JPH0531423A - Tension expansion film forming method, liquid crystal display panel, and tension expansion film forming apparatus - Google Patents

Abstract

(57) [Abstract] [Purpose] To eliminate the instability factor that affects the film thickness of the coating layer, and to realize a film forming method capable of forming a thin film having a uniform thickness. [Structure] In a state in which a surface to be coated 21a of a glass substrate 21 is positioned on a roller surface of a guide roller 42, a coating portion 51 is formed.
Transport to. Here, when the front end side of the coated surface 21a is located above the liquid supply roller 52, the glass substrate 21 is stopped and the surface tension of the coating liquid forms a preliminary coating layer on the entire front end side. After that, the glass substrate 21 is conveyed while preliminarily applied with a predetermined separation distance maintained between the coated surface 21a and the liquid supply roller 52, with the liquid reservoir layer of the colored resist being formed therebetween. A colored resist is spread from the coating layer to form a coating layer.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for forming a thin coating layer represented by a colored resist layer of a color filter of a liquid crystal display panel or the like.

[0002]

2. Description of the Related Art A uniform thin coating layer is formed in a manufacturing process of a color filter of a liquid crystal display, a forming process of a photoresist layer of a semiconductor device, etc. A typical film forming method used therefor. One of them is the spin coating method. In this spin coating method, a coating liquid is dropped on the inside of a rotating member to be coated, the centrifugal force spreads the coating liquid over the entire surface, and the excess coating liquid is removed to obtain a uniform coating. It forms a coating layer. However, in this method, the centrifugal force received by the coating liquid is used, so it is suitable for a disk-shaped member to be coated, but with a rectangular member to be coated, it is not possible to control the film thickness at the corners. Therefore, there is a problem that the entire member to be coated cannot be used.
Moreover, it is not suitable for performing inline. Therefore,
It is conceivable to apply a transfer film forming method which is frequently used for a sheet-shaped member to be coated. A typical example of this transfer film forming method is a roll coater method. When this is applied to the manufacturing process of a color filter, as shown in FIG. 37, the resist 202 stored in the resist storage tank 201 is fanned. After scraping with the ten roller 203, the transmission roller 2
It is transmitted to the coating roller 205 via 04. Then, the glass substrate 206 is conveyed in a state where the surface to be coated is in pressure contact with the roller surface of the coating roller 205 with a predetermined pressure, and the resist is transferred by the pressure,
The glass substrate 206 is coated with a resist film 202a. Therefore, a film can be formed on the entire surface of the rectangular glass substrate 206, and a continuous type is also possible.

[0003]

However, in the roll coater method, the thickness of the resist film 202a depends on the pressure on the glass substrate 206, the transport speed of the glass substrate 206, the rotation speed of the coating roller 205, and the film thickness. There are a lot of factors that affect the factor, and it is difficult to control those factors. That is, the glass substrate 206 has the roller surface 20 of the coating roller 205.
5a is applied with pressure, the resist adheres to the glass substrate 206 with this pressure, and then the roll surface 205a
The glass substrate 206 is sheared by the separating operation.
The shearing position is reflected in the film thickness, and this position depends on the balance between the adhesive force of the resist on the roll surface 205a side, the surface tension of the resist itself, and the adhesive force of the resist on the glass substrate 206 side. Of these influencing factors, the adhesive force of the resist to the roll surface 205a side is locally and temporally changed depending on the pressure applied to the glass substrate 206 and the surface condition of the roll surface 205a. It has an easy property. Therefore, the film thickness is apt to change, and it is not possible to sufficiently cope with the manufacturing of color filters, semiconductor devices, and the like.

Therefore, among the above factors, the inventor of the present application is considering the factors such as the pressure applied to the glass substrate, the surface condition of the coating roller (coating liquid supply means), etc., which are likely to change locally and with time. We propose a film formation method that is not affected.

Here, the first method tried is a pull-up film forming method in which the glass substrate is pulled up at a constant speed from the state where the glass substrate is immersed in the resist. According to this method
The thickness of the resist film can be regulated only by the shearing force defined by the pulling rate of the glass substrate, the adhesive force of the resist on the glass substrate, and the surface tension of the resist itself, and stable film formation can be realized. However, in this method, like the spin coating method, in-line formation is difficult, and further,
It has a fatal drawback that coating on only one side is impossible.

The next method tried is to reproduce the above-mentioned pulling film forming method as it is in a horizontal posture. That is, FIG.
As shown in FIG. 8, a wide nozzle body 253 for quantitatively supplying the resist toward the surface of the glass substrate 251 is arranged, and the nozzle body 253 is moved above the glass substrate 251. Here, the nozzle body 253 is always kept at a constant distance from the glass substrate 251, and a resist liquid pool layer 252a is formed between them. Therefore, the supply amount of the resist and the glass substrate 2
When the nozzle body 253 is moved at a speed that does not shear the resist while balancing the amount of resist applied to 51, the resist film 252b having a constant thickness is formed on the glass substrate 251 due to the surface tension of the resist. Can be realized, and a film formation method completely different from the conventional method, that is, a tension development film formation method that spreads the coating liquid by using surface tension can be realized. It is possible to realize a stable film formation method with a small number of defects. However,
In this method, the amount of supplied resist and the glass substrate 251
Although it is possible under the condition that the amount of resist applied to the nozzle is balanced, for example, if the amount of supplied resist is excessive, a part of the excessive resist will cause some surface tension of the nozzle body 253. Although the resist is drawn in the scanning direction to reduce the variation in thickness, most of the resist is formed on the supplied glass substrate 251 by its own weight, so that the variation in film thickness occurs and it is not put to practical use. I didn't.

