JPH0485730U - - Google Patents

Info

Publication number
JPH0485730U
JPH0485730U JP12875490U JP12875490U JPH0485730U JP H0485730 U JPH0485730 U JP H0485730U JP 12875490 U JP12875490 U JP 12875490U JP 12875490 U JP12875490 U JP 12875490U JP H0485730 U JPH0485730 U JP H0485730U
Authority
JP
Japan
Prior art keywords
sensor
outputs
wafer
power supplies
detection device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12875490U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12875490U priority Critical patent/JPH0485730U/ja
Publication of JPH0485730U publication Critical patent/JPH0485730U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の実施例1の概略図(ブロツク
図)、第2図は実施例1における干渉性膜の膜厚
とセンサヘツドの受光するウエハーより反射した
光の反射強度との関係のグラフ、第3図および第
4図は実施例2における概略図および膜厚と反射
強度の関係のグラフ、第5図はウエハーの裏面に
まわり込み成膜をした干渉性膜の図、第6図は単
一の反射型センサを用いた場合の膜厚に対する反
射強度の関係図で、第7図は検知装置の概略図、
第8図は第7図のウエハー検知装置部のセンサヘ
ツド部分の拡大図である。 1……ウエハー、2,3,4……センサヘツド
、5,6,7……センサ電源、8……OR論理回
路、9……CPU I/Oボード、10……第1
センサヘツドの受光した干渉波形、11……第2
センサヘツドの受光した干渉波形、12,13…
…センサ不感膜厚領域、14……センサ不感領域
、15……第3センサヘツドの受光した干渉波形
、101……発光路、102……反射光路。
Fig. 1 is a schematic diagram (block diagram) of Embodiment 1 of the present invention, and Fig. 2 is a graph of the relationship between the thickness of the coherent film and the reflection intensity of the light reflected from the wafer received by the sensor head in Embodiment 1. , FIGS. 3 and 4 are schematic diagrams and graphs of the relationship between film thickness and reflection intensity in Example 2, FIG. 5 is a diagram of the coherent film formed around the back surface of the wafer, and FIG. This is a diagram showing the relationship between reflection intensity and film thickness when a single reflection sensor is used. Figure 7 is a schematic diagram of the detection device;
FIG. 8 is an enlarged view of the sensor head portion of the wafer detection device section of FIG. 7. 1... Wafer, 2, 3, 4... Sensor head, 5, 6, 7... Sensor power supply, 8... OR logic circuit, 9... CPU I/O board, 10... First
Interference waveform received by the sensor head, 11...2nd
Interference waveforms received by the sensor head, 12, 13...
...Sensor insensitive film thickness area, 14...Sensor insensitive area, 15...Interference waveform received by the third sensor head, 101...Emission path, 102...Reflection optical path.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 異なる波長で発光する複数のセンサヘツドと、
該複数のセンサヘツドの出力をそれぞれ入力して
ウエハーの有無信号を出力する複数のセンサ電源
と、該複数のセンサ電源の出力を入力して、それ
らの論理和を出力する論理回路を有するウエハー
検知装置。
multiple sensor heads that emit light at different wavelengths;
A wafer detection device having a plurality of sensor power supplies that input the outputs of the plurality of sensor heads and output a wafer presence/absence signal, and a logic circuit that inputs the outputs of the plurality of sensor power supplies and outputs their logical sum. .
JP12875490U 1990-11-29 1990-11-29 Pending JPH0485730U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12875490U JPH0485730U (en) 1990-11-29 1990-11-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12875490U JPH0485730U (en) 1990-11-29 1990-11-29

Publications (1)

Publication Number Publication Date
JPH0485730U true JPH0485730U (en) 1992-07-24

Family

ID=31876198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12875490U Pending JPH0485730U (en) 1990-11-29 1990-11-29

Country Status (1)

Country Link
JP (1) JPH0485730U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014529888A (en) * 2011-08-16 2014-11-13 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated Method and apparatus for sensing a substrate in a chamber

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014529888A (en) * 2011-08-16 2014-11-13 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated Method and apparatus for sensing a substrate in a chamber
JP2017038071A (en) * 2011-08-16 2017-02-16 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated Method and apparatus for sensing a substrate in a chamber

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