JPH048429U - - Google Patents
Info
- Publication number
- JPH048429U JPH048429U JP4923390U JP4923390U JPH048429U JP H048429 U JPH048429 U JP H048429U JP 4923390 U JP4923390 U JP 4923390U JP 4923390 U JP4923390 U JP 4923390U JP H048429 U JPH048429 U JP H048429U
- Authority
- JP
- Japan
- Prior art keywords
- waveguide
- heat extraction
- dielectric window
- extraction body
- interposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000605 extraction Methods 0.000 claims 3
- 238000000034 method Methods 0.000 claims 1
- 238000001816 cooling Methods 0.000 description 2
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案に係るプラズマプロセス装置の
概略縦断面図、第２図は本案装置の要部拡大縦断
面図、第３図は従来装置の概略縦断面図、第４図
は従来装置の要部拡大縦断面図である。
１……抜熱体、１ａ……冷却水路、１ｂ……導
入管、１ｃ……排出管、２……弾性部材、３……
シート、４……ベローズ、５ａ，５ｂ……固定リ
ング、３１……プラズマ生成室、３３……導波管
、３６……誘電体窓、４０……Ｏリング、４１…
…冷却水路。
Fig. 1 is a schematic longitudinal cross-sectional view of the plasma processing apparatus according to the present invention, Fig. 2 is an enlarged longitudinal cross-sectional view of main parts of the proposed apparatus, Fig. 3 is a schematic longitudinal cross-sectional view of the conventional apparatus, and Fig. 4 is a schematic longitudinal cross-sectional view of the conventional apparatus. FIG. 2 is an enlarged vertical cross-sectional view of main parts. DESCRIPTION OF SYMBOLS 1...Heat removal body, 1a...Cooling channel, 1b...Introduction pipe, 1c...Discharge pipe, 2...Elastic member, 3...
Sheet, 4...Bellows, 5a, 5b...Fixing ring, 31...Plasma generation chamber, 33...Waveguide, 36...Dielectric window, 40...O ring, 41...
...cooling waterway.
Claims (1)
止し、その外側にマイクロ波導波管を着設し、該
導波管と該誘電体窓との間に抜熱体を介在させて
あるプラズマプロセス装置において、 前記導波管と前記抜熱体との間に、該抜熱体を
前記誘電体窓に圧接させるように弾性部材を介在
させてあることを特徴とするプラズマプロセス装
置。[Claims for Utility Model Registration] The opening of the plasma generation chamber is sealed with a dielectric window, a microwave waveguide is installed outside the window, and a microwave waveguide is installed between the waveguide and the dielectric window. In the plasma processing apparatus in which a heat extraction body is interposed, an elastic member is interposed between the waveguide and the heat extraction body so as to press the heat extraction body into contact with the dielectric window. Characteristic plasma process equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4923390U JP2510166Y2 (en) | 1990-05-11 | 1990-05-11 | Plasma process equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4923390U JP2510166Y2 (en) | 1990-05-11 | 1990-05-11 | Plasma process equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH048429U true JPH048429U (en) | 1992-01-27 |
| JP2510166Y2 JP2510166Y2 (en) | 1996-09-11 |
Family
ID=31566746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4923390U Expired - Lifetime JP2510166Y2 (en) | 1990-05-11 | 1990-05-11 | Plasma process equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2510166Y2 (en) |
-
1990
- 1990-05-11 JP JP4923390U patent/JP2510166Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2510166Y2 (en) | 1996-09-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |