JPH052738B2 - - Google Patents

Info

Publication number
JPH052738B2
JPH052738B2 JP62117562A JP11756287A JPH052738B2 JP H052738 B2 JPH052738 B2 JP H052738B2 JP 62117562 A JP62117562 A JP 62117562A JP 11756287 A JP11756287 A JP 11756287A JP H052738 B2 JPH052738 B2 JP H052738B2
Authority
JP
Japan
Prior art keywords
pallet
processing
chamber
sputtering
processing chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62117562A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63282260A (ja
Inventor
Toshimi Minami
Kinya Kisoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chugai Ro Co Ltd
Original Assignee
Chugai Ro Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chugai Ro Co Ltd filed Critical Chugai Ro Co Ltd
Priority to JP11756287A priority Critical patent/JPS63282260A/ja
Publication of JPS63282260A publication Critical patent/JPS63282260A/ja
Publication of JPH052738B2 publication Critical patent/JPH052738B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP11756287A 1987-05-13 1987-05-13 スパッタリング装置 Granted JPS63282260A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11756287A JPS63282260A (ja) 1987-05-13 1987-05-13 スパッタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11756287A JPS63282260A (ja) 1987-05-13 1987-05-13 スパッタリング装置

Publications (2)

Publication Number Publication Date
JPS63282260A JPS63282260A (ja) 1988-11-18
JPH052738B2 true JPH052738B2 (fr) 1993-01-13

Family

ID=14714886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11756287A Granted JPS63282260A (ja) 1987-05-13 1987-05-13 スパッタリング装置

Country Status (1)

Country Link
JP (1) JPS63282260A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3912297C2 (de) * 1989-04-14 1996-07-18 Leybold Ag Katodenzerstäubungsanlage
WO2016017510A1 (fr) * 2014-07-31 2016-02-04 株式会社 アルバック Dispositif de traitement de substrat

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5838757B2 (ja) * 1979-09-29 1983-08-25 株式会社東芝 原子炉遠隔停止制御装置
JPS58110671A (ja) * 1981-12-24 1983-07-01 Tanaka Kikinzoku Kogyo Kk 混合薄膜スパツタリング方法及びその装置
JPS5938307A (ja) * 1982-08-25 1984-03-02 Nippon Kokan Kk <Nkk> 高炉用塊鉄鉱石の配合方法
JPS5934947U (ja) * 1982-08-31 1984-03-05 三菱重工業株式会社 試験片研摩具
JPS60506U (ja) * 1983-06-15 1985-01-05 富士通株式会社 線材測長装置
JPH06102829B2 (ja) * 1984-03-28 1994-12-14 日電アネルバ株式会社 放電反応処理装置
JPS60230976A (ja) * 1984-05-02 1985-11-16 Hitachi Ltd 位置検出装置
JPS61102807U (fr) * 1984-12-10 1986-06-30

Also Published As

Publication number Publication date
JPS63282260A (ja) 1988-11-18

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