JPH0481802A - Vapor deposition method and optical jig for vapor deposition - Google Patents
Vapor deposition method and optical jig for vapor depositionInfo
- Publication number
- JPH0481802A JPH0481802A JP2196062A JP19606290A JPH0481802A JP H0481802 A JPH0481802 A JP H0481802A JP 2196062 A JP2196062 A JP 2196062A JP 19606290 A JP19606290 A JP 19606290A JP H0481802 A JPH0481802 A JP H0481802A
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- optical
- density
- jig
- mesh
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007740 vapor deposition Methods 0.000 title claims abstract description 63
- 230000003287 optical effect Effects 0.000 title claims abstract description 49
- 238000000034 method Methods 0.000 title claims description 16
- 239000000463 material Substances 0.000 claims abstract description 10
- 230000000295 complement effect Effects 0.000 claims abstract description 4
- 238000000151 deposition Methods 0.000 claims description 12
- 230000008021 deposition Effects 0.000 claims description 12
- 238000009826 distribution Methods 0.000 claims description 7
- 238000001704 evaporation Methods 0.000 claims description 6
- 230000008020 evaporation Effects 0.000 claims description 6
- 239000010409 thin film Substances 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 238000007738 vacuum evaporation Methods 0.000 claims description 3
- 238000001259 photo etching Methods 0.000 claims description 2
- 239000000945 filler Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 19
- 238000005259 measurement Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 241000269851 Sarda sarda Species 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000009828 non-uniform distribution Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、平面あるいは球面を有する光学部品に均一
な蒸着物質の分布を施す蒸着方法および蒸着用光学治具
に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a vapor deposition method for uniformly distributing a vapor deposition substance onto an optical component having a flat or spherical surface, and an optical jig for vapor deposition.
最近、カラーテレビジョン受像機はその普及に伴って様
々な形態に展開している。 大型画面を有する受像機も
その一つであって、大型のブラウン管にカラー画像を再
生するものあるいは小型のブラウン管上の再生像を光学
系によってスクリーンに拡大投影するものなど商品とし
て種々のものが開発されている。 カラーテレビジョン
受像機には通常光、緑および青の色成分光を各々分担す
る3本の受像管を用意され、その各々の受像管にはいわ
ゆる電子管に対してガラス製の凸面を備えた光学ガラス
にダイクロイック膜と呼ばれる光学薄膜、光導電膜およ
びAI膜を積層配置したものが取す付けられている。
これらの積層膜は、いずれも電気的あるいは光学的に均
質であることが要求され、特に凸面上に形成されるダイ
クロイック膜は、その凸面形状のどの部分においても光
学的に同一のスペクトラル特性を有していることが必要
である。 しかしながらこのような凸面形状のガラスに
光学的に均質にダイクロイック膜を付着形成するのには
、大きな問題点がある。 すなわち、必要な光学薄膜を
形成する蒸着物質を保持するほぼ点状の蒸着源から萎発
させられる蒸着物質の蒸着装置内での分布が位置的ある
いは面積的に非均−であることから生じ、るダイクロイ
ック膜の光学的透過特性あるいは反射特性の非均一性で
ある。Recently, color television receivers have been developed into various forms as they have become popular. Television receivers with large screens are one of these, and various products have been developed, including those that reproduce color images on large cathode ray tubes and those that enlarge and project the reproduced image on a small cathode ray tube onto a screen using an optical system. has been done. A color television receiver is equipped with three picture tubes that share normal light, green and blue color component light, and each picture tube has an optical tube with a glass convex surface in contrast to the so-called electron tube. A layered structure of an optical thin film called a dichroic film, a photoconductive film, and an AI film is attached to the glass.
All of these laminated films are required to be electrically or optically homogeneous, and in particular, dichroic films formed on convex surfaces must have optically the same spectral characteristics in any part of the convex surface. It is necessary to do so. However, there are major problems in forming a dichroic film optically uniformly on such convex glass. That is, it occurs because the distribution of the vapor deposition material within the vapor deposition apparatus, which is atrophied from the substantially point-like vapor deposition source that holds the vapor deposition material that forms the necessary optical thin film, is non-uniform in terms of position or area. This is the non-uniformity of the optical transmission or reflection properties of dichroic films.
