JPH0485730U - - Google Patents
Info
- Publication number
- JPH0485730U JPH0485730U JP12875490U JP12875490U JPH0485730U JP H0485730 U JPH0485730 U JP H0485730U JP 12875490 U JP12875490 U JP 12875490U JP 12875490 U JP12875490 U JP 12875490U JP H0485730 U JPH0485730 U JP H0485730U
- Authority
- JP
- Japan
- Prior art keywords
- sensor
- outputs
- wafer
- power supplies
- detection device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 6
- 230000001427 coherent effect Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 1
Description
第1図は本考案の実施例1の概略図(ブロツク
図)、第2図は実施例1における干渉性膜の膜厚
とセンサヘツドの受光するウエハーより反射した
光の反射強度との関係のグラフ、第3図および第
4図は実施例2における概略図および膜厚と反射
強度の関係のグラフ、第5図はウエハーの裏面に
まわり込み成膜をした干渉性膜の図、第6図は単
一の反射型センサを用いた場合の膜厚に対する反
射強度の関係図で、第7図は検知装置の概略図、
第8図は第7図のウエハー検知装置部のセンサヘ
ツド部分の拡大図である。
1……ウエハー、2,3,4……センサヘツド
、5,6,7……センサ電源、8……OR論理回
路、9……CPU I/Oボード、10……第1
センサヘツドの受光した干渉波形、11……第2
センサヘツドの受光した干渉波形、12,13…
…センサ不感膜厚領域、14……センサ不感領域
、15……第3センサヘツドの受光した干渉波形
、101……発光路、102……反射光路。
Fig. 1 is a schematic diagram (block diagram) of Embodiment 1 of the present invention, and Fig. 2 is a graph of the relationship between the thickness of the coherent film and the reflection intensity of the light reflected from the wafer received by the sensor head in Embodiment 1. , FIGS. 3 and 4 are schematic diagrams and graphs of the relationship between film thickness and reflection intensity in Example 2, FIG. 5 is a diagram of the coherent film formed around the back surface of the wafer, and FIG. This is a diagram showing the relationship between reflection intensity and film thickness when a single reflection sensor is used. Figure 7 is a schematic diagram of the detection device;
FIG. 8 is an enlarged view of the sensor head portion of the wafer detection device section of FIG. 7. 1... Wafer, 2, 3, 4... Sensor head, 5, 6, 7... Sensor power supply, 8... OR logic circuit, 9... CPU I/O board, 10... First
Interference waveform received by the sensor head, 11...2nd
Interference waveforms received by the sensor head, 12, 13...
...Sensor insensitive film thickness area, 14...Sensor insensitive area, 15...Interference waveform received by the third sensor head, 101...Emission path, 102...Reflection optical path.
Claims (1)
該複数のセンサヘツドの出力をそれぞれ入力して
ウエハーの有無信号を出力する複数のセンサ電源
と、該複数のセンサ電源の出力を入力して、それ
らの論理和を出力する論理回路を有するウエハー
検知装置。 multiple sensor heads that emit light at different wavelengths;
A wafer detection device having a plurality of sensor power supplies that input the outputs of the plurality of sensor heads and output a wafer presence/absence signal, and a logic circuit that inputs the outputs of the plurality of sensor power supplies and outputs their logical sum. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12875490U JPH0485730U (en) | 1990-11-29 | 1990-11-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12875490U JPH0485730U (en) | 1990-11-29 | 1990-11-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0485730U true JPH0485730U (en) | 1992-07-24 |
Family
ID=31876198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12875490U Pending JPH0485730U (en) | 1990-11-29 | 1990-11-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0485730U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014529888A (en) * | 2011-08-16 | 2014-11-13 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | Method and apparatus for sensing a substrate in a chamber |
-
1990
- 1990-11-29 JP JP12875490U patent/JPH0485730U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014529888A (en) * | 2011-08-16 | 2014-11-13 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | Method and apparatus for sensing a substrate in a chamber |
| JP2017038071A (en) * | 2011-08-16 | 2017-02-16 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | Method and apparatus for sensing a substrate in a chamber |
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