JPH0489321A - Production of glass-particulate deposit - Google Patents
Production of glass-particulate depositInfo
- Publication number
- JPH0489321A JPH0489321A JP2199117A JP19911790A JPH0489321A JP H0489321 A JPH0489321 A JP H0489321A JP 2199117 A JP2199117 A JP 2199117A JP 19911790 A JP19911790 A JP 19911790A JP H0489321 A JPH0489321 A JP H0489321A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- resistant plate
- heat
- particle deposit
- starting material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 239000011521 glass Substances 0.000 claims description 74
- 239000002245 particle Substances 0.000 claims description 33
- 239000007858 starting material Substances 0.000 claims description 32
- 239000010419 fine particle Substances 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 22
- 238000002485 combustion reaction Methods 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- 239000002994 raw material Substances 0.000 claims description 5
- 238000004017 vitrification Methods 0.000 claims description 2
- 238000000151 deposition Methods 0.000 description 16
- 230000008021 deposition Effects 0.000 description 13
- 238000010586 diagram Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000010453 quartz Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000004071 soot Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- 230000002194 synthesizing effect Effects 0.000 description 4
- 239000000567 combustion gas Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000001308 synthesis method Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01486—Means for supporting, rotating or translating the preforms being formed, e.g. lathes
- C03B37/01493—Deposition substrates, e.g. targets, mandrels, start rods or tubes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1484—Means for supporting, rotating or translating the article being formed
- C03B19/1492—Deposition substrates, e.g. targets
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ガラス微粒子堆積体をVAD法(気相軸付法
)あるいはOVD法(外付法)などのスート合成法によ
り製造する方法に関し、特に、生産性を向上した製造方
法を提供するものである。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a method for producing a glass particle deposit by a soot synthesis method such as a VAD method (vapor deposition method) or an OVD method (external deposition method). In particular, the present invention provides a manufacturing method with improved productivity.
本発明によるガラス微粒子堆積体は電気炉などの高温炉
により熱処理、透明ガラス化することにより、高品質な
ガラスロッドとなるので、光フアイバ用ガラス製品等に
好適に用いられる。The glass fine particle deposit according to the present invention can be heat-treated in a high-temperature furnace such as an electric furnace and made into transparent glass to obtain a high-quality glass rod, which can be suitably used for optical fiber glass products and the like.
ガラス微粒子堆積体を合成する方法として、燃焼バーナ
ーから燃焼ガス及び原料ガスを混合噴出し、火炎中での
火炎加水分解反応または酸化反応によりガラス微粒子を
生成し、このガラス微粒子を回転する出発材の先端に堆
積させてガラス微粒子堆積体を形成させ、該堆積体の成
長に合わせて出発材を燃焼バーナーと相対的に移動させ
ることにより、ガラス微粒子堆積体を製造するVAD法
があった。また、出発材の外周部に燃焼バーナーにより
生成したガラス微粒子を堆積させ、出発材または燃焼バ
ーナーを1回以上トラバースさせることにより、ガラス
微粒子堆積体を製造するOvD法(例えば特開昭48−
73522号公報に提案されている)がある。As a method for synthesizing glass fine particle deposits, combustion gas and raw material gas are mixed and ejected from a combustion burner, glass fine particles are generated by a flame hydrolysis reaction or oxidation reaction in a flame, and the starting material is rotated to generate glass fine particles. There is a VAD method in which a glass particulate deposit is produced by depositing on the tip to form a glass particulate deposit, and moving the starting material relative to a combustion burner as the deposit grows. Furthermore, the OvD method (for example, JP-A No. 48-1999-1) produces a glass particle deposit by depositing glass particles generated by a combustion burner on the outer periphery of the starting material and traversing the starting material or the combustion burner one or more times.
(proposed in Japanese Patent No. 73522).
従来、こうしたスート合成法によるガラス微粒子堆積体
の製造においては、第5図に示す如く、ガラス微粒子堆
積体の両端部にテーパ状の非有効部が形成される。この
非有効部はVAD法、OVD法ともに、その製法上、無
くすことはできない。Conventionally, in the production of a glass particle deposit by such a soot synthesis method, tapered ineffective portions are formed at both ends of the glass particle deposit, as shown in FIG. This ineffective area cannot be eliminated due to the manufacturing method in both the VAD method and the OVD method.