これを解決するために選択的に蒸着密度を変化させる方
法が種々考えられている。 例えば均一性を得るために
蒸着源と蒸着面との間に蒸着装置のいわゆるドームとは
別個に蒸着密度配分用のフィルタを配置するもの、遊星
歯車機構の原理を用いた蒸着密度を制御するものなどが
それである。In order to solve this problem, various methods have been considered for selectively changing the deposition density. For example, in order to obtain uniformity, a filter for distributing the deposition density is placed between the deposition source and the deposition surface separately from the so-called dome of the deposition apparatus, and methods that control the deposition density using the principle of a planetary gear mechanism. etc.
しかしながら、いずれのやり方も機構が複雑でコスト高
になるにもかかわらず効果が少なく、製造適性の高い蒸
着方法あるいは蒸着用の治具は未だ提案されていない。However, both methods have complicated mechanisms and high costs, but are ineffective, and no vapor deposition method or vapor deposition jig with high manufacturing suitability has been proposed yet.
この発明はこのような従来技術の欠点を鑑みてなされた
ものであって、簡単な構成でコスト適性も製造適性も究
めて高い蒸着方法および蒸着用の治具を提供することを
課題とするものである。This invention has been made in view of the shortcomings of the prior art, and it is an object of the present invention to provide a vapor deposition method and a vapor deposition jig that have a simple structure, are highly cost-effective, and have excellent manufacturing suitability. It is.
この発明はこのような課題の解決を行うために球面ある
いは平面を備える光学部品を真空蒸着装置内に配置し、
蒸着源と光学部品との間に位置的に密度の変化する網目
状のフィルタからなる光学治具を取り付け、蒸着を行う
ようにする方法を取るものである。In order to solve these problems, the present invention arranges an optical component with a spherical or flat surface in a vacuum evaporation apparatus,
In this method, an optical jig consisting of a mesh filter whose density varies depending on the position is attached between the vapor deposition source and the optical component, and vapor deposition is performed.
またこの方法を実施するために球面あるいは平面を備え
る光学部品と、必要な光学薄膜を形成する蒸着物質を保
持する蒸着源と、および、この蒸着源から所定の距離を
置いて配置され光学部品を保持する装置とを配置した蒸
着装置に、この光学部品保持装置に隣接して蒸着源から
の蒸着物質の付着分布を制御する位置的に密度の変化す
る網目状のフィルタからなる光学治具を取り付けた蒸着
用光学治具を用いる。 さらにこの方法を実施するに当
たって網目状のフィルタの密度を蒸着装置内での蒸着物
質の分布密度と相補的関係を生じるような分布に形成す
ることによってさらに精度の高い蒸着を行うことができ
るようになる。In addition, in order to carry out this method, an optical component having a spherical or flat surface, a deposition source that holds a deposition material for forming the necessary optical thin film, and an optical component placed at a predetermined distance from the deposition source are provided. An optical jig consisting of a mesh filter whose density varies depending on the position is attached adjacent to the optical component holding device to the vapor deposition device in which the holding device is arranged. An optical jig for vapor deposition is used. Furthermore, when carrying out this method, the density of the mesh filter is formed in a distribution that is complementary to the distribution density of the vapor deposition substance within the vapor deposition apparatus, thereby making it possible to perform vapor deposition with even higher precision. Become.
以下添付図面に示す実施例に従ってこの発明の詳細な説
明する。The present invention will be described in detail below according to embodiments shown in the accompanying drawings.
第1図は、蒸着を施すべき光学部品と、光学治具とが、
蒸着装置のドーム内に組合せられて配置された状態を示
す。 図において、1は光学部品、2は光学部品の凸面
状の蒸着面、3は光学部品lを保持する治具である。
この保持治具3には網目状フィルタ取り付は金具4が連
結固定され、網目状フィルタ5が蒸着面2に対して一定
の間隔を置いて配置される。FIG. 1 shows an optical component to be vapor-deposited and an optical jig.
A state in which they are combined and arranged in a dome of a vapor deposition apparatus is shown. In the figure, 1 is an optical component, 2 is a convex vapor deposition surface of the optical component, and 3 is a jig for holding the optical component l.
A metal fitting 4 for attaching a mesh filter is connected and fixed to this holding jig 3, and a mesh filter 5 is arranged at a constant distance from the vapor deposition surface 2.
第2図は網目状フィルタ3の平面図であって、図示のよ
うに中心おいて密で周辺において粗となるような網目構
造を有している。 このようなフィルタは例えば鉄系の
合金を写真腐食することによって比較的簡単に準備する
ことができる。FIG. 2 is a plan view of the mesh filter 3, which has a mesh structure that is dense at the center and coarser at the periphery as shown. Such a filter can be prepared relatively easily, for example, by photo-etching an iron-based alloy.
