JPH0482880A - Production of glycidyl compound - Google Patents
Production of glycidyl compoundInfo
- Publication number
- JPH0482880A JPH0482880A JP2198725A JP19872590A JPH0482880A JP H0482880 A JPH0482880 A JP H0482880A JP 2198725 A JP2198725 A JP 2198725A JP 19872590 A JP19872590 A JP 19872590A JP H0482880 A JPH0482880 A JP H0482880A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- acid
- basic compound
- reaction
- carbon dioxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 glycidyl compound Chemical class 0.000 title claims description 34
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 46
- 150000007514 bases Chemical class 0.000 claims abstract description 30
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 22
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000007259 addition reaction Methods 0.000 claims abstract description 11
- 150000003944 halohydrins Chemical class 0.000 claims abstract description 11
- 239000011973 solid acid Substances 0.000 claims abstract description 11
- 238000006243 chemical reaction Methods 0.000 claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims abstract description 8
- 150000001298 alcohols Chemical class 0.000 claims abstract description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 7
- 150000001735 carboxylic acids Chemical class 0.000 claims abstract description 7
- 150000002989 phenols Chemical class 0.000 claims abstract description 6
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 6
- 150000001412 amines Chemical class 0.000 claims abstract description 5
- 238000007363 ring formation reaction Methods 0.000 claims description 17
- 230000003472 neutralizing effect Effects 0.000 abstract description 4
- 239000003795 chemical substances by application Substances 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 3
- 239000003513 alkali Substances 0.000 abstract description 2
- 229910000000 metal hydroxide Inorganic materials 0.000 abstract 1
- 150000004692 metal hydroxides Chemical class 0.000 abstract 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 20
- 238000000034 method Methods 0.000 description 15
- 239000002904 solvent Substances 0.000 description 13
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 12
- 239000000047 product Substances 0.000 description 11
- 239000004593 Epoxy Substances 0.000 description 10
- 230000018044 dehydration Effects 0.000 description 10
- 238000006297 dehydration reaction Methods 0.000 description 10
- 238000003756 stirring Methods 0.000 description 10
- 239000000460 chlorine Substances 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- 229910052801 chlorine Inorganic materials 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- 238000001914 filtration Methods 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 238000005406 washing Methods 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 229910052500 inorganic mineral Inorganic materials 0.000 description 6
- 239000011707 mineral Substances 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 229910052708 sodium Inorganic materials 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000006386 neutralization reaction Methods 0.000 description 5
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 4
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 4
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229930185605 Bisphenol Natural products 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000004807 desolvation Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- FKBMTBAXDISZGN-UHFFFAOYSA-N 5-methyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)CCC2C(=O)OC(=O)C12 FKBMTBAXDISZGN-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910015900 BF3 Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical class NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- 239000012267 brine Substances 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 235000011089 carbon dioxide Nutrition 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 238000003776 cleavage reaction Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 150000007517 lewis acids Chemical class 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 239000003444 phase transfer catalyst Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- OBETXYAYXDNJHR-SSDOTTSWSA-M (2r)-2-ethylhexanoate Chemical compound CCCC[C@@H](CC)C([O-])=O OBETXYAYXDNJHR-SSDOTTSWSA-M 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- DEWLEGDTCGBNGU-UHFFFAOYSA-N 1,3-dichloropropan-2-ol Chemical compound ClCC(O)CCl DEWLEGDTCGBNGU-UHFFFAOYSA-N 0.000 description 1
- PMUPSYZVABJEKC-UHFFFAOYSA-N 1-methylcyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1(C)CCCCC1C(O)=O PMUPSYZVABJEKC-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- XQQZRZQVBFHBHL-UHFFFAOYSA-N 12-crown-4 Chemical compound C1COCCOCCOCCO1 XQQZRZQVBFHBHL-UHFFFAOYSA-N 0.000 description 1
- VFTFKUDGYRBSAL-UHFFFAOYSA-N 15-crown-5 Chemical compound C1COCCOCCOCCOCCO1 VFTFKUDGYRBSAL-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- VVHFXJOCUKBZFS-UHFFFAOYSA-N 2-(chloromethyl)-2-methyloxirane Chemical compound ClCC1(C)CO1 VVHFXJOCUKBZFS-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical class C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- WXQZLPFNTPKVJM-UHFFFAOYSA-N 4-[(4-hydroxycyclohexyl)methyl]cyclohexan-1-ol Chemical compound C1CC(O)CCC1CC1CCC(O)CC1 WXQZLPFNTPKVJM-UHFFFAOYSA-N 0.000 description 1
- CDBAMNGURPMUTG-UHFFFAOYSA-N 4-[2-(4-hydroxycyclohexyl)propan-2-yl]cyclohexan-1-ol Chemical compound C1CC(O)CCC1C(C)(C)C1CCC(O)CC1 CDBAMNGURPMUTG-UHFFFAOYSA-N 0.000 description 1
- WPSWDCBWMRJJED-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]phenol;oxirane Chemical compound C1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 WPSWDCBWMRJJED-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 235000017166 Bambusa arundinacea Nutrition 0.000 description 1
- 235000017491 Bambusa tulda Nutrition 0.000 description 1
- 241001330002 Bambuseae Species 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 238000005727 Friedel-Crafts reaction Methods 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical class [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical class NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011425 bamboo Substances 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- RUOKPLVTMFHRJE-UHFFFAOYSA-N benzene-1,2,3-triamine Chemical class NC1=CC=CC(N)=C1N RUOKPLVTMFHRJE-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 150000003983 crown ethers Chemical class 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- FNTHQRXVZDCWSP-UHFFFAOYSA-N cyclohexane-1,1,2-triol Chemical compound OC1CCCCC1(O)O FNTHQRXVZDCWSP-UHFFFAOYSA-N 0.000 description 1
- PDXRQENMIVHKPI-UHFFFAOYSA-N cyclohexane-1,1-diol Chemical compound OC1(O)CCCCC1 PDXRQENMIVHKPI-UHFFFAOYSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 230000009849 deactivation Effects 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- GKIPXFAANLTWBM-UHFFFAOYSA-N epibromohydrin Chemical compound BrCC1CO1 GKIPXFAANLTWBM-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 239000010451 perlite Substances 0.000 description 1
- 235000019362 perlite Nutrition 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 125000005624 silicic acid group Chemical class 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000007614 solvation Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- 230000002485 urinary effect Effects 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D301/00—Preparation of oxiranes
- C07D301/27—Condensation of epihalohydrins or halohydrins with compounds containing active hydrogen atoms
- C07D301/28—Condensation of epihalohydrins or halohydrins with compounds containing active hydrogen atoms by reaction with hydroxyl radicals
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Epoxy Compounds (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、グリシジル化合物の製造方法、より詳しくは
、工業的に有利な方法を適用することにより高度に精製
されたグリシジル化合物を製造する方法に関する。Detailed Description of the Invention [Industrial Application Field] The present invention relates to a method for producing a glycidyl compound, more specifically, a method for producing a highly purified glycidyl compound by applying an industrially advantageous method. Regarding.
