JPH0484488A - Manufacture of board for flexible printed wiring board - Google Patents
Manufacture of board for flexible printed wiring boardInfo
- Publication number
- JPH0484488A JPH0484488A JP19775990A JP19775990A JPH0484488A JP H0484488 A JPH0484488 A JP H0484488A JP 19775990 A JP19775990 A JP 19775990A JP 19775990 A JP19775990 A JP 19775990A JP H0484488 A JPH0484488 A JP H0484488A
- Authority
- JP
- Japan
- Prior art keywords
- printed wiring
- formula
- flexible printed
- product
- wiring board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Paints Or Removers (AREA)
- Structure Of Printed Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ポリイミド系前駆体樹脂を導体上に直接塗布
し乾燥して加熱硬化することにより、接着性、耐熱性、
寸法安定性に優れたカールのないフレキシブルプリント
配線板用基板を製造する方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention improves adhesion, heat resistance, and
The present invention relates to a method for manufacturing a curl-free flexible printed wiring board substrate with excellent dimensional stability.
従来、フレキシブルプリント配線板用基板の製造方法と
しては(1)ポリイミドフィルムと金属箔とを接着剤層
を介して積層する方法、(2)特開昭62−212、1
40号公報に開示されているように、金属箔上にポリイ
ミド前駆体樹脂溶液を直接塗布して乾燥した後、イミド
化してポリイミド層を金属箔上に形成する方法等が知ら
れている。Conventionally, methods for producing substrates for flexible printed wiring boards include (1) a method of laminating a polyimide film and a metal foil via an adhesive layer; (2) a method of laminating a polyimide film and a metal foil through an adhesive layer; and (2) a method of manufacturing a substrate for a flexible printed wiring board.
As disclosed in Japanese Patent No. 40, a method is known in which a polyimide precursor resin solution is directly applied onto a metal foil, dried, and then imidized to form a polyimide layer on the metal foil.
しかしながら、上記(1)の場合は、接着剤層の耐熱性
が充分でなく、ポリイミドフィルム本来の耐熱性が生か
されないばかりか、得られるフレキシブルプリント配線
板の耐屈曲性に乏しく、カールや歪みを生ずるといった
問題がある。また、上記(2)の方法は、接着剤を使用
しないため高寸法安定性、耐熱性の向上等の利点を有す
るが、充分な特性を得るためには高温で長時間熱処理す
る必要があり、高価な設備を必要とし、生産性も低い。However, in the case of (1) above, the heat resistance of the adhesive layer is not sufficient and the inherent heat resistance of the polyimide film is not utilized, and the resulting flexible printed wiring board has poor bending resistance and is prone to curling and distortion. There are problems that occur. In addition, the method (2) above has advantages such as high dimensional stability and improved heat resistance because it does not use adhesive, but it requires heat treatment at high temperature for a long time in order to obtain sufficient characteristics. It requires expensive equipment and has low productivity.
このような問題を解消するために、特開昭61−307
、789号公報にみられるように、塗布、乾燥後、円筒
状のまま加熱硬化する方法が提案されているが、この方
法では、塗布面と塗布されない金属部とが接触するため
、昇温時にこの間で癒着が発生し、金属箔の表面酸化等
の劣化を促進したり、樹脂の諸特性が低下するという問
題かあった。In order to solve this problem, Japanese Unexamined Patent Publication No. 61-307
, No. 789, a method has been proposed in which after coating and drying, the cylindrical shape is heated and cured. However, in this method, the coated surface comes into contact with the uncoated metal part, so when the temperature rises, During this time, adhesion occurs, leading to problems such as promoting deterioration such as surface oxidation of the metal foil and deteriorating various properties of the resin.
そこで、本発明者らは、上記問題を解決するために鋭意
研究を行った結果、ポリイミド前駆体樹脂溶液を導体上
に直接塗布し乾燥した後、特定の加熱硬化方法を採用す
ることにより、優れた特性を有するフレキシブルプリン
ト配線板用基板を生産性良く製造することができること
を見出し、本発明を完成するに至った。Therefore, as a result of intensive research in order to solve the above problem, the present inventors have succeeded in applying a polyimide precursor resin solution directly onto the conductor, drying it, and then employing a specific heat curing method. The present inventors have discovered that a substrate for a flexible printed wiring board having such characteristics can be manufactured with high productivity, and have completed the present invention.
