JPH0523537U - Probe card - Google Patents
Probe cardInfo
- Publication number
- JPH0523537U JPH0523537U JP7135091U JP7135091U JPH0523537U JP H0523537 U JPH0523537 U JP H0523537U JP 7135091 U JP7135091 U JP 7135091U JP 7135091 U JP7135091 U JP 7135091U JP H0523537 U JPH0523537 U JP H0523537U
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- Prior art keywords
- probe
- hole
- electrode pad
- attached
- semiconductor element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
(57)【要約】
【目的】 電極パッドでの探針の接触抵抗を一定にし、
探針が集中することのない配置レイアウトを容易にする
ことにある。
【構成】 基板(11)に貫通孔(13)を穿設し、その基
板(11)の貫通孔(13)周縁に取り付けられ、先端部が
貫通孔(13)に向けて張り出した探針(12a)(12b)を
半導体素子(14)の電極パッド(16)に接触させること
によりその半導体素子(14)の電気的特性を測定するも
のにおいて、上記貫通孔(13)を半導体素子(14)の形
状に合わせて矩形開口形状とし、その貫通孔(13)の周
縁の各辺部で、半導体素子(14)の対応する電極パッド
(16)に向く探針(12a)(12b)を平行配置する。ま
た、上記貫通孔(13)の周縁に段差(18)を設け、上段
部(19a)に取り付けられた探針(12a)と下段部(19
b)に取り付けられた探針(12b)とを一本おきに配置す
る。
(57) [Summary] [Purpose] Keep the contact resistance of the probe at the electrode pad constant,
It is to facilitate a layout in which the probes are not concentrated. [Structure] A probe (11) having a through hole (13) formed in the substrate (11), attached to the periphery of the through hole (13) of the substrate (11), and having a tip protruding toward the through hole (13) ( A method for measuring electrical characteristics of a semiconductor element (14) by bringing the electrode pads (16) of the semiconductor element (14) into contact with the semiconductor elements (14). A rectangular opening is formed in accordance with the shape of the above, and the probes (12a) (12b) facing the corresponding electrode pads (16) of the semiconductor element (14) are arranged in parallel on each side of the periphery of the through hole (13). To do. Further, a step (18) is provided on the periphery of the through hole (13), and the probe (12a) attached to the upper step (19a) and the lower step (19).
Place every other probe (12b) attached to b).
Description
【0001】[0001]
本考案はプローブカードに関し、詳しくは、半導体装置の製造に使用され、半 導体ウェーハに多数個一括して形成された半導体素子の電気的特性を測定するプ ローブカードに関する。 The present invention relates to a probe card, and more particularly to a probe card used for manufacturing a semiconductor device for measuring electrical characteristics of a large number of semiconductor elements collectively formed on a semiconductor wafer.
【0002】[0002]
半導体装置の製造では、半導体ウェーハに多数個一括して半導体素子を形成し 、その半導体ウェーハを各半導体素子ごとにダイシングにより切断分離するに先 立って、上記半導体ウェーハの状態で各半導体素子の電気的特性を測定した上で 半導体素子の良否を判別するようにしている。 In the manufacture of semiconductor devices, a large number of semiconductor elements are collectively formed on a semiconductor wafer, and before the semiconductor wafer is cut and separated by dicing for each semiconductor element, the electrical characteristics of each semiconductor element in the state of the semiconductor wafer are The quality of the semiconductor device is determined after measuring the static characteristics.
【0003】 この半導体ウェーハ状態での半導体素子の電気的特性の測定には、一般にプロ ーブカードと称される測定装置が使用される。A measuring device generally called a probe card is used for measuring the electrical characteristics of the semiconductor element in the state of the semiconductor wafer.
