JPH0487007A - Thin film magnetic head - Google Patents
Thin film magnetic headInfo
- Publication number
- JPH0487007A JPH0487007A JP20316090A JP20316090A JPH0487007A JP H0487007 A JPH0487007 A JP H0487007A JP 20316090 A JP20316090 A JP 20316090A JP 20316090 A JP20316090 A JP 20316090A JP H0487007 A JPH0487007 A JP H0487007A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- magnetic
- gap
- core
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 30
- 239000004020 conductor Substances 0.000 claims description 12
- 239000000696 magnetic material Substances 0.000 claims description 5
- 239000012212 insulator Substances 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 8
- 230000035945 sensitivity Effects 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はCVD等の薄膜形成技術、フォトリソグラフィ
及びエツチング等を利用して製作される薄膜磁気ヘッド
に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a thin film magnetic head manufactured using thin film forming techniques such as CVD, photolithography, etching, and the like.
(従来の技術)
磁気記録再生装置に組み込まれる薄膜磁気ヘッドの一般
的な構造は第4図に示すように、上コア100と下コア
101の先端部に非磁性層102によってギャップ10
3を形成し、また上コア100と下コア101の対向す
る空間部に絶縁層104にて囲まれる導体コイル105
のパターンを形成している。(Prior Art) As shown in FIG. 4, the general structure of a thin film magnetic head incorporated in a magnetic recording/reproducing device is that a gap 10 is formed between the tips of an upper core 100 and a lower core 101 by a nonmagnetic layer 102.
3 and is surrounded by an insulating layer 104 in the space where the upper core 100 and the lower core 101 face each other.
forming a pattern.
(発明が解決しようとする課題)
上述した薄膜磁気ヘッドは真空蒸着、スパッタリング或
いはCVD等の薄膜形成技術を利用して製作されるため
、上コア100のギャップを形成する先端部100aと
後方の平坦部100bと連続する傾斜部100cが他の
部分に比べ薄く形成される傾向がある。このため、薄膜
磁気ヘッドの磁気回路のうち傾斜部100cの部分が最
初にに磁気飽和し、更に仮に同じ厚みであっても傾斜部
100cは磁束が流れづらく全ての磁束をギャップ付近
まで導くことができない。このため、磁性膜のBsを十
分に生かすことができず、ギャップより高い磁束密度の
磁束を出すことができず、記録効率が低下したり、高抗
磁力媒体ヘッド記録ができないという不利がある。(Problem to be Solved by the Invention) Since the above-mentioned thin film magnetic head is manufactured using thin film forming techniques such as vacuum evaporation, sputtering, or CVD, the top core 100 has a flat tip 100a forming a gap and a flat rear part. The inclined portion 100c that is continuous with the portion 100b tends to be formed thinner than other portions. Therefore, in the magnetic circuit of the thin-film magnetic head, the part of the sloped part 100c becomes magnetically saturated first, and even if the thickness is the same, it is difficult for magnetic flux to flow through the sloped part 100c, making it difficult to guide all the magnetic flux to the vicinity of the gap. Can not. For this reason, the Bs of the magnetic film cannot be fully utilized, and a magnetic flux with a higher magnetic flux density than the gap cannot be emitted, resulting in disadvantages such as a decrease in recording efficiency and the inability to perform recording with a high coercive force medium head.
また、傾斜部100cは軟磁気特性も劣り、再生効率及
び感度の低下を招いている。Furthermore, the inclined portion 100c has poor soft magnetic properties, resulting in a reduction in reproduction efficiency and sensitivity.
(課題を解決するための手段)
上記課題を解決すべく本発明は、薄膜形成技術によって
製作される磁気ヘッドの上コアの平坦部の前端を、磁気
ギャップの寿命0点よりも前方に位置せしめた。(Means for Solving the Problems) In order to solve the above problems, the present invention positions the front end of the flat part of the upper core of the magnetic head manufactured by thin film forming technology in front of the zero point of the magnetic gap life. Ta.
(作用)
上コアの平坦部の前端を、磁気ギャップの寿命0点より
も前方に位置させることで、上コアの傾斜部が厚くなり
、この部分の磁気飽和を防止できる。(Function) By locating the front end of the flat portion of the upper core ahead of the 0 point of life of the magnetic gap, the sloped portion of the upper core becomes thicker, and magnetic saturation in this portion can be prevented.
(実施例) 以下に本発明の実施例を添付図面に基いて説明する。(Example) Embodiments of the present invention will be described below with reference to the accompanying drawings.
第1図は本発明に係る薄膜磁気ヘッドの断面図、第2図
は同薄膜磁気ヘッドの平面図である。FIG. 1 is a sectional view of a thin film magnetic head according to the present invention, and FIG. 2 is a plan view of the same thin film magnetic head.
薄膜磁気ヘッドは基板1上に絶縁層2,3,4゜5を蒸
着、スパッタリング或いはCVD等の薄膜形成技術を利
用して形成し、これら絶縁層2,3゜4.5の一部をフ
ォトリソグラフィ及びドライエツチングにて除去して凹
部を形成し、この凹部内にFe、Co、Ni等を主成分
とする磁性材料からなる下コア6、中間コア7a、7b
、上コア8及びCuSAl、Au、Ag等からなる導体
コイル9を埋設し、更に導体コイル9とリード部10と
をコンタクトホール内の導体11で接続している。The thin-film magnetic head is formed by forming insulating layers 2, 3, 4.5 on a substrate 1 using thin film forming techniques such as vapor deposition, sputtering, or CVD, and a portion of these insulating layers 2, 3, 4.5 is photo-photographed. A recess is formed by removal using lithography and dry etching, and a lower core 6, intermediate cores 7a and 7b made of a magnetic material mainly composed of Fe, Co, Ni, etc. are placed in the recess.
, an upper core 8 and a conductor coil 9 made of CuSAl, Au, Ag, etc. are buried therein, and the conductor coil 9 and the lead portion 10 are connected by a conductor 11 in the contact hole.
また、前方の中間コア7aと下コア6との間には磁気ギ
ャップ12が形成され、本発明にあってはこの磁気ギャ
ップ12の深さ方向の後端部、即ち寿命0点(寿命が零
になる点)よりも上コア8の平坦部8aの前端Pを前方
に位置せしめ、平坦部8aとギャップ12との間の部分
つまり従来の上コアの傾斜部の厚みを他の部分よりも厚
くしてこの部分のBsを十分に生かすことができるよう
にしている。尚、図示例では上コア8の前端部を斜めに
切り欠いているが、上コア8を切り欠かす想像線で示す
点P′まで平坦部8aの前端を伸してもよい。Further, a magnetic gap 12 is formed between the front intermediate core 7a and the lower core 6, and in the present invention, the rear end of the magnetic gap 12 in the depth direction, that is, the life 0 point (the life is zero) The front end P of the flat part 8a of the upper core 8 is positioned forward than the point where the flat part 8a of the upper core 8 becomes This allows us to make full use of the Bs in this area. In the illustrated example, the front end portion of the upper core 8 is cut out diagonally, but the front end of the flat portion 8a may be extended to a point P' shown by an imaginary line where the upper core 8 is cut out.
次に第3図に基づき本発明の薄膜磁気ヘットの製造方法
の一例を説明する。Next, an example of a method for manufacturing the thin film magnetic head of the present invention will be explained based on FIG.
即ち、薄膜磁気ヘットは第3図(a)に示すように、基
板1上に薄膜形成技術によって8102、T i O2
或いはAl2O3等の絶縁層2を1〜10μmの厚さで
形成し、次いで絶縁層2をフォトリソグラフィ技術によ
って作成したマスクを介してエツチングし、コア形状の
溝13を形成する。そして、同図(b)に示すように溝
13内に薄膜形成技術によってFe、Co、Niを主成
分とした軟磁性材料の層を形成し、この磁性層の上部の
余分な部分を研磨によって削除し、表面を平坦化して下
コア6とする。That is, as shown in FIG. 3(a), the thin film magnetic head is manufactured using thin film forming technology such as 8102, T i O2 on the substrate 1.