従って、本発明の目的は、ポリイミドフィルムと金属箔
との接着強度、特に高温での接着強度に優れ、かつ、高
い寸法安定性、耐熱性を有し、カールや酸化のないフレ
キシブルプリント配線板用基板を提供することにある。Therefore, an object of the present invention is to provide a flexible printed wiring board that has excellent adhesive strength between a polyimide film and metal foil, especially at high temperatures, has high dimensional stability and heat resistance, and is free from curling and oxidation. The purpose is to provide the substrate.
すなわち、本発明は、導体上にポリイミド系前駆体樹脂
溶液を塗布し乾燥して形成した撓み性基板と、平均表面
粗さRaが0.5趨以上のシート状材料とを円筒状に伴
巻きした後、加熱硬化するフレキシブルプリント配線板
用基板の製造方法である。That is, the present invention involves winding a flexible substrate formed by applying and drying a polyimide precursor resin solution onto a conductor and a sheet material having an average surface roughness Ra of 0.5 or more into a cylindrical shape. This is a method for manufacturing a substrate for a flexible printed wiring board, which is then heated and cured.
本発明において、撓み性基板を製造するために用いられ
る導体としては、銅、ニッケル、アルミニウム等の金属
箔を使用できるが、好ましくは厚さ5〜150趨の銅箔
である。In the present invention, metal foils such as copper, nickel, and aluminum can be used as the conductor used to manufacture the flexible substrate, but copper foil with a thickness of 5 to 150 mm is preferable.
また、この撓み性基板を製造するために用いられるポリ
イミド系前駆体樹脂としては、加熱硬化させることによ
りイミド結合を生ずるものであり、代表的にはポリアミ
ック酸である。硬化後のカールを防止する上で、線膨張
係数3 X 10−5(1/K)以下の樹脂を与えるも
のが好ましく、より好ましくは硬化後の構造式が下記一
般式[1](但し、式中R1〜Rsは水素、ハロゲン、
低級アルキル基及び低級アルコキシ基から選ばれたいず
れかの基であり、そのうちR3−R6の少なくとも1つ
は低級アルコキシ基であり、Arは
のいずれかを示す)で表される構成単位を含むポリアミ
ドイミド樹脂、又は、下記一般式[2](式中R9〜R
1□は水素、ハロゲン、低級アルキル基、低級アルコキ
シ基、ニトロ基及びニトリル基から選ばれたいずれかの
基を示す)で表される構成単位を含むポリイミド樹脂で
ある。Further, the polyimide precursor resin used for manufacturing this flexible substrate is one that forms imide bonds by heating and curing, and is typically polyamic acid. In order to prevent curling after curing, it is preferable to provide a resin with a linear expansion coefficient of 3 x 10-5 (1/K) or less, and more preferably, the structural formula after curing is the following general formula [1] (however, In the formula, R1 to Rs are hydrogen, halogen,
A polyamide containing a structural unit which is any group selected from a lower alkyl group and a lower alkoxy group, among which at least one of R3-R6 is a lower alkoxy group, and Ar represents one of the following. Imide resin or the following general formula [2] (in the formula R9 to R
1□ is a polyimide resin containing a structural unit represented by hydrogen, halogen, a lower alkyl group, a lower alkoxy group, a nitro group, and a nitrile group.
また、このポリイミド系前駆体樹脂中には、可撓性付与
や流動性改質を目的として他の樹脂やフィラーあるいは
消泡剤、レベリング剤のような添加剤を加えることも可
能である。Further, it is also possible to add other resins, fillers, or additives such as antifoaming agents and leveling agents to the polyimide precursor resin for the purpose of imparting flexibility and improving fluidity.
導体上へポリイミド系前駆体樹脂を塗布する際には、任
意の塗工機を用いることができるか、好ましくはグラビ
アコーター リバースロールコータ−、バーリバースロ
ールコータ−、バーコータドクターブレードコーター、
ダイコーター及び多層ダイコーターである。更に、これ
らを用いて、カール防止や緒特性向上を目的として、1
種あるいは2種以上の樹脂溶液を2層以上塗布してもよ
い。When applying the polyimide precursor resin onto the conductor, any coating machine can be used, preferably a gravure coater, reverse roll coater, bar reverse roll coater, bar coater, doctor blade coater,
die coater and multilayer die coater. Furthermore, using these materials, 1.
Two or more layers of seeds or resin solutions of two or more types may be applied.
乾燥に用いる装置についても任意のものを用いることが
できる。乾燥は通常150°C以下、好ましくは90〜
130℃で行われるが、ポリイミド前駆体樹脂溶液中の
溶媒は、塗布時の樹脂に対し50重量部以下にまで除去
することか好ましい。Any device can be used for drying. Drying is usually 150°C or less, preferably 90°C or less.
Although the coating is carried out at 130° C., it is preferable to remove the solvent in the polyimide precursor resin solution to 50 parts by weight or less based on the resin at the time of coating.
溶媒が50重量部を超えて残留すると、樹脂表面にタッ
ク性が残り、円筒状に巻回する際にシート状材料と密着
し、加熱後樹脂が劣化する。If more than 50 parts by weight of the solvent remains, tackiness remains on the resin surface and the resin adheres closely to the sheet-like material when wound into a cylindrical shape, resulting in deterioration of the resin after heating.
また、本発明で用いるシート状材料は、昇温時に発生す
る揮発分の除去を円滑に行うために、少なくとも片面が
表面粗さRa=0.5Iim以上のもので、350℃に
おける加熱収縮率が1%以下の熱安定性の高いものか好
ましい。このようなシート状材料としては、例えば芳香
族ポリアミド系の繊維からなる織布あるいは不織布があ
り、この場合のRaは0.5〜5趨の範囲か好ましい。In addition, the sheet-like material used in the present invention has at least one surface with a surface roughness of Ra=0.5Iim or more, and has a heat shrinkage rate of 350°C in order to smoothly remove volatile components generated when the temperature is increased. Preferably, it has a high thermal stability of 1% or less. Such sheet-like materials include, for example, woven or nonwoven fabrics made of aromatic polyamide fibers, and in this case Ra is preferably in the range of 0.5 to 5.
Raが0゜5より小さいと揮発分の除去が充分に行えず
、樹脂表面に曇りか発生したり、癒着したりして樹脂劣
化の原因となる。また、Raが5趨を超える場合は樹脂
面に部分的に繊維の付着が発生し、品質のばらつきの原
因となる。If Ra is less than 0°5, volatile matter cannot be removed sufficiently, causing clouding or adhesion on the resin surface, causing resin deterioration. Furthermore, if Ra exceeds 5, fibers will partially adhere to the resin surface, causing variations in quality.
他の好ましいシート状材料としては、透過精度200〜
350メツシユの範囲のステンレス鋼金網が挙げられる
。この場合、透過精度が200メヲシユより小さいと樹
脂面上に金網跡が転写され、膜厚の不均一化をもたらし
、また、350メツシユを超えると樹脂面との癒着が発
生する。なお、200メツシユのステンレス鋼金網のR
aは8.0趨であり、同じ<350jtシユはRa=4
.8趨に相当する。Other preferable sheet materials include transmission accuracy of 200~
Stainless steel wire mesh in the 350 mesh range is included. In this case, if the transmission accuracy is less than 200 meshes, traces of wire mesh will be transferred onto the resin surface, resulting in uneven film thickness, and if it exceeds 350 meshes, adhesion with the resin surface will occur. In addition, the R of the 200 mesh stainless steel wire mesh
a is 8.0 trend, and the same <350jt is Ra=4
.. Corresponds to 8 trends.
金属箔上に樹脂溶液を塗布し乾燥し手形成された撓み性
基板とシート状材料とを互いに一緒にして伴巻きすると
きは、しわやねじれか入らないように巻くのが好ましい
。これは、塗布面に生じたしわやねじれが転写したり、
溶媒の揮発の妨げとなるのを防ぐためである。また、伴
巻きする際、シート状材料で塗布面を全て覆う必要はな
く、ロールの外周に近い部分は熱伝導性が比較的良好な
ため、シート状材料と伴巻きされていなくても何ら差し
支えない。また、昇温時のポリイミドフィルムの残留応
力を緩和するため、金属部分が内側を、樹脂面が外側を
向くように伴巻きすることが好ましい。When the flexible substrate, which has been hand-formed by applying a resin solution onto the metal foil and drying it, and the sheet-like material are rolled together, it is preferable to roll them so that no wrinkles or twists occur. This may cause wrinkles or twists on the applied surface to be transferred, or
This is to prevent the solvent from interfering with volatilization. In addition, when trail-winding, it is not necessary to cover the entire coated surface with the sheet-like material, and the part near the outer periphery of the roll has relatively good thermal conductivity, so there is no problem even if it is not trail-wound with the sheet-like material. do not have. Further, in order to alleviate residual stress in the polyimide film when the temperature rises, it is preferable to tail-wrap the polyimide film so that the metal part faces inside and the resin surface faces outside.
塗布、乾燥後の樹脂の硬化は不活性ガス雰囲気下あるい
は100Torr以下の減圧下で行うことが好ましく、
連続的に5 Torr以下の減圧下で行うことがより好
ましい。これは、塗布した樹脂中から発生する有機溶剤
及びイミド化閉環反応中に発生する水分等を完全に除去
するためである。水分が雰囲気中に残留すると樹脂の加
水分解が起こり、樹脂の重合度が低くなり、結果として
ポリイミドフィルムの物性の低下を招く恐れがある。Curing of the resin after coating and drying is preferably carried out under an inert gas atmosphere or under reduced pressure of 100 Torr or less,
It is more preferable to carry out the reaction continuously under reduced pressure of 5 Torr or less. This is to completely remove the organic solvent generated from the applied resin and the moisture generated during the imidization ring-closing reaction. If moisture remains in the atmosphere, hydrolysis of the resin will occur, resulting in a decrease in the degree of polymerization of the resin, which may result in deterioration of the physical properties of the polyimide film.
加熱硬化工程における真空炉内での昇温手順としては、
大きく分けて脱気、脱溶媒を充分に行う段階と、硬化反
応を完了させる段階の2段階で行うのがよい。すなわち
、先ず150℃前後、好ましくは有機溶媒の沸点付近ま
で徐々にあるいは段階的に昇温させ、樹脂中の残留溶媒
を充分に揮発させた後、150〜330°Cまで徐々に
あるいは段階的に昇温させるのが好ましい。より好まし
くはその昇温速度が0.75〜12°C/minの範囲
で行うのがよい。昇温速度が12°C/n+inを超え
ると急激に脱溶媒されるため、樹脂中に発泡が起こる。The temperature raising procedure in the vacuum furnace during the heat curing process is as follows:
It is preferable to carry out the process in two main stages: a stage in which sufficient deaeration and solvent removal are carried out, and a stage in which the curing reaction is completed. That is, first, the temperature is gradually or stepwise raised to around 150°C, preferably around the boiling point of the organic solvent, and after the residual solvent in the resin is sufficiently volatilized, the temperature is gradually or stepwise raised to 150 to 330°C. Preferably, the temperature is raised. More preferably, the heating rate is 0.75 to 12°C/min. When the temperature increase rate exceeds 12° C./n+in, the solvent is removed rapidly and foaming occurs in the resin.
また、0.75°C/minより小さいと最高温度に達
するまでの時間が長くなり、樹脂が長時間高温に晒され
ることになり樹脂が劣化する原因となる。また、加熱硬
化後室温まで冷却する際には、不活性ガス雰囲気下ある
いは100 Torr以下の真空下で行うのが好ましく
、より好ましくは10 Torr以下の真空下で冷却す
るのがよい。冷却手段としては、単に放置してもよいが
、生産効率を考慮して冷却水を流すなどの強制冷却手段
を用いることが好ましい。Moreover, if it is smaller than 0.75°C/min, it will take a long time to reach the maximum temperature, and the resin will be exposed to high temperature for a long time, causing deterioration of the resin. Further, when cooling to room temperature after heat curing, it is preferable to perform the cooling under an inert gas atmosphere or under a vacuum of 100 Torr or less, more preferably under a vacuum of 10 Torr or less. As a cooling means, it is possible to simply leave it alone, but in consideration of production efficiency, it is preferable to use forced cooling means such as flowing cooling water.
以上においては片側導体張積層板のフレキシブルプリン
ト配線板用基板を製造する場合について説明したが、本
発明方法を用いて特開平1−244.841号公報に見
られるような方法で両面銅張積層板を製造することもで
きる。In the above, a case has been described in which a substrate for a flexible printed wiring board is manufactured using a conductor-clad laminate on one side, but it is also possible to manufacture a double-sided copper-clad laminate using the method of the present invention as disclosed in Japanese Patent Application Laid-Open No. 1-244.841. It is also possible to manufacture plates.
以下に本発明の実施例を示し、本発明を更に詳しく説明
する。Examples of the present invention will be shown below to explain the present invention in more detail.
以下の実施例において、平均表面粗さは平均表面粗さ形
状測定器(東京精密(掬製、サーフコム110B)を用
いて測定面を高精度の差動変圧器式ピ・ツクアップでト
レースすることにより求めた。In the following examples, the average surface roughness was measured by tracing the measurement surface with a high-precision differential transformer type pick-up using an average surface roughness profile measuring device (Tokyo Seimitsu Co., Ltd., manufactured by Kiki, Surfcom 110B). I asked for it.
線膨張係数は、イミド化反応が十分終了した試料を用い
、サーモメカニカルアナライザー(TMA)を用いて、
250°Cに昇温後に10°C/分で冷却して240℃
から100℃までの平均の線膨張係数を算出して求めた
。The coefficient of linear expansion is determined using a thermomechanical analyzer (TMA) using a sample that has undergone sufficient imidization reaction.
