JPH0527111A - Method for correcting defect of color filter in color liquid crystal display device - Google Patents
Method for correcting defect of color filter in color liquid crystal display deviceInfo
- Publication number
- JPH0527111A JPH0527111A JP17846891A JP17846891A JPH0527111A JP H0527111 A JPH0527111 A JP H0527111A JP 17846891 A JP17846891 A JP 17846891A JP 17846891 A JP17846891 A JP 17846891A JP H0527111 A JPH0527111 A JP H0527111A
- Authority
- JP
- Japan
- Prior art keywords
- color filter
- defect
- excimer laser
- liquid crystal
- color
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/50—Protective arrangements
- G02F2201/506—Repairing, e.g. with redundant arrangement against defective part
- G02F2201/508—Pseudo repairing, e.g. a defective part is brought into a condition in which it does not disturb the functioning of the device
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Optical Filters (AREA)
Abstract
(57)【要約】
【目的】 カラー液晶表示装置におけるカラーフィルタ
の欠陥修正を迅速、確実に行え、修正作業の信頼性およ
び歩留りの向上が図れるカラーフィルタの欠陥修正方法
を実現する。
【構成】 カラーフィルタ１５に欠陥が発生し、かつそ
の位置データが検出されているガラス基板１をＸ−Ｙテ
ーブル上に載置し、エキシマレーザ発振器と欠陥を発生
しているカラーフィルタ１５との位置合わせ行う。続い
て、エキシマレーザ発振器よりエネルギ密度の閾値を適
宜の値に設定したエキシマレーザビームＩBを出射し、
パターンマスク１１のスリット部１２、反射ミラー１３
およびパターン縮小レンズ１４からなる縮小光学系によ
り欠陥を発生しているカラーフィルタ１５にそのサイズ
に対応したエキシマレーザビームスポットを照射し、こ
れにより欠陥を発生しているカラーフィルタ１５を除去
する。
(57) [Summary] [Object] To provide a color filter defect repair method capable of quickly and reliably repairing a color filter defect in a color liquid crystal display device and improving the reliability of repair work and the yield. A glass substrate 1 in which a color filter 15 has a defect and whose position data is detected is placed on an XY table, and an excimer laser oscillator and a color filter 15 having a defect are arranged. Align. Subsequently, the excimer laser beam I B having the energy density threshold value set to an appropriate value is emitted from the excimer laser oscillator,
The slit portion 12 of the pattern mask 11 and the reflection mirror 13
The color filter 15 having the defect is irradiated with the excimer laser beam spot corresponding to the size by the reduction optical system including the pattern reduction lens 14, and thereby the color filter 15 having the defect is removed.
Description
【０００１】[0001]
【産業上の利用分野】本発明は、一対の透明基板間に液
晶が封入され、かつ一方の透明基板の内面または外面に
Ｒ、Ｇ、Ｂの三原色のカラーフィルタが配列された液晶
パネルを具備するカラー液晶表示装置におけるカラーフ
ィルタの欠陥修正方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention comprises a liquid crystal panel in which liquid crystal is sealed between a pair of transparent substrates, and R, G, B primary color filters are arranged on the inner or outer surface of one transparent substrate. The present invention relates to a color filter defect correction method for a color liquid crystal display device.
【０００２】[0002]
【従来の技術】この種の液晶パネルの一例として、ＴＦ
Ｔ（薄膜トランジスタ）をスイッチング素子として備え
たアクティブマトリクス駆動方式のものがある。この液
晶パネルは、互いに貼り合わされる一対のガラス基板間
に表示媒体としての液晶を封入してなる。一方のガラス
基板の内面におけるゲートバスラインとソースバスライ
ンで囲まれた領域には、絵素電極がマトリクス状に配設
され、該絵素電極にこれを選択駆動するＴＦＴが接続さ
れる。すなわち、ＴＦＴのスイッチング動作により各絵
素電極の選択、非選択を行って表示動作を行うようにな
っている。2. Description of the Related Art As an example of this type of liquid crystal panel, TF
There is an active matrix drive system that includes T (thin film transistor) as a switching element. This liquid crystal panel has liquid crystal as a display medium sealed between a pair of glass substrates that are bonded to each other. In a region surrounded by the gate bus lines and the source bus lines on the inner surface of one glass substrate, pixel electrodes are arranged in a matrix, and TFTs for selectively driving the pixel electrodes are connected to the pixel electrodes. That is, the display operation is performed by selecting or deselecting each pixel electrode by the switching operation of the TFT.