以上のような組立体は第3図に示すようにドーム6に取
り付けられ、このドーム6はさらに真空蒸着装置の1着
槽7内に取り付けられる。 蒸着槽7は周知の構成であ
るので図示を省略しであるが、この蒸着装置が装備して
いる排気機構、加熱機構およびドーム6の回転駆動機構
を用いて、圧力、温度およびドーム回転数を必要な一定
条件に設定し、蒸着源8から光学部品lに要求される光
学特性を与える干渉膜を形成する蒸着材料が定められた
蒸着温度により蒸着を行うものである。The assembly as described above is attached to a dome 6 as shown in FIG. 3, and this dome 6 is further attached to a first deposition tank 7 of a vacuum evaporation apparatus. The vapor deposition tank 7 has a well-known configuration and is not shown in the drawings, but the pressure, temperature, and dome rotation speed are controlled using the exhaust mechanism, heating mechanism, and rotation drive mechanism of the dome 6 that are equipped with this vapor deposition apparatus. Necessary constant conditions are set, and a vapor deposition material that forms an interference film that provides the optical characteristics required for the optical component 1 is vapor-deposited from the vapor deposition source 8 at a predetermined vapor deposition temperature.
このような構成によって蒸着が実施されるとき、上述し
たような構成の網目フィルタ5の働きで、蒸着面2に付
着する膜厚は網目の密度に応じて変化する、すなわち、
網目の密度と相捕的な関係を有する厚さに付着する。When vapor deposition is performed with such a configuration, the thickness of the film deposited on the vapor deposition surface 2 changes depending on the mesh density due to the function of the mesh filter 5 having the above-described structure, that is,
It adheres to a thickness that has a complementary relationship with the mesh density.
網目フィルタ5は次のようにして製作される。The mesh filter 5 is manufactured as follows.
まず網目フィルタを使用しない状態で干渉膜を形成し、
第4図に示す位置lO〜15の分光透過率を測定する。First, an interference film is formed without using a mesh filter,
The spectral transmittance at positions lO to 15 shown in FIG. 4 is measured.
第5図が測定結果である。 この測定結果から各位置
の一定の透過率を有する波長域を探すと第6図のように
なる。 中央10が最も長波長であり、周辺位置に向か
って短波長になる。。Figure 5 shows the measurement results. If a wavelength range having a constant transmittance at each position is searched from the measurement results, the result will be as shown in FIG. The wavelength is the longest at the center 10 and becomes shorter toward the peripheral positions. .
これは中央に向かって膜厚が漸次厚くなっていることを
意味している。 これを均一にするにハ膜ニー′:′−
も薄い位置を基準として膜厚の厚くなる位置にむかって
膜の付着が漸次薄くなるようにこの網目フィルタの密度
を変えて行くことである。This means that the film thickness gradually increases toward the center. To make this uniform, it is necessary to apply a film ′:′−
The density of this mesh filter is changed so that the film adhesion becomes gradually thinner from the position where the film is thinner to the position where the film becomes thicker.
これを勘案して、各位置に対応する蒸着面の面積と網口
フィルタの対応部分の面積との比を変化させて(第7図
、フィルタ率と定義する)、このようなフィルタ率の分
布密度を有する網目フィルタを製作することによって、
上述したように蒸着すれば所望の均一な蒸着物質の分布
を有する光学部品を得ることが可能になる。Taking this into consideration, the ratio of the area of the evaporation surface corresponding to each position to the area of the corresponding part of the mesh filter is changed (Fig. 7, defined as filter ratio), and such a distribution of filter ratio is obtained. By manufacturing a mesh filter with density,
By performing the vapor deposition as described above, it is possible to obtain an optical component having a desired uniform distribution of the vapor-deposited substance.
第8図が、第7図のフィルタ率により設計した網目フィ
ルタである。 第9図がこのフィルタによって得られた
蒸着膜の第6図に相当する位置と一定透過率を有する波
長域とを示す図である。FIG. 8 shows a mesh filter designed using the filter ratio shown in FIG. FIG. 9 is a diagram showing the positions of the vapor deposited film obtained by this filter corresponding to FIG. 6 and the wavelength range having a constant transmittance.
