JPH0524648B2 - - Google Patents
Info
- Publication number
- JPH0524648B2 JPH0524648B2 JP8177189A JP8177189A JPH0524648B2 JP H0524648 B2 JPH0524648 B2 JP H0524648B2 JP 8177189 A JP8177189 A JP 8177189A JP 8177189 A JP8177189 A JP 8177189A JP H0524648 B2 JPH0524648 B2 JP H0524648B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- heat
- semiconductor ceramic
- treated
- type semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 46
- 238000010405 reoxidation reaction Methods 0.000 claims description 18
- 229910052573 porcelain Inorganic materials 0.000 claims description 16
- 239000000919 ceramic Substances 0.000 claims description 15
- 239000003985 ceramic capacitor Substances 0.000 claims description 14
- 125000006850 spacer group Chemical group 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 6
- 239000002994 raw material Substances 0.000 claims description 4
- 238000010304 firing Methods 0.000 description 7
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000002542 deteriorative effect Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 239000011819 refractory material Substances 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Landscapes
- Ceramic Capacitors (AREA)
Description
〔産業上の利用分野〕
本発明は、表面再酸化型半導体磁器コンデンサ
の製造方法に関する。
〔従来の技術〕
表面再酸化型半導体磁器コンデンサは、一般的
には、次の工程により製造される。
例えば、BaTiO3を主成分とする原材料を混
合した後、バインダー等を添加して混練し、シ
ート状に押し出し成形し、得られたシートを打
ち抜いて円板状の成形体を得る。
上記成形体を複数枚重ねてサヤ詰めし、大気
中で焼成したのち、得られた焼結体を還元性雰
囲気中で熱処理して半導体磁器を得る。
上記半導体磁器を、大気中で再び熱処理して
表面を再酸化し、表面再酸化型半導体磁器を得
る。
上記表面再酸化型半導体磁器の両主面の互い
に対向する位置に、それぞれAg電極層を形成
して表面再酸化型半導体磁器コンデンサを得
る。
上記製造方法により製造される表面再酸化型半
導体磁器コンデンサにおいては、半導体磁器を再
び大気中で熱処理する際の該半導体磁器の表面へ
の酸素供給の度合い及び熱処理温度の条件等によ
り、上記半導体磁器の表面層部分での酸素拡散の
度合が大きく異なり、これにより、その静電容量
C〔nF〕、誘電損失tanδ〔%〕、絶縁抵抗IR〔MΩ〕
等の特性が大きく影響変動する。
このような観点から従来は、酸素拡散の度合い
が個々の半導体磁器毎にばらつくことのないよ
う、アルミナ、あるいはジルコニア等の耐火物か
らなる焼成用サヤの上に、直接あるいは上記耐火
物からなるセツターを介して、互いに重ならない
ように上記半導体磁器を平詰めしたのち、これら
のサヤを複数段重ねて大気中で熱処理するのが一
般的であつた。
〔発明が解決しようとする課題〕
しかしながら、上記従来の製造方法では、耐火
物製の焼成用サヤあるいはセツターの上に、互い
に重ならないように半導体磁器を平詰めして熱処
理していたため、ひとサヤ当たりに処理できる半
導体磁器の数が少なく、熱効率、処理効率ともに
低かつた。
また、ひとサヤ当たりの処理量を増やすため
に、上記半導体磁器を複数枚重ねて熱処理するこ
とも検討されているが、半導体磁器毎に特性が大
きくばらつき、誘電損失の増加や、絶縁抵抗の低
下が否めなかつた。
本発明の目的は、上記従来の問題点を解決し
て、特性バラツキの増加や特性の悪化等を生ずる
ことなく、表面再酸化型半導体磁器コンデンサを
効率良く得ることが可能な製造方法を提供するこ
とにある。
〔課題を解決するための手段〕
本発明は、半導体磁器の原材料を混合したのち
成形して得られた成形体を大気中で焼成し、還元
性雰囲気中で熱処理したのち再び大気中で熱処理
して表面を再酸化し、得られた表面再酸化型半導
体磁器の表面に一対の電極層を形成してなる表面
再酸化型半導体磁器コンデンサの製造方法におい
て、上記半導体磁器を再び大気中で熱処理する際
に、該熱処理しようとする半導体磁器と同一又は
それよりも大きいサイズの板状のスペーサーを準
備し、上記半導体磁器を上記スペーサーで挟むよ
うにして上記半導体磁器と上記スペーサーとを交
互に重ね合せ、この状態で熱処理することを特徴
とするものである。
なお、上記スペーサーは、アルミナ、ジルコニ
ア、マグネシア、あるいはこれらの混合組成物を
焼成して得られた耐火物で形成することが望まし
い。
〔作用〕
本発明の表面再酸化型半導体磁器コンデンサの
製造方法においては、上記したように、半導体磁
器の両側面を上記スペーサーで挟むようにして、
上記半導体磁器と上記スペーサーとを交互に重ね
合せ、この状態で再酸化のための熱処理を行なう
ようにしたので、各半導体磁器への熱伝導および
酸素拡散が均一に行われる。
〔実施例〕
次に、本発明の表面再酸化型半導体磁器コンデ
ンサの実施例を比較例と共に説明する。
先ず、BaTiO3 92mol%、CeO2 5mol%、
TiO2 3mol%、の組成比からなる半導体磁器の
原料粉末を混合し、バインダーとしてメチルセル
ロース7wt%と、可塑剤としてグリセリンの10wt
%水溶液を添加し、0.6mmの厚さのシート状に押
し出し成形した。次いで、上記シートを10mmφの
円板形状に打ち抜き、得られた成形体をアルミナ
磁器製の焼成用サヤに詰めた後、大気中1300℃で
焼成して焼結体を得た。次に、上記焼結体を再び
焼成用サヤに詰め、H2 10vol%、N2 90vol%の
還元雰囲気中1000℃で2時間熱処理し、半導体磁
器を得た。この後、上記で得られた半導体磁器を
用いて、第1表に示す実施例1〜4及び比較例1
〜3の条件で再び大気中、900℃で、2時間熱処
理して表面再酸化型半導体磁器を得た。上記で得
られた表面再酸化型半導体磁器の両主面にそれぞ
れ6mmφの円形にAg電極材料ペーストを塗布し、