すなわち、VAD法の場合は、第6図ta+〜fclに
示すように、通常細径のガラスロッド先端部よりガラス
微粒子堆積体の合成を開始するが、最初は堆積するター
ゲットが小さい〔第6図(a)〕ことがら、ガラス微粒
子の堆積効率が悪い。さらに堆積の定常状態(外径、母
材の成長速度が一定の状態をいう)に近づくにつれ〔第
6図(bl〜(C)〕テーパ状の非有効部の長さは長く
なり、一方ターゲットは大きくなるため、堆積効率も向
上する。定常になった状態で最も堆積効率が高い状態と
なる。このとき、非有効部上端は、火炎による加熱が充
分でないためガラス微粒子堆積体が柔らかい(密度が小
)ことから、割れが発生しゃすいという問題が生じる。That is, in the case of the VAD method, as shown in FIG. 6 ta+ to fcl, synthesis of glass fine particle deposits is usually started from the tip of a glass rod with a small diameter, but initially the target to be deposited is small [FIG. 6 (a)] The deposition efficiency of glass particles is poor. Furthermore, as the deposition approaches a steady state (a state in which the outer diameter and growth rate of the base material are constant) [Fig. increases, so the deposition efficiency also improves.The deposition efficiency is highest when it becomes steady.At this time, the upper end of the ineffective part is not heated sufficiently by the flame, so the glass particle deposit is soft (density is low). (small), which causes the problem of easy cracking.
また、OVD法においては、第7図に示すように、出発
材となる心棒13をチャック16−1および16−2に
固定し、バーナエlを用いてこの出発材13の外周にガ
ラス微粒子堆積体を形成する。チャνりl 6−1およ
び16−2は同調して回転するようになっており、バー
ナ11に対して一定区間で左右に往復トラバースできる
機構となっている。トラバースはチャック16−1およ
び16−2を固定し、バーナ■1について行っても同様
である。バーナ11からは火炎12が形成され、この火
炎12内でガラス微粒子が生成され、チャック16−1
.16−2をトラバースさせることを繰り返すことによ
り、出発材13の表面にガラス微粒子が付着・堆積して
ガラス微粒子堆積体の層が形成される。バーナ11内で
生成されたガラス微粒子は燃焼ガスに運ばれる形で堆積
面まで移動するため、広がりを持って堆積する。このた
め、ガラス微粒子堆積体の両端はテーバ状とならざるを
得ない。また、OVD法の場合は上述したように、繰り
返し熱源が移動するため、母材は加熱、冷却を繰り返す
ことになり、特異点となる両端は、割れを生じやすくな
る。こうしたことがらも、バーナの調整だけで両端形状
をテーバの少ないものとすることは困難である。In addition, in the OVD method, as shown in FIG. 7, the mandrel 13 serving as the starting material is fixed to the chucks 16-1 and 16-2, and a glass fine particle deposit is formed on the outer periphery of the starting material 13 using a burner l. form. The shafts 6-1 and 16-2 are designed to rotate in synchrony, and are configured to be able to reciprocate left and right with respect to the burner 11 in a fixed section. The same thing can be done even if the traverse is performed for burner 1 with chucks 16-1 and 16-2 fixed. A flame 12 is formed from the burner 11, and glass fine particles are generated within the flame 12, and the chuck 16-1
.. By repeating traversing 16-2, glass particles adhere and accumulate on the surface of the starting material 13, forming a layer of glass particle deposits. The glass particles generated in the burner 11 are carried by the combustion gas and move to the deposition surface, so that they are spread out and deposited. For this reason, both ends of the glass fine particle deposit must have a tapered shape. Furthermore, in the case of the OVD method, as described above, since the heat source moves repeatedly, the base material is repeatedly heated and cooled, and both ends, which are singular points, are likely to be cracked. Under these circumstances, it is difficult to make the shape of both ends less tapered just by adjusting the burner.
このように、従来のスート合成法によるガラス微粒子堆
積体の合成においては、堆積効率を悪くさせ、製造歩留
りを低下させる要因となる非有効部の形成が避けられな
かった。また、この非有効部は、生産性向上の観点から
合成速度(単位時間当たりに合成されるガラス微粒子堆
積体の重量:27分)を上げるに従い長くなり、逆に生
産性を低下させるという矛盾を生ずる。As described above, in the synthesis of glass fine particle deposits using the conventional soot synthesis method, the formation of ineffective parts, which deteriorates the deposition efficiency and reduces the manufacturing yield, cannot be avoided. In addition, from the viewpoint of improving productivity, this ineffective part becomes longer as the synthesis rate (weight of glass fine particle deposits synthesized per unit time: 27 minutes) is increased, which causes a paradox in that it reduces productivity. arise.
本発明は、上記した問題点の解消を課題としてなされた
ものであり、堆積効率、生産性、製品歩留りが高く、高
品質なガラス微粒子堆積体を製造できる方法を提供する
ことを意図している。The present invention has been made to solve the above-mentioned problems, and is intended to provide a method for producing a high-quality glass particle deposit with high deposition efficiency, high productivity, and high product yield. .
上記課題を解決するための本発明の構成は、気体のガラ
ス原料を燃焼バーナーから噴出させて火炎中で反応させ
、これによって生成するガラス微粒子を回転する出発材
または心棒の周囲に堆積させつつ上記燃焼バーナーを出
発材または心棒に対して相対的に移動させることにより
ガラス微粒子堆積体を製造する方法において、出発材ま
たは心棒のガラス微粒子の堆積開始端近傍に、脱着可能
なリング状の耐熱板を上記出発材または心棒と同軸状に
設置し、該耐熱板の片面に一体となるようにガラス微粒
子堆積体を成長させることを特徴とするものである。The structure of the present invention for solving the above-mentioned problems is such that gaseous glass raw materials are ejected from a combustion burner and reacted in a flame, and the resulting glass fine particles are deposited around the rotating starting material or mandrel, while the above-mentioned In a method for producing a glass particle deposit by moving a combustion burner relative to a starting material or a mandrel, a removable ring-shaped heat-resistant plate is provided near the end of the starting material or mandrel at which glass particulates start to accumulate. It is characterized in that it is placed coaxially with the starting material or mandrel, and the glass fine particle deposit is grown integrally on one side of the heat-resistant plate.
上記リング状の耐熱板は、ガラス微粒子堆積体製造後、
高温熱処理による透明ガラス化前に取り去ることもでき
る。The above-mentioned ring-shaped heat-resistant plate is produced after manufacturing the glass fine particle deposit.
It can also be removed before becoming transparent vitrified by high temperature heat treatment.
上記リング状の耐熱板として、その径が製造しようとす
るガラス微粒子堆積体の外径りに対して0.5Dから1
.0 Dのものを用い、且つ燃焼バーナの中心軸と出発
材の交差する点から母材成長側と反対方向にD以内の位
置に該耐熱板を設置することを、本発明の特に好ましい
実施態様として挙げることができる。The ring-shaped heat-resistant plate has a diameter of 0.5D to 1D relative to the outer diameter of the glass particle deposit body to be manufactured.
.. In a particularly preferred embodiment of the present invention, the heat-resistant plate is installed at a position within D in the direction opposite to the base material growth side from the point where the central axis of the combustion burner and the starting material intersect. It can be mentioned as follows.
以下、図面を参照して本発明を説明する。第1図及び第
2図は本発明の構成を示す概略説明図である。第1図は
VAD法における構成例であり、燃焼バーナーlにより
火炎2が形成され、燃焼バーナーlより噴出する気体状
ガラス原料、例えば81 Cz、は、火炎2中で火炎加
水分解反応され、ガラス微粒子(SI O諺)となる。The present invention will be described below with reference to the drawings. FIG. 1 and FIG. 2 are schematic explanatory diagrams showing the configuration of the present invention. FIG. 1 shows a configuration example in the VAD method, in which a flame 2 is formed by a combustion burner 1, and the gaseous glass raw material ejected from the combustion burner 1, e.g. They become fine particles (SIO proverb).
このガラス微粒子は出発材3に堆積されるが、出発材3
には堆積開始部より若干上部にリング状の耐熱板4が、
脱着可能な形態で設置されており、ここからガラス微粒
子堆積体5が合成される。These glass particles are deposited on the starting material 3, but the starting material 3
There is a ring-shaped heat-resistant plate 4 slightly above the deposition start part.
It is installed in a removable form, from which the glass fine particle deposit 5 is synthesized.
一方、第2図はOVD法における構成例であるが、出発
材13の両端部にリング状耐熱板14がそれぞれ設置さ
れ、この耐熱板14の間を燃焼バーナー11が相対的に
トラバースすることにより(出発材が実質的にトラバー
スすることもある)、ガラス微粒子堆積体5が合成され
る。On the other hand, FIG. 2 shows a configuration example for the OVD method, in which ring-shaped heat-resistant plates 14 are installed at both ends of the starting material 13, and the combustion burner 11 relatively traverses between the heat-resistant plates 14. (The starting material may be substantially traversed), a glass particulate deposit 5 is synthesized.
どちらの構成例でも、出発材3(または13)において
、ガラス微粒子の堆積開始点の近傍に、リング状の耐熱
板4(または14)を設置することにより、燃焼バーナ
ー1(または11)により合成されるガラス微粒子は耐
熱板4(14)さえぎられるため、そのほとんどが耐熱
板4(14)下方に付着し、耐熱板4(14)をまわり
込んで上部出発材に付着するスートは激減する。このた
め、耐熱板4(14)の位fl調整より、またはガラス
微粒子の堆積開始点の位置調整により、テーパ状非有効
部の長さを短く調整できることになる。In either configuration example, in the starting material 3 (or 13), a ring-shaped heat-resistant plate 4 (or 14) is installed near the starting point of glass particle deposition, so that synthesis can be performed using the combustion burner 1 (or 11). Since the glass particles are blocked by the heat-resistant plate 4 (14), most of them adhere to the lower part of the heat-resistant plate 4 (14), and the amount of soot that goes around the heat-resistant plate 4 (14) and adheres to the upper starting material is drastically reduced. Therefore, the length of the tapered ineffective portion can be adjusted to be shorter by adjusting the height of the heat-resistant plate 4 (14) or by adjusting the position of the starting point of glass particle deposition.
ガラス微粒子堆積体は第1図に示す如く、耐熱板の底面
(下面)から出発ロフトに堆積を始めるが、耐熱板の位
置を調整することにより、耐熱板の下面にもガラス微粒
子はスムーズに付着し、耐熱板とガラス微粒子がほぼ一
体状となる。こうすることにより、従来法では耐熱板に
より遮られずに上方に付着していたガラス微粒子が遮ら
れ、上方への付着がなくなるので、非有効部を短くする
効果が生じる。さらに、耐熱板4(14)により上方部
の付着が制限されるため、従来法では火炎に加熱されに
くく柔らかいため、割れの原因となる部分がなくなり、
製造歩留りが向上するという効果が生ずる。As shown in Figure 1, the glass particle deposits begin to accumulate in the starting loft from the bottom surface (lower surface) of the heat-resistant plate, but by adjusting the position of the heat-resistant plate, the glass particles can smoothly adhere to the bottom surface of the heat-resistant plate. The heat-resistant plate and the glass particles become almost integral. By doing this, the glass particles that were attached to the top without being blocked by the heat-resistant plate in the conventional method are blocked and no longer stick to the top, resulting in the effect of shortening the ineffective portion. Furthermore, since the heat-resistant plate 4 (14) restricts the adhesion of the upper part, which is soft and difficult to be heated by flame in the conventional method, there is no part that could cause cracks.
This has the effect of improving manufacturing yield.
堆積開始点と耐熱板が離れ過ぎていると、耐熱板による
遮り効果および加熱効果はなくなる。従って、本発明に
おいて、ガラス微粒子堆積体と耐熱板を一体化する目的
のために、耐熱板の寸法と耐熱板の取付は位置は重要で
ある。例えば、第8図fatおよび(blに示すように
、製造しようとするガラス微粒子堆積体の外径りに対し
て、0.5 Dから1.0Dの外径のリング状の耐熱板
を用いることが好ましく、出発材(心棒)への取付は位
置は燃焼バーナの中心軸と出発材との交点から母材成長
側と反対方向にD以内の位置とすることが好ましい。If the deposition starting point and the heat-resistant plate are too far apart, the shielding effect and heating effect of the heat-resistant plate are lost. Therefore, in the present invention, for the purpose of integrating the glass fine particle deposit and the heat-resistant plate, the dimensions of the heat-resistant plate and the mounting position of the heat-resistant plate are important. For example, as shown in FIG. is preferable, and the position of attachment to the starting material (mandrel) is preferably within D from the intersection of the central axis of the combustion burner and the starting material in the direction opposite to the growth side of the base material.