An object of the present invention is to realize the above-mentioned proposal, that is, to eliminate the influence of an unstable factor among the factors affecting the film thickness of the coating layer to obtain a uniform thickness. Another object of the present invention is to propose a tension expansion film forming method capable of forming a thin film, a liquid crystal display panel and a tension expansion film forming apparatus using the same.

[0008]

In order to solve the above-mentioned problems, the means taken in the film forming method according to the present invention will be described with reference to FIG.
This will be described with reference to. In FIG. 2A, the coating liquid 3 is provided at a position below the transport path of the coating target member 2 that is transported with the coating surface 2a facing downward, in the width direction of the transport path.
The coating liquid supply means 4 for quantitatively supplying
As the preliminary coating layer forming step, for example, as shown in FIG. 2B, the coating liquid supply means 4 is applied to the tip side 2b of the coated surface 2a.
Of the coating liquid 3, the coating liquid 3 is brought into contact therewith, the member 2 to be coated is temporarily stopped at that position, and the coating liquid 3 is brought into contact with the entire tip side by the surface tension of the coating liquid. To form a preliminary coating layer. Next, from this state, as a coating liquid developing step, as shown in FIG. 2C, a predetermined separation distance d ₁ between the coating liquid supply means 4 and the coated surface 2a.
And the liquid pool layer 3a is formed between them, the member to be coated 2 is conveyed to spread the coating layer 5b from the preliminary coating layer 5a, and as shown in FIG. 2 (d). Coating layer 5
b is formed. That is, the surface tension of the coating liquid 3 is used from the pre-coating layer 5a that has been previously coated, rather than applying the pressure to the coating liquid supply means 4 side with respect to the member 2 to be coated. Then, the coating layer 5b is continuously guided to form a film by a tension developing operation.

As a tension expansion film forming apparatus for realizing such a film forming method, for example, those shown in FIGS. 1 and 2 can be used. First, the conveying means 6 that conveys the member to be coated 2 with the surface to be coated 2a facing downward, and the conveying member 1 that is disposed below the conveying path 1b of the object to be coated 2 and are oriented in the width direction of the conveying path 1b. Coating liquid supply means 4 for quantitatively supplying the coating liquid 3
And a separation distance adjusting and holding means for adjusting and holding the separation distance d ₁ between the coating liquid supply means 4 and the surface 2a to be coated so that the liquid pool layer 3a can be formed. Further, when the tip side 2b of the coated surface 2a is located above the coating liquid supply means 4, the coating liquid 3 is brought into contact with the entire area of the tip side 2b to form the preliminary coating layer 5a. As the coating layer forming means, for example, a predetermined separation distance d ₁ is maintained between the tip side 2b of the surface to be coated 2a and the coating liquid supply means 4, and a liquid pool layer of the coating liquid is provided there. Formed and in that state,
The transfer means 6 is temporarily stopped so that the coating member 2 is temporarily stopped and the liquid pool layer is expanded by the surface tension between the tip side 2b of the coating surface 2a and the coating liquid supply means 4. Make an action. As a result, after the preliminary coating layer 5a is formed, the transporting means 6 transports the member to be coated 2 while the liquid pool layer 3a is formed, and develops the coating layer 5b from the preliminary coating layer 5a. To do.

In the present invention, as the coating liquid supply means, a coating liquid supply roller for rotating the roller surface while passing through the coating liquid to scrape up the coating liquid, and the coating liquid supply roller A supply liquid that is arranged close to the scraping side and that removes the amount of the coating liquid corresponding to the distance between them from the roller surface of the coating liquid supply roller and regulates the amount of the coating liquid that is supplied upward. It is possible to employ one having a quantity defining means. Further, as the supply liquid amount regulating means, for example, a doctor roller which is disposed in proximity to the coating liquid scraping side of the coating liquid supply roller, which rotates in the same direction as the rotation direction thereof, and a doctor roller which is disposed in proximity to this doctor roller are provided. , A doctor squeegee for scraping off the coating liquid from the roller surface can be used. In this case, in addition to the separation distance, the coating liquid supply amount can be adjusted not only by the rotation speed of the doctor roller. Here, the number of the doctor rollers and the doctor squeegee arranged is not limited, and includes a combination of a plurality of rollers including a doctor roller and a transmission roller and a doctor squeegee.

Here, unlike the coating roller used in the transfer film forming method, the coating liquid supply roller has a V surface on its roller surface.
It is not necessary to provide a groove or the like and may be a smooth surface. On the contrary, a smooth surface is suitable for forming a thin coating layer, and the leveling step may be omitted in some cases.

In the present invention, when the member to be coated is conveyed on the other side such as the back side of the member to be coated 2 or the conveying means instead of the side to be coated 2a, the member to be coated is referred to. The shape variation such as the thickness of 2 is directly reflected in the film characteristics. Therefore, as the separation distance adjustment holding means, for example,
A rail body which is arranged on both sides of the transport path of the coating member 2 so as to be able to support both ends of the coating member, and which adjusts the height position of its guide surface to form a transport reference surface of the transport path at a predetermined position. ,
Adopting a conveyance reference plane setting member such as a roller, the conveyance means
It is preferable to provide a position defining means for directly defining the coated surface itself on the transport reference surface.