After heating to 250°C, cool at 10°C/min to 240°C.
The average linear expansion coefficient from 100°C to 100°C was calculated.
接着力は、テンションテスターを用い、幅10mの銅張
品の樹脂側を両面テープによりアルミ板に固定し、銅箔
を180°Cの角度で5m/min、の速度で剥離する
ときの強さから求めた。Adhesive strength is determined by using a tension tester to fix the resin side of a 10 m wide copper-clad product to an aluminum plate with double-sided tape, and peeling off the copper foil at an angle of 180°C at a speed of 5 m/min. I asked for it from.
加熱収縮率は、幅10mm、長さ200mmの導体をエ
ツチングした後のフィルムを用い、2508Cの熱風オ
ーブン中で30分間熱処理し、その前後の寸法変化率に
より求めた。The heat shrinkage rate was determined by using a film after etching a conductor with a width of 10 mm and a length of 200 mm, heat treating it in a hot air oven at 2508C for 30 minutes, and determining the dimensional change rate before and after that.
エツチング後のフィルムのカールは、導体を塩化第二鉄
水溶液で全面エツチングした後、縦10cm×横10c
m×厚さ25趨の大きさのフィルムを100℃で10分
間乾燥した後、発生したカールの屈曲半径を求めて数値
化した。The curl of the film after etching is determined by etching the entire surface of the conductor with a ferric chloride aqueous solution,
After drying a film with a size of 25 m×thickness for 10 minutes at 100° C., the bending radius of the curl that occurred was determined and quantified.
エツチング後のフィルムの強度及び弾性率は、JIS
Z−1702、ASTM D−882−67ニ準じて行
ツタ。The strength and elastic modulus of the film after etching are JIS
Ivy according to Z-1702, ASTM D-882-67.
はんだ耐熱試験は、硬化が十分に終了したのち、試料を
400℃のはんだ洛中に1分間浸漬し、その際のふくれ
、はがれ等の異常の有無により判定した。In the solder heat resistance test, after the curing was sufficiently completed, the sample was immersed in a solder bath at 400° C. for 1 minute, and judgment was made based on the presence or absence of abnormalities such as blistering and peeling.
実施例1
ポリアミドイミド前駆体樹脂溶液を粗化面と光沢面をも
つ厚さ35Aの電界銅箔の粗化面に厚さが25趨になる
ように塗布し130℃で12分間乾燥し、ポリイミド系
樹脂と銅箔よりなる銅張品を得た。この時の樹脂中の溶
媒残留量は0.78重量部であり、樹脂は乾固し、タッ
ク性は認められなかった。Example 1 A polyamide-imide precursor resin solution was applied to the roughened surface of a 35A thick electrolytic copper foil having a roughened surface and a glossy surface so as to have a thickness of 25 mm, and dried at 130° C. for 12 minutes to form polyimide. A copper-clad product made of resin and copper foil was obtained. At this time, the amount of solvent remaining in the resin was 0.78 parts by weight, the resin was dried to solidity, and no tackiness was observed.
次に、上記銅張品を第1図上のシャフト1に取り付け、
このシャフト1から繰り出された銅張品2を各ロールを
経由させてロール4に供給した。Next, attach the copper-clad product to the shaft 1 in FIG.
The copper-clad product 2 fed out from the shaft 1 was supplied to the roll 4 via each roll.
このロール4では、銅張品2とシャフト3から繰り出さ
れたRa=1.51i!11及び厚さ40岸の芳香族ポ
リアミド系不織布とを重ね合わせ、シャフト5に取り付
けである外径90mmの表面研磨を施した金属アルミニ
ウム製のパイプに前記銅張品2の樹脂面が外側を、光沢
金属面が内側をそれぞれ向くように伴巻きし、伴巻き品
を得た。In this roll 4, Ra = 1.51i! drawn out from the copper-clad product 2 and the shaft 3! 11 and an aromatic polyamide nonwoven fabric with a thickness of 40 mm, and the resin surface of the copper-clad product 2 is placed on the outside of a polished metal aluminum pipe with an outer diameter of 90 mm, which is attached to the shaft 5. The pieces were wrapped together so that the shiny metal surfaces faced inward to obtain a rolled product.