第8図fatは出発材の外周にガラス微粒子堆積体を形
成する場合、同図fblは出発ロット(心棒)先端にガ
ラス微粒子堆積体を成長させる場合である。FIG. 8 fat shows the case where the glass fine particle deposit is formed on the outer periphery of the starting material, and FIG. 8 fbl shows the case where the glass fine particle deposit is grown at the tip of the starting lot (mandrel).
本発明に用いる耐熱板は、石英、カーボン等の耐熱性を
有する材質のものが用いられるが、これらの耐熱板は、
第3図に示すように、場合によれば、透明ガラス化前に
取り去ることができる。また、一方、カーボン製のもの
を使用し、透明化の後に取り去ることも差し支えない。The heat-resistant plates used in the present invention are made of heat-resistant materials such as quartz and carbon.
As shown in FIG. 3, it can optionally be removed before clear vitrification. On the other hand, it is also possible to use a carbon material and remove it after transparency.
なお、リング状の耐熱板は、出発材に設置できる構成で
あれば、一体のものでなくても、例えば半割り構造のも
のであっても良い。また、内孔形状は出発材の形状に合
わせればよいが、外周形状は円形あるいはこれに近い形
状のものが望ましい。Note that the ring-shaped heat-resistant plate does not have to be an integral piece, and may have a half-split structure, for example, as long as it can be installed on the starting material. Further, although the shape of the inner hole may be matched to the shape of the starting material, it is desirable that the outer circumferential shape be circular or a shape close to this.
例えば三角形状では、耐熱板の形状により、当初のガラ
ス微粒子堆積体形状が左右され、変形に繋がるため好ま
しくない。例えば、五角形以上の略正多角形であれば良
い。具体例として第4図fatに円形のものを、同図f
blに五角形のものを示す。For example, a triangular shape is not preferable because the shape of the heat-resistant plate affects the initial shape of the glass particle deposit, leading to deformation. For example, it may be a substantially regular polygon of pentagon or more. As a specific example, a circular one is shown in figure 4 fat, and a circular one is shown in figure 4 fat.
The pentagonal one is shown in bl.
上記のように本発明は、VAD法においても、OVD法
においても同様の効果を奏する。As described above, the present invention has similar effects in both the VAD method and the OVD method.
以下に本発明を実施例により具体的に説明するが、本発
明はこれに限定されるものではない。EXAMPLES The present invention will be specifically explained below using Examples, but the present invention is not limited thereto.
(比較例)
同心円状8重管バーナーを燃焼バーナーとし、第6図f
at〜JCIに示した従来法により、18mmφの出発
材の先端にガラス微粒子堆積体を合成、成長させた。バ
ーナーに供給するガスは、原料として SiCl25j
!/分、燃焼ガスとして山 501/分、0嘗 481
/分、燃焼調整用ガスとしてAr 1217分 を使
用した。合成されたガラス微粒子堆積体の外径は180
mmφ、長さは全長で800mmであった。このうち上
端のテーパ部は200mm、下端のテーパ部は150m
mであり、有効部の割合いは、長さで56%に過ぎなが
った。(Comparative example) A concentric eight-pipe burner is used as the combustion burner, and Fig. 6 f
A glass fine particle deposit was synthesized and grown on the tip of a starting material having a diameter of 18 mm using the conventional method shown in JCI. The gas supplied to the burner is SiCl25j as a raw material.
! /min, mountain as combustion gas 501/min, 0 嘗 481
/min, and Ar 1217min was used as the combustion adjustment gas. The outer diameter of the synthesized glass particle deposit is 180
mmφ, and the total length was 800 mm. The tapered part at the upper end is 200mm, and the tapered part at the lower end is 150mm.
m, and the effective portion ratio was only 56% in terms of length.
(実施例1)
第1図に示した本発明の構成において、出発材に外径1
00mm、内孔径18.2mmのリング状の石英製耐熱
板を、出発材先端より70mm上方に設置した。バーナ
中心軸と出発材の交点は先端より20mmとした。その
他の条件は比較例と同様にした。合成されたガラス微粒
子堆積体は、外径181mmφ、全長800mmで、比
較例のものとほぼ同様の母材が製造出来たが、上端テー
パ部は100mmと短くなり、有効部の長さは69%と
改善された。(Example 1) In the configuration of the present invention shown in FIG.
