たものであり、本発明のガラスレンズ成形型用洗
浄液は、酸性フツ化アンモン飽和水溶液を必須成
分とし、更に場合により濃硝酸及び/又は水をも
必須成分とする液であつて、酸性フツ化アンモン
飽和水溶液/(酸性フツ化アンモン飽和水溶液+
濃硝酸)の比率が50容量%以上で、かつ(酸性フ
ツ化アンモン飽和水溶液+濃硝酸)/(酸性フツ
化アンモン飽和水溶液+濃硝酸+水)の比率が10
容量%以上であることを特徴とする。
ここに、酸性フツ化アンモン飽和水溶液とは、
水1中に酸性フツ化アンモンを室温にて670g
溶解した液のことである(飽和水溶液を得るため
の酸性フツ化アンモンの溶解量は温度によつて変
動する)。また濃硝酸とはHNO3を63重量%含む、
比重1.38の水溶液のことであり、市販濃硝酸に相
当する。これらの主成分の他に、硫酸、塩酸、酢
酸、フツ酸等を添加してもよいが、フツ酸は皮膚
に付着すると危険であることから使用しないこと
が好ましい。
本発明の洗浄液を用いれば、成形型に付着した
ガラス屑をガラスの種類を問わずに容易に溶解除
去することができる。又、SF系光学ガラスは
PbOを多量に含むために、成形時に還元粒子が型
に付着、堆積しやすいが、これも容易に除去でき
る。本発明の洗浄液で洗浄される成形型の材質と
しては炭化ケイ素、炭化ケイ素と炭素の混合物、
窒化ケイ素、ホウ化チタン、貴金属(白金、ロジ
ウム、金等)、炭化タングステン、ステンレスス
チール及びその他の多くの材質が挙げられる。材
質によつて、洗浄液中の成分の混合比を任意にか
えることができるが、酸性フツ化アンモン飽和水
溶液/(酸性フツ化アンモン飽和水溶液+濃硝
酸)の比率が50容量%未満になるとコバルトをバ
ンイダーとしている炭化タングステン焼結体やス
テンレススチールの場合は腐食されやすくなるの
で好ましくない。
また(酸性フツ化アンモン飽和水溶液+濃硝
酸)/(酸性フツ化アンモン飽和水溶液+濃硝酸
+水)の比率が10容量%未満であると、プレスに
よつて型に付着したガラス屑の除去に時間を要す
るので好ましくない。
本発明の洗浄液を、成形型のガラス屑等が付着
した部分につけてしばらく放置することにより、
型を侵すことなく、ガラス屑等を除去でき、しか
る後にアセトンで拭いて成形型を再び使用するこ
とができる。又、洗浄液中に成形型を浸漬して、
超音波洗浄し、しかる後にシミ等が残らないよう
に、光学レンズの洗浄に通常用いられる超音波自
動洗浄工程を通せばさらによい。
[実施例]
以下、実施例により本発明を更に説明するが、
本発明は下記実施例に限定されるものではない。
本発明の洗浄液として、第1表にNo.1〜10の10
種類の洗浄液を示すが、これらの洗浄液は下記の
ようにして調製した。
即ち、一定量の蒸留水中に酸性フツ化アンモン
を室温にて少量ずつ攪拌しながら投入し、酸性フ
ツ化アンモン飽和水溶液(水1に対する酸性フ
ツ化アンモンの溶解量670g)を調製し、これを
そのまま本発明のNo.3の洗浄液とした。
また本発明のNo.1,2及び4〜10の洗浄液は、
上で得られた酸性フツ化アンモン飽和水溶液に濃
硝酸(JIS特級63重量%液、比重1.38)及び/又
は蒸留水を所定の容量比で加え、攪拌することに
より調製した。なお比較のためNo.11として濃硝酸
を用意した。
これらの洗浄液を用いて、まず、予備テストと
して、ガラスの溶解速度を調べ、又、型材の肌荒
れテストを行なつた。鉛を多量に含む光学ガラス
であるSF6の研磨球(直径4.4mm、重さ230mg)を
各洗浄液に浸漬し、浸漬時間と重量減の関係を調
べた結果の1例を第1図に示す。通常、プレス成
形で成形型に付着するガラス屑は数μm程度の微
小のものであり、1mg以下であることから、これ
らの洗浄液で付着ガラスを十分に溶解除去でき
る。
一方、型材の肌荒れを調べるために、炭化ケイ
素焼結体の上にCVD法で炭化ケイ素をコーテイ
ングしたもの及びバインダーが主にコバルトであ
る炭化タングステン焼結体の直径17mm、厚さ3mm
の平面円板を表面粗さ150Å以下に鏡面研磨し、
これらを室温で各洗浄液に2時間浸漬し、前後の
表面粗さの測定と顕微鏡観察を行なつた。その結
果、CVD法で炭化ケイ素をコーテイングした型
では、No.1〜10のいずれの洗浄液を用いても、型
は全く変化しなかつた。炭化タングステン焼結体
の場合は、No.1〜8の洗浄液を用いると型は全く
変化せず、No.9及びNo.10の洗浄液を用いると表面
粗さが10Å程度悪化したが、実用上問題ない範囲
であつた。これに対して比較のためのNo.11の液で
は肌荒れが顕著であつた。これは、バンダーのコ
バルトが硝酸によつて腐食されるためと考えられ
る。
次に前記のSF6研磨球を、前記の鏡面仕上げ面
を有する成形型内に納め、N2雰囲気中で、500℃
に昇温しプレス成形したのち室温まで冷却し、成
形体を成形型から取り出し、再び新たなガラスを
成形型内に納め、同様の手順で20回プレス成形を
行なつた。しかる後に型表面を観察したところ、
CVD法で炭化ケイ素をコーテイングしたものも、
炭化タングステン焼結体の場合もガラス屑の付着
が顕微鏡で認められ、かつ、PbOの還元により鉛
成分の付着が求められた。この型をNo.1〜10の各
洗浄液中に5分間浸漬し、しかる後に光学レンズ
の洗浄の際に通常用いられている超音波自動洗浄
工程(水→界面活性剤液→水→イソプロピルアル
コール→フロン乾燥)を通して、光学顕微鏡で観
察したところ、残存付着異物は全く認められず、
元の鏡面状態を保つていた。No.1〜10の各洗浄液
に対して、同様のテストを行なつたが、すべてに
対して同様の結果が得られた。又、成形面に洗浄
液を数滴滴下し、5分間の間に綿棒による擦り操
作を所定間隔で10回程度行なつた後、水拭きし、
アセトンで清拭しても同様な結果が得られた。
上記の実施例では酸性フツ化アンモン飽和水溶
液又は該酸性フツ化アンモン飽和水溶液と濃硝酸
及び/又は水との混合液を用いたが、これに、さ
らに硫酸、塩酸、酢酸、フツ酸等を添加してもよ
い。しかしながら、フツ酸は皮膚に付着した場
合、人体に悪影響を及ぼすので、その使用はでき
るだけ避けた方がよい。
[Industrial Application Field] The present invention relates to a cleaning liquid used for cleaning a mold for press-molding a glass lens. [Prior Art] In recent years, optical glass components, especially optical glass lenses, have been trending toward aspheric surfaces that can simultaneously simplify the structure of a lens system of an optical device and reduce the weight of the lens portion. To manufacture this aspherical lens,
The polishing method, which is a conventional optical lens manufacturing method, has difficulty in processing and mass production, and direct press molding is considered promising. This direct press molding method involves heating a lump of optical glass and then press-molding it on a mold that has been finished to the desired surface quality and precision, or pressing a lump of optical glass that has been heated in advance. This is a method of manufacturing optical lenses by molding and press-molding without requiring post-processes such as polishing or polishing. In order to obtain an optical lens using this method, a mold with the desired high shape accuracy and an optical mirror finish is of course required, but on the molding surface of the mold,
If glass dust or other foreign matter adheres to the lens, the desired lens cannot be obtained, so in such a case, it is necessary to promptly remove the adhered substance. For this purpose, Japanese Patent Application Laid-Open No. 61-72633 discloses a method in which non-oxidizing gas is blown onto the molding surface of the mold after press molding to blow away glass debris and foreign matter on the molding surface. ing. [Problems to be Solved by the Invention] With the conventional cleaning method described above, glass debris and foreign matter adhering to the molding surface may not be removed and may remain on the molding surface, and this method cleans glass more reliably than gas blowing. A method for removing debris and foreign matter was desired. Accordingly, an object of the present invention is to provide a cleaning liquid that can easily remove glass debris adhering to the molding surface of a mold, foreign matter such as attached or deposited lead, and other stains, and can clean the molding surface. It's about doing. [Means for Solving the Problems] The present invention has been made to achieve the above object, and the cleaning liquid for glass lens molds of the present invention contains an acidic ammonium fluoride saturated aqueous solution as an essential component, Furthermore, it is a liquid containing concentrated nitric acid and/or water as an essential component in some cases, and is a liquid containing acidic ammonium fluoride saturated aqueous solution/(acidic ammonium fluoride saturated aqueous solution +
The ratio of (concentrated nitric acid) is 50% by volume or more, and the ratio of (acidic ammonium fluoride saturated aqueous solution + concentrated nitric acid) / (acidic ammonium fluoride saturated aqueous solution + concentrated nitric acid + water) is 10
It is characterized by a capacity of % or more. Here, the acidic ammonium fluoride saturated aqueous solution is
670g of acidic ammonium fluoride in 1 part of water at room temperature
It refers to the dissolved liquid (the amount of acidic ammonium fluoride dissolved to obtain a saturated aqueous solution varies depending on the temperature). Also, concentrated nitric acid contains 63% by weight of HNO3 .