Here, as the guide surface of the conveyance reference surface setting member, for example, the roller surface of the guide roller group mounted on the guide roller support via the eccentric shaft is used, and the mounting posture of the eccentric shaft is used. It is possible to use a device that adjusts the height position of the roller surface. If such an eccentric shaft is used, it is easy to adjust the positions of the individual guide rollers, but further, the guide roller support base to which they are attached is adjusted so that the heights of a plurality of guide rollers can be adjusted collectively. An upper guide roller support base having an inclined surface on the lower surface, a lower guide roller support base having an inclined surface corresponding to the inclined surface of the upper guide roller support base, and an upper guide roller support base using these inclined surfaces. It is preferable to have a support base adjusting and fixing means for sliding and fixing at a predetermined position.

It should be noted that the conveyance reference plane setting member is arranged up to both sides of the coating liquid supply means, for example, guide rollers are provided at both shaft ends of the coating liquid supply roller as the coating liquid supply means. It is effective to prevent the posture of the adhered member passing above the position from changing.

Further, in the apparatus of the present invention, the carrying means includes a holding member for holding the member to be coated, a vertical moving means for moving the holding member in the vertical direction, and a vertical moving means for moving the vertical moving means in the horizontal direction. And a horizontal movement means for moving the holding member so that when the vertical movement means defines the position of the coated surface on the transport reference surface, the entire coated surface follows the transport reference surface. Is preferably connected to the vertical moving means via a universal joint.

Further, since the holding member holds the entire back surface of the member to be coated, reliable conveyance and position regulation can be performed, and the contact of the holding member causes temperature variations depending on the position of the coated surface of the member to be coated. To prevent
It is effective that the holding member is provided with a porous vacuum chuck surface on its lower surface side that adsorbs and supports the entire back surface of the adherend member.

In order to reuse the used coating liquid, the coating liquid supply means stores the first coating portion storing the supplied coating liquid and the collected coating liquid. Second
And a return path for returning the coating liquid from the second storage section to the first storage section via a pump, and is inserted between the pump and the first storage section in the return path, It is preferable to provide a coating liquid regenerating means for removing impurities from the coating liquid. A cooling means is also provided here, and the operating temperature of the coating liquid is set to be equal to the storage temperature so that it can be used immediately after being taken out, and the solvent component will not volatilize. Is preferred.

Furthermore, since an excessive amount of the coating liquid tends to adhere to the rear end side of the surface to be coated on which the coating layer is formed,
After the step of spreading the coating liquid, a liquid draining member should be brought into contact with the rear end side of the surface to be coated and, if necessary, the front end side, and a liquid draining step of removing excess coating liquid from there Is preferred.
In this case, the tension expansion film forming apparatus is configured to contact the rear end side or the front end side of the coating surface on which the coating layer is formed so that the rear end side or the front end side can be selectively contacted. Then, a liquid draining member for removing excess coating liquid from the liquid draining member, and a liquid draining member movement for moving the liquid draining member to a position where the liquid draining member can contact the coating surface and a position retracted from this position. It is also preferable to provide a liquid draining mechanism including a means. In this case, the liquid draining member moving means operates in synchronization with the conveying operation of the coated member.

In the above construction, the coated member side may be fixed and the coating liquid supply means side may be moved.

[0020]

In the tension-developing film forming method and film forming apparatus of the present invention having the above construction, first, in the preliminary coating layer forming step, the tip side of the coated surface 2a is located above the coating liquid supply means 4. When it is transported to, the coating liquid supply means 4 and the surface to be coated 2a are separated by a predetermined distance.
When the member to be coated 2 is temporarily stopped with the liquid pool layer 3a formed between them, the coating liquid spreads between the coating liquid supply means 4 and the surface to be coated 2a due to its surface tension. (Capillary phenomenon), the coating liquid spreads also to the portion where the liquid pool layer 3a is not formed, and the preliminary coating layer 5 is spread over the entire tip side 2b.
a is formed. Next, in the coating liquid developing step, the separation distance adjusting and holding means holds a predetermined separation distance d ₁ between the coating liquid supply means 4 and the surface 2a to be coated, and the liquid pool collects between them. When the member 2 to be coated is conveyed with the layer 3a formed, the coating liquid is spread without being sheared by its surface tension. Here, if the film is formed only by the wettability of the coating liquid without forming the preliminary coating layer 5a, the film cannot be formed in the entire region due to the delay time until the wetting becomes steady, and the film is formed. The unevenness occurs. On the other hand, in the present invention, since the preliminary coating layer 5a is formed and the coating layer 5b is continuously developed starting from this, the coating layer 5b (tension developing film) is spread over the entire surface 2a to be coated. ) Can be formed.

As described above, in the tension expansion film forming method according to the present invention, pressure is applied to the member to be coated as in the roll coater method (transfer film forming method), and the surface to be coated is applied to the coating roller or the like. Contrary to the transfer film forming method of closely adhering to the opposite side, conversely, the separation distance between the surface to be coated 2a and the coating liquid supply means 4 is kept constant, and the liquid pool layer 3a in the non-pressure state is formed to form the film. To do. Therefore, when the sheared surface is formed by the conveyance of the coating target member 2, the position where the sheared surface is generated is the acting force between the coating surface 2a and the liquid pool layer 3a, that is, the coating surface. It is defined only by the balance of the adhesive force of the coating liquid to the 2a side, the surface tension of the coating liquid, and the shearing force, and the adhesive force of the coating liquid to the coating liquid supply means side does not reach.

Therefore, when the surface state of the coating liquid supply means and the roller member are used, the shape of the roller surface and the like do not affect the film forming characteristics. Moreover, since high pressure is not applied to the coating liquid, stress does not remain inside the coating liquid during film formation, and fine bubbles are entrained in the coating liquid, resulting in material change. It never happens.