Alternatively, the insulating layer 2 of Al2O3 or the like is formed to a thickness of 1 to 10 .mu.m, and then the insulating layer 2 is etched through a mask made by photolithography to form the core-shaped groove 13. Then, as shown in FIG. 13(b), a layer of soft magnetic material mainly composed of Fe, Co, and Ni is formed in the groove 13 using thin film formation technology, and the excess portion of the upper part of this magnetic layer is removed by polishing. The lower core 6 is obtained by removing the core and flattening the surface.
次いで、同図(C)に示すように絶縁層2の上に別の絶
縁層3を形成し、同図(d)に示すようにエツチングに
よって絶縁層3の表面に形成したコイル溝14に、薄膜
形成技術によってCu、Al、Au或いはAg等の導体
を埋め込み、この導体の上の余分な部分を研磨によって
削除し、表面を平坦化して導体コイル9とする。尚、コ
イル溝14の深さは下コア6に達しないものとし電気的
な絶縁を確保する。Next, as shown in the figure (C), another insulating layer 3 is formed on the insulating layer 2, and as shown in the figure (d), a coil groove 14 formed on the surface of the insulating layer 3 by etching is formed. A conductor such as Cu, Al, Au, or Ag is embedded using a thin film forming technique, and the excess portion on the conductor is removed by polishing to flatten the surface to form a conductor coil 9. Note that the depth of the coil groove 14 does not reach the lower core 6 to ensure electrical insulation.
この後、同図(e)に示すように薄膜形成技術によって
5102、TiO□或いはAl2O3等の絶縁層4を0
.1〜1μmの厚さで形成し、同図(f)に示すように
前後に中間コアの溝15a、15bをエツチングによっ
て形成する。ここで、前方の中間コアの溝15aについ
てはテーパ状にするとともにギヤツブ分残してエツチン
グを止め、後方の溝15bについては下コア6が露出す
るまで行なう。After that, as shown in the same figure (e), the insulating layer 4 of 5102, TiO□, Al2O3, etc.
.. It is formed to a thickness of 1 to 1 μm, and grooves 15a and 15b of the intermediate core are formed at the front and rear by etching, as shown in FIG. 2(f). Here, the groove 15a of the front intermediate core is made into a tapered shape and the etching is stopped leaving a gear tooth portion, and the groove 15b of the rear is etched until the lower core 6 is exposed.
次いで、同図(g)に示すように中間コアの溝15a、
15b内に薄膜形成技術によってFe。Next, as shown in the same figure (g), the groove 15a of the intermediate core,
15b by thin film formation technology.
Co、Niを主成分とした軟磁性材料の層を形成し、こ
の磁性層の上部の余分な部分を研磨によって削除し、表
面を平坦化して中間コア7a、7bとする。A layer of a soft magnetic material containing Co and Ni as main components is formed, and an excess portion of the upper part of this magnetic layer is removed by polishing to flatten the surface to form intermediate cores 7a and 7b.
そして同図(h)に示すように、薄膜形成技術によって
8102、T i O2或いはA1゜03等の絶縁層5
を1〜10μmの厚さで形成し、前記と同様にコア溝1
6をエツチングし、この溝16内に同図(i)に示すよ
うにFe、 Co、 Niを主成分とした軟磁性材料の
層を形成し、この磁性層の上部の余分な部分を研磨によ
って削除し、表面を平坦化して上コア8とする。As shown in FIG. 5(h), an insulating layer 5 of 8102, TiO2, A1°03, etc. is formed using thin film forming technology.
is formed with a thickness of 1 to 10 μm, and the core groove 1 is formed in the same manner as above.
6 is etched, and a layer of soft magnetic material mainly composed of Fe, Co, and Ni is formed in the groove 16 as shown in FIG. The upper core 8 is obtained by removing the upper core 8 and flattening the surface.