【０００３】なお、他方のガラス基板の内面又は外面に
はＲ（赤）、Ｇ（緑）、Ｂ（青）の三原色のカラーフィ
ルタおよびブラックストライプが表示絵素に対応して形
成されている。A color filter of three primary colors of R (red), G (green) and B (blue) and a black stripe are formed on the inner surface or the outer surface of the other glass substrate in correspondence with the display picture element.
【０００４】この種のカラーフィルタの形成方法とし
て、最近ではフォトリソグラフィ染色方式が多用される
傾向にある。すなわち、この方式によれば、高精度のカ
ラーフィルタを能率よく生産できるからである。As a method of forming this kind of color filter, recently, a photolithography dyeing method is often used. That is, according to this method, a highly accurate color filter can be efficiently produced.
【０００５】以下図２に従いフォトリソグラフィ染色方
式によるカラーフィルタの形成方法を説明する。まず、
ガラス基板１の上面に、例えばスパッタリング法を用い
て所定膜厚のＣｒを積層し、続いて該Ｃｒ膜をフォトリ
ソグラフィ技術を用いてパターニングして遮光膜２を形
成する。次いで、該遮光膜２の上に、例えばゼラチンに
感光性を付与してなる感光性基材３を積層形成する。続
いて該感光性基材３を露光、現像してパターン化し、そ
の後、パターン化された感光性基材３を染色してＲ、
Ｇ、Ｂの三原色のカラーフィルタを形成する。すなわ
ち、露光〜染色迄の工程を３回繰り返してＲ、Ｇ、Ｂの
三原色のカラーフィルタを形成する。A method of forming a color filter by a photolithography dyeing method will be described below with reference to FIG. First,
A light-shielding film 2 is formed by stacking Cr with a predetermined film thickness on the upper surface of the glass substrate 1 by using, for example, a sputtering method, and then patterning the Cr film by using a photolithography technique. Then, on the light-shielding film 2, a photosensitive substrate 3 made of, for example, gelatin having photosensitivity is laminated. Subsequently, the photosensitive substrate 3 is exposed and developed to be patterned, and then the patterned photosensitive substrate 3 is dyed to form R,
A color filter of three primary colors of G and B is formed. That is, the steps from exposure to dyeing are repeated three times to form the color filters of the three primary colors of R, G and B.
【０００６】次いで、カラーフィルタの上に保護膜４を
コーティングし、これによりカラーフィルタが形成され
たガラス基板１を得る。Next, the protective film 4 is coated on the color filter, and the glass substrate 1 having the color filter formed thereon is obtained.
【０００７】ところで、上記のようにしてカラーフィル
タを形成する工程において、カラーフィルタに塵埃や不
純物が混入するおそれがあり、これらが混入すると、カ
ラーフィルタに部分的な欠損が生じ、液晶パネルの表示
品位が著しく損なわれることになる。それ故、歩留りの
向上を図るためには、欠損が発生しているカラーフィル
タを修正する必要がある。By the way, in the process of forming the color filter as described above, there is a possibility that dust or impurities may be mixed into the color filter, and if they are mixed, the color filter is partially damaged, and the liquid crystal panel display. The quality will be significantly impaired. Therefore, in order to improve the yield, it is necessary to correct the defective color filter.
【０００８】従来この種の修正は以下のようにして行わ
れていた。すなわち、保護膜４をコーティングする前
に、ガラス基板１を駆動して目視検査等により、Ｒ、
Ｇ、Ｂ画素間やＲ、Ｇ、Ｂ各画素内の色ムラやコントラ
ストムラを検査し、この検査工程で欠損部のあるガラス
基板１と正常なガラス基板１とを選別する。欠損部を発
生しているガラス基板１は修正工程に送られ、ここで以
下に示す修正作業が行われる。Conventionally, this type of correction has been performed as follows. That is, before coating the protective film 4, the glass substrate 1 is driven and the R,
Color unevenness and contrast unevenness between the G and B pixels and in each of the R, G, and B pixels are inspected, and the glass substrate 1 having a defective portion and the normal glass substrate 1 are selected in this inspection step. The glass substrate 1 in which the defective portion is generated is sent to the repairing step, where the repairing work described below is performed.