上記伴巻き品を真空乾燥炉内に横置きに装填し、炉内圧
をI O−’Torrに減圧し、伴巻き品の温度が均一
に150℃になるように徐々に昇温し、この状態で2時
間保持し、脱溶媒を十分に行ったのち、再び2時間かけ
て330〜340°Cになるように調整した。次に、炉
内を減圧したまま、炉壁に冷却水を流し降温した後、炉
内から伴巻き品を取り出し、先の伴巻き手順と全く逆の
手順で巻き返しを行った。The above-mentioned trailing product was loaded horizontally into a vacuum drying oven, the pressure inside the furnace was reduced to IO-'Torr, and the temperature of the trailing product was gradually raised to uniformly reach 150°C. After holding for 2 hours and sufficiently removing the solvent, the temperature was adjusted to 330 to 340°C again over 2 hours. Next, cooling water was poured over the furnace walls to cool down the temperature while the pressure inside the furnace was kept reduced, and then the trailing product was taken out of the furnace and rewound in the exact opposite manner to the trailing winding procedure described above.
このようにして得られたフレキシブルプリント配線板用
基板はカールが全くなく、その接着力は2.0kg7c
mであり、加熱収縮率は0.05%であり、線膨張係数
は11 X 10−6(1/K)であり、はんだ耐熱試
験ではなんらの異常も認められなかった。また、銅箔の
光沢面の酸化は皆無であり、所望の回路パターン形成を
容易に行うことができた。The thus obtained flexible printed wiring board substrate has no curls and has an adhesive strength of 2.0kg7c.
m, the heat shrinkage rate was 0.05%, the linear expansion coefficient was 11 x 10-6 (1/K), and no abnormality was observed in the soldering heat resistance test. Further, there was no oxidation of the shiny surface of the copper foil, and the desired circuit pattern could be easily formed.
実施例2
実施例1と同様に、厚さ18.mの圧延銅箔の粗化面上
にポリイミド前駆体樹脂溶液を厚さ25趨になるように
塗布し乾燥したのち、シャフト3より透過精度325j
ブシユの厚さ70趨のステンレス鋼金網を繰り出し、両
者を伴巻きした。次に真空炉内で10−’Torrの減
圧下、脱溶媒及び熱硬化を行った。得られたフレキシブ
ルプリント配線板は、樹脂上に異物は全く認められずフ
ラットであり、接着力1.8kg/cm、加熱収縮率0
.05%、線膨張係数1. OX 10−’(1/K)
、耐はんだ試験では全く異常は認められなかった。Example 2 As in Example 1, the thickness was 18. After applying a polyimide precursor resin solution to a thickness of 25 mm on the roughened surface of rolled copper foil and drying it, the shaft 3 was coated with a transmission accuracy of 325 j.
A stainless steel wire mesh with a thickness of 70 mm was rolled out from the bush and both were wrapped together. Next, solvent removal and heat curing were performed in a vacuum furnace under reduced pressure of 10-' Torr. The obtained flexible printed wiring board was flat with no foreign matter observed on the resin, had an adhesive strength of 1.8 kg/cm, and a heat shrinkage rate of 0.
.. 05%, linear expansion coefficient 1. OX 10-' (1/K)
No abnormality was observed in the solder resistance test.
比較例1
実施例1において、伴巻きするシート状材料を用いなか
った以外は全く同様にして試験を行ったところ、得られ
たフレキシブルプリント配線板用基板は癒着が激しく、
樹脂は明らかに劣化してした。Comparative Example 1 A test was conducted in exactly the same manner as in Example 1 except that the trailing sheet material was not used, and the resulting flexible printed wiring board substrate showed severe adhesion.
The resin had clearly deteriorated.
比較例2
実施例1において、伴巻きするポリアミド不織布のRa
が0,1のものを用いた以外は全く同様にして試験を行
ったところ、得られたフレキシブルプリント配線板用基
板の樹脂面には曇りや癒着が見られ、フィルム強度が1
5kg/emuかなかった。Comparative Example 2 In Example 1, the Ra of the polyamide nonwoven fabric to be wrapped
When the test was carried out in exactly the same manner except that one with 0 and 1 was used, cloudiness and adhesion were observed on the resin surface of the obtained flexible printed wiring board substrate, and the film strength was 1.
It was less than 5kg/emu.
比較例3
実施例1において、伴巻きするポリアミド不織布のRa
が1.5のものを用い、かつ、ポリアミドイミド前駆体
の塗布、乾燥後の溶媒残留が60重量部であった以外は
全く同様にして試験を行ったところ、シート状材料と樹
脂面か接着してしまい、加熱硬化後は樹脂は明らかに劣
化していた。Comparative Example 3 In Example 1, the Ra of the trailing polyamide nonwoven fabric
The test was conducted in exactly the same manner except that 60 parts by weight of the solvent remained after coating and drying the polyamide-imide precursor, and the adhesive between the sheet material and the resin surface was 1.5. The resin clearly deteriorated after being heated and cured.