[従来の技術]
従来、グリシジル化合物は、−船釣に、以下の方法によ
り製造されていた。[Prior Art] Conventionally, glycidyl compounds have been produced by the following method.
即ち、アルコール類、フェノール類、カルボン酸類、ア
ミン類等とエピハロヒドリン類及び/又はハロヒドリン
類とを溶媒の存在下又は無溶媒下、所望により触媒の存
在下に加熱して付加反応せしめてハロヒドリン体を得、
次いで水酸化ナトリウム等の塩基性化合物を用いて脱ハ
ロゲン化水素してこれを閉環する。しかる後に、上記閉
環時に副生する塩類及び残存する塩基性化合物を水洗又
は濾別し、次いで加熱、減圧下に揮発性物質を留去して
目的物を得ていた。That is, alcohols, phenols, carboxylic acids, amines, etc. and epihalohydrins and/or halohydrins are heated in the presence of a solvent or in the absence of a solvent, optionally in the presence of a catalyst, to cause an addition reaction, thereby producing a halohydrin. Gain,
Next, dehydrohalogenation is performed using a basic compound such as sodium hydroxide to close the ring. Thereafter, the salts produced as by-products during the ring closure and the remaining basic compounds were washed with water or filtered, and volatile substances were distilled off under heating and reduced pressure to obtain the desired product.
3、発明の詳細な説明
[発明が解決しようとする課題]
しかしながら、比較的親水性が強く、水に溶解し、市る
いは水と乳化し易い性質を有するグリシジル化合物を製
造する場合には、生成したグリシジル化合物が水系で溶
解又は乳化するために従来採られていた水洗操作が困難
であり、しかも生成したグリシジル化合物が水洗水中に
溶出することにより目的物の収率が低下する。又、閉環
反応後、濾過を行っただけで脱水・脱溶媒したり、残存
する塩基性化合物が完全に水洗除去されないままに加熱
条件下で脱水・脱溶媒した場合には、グリシジル化合物
のエポキシ基と残留している塩基性化合物とが反応して
重合物が生成したりエポキシ基が開裂することにより、
最終生成物のエポキシ当量や粘度が増大して製品品質の
低下を招いていた。3. Detailed Description of the Invention [Problems to be Solved by the Invention] However, when producing a glycidyl compound that has relatively strong hydrophilic properties, dissolves in water, and easily emulsifies with water, Since the produced glycidyl compound is dissolved or emulsified in an aqueous system, the conventional water washing operation is difficult, and furthermore, the produced glycidyl compound is eluted into the washing water, resulting in a decrease in the yield of the target product. In addition, after the ring-closing reaction, if dehydration and solvent removal is performed only by filtration, or if dehydration and solvent removal is performed under heating conditions without the remaining basic compound being completely removed by water washing, the epoxy group of the glycidyl compound may be removed. By reacting with the remaining basic compound to form a polymer or cleavage of the epoxy group,
The epoxy equivalent and viscosity of the final product increased, leading to a decrease in product quality.
一方、閉環反応後、残存する塩基性化合物をリン酸や塩
酸等の鉱酸を用いて中和する方法では、製造工程が繁雑
となったり、製品品質が低下する危険性を孕んでいた。On the other hand, the method of neutralizing the remaining basic compound after the ring-closing reaction using a mineral acid such as phosphoric acid or hydrochloric acid has the risk of complicating the manufacturing process and reducing product quality.
即ち、鉱酸の添加量が多ずぎる場合、この過剰量の鉱酸
はグリシジル化合物のエポキシ基を開裂し、製品品質の
低下の原因ともなるため、残存する塩基性化合物と等当
量の鉱酸を添加する目的で塩基性化合物の残存量を事前
に測定する必要かあった。In other words, if the amount of mineral acid added is too large, this excessive amount of mineral acid will cleave the epoxy group of the glycidyl compound and cause a decrease in product quality. In order to add basic compounds, it was necessary to measure the remaining amount of basic compounds in advance.
このため、高品質のグリシジル化合物を収率良く得るこ
とを目的に、閉環反応に続く後処理技術として、残存す
る塩基性化合物を効率良く除去する方法の開発が望まれ
ていた。Therefore, with the aim of obtaining high-quality glycidyl compounds in good yields, it has been desired to develop a method for efficiently removing the remaining basic compounds as a post-treatment technique following the ring-closing reaction.
本発明者らは、斯かる問題点を解決すべく鋭意検問の結
果、下記の事実を見い出した。If]ち、(1)閉環反
応終了後、副生した塩を飽和溶解させるに必要な最少量
の水で溶解除去するか、又は当該副生塩を濾過又は遠心
分離等により除去した後、系内に二酸化炭素を導入して
系中に残存する塩基性化合物を中和処理する方法(こよ
れば、その後の脱水・脱溶媒工程時においてエポキシ当
量や粘度の増大を起こずことがない。The inventors of the present invention have conducted extensive research to solve these problems, and have discovered the following facts. (1) After the completion of the ring-closing reaction, the by-produced salt is dissolved and removed with the minimum amount of water necessary to saturately dissolve it, or the by-produced salt is removed by filtration or centrifugation, and then the system A method of neutralizing basic compounds remaining in the system by introducing carbon dioxide into the system (this method prevents an increase in epoxy equivalent and viscosity during the subsequent dehydration and solvent removal steps).
