JPH051970A - Surface shape measuring device - Google Patents

Surface shape measuring device

Info

Publication number
JPH051970A
JPH051970A JP18171991A JP18171991A JPH051970A JP H051970 A JPH051970 A JP H051970A JP 18171991 A JP18171991 A JP 18171991A JP 18171991 A JP18171991 A JP 18171991A JP H051970 A JPH051970 A JP H051970A
Authority
JP
Japan
Prior art keywords
light
cgh
diffracted light
surface shape
spherical wave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18171991A
Other languages
Japanese (ja)
Inventor
Tadashi Kaneko
正 金子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP18171991A priority Critical patent/JPH051970A/en
Publication of JPH051970A publication Critical patent/JPH051970A/en
Pending legal-status Critical Current

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  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)

Abstract

(57)【要約】 【目的】 計算機ホログラムを用いて非球面の多い非球
面形状を高精度に測定することができる面形状測定装置
を得ること。 【構成】 物体の面形状を計算機ホログラムを用いて干
渉計で測定する面形状測定装置において、該計算機ホロ
グラムは前記干渉計より球面波が斜めに入射するように
配置されるとともに、該計算機ホログラムから発生する
不要な回折光を除去するピンホールを干渉計内に配置す
ること。
(57) [Abstract] [Purpose] To obtain a surface shape measuring device capable of highly accurately measuring an aspherical shape having many aspherical surfaces by using a computer generated hologram. In a surface shape measuring device for measuring a surface shape of an object by an interferometer using a computer generated hologram, the computer generated hologram is arranged so that a spherical wave is obliquely incident from the interferometer, and Place a pinhole in the interferometer that removes unwanted diffracted light that occurs.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は光学系に用いられる非球
面光学素子等の面形状を測定する面形状測定装置に関す
るものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface shape measuring device for measuring the surface shape of an aspherical optical element used in an optical system.

【0002】[0002]

【従来の技術】近年、光学系ではコンパクト化や応用分
野の広がりにより、従来の球面のみの光学系から非球面
を利用して性能を向上させることが盛んに行われる様に
なってきた。このような場合、問題となるのは作成した
非球面の検査である。特に非球面量が大きくなり、通常
のフィゾー型の干渉系では干渉縞が密になりすぎて、事
実上測定が不可能になってしまうという問題点がある。
2. Description of the Related Art In recent years, as optical systems have become more compact and the fields of application have expanded, it has become popular to improve performance by using aspherical surfaces from conventional optical systems having only spherical surfaces. In such cases, the problem is the inspection of the created aspherical surface. In particular, there is a problem in that the amount of aspherical surface becomes large and the interference fringes become too dense in a normal Fizeau type interference system, making measurement impossible in practice.

【0003】このため、従来、大きい非球面量を測定に
は種々の方式が提案されてきている。例えば接触または
非接触型のプローブを被検面に対して走査し、結果を信
号処理する方法が一例である。この方法は汎用的なもの
であるが、走査に伴う機械的な誤差が測定値に直接影響
してしまうという欠点がある。このような中で有力な方
法として計算機ホログラム(以下「CGH」という。)
を用いる方法が知られている。
Therefore, various methods have been conventionally proposed for measuring a large amount of aspherical surface. An example is a method in which a contact or non-contact type probe is scanned on the surface to be inspected and the result is subjected to signal processing. Although this method is general-purpose, it has the drawback that mechanical errors associated with scanning directly affect the measured values. Computer hologram (hereinafter referred to as “CGH”) is a powerful method in such a situation.
A method using is known.

【0004】CGHはあらかじめ設計値として分かって
いる面形状より計算して作成されるもので、所定の入射
光が入射した時、所望の非球面量に相当する波面を参照
波面として回折する。回折された参照波が被検面からの
光と干渉し測定が行われるというものである。CGHは
計算により任意の波面を形成できるため汎用性に富んで
おり、また干渉縞の形で被検面全体を一度に測定できる
というメリットを持っている。
The CGH is created by calculating from a surface shape known as a design value in advance, and when a predetermined incident light is incident, it diffracts with a wavefront corresponding to a desired aspherical amount as a reference wavefront. The diffracted reference wave interferes with the light from the surface to be inspected and measurement is performed. CGH is versatile because it can form an arbitrary wavefront by calculation, and has the advantage of being able to measure the entire surface under test at once in the form of interference fringes.