比較例4
実施例1において、伴巻きするポリアミド不織布のRa
が10のものを用いた以外は全く同様にして試験を行っ
たところ、得られたフレキシブルプリント配線板用基板
は部分的に繊維の付着か見られた。Comparative Example 4 In Example 1, the Ra of the polyamide nonwoven fabric to be wrapped
When a test was conducted in exactly the same manner except that a substrate with a diameter of 10 was used, it was found that fibers were partially attached to the obtained flexible printed wiring board substrate.
比較例5
実施例2において、伴巻きするステンレス鋼金網の透過
精度が400のものを用いた以外は全く同様にして試験
を行ったところ、シート状材料と樹脂面との間に癒着が
見られた。Comparative Example 5 A test was conducted in exactly the same manner as in Example 2, except that the trailing stainless steel wire mesh had a transmission accuracy of 400, and adhesion was observed between the sheet material and the resin surface. Ta.
比較例6
実施例2において、伴巻きするステンレス鋼金網の透過
精度が165のものを用いた以外は全く同様にして試験
を行ったところ、シート状材料の表面形状が樹脂表面に
転写していた。Comparative Example 6 A test was carried out in exactly the same manner as in Example 2, except that the trailing stainless steel wire mesh had a transmission accuracy of 165, and the surface shape of the sheet material was transferred to the resin surface. .
本発明方法によれば、高寸法安定性、低熱膨張性、耐熱
性に優れており、カールや酸化のないフレキシブルプリ
ント配線板用基板を容易に製造することができる。According to the method of the present invention, it is possible to easily produce a substrate for a flexible printed wiring board that has high dimensional stability, low thermal expansion, and excellent heat resistance, and is free from curling and oxidation.
第1図は本発明の実施例及び比較例中で伴巻き時に用い
たラインの概略を示す説明図である。
符号の説明FIG. 1 is an explanatory diagram showing an outline of the lines used for trail winding in the examples and comparative examples of the present invention. Explanation of symbols
Claims (5)
燥して形成された撓み性基板と、平均表面粗さRaが0
.5μm以上のシート状材料とを円筒状に伴巻きした後
、加熱硬化することを特徴とするフレキシブルプリント
配線板用基板の製造方法。(1) A flexible substrate formed by coating a polyimide precursor resin solution on a conductor and drying it, and an average surface roughness Ra of 0.
.. A method for producing a substrate for a flexible printed wiring board, which comprises rolling a sheet material of 5 μm or more into a cylindrical shape and then heating and curing the material.
求項1記載のフレキシブルプリント配線板用基板の製造
方法。(2) The method for manufacturing a flexible printed wiring board substrate according to claim 1, wherein the sheet material is an aromatic polyamide nonwoven fabric.
記載のフレキシブルプリント配線板用基板の製造方法。(3) Claim 1, wherein the sheet-like material is a stainless steel wire mesh.
The method for manufacturing the flexible printed wiring board substrate described above.
1〜3記載のフレキシブルプリント配線板用基板の製造
方法。(4) The method for manufacturing a flexible printed wiring board substrate according to any one of claims 1 to 3, wherein the heat curing is performed under vacuum.
が下記一般式[1] ▲数式、化学式、表等があります▼ (但し、式中R_1〜R_8は水素、ハロゲン、低級ア
ルキル基及び低級アルコキシ基から選ばれたいずれかの
基であり、そのうちR_3〜R_6の少なくとも1つは
低級アルコキシ基であり、Arは ▲数式、化学式、表等があります▼ 又は ▲数式、化
学式、表等があります▼ のいずれかを示す)で表される構成単位を含むポリアミ
ドイミド樹脂、又は、下記一般式[2]▲数式、化学式
、表等があります▼[2] (式中R_9〜R_1_2は水素、ハロゲン、低級アル
キル基、低級アルコキシ基、ニトロ基及びニトリル基か
ら選ばれたいずれかの基を示す)で表される構成単位を
含むポリイミド樹脂を用いることを特徴とする請求項1
記載のフレキシブルプリント配線用基板の製造方法。(5) As a polyimide precursor resin, the structural formula after curing is the following general formula [1] ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (However, in the formula, R_1 to R_8 are hydrogen, halogen, lower alkyl group, lower Any group selected from alkoxy groups, of which at least one of R_3 to R_6 is a lower alkoxy group, and Ar has ▲a mathematical formula, a chemical formula, a table, etc.▼ or ▲a mathematical formula, a chemical formula, a table, etc. ▼) or the following general formula [2] ▲ Numerical formula, chemical formula, table, etc. ▼ [2] (In the formula, R_9 to R_1_2 are hydrogen, halogen , a lower alkyl group, a lower alkoxy group, a nitro group, and a nitrile group).
