JPH048250U - - Google Patents
Info
- Publication number
- JPH048250U JPH048250U JP4805090U JP4805090U JPH048250U JP H048250 U JPH048250 U JP H048250U JP 4805090 U JP4805090 U JP 4805090U JP 4805090 U JP4805090 U JP 4805090U JP H048250 U JPH048250 U JP H048250U
- Authority
- JP
- Japan
- Prior art keywords
- ion source
- ion
- container
- vacuum
- roy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010586 diagram Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第１図は本考案の装置の正面図、第２図は本考
案の装置の側面図、第３図は異形状のイオン源の
取り付け方法を説明する図、第４図はイオン源を
１台あるいは２２台しか使用しない場合の、イオ
ン源の取り付け方法を説明する図、第５図は排気
装置を示す図である。
１……イオン源取り付け部、２……排気部、３
……電源部、４……操作部、５……表示板、６…
…イオン源、７……電線、８……フランジ、９…
…異形状イオン源、１０……変換用フランジ、１
１……カバー、１２……容器、１３……バルブ、
１４……排気ポンプ、１５……補助ポンプ、１６
……真空ゲージ、１７……バルブ、１８……端子
。
Figure 1 is a front view of the device of the present invention, Figure 2 is a side view of the device of the present invention, Figure 3 is a diagram explaining how to attach an irregularly shaped ion source, and Figure 4 is a diagram showing one ion source. Alternatively, FIG. 5 is a diagram illustrating a method of attaching ion sources when only 22 ion sources are used, and is a diagram showing an exhaust device. 1...Ion source attachment part, 2...Exhaust part, 3
...Power supply unit, 4...Operation unit, 5...Display board, 6...
...Ion source, 7...Electric wire, 8...Flange, 9...
...Unusual shape ion source, 10...Conversion flange, 1
1...Cover, 12...Container, 13...Valve,
14...Exhaust pump, 15...Auxiliary pump, 16
...Vacuum gauge, 17...Valve, 18...Terminal.
Claims (1)
つ。 ロ イに示す容器を真空に排気できる。 ハ イオン注入機用イオン源を加熱できる。 以上のように構成された装置。[Scope of Claim for Utility Model Registration] (a) Having a container for storing an ion source for an ion implanter. The container shown in Roy can be evacuated to vacuum. Can heat the ion source for ion implanters. The device configured as described above.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4805090U JPH048250U (en) | 1990-05-08 | 1990-05-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4805090U JPH048250U (en) | 1990-05-08 | 1990-05-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH048250U true JPH048250U (en) | 1992-01-24 |
Family
ID=31564524
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4805090U Pending JPH048250U (en) | 1990-05-08 | 1990-05-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH048250U (en) |
-
1990
- 1990-05-08 JP JP4805090U patent/JPH048250U/ja active Pending