800℃で10分間焼き付け処理して表面再酸化型半
導体磁器コンデンサ試料を得た。
このようにして得られたコンデンサ試料各500
個について、測定周波数1KHz、測定電圧0.1Vで
静電容量C〔nF〕、誘電損失tanδ〔%〕、および直
流50Vの電圧を15秒印加した後の絶縁抵抗IR
〔MΩ〕を測定し、平均値、バラツキ(3σ/
x)、およびひとサヤ当たりの処理量の比すなわ
ち処理能力比を求めて、その結果を第2表に示し
た。
第2表に示される通り、本発明の実施例1〜4
で得られた試料はいずれも、静電容量、誘電損
失、絶縁抵抗ともに比較例1に示す従来の平詰め
方法による試料と同等の特性を有し、また静電容
量、誘電損失では、比較例2〜3で得られた試料
よりもバラツキが小さかつた。また、ひとサヤ当
たりの処理量の点では、従来の平詰め方法に比べ
て7倍以上の処理量であつた。
上記実施例では、スペーサーとしてアルミナあ
るいはジルコニアを用いたが、本発明はこれに限
定されるものではなく、焼結可能な金属あるいは
金属の酸化物、炭化物、窒化物のうち、被熱処理
物と同一組成のものを除けば種々選択して用いる
ことが可能である。
また、上記スペーサーの空〓率を調整すること
により、半導体磁器表面への酸素供給の度合を調
整することも可能である。
[Industrial Field of Application] The present invention relates to a method of manufacturing a surface reoxidation type semiconductor ceramic capacitor. [Prior Art] Surface reoxidation type semiconductor ceramic capacitors are generally manufactured by the following steps. For example, after mixing raw materials containing BaTiO 3 as a main component, a binder and the like are added, kneaded, extruded into a sheet, and the resulting sheet is punched out to obtain a disc-shaped molded body. A plurality of the above molded bodies are piled up and packed in pods, fired in the atmosphere, and then the obtained sintered body is heat treated in a reducing atmosphere to obtain semiconductor porcelain. The semiconductor ceramic is heat-treated again in the atmosphere to re-oxidize the surface to obtain a surface-reoxidized semiconductor ceramic. A surface reoxidation type semiconductor ceramic capacitor is obtained by forming Ag electrode layers at mutually opposing positions on both principal surfaces of the surface reoxidation type semiconductor ceramic capacitor. In the surface reoxidation type semiconductor ceramic capacitor manufactured by the above manufacturing method, depending on the degree of oxygen supply to the surface of the semiconductor ceramic and the conditions of the heat treatment temperature when the semiconductor ceramic is heat-treated in the atmosphere again, the semiconductor ceramic The degree of oxygen diffusion in the surface layer portion of the
Characteristics such as these are greatly affected and fluctuate. From this point of view, conventionally, in order to prevent the degree of oxygen diffusion from varying among individual semiconductor porcelains, a firing sheath made of a refractory material such as alumina or zirconia was placed directly on top of the firing pod, or a setter made of the above refractory material was used. It was common practice to pack the semiconductor porcelain flatly so that they did not overlap each other, and then stack these pods in multiple stages and heat-treat them in the atmosphere. [Problems to be Solved by the Invention] However, in the above conventional manufacturing method, semiconductor porcelain was packed flat on a refractory firing pod or setter and heat-treated so that they did not overlap each other. The number of semiconductor ceramics that could be processed per unit was small, and both thermal efficiency and processing efficiency were low. In addition, in order to increase the throughput per pod, heat treatment of multiple layers of the above semiconductor porcelain is being considered, but the characteristics vary widely among semiconductor porcelains, resulting in an increase in dielectric loss and a decrease in insulation resistance. I couldn't deny it. An object of the present invention is to provide a manufacturing method capable of solving the above-mentioned conventional problems and efficiently obtaining a surface reoxidation type semiconductor ceramic capacitor without increasing variation in characteristics or deteriorating characteristics. There is a particular thing. [Means for Solving the Problems] The present invention involves mixing raw materials for semiconductor porcelain, molding the resulting molded product, firing it in the air, heat-treating it in a reducing atmosphere, and then heat-treating it again in the air. In the method for producing a surface reoxidation type semiconductor ceramic capacitor, the surface reoxidation type semiconductor ceramic capacitor is formed by reoxidizing the surface and forming a pair of electrode layers on the surface of the obtained surface reoxidation type semiconductor ceramic. At this time, plate-shaped spacers of the same size or larger than the semiconductor porcelain to be heat-treated are prepared, and the semiconductor porcelain and the spacers are alternately stacked so that the semiconductor porcelain is sandwiched between the spacers. It is characterized by being heat-treated in the state. Note that the spacer is preferably formed of a refractory obtained by firing alumina, zirconia, magnesia, or a mixed composition thereof. [Function] In the method for manufacturing a surface reoxidation semiconductor ceramic capacitor of the present invention, as described above, both sides of the semiconductor ceramic are sandwiched between the spacers,
Since the semiconductor ceramics and the spacers are alternately stacked and the heat treatment for reoxidation is performed in this state, heat conduction and oxygen diffusion to each semiconductor ceramic is uniform. [Example] Next, examples of the surface reoxidation type semiconductor ceramic capacitor of the present invention will be described together with comparative examples. First, BaTiO 3 92 mol%, CeO 2 5 mol%,
Mix raw material powder for semiconductor porcelain with a composition ratio of 3 mol% TiO 2 , 7 wt % methyl cellulose as a binder, and 10 wt % glycerin as a plasticizer.
% aqueous solution was added and extruded into a sheet with a thickness of 0.6 mm. Next, the sheet was punched out into a disk shape of 10 mmφ, and the resulting molded body was packed in an alumina porcelain firing sheath, and then fired in the air at 1300°C to obtain a sintered body. Next, the sintered body was packed into a firing pod again and heat treated at 1000° C. for 2 hours in a reducing atmosphere containing 10 vol% H 2 and 90 vol% N 2 to obtain semiconductor porcelain. After this, using the semiconductor porcelain obtained above, Examples 1 to 4 and Comparative Example 1 shown in Table 1 were prepared.
A heat treatment was performed again at 900° C. for 2 hours in the air under the conditions of 3 to 3 to obtain a surface reoxidation type semiconductor porcelain. Ag electrode material paste was applied in a circular shape of 6 mm diameter to both main surfaces of the surface reoxidation type semiconductor porcelain obtained above.