【０００９】まず、部分的な欠損が発生しているＲ、
Ｇ、Ｂのカラーフィルタの染色膜を作業者が先端が針状
になった工具で剥し取る。次いで、カラーフィルタを剥
した部分にインク塗布用針を用いてＲ、Ｇ、ＢのＵＶ樹
脂硬化インクを塗布する。次いで、ＵＶ光を照射してＵ
Ｖ樹脂硬化インクを定着し、これにより修正作業を終了
する。First, R, which has a partial defect,
The operator peels off the dyed films of the G and B color filters with a tool having a needle-shaped tip. Next, R, G, and B UV resin curing inks are applied to the portion where the color filter is peeled off using an ink application needle. Then, irradiate UV light to U
The V resin curing ink is fixed, and the repair work is completed.
【００１０】[0010]
【発明が解決しようとする課題】しかしながら、上記従
来の修正方法は、作業者の手作業により欠損を発生して
いるカラーフィルタを剥し取る工程を含むため、作業者
個々の熟練度の相違により均質な修正作業が行えないと
いう欠点がある。すなわち、Ｒ、Ｇ、Ｂのカラーフィル
タ膜個々のサイズは面積が約100μｍ×100μｍ、膜厚が
２μｍ〜２．５μｍの微細なものであるため、精度よく
作業を行うためには熟練を要し、経験の不足の作業者に
とっては困難な作業になるからである。However, since the above-mentioned conventional correction method includes a step of peeling off the color filter having a defect by the manual operation of the operator, it is uniform due to the difference in the skill level of each operator. However, there is a drawback in that it is impossible to perform corrective work. That is, since the size of each of the R, G, and B color filter films is a fine one having an area of about 100 μm × 100 μm and a film thickness of 2 μm to 2.5 μm, skill is required to perform the work accurately. , Because it is a difficult task for an inexperienced worker.
【００１１】以上の理由により従来方法では修正作業の
信頼性の向上を図る上で問題があり、歩留りの向上を図
る上で限界があった。For the above reasons, the conventional method has a problem in improving the reliability of the repair work, and has a limit in improving the yield.
【００１２】なお、修正用のＵＶ樹脂硬化インクの塗布
および定着は専用の機械装置により行われるため、この
工程に関しては精度よく行われていた。Since the application and fixing of the UV resin curing ink for correction is performed by a dedicated mechanical device, this step has been performed accurately.
【００１３】本発明はこのような従来技術の欠点を解消
するものであり、カラーフィルタの修正作業を迅速、確
実に行え、歩留りを格段に向上できるカラー液晶表示装
置におけるカラーフィルタの欠陥修正方法を提供するこ
とを目的とする。The present invention solves the above-mentioned drawbacks of the prior art, and provides a method of correcting a defect of a color filter in a color liquid crystal display device, which can perform a color filter correction work quickly and reliably and can significantly improve the yield. The purpose is to provide.
【００１４】[0014]
【課題を解決するための手段】本発明のカラー液晶表示
装置の欠陥修正方法は、一対の透明基板間に液晶が封入
され、かつ一方の透明基板の内面または外面にＲ、Ｇ、
Ｂ三原色のカラーフィルタが配列された液晶パネルを具
備するカラー液晶表示装置の欠陥修正方法において、欠
陥が発生している該カラーフィルタを検出する工程と、
該欠陥が発生している該カラーフィルタにエキシマレー
ザビームを照射して、該カラーフィルタを除去する工程
とを含んでなり、そのことにより上記目的が達成され
る。According to a defect repairing method for a color liquid crystal display device of the present invention, liquid crystal is sealed between a pair of transparent substrates, and R, G, and
B, a method of correcting a defect of a color liquid crystal display device including a liquid crystal panel in which color filters of three primary colors are arranged, detecting the defective color filter;
Irradiating the color filter having the defect with an excimer laser beam to remove the color filter, whereby the above object is achieved.
【００１５】[0015]
【作用】エキシマレーザビームのエネルギ密度の閾値を
適宜の値に設定し、このように設定されたエキシマレー
ザビームを欠陥を発生しているカラーフィルタに照射す
ると、透明基板にダメージを与えることなく、また該透
明基板を傷つけることなく、欠陥の発生しているカラー
フィルタを確実に除去することができる。従って、以後
上記したＲ、Ｇ、ＢのＵＶ樹脂硬化インクを塗布し、続
いてＵＶ光を照射してＵＶ樹脂硬化インクを定着する工
程を行えば、これにより欠陥部を発生していたＲ、Ｇ、
Ｂのカラーフィルタを精度よく修正できる。When the threshold value of the energy density of the excimer laser beam is set to an appropriate value and the excimer laser beam set in this way is applied to the color filter having the defect, the transparent substrate is not damaged. Further, it is possible to reliably remove the color filter having the defect without damaging the transparent substrate. Therefore, if the steps of applying the R, G, and B UV resin-cured inks described above and subsequently irradiating UV light to fix the UV resin-cured inks are performed, R, which causes a defective portion, is generated. G,
The color filter of B can be corrected accurately.
【００１６】[0016]
【実施例】以下に本発明の一実施例を説明する。EXAMPLE An example of the present invention will be described below.
【００１７】図１は本発明のカラーフィルタの欠陥修正
方法を模式的に示しており、図示しないＸ−Ｙテーブル
上には、上面にＲ、Ｇ、Ｂの三原色カラーフィルタ１５
が形成されたガラス基板１が載置されている。カラーフ
ィルタ１５は、上記のように感光性基材としてのゼラチ
ンをパターン化した後に染色して形成される。該ガラス
基板１はＸ−Ｙテーブルに載置される前に、前工程でカ
ラーフィルタ１５に部分的な欠陥が発生しているか否か
の検査が行われ、欠陥を発生しているガラス基板１のみ
がＸ−Ｙテーブルに載置されるようになっている。この
検査は上記従来技術の項で述べた方法によって行われ
る。FIG. 1 schematically shows a color filter defect correcting method of the present invention. On an XY table (not shown), R, G, B three primary color filters 15 are arranged on the upper surface.
A glass substrate 1 on which is formed is placed. The color filter 15 is formed by patterning gelatin as a photosensitive substrate and then dyeing it as described above. Before the glass substrate 1 is placed on the XY table, it is inspected in the previous step whether or not a partial defect has occurred in the color filter 15, and the glass substrate 1 in which the defect has occurred. Only one is intended to be placed on the XY table. This inspection is performed by the method described in the above-mentioned section of the prior art.
【００１８】従って、Ｘ−Ｙテーブル上のガラス基板１
はいずれの位置のカラーフィルタ１５に欠陥が発生して
いるか、すなわち欠陥に関する位置データが予め得られ
ており、該データに応じてＸ−Ｙテーブル上のガラス基
板１と、該ガラス基板１にエキシマレーザビームを照射
するエキシマレーザ発振器（図示せず）との位置合わせ
が行われるようになっている。今少し説明すると、該デ
ータに応じてＸ−ＹテーブルをＸ、Ｙ方向にそれぞれ所
定量移動させて両者の位置合わせを行い、これによりガ
ラス基板１上の欠陥を発生しているカラーフィルタ１５
にエキシマレーザービームが数秒間照射されるようにな
っている。Therefore, the glass substrate 1 on the XY table
Indicates at which position the color filter 15 has a defect, that is, position data relating to the defect is obtained in advance, and the glass substrate 1 on the XY table and the excimer on the glass substrate 1 are obtained according to the data. Positioning with an excimer laser oscillator (not shown) that emits a laser beam is performed. Explaining a little now, according to the data, the XY table is moved in the X and Y directions respectively by a predetermined amount to align the two, and thereby the color filter 15 that has a defect on the glass substrate 1 is generated.
The excimer laser beam is emitted for several seconds.
【００１９】エキシマレーザビームの照射は以下の構成
により行われる。すなわち、エキシマレーザ発振器から
出射される断面長方形状をなすエキシマレーザビームＩ
Bの出射域には、カラーフィルタ１５を拡大した形状の
スリット部１２が開口されたパターンマスク１１が配設
され、該スリット部１２を通してエキシマレーザビーム
ＩBが前方に出射されるようになっている。従って、ス
リット部１２を通過した後のエキシマレーザビームＩB
の断面形状は、図中破線で示すようにカラーフィルタ１
５の形状を拡大した形になっている。Irradiation of the excimer laser beam is performed with the following configuration. That is, the excimer laser beam I having a rectangular cross section emitted from the excimer laser oscillator.
In the emission area of B , a pattern mask 11 in which a slit portion 12 having an enlarged shape of the color filter 15 is opened is provided, and the excimer laser beam I B is emitted forward through the slit portion 12. There is. Therefore, the excimer laser beam I B after passing through the slit portion 12
The cross-sectional shape of the color filter 1 is as shown by the broken line in the figure.
The shape of 5 is enlarged.
【００２０】パターンマスク１１の前方には、スリット
部１２を通過した後のエキシマレーザビームＩBの光路
を下方に９０°変換する反射ミラー１３が配置され、該
反射ミラー１３により光路を変換されたエキシマレーザ
ビームＩBはパターン縮小レンズ１４を通してガラス基
板１上のカラーフィルタ１５に照射される。パターン縮
小レンズ１４を通してカラーフィルタ１５上に照射され
るエキシマレーザビームＩBのビームスポットは該カラ
ーフィルタ１５の形状に対応した形になっている。すな
わち、以上の光学系は縮小光学系を構成し、ガラス基板
１上の欠陥を発生しているカラーフィルタ１５にエキシ
マレーザビームＩBが精度よく照射されるようになって
いる。In front of the pattern mask 11, a reflecting mirror 13 for diverting the optical path of the excimer laser beam I B after passing through the slit 12 downward by 90 ° is arranged, and the optical path is converted by the reflecting mirror 13. The excimer laser beam I B is applied to the color filter 15 on the glass substrate 1 through the pattern reduction lens 14. The beam spot of the excimer laser beam I B irradiated onto the color filter 15 through the pattern reduction lens 14 has a shape corresponding to the shape of the color filter 15. That is, the above optical system constitutes a reduction optical system, and the excimer laser beam I B is accurately applied to the color filter 15 which has a defect on the glass substrate 1.
【００２１】エキシマレーザビームスポットが数１０ｍ
ｓ〜１秒程度照射されると、ゼラチンを感光性基材とす
るカラーフィルタ１５が除去される。すなわち、本発明
方法は欠陥を発生しているカラーフィルタ１５にエキシ
マレーザビームスポットを照射して該カラーフィルタ１
５を除去する加工方法をとる。Excimer laser beam spot is several tens of meters
When irradiated for about s to 1 second, the color filter 15 having gelatin as a photosensitive base material is removed. That is, according to the method of the present invention, the color filter 15 having a defect is irradiated with an excimer laser beam spot, and
A processing method for removing 5 is adopted.
【００２２】ここで、エキシマレーザビーム加工の特質
について説明すると、ガスレーザであるエキシマレーザ
ビームＩBの発振波長は、封入ガスとしてＡｒＦを用い
た場合は193ｎｍであり、ＫｒＦを用いた場合は248ｎｍ
になる。このようにエキシマレーザビームＩBは発振波
長が非常に短波長である。Explaining the characteristics of the excimer laser beam processing, the oscillation wavelength of the excimer laser beam I B , which is a gas laser, is 193 nm when ArF is used as the filling gas, and 248 nm when KrF is used.
become. As described above, the oscillation wavelength of the excimer laser beam I B is extremely short.
【００２３】ところで、レーザ加工の加工精度はレーザ
ビームの波長が短くなる程高精度になる。従って、エキ
シマレーザ加工によれば、高精度の加工が可能になり、
カラーフィルタ１５を精度よく除去できる。By the way, the processing accuracy of the laser processing becomes higher as the wavelength of the laser beam becomes shorter. Therefore, excimer laser processing enables high-precision processing,
The color filter 15 can be removed accurately.
【００２４】加えて、エキシマレーザビームＩBは紫外
線領域のレーザビームであるので、ＣＯ2レーザ等の赤
外線領域のレーザ加工に比べて以下に示す利点を有す
る。すなわち、後者のレーザ加工は熱エネルギを利用し
たレーザ加工であるため、照射部周辺に熱的ダメージを
与える。このため、ガラス基板１に「ダレ」が発生し、
形状精度が損なわれるおそれがある。In addition, since the excimer laser beam I B is a laser beam in the ultraviolet region, it has the following advantages over laser processing in the infrared region such as CO 2 laser. That is, since the latter laser processing is laser processing using heat energy, thermal damage is given to the periphery of the irradiation portion. As a result, "sag" occurs on the glass substrate 1,
Shape accuracy may be impaired.
【００２５】これに対してエキシマレーザ加工は、光エ
ネルギ加工であり、照射部周辺に熱的ダメージを与えな
いアブレーション加工であるため、ガラス基板１に「ダ
レ」は発生しない。従って、エキシマレーザ加工によれ
ば、外形形状を精度よく仕上げることができる。On the other hand, the excimer laser processing is an optical energy processing and is an ablation processing that does not cause thermal damage to the periphery of the irradiation portion, so that "sagging" does not occur in the glass substrate 1. Therefore, according to the excimer laser processing, the outer shape can be accurately finished.
【００２６】なお、加工に際してエキシマレーザビーム
ＩBのエネルギ密度の閾値は加工対象のワークの材質に
応じて適宜の値に設定される。すなわち、本実施例では
ワークが、ガラス基板１の上面にゼラチンを感光性基材
とするカラーフィルタ１５を形成したものであり、ゼラ
チンの場合のエネルギ密度閾値は数百ｍＪ／ｃｍ2であ
るのに対し、ガラス基板１のそれは５Ｊ／ｃｍ2であ
り、ゼラチンに比べて１桁高いエネルギ密度になってい
る。In processing, the threshold value of the energy density of the excimer laser beam I B is set to an appropriate value according to the material of the work to be processed. That is, in this embodiment, the work is the glass substrate 1 on which the color filter 15 having gelatin as a photosensitive base material is formed, and the energy density threshold in the case of gelatin is several hundred mJ / cm 2 . On the other hand, the glass substrate 1 has an energy density of 5 J / cm 2, which is one digit higher than that of gelatin.
【００２７】従って、エキシマレーザ発振器の発振エネ
ルギのエネルギ密度の閾値を数百ｍＪ／ｃｍ2に設定す
ると、ゼラチンからなるカラーフィルタ１５のみが除去
され、ガラス基板１に傷等が発生することがない。それ
故、カラーフィルタ１５が除去された部分にＲ、Ｇ、Ｂ
のＵＶ樹脂硬化インクを塗布し、続いてＵＶ光を照射し
てＵＶ樹脂硬化インクを定着してカラーフィルタ１５の
修復を行う工程を容易、且つ精度よく行える。Therefore, when the threshold value of the energy density of the oscillation energy of the excimer laser oscillator is set to several hundred mJ / cm 2 , only the color filter 15 made of gelatin is removed, and the glass substrate 1 is not scratched or the like. . Therefore, R, G, B are added to the part where the color filter 15 is removed.
The step of applying the UV resin-cured ink and subsequently irradiating UV light to fix the UV resin-cured ink to restore the color filter 15 can be performed easily and accurately.
【００２８】[0028]
【発明の効果】以上の本発明カラーフィルタの欠陥修正
方法は、欠陥を発生しているカラーフィルタの除去を、
該カラーフィルタにエキシマレーザビームを照射して行
うので、カラーフィルタ周辺の透明基板にダメージを与
えることがない。従って、形状精度を損なうことなく欠
陥が発生しているカラーフィルタの除去を確実に行うこ
とができる。The above-described color filter defect correcting method of the present invention removes a color filter having a defect,
Since the color filter is irradiated with an excimer laser beam, the transparent substrate around the color filter is not damaged. Therefore, it is possible to surely remove the color filter having the defect without impairing the shape accuracy.
【００２９】また、エキシマレーザビームのエネルギ密
度の閾値を適宜の値に設定することにより、透明基板に
傷等を発生することなく欠陥を発生しているカラーフィ
ルタを確実に除去できる。By setting the threshold value of the energy density of the excimer laser beam to an appropriate value, it is possible to surely remove the defective color filter without causing scratches or the like on the transparent substrate.