[0023]

【Example】

[Embodiment 1] Next, a tension expansion film forming apparatus according to Embodiment 1 of the present invention will be described with reference to FIGS. 1 and 2.

FIG. 1 is a perspective view showing the main part of the tension expansion film forming apparatus of this example, and FIG. 2 is a process sectional view showing the film forming operation.

In these figures, the film forming apparatus 1 of this example
Is an apparatus for forming a colored resist layer on the surface of a rectangular color filter glass substrate, and a plurality of rectangular color filters are cut out from this glass substrate. The film forming apparatus 1 is provided with a member to be coated 2 (glass substrate).
Means 6 for conveying the coated surface 2a downward
And a coating liquid supply means 4 which is arranged below the transport path 1b of the member to be coated 2 and which supplies the coating liquid (colored resist) 3 in a fixed amount over the entire width direction of the transport path 1b. Here, in FIG. 1, the transport path 1 is used as the transport means 6.
Only the suction chuck connected to the arm (not shown) of the transfer robot moving laterally at the side position of b is shown. Further, the coating liquid supply means 4 is a rectangular nozzle body which is connected to a metering pump (not shown) at a lower position and has a slit 4a on the upper surface side, and the surface on which the slit 4a is formed is formed from the side end of the nozzle body. Low, concave coating liquid supply unit 4
b is formed. Therefore, the coating liquid 3 discharged from the slits 4a is temporarily retained in the coating liquid supply unit 4b, and then is supplied so as to rise due to the surface tension of the coating liquid 3, and the supply amount in the width direction is fixed. Has been converted. Further, on both sides of the conveyance path 1b of the coating member 2, a separation distance for adjusting and maintaining a constant separation distance between the tip surface 4c of the coating liquid supply means 4 and the coating surface 2a. Rail bodies 7 each having an L-shaped cross section are arranged in parallel as adjustment holding means.
The member to be coated 2 is conveyed with both ends of the surface to be coated 2a supported by the upper surface 7a (guide surface) of the step portion. That is, the transport reference surface 1 of the coated member 2 is defined by the upper surface 7a.
a is formed. Here, the separation distance d ₁ between the upper surface 7a and the tip surface 4c of the coating liquid supply means 4 is, as will be described later, when the member to be coated 2 passes above the coating liquid supply means 4, this tip end. The distance is such that a liquid pool layer of the coating liquid can be formed between the surface 4c and the surface 2a to be coated.

Next, the film forming operation of the film forming apparatus 1 will be described.

First, as shown in FIG. 2 (a), the coating member 2 is transported by the transport means 6 in a state where the height position and the width direction position are regulated by the rail body 7, and As shown in FIG. 2 (b), the tip side 2 of the coated surface 2a
When b reaches the position above the coating liquid supply means 4 and the tip side 2b of the surface 2a to be coated comes into contact with the coating liquid 3, the conveying means 6 temporarily stops the conveying operation. Therefore, the coated surface 2a
The coating liquid 3 spreads in the width direction due to the surface tension of the coating liquid 3 between the front end side 2b and the front end surface 4c of the coating liquid supply means 4, and the coating liquid 3 spreads over the entire front end side 2b. as a result,
A preliminary coating layer of the coating liquid 3 is formed on the entire tip side 2b (preliminary coating step).

From this state, the conveying means 6 again starts to move laterally to convey the adherend member 2 as shown in FIG. 2 (c). Here, the separation distance d ₁ between the coated surface 2a and the tip surface 4c of the coating liquid supply means 4 is set in advance between the coated surface 2a and the tip surface 4c depending on the arrangement position of the rail body 7. It is set so as to maintain the state in which the liquid pool layer 3a of the landing liquid 3 is formed. Further, the moving speed of the transporting means 6 and the coating liquid supply speed of the coating liquid supply means 4 are set under the condition that the coating liquid 3 is not interrupted. Therefore, on the coated surface 2a, the coating layer 5b is expanded from the preliminary coating layer 5a along with the conveyance of the coated member 2 (coating liquid developing step), as shown in FIG. As shown, when the member to be coated 2 has finished passing the position above the coating liquid supply means 4, the coating layer 5b having a uniform film thickness d ₂ is formed. The coating liquid 3 supplied from the coating liquid supply means 4 during this period.
Is set so as to correspond to the amount of the coating liquid 3 consumed as the coating layer 5b. However, even if the amount of the coating liquid 3 supplied is too large, the excess coating liquid only drips along the side surface of the coating liquid supply means 4, so that it is attached to the surface to be coated 2a. There is no variation and the thickness d ₂ of the coating layer 5b does not vary.

As described above, in the present embodiment, the coating liquid is not adhered to the coating member by pressure as in the roll coater method, but is provided between the coating member 2 and the coating liquid supply means 4. The coating layer 5b is formed by using the liquid pool layer 3a formed on the surface of the substrate, and the wet surface is coated while the surface to be coated 2a is wet with the liquid pool layer 3a. The film is formed while expanding due to the surface tension of the liquid. Moreover,
If the film is formed only by the wettability from the initial stage, there is a time lag until the wetness reaches a completely steady state, and the tip side 2b of the coating surface 2a is not completely wetted at the start of film formation. Film formation unevenness occurs. Therefore, the preliminary coating layer 5a is formed in advance, and the coating layer 5b is expanded starting from this. Therefore, rather than coating, the coating layer 5b
The thickness d ₂ of the coating layer 5b is not affected by the pressure applied to the member to be coated as in the roll coater method, because the surface tension is developed and expanded.
Moreover, it is not affected by the surface condition of the tip end surface 4c of the coating liquid supply means 4 corresponding to the roller surface of the coating roller of the roll coater method. That is, since the coating surface 2a has the liquid pool layer 3a of a predetermined thickness between the coating surface 2a and the tip surface 4c, the shearing surface of the coating liquid generated by the movement of the coating member 2 is It is formed at a position where the change in the surface state of the tip surface 4c does not affect, in other words, at a position where the adhesive force of the coating liquid to the tip surface 4c does not affect. Therefore, the thickness of the coating layer 5b is a balance between the shearing force defined by the moving speed of the coating member 2, the adhesive force of the coating liquid on the coating surface 2a, and the surface tension of the coating liquid. Determined by
The adhesive force to the coating liquid supply means 4 side is not involved. Moreover,
Since the history of pressure received by the coating liquid is gentle, the residual stress of the coating liquid is at a level that can be ignored, and fine bubbles are not caught in the coating liquid. As described above, since there are few factors that influence film formation, particularly factors that are difficult to control, stable film formation can be performed.