A surface reoxidation type semiconductor ceramic capacitor sample was obtained by baking at 800°C for 10 minutes. 500 capacitor samples each obtained in this way
For each piece, capacitance C [nF], dielectric loss tan δ [%], and insulation resistance IR after applying a voltage of 50 V DC for 15 seconds at a measurement frequency of 1 KHz and a measurement voltage of 0.1 V.
[MΩ] was measured, and the average value and variation (3σ/
x) and the throughput per pod, that is, the throughput ratio, were determined and the results are shown in Table 2. Examples 1 to 4 of the present invention as shown in Table 2
All of the samples obtained in this procedure had the same characteristics in terms of capacitance, dielectric loss, and insulation resistance as the sample obtained by the conventional flat-packing method shown in Comparative Example 1. The variation was smaller than that of the samples obtained in 2 and 3. In addition, in terms of the throughput per pod, the throughput was more than seven times that of the conventional flat packing method. In the above embodiments, alumina or zirconia was used as the spacer, but the present invention is not limited thereto. Various selections can be made except for the composition. Furthermore, by adjusting the vacancy of the spacer, it is also possible to adjust the degree of oxygen supply to the surface of the semiconductor ceramic.
【表】【table】
【表】【table】
本発明によれば、上記実施例の結果に示される
通り、特性バラツキの増加や特性の悪化等を生ず
ることなく、表面再酸化型半導体磁器コンデンサ
を効率良く製造することができる。
According to the present invention, as shown in the results of the above examples, surface reoxidation type semiconductor ceramic capacitors can be efficiently manufactured without increasing variation in characteristics or deteriorating characteristics.
Claims (1)
得られた成形体を大気中で焼成し、還元性雰囲気
中で熱処理したのち再び大気中で熱処理して表面
を再酸化し、得られた表面再酸化型半導体磁器の
表面に一対の電極層を形成してなる表面再酸化型
半導体磁器コンデンサの製造方法において、前記
半導体磁器を再び大気中で熱処理する際に、該半
導体磁器と同一又はそれよりも大きいサイズの板
状のスペーサーを準備し、前記半導体磁器を上記
スペーサで挟むようにして前記半導体磁器と前記
スペーサーとを交互に重ね合せ、この状態で熱処
理することを特徴とする表面再酸化型半導体磁器
コンデンサの製造方法。1. Mix the raw materials for semiconductor porcelain and then form it.
The obtained compact is fired in the air, heat-treated in a reducing atmosphere, and then heat-treated again in the air to re-oxidize the surface, and a pair of electrode layers is formed on the surface of the surface-reoxidized semiconductor porcelain obtained. In the method for manufacturing a surface reoxidation type semiconductor ceramic capacitor, when the semiconductor ceramic is heat-treated in the atmosphere again, a plate-shaped spacer of the same size or larger than the semiconductor ceramic is prepared, and the A method for manufacturing a surface reoxidation type semiconductor ceramic capacitor, characterized in that the semiconductor ceramics and the spacers are alternately stacked so that the semiconductor ceramics are sandwiched between the spacers, and heat-treated in this state.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8177189A JPH02260510A (en) | 1989-03-31 | 1989-03-31 | Manufacture of semiconductor ceramic capacitor of surface re-oxidation type |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8177189A JPH02260510A (en) | 1989-03-31 | 1989-03-31 | Manufacture of semiconductor ceramic capacitor of surface re-oxidation type |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02260510A JPH02260510A (en) | 1990-10-23 |
| JPH0524648B2 true JPH0524648B2 (en) | 1993-04-08 |
Family
ID=13755735
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8177189A Granted JPH02260510A (en) | 1989-03-31 | 1989-03-31 | Manufacture of semiconductor ceramic capacitor of surface re-oxidation type |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02260510A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001130957A (en) * | 1999-11-02 | 2001-05-15 | Murata Mfg Co Ltd | Semiconductor ceramic, method for producing semiconductor ceramic, and thermistor |
| CN114394415B (en) * | 2021-12-28 | 2023-12-12 | 赤壁市万皇智能设备有限公司 | FPC automated production line based on AGV automatic handling system |
-
1989
- 1989-03-31 JP JP8177189A patent/JPH02260510A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02260510A (en) | 1990-10-23 |
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