この後、同図(j)に示すように絶縁層5にコンタクト
ホールを形成し、このコンタクトホール内を導体11で
埋め、この導体11を介して前記したように導体コイル
9に接続する0、1〜10μm厚のCu層を形成し、こ
のCu層を所定形状にエツチングしてリード部10とす
る。After that, as shown in FIG. 12(j), a contact hole is formed in the insulating layer 5, the inside of this contact hole is filled with a conductor 11, and the conductor coil 9 is connected to the conductor coil 9 as described above through this conductor 11. A Cu layer having a thickness of 1 to 10 μm is formed, and this Cu layer is etched into a predetermined shape to form the lead portion 10.
この後、磁気ギャップ12が端部となるように切断して
第1図に示した薄膜磁気ヘットを得る。Thereafter, the thin film magnetic head shown in FIG. 1 is obtained by cutting so that the magnetic gap 12 becomes the end.
(効果)
以上に説明したように本発明によれば、薄膜形成技術に
よって製作される磁気ヘッドの上コアの平坦部の前端を
、磁気ギャップの寿命0点よりも前方に位置せしめたの
で、上コアの傾斜部が厚くなり、傾斜部の磁気飽和を防
止できる。したがって、磁性膜のBsを十分に生かすこ
とができ、記録効率、再生効率及び感度の向上を図れる
。(Effects) As explained above, according to the present invention, the front end of the flat part of the upper core of the magnetic head manufactured by thin film formation technology is positioned forward of the zero point of the magnetic gap life. The sloped portion of the core becomes thicker, and magnetic saturation of the sloped portion can be prevented. Therefore, the Bs of the magnetic film can be fully utilized, and recording efficiency, reproduction efficiency, and sensitivity can be improved.
第1図は本発明に係る薄膜磁気ヘッドの断面図、第2図
は同薄膜磁気ヘッドの平面図、第3図(a)乃至(j)
は薄膜磁気ヘッドの製法の一例を示した図、第4図は従
来の薄膜磁気ヘッドの断面図である。
1・・・基板、2,3,4.5・・・絶縁層、6・・・
下コア、7a、7b・・・中間コア、8・・・上コア、
9・・・導体コイル、12・・・ギャップ、P・・・上
コアの平坦部の前端。FIG. 1 is a sectional view of a thin film magnetic head according to the present invention, FIG. 2 is a plan view of the same thin film magnetic head, and FIGS. 3(a) to (j)
4 is a diagram showing an example of a method for manufacturing a thin film magnetic head, and FIG. 4 is a sectional view of a conventional thin film magnetic head. 1... Substrate, 2, 3, 4.5... Insulating layer, 6...
Lower core, 7a, 7b...middle core, 8...upper core,
9... Conductor coil, 12... Gap, P... Front end of flat part of upper core.
Claims (1)
を配置し、更にコア先端間に磁気ギャップを形成してな
る薄膜磁気ヘッドにおいて、前記コアのうち上コアの平
坦部の前端を磁気ギャップの寿命寸法0点よりも前方に
位置させたことを特徴とする薄膜磁気ヘッド。In a thin film magnetic head in which a conductor coil is arranged between cores made of magnetic material via an insulator, and a magnetic gap is formed between the tips of the cores, the front end of the flat part of the upper core is connected to the front end of the flat part of the upper core of the core. A thin film magnetic head characterized in that it is located forward of the zero point of life dimension.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20316090A JPH0487007A (en) | 1990-07-30 | 1990-07-30 | Thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20316090A JPH0487007A (en) | 1990-07-30 | 1990-07-30 | Thin film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0487007A true JPH0487007A (en) | 1992-03-19 |
Family
ID=16469434
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20316090A Pending JPH0487007A (en) | 1990-07-30 | 1990-07-30 | Thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0487007A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60160010A (en) * | 1984-01-31 | 1985-08-21 | Toshiba Corp | Thin film magnetic head |
| JPS62107417A (en) * | 1985-11-01 | 1987-05-18 | Matsushita Electric Ind Co Ltd | thin film magnetic head |
-
1990
- 1990-07-30 JP JP20316090A patent/JPH0487007A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60160010A (en) * | 1984-01-31 | 1985-08-21 | Toshiba Corp | Thin film magnetic head |
| JPS62107417A (en) * | 1985-11-01 | 1987-05-18 | Matsushita Electric Ind Co Ltd | thin film magnetic head |
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