【００３０】更には、数１０ｍｓ〜１秒程度の照射で欠
陥が発生しているカラーフィルタを確実に除去できる。
従って、全体としてカラーフィルタの修正作業を能率よ
く行える。Furthermore, the color filter having a defect can be reliably removed by irradiation for several tens of ms to 1 second.
Therefore, the color filter correction work can be efficiently performed as a whole.
【００３１】また、人手を要せず、均質な修正作業が行
える利点もある。There is also an advantage that a uniform correction work can be performed without requiring manpower.
【００３２】以上の理由により、本発明方法によれば、
修正作業の信頼性を向上でき、歩留りの向上を格段に図
れる利点がある。For the above reasons, according to the method of the present invention,
There is an advantage that the reliability of the repair work can be improved and the yield can be remarkably improved.
【図１】本発明カラーフィルタの欠陥修正方法を模式的
に示す斜視図。FIG. 1 is a perspective view schematically showing a color filter defect correcting method of the present invention.
【図２】フォトリソグラフィ染色方式によって形成され
たカラーフィルタが配列された基板を示す断面図。FIG. 2 is a cross-sectional view showing a substrate on which color filters formed by a photolithography dyeing method are arranged.
１ ガラス基板 ２ 遮光膜 ３ 感光性基材 １１ パターンマスク １２ スリット部 １３ 反射ミラー １４ パターン縮小レンズ １５ カラーフィルタ ＩB エキシマレーザビーム1 glass substrate 2 light-shielding film 3 photosensitive substrate 11 patterned mask 12 slit portion 13 reflecting mirror 14 patterns the reduction lens 15 color filters I B excimer laser beam
Claims (1)
一方の透明基板の内面または外面にＲ、Ｇ、Ｂの三原色
のカラーフィルタが配列された液晶パネルを具備するカ
ラー液晶表示装置におけるカラーフィルタの欠陥修正方
法において、 欠陥が発生している該カラーフィルタを検出する工程
と、 該欠陥が発生している該カラーフィルタにエキシマレー
ザビームを照射して、該カラーフィルタを除去する工程
とを含むカラー液晶表示装置におけるカラーフィルタの
欠陥修正方法。Claim: What is claimed is: 1. A liquid crystal panel in which liquid crystal is sealed between a pair of transparent substrates, and color filters of three primary colors of R, G, B are arranged on an inner surface or an outer surface of one transparent substrate. In the method of correcting a defect of a color filter in a color liquid crystal display device, the step of detecting the defective color filter, and irradiating the defective color filter with an excimer laser beam, A method of correcting a defect of a color filter in a color liquid crystal display device, the method including a step of removing the filter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17846891A JPH0527111A (en) | 1991-07-18 | 1991-07-18 | Method for correcting defect of color filter in color liquid crystal display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17846891A JPH0527111A (en) | 1991-07-18 | 1991-07-18 | Method for correcting defect of color filter in color liquid crystal display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0527111A true JPH0527111A (en) | 1993-02-05 |
Family
ID=16049039
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17846891A Withdrawn JPH0527111A (en) | 1991-07-18 | 1991-07-18 | Method for correcting defect of color filter in color liquid crystal display device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0527111A (en) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0675384A1 (en) * | 1994-03-31 | 1995-10-04 | Canon Kabushiki Kaisha | Color filter repair method and apparatus |
| WO1999013363A1 (en) * | 1997-09-08 | 1999-03-18 | Photon Dynamics, Inc. | Color filter repair method and apparatus |
| US6054235A (en) * | 1997-09-08 | 2000-04-25 | Photon Dynamics, Inc. | Color filter repair method |
| KR100420142B1 (en) * | 1996-10-28 | 2004-09-04 | 삼성에스디아이 주식회사 | Method and device for forming black matrix layer in complex pattern for color filter |
| US6812992B2 (en) * | 2001-01-26 | 2004-11-02 | Rockwell Collins | Photo ablation to resolve “bright on” pixel defects in a normally white LCD |
| KR100510419B1 (en) * | 2001-09-27 | 2005-08-26 | 레이저프론트 테크놀로지스 가부시키가이샤 | Raster defect correction method for liquid crystal display device and raster defect correction device for the same |