【0005】[0005]

【発明が解決しようとする課題】しかしながら上記従来
例のCGHによる測定では、干渉縞で被検面の測定観察
を行う際、光軸近くで不要な回折光が重なりあって、観
察を行うことのできない領域が存在するという問題点が
あった。光軸付近の形状は素子の形状を検査する場合特
に重要であるが、測定が困難なのは重大な問題である。
本発明は上記の点を考慮してなされたもので、光軸付近
での不要な回折光の重なりを除去し、所望の成分の光の
みを取り出すことによって被検面全体を高速に精度良く
測定することを目的としている。
However, in the measurement by the CGH of the above-mentioned conventional example, when the measurement and observation of the surface to be inspected by the interference fringes, unnecessary diffracted light overlaps near the optical axis, and the observation is performed. There was a problem that there are areas that cannot be used. The shape near the optical axis is particularly important when inspecting the shape of an element, but the difficulty of measurement is a serious problem.
The present invention has been made in consideration of the above points, and removes unnecessary diffracted light overlap in the vicinity of the optical axis, and extracts only the desired component light to accurately measure the entire surface under test at high speed. The purpose is to do.

【0006】[0006]

【課題を解決するための手段】本発明によれば、上記問
題点を解決するため、CGHをオフアクシスタイプの構
成とし、光学的なフィルタリング手法を駆使することに
よって不要な回折光を除去し、被検面全体の観察を可能
としたものである。このため、図2に示す様にCGHは
CGHに入射するまでの干渉計の主光学系の光軸に対し
斜めに配置され、被検物自体もその光軸が前記主光学系
やCGHの法線面と共通にならない様に配置される。C
GHには前記主光学系の中にある球面波を発生するレン
ズまたはミラー系により発生された球面波が入射する。
主光学系の中ではCGHによって発生する不要な回折光
を除去するため、前記球面波発生光学系のCGHと逆側
にある焦点位置にピンホールが配置されていることを特
徴としている。
According to the present invention, in order to solve the above-mentioned problems, the CGH has an off-axis type structure, and unnecessary diffracted light is removed by making full use of an optical filtering method. This makes it possible to observe the entire test surface. Therefore, as shown in FIG. 2, the CGH is arranged obliquely with respect to the optical axis of the main optical system of the interferometer until it is incident on the CGH, and the optical axis of the test object itself is the same as that of the main optical system or the CGH. It is arranged so that it is not common with the line surface. C
A spherical wave generated by a lens or mirror system that generates a spherical wave in the main optical system enters the GH.
In the main optical system, in order to remove unnecessary diffracted light generated by CGH, a pinhole is arranged at a focal position on the side opposite to the CGH of the spherical wave generating optical system.

【0007】[0007]

【実施例】図1は本発明の実施例1にもとずく非球面測
定装置の概略図である。図中1はレーザ光源、2及び3
はレンズで、レンズ2と3でレーザ光1を所定の径の平
行光束にコリメートする。レーザ光はビームスプリッタ
4を透過した後、球面波変換レンズ5に入射する。球面
波変換レンズ5の第1面6は参照平面となっており、入
射した光の一部は6で反射して参照波Rとして元の主光
学系に戻る。
1 is a schematic view of an aspherical surface measuring device according to a first embodiment of the present invention. In the figure, 1 is a laser light source, 2 and 3
Is a lens, and the lenses 2 and 3 collimate the laser beam 1 into a parallel light beam having a predetermined diameter. The laser light passes through the beam splitter 4 and then enters the spherical wave conversion lens 5. The first surface 6 of the spherical wave conversion lens 5 is a reference plane, and a part of the incident light is reflected by 6 and returns to the original main optical system as a reference wave R.