A ring-shaped quartz heat-resistant plate with a diameter of 0.00 mm and an inner hole diameter of 18.2 mm was placed 70 mm above the tip of the starting material. The intersection point between the burner center axis and the starting material was 20 mm from the tip. Other conditions were the same as in the comparative example. The synthesized glass particle deposit body had an outer diameter of 181 mmφ and a total length of 800 mm, and a base material almost the same as that of the comparative example could be manufactured, but the upper end tapered part was shortened to 100 mm, and the length of the effective part was 69%. and improved.
また、本実施例で製造したものは、非有効部での割れは
全(発生せず、安定した製造を行なうことができた。Further, in the product manufactured in this example, no cracking occurred in the non-effective portion, and stable manufacturing could be performed.
次に、ガラス微粒子堆積体合成後、石英製耐熱板を上方
に抜き去り、高温電気炉にて、i雰囲気中1600℃以
上の熱処理を行い、透明ガラス化した。この結果、外径
73mmφの、クラック、気泡等の発生がなく良好なガ
ラスロットを得ることができた。Next, after synthesizing the glass fine particle deposit, the quartz heat-resistant plate was pulled upward, and heat treatment was performed in an i atmosphere at 1600° C. or higher in a high-temperature electric furnace to make it transparent vitrified. As a result, a good glass lot with an outer diameter of 73 mm and no cracks or bubbles was obtained.
(実施例2)
実施例1で合成したガラス微粒子堆積体をリング状石英
製耐熱板を取り去らずに、透明ガラス化した。この方法
でも実施例1のものと同様に透明で良好なガラスロフト
は得られたが、石英耐熱板は収縮しないため、有効部の
径73mmφに対して、上端側に100mmφの円板が
取りついた形状となった。この円板を削り取る、あるい
は切り取ることにより、ガラスロッドは通常と同様に使
用することができた。(Example 2) The glass fine particle deposit synthesized in Example 1 was made into transparent glass without removing the ring-shaped quartz heat-resistant plate. Even with this method, a transparent and good glass loft was obtained as in Example 1, but since the quartz heat-resistant plate does not shrink, a 100 mmφ disk was attached to the upper end of the effective part diameter of 73 mmφ. It became a shape. By scraping or cutting off this disk, the glass rod could be used normally.
以上説明したように、本発明によればスート法により合
成するガラス微粒子堆積体端部のテーパ状非有効部を減
少させ、かつ非有効部での割れを防止することができる
ことから、製造効率を上げることができ、特に、合成速
度が高く、大径の大型ガラス微粒子堆積体を合成する場
合に効果的である。As explained above, according to the present invention, it is possible to reduce the tapered ineffective part at the end of the glass particle deposit synthesized by the soot method and to prevent cracking in the ineffective part, thereby increasing manufacturing efficiency. This is particularly effective when synthesizing a large glass particle deposit with a high synthesis rate and a large diameter.
第1図及び第2図は本発明の実施態様を示す概略説明図
であり、第1図はVAD法における本発明の構成例、第
2図はOVD法における本発明の構成例を示す。第3図
は本発明の実施例1においてガラス微粒子堆積体合成後
、耐熱板を取り外した後に加熱透明化する工程の説明図
、第4図fa+および(blは本発明に用いる耐熱板の
具体例を示す図である。第5図はガラス微粒子堆積体の
テーパ状非有効部を説明する図、第6図(al〜(C1
は、従来のVAD法におけるガラス微粒子の堆積開始時
の成長の様子を説明する図、第7図は従来のOVD法に
おける堆積開始時の様子の説明図、第8図fatおよび
(b)は本発明の耐熱板のサイズと取付は位置の好まし
い例を説明する図である。
である。
l、11は燃焼バーナー 2,12は火炎、313は出
発材、4.14は耐熱板、5,15はガラス微粒子堆積
体、16−1.16−2はチャックを示す。
第3図
第4図
第8図
(a)
第5図
(α)
第6図
(b)
(c)
錦7図1 and 2 are schematic explanatory diagrams showing embodiments of the present invention, with FIG. 1 showing a configuration example of the present invention in a VAD method, and FIG. 2 showing a configuration example of the present invention in an OVD method. FIG. 3 is an explanatory diagram of the step of heating and transparentizing after removing the heat-resistant plate after synthesizing the glass fine particle deposit in Example 1 of the present invention, and FIG. 4 fa+ and (bl are specific examples of the heat-resistant plate used in the present invention. FIG. 5 is a diagram illustrating the tapered ineffective part of the glass particle deposit, and FIG. 6 (al~(C1