以上詳しく述べたようにこの発明によれば、蒸着源と蒸
着面との間に位置的に密度の変化する網目状のフィルタ
からなる光学治具を取り付は蒸着を行うようにしたので
、蒸着装置内での蒸着物質の分布が位置的あるいは面積
的に非均−であることから生じる蒸着膜の光学的な透過
特性あるいは反射特性の非均一性を完全に解消した蒸着
膜を製作することができ、低コストで製造適性の高い蒸
方法あるいは蒸着用の治具の提供が可能となる。As described in detail above, according to the present invention, an optical jig consisting of a mesh filter whose density varies depending on the position is attached between the evaporation source and the evaporation surface, so that the evaporation can be carried out. It is possible to produce a vapor deposited film that completely eliminates non-uniformity in the optical transmission characteristics or reflection characteristics of the vapor deposited film, which is caused by non-uniform distribution of the vapor deposited substance in the device in terms of position or area. This makes it possible to provide a low-cost, highly manufacturable vaporization method or a vaporization jig.
第1図はこの発明の方法および装置に用いる蒸着装置内
に配置される蒸着用の治具と、光学部品との組立体の断
面図、第2図は網目フィルタの平面図、第3図は蒸着膜
にのドームの概略の側面図、第4図は光学部品の測定点
を示す平面図、第5図は分光透過率の測定結果を示す図
、第6図は各測定位置における一定透過率を示す波長域
を示す図、第7図はフィルタ率を示す図、第8図はこの
発明による方法を実施するための網目フィルタの平面図
、および、第9図はフィルタ率を変化させたときに得ら
れる第5図に対応する波長域を位置との関係で示す図で
ある。 l・・光学部品、2・・蒸着面、3・・保持
治具、4・・網目状フィルタ取り付は金具、5・・網目
状フィルタ5.6・・ドーム、7・・蒸着槽、8・・蒸
着源、10〜15・・光学部品上の測定点。
7000鵠m
(鰹略)
+h=e〜冊)
手続補正書、方式、
平成2年11月 口
特許庁長官 植松 敏 殿平成。年1、月。7日差1
1、事件の表示
平成2年特許願第196062号
2、発明の名称
蒸着方法および蒸着用光学治具
3補正をする者
事件との関係 特許出願人
4、補正命令の日付
平成2年10月150
平成2年10月30口(発送日)
6゜
補正の内容FIG. 1 is a sectional view of an assembly of a vapor deposition jig and optical components arranged in a vapor deposition apparatus used in the method and apparatus of the present invention, FIG. 2 is a plan view of a mesh filter, and FIG. Figure 4 is a schematic side view of the dome on the vapor deposited film, Figure 4 is a plan view showing the measurement points of optical components, Figure 5 is a diagram showing the measurement results of spectral transmittance, and Figure 6 is the constant transmittance at each measurement position. FIG. 7 is a diagram showing the filter rate, FIG. 8 is a plan view of a mesh filter for carrying out the method according to the present invention, and FIG. 9 is a diagram showing the filter rate when the filter rate is changed. FIG. 6 is a diagram showing the wavelength range corresponding to FIG. 5 obtained in relation to position. l...Optical parts, 2...Vapour deposition surface, 3...Holding jig, 4...Metal fittings for mesh filter installation, 5...Mesh filter 5.6...Dome, 7...Vapor deposition tank, 8 ... Vapor deposition source, 10-15... Measurement point on the optical component. 7000 鵠m (bonito omitted) +h=e~book) Procedural amendment, method, November 1990 Director General of the Japan Patent Office Satoshi Uematsu Tono Heisei. Year 1, month. 7 days difference 1
1. Indication of the case Patent Application No. 196062 of 1990 2. Name of the invention Vapor deposition method and optical jig for vapor deposition 3. Person making the amendment Relationship to the case Patent applicant 4. Date of amendment order October 150, 1990 October 1990 30 units (shipment date) 6° correction details
Claims (4)
装置内に配置し、蒸着源と光学部品との間に位置的に密
度の変化する網目状のフィルタからなる光学治具を取り
付け、蒸着を行うようにした蒸着方法。(1). An optical component with a spherical or flat surface is placed in a vacuum evaporation device, and an optical jig consisting of a mesh filter whose density changes depending on the position is attached between the evaporation source and the optical component to perform evaporation. Vapor deposition method.