【0008】球面波変換レンズ5を透過した光は収束球
面波としてCGH7に斜入射する。CGH7はこの斜入
射球面波と被検非球面の理想値に対して設計されてお
り、CGH7の1次回折光が被検面と等しい波面を発生
する様になっている。該1次回折光は被検面8上で設計
値である理想非球面形状に共役な波面を形成し、被検面
8で反射を受けて再びCGH7に戻る。CGH7を再び
透過した波面は相反則により今度はー1次の回折光が入
射した球面波に対応した発散球面波となって、球面波発
生レンズ5に至り、球面波発生レンズ5を透過して物体
波Iに変換される。この光は実際の被検面8からの反射
光なので、被検面8が設計値に対応して理想的にできて
いれば該透過光、即ち物体波Iは完全な平行光となる。
また理想値からずれた場合、その量に対応して平行光か
らずれるところは、通常のフィゾー型の干渉計と同様で
ある。
The light transmitted through the spherical wave conversion lens 5 obliquely enters the CGH 7 as a convergent spherical wave. The CGH 7 is designed with respect to the ideal values of the oblique incident spherical wave and the aspherical surface to be inspected, and the first-order diffracted light of the CGH 7 generates a wavefront equal to the inspected surface. The first-order diffracted light forms a conjugate wavefront on the surface to be inspected 8 having an ideal aspherical surface shape as a design value, is reflected by the surface to be inspected 8 and returns to the CGH 7 again. According to the reciprocity law, the wavefront transmitted through the CGH 7 again becomes a diverging spherical wave corresponding to the spherical wave on which the -1st order diffracted light is incident, reaches the spherical wave generating lens 5, and passes through the spherical wave generating lens 5. Converted to the object wave I. Since this light is the reflected light from the actual surface 8 to be inspected, if the surface 8 to be inspected is ideally formed corresponding to the design value, the transmitted light, that is, the object wave I becomes a perfect parallel light.
Further, when deviating from the ideal value, the position deviating from the parallel light corresponding to the amount is the same as in a normal Fizeau interferometer.

【0009】CGH7には実際には各種の次数の回折光
が存在している。測定に使用するのはそのうちのただ一
つであるため、CGHの設計に当たってはそれら余分な
回折光が測定光に混じり込まないような配慮が必要であ
る。ここまでの光に経路に当たってCGHの設計で考慮
しなければならないのは次の4つの成分である。
The CGH 7 actually contains diffracted light of various orders. Since only one of them is used for measurement, care must be taken in designing the CGH so that the extra diffracted light does not mix with the measurement light. The following four components have to be considered in the design of the CGH by hitting the path of the light up to this point.

【0010】第1に考慮しなければならないのは主光学
系の球面波変換レンズ5からCGH7に入射した球面波
の7による各回折次数の反射光、第2に考慮しなければ
ならないのは各回折次数の透過光である。また第3に考
慮しなければならないのは今度は逆に被検面8からの反
射してCGH7に入射した球面波のCGH7による各回
折次数の反射光、そして第4に考慮しなければならない
のはCGH7による各回折次数の透過光である。
First, it is necessary to consider the reflected light of each diffraction order by 7 of the spherical wave incident on the CGH 7 from the spherical wave conversion lens 5 of the main optical system, and secondly, it is necessary to consider each. It is the transmitted light of the diffraction order. In addition, thirdly, this time, on the contrary, the reflected light of each diffraction order by the CGH 7 of the spherical wave reflected from the surface 8 to be inspected and incident on the CGH 7, and the fourth must be considered. Is transmitted light of each diffraction order by CGH7.