[Embodiment 2] Next, a tension expansion film forming apparatus according to Embodiment 2 of the present invention will be described with reference to the accompanying drawings.

(Overall Structure) First, the schematic structure of the apparatus of this example will be described with reference to FIGS.

FIG. 3 is a schematic configuration diagram of the film forming apparatus, FIG. 4 is a front view thereof, FIG. 5 is a plan view thereof, and FIG. 6 is a side view from the upstream side of the transport path.

In these figures, the film forming apparatus 11 of this example is shown.
Is a device for applying a colored resist (coating liquid) to a rectangular glass substrate (coating member) 21 for a color filter, and is a marble stone plate supported by a leg 11a having an air damper mechanism. On the board 11b, the work supply stage 31, the upstream work guide part 41, the coating part 51, the downstream work guide part 61, and the work from the upstream side to the downstream side of the transport path 11c of the glass substrate 21. Ejecting units 71 are arranged, and above them, a transport mechanism 81 (transporting unit) that transports the glass substrate 21 according to a preset program is disposed at each site from the upstream side to the downstream side. . Here, work supply stage 3
The glass substrate 21 supplied to the No. 1 has the coated surface 21a.
Is first conveyed to the coating section 51 while being positioned on the roller surface of the guide roller 42 of the upstream work guide section 41. In this coating section 51, the liquid supply roller 52
At a position above the (coating liquid supply roller), while being conveyed in a state where the surface is regulated by the guide roller 42 of the upstream side work guide part 41 and further the guide roller 62 of the downstream side work guide part 61, After the coating layer of the colored resist is formed in contact with each other, it is conveyed on the roller surface of the guide roller 62 of the downstream work guide section 61 and is conveyed to the work discharge section 71.

In the film forming apparatus 11, each part has
Various types of sensors are attached to each, and the main ones are shown in FIG.

First, on the work supply stage 31, a material supply detection sensor 31a for detecting that the glass substrate 21 is supplied thereto, and a material supply position detection sensor 31b for detecting the position of the supplied glass substrate 21. And a height position detection sensor 41 for detecting the height position of the glass substrate 21 conveyed to the upstream work guide portion 41.
a, a speed sensor 41b for detecting the deceleration state of the glass substrate 21 conveyed therein, and a position detection sensor for detecting that the front end side of the glass substrate 21 has been conveyed to a position above the liquid supply roller 52 where it should be stopped. 41c is disposed, and the coating unit 51 has a liquid level sensor 51a for detecting the liquid level of the liquid supply roller 52, and a liquid level sensor for detecting the level of the colored resist liquid in the liquid storage tank supplied thereto. 51b
And a position detection sensor 61a for detecting the position of the glass substrate 21 conveyed thereto are arranged in the downstream side work guide portion 61, and the glass substrate 21 is conveyed therein to the work discharge stage 71. Position detection sensor 71a for detecting that the liquid draining roller has risen to a predetermined position, and a height position detection sensor 7a
1b and are arranged.

(Conveyance Mechanism) The conveyance mechanism of this apparatus is shown in FIG.
This will be described with reference to FIGS. 7 and 8 in addition to FIG. 6.

FIG. 7 is a side view from the upstream side of the transport mechanism, and FIG. 8 is a front view of its horizontal moving means.

In these figures, two rows of guide rails 82a and 82b are laid from the upstream side to the downstream side on both sides of the transport path 11c, and further, outside the guide rail 82a, the support units 82c and 82c are provided. A screw shaft 82e is bridged between 82d. The base end side of the screw shaft 82e is connected to the speed reducer 82f via the support unit 82d, and further, the speed reducer 82f.
Is connected to the output shaft 82h of the transport unit drive motor 82g. Here, on the screw shaft 82e, there is provided a slider 83a having a built-in precision ball screw that meshes with the screw portion thereof and transmits the lateral conveying drive, and these constitute a horizontal movement mechanism. The slider 83a is connected to a slider 83b that straddles the guide rail 82a. Further, the slider 83b and the guide rail 8
The slider 83c extending over 2b is connected by a support plate 84a of a vertical movement mechanism (position defining means) arranged so as to cross over the transport path 11c. As a result, when the screw shaft 82e rotates due to the rotational driving of the output shaft 82h of the transport unit drive motor 82g, the slider 83a moves horizontally, and the slider 83a accordingly.
b and 83c also move horizontally. In addition, the support unit 82 is provided on the tip side of the screw shaft 82e.
A rubber sheet 82i is attached to c so as to surround the tip of the screw shaft 82e, while the screw shaft 8e
Also on the base end side of 2e, a rubber sheet 82j surrounding the base end of the screw shaft 82e is attached to the support unit 82d, and the slider 83a is attached to the support unit 82d.
It reduces the shock when touching c, 82d.

