JPH0525232A - カルボキシル基含有共重合体の保存安定性溶液、及び感光性被覆物とオフセツト印刷版体の製造方法 - Google Patents

カルボキシル基含有共重合体の保存安定性溶液、及び感光性被覆物とオフセツト印刷版体の製造方法

Info

Publication number: JPH0525232A
Authority: JP; Japan
Prior art keywords: meth; acrylate; photopolymerizable; offset printing; solution
Prior art date: 1991-01-25
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Withdrawn

Application number

JP4006459A

Other languages

English (en)

Japanese (ja)

Inventor

Harald Lauke

ハーラルト、ラウケ

Thomas Loerzer

トーマス、レルツアー

Axel Dr Sanner

アクセル、ザナー

Joachim Roser

ヨーアヒム、ローザー

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

BASF SE

Original Assignee

BASF SE

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-01-25

Filing date

1992-01-17

Publication date

1993-02-02

1992-01-17 Application filed by BASF SE filed Critical BASF SE

1993-02-02 Publication of JPH0525232A publication Critical patent/JPH0525232A/ja

Status Withdrawn legal-status Critical Current

Links

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238000003860 storage Methods 0.000 title claims description 8
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DPKBAXPHAYBPRL-UHFFFAOYSA-M tetrabutylazanium;iodide Chemical compound [I-].CCCC[N+](CCCC)(CCCC)CCCC DPKBAXPHAYBPRL-UHFFFAOYSA-M 0.000 description 2
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238000012986 modification Methods 0.000 description 1
239000003607 modifier Substances 0.000 description 1
DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 1
PSHKMPUSSFXUIA-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine Chemical compound CN(C)C1=CC=CC=N1 PSHKMPUSSFXUIA-UHFFFAOYSA-N 0.000 description 1
LXCJGJYAOVCKLO-UHFFFAOYSA-N n-cyclohexyl-n-hydroxynitrous amide Chemical compound O=NN(O)C1CCCCC1 LXCJGJYAOVCKLO-UHFFFAOYSA-N 0.000 description 1
KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
125000002560 nitrile group Chemical group 0.000 description 1
125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
150000002894 organic compounds Chemical class 0.000 description 1
150000001451 organic peroxides Chemical class 0.000 description 1
230000001151 other effect Effects 0.000 description 1
RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
239000000123 paper Substances 0.000 description 1
239000011087 paperboard Substances 0.000 description 1
UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical compound C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 1
WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
238000000016 photochemical curing Methods 0.000 description 1
239000000791 photochemical oxidant Substances 0.000 description 1
239000003504 photosensitizing agent Substances 0.000 description 1
229920002647 polyamide Polymers 0.000 description 1
229920000573 polyethylene Polymers 0.000 description 1
229920000139 polyethylene terephthalate Polymers 0.000 description 1
239000005020 polyethylene terephthalate Substances 0.000 description 1
229920001228 polyisocyanate Polymers 0.000 description 1
239000005056 polyisocyanate Substances 0.000 description 1
229920005862 polyol Polymers 0.000 description 1
150000003077 polyols Chemical class 0.000 description 1
229920001451 polypropylene glycol Polymers 0.000 description 1
229920000166 polytrimethylene carbonate Polymers 0.000 description 1
229920002635 polyurethane Polymers 0.000 description 1
239000004814 polyurethane Substances 0.000 description 1
239000011118 polyvinyl acetate Substances 0.000 description 1
229920002689 polyvinyl acetate Polymers 0.000 description 1
229920002451 polyvinyl alcohol Polymers 0.000 description 1
125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
238000012545 processing Methods 0.000 description 1
LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
229960004063 propylene glycol Drugs 0.000 description 1
235000013772 propylene glycol Nutrition 0.000 description 1
150000004053 quinones Chemical class 0.000 description 1
150000003254 radicals Chemical class 0.000 description 1
239000011541 reaction mixture Substances 0.000 description 1
239000012744 reinforcing agent Substances 0.000 description 1
229920006395 saturated elastomer Polymers 0.000 description 1
230000035945 sensitivity Effects 0.000 description 1
239000008234 soft water Substances 0.000 description 1
230000000087 stabilizing effect Effects 0.000 description 1
239000007858 starting material Substances 0.000 description 1
239000010959 steel Substances 0.000 description 1
239000000126 substance Substances 0.000 description 1
150000005846 sugar alcohols Polymers 0.000 description 1
238000004381 surface treatment Methods 0.000 description 1
UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
LLWJPGAKXJBKKA-UHFFFAOYSA-N victoria blue B Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)=C(C=C1)C2=CC=CC=C2C1=[NH+]C1=CC=CC=C1 LLWJPGAKXJBKKA-UHFFFAOYSA-N 0.000 description 1
229920001567 vinyl ester resin Polymers 0.000 description 1
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
229920002554 vinyl polymer Polymers 0.000 description 1
239000002351 wastewater Substances 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
239000002023 wood Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/12—Polymers provided for in subclasses C08C or C08F
- C08F290/126—Polymers of unsaturated carboxylic acids or derivatives thereof
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/118—Initiator containing with inhibitor or stabilizer
- Y10S430/119—Hydroxyl or carbonyl group containing as sole functional groups

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Physics & Mathematics (AREA)
Health & Medical Sciences (AREA)
Medicinal Chemistry (AREA)
Polymers & Plastics (AREA)
Organic Chemistry (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Macromonomer-Based Addition Polymer (AREA)
Polymerisation Methods In General (AREA)

JP4006459A 1991-01-25 1992-01-17 カルボキシル基含有共重合体の保存安定性溶液、及び感光性被覆物とオフセツト印刷版体の製造方法 Withdrawn JPH0525232A (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
DE4102173A DE4102173A1 (de)	1991-01-25	1991-01-25	Lagerstabile loesung eines carboxylgruppenhaltigen copolymerisats sowie verfahren zur herstellung von photoempfindlichen lacken und offsetdruckplatten
DE4102173.8		1991-01-25

Publications (1)

Publication Number	Publication Date
JPH0525232A true JPH0525232A (ja)	1993-02-02

Family

ID=6423688

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP4006459A Withdrawn JPH0525232A (ja)	1991-01-25	1992-01-17	カルボキシル基含有共重合体の保存安定性溶液、及び感光性被覆物とオフセツト印刷版体の製造方法

Country Status (4)

Country	Link
US (1)	US5262278A (fr)
EP (1)	EP0496203B1 (fr)
JP (1)	JPH0525232A (fr)
DE (2)	DE4102173A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH10312055A (ja) *	1997-05-14	1998-11-24	Mitsubishi Chem Corp	感光性平版印刷版
JP2013194189A (ja) *	2012-03-22	2013-09-30	Nippon Shokubai Co Ltd	硬化性樹脂組成物および感光性樹脂組成物

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP0620673B1 (fr)	1993-04-16	1996-07-24	Agfa-Gevaert N.V.	Procédé de fabrication de plaques d'impression lithographiques
EP0698822B1 (fr)	1994-08-22	1999-03-17	Agfa-Gevaert N.V.	Précurseur de plaque d'impression lithographique avec und support flexible et méthode de fabrication d'une plaque d'impression lithographique à partir de ce précurseur
EP0751430A1 (fr)	1995-06-29	1997-01-02	Agfa-Gevaert N.V.	Dispositif et méthode de fabrication d'une plaque d'impression lithographique selon le procédé de diffusion-transfert de sel d'argent
US5773194A (en) *	1995-09-08	1998-06-30	Konica Corporation	Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate
US5800965A (en) *	1996-02-29	1998-09-01	Mitsubishi Chemical Corporation	Photopolymerizable composition for a photosensitive lithographic printing plate and photosensitive lithographic printing plate employing it
JP3505716B2 (ja) *	1996-05-23	2004-03-15	オムロン株式会社	感光性組成物および白色塗膜
JP3814961B2 (ja)	1996-08-06	2006-08-30	三菱化学株式会社	ポジ型感光性印刷版
EP0851299B1 (fr) *	1996-12-26	2000-10-25	Mitsubishi Chemical Corporation	Plaque d'impression lithographique photosensible
DE19823099A1 (de)	1998-05-22	1999-11-25	Wacker Chemie Gmbh	Verfahren zur Herstellung von vernetzbaren Bindemitteln
DE602004030519D1 (de) *	2003-07-22	2011-01-27	Fujifilm Corp	Flachdruckplattenvorläufer und lithographisches Druckverfahren
DE102005041025A1 (de) *	2005-08-23	2007-03-01	Karl Wörwag Lack- Und Farbenfabrik Gmbh & Co. Kg	Verfahren zur Herstellung einer Kunststoff-Formhaut
EP1843203A1 (fr) *	2006-04-03	2007-10-10	Agfa Graphics N.V.	Procédé de fabrication d'une plaque d'impression photopolymère
CN102650825B (zh) *	2011-02-28	2014-08-27	中山市立顺实业有限公司	一种含有粘着添加剂及增塑剂的干膜光阻剂

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB1090142A (en) *	1965-02-26	1967-11-08	Agfa Gevaert Nv	Photochemical insolubilisation of polymers
US3686371A (en) *	1969-05-22	1972-08-22	Tadashi Hasegawa	Method for producing copolymerizable compound containing functional group of phosphoric acid
GB1377978A (en) *	1970-11-25	1974-12-18	Kansai Paint Co Ltd	Composition for preparing electroconductive resin
US3754972A (en) *	1971-03-29	1973-08-28	Ppg Industries Inc	Phosphate esters and their use as adhesive promoters
US3984500A (en) *	1974-01-08	1976-10-05	Ford Motor Company	Radiation polymerizable coating composition containing an unsaturated phosphoric ester
US4000349A (en) *	1974-01-08	1976-12-28	Ford Motor Company	Plural coated abrasion and corrosion resistant article
JPS51132234A (en) *	1975-04-21	1976-11-17	Suriibondo:Kk	An anaerobic adhesive composition
JPS5928328B2 (ja) *	1977-11-29	1984-07-12	富士写真フイルム株式会社	光重合性組成物
JPS6053300B2 (ja) *	1978-08-29	1985-11-25	富士写真フイルム株式会社	感光性樹脂組成物
JPS5550001A (en) *	1978-10-06	1980-04-11	Fuji Photo Film Co Ltd	Photo-polymerizable composition
CA1216998A (fr) *	1980-09-10	1987-01-20	Donald P. Specht	Compositions pour photopolymerisation renfermant des photosensibilisateurs amines et des composes n- heterocycliques n-oxy
JPH0629285B2 (ja) *	1983-10-14	1994-04-20	三菱化成株式会社	光重合性組成物
DE3478461D1 (en) *	1984-09-19	1989-07-06	Sumitomo Metal Ind	U.v. radiation-curable rust-preventive coating compositions for steel products
US5069929A (en) *	1984-09-19	1991-12-03	Sumitomo Metal Industries, Ltd.	Actinic radiation-curable rust-preventive coating compositions for steel products
DE3606155A1 (de) *	1986-02-26	1987-08-27	Basf Ag	Photopolymerisierbares gemisch, dieses enthaltendes lichtempfindliches aufzeichnungselement sowie verfahren zur herstellung einer flachdruckform mittels dieses lichtempfindlichen aufzeichnungselements
JPH0670110B2 (ja) *	1989-10-13	1994-09-07	関西ペイント株式会社	重合体微粒子の分散液

1991
- 1991-01-25 DE DE4102173A patent/DE4102173A1/de not_active Withdrawn
1992
- 1992-01-08 EP EP92100165A patent/EP0496203B1/fr not_active Expired - Lifetime
- 1992-01-08 DE DE59202049T patent/DE59202049D1/de not_active Expired - Fee Related
- 1992-01-17 US US07/822,266 patent/US5262278A/en not_active Expired - Fee Related
- 1992-01-17 JP JP4006459A patent/JPH0525232A/ja not_active Withdrawn