| JP2007279513A (en) * | 2006-04-10 | 2007-10-25 | V Technology Co Ltd | Defect correction method |
| US8035058B2 (en) | 2004-09-27 | 2011-10-11 | Hitachi Displays, Ltd. | Apparatus for repairing circuit pattern and method for manufacturing display apparatus using the same |
| CN102626829A (en) * | 2011-08-16 | 2012-08-08 | 北京京东方光电科技有限公司 | Laser repairing device and laser repairing method for substrate |
| US8273423B2 (en) | 2004-09-29 | 2012-09-25 | Sharp Kabushiki Kaisha | Color filter substrate, liquid crystal display device, production method of color filter substrate, production method of liquid crystal display device |
| KR101227137B1 (en) * | 2006-03-27 | 2013-01-28 | 엘지디스플레이 주식회사 | Repairing apparatus for liquid crystal display and repairing method using the same |
| WO2015089875A1 (en) * | 2013-12-20 | 2015-06-25 | 深圳市华星光电技术有限公司 | Liquid crystal panel and image sticking detection method thereof |
-
1991
- 1991-07-18 JP JP17846891A patent/JPH0527111A/en not_active Withdrawn
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5714195A (en) * | 1994-03-31 | 1998-02-03 | Canon Kabushiki Kaisha | Color filter repair method and apparatus, color filter, liquid crystal display device, and apparatus having liquid crystal display device |
| EP0675384A1 (en) * | 1994-03-31 | 1995-10-04 | Canon Kabushiki Kaisha | Color filter repair method and apparatus |
| KR100420142B1 (en) * | 1996-10-28 | 2004-09-04 | 삼성에스디아이 주식회사 | Method and device for forming black matrix layer in complex pattern for color filter |
| WO1999013363A1 (en) * | 1997-09-08 | 1999-03-18 | Photon Dynamics, Inc. | Color filter repair method and apparatus |
| WO1999013364A1 (en) * | 1997-09-08 | 1999-03-18 | Photon Dynamics, Inc. | Color filter repair method and apparatus using multiple/mixed sources |
| US6054235A (en) * | 1997-09-08 | 2000-04-25 | Photon Dynamics, Inc. | Color filter repair method |
| US6812992B2 (en) * | 2001-01-26 | 2004-11-02 | Rockwell Collins | Photo ablation to resolve “bright on” pixel defects in a normally white LCD |
| KR100510419B1 (en) * | 2001-09-27 | 2005-08-26 | 레이저프론트 테크놀로지스 가부시키가이샤 | Raster defect correction method for liquid crystal display device and raster defect correction device for the same |
| US8035058B2 (en) | 2004-09-27 | 2011-10-11 | Hitachi Displays, Ltd. | Apparatus for repairing circuit pattern and method for manufacturing display apparatus using the same |
| US8273423B2 (en) | 2004-09-29 | 2012-09-25 | Sharp Kabushiki Kaisha | Color filter substrate, liquid crystal display device, production method of color filter substrate, production method of liquid crystal display device |
| KR101227137B1 (en) * | 2006-03-27 | 2013-01-28 | 엘지디스플레이 주식회사 | Repairing apparatus for liquid crystal display and repairing method using the same |
| JP2007279513A (en) * | 2006-04-10 | 2007-10-25 | V Technology Co Ltd | Defect correction method |
| CN102626829A (en) * | 2011-08-16 | 2012-08-08 | 北京京东方光电科技有限公司 | Laser repairing device and laser repairing method for substrate |
| US9291839B2 (en) | 2011-08-16 | 2016-03-22 | Beijing Boe Optoelectronics Technology Co., Ltd. | Laser repairing apparatus and laser repairing method for substrate |
| WO2015089875A1 (en) * | 2013-12-20 | 2015-06-25 | 深圳市华星光电技术有限公司 | Liquid crystal panel and image sticking detection method thereof |
| US9888236B2 (en) | 2013-12-20 | 2018-02-06 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Liquid crystal panel and the detection method on image sticking of the liquid crystal panel |
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