It is an aqueous solution with a specific gravity of 1.38, and is equivalent to commercially available concentrated nitric acid. In addition to these main components, sulfuric acid, hydrochloric acid, acetic acid, hydrofluoric acid, etc. may be added, but it is preferable not to use hydrofluoric acid since it is dangerous if it adheres to the skin. By using the cleaning liquid of the present invention, glass debris adhering to a mold can be easily dissolved and removed regardless of the type of glass. In addition, SF optical glass
Because it contains a large amount of PbO, reduced particles tend to adhere to and accumulate on the mold during molding, but these can also be easily removed. The material of the mold to be cleaned with the cleaning solution of the present invention is silicon carbide, a mixture of silicon carbide and carbon,
These include silicon nitride, titanium boride, precious metals (platinum, rhodium, gold, etc.), tungsten carbide, stainless steel and many other materials. Depending on the material, the mixing ratio of the components in the cleaning solution can be changed arbitrarily, but if the ratio of acidic ammonium fluoride saturated aqueous solution/(acidic ammonium fluoride saturated aqueous solution + concentrated nitric acid) is less than 50% by volume, cobalt may be removed. It is not preferable to use sintered tungsten carbide or stainless steel as the binder because they are easily corroded. In addition, if the ratio of (acidic ammonium fluoride saturated aqueous solution + concentrated nitric acid)/(acidic ammonium fluoride saturated aqueous solution + concentrated nitric acid + water) is less than 10% by volume, it will be difficult to remove glass debris that has adhered to the mold by pressing. This is not preferred because it takes time. By applying the cleaning liquid of the present invention to the part of the mold where glass debris etc. have adhered and leaving it for a while,
Glass debris etc. can be removed without damaging the mold, and the mold can then be used again by wiping it with acetone. Also, by immersing the mold in the cleaning solution,
It is even better to perform ultrasonic cleaning, and then pass through an automatic ultrasonic cleaning process normally used for cleaning optical lenses so that no stains or the like remain. [Examples] Hereinafter, the present invention will be further explained with reference to Examples.
The present invention is not limited to the following examples. As the cleaning liquid of the present invention, 10 of No. 1 to 10 in Table 1 are listed.
These cleaning solutions were prepared as follows. That is, add acidic ammonium fluoride little by little into a certain amount of distilled water at room temperature while stirring to prepare a saturated aqueous solution of acidic ammonium fluoride (dissolved amount of acidic ammonium fluoride in 1 part of water: 670 g), and add this as it is. This was the No. 3 cleaning solution of the present invention. In addition, the cleaning liquids No. 1, 2 and 4 to 10 of the present invention are:
It was prepared by adding concentrated nitric acid (JIS special grade 63% by weight liquid, specific gravity 1.38) and/or distilled water in a predetermined volume ratio to the acidic ammonium fluoride saturated aqueous solution obtained above and stirring. For comparison, concentrated nitric acid was prepared as No. 11. Using these cleaning solutions, first, as a preliminary test, the melting rate of glass was investigated, and a surface roughening test of the mold material was conducted. Figure 1 shows an example of the results of examining the relationship between immersion time and weight loss by immersing a polished ball (4.4 mm in diameter, 230 mg in weight) of SF6, an optical glass containing a large amount of lead, in each cleaning solution. Normally, the glass debris that adheres to the mold during press molding is minute, about several μm in size, and is less than 1 mg, so these cleaning solutions can sufficiently dissolve and remove the adhered glass. On the other hand, in order to investigate the surface roughness of the mold material, we used a silicon carbide sintered body coated with silicon carbide using the CVD method and a tungsten carbide sintered body whose binder was mainly cobalt, with a diameter of 17 mm and a thickness of 3 mm.
mirror-polished the flat disk to a surface roughness of 150Å or less,
These were immersed in each cleaning solution for 2 hours at room temperature, and the surface roughness before and after was measured and observed under a microscope. As a result, the molds coated with silicon carbide by the CVD method did not change at all no matter which of the cleaning liquids Nos. 1 to 10 were used. In the case of sintered tungsten carbide, the mold did not change at all when cleaning solutions No. 1 to 8 were used, and the surface roughness worsened by about 10 Å when cleaning solutions No. 9 and No. 10 were used, but this is not practical. It was within a reasonable range. In contrast, liquid No. 11 for comparison had noticeable skin roughness. This is thought to be because cobalt in the bander is corroded by nitric acid. Next, the SF6 polished ball was placed in the mold with the mirror-finished surface and heated at 500°C in an N2 atmosphere.