On the other hand, on the upper surface side of the support plate 84a, three air cylinder mechanisms 84b (vertical moving means) are fixed with the tip ends of their output shafts 84c facing downward. A chuck plate 8 of a porous sintered body having a size larger than that of the glass substrate 21 is provided on the tip side of 84c via a universal joint 85 which is bendable in all directions.
6 are connected. The lower surface of the chuck plate 86 is a suction surface 86a (vacuum chuck surface), and the inside of the chuck plate 86 is sucked through a pipe connected from the outside, so that the suction surface 86a serves as a back surface of the glass substrate 21. Vacuum chuck the whole. Further, the universal joint 85 has a shaft portion 85 connected to the tip side of the output shaft 84c.
The spherical damper includes a spherical tip portion 85b of a and a receiving seat portion 85c having a hole corresponding to the spherical tip portion 85b. Therefore, for example, even if the thickness of the glass substrate 21 varies and the upper surface is an inclined surface, the universal joint 85 bends to follow the inclined surface, and the chuck plate The suction surface 86a of 86 firmly adheres to and holds the upper surface of the glass substrate 21. Further, when the glass substrate 21 is held by the suction surface 86a and the glass substrate 21 is positioned on the roller surface of the guide roller 42 of the upstream work guide portion 41, the coated surface 21a of the glass substrate 21 is guided. It can be brought into contact with the roller surface of the roller 42 without any gap. Further, the suction surface 86a is formed on the glass substrate 21.
Since it is adsorbed and held on the entire back surface of the glass substrate 21, the center side of the glass substrate 21 does not warp when the glass substrate 21 is positioned on the roller. In addition, the chuck plate 8
Even if there is a temperature difference between 6 and the glass substrate 21, since they are in contact with each other over the entire area, there is no temperature unevenness on the coated surface 21a of the glass substrate 21, so the entire surface of the glass substrate 21 is in the same state. Therefore, the film formation variation due to the temperature unevenness of the coated surface 21a of the glass substrate 21 does not occur. The chuck plate 8 is provided on each of the front, rear, left and right side surfaces of the support plate 84a.
A guide 87 for 6 is fixed with its tip facing downward, a guide roller 87a is provided at an intermediate position thereof, and a guide roller 87b is also provided on the tip side.
Further, a photo sensor mechanism 88 is attached to the front surface of the support plate 84a so that the relative position to the chuck plate 86 can be detected.

(Work Supply Stage) FIG. 9 is a plan view of the work supply stage 31.

The work supply stage 31 is arranged on the most upstream side of the film forming apparatus 11, and frames 32a to 32d are provided on the upper surface side of the support plate 31c thereof. Of the frames 32a to 32d, the frames 32a and 32d have mounting holes 33a and 33 having springs on the bottom side.
b and 33c are formed, and these mounting holes 33 are formed.
Reference pins 34a, 34b, 34c for the glass substrate 21 are attached to a, 33b, 33c. Here, the glass substrate 21 has two sides with reference pins 34a, 3a.
The region 31d, which is placed on the frames 32a, 32b, and 32d in a state where it is positioned inside 4b and 34c, and which is indicated by the alternate long and short dash line, is the placement region of the glass substrate 21. Therefore, when the glass substrate 21 is sucked and chucked, the chuck plate 86 presses down the reference pins 34a, 34b, 34c and contacts the glass substrate 21. Moreover, the support plate 31c itself is fixed to the stone surface plate 11b side via a spring. Therefore, when the chuck plate 86 sucks and chucks the glass substrate 21,
There is no excessive force applied to. In the case of a rectangular glass substrate having a length longer than that of the glass substrate 21, the glass substrate is designed to be supported by the frames 32a to 32d. For example, no adjustment of this part is necessary.

(Upstream Work Guide Section) In addition to the upstream work guide section of this apparatus shown in FIGS. 4 to 6, FIGS.
This will be described with reference to 2 as well.

FIG. 10 is a front view of the upstream work guide section,
11 is a plan sectional view thereof, and FIG. 12 is a sectional view thereof.

In these drawings, in the upstream work guide portion 41, ten guide rollers 42 are arranged in two rows on both sides of the transport path 11c. Here, the arrangement widths of the guide rollers 42 arranged in two rows so that the roller surfaces 42a of the guide rollers 42 become the conveyance reference surface 13 of the glass substrate 21 can support both end sides of the glass substrate 21. That is, as shown in FIG. 12, the edge of the glass substrate 21 is located at the center of the roller surface 42a. For this reason, only both ends of the glass substrate 21 are non-adhesive areas, and the substantially entire surface of the glass substrate 21 can be effectively used. Further, the glass substrate 21 is
Since the roller surface 42a is directly positioned and is transported with the coated surface 21a as a reference, for example, the back side (supporting surface side) of the glass substrate 21 and the like are not used as a reference. Even if the glass substrate 21 has undulations or uneven thickness, the coated surface 21a can always follow the roller surface 42a. Here, as the mounting position of the guide rollers 42 on both sides, the guide rollers in one row are staggered between the guide rollers in the other row to prevent the attitude of the glass substrate 21 during conveyance from varying. Good. Each of these guide rollers 42 is provided with an eccentric shaft 42b (roller position adjusting mechanism) whose axial center is located at a position deviated from the rotational center, and this eccentric shaft 42b is attached to the mounting hole of the upper guide roller support base 43. 43a, while changing the mounting posture of the eccentric shaft 42b, the set screw 43
By fixing with b, the height position of the roller surface 42a can be set for each guide roller 42.