(2)二酸化炭素を使用して中和処理した場合には、過
剰の二酸化炭素を系内に導入しても、このもの自体は気
化して系外に排出されるため、製品品質の低下がほとん
ど起こらず、フェノールフタレインの呈色反応等により
中和を確認するまで二酸化炭素を導入し続ければよい。(2) When neutralizing using carbon dioxide, even if excess carbon dioxide is introduced into the system, it will vaporize and be discharged outside the system, so product quality will not deteriorate. This hardly occurs, and it is sufficient to continue introducing carbon dioxide until neutralization is confirmed by color reaction of phenolphthalein, etc.
そのため、製造工程が簡便となる。Therefore, the manufacturing process becomes simple.
(3)シリカ及びアルミナを主成分とする固体酸を用い
た吸着処理を併用することにより、中和処理後に脱水・
脱溶媒し、濾過しただけでは除去しきれない101)り
m程度の塩基性化合物を1pDm以下まで低下せしめる
ことができる。(3) By using adsorption treatment using solid acids mainly composed of silica and alumina, dehydration and
It is possible to reduce the basic compound of about 101) m, which cannot be completely removed only by desolvation and filtration, to 1 pDm or less.
本発明は、斯かる知見に基づいて完成されたもので市っ
て、比較的簡便に、かつ工業的に有利な条件下でグリシ
ジル化合物を高品質、高収率で製造し得る新規な方法を
提供することを目的とする。The present invention was completed based on this knowledge, and provides a novel method for producing glycidyl compounds with high quality and high yield under relatively simple and industrially advantageous conditions. The purpose is to provide.
[課題を解決するための手段]
本発明に係るグリシジル化合物の製造方法は、アルコー
ル類、フェノール類、カルボン酸類、アミン類から選ば
れる化合物(以下「原料■」と総称する。)とエピハロ
ヒドリン類及び/又はハロヒドリン類との付加反応(こ
より得られるハロヒドリン体を塩基性化合物の存在下に
閉環してグリシジル化合物を製造する方法において、閉
環反応終了後、
(1)当該反応系に対して二酸化炭素を導入して塩基性
化合物を中和する工程、及び
(2)シリカ及びアルミナを主成分とする固体酸を用い
て当該中和処理物中に残存する塩基性化合物を除去する
工程、
を含むことを特徴とする。[Means for Solving the Problems] The method for producing a glycidyl compound according to the present invention includes a compound selected from alcohols, phenols, carboxylic acids, and amines (hereinafter collectively referred to as "raw materials ■"), epihalohydrins, and / or addition reaction with halohydrins (in the method of producing a glycidyl compound by ring-closing the resulting halohydrin in the presence of a basic compound, after the ring-closing reaction is completed, (1) carbon dioxide is introduced into the reaction system) and (2) a step of removing the basic compound remaining in the neutralized product using a solid acid mainly composed of silica and alumina. Features.
グリシジル化合物の原料となるアルコール類としては、
ブタノール、ペンタノール、ヘキサノール、オクタツー
ル、アリルアルコール等の脂肪族モノアルコール、エチ
レングリコール、ポリエチレングリコール、プロピレン
グリコール、ボップロピレングリコール、テトラメチレ
ングリコール、ポリテトラメチレングリコール、1,5
−ベンタンジオール、3−メチル−1,5−ベンタンジ
オール、1,6〜ヘキサンジオール、グリセリン、トリ
メチロールプロパン、ペンタエリスリトール等の脂肪族
多価アルコール、シクロヘキサノール、シクロヘキサン
ジオール、1,4−シクロヘキサントリオ−ル、2,2
−ビス(4−ヒドロキシシクロヘキシル)プロパン[水
素化ヒスフエノル△]、ビス(4−ヒドロキシシクロヘ
キシル)メタン、シクロヘキサントリオール等の脂環式
アルコール、及びそれらのエチレンオキサイド、プロピ
レンオキサイド等のアルキレンオキサイド付加物、フェ
ノール類やカルボン酸類やイソシアヌル酸等のアルキレ
ンオキサイド付加物が例示される。Alcohols that are raw materials for glycidyl compounds include:
Aliphatic monoalcohols such as butanol, pentanol, hexanol, octatool, allyl alcohol, ethylene glycol, polyethylene glycol, propylene glycol, propylene glycol, tetramethylene glycol, polytetramethylene glycol, 1,5
- Aliphatic polyhydric alcohols such as bentanediol, 3-methyl-1,5-bentanediol, 1,6-hexanediol, glycerin, trimethylolpropane, pentaerythritol, cyclohexanol, cyclohexanediol, 1,4-cyclohexanetriol -le, 2,2
-Alicyclic alcohols such as bis(4-hydroxycyclohexyl)propane [hydrogenated hisphenol△], bis(4-hydroxycyclohexyl)methane, and cyclohexanetriol, and their alkylene oxide adducts such as ethylene oxide and propylene oxide, and phenol and alkylene oxide adducts such as carboxylic acids and isocyanuric acid.
フェノール類としては、フェノール、アルキルフェノー
ル、レゾルシン、ビスフェノールA等が例示される。Examples of phenols include phenol, alkylphenol, resorcinol, bisphenol A, and the like.
カルボン酸類としては、酢酸、プロピオン酸、アクリル
酸、メタクリル酸、2−エチルヘキサン酸、ラウリン酸
、ステアリン酸、オレイン酸等の炭素数1〜22の脂肪
族モノカルボン酸;シュウ酸、マロン酸、コハク酸、グ
ルタル酸、アジピン酸、セパチン酸、マレイン酸、フマ
ル酸等の脂肪族ジカルボン酸及びそれらの無水物;フタ
ル酸、イソフタル酸、プレフタル酸、トリメリソ1〜酸
、安息香酸、tert−ブヂル安息香酸等の芳香族カル
ボン酸及びそれらの無水物;ヘキサヒドロフタル酸、テ
トラヒドロフタル酸、メチルへキサヒドロフタル酸、メ
チルナ1〜ラビドロフタル酸等の脂環式カルボン酸及び
それらの無水物;イソシアヌル酸、Jチレン尿索、ヒダ
ントイン等の複素環式カルボン酸等が例示される。Examples of carboxylic acids include aliphatic monocarboxylic acids having 1 to 22 carbon atoms such as acetic acid, propionic acid, acrylic acid, methacrylic acid, 2-ethylhexanoic acid, lauric acid, stearic acid, and oleic acid; oxalic acid, malonic acid, Aliphatic dicarboxylic acids such as succinic acid, glutaric acid, adipic acid, sepatic acid, maleic acid, fumaric acid and their anhydrides; phthalic acid, isophthalic acid, prephthalic acid, trimerisolic acid, benzoic acid, tert-butylbenzoic acid Aromatic carboxylic acids such as acids and their anhydrides; Alicyclic carboxylic acids such as hexahydrophthalic acid, tetrahydrophthalic acid, methylhexahydrophthalic acid, methylna-1-rabidolphthalic acid and their anhydrides; Isocyanuric acid, Examples include heterocyclic carboxylic acids such as J tylene urinary chord and hydantoin.