【0011】本発明では光学系の配置とCGH7によ
り、これら4つの余分な成分の回折光について検出を行
う光との空間周波数分布が重なることがないようにする
ことが特徴である。例えば本発明の光学系ではオフアク
シスの配置を取っている。このためCGH7に入射した
光の0次の反射光は球面波変換レンズ5に戻らないよう
な配置となっている。従来のオンアクシス型のCGH検
査の手法ではこのような回折光の分離が困難であった
が、本発明のような手法を取れば分離を容易に行うこと
ができる。このように不要回折光の分離は光学系自体の
配置とCGHの設計により可能となる。
The present invention is characterized by the arrangement of the optical system and the CGH 7 so that the spatial frequency distributions of the light for detecting the diffracted light of these four extra components do not overlap. For example, the optical system of the present invention has an off-axis arrangement. Therefore, the arrangement is such that the 0th-order reflected light of the light incident on the CGH 7 does not return to the spherical wave conversion lens 5. Although it was difficult to separate such diffracted light by the conventional on-axis CGH inspection method, the separation can be easily performed by using the method of the present invention. In this way, the separation of unnecessary diffracted light becomes possible by the arrangement of the optical system itself and the design of the CGH.

【0012】不要回折光の除去にはこの他に光学的なフ
ィルタリング手法を共用する。CGH7の不要回折光と
しては先に説明した収束球面波の反射、あるいは透過回
折光群や、被検面8より入射した透過回折光群等が挙げ
られるが、ここで不要回折光波面群が球面波変換レンズ
5を透過した後につくる波面をGとする。
In addition to this, an optical filtering method is commonly used to remove the unnecessary diffracted light. Examples of the unnecessary diffracted light of the CGH 7 include the reflected or transmitted diffracted light group of the convergent spherical wave described above and the transmitted diffracted light group incident from the surface 8 to be inspected. Let G be the wavefront created after passing through the wave conversion lens 5.

【0013】球面波変換レンズ5から戻ってくる光はこ
の様に参照波R、物体波I、及び不要回折光Gの混合状
態となっている。これら3種の波R、I、Gは球面波変
換レンズ5に続いてビームスプリッタ4で今度は反射し
た後、レンズ9を透過し、ピンホール10に到達する。
ピンホール10は球面波変換レンズ5とレンズ9の合成
焦点面上に配置され、光学的なフィルタリングを行う役
目をする。
The light returning from the spherical wave conversion lens 5 is thus in a mixed state of the reference wave R, the object wave I and the unnecessary diffracted light G. These three kinds of waves R, I, and G are reflected by the beam splitter 4 next to the spherical wave conversion lens 5, then transmitted through the lens 9, and reach the pinhole 10.
The pinhole 10 is arranged on the combined focal plane of the spherical wave conversion lens 5 and the lens 9, and serves to perform optical filtering.

【0014】光学的なフィルタリングの作用を明確にす
るため、ピンホール10の位置での光の状態について説
明を加える。球面波変換レンズ5から戻ってくる波面を
考えると、参照波Rは主光学系の光軸方向に伝播する平
面波である。又、物体波Iも往きにCGHの+1次、帰
りにー1次を用いたことで、相反則より被検面8の情報
を含んだ形で主光学系の光軸方向に伝播する平面波とな
っている。IとRは従って同一方向に進行する平面波と
して重畳された状態にあり、両者の干渉が被検面の形状
を示すことになる。これに対し波面Gは光学系の配置と
CGHの設計によりその伝播方向を波面I、Rと共通部
分を持たない様にすることができる。ピンホール10の
ところには波面I、R、Gの伝播する方向、即ち空間周
波数に応じた光の広がりが表れるが、本発明の様にすれ
ばI、RとGとが実質的に重なりを持たない様にするこ
とができる。従ってピンホール10の径を適当に定めれ
ば波面I、Rのみを干渉縞観察面11に導くことが可能
である。
In order to clarify the action of optical filtering, the state of light at the position of the pinhole 10 will be described. Considering the wavefront returning from the spherical wave conversion lens 5, the reference wave R is a plane wave propagating in the optical axis direction of the main optical system. In addition, since the object wave I also uses the + 1st order of CGH for the forward and the −1st order of the return, it is a plane wave propagating in the optical axis direction of the main optical system in a form including the information of the surface 8 to be inspected by the reciprocity law. Is becoming Therefore, I and R are superposed as plane waves traveling in the same direction, and the interference between them indicates the shape of the surface to be inspected. On the other hand, the wavefront G can be designed so that its propagation direction does not have a common part with the wavefronts I and R by the arrangement of the optical system and the design of the CGH. At the pinhole 10, the propagation directions of the wavefronts I, R, and G, that is, the spread of light according to the spatial frequency appears, but according to the present invention, I, R, and G are substantially overlapped. It is possible not to have it. Therefore, if the diameter of the pinhole 10 is set appropriately, only the wavefronts I and R can be guided to the interference fringe observation surface 11.

