JPH0521336B2 - - Google Patents
Info
- Publication number
- JPH0521336B2 JPH0521336B2 JP60189600A JP18960085A JPH0521336B2 JP H0521336 B2 JPH0521336 B2 JP H0521336B2 JP 60189600 A JP60189600 A JP 60189600A JP 18960085 A JP18960085 A JP 18960085A JP H0521336 B2 JPH0521336 B2 JP H0521336B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- substrate
- temperature
- photosensitive resin
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60189600A JPS6251225A (ja) | 1985-08-30 | 1985-08-30 | 光化学反応方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60189600A JPS6251225A (ja) | 1985-08-30 | 1985-08-30 | 光化学反応方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6251225A JPS6251225A (ja) | 1987-03-05 |
| JPH0521336B2 true JPH0521336B2 (de) | 1993-03-24 |
Family
ID=16244023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60189600A Granted JPS6251225A (ja) | 1985-08-30 | 1985-08-30 | 光化学反応方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6251225A (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63276225A (ja) * | 1987-05-08 | 1988-11-14 | Tokyo Electron Ltd | アッシング装置 |
| CN106896194A (zh) * | 2017-04-17 | 2017-06-27 | 武汉华星光电技术有限公司 | 一种监控涂布显影设备灯箱内臭氧含量的装置及方法 |
| JP7232886B2 (ja) * | 2017-11-13 | 2023-03-03 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法、及び記憶媒体 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6049630A (ja) * | 1983-08-29 | 1985-03-18 | Fujitsu Ltd | 半導体装置の製造方法 |
-
1985
- 1985-08-30 JP JP60189600A patent/JPS6251225A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6251225A (ja) | 1987-03-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |