JPH0522657B2 - - Google Patents
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- JPH0522657B2 JPH0522657B2 JP62076307A JP7630787A JPH0522657B2 JP H0522657 B2 JPH0522657 B2 JP H0522657B2 JP 62076307 A JP62076307 A JP 62076307A JP 7630787 A JP7630787 A JP 7630787A JP H0522657 B2 JPH0522657 B2 JP H0522657B2
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- Prior art keywords
- film
- glass
- heat ray
- visible light
- thickness
- Prior art date
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Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、膜積層側可視光反射率を低下させ、
かつ可視光透過率を任意の値に設定できる熱線反
射ガラス、特に膜積層側からの可視光反射率が20
％以下の低反射性の熱線反射ガラスに関するもの
である。[Detailed description of the invention] [Industrial application field] The present invention reduces the visible light reflectance on the film lamination side,
And heat ray reflective glass that can set the visible light transmittance to any value, especially the visible light reflectance from the film lamination side is 20
% or less of heat ray reflective glass.
［従来の技術］
建築用窓ガラスは、近年意匠性と快適性のため
に開口部が拡大する傾向にある。それに伴い、太
陽光の侵入量が多くなり、室内の冷房負荷が大き
くなつてきた。この負荷を減少させるために熱線
反射ガラスを用いることが多くなつている。熱線
反射ガラスとしては、金属単体、各種窒化物膜、
炭化物膜、酸化物膜、及びそれらのある組合せが
知られているが、熱線反射性能に対応して、可視
光反射率も高くなつている。たとえば、クロムの
半透明膜をガラスにコーテイングすることにより
熱線反射性能を持たせた場合、可視光も反射し、
かつガラス基板両側で同程度の反射が生じる。し
たがつて従来の熱線反射膜は熱線反射性能の向上
とともにガラス基板両側で反射が高くなり、夜間
室内にいるものからは、ガラスがミラー状にな
り、室内の物が反射して映るという欠点を持つて
いた。[Prior Art] In recent years, the openings of architectural window glasses have tended to be enlarged for design and comfort. As a result, the amount of sunlight entering has increased, and the indoor cooling load has increased. In order to reduce this load, heat-reflecting glass is increasingly being used. Heat-reflective glass includes simple metals, various nitride films,
Carbide films, oxide films, and certain combinations thereof are known, and their visible light reflectance has also increased in response to their heat ray reflection performance. For example, if glass is coated with a translucent chromium film to provide heat-reflecting properties, visible light will also be reflected.
In addition, the same degree of reflection occurs on both sides of the glass substrate. Therefore, with conventional heat ray reflective films, as the heat ray reflection performance improves, the reflection becomes high on both sides of the glass substrate, and when seen indoors at night, the glass becomes mirror-like and objects inside the room are reflected. I had it.
又、窒化チタンは耐久性と熱線反射性能が高く
熱線反射ガラス用の熱線反射性膜として適してい
るがこれを単層膜を用いた場合でも、熱線反射性
能を向上させるためには、窒化チタン膜厚を増加
させるという必要があるが、可視光反射率も同時
に上昇し、さらに内部応力が大きくなるので耐久
性も低下するという欠点があつた。 Furthermore, titanium nitride is highly durable and has high heat ray reflection performance, making it suitable as a heat ray reflective film for heat ray reflective glass. Although it is necessary to increase the film thickness, the visible light reflectance also increases at the same time, and internal stress increases, resulting in a decrease in durability.
［発明の解決しようとする問題点］
従来の熱線反射ガラスとして知られているクロ
ム単体、窒化チタン単層膜等では、熱線反射性能
の向上とともに、室内側（膜側）で可視光反射率
が高く、例えば30％以上となり夜間太陽光がない
場合には、室内灯の光により、室内の物体が熱線
反射ガラスにより反射し、居住性が悪くなるとい
う欠点を持つていた。また、熱線反射性能は、膜
厚を厚くすることで達せられるが、同時に、膜の
内部応力が増加し、耐久性が低下するという欠点
を持つていた。[Problems to be solved by the invention] Conventional heat-reflective glasses such as single-layer chromium and titanium nitride single-layer films have not only improved heat-reflection performance but also improved visible light reflectance on the indoor side (film side). If the ratio is high, for example 30% or more, and there is no sunlight at night, objects in the room will be reflected by the heat-reflecting glass due to the light from the indoor lights, making it less comfortable to live in. Further, heat ray reflection performance can be achieved by increasing the thickness of the film, but at the same time, it has the drawback of increasing internal stress of the film and reducing durability.
［問題点を解決するための手段］
本発明は、前述の問題点を解決すべくなされた
ものであり、ガラス基板上に形成する熱線反射膜
の膜構成を３層とし、基板側から金属膜、窒化
膜、酸化膜を順次積層することにより、熱線反射
性能を維持したまま、膜側可視光平均反射率を20
％以下に低下させることができ、かつ、耐久性の
向上がはかられるようにしたものである。[Means for Solving the Problems] The present invention has been made to solve the above-mentioned problems, and has a three-layer film structure for a heat ray reflective film formed on a glass substrate, and a metal film is formed from the substrate side. By sequentially laminating , nitride film, and oxide film, the average visible light reflectance of the film side can be increased to 20% while maintaining heat ray reflective performance.
% or less, and the durability can be improved.
本発明の熱線反射ガラスの構成は、第１図に示
す様にガラス基板１１の上に基板１１側から金属
膜１２、窒化物膜１３及び酸化物膜１４の３層が
積層されてなつている。なお、本発明の特徴は上
記した３層構成にあるものであるが場合によつて
は、かかる３層膜の光学性能に実質的な影響を及
ぼさない範囲で、この３層膜の上層として、ある
いは下層として１層ないし複数層の各種機能を有
する膜を形成してもよい。 The structure of the heat ray reflective glass of the present invention is as shown in FIG. 1, in which three layers are laminated on a glass substrate 11 from the substrate 11 side: a metal film 12, a nitride film 13, and an oxide film 14. . Although the feature of the present invention lies in the above-mentioned three-layer structure, in some cases, as an upper layer of the three-layer film, as long as it does not substantially affect the optical performance of the three-layer film. Alternatively, one or more layers of films having various functions may be formed as the lower layer.
本発明において使用されるガラス基板として
は、各種ガラスからなる基板が使用されるが通常
はソーダライム・シリケートガラスからなる普通
板ガラスやフロート板ガラスであり、無色透明で
あつても着色透明であつてもよい。 As the glass substrate used in the present invention, substrates made of various glasses are used, but usually they are ordinary plate glass or float plate glass made of soda lime silicate glass, and may be colorless and transparent or colored and transparent. good.
第１層としての金属膜にはCr，Ti，Zr，Hf，
Ta，Ni，Mo，Nb，Ｗ，Si又はこれらの合金、
又はステンレス（SUS）からなるものである。
その厚さはそれぞれの材料、又は要求される可視
光透過率、熱線反射性能等にもよるが通常20Å〜
100Åの範囲が適当である。中でも、クロムやス
テンレスはガラス基板及び第２層の窒化膜との密
着性が良好で、かつ耐久性の高い膜が得られるの
で最適である。ステンレス膜を使用すればコスト
ダウンを図ることができる。 The metal film as the first layer includes Cr, Ti, Zr, Hf,
Ta, Ni, Mo, Nb, W, Si or alloys thereof,
Or made of stainless steel (SUS).
The thickness depends on each material and the required visible light transmittance, heat ray reflection performance, etc., but it is usually 20 Å or more.
A range of 100 Å is suitable. Among them, chromium and stainless steel are optimal because they have good adhesion to the glass substrate and the second layer nitride film, and provide a highly durable film. Cost reduction can be achieved by using a stainless steel membrane.
第２層としての窒化物膜は、熱線反射性能と膜
の固さを保つ役割を持つものであり、その膜材料
としてはTi，Zr，Ta，Hf，Crの窒化物、あるい
はこれらの複合窒化物が用いられる。その膜厚と
しては、要求される熱線反射性能、可視光透過率
にもよるが通常200Å〜550Åの範囲が適当であ
る。中でも窒化物膜としては製膜の容易さ、耐久
性、熱反性能などの点から窒化チタン又は窒化ジ
ルコニウムが最適である。 The nitride film as the second layer has the role of maintaining heat ray reflection performance and film hardness, and the film material may be Ti, Zr, Ta, Hf, Cr nitride, or a composite nitride of these. things are used. The appropriate film thickness is usually in the range of 200 Å to 550 Å, although it depends on the required heat ray reflection performance and visible light transmittance. Among them, titanium nitride or zirconium nitride is most suitable as the nitride film from the viewpoint of ease of film formation, durability, heat resistance performance, etc.
第３層としての酸化物膜は、熱線反射性能の耐
久性を向上させる保護膜として、かつ可視光反射
率を20％以下に下げる膜として働きをするもので
あり、その膜材料としては、Ti，Cr，Zr，Si，
Al，Hf，Ta，Nbなどの酸化物あるいはこれら
の複合酸化物が用いられる。その膜厚としては、
充分な保護機能と可視光の反射率低減作用が発揮
される様に100Å〜500Åの膜厚が最適であ。中で
も酸化物膜としては製膜の容易さ、耐久性、反射
防止性能などの点から酸化チタンが最適である。
この酸化物膜の厚さを変えることで、低反射率化
する程度を、例えば、10〜20％の範囲で変えるこ
とが可能である。次に本発明の代表的な熱線反射
膜構成のいくつかについて例示する。 The oxide film as the third layer functions as a protective film that improves the durability of heat ray reflection performance and as a film that reduces the visible light reflectance to 20% or less.The film material is Ti. , Cr, Zr, Si,
Oxides of Al, Hf, Ta, Nb, etc. or composite oxides of these are used. The film thickness is
A film thickness of 100 Å to 500 Å is optimal to provide sufficient protection and visible light reflectance reduction effect. Among these, titanium oxide is most suitable as the oxide film from the viewpoints of ease of film formation, durability, and antireflection performance.
By changing the thickness of this oxide film, it is possible to change the extent to which the reflectance is reduced, for example, within a range of 10 to 20%. Next, some typical heat ray reflective film configurations of the present invention will be illustrated.
(1) 酸化チタン／窒化チタン／クロム／ガラス板
厚さ（120Å）（510Å）（100Å）（３mm）
(2) 酸化チタン／窒化チタン／ステンレス／ガラ
ス板厚さ（150Å）（550Å）（80Å）（３mm）
(3) 酸化チタン／窒化チタン／ステンレス／ガラ
ス板厚さ（450Å）（250Å）（20Å）（３mm）
本発明において、金属膜、窒化物膜及び酸化物
膜を形成する方法としては、スパツタリング法、
真空蒸着法、イオンプレーテイング法などの物理
蒸着法が採用される。中でも、窒化物膜は成膜速
度、膜質の安定性の理由により反応性スパツタリ
ングの方法が最適である。(1) Titanium oxide/Titanium nitride/Chromium/Glass plate thickness (120Å) (510Å) (100Å) (3mm) (2) Titanium oxide/Titanium nitride/Stainless steel/Glass plate thickness (150Å) (550Å) (80Å ) (3 mm) (3) Titanium oxide/titanium nitride/stainless steel/glass plate thickness (450 Å) (250 Å) (20 Å) (3 mm) In the present invention, as a method for forming a metal film, a nitride film, and an oxide film is the sputtering method,
Physical vapor deposition methods such as vacuum evaporation method and ion plating method are employed. Among these, reactive sputtering is the most suitable method for forming nitride films due to the film formation rate and stability of film quality.
［作用］
本発明の構成は、各層の膜厚を特定の範囲内と
し、主に上述のような役割を持たせたことによ
り、熱線反射性能を維持しつつ、可視光反射率を
低減し、さらに耐久性を向上させたことを特徴と
する。また、この場合に第２層の窒化物膜、第３
層の酸化物膜層の厚さ及び材料を変えることで、
膜側表面の可視光反射率を変えずに、分光特性を
変えることが出来、見た目に好ましい色合を与え
ることにより、より高付加価値にすることが可能
である。[Function] The structure of the present invention maintains heat ray reflection performance while reducing visible light reflectance by setting the film thickness of each layer within a specific range and mainly serving the above-mentioned roles. It is also characterized by improved durability. In addition, in this case, the second layer nitride film, the third layer
By changing the thickness and material of the oxide film layer,
It is possible to change the spectral characteristics without changing the visible light reflectance of the film side surface, and by giving a visually pleasing color, it is possible to increase the added value.
［実施例］ 以下に本発明の実施例について説明する。[Example] Examples of the present invention will be described below.
実施例 １
板厚３mmの30cm角のフロートガラス基板（ソー
ダライムシリケートガラス）を用意し、これを充
分に洗浄し、乾燥させた後、RFマグネトロンス
パツター装置の真空室に入れ、真空室内を１×
10-5Torrまで減圧した後、アルゴンガスを導入
し、２×10-3Torrとし、このアルゴン雰囲気中
でCrをターゲツトとして2KVのターゲツト電圧
でRFスパツターを行なつて上記ガラス板上に第
１層としての20ű５％の膜厚のCr膜を形成し
た。次いでこの真空室内を１×10-5Torrまで減
圧した後、N2ガスを導入し２×10-3Torrとし、
このN2ガス雰囲気中でTiをターゲツトとして
3KVのターゲツト電圧でRFスパツターを行なつ
て上記クロム膜上に第２層として230ű５％の
膜厚の窒化チタン膜を形成した。その後、この真
空室内を１×10-5Torrまで減圧した後、O2ガス
を導入し、２×10-3Torrとし、このO2ガス雰囲
気中でTiをターゲツトとして3KVのターゲツト
電圧でRFスパツターを行なつて上記窒化チタン
膜上に第３層として500ű５％の膜厚の酸化チ
タン膜を形成した。なお、クロム膜、窒化チタン
膜、酸化チタン膜の製膜時、ガラス基板の加熱は
行なわなかつた。この様にして得られた３層膜の
形成された熱線反射ガラスの可視光平均透過率は
40％、可視光平均反射率は９％で、その分光特性
（波長に対する反射率の特性）を測定した結果を
第２図の曲線Ａ（可視光反射率曲線）に示す。Example 1 A 30 cm square float glass substrate (soda lime silicate glass) with a plate thickness of 3 mm was prepared, thoroughly washed and dried, and then placed in the vacuum chamber of an RF magnetron sputtering device. ×
After reducing the pressure to 10 -5 Torr, argon gas was introduced to bring the pressure to 2 x 10 -3 Torr, and in this argon atmosphere, RF sputtering was performed using Cr as a target at a target voltage of 2KV to form a first layer on the glass plate. A Cr film with a thickness of 20 ű5% was formed as a layer. Next, after reducing the pressure in this vacuum chamber to 1×10 -5 Torr, N 2 gas was introduced to reduce the pressure to 2×10 -3 Torr.
Using Ti as a target in this N2 gas atmosphere,
A titanium nitride film having a thickness of 230 ű5% was formed as a second layer on the chromium film by RF sputtering at a target voltage of 3 KV. After that, the pressure in this vacuum chamber was reduced to 1 x 10 -5 Torr, O 2 gas was introduced to bring the pressure to 2 x 10 -3 Torr, and an RF sputter was applied in this O 2 gas atmosphere using Ti as a target at a target voltage of 3 KV. A titanium oxide film having a thickness of 500 ű5% was formed as a third layer on the titanium nitride film. Note that the glass substrate was not heated when forming the chromium film, titanium nitride film, and titanium oxide film. The average visible light transmittance of the heat-reflecting glass with the three-layer film obtained in this way is
40%, and the average visible light reflectance was 9%, and the results of measuring its spectral characteristics (characteristics of reflectance with respect to wavelength) are shown in curve A (visible light reflectance curve) in FIG.
なお、第２図の曲線Ｂ（可視光反射率曲線）は、
同上の方法により80Å厚のクロム膜、480Å厚の
窒化チタン膜、140Å厚の酸化チタン膜を順次同
上のガラス基板に形成した熱線反射ガラスの分光
特性を測定したものである。 Note that curve B (visible light reflectance curve) in Fig. 2 is
The spectral characteristics of heat-reflective glass were measured using the same method as above, in which a chromium film with a thickness of 80 Å, a titanium nitride film with a thickness of 480 Å, and a titanium oxide film with a thickness of 140 Å were sequentially formed on the same glass substrate.
上記した熱線反射膜の各種の実測した屈折率を
もとに計算機シユミレーシヨンにより、各層の膜
厚を計算しても可視光透過率は10％〜40％まで任
意の値にすることが可能であることが認められ
る。第３層の酸化物膜は膜面側からの入射光に対
して保護膜としての役割とともに、可視光反射低
下の役割ももつているため、この膜厚を変化させ
ることにより、可視光反射率を必要に応じて10％
〜20％の範囲にすることができる。 The visible light transmittance can be set to any value from 10% to 40% even if the film thickness of each layer is calculated by computer simulation based on the actually measured refractive index of the various heat ray reflective films mentioned above. It is recognized that The third layer oxide film has the role of a protective film against incident light from the film surface side as well as the role of reducing visible light reflection, so by changing this film thickness, visible light reflectance can be changed. 10% as required
It can range from ~20%.
実施例 ２
板厚３mmの30cm角のフロートガラス基板（ソー
ダライムシリケートガラス）を用意し、これを充
分に洗浄し、乾燥させた後、RFマグネトロンス
パツター装置の真空室に入れ、真空室内を１×
10-5Torrまで減圧した後、アルゴンガスを導入
し、２×10-3Torrとし、このアルゴン雰囲気中
でSUSをターゲツトとして2.4KVのターゲツト電
圧でRFスパツターを行なつて上記ガラス板上に
第１層としての20ű５％の膜厚のステンレス膜
を形成した。次いでこの真空室内を１×
10-5Torrまで減圧した後、N2ガスを導入し２×
10-3Torrとし、このN2ガス雰囲気中でTiをター
ゲツトとして3KVのターゲツト電圧でRFスパツ
ターを行なつて上記ステンレス膜上に第２層とし
て250ű５％の膜厚の窒化チタン膜を形成した。
その後、この真空室内を１×10-5Torrまで減圧
した後、O2ガスを導入し２×10-3Torrとし、こ
のO2ガス雰囲気中でTiをターゲツトとして3KV
のターゲツト電圧でRFスパツターを行なつて上
記窒化チタン膜上に第３層として450ű５％の
膜厚の酸化チタン膜を形成した。なお、ステンレ
ス膜、窒化チタン膜、酸化チタン膜の製膜時、ガ
ラス基板の加熱は行なわなかつた。Example 2 A 30 cm square float glass substrate (soda lime silicate glass) with a plate thickness of 3 mm was prepared, thoroughly washed and dried, and then placed in the vacuum chamber of an RF magnetron sputtering device. ×
After reducing the pressure to 10 -5 Torr, argon gas was introduced to bring the pressure to 2 x 10 -3 Torr, and in this argon atmosphere, RF sputtering was performed using SUS as a target at a target voltage of 2.4 KV to form a sputter on the glass plate. A stainless steel film with a thickness of 20 ű5% was formed as one layer. Then, inside this vacuum chamber,
After reducing the pressure to 10 -5 Torr, introduce N 2 gas and
A titanium nitride film with a thickness of 250 Å ± 5% was formed as a second layer on the stainless steel film by performing RF sputtering at a target voltage of 3 KV using Ti as a target in this N 2 gas atmosphere at 10 -3 Torr. did.
After that, the pressure in this vacuum chamber was reduced to 1×10 -5 Torr, and then O 2 gas was introduced to bring the pressure to 2×10 -3 Torr, and Ti was targeted at 3KV in this O 2 gas atmosphere.
A titanium oxide film having a thickness of 450 ű5% was formed as a third layer on the titanium nitride film by performing RF sputtering at a target voltage of . Note that the glass substrate was not heated when forming the stainless steel film, titanium nitride film, and titanium oxide film.
この様にして得られた３層膜の形成された熱線
反射ガラスの可視光平均透過率は10％、可視光平
均反射率は13％で、その分光特性（波長に対する
反射率の特性）を測定した結果を第２図の曲線Ｃ
（可視光反射率曲線）に示す。 The average visible light transmittance of the heat-reflecting glass with the three-layer film thus obtained was 10% and the average visible light reflectance was 13%, and its spectral characteristics (characteristics of reflectance with respect to wavelength) were measured. The result is curve C in Figure 2.
(Visible light reflectance curve).
なお、第２図の曲線Ｄ（可視光反射率曲線）は、
同上の方法により80Å厚のステンレス膜、500Å
厚の窒化チタン膜、150Å厚の酸化チタン膜を順
次同上のガラス基板に形成した熱線反射ガラスの
分光特性を測定したものである。 Note that the curve D (visible light reflectance curve) in FIG. 2 is
80 Å thick stainless steel film, 500 Å thick by the same method as above.
The spectral characteristics of a heat-reflecting glass in which a thick titanium nitride film and a 150 Å thick titanium oxide film were sequentially formed on the same glass substrate were measured.
比較例 １
板厚３mmの30cm角のフロートガラス基板（ソー
ダライムシリケートガラス）を用意し、これを充
分に洗浄し、乾燥させた後、RFマグネトロンス
パツター装置の真空室に入れ、真空室内を１×
10-5Torrまで減圧した後、Arガスを導入し、２
×10-3Torrとし、このArガス雰囲気中でCrをタ
ーゲツトとして2KVのターゲツト電圧でRFスパ
ツターを行なつて上記ガラス基板上に150ű５
％の膜厚のクロム膜を形成した。なお、クロム膜
の製膜時、ガラス基板の加熱は行なわなかつた。Comparative Example 1 A 30 cm square float glass substrate (soda-lime silicate glass) with a plate thickness of 3 mm was prepared, thoroughly washed and dried, and then placed in the vacuum chamber of an RF magnetron sputtering device. ×
After reducing the pressure to 10 -5 Torr, Ar gas was introduced and 2
×10 -3 Torr, RF sputtering was performed using Cr as a target at a target voltage of 2KV in this Ar gas atmosphere, and sputtering was performed on the glass substrate with a thickness of 150 ű5.
A chromium film with a film thickness of 50% was formed. Note that the glass substrate was not heated when forming the chromium film.
この様にして得られた単層熱線反射膜の形成さ
れた熱線反射ガラスの分光特性（波長に対する反
射率の特性）を測定した結果を第３図の曲線Ｅ
（可視光反射率曲線）に示す。 The results of measuring the spectral characteristics (characteristics of reflectance with respect to wavelength) of the heat ray reflective glass on which the single layer heat ray reflective film obtained in this way was formed are shown by curve E in Figure 3.
(Visible light reflectance curve).
なお、第３図の曲線Ｆ（可視光反射率曲線）は、
同上の方法により80Å厚のクロム膜を同上のガラ
ス基板に形成した熱線反射ガラスの分光特性を測
定したものである。 Note that the curve F (visible light reflectance curve) in Fig. 3 is
The spectral characteristics of a heat-reflecting glass in which an 80 Å thick chromium film was formed on the same glass substrate using the same method as above were measured.
比較例 ２
板厚３mmの30cm角のフロートガラス基板（ソー
ダライムシリケートガラス）を用意し、これを充
分に洗浄し、乾燥させた後、RFマグネトロンス
パツター装置の真空室に入れ、真空室内を１×
10-5Torrまで減圧した後、N2ガスを導入し、２
×10-3Torrとし、このN2ガス雰囲気中でTiをタ
ーゲツトとして3KVのターゲツト電圧でRFスパ
ツターを行なつて上記ガラス基板上に750ű５
％の膜厚の窒化チタン膜を形成した。なお、窒化
チタン膜の製膜時、ガラス基板の加熱は行なわな
かつた。Comparative Example 2 A 30 cm square float glass substrate (soda lime silicate glass) with a plate thickness of 3 mm was prepared, thoroughly washed and dried, and then placed in the vacuum chamber of an RF magnetron sputtering device. ×
After reducing the pressure to 10 -5 Torr, N 2 gas was introduced and 2
×10 -3 Torr, RF sputtering was performed using Ti as a target in this N 2 gas atmosphere at a target voltage of 3KV, and sputtering was performed on the above glass substrate to a thickness of 750 ű5.
A titanium nitride film with a film thickness of 1.5% was formed. Note that the glass substrate was not heated when forming the titanium nitride film.
この様にして得られた単層熱線反射の形成され
た熱線反射ガラスの分光特性（波長に対する反射
率の特性）を測定した結果を第３図の曲線Ｇ（可
視光反射率曲線）に示す。 Curve G (visible light reflectance curve) in FIG. 3 shows the results of measuring the spectral characteristics (characteristics of reflectance versus wavelength) of the thus obtained single-layer heat ray reflective glass.
なお、第３図の曲線Ｈ（可視光反射率曲線）は、
同上の方法により180Å厚の窒化チタン膜を同上
のガラス基板に形成した熱線反射ガラスの分光特
性を測定したものである。 Note that the curve H (visible light reflectance curve) in Fig. 3 is
The spectral characteristics of a heat-reflecting glass in which a 180 Å thick titanium nitride film was formed on the same glass substrate using the same method as above were measured.
上記した実施例及び比較例から認められる様
に、同程度の可視光透過率を持つ従来の熱線反射
ガラスでは、たとえば比較例１に示した様にクロ
ムからなる半透明金属膜を用いた場合、曲線Ｅ，
Ｆに示すように、熱線反射特性はやや低く、可視
光反射率が高いことが判る。この場合には、昼間
の可視光反射も高いが、夜間ではミラー化による
反射がきわめて高くなり、目ざわりとなる。ま
た、比較例２に関する第３図の曲線Ｇ，Ｈに示す
ように、窒化チタン単層膜の場合でも近赤外域か
ら可視光側になるに従つて、ゆるやかに下がつて
いるが、まだ高めであり、夜間のミラー化が生
じ、室内側では不快感を与えることになる。これ
に対し、本発明の熱線反射ガラスは第２図に示す
分光特性で明らかなように、350〜750nmの可視
域での室内側反射率が小さく、夜間のミラー化が
十分抑制されている。また、この構成では、金属
膜厚を主として調整することにより、可視光透過
率を任意に変えることが可能となる。 As can be seen from the above-mentioned Examples and Comparative Examples, in conventional heat-reflecting glass having similar visible light transmittance, when a translucent metal film made of chromium is used as shown in Comparative Example 1, for example, Curve E,
As shown in F, it can be seen that the heat ray reflection property is somewhat low and the visible light reflectance is high. In this case, the visible light reflection is high during the day, but at night the reflection due to mirroring becomes extremely high and becomes a nuisance. In addition, as shown in curves G and H in Figure 3 for Comparative Example 2, even in the case of a titanium nitride single layer film, the slope gradually decreases from the near-infrared region to the visible light region, but it is still relatively high. Therefore, mirroring occurs at night, causing discomfort indoors. On the other hand, as is clear from the spectral characteristics shown in FIG. 2, the heat-reflecting glass of the present invention has a small indoor reflectance in the visible range of 350 to 750 nm, and mirror formation at night is sufficiently suppressed. Furthermore, with this configuration, it is possible to arbitrarily change the visible light transmittance by mainly adjusting the metal film thickness.
［発明の効果］
本発明によれば、フロートガラス基板上に金属
膜、窒化物膜、酸化物膜を順次、積層する構成に
より、室内側の可視光反射率を10〜20％の範囲に
抑制し、夜間の窓ガラスのミラー化を低減させ、
居住性を改善することができる。更に、本発明に
よれば、金属膜の厚さを主として変化させること
により、熱線反射性能を損なうことなく用途、目
的に応じて、任意の可視光透過率にすることが可
能となる。更に、最表面に酸化物膜を積層する構
成により、耐久性を向上することが可能となる。[Effects of the Invention] According to the present invention, the visible light reflectance on the indoor side is suppressed to a range of 10 to 20% by a structure in which a metal film, a nitride film, and an oxide film are sequentially laminated on a float glass substrate. and reduce the mirroring of window glass at night.
Living comfort can be improved. Further, according to the present invention, by mainly changing the thickness of the metal film, it is possible to obtain any visible light transmittance depending on the application and purpose without impairing the heat ray reflection performance. Furthermore, the structure in which an oxide film is laminated on the outermost surface makes it possible to improve durability.
１１……ガラス基板、１２……金属膜、１３…
…窒化物膜、１４……酸化物膜。 11...Glass substrate, 12...Metal film, 13...
...Nitride film, 14...Oxide film.
第１図は本発明の熱線反射ガラス断面図であ
る。第２図は、本発明の実施例１，２の熱線反射
ガラスの分光特性を示す図面である。第３図は、
比較例１，２の熱線反射ガラスの分光特性を示す
図面である。
FIG. 1 is a sectional view of the heat ray reflective glass of the present invention. FIG. 2 is a drawing showing the spectral characteristics of the heat ray reflective glasses of Examples 1 and 2 of the present invention. Figure 3 shows
3 is a drawing showing the spectral characteristics of heat ray reflective glasses of Comparative Examples 1 and 2. FIG.
Claims (1)
化物膜及び酸化物膜が積層して形成されてなる熱
線反射ガラスであつて、上記金属膜は20Å以上
100Å以下、窒化物膜は200Å以上550Å以下、酸
化物膜は100Å以上500Å以下の各範囲内で、かか
る熱線反射ガラスの膜側表面の可視光反射率が20
％以下となる膜厚で形成されており、かつ、金属
膜の材質がCr，Ti，Zr，Hf，Ta，Ni，Mo，
Nb，Ｗ，Si、及びこれらの合金、並びにステン
レスの群から選ばれたものであることを特徴とす
る熱線反射ガラス。 ２ 窒化物膜の材質がTi，Zr，Ta，Hf，Crの窒
化物及びこれらの複合窒化物の群から選ばれたも
のであることを特徴とする特許請求の範囲第１項
記載の熱線反射ガラス。 ３ 酸化物膜の材質がTi，Cr，Zr，Si，Al，
Hf，Ta，Nbの酸化物及びこれらの複合酸化物
の群から選ばれたものであることを特徴とする特
許請求の範囲第１項記載の熱線反射ガラス。 ４ ガラス基板表面にクロム膜、窒化チタン膜及
び酸化チタン膜が順次積層して形成されてなるこ
とを特徴とする特許請求の範囲第１項記載の熱線
反射ガラス。 ５ ガラス基板表面にステンレス膜、窒化チタン
膜及び酸化チタン膜が順次積層して形成されてな
ることを特徴とする特許請求の範囲第１項記載の
熱線反射ガラス。[Scope of Claims] 1. A heat-reflecting glass formed by laminating a metal film, a nitride film, and an oxide film in order from the substrate side on the surface of a glass substrate, wherein the metal film has a thickness of 20 Å or more.
The visible light reflectance of the film side surface of such heat ray reflective glass is within the range of 100 Å or less, 200 Å or more and 550 Å or less for nitride films, and 100 Å or more and 500 Å or less for oxide films.
% or less, and the material of the metal film is Cr, Ti, Zr, Hf, Ta, Ni, Mo,
A heat ray reflective glass characterized by being selected from the group of Nb, W, Si, alloys thereof, and stainless steel. 2. Heat ray reflection according to claim 1, characterized in that the material of the nitride film is selected from the group of nitrides of Ti, Zr, Ta, Hf, Cr, and composite nitrides thereof. glass. 3 The material of the oxide film is Ti, Cr, Zr, Si, Al,
The heat ray reflective glass according to claim 1, characterized in that the glass is selected from the group of oxides of Hf, Ta, Nb, and composite oxides thereof. 4. The heat ray reflective glass according to claim 1, wherein a chromium film, a titanium nitride film, and a titanium oxide film are sequentially laminated on the surface of a glass substrate. 5. The heat ray reflective glass according to claim 1, wherein a stainless steel film, a titanium nitride film, and a titanium oxide film are sequentially laminated on the surface of a glass substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7630787A JPS63242948A (en) | 1987-03-31 | 1987-03-31 | Heat reflective glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7630787A JPS63242948A (en) | 1987-03-31 | 1987-03-31 | Heat reflective glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63242948A JPS63242948A (en) | 1988-10-07 |
| JPH0522657B2 true JPH0522657B2 (en) | 1993-03-30 |
Family
ID=13601712
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7630787A Granted JPS63242948A (en) | 1987-03-31 | 1987-03-31 | Heat reflective glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63242948A (en) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06102558B2 (en) * | 1987-05-29 | 1994-12-14 | セントラル硝子株式会社 | Colored glass plates |
| GB8801366D0 (en) * | 1988-01-21 | 1988-02-17 | Secr Defence | Infra red transparent materials |
| DE68917549T2 (en) * | 1988-09-01 | 1995-03-16 | Asahi Glass Co Ltd | Glass for automotive glass. |
| JPH02225346A (en) * | 1989-02-27 | 1990-09-07 | Central Glass Co Ltd | Heat-reflective glass |
| US5073451A (en) * | 1989-07-31 | 1991-12-17 | Central Glass Company, Limited | Heat insulating glass with dielectric multilayer coating |
| US5506037A (en) * | 1989-12-09 | 1996-04-09 | Saint Gobain Vitrage International | Heat-reflecting and/or electrically heatable laminated glass pane |
| DE3940748A1 (en) * | 1989-12-09 | 1991-06-13 | Ver Glaswerke Gmbh | ELECTRICALLY HEATED CAR GLASS PANEL MADE OF COMPOSITE GLASS |
| FR2657343B1 (en) * | 1990-01-19 | 1993-01-29 | Saint Gobain Vitrage Int | THIN LAYER FOR SUN PROTECTION GLAZING. |
| US5377045A (en) * | 1990-05-10 | 1994-12-27 | The Boc Group, Inc. | Durable low-emissivity solar control thin film coating |
| US5091244A (en) * | 1990-08-10 | 1992-02-25 | Viratec Thin Films, Inc. | Electrically-conductive, light-attenuating antireflection coating |
| US5407733A (en) * | 1990-08-10 | 1995-04-18 | Viratec Thin Films, Inc. | Electrically-conductive, light-attenuating antireflection coating |
| JPH0818849B2 (en) * | 1991-08-29 | 1996-02-28 | 日本板硝子株式会社 | Heat shield glass |
| US6274244B1 (en) | 1991-11-29 | 2001-08-14 | Ppg Industries Ohio, Inc. | Multilayer heat processable vacuum coatings with metallic properties |
| SG45418A1 (en) * | 1991-10-30 | 1998-01-16 | Asahi Glass Co Ltd | Method of making a heat treated coated glass |
| US6139969A (en) * | 1991-11-29 | 2000-10-31 | Ppg Industries Ohio, Inc. | Reactive sputtering of silicon and transition metal |
| US6793781B2 (en) | 1991-11-29 | 2004-09-21 | Ppg Industries Ohio, Inc. | Cathode targets of silicon and transition metal |
| US5709938A (en) * | 1991-11-29 | 1998-01-20 | Ppg Industries, Inc. | Cathode targets of silicon and transition metal |
| US5229194A (en) * | 1991-12-09 | 1993-07-20 | Guardian Industries Corp. | Heat treatable sputter-coated glass systems |
| US5965278A (en) * | 1993-04-02 | 1999-10-12 | Ppg Industries Ohio, Inc. | Method of making cathode targets comprising silicon |
| CA2120875C (en) * | 1993-04-28 | 1999-07-06 | The Boc Group, Inc. | Durable low-emissivity solar control thin film coating |
| GB9313416D0 (en) * | 1993-06-29 | 1993-08-11 | Glaverbel | Transaparent solar control glazing panels |
| US6495251B1 (en) | 1997-06-20 | 2002-12-17 | Ppg Industries Ohio, Inc. | Silicon oxynitride protective coatings |
| US6132881A (en) * | 1997-09-16 | 2000-10-17 | Guardian Industries Corp. | High light transmission, low-E sputter coated layer systems and insulated glass units made therefrom |
| DE19825424C1 (en) * | 1998-06-06 | 2000-01-05 | Ver Glaswerke Gmbh | Glass pane with a metallic reflective layer system |
| FR2820241B1 (en) * | 2001-01-31 | 2003-09-19 | Saint Gobain | TRANSPARENT SUBSTRATE PROVIDED WITH AN ELECTRODE |
| US6707610B1 (en) * | 2002-09-20 | 2004-03-16 | Huper Optik International Pte Ltd | Reducing the susceptibility of titanium nitride optical layers to crack |
| EP1644293B2 (en) | 2003-07-11 | 2022-04-13 | Pilkington Group Limited | Solar control glazing |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3311815C3 (en) * | 1983-03-31 | 1997-12-04 | Leybold Ag | Method of making discs |
| JPS6042253A (en) * | 1983-08-19 | 1985-03-06 | Asahi Glass Co Ltd | Heat-ray reflecting glass |
-
1987
- 1987-03-31 JP JP7630787A patent/JPS63242948A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63242948A (en) | 1988-10-07 |
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