【0004】 上記プローブカードは、図3及び図4に示すように測定装置本体〔図示せず〕 にソケットを介して電気的に接続される基板(1)と、その基板(1)上にソケ ット部分から延びる配線パターン〔図示せず〕を介して電気的に接続された多数 の探針(2)とで構成される。上記基板(1)の中央部分には、後述の半導体素 子の大きさに応じてほぼ楕円形状の貫通孔(3)が穿設され、この貫通孔(3) の周縁から貫通孔(3)の下方に位置する半導体素子(4)へ向けて上記探針( 2)が放射状に配置される。探針(2)は、その基端部が太くなっており、貫通 孔(3)の周縁に取り付けられて配線パターンと電気的に接続され、基端部から 半導体素子(4)に向けて延びる先端部が細くなっており、その半導体素子(4 )の表面周辺部に形成された電極パッド(6)に向けて下方傾斜するように屈曲 形成されている。As shown in FIGS. 3 and 4, the probe card includes a substrate (1) electrically connected to a measuring device main body (not shown) through a socket, and a socket on the substrate (1). And a large number of probes (2) electrically connected to each other via a wiring pattern (not shown) extending from the contact portion. A through-hole (3) having a substantially elliptical shape is formed in the central portion of the substrate (1) according to the size of a semiconductor element described later, and the through-hole (3) extends from the peripheral edge of the through-hole (3). The probes (2) are radially arranged toward the semiconductor element (4) located below the. The probe (2) has a thick base end, is attached to the peripheral edge of the through hole (3) and is electrically connected to the wiring pattern, and extends from the base end toward the semiconductor element (4). The tip portion is thin, and is bent and formed so as to be inclined downward toward the electrode pad (6) formed on the peripheral portion of the surface of the semiconductor element (4).
【0005】 上記構成からなるプローブカードによる半導体素子の電気的特性の測定は以下 のようにして行なわれる。The electrical characteristics of the semiconductor element are measured by the probe card having the above structure as follows.
【0006】 まず、半導体ウェーハ(5)の上方にプローブカードを配置し、その貫通孔( 3)の直下に測定すべき半導体素子(4)を位置決め配置する。この状態で、半 導体ウェーハ(5)とプローブカードとを相対的に近接させることにより、プロ ーブカードの各探針(2)の先端部を半導体素子(4)の表面周辺部に配設され た電極パッド(6)に接触させる。そして、上記探針(2)と電極パッド(6) とが接触した時点から半導体ウェーハ(5)とプローブカードとを更に若干近接 させることにより、探針(2)の先端部が電極パッド(6)上を探針(2)が延 びる方向に擦ることによって探針(2)が電極パッド(6)に所定の押圧力でも って確実に接触するようにしている。そして、この探針(2)の電極パッド(6 )への接触による通電でもって半導体素子(4)の電気的特性を測定する。この 半導体素子(4)の電気的特性の測定は半導体ウェーハ(5)のすべての半導体 素子(4)について順次実行される。First, the probe card is arranged above the semiconductor wafer (5), and the semiconductor element (4) to be measured is positioned and arranged immediately below the through hole (3). In this state, the tip of each probe (2) of the probe card was placed around the surface of the semiconductor element (4) by bringing the semiconductor wafer (5) and the probe card relatively close to each other. Contact the electrode pad (6). Then, when the probe (2) and the electrode pad (6) come into contact with each other, the semiconductor wafer (5) and the probe card are moved slightly closer to each other, so that the tip of the probe (2) is moved to the electrode pad (6). ) By rubbing the probe (2) in the extending direction, the probe (2) is surely brought into contact with the electrode pad (6) with a predetermined pressing force. Then, the electrical characteristics of the semiconductor element (4) are measured by energization by the contact of the probe (2) with the electrode pad (6). The measurement of the electrical characteristics of the semiconductor element (4) is sequentially performed on all the semiconductor elements (4) of the semiconductor wafer (5).
【0007】[0007]
ところで、近年、半導体素子(4)が例えば長方形のように大きくなる傾向に あり、それに伴ってプローブカードの貫通孔(3)の開口形状が楕円形状となり 〔図3参照〕、また、半導体素子(4)での集積度が上がることにより電極パッ ド(6)の数が増大することに伴って探針(2)の数が増加する傾向にある。そ の結果、上述した従来のプローブカードでは以下のような問題があった。 By the way, in recent years, the semiconductor element (4) tends to be large, for example, a rectangle, and accordingly, the opening shape of the through hole (3) of the probe card becomes an elliptical shape [see FIG. 3]. The number of the probes (2) tends to increase as the number of the electrode pads (6) increases as the integration degree in 4) increases. As a result, the above-mentioned conventional probe card has the following problems.
【0008】 まず第一に、多数の探針(2)を貫通孔(3)の周縁から半導体素子(4)の 電極パッド(6)に向けて放射状に配置している点で、探針(2)の基端部が太 くなっていることにより探針(2)の基端部での配列ピッチをかせげるので有利 であるが、その反面、探針(2)が電極パッド(6)と接触する際にその先端部 が電極パッド(6)上を擦る方向が各探針(2)ごとに異なり、而も、貫通孔( 3)の開口形状が楕円形状であるため、その貫通孔(3)の周端縁から電極パッ ド(6)までの探針(2)の長さが異なるため、電極パッド(6)での探針(2 )の接触抵抗がばらついて正確な測定が実現困難であった。First, a large number of probes (2) are arranged radially from the peripheral edge of the through hole (3) toward the electrode pads (6) of the semiconductor element (4). The thicker base end of 2) is advantageous because it allows the array pitch of the probe (2) to be increased at the base end, but on the other hand, the probe (2) does not function as an electrode pad (6). The direction in which the tip rubs the electrode pad (6) when contacting is different for each probe (2), and since the opening shape of the through hole (3) is elliptical, the through hole (3) Since the length of the probe (2) from the peripheral edge of 3) to the electrode pad (6) is different, the contact resistance of the probe (2) at the electrode pad (6) varies and accurate measurement is realized. It was difficult.
【0009】 第二に、上記探針(2)の本数が増加してくると、その探針(2)を放射状に レイアウトすることが非常に困難となり、特に、半導体素子(4)のエッジ部分 と対応する部位近傍では探針(2)の基端部が集中してくるため、異物などの付 着により探針(2)間が短絡するという問題があった。Secondly, when the number of the probes (2) increases, it becomes very difficult to lay out the probes (2) in a radial pattern. Since the proximal end portion of the probe (2) is concentrated near the portion corresponding to, there is a problem that the probe (2) is short-circuited due to attachment of foreign matter or the like.
【0010】 そこで、本考案は上記問題点に鑑みて提案されたもので、その目的とするとこ ろは、電極パッドでの探針の接触抵抗を一定にし、探針が集中することのない配 置レイアウトを容易にし得るプローブカードを提供することにある。Therefore, the present invention has been proposed in view of the above problems, and an object thereof is to make the contact resistance of the probe at the electrode pad constant so that the probe is not concentrated. An object of the present invention is to provide a probe card capable of facilitating a layout.
【0011】[0011]
上記目的を達成するための技術的手段として本考案は、基端部が基板に穿設し た貫通孔の周縁に取り付けられ、先端部が貫通孔の下方に位置する被測定素子の 電極パッドに向けて張り出した探針を、その電極パッドに接触させることにより 被測定素子の電気的特性を測定するものにおいて、上記貫通孔を被測定素子の形 状に合わせて矩形開口形状とし、その貫通孔周縁の各辺部で、被測定素子の対応 する電極パッドに向く各探針を平行配置したことを特徴とする。 As a technical means for achieving the above object, the present invention has a base end portion attached to a peripheral edge of a through hole formed in a substrate and a tip end portion of the electrode pad of a device to be measured located below the through hole. In a device that measures the electrical characteristics of the device under test by bringing a probe protruding toward it into contact with its electrode pad, the through-hole should have a rectangular opening shape that matches the shape of the device under test. It is characterized in that the probes facing the corresponding electrode pads of the device under test are arranged in parallel on each side of the peripheral edge.
【0012】 また、本考案は、基端部が基板に穿設した貫通孔の周縁に取り付けられ、先端 部が貫通孔の下方に位置する被測定素子の電極パッドに向けて張り出した探針を 、その電極パッドに接触させることにより被測定素子の電気的特性を測定するも のにおいて、上記貫通孔の周縁に段差を設け、上段部に取り付けられた探針と下 段部に取り付けられた探針とを一本おきに配置したことを特徴とする。Further, the present invention provides a probe having a base end attached to the periphery of a through hole formed in a substrate and a tip protruding toward an electrode pad of a device under test located below the through hole. In order to measure the electrical characteristics of the device under test by making contact with the electrode pad, a step is formed on the periphery of the through hole, and the probe attached to the upper step and the probe attached to the lower step are connected. It is characterized by arranging every other needle.
【0013】[0013]
本考案に係るプローブカードでは、貫通孔を被測定素子の形状に合わせて矩形 開口形状とし、その貫通孔周縁の各辺部で、被測定素子の対応する電極パッドに 向く各探針を平行配置したことにより、上記探針が電極パッド上を擦る方向が貫 通孔の対向辺部について一定するため、電極パッドでの探針の接触抵抗が一定と なると共に、探針の配置レイアウトが単純化される。 In the probe card according to the present invention, the through hole is formed into a rectangular opening shape in accordance with the shape of the element to be measured, and the probes facing the corresponding electrode pads of the element to be measured are arranged in parallel on each side of the periphery of the through hole. As a result, the direction in which the probe rubs the electrode pad is constant on the opposite sides of the through hole, so the contact resistance of the probe on the electrode pad is constant and the layout of the probe is simplified. To be done.
【0014】 また、貫通孔の周縁に段差を設け、上段部に取り付けられた探針と下段部に取 り付けられた探針とを一本おきに配置したことにより、上記探針の本数が増加し てもその同一面内での配置ピッチが小さくなることがなく、異物などの付着によ る短絡が発生することも可及的に少なくなる。Further, by providing a step on the periphery of the through hole and arranging every other probe attached to the upper part and the probe attached to the lower part, the number of the above-mentioned probes is increased. Even if the number increases, the arrangement pitch in the same plane does not become small, and the occurrence of short circuits due to the adhesion of foreign matter is reduced as much as possible.
【0015】[0015]
本考案に係るプローブカードの実施例を図1及び図2に示して説明する。 An embodiment of the probe card according to the present invention will be described with reference to FIGS.
【0016】 本考案のプローブカードは、図1及び図2に示すように測定装置本体〔図示せ ず〕にソケットを介して電気的に接続される基板(11)と、その基板(11)上に ソケット部分から延びる配線パターン〔図示せず〕を介して電気的に接続された 多数の探針(12a)(12b)とで構成される。As shown in FIGS. 1 and 2, the probe card of the present invention includes a substrate (11) electrically connected to a measuring device main body (not shown) through a socket, and a substrate (11) on the substrate (11). And a large number of probes (12a) (12b) electrically connected through a wiring pattern (not shown) extending from the socket portion.
【0017】 本考案の第1の特徴は、上記基板(11)の中央部分に穿設された貫通孔(13) を半導体素子(14)の形状〔図では長方形〕に合わせて矩形〔長方形〕開口形状 とし、その貫通孔(13)の周縁の各辺部(17)で、半導体素子(14)の表面周辺 部(15)と対応する電極パッド(16)に向く探針(12a)(12b)を平行配置した ことにある。即ち、貫通孔(13)の周縁の各辺部(17)に取り付けられた探針( 12a)(12b)が半導体素子(14)の各辺部(15)に対して直交する方向から延び 、対向する辺部(17)では、探針(12a)(12b)の延びる方向が一致しており、 隣接する辺部(17)では、探針(12a)(12b)の延びる方向が直交する位置関係 にある。これにより、後述するように探針(12a)(12b)の先端部が電極パッド (16)の表面を擦る方向が直交二方向となる。The first feature of the present invention is that the through hole (13) formed in the central portion of the substrate (11) is rectangular (rectangular) according to the shape (rectangular in the figure) of the semiconductor element (14). The probe (12a) (12b) has an opening shape and faces the electrode pad (16) corresponding to the peripheral portion (15) of the surface of the semiconductor element (14) on each side (17) of the periphery of the through hole (13). ) Are arranged in parallel. That is, the probes (12a) (12b) attached to the respective side portions (17) of the peripheral edge of the through hole (13) extend in a direction orthogonal to the respective side portions (15) of the semiconductor element (14), On the opposite side (17), the extending directions of the probes (12a) (12b) are the same, and on the adjacent side (17), the extending directions of the probes (12a) (12b) are orthogonal to each other. In a relationship. As a result, as will be described later, the directions in which the tips of the probes (12a) (12b) rub the surface of the electrode pad (16) are two orthogonal directions.