The method for manufacturing the flexible printed wiring board described above.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19775990A JP2919924B2 (en) | 1990-07-27 | 1990-07-27 | Method for manufacturing substrate for flexible printed wiring board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19775990A JP2919924B2 (en) | 1990-07-27 | 1990-07-27 | Method for manufacturing substrate for flexible printed wiring board |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0484488A true JPH0484488A (en) | 1992-03-17 |
| JP2919924B2 JP2919924B2 (en) | 1999-07-19 |
Family
ID=16379879
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19775990A Expired - Fee Related JP2919924B2 (en) | 1990-07-27 | 1990-07-27 | Method for manufacturing substrate for flexible printed wiring board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2919924B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000133892A (en) * | 1998-08-19 | 2000-05-12 | Sony Chem Corp | Manufacture of flexible printed wiring board |
| JP2008030464A (en) * | 2006-06-30 | 2008-02-14 | Sumitomo Chemical Co Ltd | Method for producing liquid crystal polyester laminated film, and liquid crystal polyester laminated film |
| JP2008182222A (en) * | 2006-12-28 | 2008-08-07 | Mitsui Mining & Smelting Co Ltd | Flexible printed wiring board and semiconductor device |
| JP2008207386A (en) * | 2007-02-23 | 2008-09-11 | Sumitomo Chemical Co Ltd | Polymer film laminate, method for producing the same, and flexible wiring board using polymer film laminate. |
| JP2008284716A (en) * | 2007-05-15 | 2008-11-27 | Sumitomo Chemical Co Ltd | Polymer film laminate, method for producing the same, and flexible wiring board using polymer film laminate. |
| JP2009262531A (en) * | 2008-03-31 | 2009-11-12 | Nippon Steel Chem Co Ltd | Laminate manufactuiring method |
| JP2011201261A (en) * | 2010-03-26 | 2011-10-13 | Dainippon Printing Co Ltd | Method for manufacturing rolled film base material, method for manufacturing pattern forming body using rolled film base material, rolled film base material, and functional layer-containing film base material |
| CN103281868A (en) * | 2013-06-19 | 2013-09-04 | 苏州工业园区格米克精密机械有限公司 | Flexible circuit board hot-press overflowing glue non-stick heating head mechanism |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013038384A (en) * | 2011-07-12 | 2013-02-21 | Sumitomo Electric Ind Ltd | Flexible printed wiring board for mounting led light-emitting element, led light-emitting element mounted flexible printed wiring board, and illumination device |
-
1990
- 1990-07-27 JP JP19775990A patent/JP2919924B2/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000133892A (en) * | 1998-08-19 | 2000-05-12 | Sony Chem Corp | Manufacture of flexible printed wiring board |
| JP2008030464A (en) * | 2006-06-30 | 2008-02-14 | Sumitomo Chemical Co Ltd | Method for producing liquid crystal polyester laminated film, and liquid crystal polyester laminated film |
| JP2008182222A (en) * | 2006-12-28 | 2008-08-07 | Mitsui Mining & Smelting Co Ltd | Flexible printed wiring board and semiconductor device |
| JP2008207386A (en) * | 2007-02-23 | 2008-09-11 | Sumitomo Chemical Co Ltd | Polymer film laminate, method for producing the same, and flexible wiring board using polymer film laminate. |
| JP2008284716A (en) * | 2007-05-15 | 2008-11-27 | Sumitomo Chemical Co Ltd | Polymer film laminate, method for producing the same, and flexible wiring board using polymer film laminate. |
| JP2009262531A (en) * | 2008-03-31 | 2009-11-12 | Nippon Steel Chem Co Ltd | Laminate manufactuiring method |
| JP2011201261A (en) * | 2010-03-26 | 2011-10-13 | Dainippon Printing Co Ltd | Method for manufacturing rolled film base material, method for manufacturing pattern forming body using rolled film base material, rolled film base material, and functional layer-containing film base material |
| CN103281868A (en) * | 2013-06-19 | 2013-09-04 | 苏州工业园区格米克精密机械有限公司 | Flexible circuit board hot-press overflowing glue non-stick heating head mechanism |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2919924B2 (en) | 1999-07-19 |
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