アミン類とし−Cは、アニリン、アミンフェノール、ア
ルキル置換アミノフェノール、4,4−ジアミノジフェ
ニルメタン、ベンジルアミン、キシリレンジアミン、ト
リアミノベンゼン等が例示される。Examples of the amines -C include aniline, aminephenol, alkyl-substituted aminophenol, 4,4-diaminodiphenylmethane, benzylamine, xylylene diamine, and triaminobenzene.
又、エピハロヒドリン類やハロヒドリン類としては、エ
ピクロルヒドリン、エピブロムヒドリン、β−メチルエ
ピクロルヒドリン、β−メチルエピブロムヒドリン、グ
リセロール−1,3−ジクロルヒドリン等が代表例であ
って、これらは単独で又は2種以上組み合せて用いられ
る。Further, as epihalohydrins and halohydrins, epichlorohydrin, epibromhydrin, β-methylepichlorohydrin, β-methylepibromhydrin, glycerol-1,3-dichlorohydrin, etc. are representative examples, and these may be used alone or Two or more types are used in combination.
付加反応に際し、所望により触媒を用いることができる
。斯かる触媒としでは、塩化第二錫及びその水和物、三
フッ化ホウ素、三塩化ホウ素及びそれらの錯塩、フリー
デルクラフト触媒等のルイス酸、水酸化す1〜リウム、
水酸化バリウム、炭酸カリウム等のアルカリ金属又はア
ルカリ土類金属の水酸化物、炭酸塩等の塩基性化合物、
塩化テトラメチルアンモニウム、塩化ベンジルトリメデ
ルアンモニウム等の4級アンモニウム塩等の各種の化合
物が例示され、これらの触媒は、本発明方法が適用され
る原料■の種類に応じて適宜選択して用いられる。例え
ば、アルコール類に対してはルイス酸が用いられる。こ
の場合、原料中の水分は極力除去されていることが好ま
しい。又、フェノール類に対しては塩基性化合物が、カ
ルボン酸類に対しては第4級アンモニウム塩が適用され
る。In the addition reaction, a catalyst can be used if desired. Such catalysts include stannic chloride and its hydrates, boron trifluoride, boron trichloride and complex salts thereof, Lewis acids such as Friedel-Crafts catalysts, mono-lithium hydroxides,
Basic compounds such as alkali metal or alkaline earth metal hydroxides and carbonates such as barium hydroxide and potassium carbonate;
Various compounds such as quaternary ammonium salts such as tetramethylammonium chloride and benzyltrimedelammonium chloride are exemplified, and these catalysts are appropriately selected and used depending on the type of raw material (2) to which the method of the present invention is applied. . For example, Lewis acids are used for alcohols. In this case, it is preferable that moisture in the raw materials be removed as much as possible. Furthermore, basic compounds are used for phenols, and quaternary ammonium salts are used for carboxylic acids.
本発明において適用される塩基性化合物(脱ハロゲン化
水素剤)としては、ナトリウム、カリウム、マグネシウ
ム、カルシウム等のアルカリ金属やアルカリ土類金属の
水酸化物、炭酸塩、酸化物、アルコラード等が例示され
、固体又は溶液の形態で使用される。Examples of the basic compound (dehydrohalogenating agent) used in the present invention include hydroxides, carbonates, oxides, and alcolades of alkali metals and alkaline earth metals such as sodium, potassium, magnesium, and calcium. It is used in solid or solution form.
本発明において適用される二酸化炭素とは、二酸化炭素
単独又は二酸化炭素を主成分とするガスであって、より
具体的には、炭酸ガス又はドライアイス、又は空気、窒
素、アルゴン等と炭酸ガスとの混合物が例示され、本発
明所定の効果が損われない限り、二酸化炭素の形態や濃
度には特に限定されない。The carbon dioxide applied in the present invention refers to carbon dioxide alone or a gas mainly composed of carbon dioxide, and more specifically, carbon dioxide gas or dry ice, or carbon dioxide gas with air, nitrogen, argon, etc. The form and concentration of carbon dioxide are not particularly limited as long as the desired effects of the present invention are not impaired.
当該二酸化炭素の仕込み操作としては、フエノルフタレ
インの呈色反応等により中和を完了したことが確認され
るまで系内に導入し続(ブればよく、その仕込み量に関
しては、特に厳密に管理する必要はない。The carbon dioxide should be continuously introduced into the system until it is confirmed that the neutralization is completed by the color reaction of phenolphthalein, etc.; There is no need to manage it.
本発明において使用されるシリカ及びアルミナを主成分
とする固体酸とは、グリシジル化合物中に残存する塩基
性化合物を吸着除去し得るものであれば足り、具体的に
は、ベントナイ1〜、パーライト、カオリン、ゼオライ
ト、活竹白十等の天然鉱物あるいはそれらから誘導され
た類似の性質を有する他の固体ケイ酸系鉱物及び人為的
に合成された前記の天然鉱物と類似の性質を有する固体
ケイ酸系物質等が例示され、特に、合成ケイ酸アルミニ
ウム等の酸性度の高い化合物が推奨される。The solid acid mainly composed of silica and alumina used in the present invention may be one that can adsorb and remove basic compounds remaining in the glycidyl compound, and specifically, bentonite 1~, perlite, Natural minerals such as kaolin, zeolite, and live bamboo shoots, or other solid silicic acid minerals derived from them that have similar properties, and artificially synthesized solid silicic acids that have similar properties to the above-mentioned natural minerals. For example, compounds with high acidity such as synthetic aluminum silicate are recommended.
当該固体酸の好ましい添加量は、目的とするグリシジル
化合物に対して0.05〜3重量%程度である。The preferred amount of the solid acid added is about 0.05 to 3% by weight based on the target glycidyl compound.
本発明に係るグリシジル化合物は、通常、以下のように
して製造される。即ち、所定の反応器に原料T、エピハ
ロヒドリン、付加反応触媒及び所望により溶媒を適宜仕
込み、−船釣にはエピハロヒドリンの沸点以下(例えば
、エピクロルヒドリンを用いた場合には30〜100℃
程度)の加熱撹拌下に付加反応を行う。このとき、原料
■の活性水素に対するエピハロじドリノの当量比は、通
常0.8〜2程度である。又、エピハロヒドリンを大過
剰に用いてこのもの自体を反応溶媒として用いることが
できる。この反応は、通常、常圧で行われ、0.5〜6
時間程度で完結し、原料工に対応するハロヒドリン体が
得られる。The glycidyl compound according to the present invention is usually produced as follows. That is, the raw material T, epihalohydrin, addition reaction catalyst, and optionally a solvent are suitably charged into a predetermined reactor;
The addition reaction is carried out under heating and stirring at a temperature of about 100%. At this time, the equivalent ratio of epihalo didolino to active hydrogen in raw material (1) is usually about 0.8 to 2. Alternatively, epihalohydrin can be used in large excess and itself used as a reaction solvent. This reaction is usually carried out at normal pressure, with a pressure of 0.5 to 6
The process can be completed in about an hour, and a halohydrin compound compatible with raw material processing can be obtained.
次いで、このハロヒドリン体の加水分解性の塩素に対し
て、通常、1.0〜2.0倍当量程度の塩基性化合物を
添加する。このとき、閉環反応を促進させる目的で相間
移動触媒をハロヒドリン体に対して0.05〜0.5重
量%程度添加してもよい。斯かる相間移動触媒としては
、塩化ベンジルトリメチルアンモニウム、塩化テトラメ
ヂルアンーしニウム、塩化テトラエチルアン−しニウム
及びそれらの臭化物等の第4級アンモニウム塩、12ク
ラウン−4−エーテル、15−クラウン−5]ニーチル
等のクラウンエーテル等が例示される。Next, a basic compound is usually added in an amount of about 1.0 to 2.0 times equivalent to the hydrolyzable chlorine of the halohydrin. At this time, a phase transfer catalyst may be added in an amount of about 0.05 to 0.5% by weight based on the halohydrin body in order to promote the ring-closing reaction. Such phase transfer catalysts include quaternary ammonium salts such as benzyltrimethylammonium chloride, tetramethylammonium chloride, tetraethylammonium chloride and their bromides, 12-crown-4-ether, 15-crown -5] Crown ethers such as Nythyl are exemplified.
次いで、減圧−ト(通常、20mml−tg程度まで゛
)乃至常圧上、30へ一100°C程度で0.5〜6時
間かけて脱ハ[1グン化水素して閉環反応を行う。この
とき、アルカリ濃度を高く保つために水を留去してもよ
い。Next, dehydrogenation is carried out under reduced pressure (usually up to about 20 mml-tg) to normal pressure at about 30 to 100° C. for 0.5 to 6 hours to carry out a ring-closing reaction. At this time, water may be distilled off to maintain a high alkali concentration.
かくして得られたグリシジル化合物の組物に対し、必要
に応じて、系内の粘度を低下せしめる目的で反応物に対
し不活性な溶媒(例えば、ベンゼン、トルエン、キシレ
ン、ヘキサジ、ヘプタン、オクタン、メヂル」−チルケ
トン、メチルイン−ブチルケトン等)を添加し、次いで
、必要に応じて塩基性化合物や副生塩を水洗除去及び/
又は濾別する。For the glycidyl compound composition thus obtained, if necessary, a solvent inert to the reactants (for example, benzene, toluene, xylene, hexadi, heptane, octane, medyl) is added for the purpose of reducing the viscosity of the system. ”-tyl ketone, methyl in-butyl ketone, etc.), and then, if necessary, basic compounds and by-product salts are removed by washing with water and/or
Or filter it.
しかる後に、二酸化炭素を系内に導入し、残存する塩基
性化合物を中和する。After that, carbon dioxide is introduced into the system to neutralize the remaining basic compound.
中和が完了した後、加熱・減圧下に揮発性物質、具体的
には、水又は上記処理で適用した揮発性の溶媒等を留去
する。この操作を施すことにより、引続いて適用する固
体酸の失活化を回避することができる。After neutralization is completed, volatile substances, specifically water or the volatile solvent applied in the above treatment, are distilled off under heating and reduced pressure. By carrying out this operation, it is possible to avoid deactivation of the subsequently applied solid acid.
次いで、上記の系にシリカ・アルミナ系固体酸を所定量
添加し、通常、50〜100’Cの温度条件下、好まし
くは3〜20mml−1g程度の減圧下で約30分間程
度撹拌する。この過程において、前記工程において中和
しきれずに、尚、残存する微量の塩基性化合物が当該固
体酸に吸着される。その後、系を濾過又は遠心分離して
固形物を回収、除去し、高度に精製されたグリシジル化
合物を高収率で得る。Next, a predetermined amount of a silica-alumina solid acid is added to the above system, and the mixture is stirred for about 30 minutes, usually at a temperature of 50 to 100'C, preferably under reduced pressure of about 3 to 20 mml-1g. In this process, a trace amount of the basic compound that remains after being neutralized in the above step is adsorbed by the solid acid. Thereafter, the system is filtered or centrifuged to recover and remove solids, yielding a highly purified glycidyl compound in high yield.
閉環反応後、二酸化炭素を導入して中和することなく、
加熱、減圧下に弱水・脱溶媒した場合には、エポキシ基
の重合や開裂等を起こし、最終製品のエポキシ当量や粘
度が増大する。一方、本発明に係る固体酸による吸着処
理を併用しない場合や弱水・脱溶媒の前に当該固体酸を
仕込んだ場合には、10ppm程度の塩基性化合物が残
留して本発明所定の効果を得ることが困難で必る。After the ring-closing reaction, without introducing carbon dioxide for neutralization,
If the solvent is removed with weak water under heating or reduced pressure, polymerization or cleavage of epoxy groups will occur, increasing the epoxy equivalent and viscosity of the final product. On the other hand, when the adsorption treatment with the solid acid according to the present invention is not used together, or when the solid acid is charged before weak water and desolvation, about 10 ppm of the basic compound remains and the desired effect of the present invention is not achieved. It is difficult to obtain.
[実施例] 以下に実施例を掲げ、本発明の詳細な説明する。[Example] The present invention will be described in detail below with reference to Examples.
尚、各個における評価方法は以下の通りである。The evaluation method for each item is as follows.
エポキシ当量・・・過塩素酸法による。Epoxy equivalent: Based on perchloric acid method.
有機塩素含量・・・ポルハルト(volhard)法に
よる。Organic chlorine content: Based on Volhard method.
粘度(25°C)・・・B型回転粘度計による。Viscosity (25°C): Based on a B-type rotational viscometer.
ナトリウム含量・・・突先分析法による。Sodium content: Based on tip analysis method.
実施例1
回転式撹拌装置、デカンタ、温度計及びガス導入管を備
えた反応器に1へりメチロールプロパン134g(1.
0モル)、キシレン4. 1 9を仕込み、100’C
、減圧下に1時間脱水し、その後、100°Cl2Om
mHgで20分間脱キシレンヲ行った(原料の前処理工
程)。60°Cまで冷却後、三フッ化ホウ素エーテル錯
塩4,3Jを添加し、エピクロルヒドリン27i (3
,0モル)を60°Cで゛1時間かけて滴下し、更に3
0分間撹拌を続け、付加反応を終了した(付加反応工程
)。Example 1 Into a reactor equipped with a rotary stirrer, a decanter, a thermometer and a gas inlet tube, 134 g of methylolpropane (1.
0 mol), xylene 4. 1 Prepare 9, 100'C
, dehydrated under reduced pressure for 1 hour, then 100°Cl2Om
Dexylene was removed at mHg for 20 minutes (raw material pretreatment step). After cooling to 60°C, 4.3 J of boron trifluoride ether complex salt was added, and epichlorohydrin 27i (3
, 0 mol) was added dropwise at 60°C over 1 hour, and then
Stirring was continued for 0 minutes to complete the addition reaction (addition reaction step).
次いで、40’Cまで冷却後、固体の水酸化ナトリウム
120びを40°C130分間で添加し、40°C11
時間撹拌を続けて閉環反応を終了した(閉環反応工程)
。副生じた塩化ナトリウム及び未反応の固体の水酸化ナ
トリウムを濾別した後、40°Cで、フェノールツタレ
インにより濾液が赤色を早さなくなるまで(約10分間
)炭酸ガスを吹込んで、濾液中に水溶液の形態で残存す
る水酸化ナトリウムを中和した(中和工程)。更に、8
0’Cl3mmHgで2時間脱水・脱溶媒した。その後
、キョーワード7003N(Fg、和化学工業■製合成
ケイ酸アルミニウム)3びを添加し、80°C13+n
m1−10で30分間撹拌した後、固形物を濾別した(
精製工程)。その結果、エポキシ当@122、有機塩素
含量7.0%、25°Cにあける粘度(以下同様)11
0cpを有する目的とするトリメチロールプロパンポリ
グリシジルエーテル301 g(収率99.7%)を得
た。尚、当該グリシジル化合物中のナトリウム含量は、
検出限界(0,1p pm、以下同様)以下であった。Then, after cooling to 40°C, 120 g of solid sodium hydroxide was added at 40°C for 130 minutes, and the temperature was increased to 11°C at 40°C.
The ring-closing reaction was completed by continuing stirring for a certain period of time (ring-closing reaction step).
. After filtering out by-produced sodium chloride and unreacted solid sodium hydroxide, carbon dioxide gas was bubbled into the filtrate at 40°C until the filtrate stopped turning red due to phenoltutalein (about 10 minutes). The remaining sodium hydroxide in the form of an aqueous solution was neutralized (neutralization step). Furthermore, 8
Dehydration and solvent removal were performed for 2 hours with 0'Cl 3 mmHg. After that, 3 parts of Kyoward 7003N (Fg, synthetic aluminum silicate manufactured by Wa Kagaku Kogyo ■) was added and heated at 80°C13+n.
After stirring for 30 minutes at m1-10, the solid matter was filtered out (
purification process). As a result, the epoxy weight was 122, the organic chlorine content was 7.0%, and the viscosity at 25°C was 11.
301 g (yield 99.7%) of the target trimethylolpropane polyglycidyl ether having 0 cp was obtained. In addition, the sodium content in the glycidyl compound is
It was below the detection limit (0.1 ppm, the same applies hereinafter).
実施例2
実施例1と同様の反応器にビスフェノールAエヂレンオ
キサイド6モル付加体4929 (″1.0モル)、キ
シレン769を仕込み、100’C,減圧下に1時間脱
水した。80°Cまで冷却後、塩化第二錫5水和物3,
29を添加し、エピクロルヒドリン’194y (2,
1モル)を80’(、,30分間かりで滴下し、更に1
00°Cで30分間撹拌を続け、付加反応を終了した。Example 2 A 6-mol adduct of bisphenol A ethylene oxide 4929 (''1.0 mol) and xylene 769 were charged into the same reactor as in Example 1, and dehydrated at 100'C for 1 hour under reduced pressure.80°C. After cooling to, stannic chloride pentahydrate 3,
29 and epichlorohydrin '194y (2,
1 mol) was added dropwise over 80'(,,30 minutes, and then 1 mol)
Stirring was continued for 30 minutes at 00°C to complete the addition reaction.
次いで、80℃まで冷却後、塩化ベンジル1−リメチル
アンモニウム0.79を添加後、50%水酸化す1〜リ
ウム水溶液1779を80’C,30分間で添加し、8
0°(。Then, after cooling to 80°C, 0.79% of benzyl 1-limethylammonium chloride was added, and 1779% of a 50% aqueous solution of 1-lium hydroxide was added at 80°C for 30 minutes.
0°(.