光学薄膜を形成する蒸着物質を保持する蒸着源と、およ
び、この蒸着源から所定の距離を置いて配置され光学部
品を保持する装置とを配置した蒸着装置において、この
光学部品保持装置に隣接して蒸着源からの蒸着物質の付
着分布を制御する密度の変化する網目状のフィルタから
なる光学治具を取り付けた蒸着用光学治具。(2). A vapor deposition system that includes an optical component having a spherical or flat surface, a vapor deposition source that holds a vapor deposition material that forms a necessary optical thin film, and a device that is placed at a predetermined distance from the vapor deposition source and that holds the optical component. In the apparatus, an optical jig for vapor deposition is attached adjacent to the optical component holding device, and an optical jig consisting of a mesh-like filter having a variable density for controlling the deposition distribution of the vapor deposition material from the vapor deposition source is attached.
物質の分布密度と相補的関係を生じるような分布に形成
することによって光学部品の前記面上に蒸着物質が光学
的に均一付着するように前記密度を変化させて特許請求
の範囲第2項に記載の蒸着用光学治具。(3). By forming the density of the mesh filter to have a distribution that is complementary to the distribution density of the vapor deposition material in the vapor deposition apparatus, the vapor deposition material is optically uniformly deposited on the surface of the optical component. The optical jig for vapor deposition according to claim 2, wherein the density is changed.
した特許請求の範囲第3項に記載の蒸着方法。(4). 4. The vapor deposition method according to claim 3, wherein the mesh is created by metal photoetching.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19606290A JP3259914B2 (en) | 1990-07-25 | 1990-07-25 | Method for manufacturing mesh filter for forming interference film and apparatus for forming interference film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19606290A JP3259914B2 (en) | 1990-07-25 | 1990-07-25 | Method for manufacturing mesh filter for forming interference film and apparatus for forming interference film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0481802A true JPH0481802A (en) | 1992-03-16 |
| JP3259914B2 JP3259914B2 (en) | 2002-02-25 |
Family
ID=16351567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19606290A Expired - Fee Related JP3259914B2 (en) | 1990-07-25 | 1990-07-25 | Method for manufacturing mesh filter for forming interference film and apparatus for forming interference film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3259914B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998052074A1 (en) * | 1997-05-16 | 1998-11-19 | Hoya Kabushiki Kaisha | Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform |
| WO1998052075A1 (en) * | 1997-05-16 | 1998-11-19 | Hoya Kabushiki Kaisha | Mechanism for imparting water repellency to both sides simultaneously |
| US6264751B1 (en) * | 1998-05-18 | 2001-07-24 | Hoya Corporation | Mechanism for performing water repellency processing on both sides simultaneously |
| JP2015136868A (en) * | 2014-01-23 | 2015-07-30 | 旭化成イーマテリアルズ株式会社 | Substrate applied to flexible electronic device having predetermined structure and method for manufacturing the same |
| WO2015158048A1 (en) * | 2014-04-17 | 2015-10-22 | 京东方科技集团股份有限公司 | Vacuum evaporation device |
| CN116641035A (en) * | 2023-07-26 | 2023-08-25 | 南京诺源医疗器械有限公司 | A coating method for laparoscopic optics |
-
1990
- 1990-07-25 JP JP19606290A patent/JP3259914B2/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998052074A1 (en) * | 1997-05-16 | 1998-11-19 | Hoya Kabushiki Kaisha | Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform |
| WO1998052075A1 (en) * | 1997-05-16 | 1998-11-19 | Hoya Kabushiki Kaisha | Mechanism for imparting water repellency to both sides simultaneously |
| US6250758B1 (en) | 1997-05-16 | 2001-06-26 | Hoya Corporation | Plastic optical devices having antireflection film and mechanism for equalizing thickness of antireflection film |
| US6264751B1 (en) * | 1998-05-18 | 2001-07-24 | Hoya Corporation | Mechanism for performing water repellency processing on both sides simultaneously |
| JP2015136868A (en) * | 2014-01-23 | 2015-07-30 | 旭化成イーマテリアルズ株式会社 | Substrate applied to flexible electronic device having predetermined structure and method for manufacturing the same |
| WO2015158048A1 (en) * | 2014-04-17 | 2015-10-22 | 京东方科技集团股份有限公司 | Vacuum evaporation device |
| CN116641035A (en) * | 2023-07-26 | 2023-08-25 | 南京诺源医疗器械有限公司 | A coating method for laparoscopic optics |
| CN116641035B (en) * | 2023-07-26 | 2023-10-13 | 南京诺源医疗器械有限公司 | Film coating method for laparoscopic optical piece |
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|---|---|
| JP3259914B2 (en) | 2002-02-25 |
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