The glass was heated to a temperature of 100°C and press-molded, then cooled to room temperature, the molded body was taken out of the mold, new glass was placed in the mold, and press-molded 20 times in the same manner. After that, when I observed the mold surface, I found that
Products coated with silicon carbide using the CVD method are also available.
In the case of the tungsten carbide sintered body, the adhesion of glass debris was also observed under a microscope, and the adhesion of lead components was determined due to the reduction of PbO. This mold was immersed in each cleaning solution No. 1 to No. 10 for 5 minutes, followed by an automatic ultrasonic cleaning process normally used for cleaning optical lenses (water → surfactant solution → water → isopropyl alcohol → When observed under an optical microscope after drying with Freon, no residual foreign matter was observed.
The original mirror surface condition was maintained. Similar tests were conducted on each of the cleaning solutions No. 1 to No. 10, and similar results were obtained for all of them. Also, put a few drops of cleaning liquid on the molded surface, rub it with a cotton swab about 10 times at specified intervals for 5 minutes, then wipe it with water.
Similar results were obtained by wiping with acetone. In the above examples, an acidic ammonium fluoride saturated aqueous solution or a mixture of the acidic ammonium fluoride saturated aqueous solution and concentrated nitric acid and/or water was used, but sulfuric acid, hydrochloric acid, acetic acid, hydrofluoric acid, etc. were further added to this. You may. However, since hydrofluoric acid has an adverse effect on the human body when it comes into contact with the skin, its use should be avoided as much as possible.
【表】
[発明の効果]
以上のように、本発明の洗浄液は、酸性フツ化
アンモン水溶液又はこれと濃硝酸及び/又は水と
の混合液を、所定配合比率で用いることにより得
られるものであり、本発明の洗浄液をガラスレン
ズ成形型の洗浄に使用すると、ガラスレンズを直
接プレス成形法で製造する際の、成形面上の付着
物を、人体への危険を防止しつつ、容易に、素早
く取り除くことが可能となり、これによつて、表
面品質、表面形状の良好な超精密光学ガラスレン
ズを、安定して製造できるという顕著な利点があ
る。[Table] [Effects of the Invention] As described above, the cleaning liquid of the present invention is obtained by using an acidic ammonium fluoride aqueous solution or a mixture of this with concentrated nitric acid and/or water at a predetermined mixing ratio. When the cleaning liquid of the present invention is used to clean a glass lens mold, it can easily remove deposits on the molding surface when manufacturing glass lenses by direct press molding, while preventing danger to the human body. This has the remarkable advantage that it can be removed quickly and that ultra-precision optical glass lenses with good surface quality and shape can be stably manufactured.
第1図は、本発明の洗浄液中に、光学ガラス球
を浸漬した場合の浸漬時間と光学ガラス球の重量
減の関係を示すグラフである。
FIG. 1 is a graph showing the relationship between the immersion time and the weight loss of the optical glass bulb when the optical glass bulb is immersed in the cleaning solution of the present invention.
Claims (1)
し、更に場合により濃硝酸及び/又は水をも必須
成分とする液であつて、酸性フツ化アンモン飽和
水溶液/(酸性フツ化アンモン飽和水溶液+濃硝
酸)の比率が50容量%以上で、かつ(酸性フツ化
アンモン飽和水溶液+濃硝酸)/(酸性フツ化ア
ンモン飽和水溶液+濃硝酸+水)の比率が10容量
%以上であることを特徴とするガラスレンズ成形
型用洗浄液。1 A liquid containing an acidic saturated ammonium fluoride aqueous solution as an essential component, and further containing concentrated nitric acid and/or water as an essential component, where the acidic ammonium fluoride saturated aqueous solution/(acidic ammonium fluoride saturated aqueous solution + concentrated nitric acid) A glass characterized in that the ratio of (acidic ammonium fluoride saturated aqueous solution + concentrated nitric acid)/(acidic ammonium fluoride saturated aqueous solution + concentrated nitric acid + water) is at least 10% by volume. Cleaning liquid for lens molds.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31178786A JPS63168497A (en) | 1986-12-30 | 1986-12-30 | Washing liquid for glass lens mold |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31178786A JPS63168497A (en) | 1986-12-30 | 1986-12-30 | Washing liquid for glass lens mold |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63168497A JPS63168497A (en) | 1988-07-12 |
| JPH0480080B2 true JPH0480080B2 (en) | 1992-12-17 |
Family
ID=18021458
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31178786A Granted JPS63168497A (en) | 1986-12-30 | 1986-12-30 | Washing liquid for glass lens mold |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63168497A (en) |
-
1986
- 1986-12-30 JP JP31178786A patent/JPS63168497A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63168497A (en) | 1988-07-12 |
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