Further, the upper guide roller support base 43 is
A support block 43c to which the guide roller 42 is fixed,
It is equipped with a slide block 43d that is the pedestal,
On the lower surface side of the slide block 43d, an inclined surface 43e having a slope of about 2 ° is formed in the longitudinal direction. On the other hand, below the upper guide roller support base 43, a lower guide roller support base 44 is arranged, and the lower guide roller support base 44 has a slope of about 2 ° on the upper surface side corresponding to the inclined surface 43c. A slide block 44b having an inclined surface 44a and a pedestal block 44 supporting the slide block 44b.
with c and. Inclined surface 4 of this slide block 44b
4a has a groove 44d formed in its central region,
In the upper guide roller support base 43, the support block 4
3c and the slide block 43d from below with the bolt 43
When fixed by f, the inclined surface 43e of the slide block 43d and the inclined surface 44a of the slide block 44b can be brought into close contact with each other even when the bolt head is protruding. Therefore, by using these inclined surfaces 43e and 44a, the upper guide roller support base 43 is slid with respect to the lower guide roller support base 44, so that all guides fixed to the upper guide roller support base 43 are moved. The height position of the roller surface 42a of the roller 42 can be collectively adjusted. In the film forming apparatus 11 of this example, in order to slide the upper guide roller support base 43 and the lower guide roller support base 44, a feeding mechanism using a screw mechanism is provided on both end surfaces of the upper guide roller support base 43. A pair of 45 (support base adjustment fixing means) is arranged. The feeding mechanism 45 includes a fixing block 45b fixed to the lower guide roller support base 44 with a bolt 45a, and a feeding shaft 45c forming a screw hole and a fine screw mechanism formed on the upper side of the fixing block 45b. It is configured. This delivery shaft 45c
45 d of the slide block 4 has a spherical shape.
3b includes a receiving seat 4 corresponding to the shape of the tip portion 45d.
3c is fixed. Therefore, it is possible to easily adjust the position of the upper guide roller support base 43 by using the delivery mechanism 45 and set the position of the roller surface 42a of the guide roller 42, that is, the conveyance reference surface 13 of the glass substrate 21. There is. In addition, on the side surface of the slide block 43d,
Through the screw holes formed in the slide block 43d,
Fixing screw mechanisms 46 for fixing the upper guide roller support base 43 and the lower guide roller support base 44 by being brought into contact with the slide block 44b are provided at two places. The fixing position of the upper guide roller support base 43 is adjusted by using the small dial gauge 47 attached to the one fixing block 45b.

(Coating Section) FIG. 13 is a block diagram of the coating section 51.

In this figure, a doctor squeegee 53, a doctor roller 54, and a liquid supply roller 52, which are all made of stainless steel, are arranged from the upstream side to the downstream side of the transport path of the glass substrate 21. Here, the liquid supply roller 52 is rotating clockwise in FIG. 13, and the roller surface 52a of the liquid supply roller 52 is in the state where the liquid storage tank 91 is arranged at the position shown by the one-dot chain line below. By rotating while being immersed in the colored resist, the colored resist is scraped upward. At the lateral position of the liquid supply roller 52, the doctor roller 54 rotates in the same direction, and its roller surface 54a is separated from the roller surface 52a of the liquid supply roller 52 by a predetermined distance d _12.
Are separated. For this reason, a part of the colored resist scraped up by the liquid supply roller 52 is partially covered by the roller surface 5.
Removed from the 2a side, moved to the roller surface 54a side,
Only the colored resist in an amount corresponding to the separation distance d ₁₂ is supplied upward in a substantially fixed amount. Furthermore, the doctor squeegee 5
3 are arranged close to each other, and the colored resist that has moved to the roller surface 54a side is scraped off from there and falls into the liquid storage tank 91. Here, the tip portion 53a of the doctor squeegee 53, since separating the roller surface 54a and predetermined separation distance d ₁₃ of the doctor roller 54, the colored resists scraping the roller surface 54a
The amount of the colored resist that is supplied upward while it is still attached to the roller surface 54a is defined by the separation distance d _{13 and} is substantially quantified. The amount of colored resist supplied above the roller 52 is substantially quantified. Here, there is also a method of arranging the tip end portion 53a of the doctor squeegee 53 and the roller surface 54a in contact with each other and scraping off the entire amount of the colored resist from the roller surface 54a. Also, since the contact state changes due to wear and the like, and the supply amount of the colored resist changes, this arrangement structure is adopted. In addition, what is shown on the back side of the doctor squeegee 53 is the guide roller 42 on the final end side of the upstream work guide portion 41, and what is shown on the downstream side of the liquid supply roller 52 is the downstream side. Work guide section 61
Guide roller 62 of the upstream work guide section 41
The glass substrate 21 conveyed from the
1a is positioned on the roller surface 42a of the guide roller 42, passes through the coating portion 51, and is guided by the guide roller 62.
Move to the side of. Here, which guide roller 4
Since the reference numerals 2 and 62 are also arranged close to the coating section 51, it is possible to prevent the glass substrate 21 from changing its transporting posture. Further, at the height positions of the roller surfaces of the guide roller 42 and the guide roller 62, the conveyance reference surface 13 of the glass substrate 21 formed by these roller surfaces is separated from the roller surface 52a of the liquid supply roller 52 by a predetermined distance d _11. That is, as described later, the liquid reservoir layer of the colored resist is set so as to have a space d ₁₁ between the glass substrate 21 and the roller surface 52a of the liquid supply roller 52.