【0015】不要回折光Gのフィルタリングによる除去
は、図2に示した様に基本的には主光学系の光軸に対し
CGH7を斜めに配置すること、及びCGH7からの回
折光を入射球面波に対して更に斜めに導くという本発明
の構成によって実現される。CGH7の斜め配置はCG
H7からの反射回折光を主光学系に戻さない役割を果し
ている。一方、CGH7からの斜め回折光の配置はCG
H7に入射する球面波の0次光が被検面に到達しないこ
とを意味しており、不要回折光の除去に効果が大きい。
CGH7の斜め回折角はCGH7のキヤリア周波数によ
って決められるもので、この角度を設計的に定めること
によって不要回折光を効率よく除去することができる。
To remove the unnecessary diffracted light G by filtering, basically, as shown in FIG. 2, the CGH 7 is arranged obliquely with respect to the optical axis of the main optical system, and the diffracted light from the CGH 7 is incident on an incident spherical wave. It is realized by the structure of the present invention in which the guide is carried out more obliquely. The diagonal arrangement of CGH7 is CG
It plays a role of not returning the reflected and diffracted light from H7 to the main optical system. On the other hand, the arrangement of obliquely diffracted light from CGH7 is CG.
This means that the 0th-order light of the spherical wave incident on H7 does not reach the surface to be inspected, and is highly effective in removing unnecessary diffracted light.
The oblique diffraction angle of the CGH 7 is determined by the carrier frequency of the CGH 7, and unnecessary diffracted light can be efficiently removed by designing this angle.

【0016】実際には本発明の構成でも一つだけ除けな
い不要回折光が存在する。それは被検面8から反射した
光がCGH7によって反射された時の−1次(又は+1
次)光であるが、これは反射によって発散球面波となり
ピンホール10の位置では大きく広がった光となるの
で、ピンホールの径を適切に選ぶことにより、実際の測
定に与える影響は殆ど無視できる。
In reality, even with the configuration of the present invention, there is one unnecessary diffracted light. It is the -1st order (or +1) when the light reflected from the surface 8 to be inspected is reflected by the CGH 7.
Next, it is light, but it becomes a divergent spherical wave by reflection and becomes a light that spreads widely at the position of the pinhole 10. Therefore, by appropriately selecting the diameter of the pinhole, the influence on the actual measurement can be almost ignored. ..

【0017】以上の様に本発明の構成を用いれば不要回
折光が実質的に全く無視できる影響しか与えないため、
従来型で問題となっていた被検面の測定できない領域の
問題が解決され、S/N比の良い測定を容易に行うこと
ができる。
As described above, when the structure of the present invention is used, unnecessary diffracted light has a substantially negligible effect.
The problem of the non-measurable area of the surface to be inspected, which has been a problem in the conventional type, is solved, and the measurement with a good S / N ratio can be easily performed.

【0018】図3は本発明の実施例2の概略図である。
図中実施例1と同一の部材については同じ番号がつけら
れている。本実施例が実施例1と異なるのは、参照波の
形成のさせ方である。本実施例ではビームスプリッタ4
で反射された光を参照平面6に向けて反射させ、再び元
のビームスプリッタ4に戻す構成にしている。その他の
作用、例えば不要回折光の除去の仕方などは実施例1と
同じである。干渉縞観察面11で観察されるのは参照面
6と被検面からの反射光の干渉となるが、参照面を被検
面と全く独立させたことにより、観察の際の干渉縞のピ
ッチに微調などを参照面を傾けることによって、被検面
と別個に行うことができるという利点を持っている。
FIG. 3 is a schematic diagram of a second embodiment of the present invention.
In the figure, the same members as those in the first embodiment are designated by the same reference numerals. The present embodiment is different from the first embodiment in the way of forming the reference wave. In this embodiment, the beam splitter 4
The light reflected by is reflected toward the reference plane 6 and returned to the original beam splitter 4. Other functions, such as a method of removing unnecessary diffracted light, are the same as those in the first embodiment. What is observed on the interference fringe observation surface 11 is the interference of the reflected light from the reference surface 6 and the surface to be inspected, but by making the reference surface completely independent from the surface to be inspected, the pitch of the interference fringes at the time of observation In addition, the fine adjustment can be performed separately from the surface to be inspected by inclining the reference surface.

【0019】図4は本発明の実施例3の概略図である。
この場合にも実施例2と同じく参照波を形成させるやり
方が実施例1と異なっている。レーザ1から出た光はレ
ンズ2により発散光となってハーフミラー12に入射す
る。ハーフミラー12を透過した光が球面波変換レンズ
5に至ってからは実施例1と同様であるが、本実施例で
は、参照波はハーフミラー12からの反射光に対し、今
度は参照球面13によって設定される。ピンホール10
の位置はレンズ系5と9を考慮して決定され、効率よく
被検面からの光と参照球面からの光が干渉し、その他の
不要回折光がフィルタリングにより除去できる様になっ
ている。
FIG. 4 is a schematic diagram of a third embodiment of the present invention.
In this case as well, the method of forming the reference wave is different from that in the first embodiment. The light emitted from the laser 1 becomes divergent light by the lens 2 and enters the half mirror 12. After the light transmitted through the half mirror 12 reaches the spherical wave conversion lens 5, it is the same as in the first embodiment, but in this embodiment, the reference wave is reflected by the half mirror 12, and this time by the reference spherical surface 13. Is set. Pinhole 10
The position of is determined in consideration of the lens systems 5 and 9, and the light from the surface to be inspected and the light from the reference spherical surface efficiently interfere with each other, and other unnecessary diffracted light can be removed by filtering.

【0020】[0020]

【発明の効果】以上説明した様に本発明のオフアクシス
構成のCGHによる非球面測定法は、従来問題となって
いたCGHによる不要回折光を効率的に除去できるた
め、S/N比良く被検面の測定を行うことが可能となっ
た。またこの結果、従来問題となっていた光軸上付近で
の計測も可能となった。
As described above, according to the aspherical surface measuring method by CGH of the off-axis configuration of the present invention, unnecessary diffracted light by CGH, which has been a problem in the past, can be efficiently removed, so that the S / N ratio can be improved. It became possible to measure the inspection surface. As a result, it became possible to measure near the optical axis, which was a problem in the past.

【0021】CGHによる測定法は種々の非球面形状に
対して広範に応用することが可能であり、特に従来のフ
ィゾー型の干渉系で大きな非球面量を計測できないとい
う限界を取り除けることで大きな効果が見込まれる。本
発明の実施例では簡単な構成で従来の問題点を克服でき
るだけではなく、装置としての調整の容易さが達成され
るとともに、また時間的にも全面を一挙に測定できて効
率的など、実用上効果が大きい。
The measuring method by CGH can be widely applied to various aspherical shapes, and in particular, it can be greatly effective by removing the limit that a large amount of aspherical surface cannot be measured by the conventional Fizeau interferometer. Is expected. In the embodiment of the present invention, not only can the conventional problems be overcome with a simple configuration, but also the ease of adjustment of the device can be achieved, and the entire surface can be measured all at once in terms of efficiency. Great effect.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の実施例1の非球面測定系を示す図FIG. 1 is a diagram showing an aspherical surface measuring system according to a first embodiment of the present invention.

【図2】 本発明の主要部を示す図FIG. 2 is a diagram showing a main part of the present invention.

【図3】 本発明の実施例2の非球面測定系を示す図FIG. 3 is a diagram showing an aspherical surface measuring system according to a second embodiment of the present invention.