【0018】 また、本考案の第2の特徴は、上記貫通孔(13)の周縁に段差(18)を設け、 上段部(19a)に取り付けられた探針(12a)と下段部(19b)に取り付けられた 探針(12b)とを一本おきに配置したことにある。ここで、探針(12a)(12b) は、従来と同様、図示しないがその基端部が太くなっており、貫通孔(13)の周 縁に取り付けられて配線パターンと電気的に接続され、基端部から半導体素子( 14)に向けて延びる先端部が細くなっており、その半導体素子(14)の表面周辺 部に形成された電極パッド(16)に向けて下方傾斜するように屈曲形成されてい る。従って、上述のように貫通孔(13)の周縁の上段部(19a)に取り付けられ た探針(12a)同士が同一平面内に配置され、下段部(19b)に取り付けられた探 針(12b)同士が同一平面内に配置される。貫通孔(13)の周縁の上段部(19a) と下段部(19b)とに取り付けられた探針(12a)(12b)の基端部でのそれぞれ の配置ピッチは、電極パッド(16)の配置ピッチの二倍となり、電極パッド(16 )の数が増加するに伴って、探針(12a)(12b)の数が増加してもその探針(12 a)(12b)の基端部での配置ピッチが小さくなることを可及的に抑制することが できる。A second feature of the present invention is that a step (18) is provided on the periphery of the through hole (13), and the probe (12a) and the lower step (19b) attached to the upper step (19a). This is because the probe (12b) attached to and every other line were arranged. Here, the probe (12a) (12b) has a thicker base end, which is not shown, as in the conventional case, and is attached to the periphery of the through hole (13) and electrically connected to the wiring pattern. , The tip extending from the base end toward the semiconductor element (14) is thin, and is bent so as to be inclined downward toward the electrode pad (16) formed on the peripheral portion of the surface of the semiconductor element (14). Has been formed. Therefore, as described above, the probes (12a) attached to the upper step (19a) of the peripheral edge of the through hole (13) are arranged in the same plane, and the probe (12b) attached to the lower step (19b). ) Are arranged in the same plane. The arrangement pitch of each of the probes (12a) and (12b) attached to the upper step (19a) and the lower step (19b) of the peripheral edge of the through hole (13) at the base end is different from that of the electrode pad (16). Even if the number of probes (12a) (12b) increases as the number of electrode pads (16) increases, which is twice the arrangement pitch, the proximal ends of the probes (12a) (12b) It is possible to suppress the arrangement pitch at the point where it becomes small as much as possible.
【0019】 上記構成からなるプローブカードによる半導体素子の電気的特性の測定は以下 のようにして行なわれる。The electrical characteristics of the semiconductor element are measured by the probe card having the above structure as follows.
