JPH0480355A - Device for forming film - Google Patents

Abstract

PURPOSE:To efficiently form polymer films on many substrates with a single shutter set between evaporating sources and each of the substrates in a vacuum treating chamber by making the shutter freely windable. CONSTITUTION:A shutter 7 set between evaporating sources 3 and a substrate 5 is freely windably stretched between a sending roll 8 and a winding roll 9 so that the shutter 7 can be arbitrarily moved from the roll 8 side to the roll 9 side (arrow C) and wound around the roll 9 with a driving means (not shown) for winding such as a motor. The shutter 7 is moved to the roll 8 side to expose the front side 5a of the substrate 5 to the sources 3 and monomers A, B as starting materials are vapor-deposited and polymerized on the substrate 5 for a prescribed time to form a polymer film of a prescribed thickness.

Description

Detailed Description of the Invention (Industrial Field of Application) The present invention relates to a film forming apparatus, and more particularly to a film forming apparatus used for forming a polymer film on a substrate by evaporating a raw material monomer for the polymer film. Relating to a membrane device.

(Prior Art) Conventionally, this type of film forming apparatus has been provided with evaporation sources d and e for evaporating raw material monomers b and c of a polymer film at the lower part of a vacuum processing chamber a, as shown in FIG. , vacuum processing chamber a
A substrate holding device g is provided above the evaporation sources d and e for holding the substrate f at a position facing the evaporation sources d and e, and a shutter is provided above the evaporation sources d and e and is rotatable laterally. Devices equipped with S are known.

When forming a polymer film using the above apparatus, the shutter S is used to evaporate sources d and e filled with raw material monomers b and c.
With the top closed, the inside of the vacuum processing chamber a is reduced to a predetermined pressure, and the raw material monomers b and c are heated with the evaporation sources d and e,
When a predetermined amount of evaporation is obtained, the shutter S is rotated laterally about the support axis to open the upper part of each evaporation source d and e, and the opening and closing of the shutter S is adjusted to release the raw material monomers b and c. is evaporated while controlling the amount of evaporation, and is vapor-deposited and polymerized on the substrate f to form a polymer film.

In the figure, i is the evacuation system of vacuum processing chamber a, j is the wall of vacuum processing chamber a, k is the heater for evaporation source d and e, g is a partition plate provided between both evaporation sources d and e, m indicates a rate monitor provided near each evaporation source d and e, and n indicates a film thickness monitor provided near the substrate f.

(Problem to be Solved by the Invention) However, since the raw material monomer of the polymer film used to form on the substrate in the film forming apparatus is an organic compound, the raw material monomer is heated by the evaporation sources d and e and evaporated. is attached to the wall surface j of the shutter 51 in the vacuum processing chamber a, either as a monomer alone or as a polymerized polymer, so these must be removed, but the attached raw material monomer and polymer are difficult to remove. The removal work becomes complicated, and in particular, a large amount of these particles tend to adhere to the shutters S installed above the evaporation sources d and e, and since they are attached in large quantities, they cannot be easily removed, so the shutter S needs to be replaced. There is a problem with this.

Therefore, as shown in Figure 5, a cylindrical cover 0 made of, for example, aluminum foil is attached to the lower part using Nyatter S, but large amounts of raw material monomers b and c are evaporated from evaporation sources d and e. In this case, a large amount of these raw material monomers and polymerized polymers adheres in a short period of time, so there is a problem that the shutter S must be replaced frequently.

An object of the present invention is to provide a film forming apparatus that eliminates such problems.

(Means for Solving the Problems) The film forming apparatus of the present invention includes an evaporation source or an evaporation port from an external evaporation source for evaporating a raw material monomer of a polymer film, and an evaporation source or an evaporation port for evaporating raw material monomer of a polymer film, in a vacuum processing chamber. In a film forming apparatus in which a substrate on which a polymer film is formed by vapor deposition polymerization of raw material monomers is provided facing each other, and a shutter is provided between the evaporation source or the evaporation port and the substrate, the shutter is It is characterized by a removable shutter.

(Function) When the raw material monomer is evaporated from the evaporation source or the evaporation port in the vacuum processing chamber, the raw material monomer is vapor-deposited and polymerized on the substrate to form a polymer film. In this case, the shutter, which can be rolled up freely, is moved to open the front surface of the substrate, and the raw material monomer is steamed and polymerized on the substrate. In addition, the front surface of the substrate is shielded by moving the shutter, and when shielding, the shutter to which monomer alone or polymeric material is attached can be rolled up.

(Example) Embodiments of the device of the present invention will be described based on the accompanying drawings.

1 and 2 show an example of the film forming apparatus of the present invention, and in the figures, 1 indicates a vacuum processing chamber;
The inside was connected to a vacuum evacuation system 2 such as a vacuum pump. An evaporation source 3.3 made of glass or a metal material such as A1, stainless steel, or copper is provided in the lower part of the vacuum processing chamber 1 to evaporate the raw material monomers A and B of the polymer film. The raw material monomers A and B were able to be heated to a predetermined temperature by a heater 4 provided. In addition, vacuum processing chamber 1
A substrate 5 on which a polymer film is to be formed is held by a substrate holding device 6 above the evaporation source 3 . Further, a shutter 7 was provided between each of the evaporation sources 3 and the substrate 5.

Although this configuration is not particularly different from the conventional device, the device of the present invention is provided with a shutter 7 provided between each evaporation source 3 and the substrate 5, and can be wound up freely.In the illustrated example, the shutter 7 is A band made of a flexible material with a thickness of about 25 μm, a width of about 150IIffl, and a length of about 1000 m,
Further, a delivery roller 8 and a take-up roller 9 are provided in the vacuum processing chamber 1 to face each other, and one end of the shutter 7 is attached to the delivery roller 8 and the other end is attached to the take-up roller 9, and the shutter 7 is wound around the delivery roller 8 and stretched between both rollers 8 and 9,
The shutter 7 can be arbitrarily moved from the delivery roller 8 side to the take-up roller 9 side (arrow C) by a winding drive device (not shown) such as a motor, and can be wound onto the take-up roller 9. In addition, the shutter 7 is connected to the front surface 5 of the board 5.
In addition, the shutter 7, the delivery roller 8, and the take-up roller 9 are arranged close to the delivery roller side or the take-up roller side (in the X direction in Figure 2) by a moving drive device (not shown) such as a motor. ), or the shutter can be moved toward one of the side edges (in the X direction in FIG. 2) to shield or open the front surface 5a of the substrate 5 so that the polymer film raw material monomer from the evaporation source 3 is transferred to the substrate. 5 can now be evaporated.

The material for the shutter 7 is not particularly limited as long as it is flexible and is capable of adhering raw material monomers and polymerized polymers; examples of such materials include aluminum thin film, polyethylene terephthalate (PET), Examples include plastic films such as polyimide.

Furthermore, a cylindrical protective plate 11 having a heater 10 wound around its outer peripheral surface was arranged between both evaporation sources 3 and the shutter 7.

In the figure, 12 indicates a partition plate provided between both evaporation sources 3, 13 indicates a rate monitor disposed near the evaporation source 3, and 14 indicates a film thickness monitor disposed near the substrate 5.

Next, a case will be described in which a polyimide film is formed as a polymer film on the substrate 5 using the above-mentioned apparatus.

First, the vacuum processing chamber 1 is evacuated with one of the raw material monomer evaporation sources 3, 3 filled with pyromellitic dianhydride as raw material monomer A, and the other filled with 4,4'-diaminodiphenyl ether as raw material monomer B. The air pressure was set to 1×10 −6 via the exhaust system 2.

Next, the delivery roller 8 and the take-up roller 9 are moved to the front surface 5a side of the substrate 5 by the operation of a moving drive device (not shown), and the shutter 7 between both rollers 8 and 9 moves the substrate 5 and the substrate holding device. 6 was shielded.

Next, while measuring the evaporation rate of each raw material monomer A and B from the evaporation source 3.3 with the rate monitor 13, the raw material monomer A was evaporated at 180 ml of evaporation rate so that each raw material monomer A and B were evaporated at a molar ratio of 1:1. 160±2 of raw material monomer B at ±2℃
℃ using a heater 4. Note that the pressure inside the vacuum processing chamber 1 at this time was 5×10 −6 Torr.

Next, when the raw material monomer reaches a predetermined temperature and the required evaporation rate is obtained, both rollers 8.9 are moved to the delivery roller 8 side by the operation of a moving drive device (not shown), and the shutter 7 is moved. The shielding of the substrate 5 is released to open the front surface 5a of the substrate 5, and the raw material monomer A,
After B is vapor-deposited and polymerized to form a polymer film made of polyamic acid with a predetermined thickness, both rollers 8 and 9 are again moved to the take-up roller 9 side by a moving drive device (not shown) and the shutter is closed. 7, the substrate 5 on which the polymer film was formed was removed from the substrate holder 6 in this shielded state, and then a new substrate 5 separate from the substrate 5 was attached to the substrate holder. Incidentally, the film made of polyamic acid was later heated to 200° C. to form a polyimide film.

Next, in the same manner as described above, the shutter 7 was moved to release the shielding of the front surface 5a of the new substrate 5 and opened for a predetermined time, and the raw material monomer was vapor-deposited and polymerized on the substrate 5 to form a polymer film. After that, the front surface 5a of the substrate 5 was again covered with the shutter 7.

Note that the winding operation of the shutter 7 toward the winding roller 9 side depends on the amount of raw material monomer and polymeric substance adhering to the shutter,
That is, it may be carried out as appropriate depending on the type of raw material monomer, heating temperature, evaporation amount, vapor deposition time, and film thickness of the polymer film to be formed. This winding operation is performed as shown in FIGS. 1 and 2 above.
In the case of the illustrated example, it may be performed during vapor deposition of raw material monomer onto the substrate or during exchange of the substrate to the substrate holding device.

Also, a delivery roller 8 for winding up the shutter 7;
The arrangement position of the take-up roller 9 may be appropriately selected depending on the configuration inside the vacuum processing chamber 1, and the arrangement position may be such that both rollers 8 and 9 are placed below the shutter 7, that is, close to the evaporation source, as in the illustrated example. 3 side, both rollers 8.9 are placed above the shutter 7, that is, on the substrate holding device 6 side (not shown), and one of the delivery roller 8 and take-up roller 9 is placed below the shutter 7, the other For example, a roller (not shown) may be placed above the shutter.

Further, in the illustrated example, the evaporation source for the raw material monomer is placed inside the vacuum processing chamber, but the evaporation source for the raw material monomer is placed outside the vacuum processing chamber, and the evaporation port for the raw material monomer from the evaporation source is connected through the monomer introduction pipe. It may also be provided within the vacuum processing chamber.

In addition, if the adhesion prevention plate 11 is arranged between the evaporation source 3.3 and the shutter 7 as shown in the illustrated example, and the adhesion prevention plate 11 is heated by the heater 10, the raw material monomers evaporated from the evaporation source 3. can pass through the deposition prevention plate 11 and be intensively deposited on the substrate 5, and while waiting for evaporation of the raw material or during substrate replacement, it will not adhere to anything other than the shutter, so that the inside of the vacuum processing chamber 1 It has the advantage of being able to reduce contamination.

FIG. 3 shows another embodiment of the shutter used in the device of the present invention. In this embodiment, openings 15 of a size corresponding to the size of the substrate 5 are provided in a part of the shutter 7 at predetermined intervals. It is something that

In order to form a polymer film on the substrate 5, first, the substrate 5 and the substrate holding device 6 are shielded by the shutter 7a portion without the opening 15 of the shutter 7 while waiting for the evaporation of the raw material monomer, and then the shutter When the opening 15 reaches the front surface 5a of the substrate 5 while winding up the substrate 7 with the winding roller 9,
The winding of the shutter 7 is stopped, the shielding of the substrate 5 is released by the opening 15, and each raw material monomer is evaporated from each evaporation source 3 for a predetermined period of time through the opening 15 onto the substrate 5 with the front surface 5a open. After the raw material monomer is vapor-deposited and polymerized on the substrate 5, the shutter 7 is wound up by the take-up roller 9, and the substrate 5 and the substrate holding device 6 are again shielded by the portion of the shutter 7a without the opening 15.

In this case, the front surface 5a of the board can be shielded or opened depending on the winding depth of the shutter 7, so the operation of shielding or opening the front surface 5a of the board with the shutter 7 is easy. Since the only moving device is the take-up drive device, there is an advantage that the overall structure of the shutter can be simplified.

Further, by using a mask having partially formed openings instead of the openings described above, it is possible to form the polymer film only at the necessary locations on the substrate.

(Effects of the Invention) As described above, when using the film forming apparatus of the present invention, the shutter is a shutter that can be rolled up freely, so the shutter can be rolled up depending on the adhesion status of raw material monomers and polymerized polymers. This eliminates the need to clean the shutter, unlike the fixed shutter of conventional equipment, and by replacing the used shutter, maintenance-free operation can be achieved for a long period of time. Since it is not necessary to replace the shutters frequently, there are advantages such as the ability to efficiently form polymer films on a large number of substrates using - number of shutters.

[Brief explanation of drawings]

1 and 2 show an example of the film forming apparatus of the present invention, FIG. 1 is a schematic cross-sectional view thereof, and FIG. 2 is a perspective view showing the main parts of a shutter used in the apparatus of the present invention. FIG. 3 is a perspective view showing the main parts of another embodiment of the shutter used in the device of the present invention, FIGS. 4 and 5 show the conventional device, and FIG. FIG. 5 is a perspective view of the shutter.

Claims (1)

[Claims] In the vacuum processing chamber, an evaporation source or an evaporation port from an external evaporation source for evaporating the raw material monomer of the polymer film, and a substrate on which the polymer film is formed by vapor deposition polymerization of the raw material monomer from the evaporation source or the evaporation port. What is claimed is: 1. A film forming apparatus in which a shutter is provided between the evaporation source or the evaporation port and the substrate, the shutter being a rollable shutter.