【図4】 本発明の実施例3の非球面測定系を示す図FIG. 4 is a diagram showing an aspherical surface measuring system according to a third embodiment of the present invention.

【符号の説明】 1 レーザ 2 レンズ 3 レンズ 4 ビームスプリッタ 5 球面波発生レンズ 6 参照平面 7 CGH 8 被検面 9 レンズ 10 ピンホール 11 干渉縞観察面 12 ハーフミラー 13 参照球面[Explanation of symbols] 1 laser 2 lens 3 lens 4 beam splitter 5 spherical wave generating lens 6 reference plane 7 CGH 8 surface to be inspected 9 lens 10 pinhole 11 interference fringe observation surface 12 half mirror 13 reference spherical surface

Claims (1)

【特許請求の範囲】 【請求項1】 物体の面形状を計算機ホログラムを用い
て干渉計で測定する面形状測定装置において、該計算機
ホログラムは前記干渉計より球面波が斜めに入射するよ
うに配置されるとともに、該計算機ホログラムから発生
する不要な回折光を除去するピンホールを干渉計内に配
置することを特徴とする面形状測定装置。
Claim: What is claimed is: 1. A surface shape measuring device for measuring a surface shape of an object by an interferometer using a computer generated hologram, wherein the computer generated hologram is arranged so that a spherical wave is obliquely incident from the interferometer. A surface shape measuring apparatus characterized in that a pinhole for removing unnecessary diffracted light generated from the computer generated hologram is arranged in an interferometer.
JP18171991A 1991-06-26 1991-06-26 Surface shape measuring device Pending JPH051970A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18171991A JPH051970A (en) 1991-06-26 1991-06-26 Surface shape measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18171991A JPH051970A (en) 1991-06-26 1991-06-26 Surface shape measuring device

Publications (1)

Publication Number Publication Date
JPH051970A true JPH051970A (en) 1993-01-08

Family

ID=16105677

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18171991A Pending JPH051970A (en) 1991-06-26 1991-06-26 Surface shape measuring device

Country Status (1)

Country Link
JP (1) JPH051970A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10258248A1 (en) * 2002-12-13 2004-07-15 Carl Zeiss Smt Ag Interferometric quality checking system for a mirror used in EUV-lithography, whereby a limited surface area is checked for non-rotationally symmetric errors so that rotationally symmetric parent body errors can be located
US7061626B1 (en) 2004-05-14 2006-06-13 Carl Zeiss Smt Ag Method of manufacturing an optical element using a hologram
US7106455B2 (en) 2001-03-06 2006-09-12 Canon Kabushiki Kaisha Interferometer and interferance measurement method
JP2007537426A (en) * 2004-05-14 2007-12-20 カール・ツァイス・エスエムティー・アーゲー Optical element manufacturing method
JP2020535440A (en) * 2017-09-29 2020-12-03 カール・ツァイス・エスエムティー・ゲーエムベーハー Adaptive optics for interference measurement systems

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7106455B2 (en) 2001-03-06 2006-09-12 Canon Kabushiki Kaisha Interferometer and interferance measurement method
DE10258248A1 (en) * 2002-12-13 2004-07-15 Carl Zeiss Smt Ag Interferometric quality checking system for a mirror used in EUV-lithography, whereby a limited surface area is checked for non-rotationally symmetric errors so that rotationally symmetric parent body errors can be located
DE10258248B4 (en) * 2002-12-13 2006-02-23 Carl Zeiss Smt Ag System for interferometric pass inspection
US7061626B1 (en) 2004-05-14 2006-06-13 Carl Zeiss Smt Ag Method of manufacturing an optical element using a hologram
JP2007537426A (en) * 2004-05-14 2007-12-20 カール・ツァイス・エスエムティー・アーゲー Optical element manufacturing method
JP2020535440A (en) * 2017-09-29 2020-12-03 カール・ツァイス・エスエムティー・ゲーエムベーハー Adaptive optics for interference measurement systems

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