【0020】 まず、従来と同様、半導体ウェーハ(20)の上方にプローブカードを配置し、 その貫通孔(13)の直下に測定すべき半導体素子(14)を位置決め配置する。こ の状態で、半導体ウェーハ(20)とプローブカードとを相対的に近接させること により、プローブカードの各探針(12a)(12b)の先端部を半導体素子(14)の 表面周辺部に配設された電極パッド(16)に接触させる。そして、上記探針(12 a)(12b)と電極パッド(16)とが接触した時点から半導体ウェーハ(20)とプ ローブカードとを更に若干近接させることにより、探針(12a)(12b)の先端部 が電極パッド(16)上を探針(12a)(12b)が延びる方向に擦ることによって探 針(12a)(12b)が電極パッド(16)に所定の押圧力でもって確実に接触するよ うにしている。そして、この探針(12a)(12b)の電極パッド(16)への接触に よる通電でもって半導体素子(14)の電気的特性を測定する。この半導体素子( 14)の電気的特性の測定は半導体ウェーハ(20)のすべての半導体素子(14)に ついて順次実行される。First, as in the conventional case, the probe card is arranged above the semiconductor wafer (20), and the semiconductor element (14) to be measured is positioned and arranged immediately below the through hole (13). In this state, by bringing the semiconductor wafer (20) and the probe card into close proximity to each other, the tips of the probe cards (12a) and (12b) are arranged around the surface of the semiconductor element (14). The electrode pad (16) provided is contacted. Then, the semiconductor wafer (20) and the probe card are moved slightly closer to each other from the time when the probes (12a) (12b) and the electrode pad (16) are brought into contact with each other, so that the probes (12a) (12b) By rubbing the tip of the probe on the electrode pad (16) in the direction in which the probe (12a) (12b) extends, the probe (12a) (12b) surely contacts the electrode pad (16) with a predetermined pressing force. I am trying to do it. Then, the electrical characteristics of the semiconductor element (14) are measured by energization by the contact of the probe (12a) (12b) with the electrode pad (16). The measurement of the electrical characteristics of the semiconductor element (14) is sequentially performed for all the semiconductor elements (14) of the semiconductor wafer (20).
【0021】 ここで、上記探針(12a)(12b)の先端部が電極パッド(16)を擦る方向が直 交二方向であるため、対向する各辺部ごとに探針(12a)(12b)の先端部が電極 パッド(16)を擦る方向が一定となり、探針(12a)(12b)の先端部の電極パッ ド(16)での接触状態が安定し、その接触抵抗を一定に保持することができる。 また、このようにすれば、基板(11)上で探針(12a)(12b)の配置レイアウト が単純化され、ある特定の箇所で探針(12a)(12b)が集中的に配置されること がない。而も、探針(12a)(12b)の基端部が上段部(19a)と下段部(19b)と で取り付け場所が異なるので、探針(12a)(12b)間に異物が付着することもな い。Here, since the tips of the probes (12a) (12b) rub the electrode pad (16) in two direct directions, the probe (12a) (12b ) The direction in which the tip of the probe rubs the electrode pad (16) is constant, the contact state of the tip of the probe (12a) (12b) with the electrode pad (16) is stable, and the contact resistance is kept constant. can do. Further, in this way, the layout of the tips (12a) and (12b) on the substrate (11) is simplified, and the tips (12a) and (12b) are intensively placed at a specific place. There is no such thing. Also, since the base end portions of the probes (12a) and (12b) are installed at different positions in the upper step portion (19a) and the lower step portion (19b), foreign matter may adhere between the probe tips (12a) and (12b). Nor.
【0022】[0022]
本考案に係るプローブカードによれば、貫通孔を被測定素子の形状に合わせて 矩形開口形状とし、その貫通孔周縁の各辺部で、被測定素子の対応する電極パッ ドに向く各探針を平行配置したことにより、上記探針が電極パッド上を擦る方向 が貫通孔の対向辺部について一定となるため、電極パッドでの探針の接触抵抗が 安定すると共に、探針の配置レイアウトが単純化されてプローブカードの製作が 非常に容易となると共に高精度な測定が実現可能となる。 According to the probe card of the present invention, the through hole is formed into a rectangular opening shape according to the shape of the element to be measured, and each probe on each side of the periphery of the through hole faces the corresponding electrode pad of the element to be measured. By arranging in parallel with each other, the direction in which the probe rubs the electrode pad is constant on the opposite sides of the through hole, so that the contact resistance of the probe on the electrode pad is stable and the layout of the probe is This simplifies the manufacture of the probe card and makes highly accurate measurement possible.
【0023】 また、貫通孔の周縁に段差を設け、上段部に取り付けられた探針と下段部に取 り付けられた探針とを一本おきに配置したことにより、上記探針の本数が増加し てもその同一面内での配置ピッチが小さくなることがなくて被測定素子の集積度 が向上してもそれに十分対応することができ、異物などの付着による短絡が発生 することも可及的に少なくなって信頼性が大幅に向上する。Further, by providing a step on the periphery of the through hole and arranging every other probe attached to the upper portion and the probe attached to the lower portion, the number of the above-mentioned probe is reduced. Even if the number increases, the arrangement pitch in the same plane does not become small, and even if the integration degree of the device under test is improved, it is possible to sufficiently cope with it, and a short circuit due to adhesion of foreign matter etc. may occur. As much as possible, the reliability is greatly improved.
【図1】本考案に係るプローブカードの実施例を示す平
面図FIG. 1 is a plan view showing an embodiment of a probe card according to the present invention.
【図2】図1の要部拡大断面図FIG. 2 is an enlarged sectional view of an essential part of FIG.
【図3】プローブカードの従来例を示す平面図FIG. 3 is a plan view showing a conventional example of a probe card.
【図4】図3の部分拡大断面図4 is a partially enlarged sectional view of FIG.
11 基板 12a 探針 12b 探針 13 貫通孔 14 被測定素子〔半導体素子〕 16 電極パッド 18 段差 19a 上段部 19b 下段部 11 Substrate 12a Probe 12b Probe 13 Through hole 14 Element to be measured (semiconductor element) 16 Electrode pad 18 Step 19a Upper part 19b Lower part
Claims (2)
取り付けられ、先端部が貫通孔の下方に位置する被測定
素子の電極パッドに向けて張り出した探針を、その電極
パッドに接触させることにより被測定素子の電気的特性
を測定するものにおいて、 上記貫通孔を被測定素子の形状に合わせて矩形開口形状
とし、その貫通孔周縁の各辺部で、被測定素子の対応す
る電極パッドに向く各探針を平行配置したことを特徴と
するプローブカード。1. A probe having a base end attached to the periphery of a through hole formed in a substrate and a tip protruding toward an electrode pad of a device to be measured located below the through hole, the probe having the electrode pad. In which the electrical characteristics of the element to be measured are measured by contacting with the element, the through hole is formed into a rectangular opening shape in accordance with the shape of the element to be measured, and each side of the peripheral edge of the through hole corresponds to the element The probe card is characterized in that the respective probes facing the corresponding electrode pad are arranged in parallel.
取り付けられ、先端部が貫通孔の下方に位置する被測定
素子の電極パッドに向けて張り出した探針を、その電極
パッドに接触させることにより被測定素子の電気的特性
を測定するものにおいて、 上記貫通孔の周縁に段差を設け、上段部に取り付けられ
た探針と下段部に取り付けられた探針とを一本おきに配
置したことを特徴とするプローブカード。2. A probe having a base end portion attached to the periphery of a through hole formed in a substrate and a tip portion protruding toward an electrode pad of a device to be measured located below the through hole, the electrode pad In order to measure the electrical characteristics of the device under test by making contact with the above, a step is provided at the peripheral edge of the through hole, and every other probe attached to the upper step and one attached to the lower step A probe card characterized by being placed in.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7135091U JPH0523537U (en) | 1991-09-05 | 1991-09-05 | Probe card |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7135091U JPH0523537U (en) | 1991-09-05 | 1991-09-05 | Probe card |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0523537U true JPH0523537U (en) | 1993-03-26 |
Family
ID=13457964
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7135091U Pending JPH0523537U (en) | 1991-09-05 | 1991-09-05 | Probe card |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0523537U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10123175A (en) * | 1996-10-24 | 1998-05-15 | Micronics Japan Co Ltd | Inspection head |
-
1991
- 1991-09-05 JP JP7135091U patent/JPH0523537U/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10123175A (en) * | 1996-10-24 | 1998-05-15 | Micronics Japan Co Ltd | Inspection head |
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