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH10312055A (ja) *	1997-05-14	1998-11-24	Mitsubishi Chem Corp	感光性平版印刷版
JP2013194189A (ja) *	2012-03-22	2013-09-30	Nippon Shokubai Co Ltd	硬化性樹脂組成物および感光性樹脂組成物

Also Published As

Publication number	Publication date
EP0496203B1 (fr)	1995-05-03
DE59202049D1 (de)	1995-06-08
EP0496203A3 (en)	1992-10-07
US5262278A (en)	1993-11-16
DE4102173A1 (de)	1992-07-30
EP0496203A2 (fr)	1992-07-29

Legal Events

Date

Code

Title

Description

1999-04-06

A300

Application deemed to be withdrawn because no request for examination was validly filed

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 19990408

Publication	Publication Date	Title
US4977066A (en)	1990-12-11	Alkenylphosphonic and -phosphinic acid esters, process for their preparation, and a radiation-polymerizable mixture containing said compounds
US4537855A (en)	1985-08-27	Photopolymerizable photosensitive composition
US4327170A (en)	1982-04-27	Photopolymerizable unsaturated polyesters and copying material prepared therewith
JP2792889B2 (ja)	1998-09-03	印刷版体製造に適する光重合性印刷板
US4632897A (en)	1986-12-30	Photopolymerizable recording material suitable for the production of photoresist layers
JPH0525232A (ja)	1993-02-02	カルボキシル基含有共重合体の保存安定性溶液、及び感光性被覆物とオフセツト印刷版体の製造方法
EP0081964B1 (fr)	1986-11-05	Composition polymère photosensible
JP2579637B2 (ja)	1997-02-05	感光性記録素子
EP0014012A1 (fr)	1980-08-06	Composition photosensible contenant un composé à insaturation éthylénique, initiateur et sensibilisateur
JPH0646301B2 (ja)	1994-06-15	コアシエルミクロゲルを含有する水系で処理しうる感光性組成物
WO1988002135A1 (fr)	1988-03-24	Cliche photosensible developpable dans l'eau et sa production
JP2702120B2 (ja)	1998-01-21	光重合可能な混合物、該混合物を含有する感光性記録素子および該感光性記録素子を用いて平版印刷版を製造する方法
CA1329043C (fr)	1994-05-03	Composition photopolymerisable
US5204222A (en)	1993-04-20	Photocurable elastomeric mixture and recording material, obtained therefrom, for the production of relief printing plates
US4322490A (en)	1982-03-30	Photopolymerizable compositions featuring improved monomers
US5102773A (en)	1992-04-07	Photosensitive recording material comprising carboxyl-containing polymeric binder having ethylenically unsaturated side groups and β-amino alcohols
US5175076A (en)	1992-12-29	Water-developable photosensitive composition for producing relief plates
US4576898A (en)	1986-03-18	Process of making photopolymer relief plates using an adhesive layer
JPS6331484B2 (fr)	1988-06-24
US4806449A (en)	1989-02-21	Photosensitive photopolymerizable recording element containing a terpolymer binder
EP0130828A2 (fr)	1985-01-09	Composition à base de résine photosensible
US5041357A (en)	1991-08-20	Radiation-polymerizable mixture and recording material containing it
JP2002023349A (ja)	2002-01-23	感光性樹脂凸版材
JP2895214B2 (ja)	1999-05-24	陰画処理感光性印刷版の製作方法
US5034306A (en)	1991-07-23	Photocurable elastomeric mixture and recording material, obtained therefrom, for the production of relief printing plates

JPH0525232A - カルボキシル基含有共重合体の保存安定性溶液、及び感光性被覆物とオフセツト印刷版体の製造方法 - Google Patents

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Classifications

Landscapes

Applications Claiming Priority (2)

Publications (1)

Family

ID=6423688

Family Applications (1)

Country Status (4)

Cited By (2)

Families Citing this family (13)

Family Cites Families (16)

Cited By (2)

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