2時間撹拌を続ct ′C閉環反応を終了した。蒸留水
2507を仕込み、60’C130分間撹拌して副生じ
た塩化ナトリウムを溶解させた後、静置して塩水層を除
去し、油層がフェノールフタレインにより赤色を早さな
くなるまで(約10分間)炭酸ガスを吹込んで残存する
水酸化ナトリトウムを中和した。更に、120’C,3
m1lll−illで2時間脱水・月凭溶媒後、キョー
ワード7003Nを39添加し、80’C13朋Hgで
30分間撹拌した。その後、濾過してエポキシ当量36
5、有機塩素含量1.7%、粘度11000Pを有する
ビスフェノール△・エチレンオキサイド6モル付加体の
グリシジルエーテル6019(収率98.6%)を得た
。尚、当該グリシジル化合物中のナトリウム含量は、検
出限界以下であった。Stirring was continued for 2 hours to complete the ct'C ring closure reaction. Add distilled water 2507 and stir for 130 minutes at 60'C to dissolve the by-produced sodium chloride. Leave to stand to remove the brine layer, and stir until the oil layer stops turning red due to phenolphthalein (about 10 minutes). ) The remaining sodium hydroxide was neutralized by blowing in carbon dioxide gas. Furthermore, 120'C, 3
After 2 hours of dehydration and solvation in mlll-ill, 39 g of Kyoward 7003N was added, and the mixture was stirred at 80'C13 Hg for 30 minutes. After that, it is filtered and the epoxy equivalent is 36.
5. Glycidyl ether 6019 (yield 98.6%), which is a 6 mole adduct of bisphenol Δ/ethylene oxide, having an organic chlorine content of 1.7% and a viscosity of 11000P was obtained. Note that the sodium content in the glycidyl compound was below the detection limit.
実施例3
実施例1と同様の反応器に4−メチルへキサヒドロ無水
フタル酸161(1モル)、エピクロルヒドリン250
s (2,7モル)、塩化テトラメチルアンモニウム3
.3g、蒸留水30SJを仕込み、80’Cで5時間撹
拌して付加反応を終了した後、1〜ルエン149qを添
加した。次いで、80°C12時間かけて45%水酸化
ナトリウム水溶液213Jを滴下しつつ共沸脱水を行い
、閉環反応を終了した。その後、閉環反応物がフェノー
ルフタレインにより赤色を早さなくなるまでドライアイ
スを添加しつつ、40°Cにて撹拌を行い、残存する水
酸化ナトリウムを中和した。更に、120’CC13m
1llHで2時間脱水・脱溶媒した後、キョーワード7
00SNを33添加して、80’C。Example 3 In a reactor similar to Example 1, 161 (1 mol) of 4-methylhexahydrophthalic anhydride and 250 mol of epichlorohydrin were added.
s (2,7 mol), tetramethylammonium chloride 3
.. 3g of distilled water and 30SJ of distilled water were charged, and after stirring at 80'C for 5 hours to complete the addition reaction, 1 to 149q of toluene were added. Next, azeotropic dehydration was performed while dropping 213 J of a 45% sodium hydroxide aqueous solution over 12 hours at 80° C. to complete the ring-closing reaction. Thereafter, the remaining sodium hydroxide was neutralized by stirring at 40° C. while adding dry ice until the ring-closing reaction product stopped turning red quickly due to phenolphthalein. Furthermore, 120'CC13m
After dehydration and solvent removal for 2 hours at 1llH, Kyoward 7
Add 33 ml of 00SN and heat to 80'C.
3m1llHOで30分間撹拌した。その後、濾過して
エポキシ当量171、有機塩素含!0.6%、粘度52
0CPを有する4−メチルへキサヒドロ無水フタル酸ジ
グリシジルエステル2989 (収率93.3%)を得
た。尚、当該グリシジル化合物中のナトリウム含量は、
検出限界以下であった。Stirred with 3ml HO for 30 minutes. After that, it is filtered and has an epoxy equivalent of 171 and contains organic chlorine! 0.6%, viscosity 52
4-Methylhexahydrophthalic anhydride diglycidyl ester 2989 (yield 93.3%) having 0CP was obtained. In addition, the sodium content in the glycidyl compound is
It was below the detection limit.
比較例1
炭酸ガスの吹き込みを行わない他は実施例1に準じて処
理したところ、目的とする1〜リメチロルプロパンポリ
グリシジルエーテルが291g(収率96.4%)得ら
れた。因みに、このもののエポキシ当量は190、有機
塩素含量は6.9%、粘度は2200 Pであった。Comparative Example 1 The same procedure as in Example 1 was carried out except that carbon dioxide gas was not blown in, and 291 g (yield: 96.4%) of the desired 1-limethylolpropane polyglycidyl ether was obtained. Incidentally, the epoxy equivalent of this product was 190, the organic chlorine content was 6.9%, and the viscosity was 2200 P.
比較例2
炭酸ガスの吹き込みを行わない他は実施例2に準じて反
応し、閉環反応後、フェノールフタレインにより赤色を
早さなくなるまで水洗を繰り返して残存する水酸化す1
〜リウムを除去したが、2回目以降の水洗操作において
、油層の乳化が著しく、水層の分離に長時間を要した。Comparative Example 2 The reaction was carried out in the same manner as in Example 2, except that carbon dioxide gas was not blown in. After the ring-closing reaction, water washing was repeated until the red color was no longer caused by phenolphthalein, and the remaining hydroxide 1
Although the lithium was removed, the oil layer was significantly emulsified in the second and subsequent water washing operations, and it took a long time to separate the water layer.
更に、120’C13m+u日(1,2時間脱水・脱溶
媒した後、濾過したところ、目的とするビスフェノール
△・エチレンオキサイド6モル付加体のジグリシジルエ
ーテルが56b’j (収率92.7%)得られた。因
みに、このもののエポキシ当量は364、有機塩素含量
は1.8%、粘度は1080CPで必った。Further, 120'C13m+u days (1 to 2 hours of dehydration and desolvation, then filtration revealed that the target diglycidyl ether of bisphenol△・ethylene oxide 6 moles adduct was 56b'j (yield 92.7%) Incidentally, this product had an epoxy equivalent of 364, an organic chlorine content of 1.8%, and a viscosity of 1080CP.
比較例3
炭酸ガスの吹き込みを行わない他は実施例3に準じて反
応し、閉環反応後、フェノールフタレインにより赤色を
甲ざなくなるまで水洗を繰り返して残存する水酸化ナト
リウムを除去した。更に、120’C,3mm1−1(
] 、2時間fB2水・脱溶媒した後、濾過したところ
、目的とするメチルへキサヒドロ無水フタル酸ジグリシ
ジル丁スプル254g(収率79.4%)が得られた。Comparative Example 3 The reaction was carried out in the same manner as in Example 3, except that carbon dioxide gas was not blown in. After the ring-closing reaction, the remaining sodium hydroxide was removed by repeatedly washing with water until the red color was no longer affected by phenolphthalein. Furthermore, 120'C, 3mm1-1 (
After removing the solvent with fB2 water for 2 hours and filtering, 254 g (yield 79.4%) of the desired diglycidyl methylhexahydrophthalic anhydride was obtained.
因みに、このものの]ニポキシ当量は164、有機塩水
含Nは0.6%、粘度は510 c Pであった。Incidentally, this product had a nipoxy equivalent of 164, an organic brine content of 0.6%, and a viscosity of 510 cP.
比較例4
脱水・脱溶媒後、キョーワード700SNを添加せずに
、そのまま濾過した他は実施例2に準じて遮理したとこ
ろ、目的とするビスフェノール△・エチレンオキサイド
6モル付加体のジグリシジルエーテルが6039 (収
率99.0%)得られた。因みに、このもののエポキシ
当量は364、@機塩素含量は]、7%、粘度は110
0CPでおった。尚、当該グリシジル化合物中のナトリ
ウム含量は、4.3DprT1で必った。Comparative Example 4 After dehydration and solvent removal, filtering was carried out as it was without adding Kyoward 700SN, but the method was shielded according to Example 2, and the desired diglycidyl ether of bisphenol Δ and 6 moles of ethylene oxide adduct was obtained. 6039 (yield 99.0%) was obtained. By the way, the epoxy equivalent of this product is 364, the chlorine content is 7%, and the viscosity is 110.
I got it with 0CP. Note that the sodium content in the glycidyl compound was 4.3DprT1.
[発明の効果]
本発明に係るグリシジル化合物の製造方法は、閉環反応
後に残存する塩基性化合物を簡便に、かつ確実に不活性
化することにより、最終製品の工ポキン当量や粘度、残
留する塩基性化合物の含量等の品質か著しく改良でき、
しかも収率の向上が可能になる。[Effects of the Invention] The method for producing a glycidyl compound according to the present invention easily and reliably inactivates the basic compound remaining after the ring-closing reaction, thereby reducing the polypolymer equivalent and viscosity of the final product, and the remaining base. The quality, such as the content of sexual compounds, can be significantly improved.
Moreover, it becomes possible to improve the yield.
特許出願人 新日本理化株式会社Patent applicant: Shin Nihon Rika Co., Ltd.
Claims (1)
ン類から選ばれる化合物とエピハロヒドリン類及び/又
はハロヒドリン類との付加反応により得られるハロヒド
リン体を塩基性化合物の存在下に閉環してグリシジル化
合物を製造する方法において、閉環反応終了後、 (1)当該反応系に対して二酸化炭素を導入して塩基性
化合物を中和する工程、及び (2)シリカ及びアルミナを主成分とする固体酸を用い
て当該中和処理物中に残存する塩基性化合物を除去する
工程、 を含むことを特徴とするグリシジル化合物の製造方法。[Claims] 1. A halohydrin compound obtained by an addition reaction between a compound selected from alcohols, phenols, carboxylic acids, and amines and epihalohydrins and/or halohydrins is ring-closed in the presence of a basic compound. In the method for producing a glycidyl compound, after the completion of the ring-closing reaction, (1) introducing carbon dioxide into the reaction system to neutralize the basic compound, and (2) containing silica and alumina as the main components. A method for producing a glycidyl compound, comprising the step of removing basic compounds remaining in the neutralized product using a solid acid.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2198725A JP2857236B2 (en) | 1990-07-25 | 1990-07-25 | Method for producing glycidyl compound |
| KR1019910012721A KR0150006B1 (en) | 1990-07-25 | 1991-07-24 | Process for glycidyl compounds |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2198725A JP2857236B2 (en) | 1990-07-25 | 1990-07-25 | Method for producing glycidyl compound |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0482880A true JPH0482880A (en) | 1992-03-16 |
| JP2857236B2 JP2857236B2 (en) | 1999-02-17 |
Family
ID=16395954
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2198725A Expired - Fee Related JP2857236B2 (en) | 1990-07-25 | 1990-07-25 | Method for producing glycidyl compound |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2857236B2 (en) |
| KR (1) | KR0150006B1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008088071A (en) * | 2006-09-29 | 2008-04-17 | Nippon Zeon Co Ltd | Method for producing 2-cyclopentylcyclopentanone compound |
| JP2009513536A (en) * | 2003-06-30 | 2009-04-02 | ハンツマン・アドヴァンスト・マテリアルズ・(スイッツランド)・ゲーエムベーハー | Method |
| WO2022137859A1 (en) * | 2020-12-21 | 2022-06-30 | ポリプラスチックス株式会社 | Polyacetal copolymer and method for producing same |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR19990068663A (en) * | 1999-06-09 | 1999-09-06 | 이근원 | Apparatus for automatically coating fishing rod |
-
1990
- 1990-07-25 JP JP2198725A patent/JP2857236B2/en not_active Expired - Fee Related
-
1991
- 1991-07-24 KR KR1019910012721A patent/KR0150006B1/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009513536A (en) * | 2003-06-30 | 2009-04-02 | ハンツマン・アドヴァンスト・マテリアルズ・(スイッツランド)・ゲーエムベーハー | Method |
| JP2008088071A (en) * | 2006-09-29 | 2008-04-17 | Nippon Zeon Co Ltd | Method for producing 2-cyclopentylcyclopentanone compound |
| WO2022137859A1 (en) * | 2020-12-21 | 2022-06-30 | ポリプラスチックス株式会社 | Polyacetal copolymer and method for producing same |
| JP2022097987A (en) * | 2020-12-21 | 2022-07-01 | ポリプラスチックス株式会社 | Polyacetal copolymer, and production method thereof |
| CN116635441A (en) * | 2020-12-21 | 2023-08-22 | 宝理塑料株式会社 | Polyacetal copolymer and its production method |
| CN116635441B (en) * | 2020-12-21 | 2026-02-03 | 宝理塑料株式会社 | Polyacetal copolymer and process for producing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2857236B2 (en) | 1999-02-17 |
| KR0150006B1 (en) | 1998-10-15 |
| KR920002570A (en) | 1992-02-28 |
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