JPH0520686A - Disc Carrier - Google Patents
Disc CarrierInfo
- Publication number
- JPH0520686A JPH0520686A JP3169925A JP16992591A JPH0520686A JP H0520686 A JPH0520686 A JP H0520686A JP 3169925 A JP3169925 A JP 3169925A JP 16992591 A JP16992591 A JP 16992591A JP H0520686 A JPH0520686 A JP H0520686A
- Authority
- JP
- Japan
- Prior art keywords
- disk
- carrier
- uniform
- disk carrier
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
(57)【要約】
【目的】 薄膜磁気ディスクの製造に用いるスパッタリ
ング用ディスクキャリアにおいて、磁気特性の均一な薄
膜磁気ディスクが作製でき、耐久性にも優れたディスク
キャリアを提供する。
【構成】 中央部にほぼ円形の穴を有する板状のディス
クキャリア11において、ディスク2を立てて支持する
内周面13にU字形の溝12を設けることにより、ディ
スク2とディスクキャリア11との熱伝導が良くなって
温度分布が均一となり、磁気特性の均一な薄膜磁気ディ
スクが得られる。また、熱応力の部分的集中が抑えられ
るためディスクキャリア11の変形が起り難くなり、そ
の耐久性が向上する。
(57) [Summary] [Object] To provide a disk carrier for sputtering, which is used for manufacturing a thin film magnetic disk, capable of producing a thin film magnetic disk having uniform magnetic characteristics and excellent in durability. In a plate-shaped disk carrier 11 having a substantially circular hole in the central portion, a U-shaped groove 12 is provided in an inner peripheral surface 13 that supports the disk 2 upright, so that the disk 2 and the disk carrier 11 are separated from each other. The heat conduction is improved, the temperature distribution is uniform, and a thin film magnetic disk having uniform magnetic characteristics can be obtained. Further, since the partial concentration of thermal stress is suppressed, the disk carrier 11 is less likely to be deformed, and its durability is improved.
Description
【0001】[0001]
【産業上の利用分野】本発明は、磁気記録媒体として用
いる薄膜磁気ディスクの製造時に使用する、具体的には
スパッタリング法を用いてディスクの両面に同時に磁性
材等の材料を形成する際に用いるディスクキャリアに関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used for manufacturing a thin film magnetic disk used as a magnetic recording medium, specifically, for forming a material such as a magnetic material on both sides of the disk at the same time by using a sputtering method. Disc carrier.
【0002】[0002]
【従来の技術】ディスクドライブ等の電子機器に用いら
れる薄膜磁気ディスクの製造において、ディスク上に情
報を記憶するための磁性材等を形成する方法としては、
通常スパッタリング法を用いている。スパッタリングを
行う際にはディスクをディスクキャリアに挿入して立
て、そのディスクの両面の外側に磁性材等からなる一対
の垂直電極を配置してディスクの両面に同時に磁性材等
を形成する。2. Description of the Related Art In manufacturing a thin film magnetic disk used for electronic equipment such as a disk drive, a method for forming a magnetic material for storing information on the disk is as follows.
Usually, the sputtering method is used. When performing the sputtering, the disk is inserted into a disk carrier and is erected, and a pair of vertical electrodes made of a magnetic material or the like is arranged outside both surfaces of the disk to simultaneously form the magnetic material or the like on both surfaces of the disk.
【0003】このスパッタリングの際に用いられる従来
のディスクキャリアについて、図面を参照しながら説明
する。A conventional disk carrier used in this sputtering will be described with reference to the drawings.
【0004】図2は従来のディスクキャリアの斜視図、
図3は図2におけるA−A線の詳細断面図で、いずれも
ディスクを装着した状態を示す。図2,図3に示すよう
に、ディスクキャリア1は板状のもので、その中央部に
ディスク2を挿入し立てて支持するためのほぼ円形の穴
1aが設けられている。その穴1aの形状は、上半分は
ディスク2の半径よりも大きい半径のほぼ半円の部分円
で、下半分はディスク1の半径よりわずかに小さい半径
のほぼ半円の部分円である。そして、ディスク2の挿入
を容易にするため、上半分の部分円の中心は下半分の部
分円の中心より上側に少しずらされており、また、ディ
スクキャリア1の円周縁には開口部が円形のテーパ1b
が施されている。さらに、ディスク2を立てて支持する
ため、ディスクキャリア1の下半分の内周面にはその内
周に沿ってV字形の溝1cが設けられている。なお、V
字形の溝1cの代りに前記内周面にピンを立てて支持す
る場合もある。FIG. 2 is a perspective view of a conventional disk carrier,
FIG. 3 is a detailed cross-sectional view taken along the line AA in FIG. 2, both showing a state in which a disc is mounted. As shown in FIGS. 2 and 3, the disc carrier 1 is plate-shaped, and a substantially circular hole 1a for inserting and standing up the disc 2 is provided in the center of the disc carrier 1. The shape of the hole 1a is such that the upper half is a substantially semicircular partial circle having a radius larger than the radius of the disk 2, and the lower half is a substantially semicircular partial circle having a radius slightly smaller than the radius of the disk 1. In order to facilitate the insertion of the disc 2, the center of the upper half partial circle is slightly shifted upward from the center of the lower half partial circle, and the circular opening of the disc carrier 1 has a circular opening. Taper 1b
Has been applied. Further, in order to support the disc 2 upright, a V-shaped groove 1c is provided on the inner peripheral surface of the lower half of the disc carrier 1 along the inner periphery thereof. In addition, V
In some cases, instead of the character-shaped groove 1c, a pin may be erected on the inner peripheral surface to support it.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、このよ
うなディスクキャリアを用いたスパッタリングにおいて
は、次のような問題点があった。まず第一に、スパッタ
リングはディスクおよびディスクキャリアが加熱された
状態で施されるが、その加熱の際、従来のV字形の溝等
でディスクが支持されている場合は、ディスクの外周縁
と溝の側面との非常に少ない接触面積で熱伝導が行なわ
れるため部分的に熱が集中して温度分布が不均一とな
り、熱応力が発生してディスクおよびディスクキャリア
が変形する。このため、ディスクの変形による不良が発
生し易いだけでなく、ディスクキャリアの寿命が短くな
って耐久性にも劣る。また、ディスクの温度分布が不均
一なためスパッタリングにより形成された薄膜磁気ディ
スクの磁気特性が不均一になるとともに、ディスクの温
度も変動し易いため高い磁気特性の薄膜磁気ディスクを
安定して作製することはかなり困難であった。However, the sputtering using such a disk carrier has the following problems. First of all, the sputtering is performed while the disk and the disk carrier are heated. When the disk is supported by a conventional V-shaped groove or the like during the heating, the outer peripheral edge of the disk and the groove are Since heat conduction is carried out with a very small contact area with the side surface of the disk, heat is partially concentrated and the temperature distribution becomes non-uniform, resulting in thermal stress and deformation of the disk and disk carrier. Therefore, not only defects due to the deformation of the disk are likely to occur, but also the life of the disk carrier is shortened and the durability is deteriorated. Further, since the temperature distribution of the disk is non-uniform, the magnetic characteristics of the thin-film magnetic disk formed by sputtering become non-uniform, and the temperature of the disk easily fluctuates, so that a thin-film magnetic disk with high magnetic characteristics can be stably manufactured. Things were pretty difficult.
【0006】第二に、近年高保磁力の磁気特性に優れた
薄膜磁気ディスクを作製するためのスパッタリング法と
してバイアススパッタ法が利用されるが、バイアス電圧
を印加した際、従来のディスクキャリアの内周縁にテー
パを設けた構造では内周面から遠ざかるに従って板厚が
ディスクの厚みより大幅に厚くなり、電位分布が不均一
になる。このため、ディスクの外周近傍の磁性材等の膜
厚が不均一となるばかりでなく、温度分布も不均一にな
って外周近傍に磁気特性の低い領域が生じるという問題
点があった。Secondly, the bias sputtering method has recently been used as a sputtering method for manufacturing a thin film magnetic disk having a high coercive force and excellent magnetic characteristics. When a bias voltage is applied, the inner peripheral edge of a conventional disk carrier is used. In the structure in which the taper is provided, the plate thickness becomes significantly thicker than the disk thickness as the distance from the inner peripheral surface increases, and the potential distribution becomes nonuniform. Therefore, there is a problem that not only the film thickness of the magnetic material and the like near the outer periphery of the disk becomes non-uniform but also the temperature distribution becomes non-uniform and a region having low magnetic characteristics is formed near the outer periphery.
【0007】本発明は前記従来の問題点を解決するもの
で、磁気特性が大きくかつ均一な薄膜磁気ディスクが得
られ、さらに耐久性にも優れたディスクキャリアを提供
することを目的とする。The present invention solves the above-mentioned conventional problems, and an object of the present invention is to provide a thin film magnetic disk having large and uniform magnetic characteristics and providing a disk carrier excellent in durability.
【0008】[0008]
【課題を解決するための手段】この目的を達成するため
に本発明は、中央部にほぼ円形の穴を有する板状のディ
スクキャリアにおいて、ディスクを立てて支持する前記
ディスクキャリアの穴の下半分の内周面に、その内周に
沿って底面が平らで前記内周面における開口部の幅が前
記底面の幅よりも大きいU字形の溝を設けたものであ
る。さらには必要により中央部の穴の外側の周り両面に
円形の窪みを設け、その窪みを設けた部分の板厚をディ
スクの厚みの2〜3倍としたものである。In order to achieve this object, the present invention provides a plate-shaped disk carrier having a substantially circular hole at the center thereof, and the lower half of the hole of the disk carrier for standing and supporting the disk. The inner peripheral surface is provided with a U-shaped groove having a flat bottom surface along the inner peripheral surface and the width of the opening in the inner peripheral surface being larger than the width of the bottom surface. Further, if necessary, circular recesses are provided on both sides around the outside of the hole in the central portion, and the plate thickness of the recessed portion is made two to three times the thickness of the disc.
【0009】[0009]
【作用】この構成により、U字形の溝の底面とディスク
の外周面とが接触するため接触面積が広くなってディス
クとディスクキャリアとの熱伝導が良好となり、熱応力
の発生が抑えられてディスクおよびディスクキャリアの
変形が生じ難くなるとともに、ディスクの温度の不均一
分布や温度変動も抑えられて磁気特性が均一でかつ大き
い優れた薄膜磁気ディスクが得られる。With this structure, since the bottom surface of the U-shaped groove and the outer peripheral surface of the disk are in contact with each other, the contact area is widened, the heat conduction between the disk and the disk carrier is improved, and the generation of thermal stress is suppressed. In addition, the disk carrier is less likely to be deformed, and the non-uniform distribution of the temperature of the disk and the temperature fluctuation are suppressed, and an excellent thin film magnetic disk having uniform and large magnetic characteristics can be obtained.
【0010】また、板厚がディスクの厚みの2〜3倍の
窪みを設けたことにより、バイアス電圧を印加した際に
従来発生していたディスクの外周近傍における電位の不
均一分布も解消することができ、磁性材等の膜厚が均一
で磁気特性の大きい薄膜磁気ディスクを作製することが
できる。Further, by providing the recess having a plate thickness of 2 to 3 times the thickness of the disk, it is possible to eliminate the non-uniform distribution of the electric potential in the vicinity of the outer circumference of the disk which has been conventionally generated when a bias voltage is applied. As a result, it is possible to manufacture a thin film magnetic disk having a uniform film thickness of a magnetic material or the like and excellent magnetic characteristics.
【0011】[0011]
【実施例】以下本発明の一実施例について図面により説
明する。ただし、本実施例のディスクキャリアの全体的
な構造は図2に示した従来のものと類似しているので、
その説明は省略する。図1は本実施例のディスクキャリ
アにおけるディスクを支持する部分の断面図で、その断
面位置は図3と同じである。図1において、11は本発
明のディスクキャリアであり、12はディスク2を支持
するための穴の内周面13にその内周に沿って設けたU
字形の溝で、その溝12の底面14はディスク2の外周
面と同様平らで底面14の幅はディスク2の厚みより僅
かに大きくしている。また、内周面13における溝12
の開口部の幅は底面14の幅より大きく、底面14の垂
線と底面14の周縁と溝12の開口部の周縁とを結ぶ直
線とのなす角度が約5度になる幅としている。溝12を
このような形状とすることにより、ディスク2とディス
クキャリア11とはディスク2の外周面と溝の底面14
とで面接触することとなって両者の熱伝導が良好とな
り、従来の問題点の発生原因となっていた熱応力や温度
の不均一分布の発生を抑制することができる。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. However, since the overall structure of the disk carrier of this embodiment is similar to that of the conventional one shown in FIG. 2,
The description is omitted. FIG. 1 is a sectional view of a portion supporting a disc in the disc carrier of this embodiment, and its sectional position is the same as that in FIG. In FIG. 1, 11 is a disc carrier of the present invention, and 12 is a U provided along the inner periphery of an inner peripheral surface 13 of a hole for supporting the disc 2.
The bottom surface 14 of the groove 12 is flat like the outer peripheral surface of the disk 2, and the width of the bottom surface 14 is slightly larger than the thickness of the disk 2. In addition, the groove 12 in the inner peripheral surface 13
The width of the opening is larger than the width of the bottom surface 14, and the angle formed by the perpendicular line of the bottom surface 14 and the straight line connecting the peripheral edge of the bottom surface 14 and the peripheral edge of the opening portion of the groove 12 is about 5 degrees. With the groove 12 having such a shape, the disk 2 and the disk carrier 11 are separated from each other on the outer peripheral surface of the disk 2 and the bottom surface 14 of the groove.
The surface contact is made by and the heat conduction between the two becomes good, and it is possible to suppress the occurrence of the non-uniform distribution of thermal stress and temperature, which are the causes of the conventional problems.
【0012】次に、窪みについて説明する。図1におい
て、15はディスクキャリア11の穴の内周面13の外
側の周り両面に一部を削り取って板面に設けた窪みで、
窪み15の開口部はディスク2を挿入し支持する穴を包
含し、中心が内周面13が作るほぼ半円の中心と一致す
る円形をしている。窪み15を設けた部分の板厚16は
ディスク2の厚みの約2.5倍で、熱変形および電位分
布の発生を考慮すると、2〜3倍が望ましい範囲であ
る。これは板厚16がディスク2の厚みの2倍より薄く
なると熱変形が起り易くなってディスクキャリアの寿命
が短かくなり、一方3倍より厚くなると電位の不均一分
布が発生し易くなることによる。なお、窪み15の開口
部の直径についても熱変形および電位の不均一分布の発
生を考慮する必要があるが、ディスク2の直径よりも5
〜10mm程度大きければよい。このような窪み15を設
けると、ディスク2の厚みと窪み15を設けた板厚との
厚み差が小さくなり、スパッタリングのバイアス電圧印
加時にディスク2の外周近傍で発生する電位の不均一分
布が発生し難くなる。したがって、磁製材等の膜厚が均
一となり、また温度分布も均一となって磁気特性が均一
でかつ大きい薄膜磁気ディスクが得られる。Next, the depression will be described. In FIG. 1, reference numeral 15 denotes a recess formed on the plate surface by cutting off a part of both sides around the outside of the inner peripheral surface 13 of the hole of the disk carrier 11.
The opening of the recess 15 includes a hole for inserting and supporting the disk 2, and has a circular shape whose center coincides with the center of a semicircle formed by the inner peripheral surface 13. The plate thickness 16 of the portion where the depression 15 is provided is about 2.5 times the thickness of the disk 2, and in consideration of the occurrence of thermal deformation and potential distribution, a desirable range is 2 to 3 times. This is because if the plate thickness 16 is thinner than twice the thickness of the disc 2, thermal deformation is likely to occur and the life of the disc carrier is shortened, while if it is thicker than 3 times, a non-uniform potential distribution is likely to occur. . It should be noted that the diameter of the opening of the dent 15 should be taken into consideration in consideration of the occurrence of thermal deformation and non-uniform distribution of electric potential, but it should be 5 rather than the diameter of the disk 2.
It should be about 10 mm large. When such a depression 15 is provided, the thickness difference between the thickness of the disk 2 and the thickness of the plate on which the depression 15 is provided becomes small, and a non-uniform distribution of the potential generated near the outer circumference of the disk 2 when a bias voltage for sputtering is applied. Hard to do. Therefore, the film thickness of the magnetic material and the like becomes uniform, and the temperature distribution becomes uniform, so that a thin film magnetic disk having uniform and large magnetic characteristics can be obtained.
【0013】[0013]
【発明の効果】以上のように本発明は、薄膜磁気ディス
クのスパッタリング時に使用する中央部にほぼ円形の穴
を有する板状のディスクキャリアにおいて、ディスクを
支持する部分の内周面にその内周に沿ってU字形の溝を
設けたことにより、ディスクとディスクキャリアとの接
触面積が広くなって熱伝導が良好となり、熱応力の発生
が抑えられてディスクおよびディスクキャリアの変形が
防止できるとともに、ディスクの温度分布も均一となっ
て磁気特性の均一な薄膜磁気ディスクを得ることができ
る。また、変形が発生しにくいのでディスクキャリアの
寿命が延び、耐久性が向上する。As described above, according to the present invention, in a plate-shaped disk carrier having a substantially circular hole in the center used for sputtering a thin film magnetic disk, the inner peripheral surface of the disk supporting portion has its inner peripheral surface. By providing the U-shaped groove along with, the contact area between the disk and the disk carrier is widened to improve the heat conduction, the generation of thermal stress is suppressed, and the disk and the disk carrier can be prevented from being deformed. The temperature distribution of the disk becomes uniform, and a thin film magnetic disk having uniform magnetic characteristics can be obtained. Further, since the deformation does not easily occur, the life of the disk carrier is extended and the durability is improved.
【0014】さらに、板厚がディスクの厚みの2〜3倍
の窪みを設けたことにより、従来バイアス電圧を印加し
た際にディスクの外周近傍で発生していた電位の不均一
分布も解消でき、磁性材等の膜厚が均一で磁気特性に優
れた薄膜磁気ディスクを作製することができる。Further, by providing the recess having a plate thickness of 2 to 3 times the thickness of the disk, it is possible to eliminate the non-uniform distribution of the potential which has been generated in the vicinity of the outer circumference of the disk when a bias voltage is conventionally applied. It is possible to manufacture a thin film magnetic disk having a uniform film thickness of a magnetic material and the like and excellent magnetic properties.
【図1】本発明の一実施例におけるディスクキャリアの
ディスクを支持する部分の断面図FIG. 1 is a cross-sectional view of a portion of a disc carrier that supports a disc according to an embodiment of the present invention.
【図2】従来のディスクキャリアの斜視図FIG. 2 is a perspective view of a conventional disk carrier.
【図3】従来のディスクキャリアのディスクを支持する
部分の断面図FIG. 3 is a sectional view of a portion of a conventional disc carrier that supports a disc.
2 ディスク 11 ディスクキャリア 12 U字形の溝 13 内周面 14 底面 15 窪み 16 板厚 2 discs 11 disk carrier 12 U-shaped groove 13 Inner surface 14 Bottom 15 hollow 16 Thickness
Claims (2)
スクキャリアにおいて、ディスクを立てて支持する前記
ディスクキャリアの穴の下半分の内周面に、その内周に
沿って底面が平らで前記内周面における開口部の幅が前
記底面の幅よりも大きいU字形の溝を設けたディスクキ
ャリア。1. A plate-shaped disk carrier having a substantially circular hole in the center thereof. The bottom half of the hole of the disk carrier, which supports the disk upright, has a flat bottom surface along the inner circumference. A disk carrier provided with a U-shaped groove in which the width of the opening in the inner peripheral surface is larger than the width of the bottom surface.
を設け、その窪みを設けた部分の板厚をディスクの厚み
の2〜3倍とした請求項1記載のディスクキャリア。2. The disk carrier according to claim 1, wherein circular recesses are provided on both sides around the outside of the hole in the central portion, and the plate thickness of the recessed portion is set to be 2 to 3 times the thickness of the disk.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3169925A JPH0520686A (en) | 1991-07-10 | 1991-07-10 | Disc Carrier |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3169925A JPH0520686A (en) | 1991-07-10 | 1991-07-10 | Disc Carrier |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0520686A true JPH0520686A (en) | 1993-01-29 |
Family
ID=15895491
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3169925A Pending JPH0520686A (en) | 1991-07-10 | 1991-07-10 | Disc Carrier |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0520686A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007213730A (en) * | 2006-02-10 | 2007-08-23 | Tdk Corp | Substrate holding device and manufacturing method of magnetic recording medium |
-
1991
- 1991-07-10 JP JP3169925A patent/JPH0520686A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007213730A (en) * | 2006-02-10 | 2007-08-23 | Tdk Corp | Substrate holding device and manufacturing method of magnetic recording medium |
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