7 is a diagram explaining the growth state of glass particles at the start of deposition in the conventional VAD method, FIG. 7 is an explanatory diagram of the state at the start of deposition in the conventional OVD method, and FIG. FIG. 2 is a diagram illustrating a preferred example of the size and mounting position of the heat-resistant plate of the invention. It is. 1 and 11 are combustion burners; 2 and 12 are flames; 313 is a starting material; 4.14 is a heat-resistant plate; 5 and 15 are glass particle deposits; 16-1 and 16-2 are chucks. Figure 3 Figure 4 Figure 8 (a) Figure 5 (α) Figure 6 (b) (c) Nishiki Figure 7
Claims (3)
火炎中で反応させ、これによって生成するガラス微粒子
を回転する出発材または心棒の周囲に堆積させつつ上記
燃焼バーナーを出発材または心棒に対して相対的に移動
させることによりガラス微粒子堆積体を製造する方法に
おいて、出発材または心棒のガラス微粒子の堆積開始端
近傍に、脱着可能なリング状の耐熱板を上記出発材また
は心棒と同軸状に設置し、該耐熱板の片面に一体となる
ようにガラス微粒子堆積体を成長させることを特徴とす
るガラス微粒子堆積体の製造方法。(1) A gaseous glass raw material is ejected from a combustion burner and reacted in a flame, and the resulting glass particles are deposited around the rotating starting material or mandrel while the combustion burner is applied to the starting material or mandrel. In a method for producing a glass particle deposit by relative movement, a removable ring-shaped heat-resistant plate is installed coaxially with the starting material or mandrel near the end of the starting material or mandrel at which glass particulates begin to be deposited. A method for producing a glass particle deposit, which comprises: growing the glass particle deposit integrally on one side of the heat-resistant plate.
造後、高温熱処理による透明ガラス化前に取り去ること
を特徴とする請求項(1)記載のガラス微粒子堆積体の
製造方法。(2) The method for manufacturing a glass fine particle deposit according to claim (1), wherein the ring-shaped heat-resistant plate is removed after manufacturing the glass fine particle deposit and before turning it into transparent vitrification by high-temperature heat treatment.
うとするガラス微粒子堆積体の外径Dに対して0.5D
から1.0Dのものを用い、且つ燃焼バーナの中心軸と
出発材の交差する点から母材成長側と反対方向にD以内
の位置に該耐熱板を設置することを特徴とする請求項(
1)又は(2)記載のガラス微粒子堆積体の製造方法。(3) The ring-shaped heat-resistant plate has a diameter of 0.5D relative to the outer diameter D of the glass fine particle deposit body to be manufactured.
1.0D from the point where the central axis of the combustion burner and the starting material intersect, and the heat-resistant plate is installed at a position within D in the direction opposite to the base material growth side (
The method for producing a glass fine particle deposit according to 1) or (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2199117A JP3003173B2 (en) | 1990-07-30 | 1990-07-30 | Method for producing glass particle deposit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2199117A JP3003173B2 (en) | 1990-07-30 | 1990-07-30 | Method for producing glass particle deposit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0489321A true JPH0489321A (en) | 1992-03-23 |
| JP3003173B2 JP3003173B2 (en) | 2000-01-24 |
Family
ID=16402421
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2199117A Expired - Fee Related JP3003173B2 (en) | 1990-07-30 | 1990-07-30 | Method for producing glass particle deposit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3003173B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018030729A (en) * | 2016-08-22 | 2018-03-01 | 信越化学工業株式会社 | Manufacturing apparatus for glass fine particle deposit |
-
1990
- 1990-07-30 JP JP2199117A patent/JP3003173B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018030729A (en) * | 2016-08-22 | 2018-03-01 | 信越化学工業株式会社 | Manufacturing apparatus for glass fine particle deposit |
| CN107759071A (en) * | 2016-08-22 | 2018-03-06 | 信越化学工业株式会社 | The manufacture device and manufacture method of powder accumulation body |
| US10532944B2 (en) | 2016-08-22 | 2020-01-14 | Shin-Etsu Chemical Co., Ltd. | Soot deposition body manufacturing apparatus and manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3003173B2 (en) | 2000-01-24 |
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