Next, the structure of the doctor squeegee 53 will be described with reference to FIG. 14 as well as FIG.

FIG. 14A is a plan view of the doctor squeegee 53, and FIG. 14B is a plan view showing an arrangement position of the doctor squeegee 53 with respect to the doctor roller 54.

In these figures, the doctor squeegee 5
3 is a front end portion 53a having substantially the same width as the width of the doctor roller 54.
And a support piece 53b having a width narrower than the middle position, which is connected to the tip portion 53a, and a support piece 53b fixed by screwing the support piece 53b.
3c, and this support piece 53c is a fixed portion of the doctor squeegee 53 to the stone surface plate 11b side. As described above, the width of the doctor squeegee 53 on the base end side is narrow, and the guide rollers 42 on the terminal end side of the upstream work guide 41 are arranged on both sides of the base end side with the narrow width, and The glass substrate 21 is configured to be handed over toward the downstream work guide 61 without changing the posture of the glass substrate 21. Here, the tip 53a has an inclined upper surface so that the tip 53a becomes thinner toward the tip edge, and the support piece 53c has an inclined lower surface so that the tip side becomes thinner toward the tip edge. ing. Of these tip edges, the tip edge of the tip portion 53a is fixed so as to protrude from the tip edge of the support piece 53c.

As shown in FIG. 13, the doctor squeegee 53 having such a structure is mounted on the supporting members 11c and 11d which are erected from the stone surface plate 11a side through the fixing piece 55 to which the supporting piece 53c is screwed. It is fixed. This fixed piece 5
5, a round hole 55a and an elongated hole 55b for position adjustment are formed, and the fixed shaft 55 attached to the round hole 55a.
c and a fixed shaft 55d attached to the elongated hole 55b, the fixed member 55 is fixed to the support member 11d, and the fixed position of the fixed shaft 55c with respect to the elongated hole 55b is adjusted about the fixed shaft 55d as a rotation center. It is possible to adjust the distance d ₁₃ between the tip 53a and the roller surface 54a of the doctor roller 54 by changing the mounting posture of the 53.

The structure of the doctor squeegee is:
You may employ | adopt the thing of the structure shown in FIG.

FIG. 15 (a) is a plan view showing the structure of another doctor squeegee, and FIG. 15 (b) is a side view when this doctor squeegee is arranged.

As shown in these figures, the doctor squeegee 56 has a flat plate portion 56a at its tip side.
The tip end surface of the flat plate portion 56a faces the roller surface of the doctor roller 54 with a predetermined separation distance d ₁₃ . Thereby, the colored resist scraped off can be surely dropped. The position adjusting mechanism of the doctor squeegee 56 includes a long hole 56c provided on the base end side 56b of the doctor squeegee 56, a fastening bolt 57 attached to the long hole 56c, and a doctor squeegee 56.
The micrometer 58 with which the head 58a contacts the rear end
And a supporting piece 59a for supporting the micrometer 58.
And a spring 59c arranged between the support portion pieces 59b supporting the doctor squeegee 56. When the doctor squeegee having such a configuration is used, the micrometer 58 is used for setting the distance between the doctor squeegee 56 and the doctor roller 54, and therefore the adjustment is easy. Further, when the doctor squeegee 56 and the doctor roller 54 are repeatedly repeatedly moved laterally, it is possible to prevent the occurrence of uneven thickness such as stripes on the colored resist on the roller surface of the doctor roller 54. This mechanism can also be applied to the relationship between the doctor roller 54 and the liquid supply roller 52 described later.

Next, the structure of the doctor roller 54 is shown in FIG.
This will be described with reference to FIGS.

FIG. 16 is a plan view of the doctor roller 54, the liquid supply roller 52, and their drive system, and FIG. 17 is a side view of them from the upstream side.

In these figures, the doctor roller 54
Has a roller surface 54a having a smooth surface having substantially the same width as that of the glass substrate 21, and both shaft ends thereof are fixed to the bearings 54b fixed on the frames 11e and 11f arranged on both sides of the transport path 11c of the glass substrate 21. , 54c, and a pulley 54d fixed to the tip end side of one shaft end is connected to the doctor roller drive system 14 via a rotation timing belt 54e. The doctor roller drive system 14 has a configuration in which a rotation timing belt 54e is connected to a pulley 14c fixed to an output shaft 14b of a drive motor 14a. In addition, adjustment of the fixed position of the doctor roller 54
This is performed using a micrometer 54f in which the head contacts the shaft end of the doctor roller 54.

Next, the structure of the liquid supply roller 52 is also shown in FIG.
Also, with reference to FIG.

In these drawings, the roller surface 52a of the liquid supply roller 52 has a roller surface 52a having substantially the same width as the glass substrate 21, and the surface is a smooth surface. Both ends of the shaft are positioned outside the bearings 54b and 54c at the frame 1
It is supported by bearings 52b and 52c fixed on 1e and 11f, and the tip side of one shaft end is connected to the liquid supply roller drive system 15 via a coupler 52d. The liquid supply roller drive system 15 has a configuration in which the output shaft 15b of the drive motor 15a is connected to the connector 52d. Here, since the width of the liquid supply roller 52 is narrower than the width of the glass substrate 21, the excessive coating liquid does not adhere to the outer edge region (marginal zone) of the coating region, so that the entire coating surface is used. You can
Good material efficiency.

(Downstream Work Guide Section) As shown in FIGS. 4 and 5, the downstream work guide section 61 has a coating section 51.
Of the guide rollers 62 arranged on both sides of the conveyance path 11c, and a height position adjusting mechanism in which roller surfaces of these guide rollers 62 can be set to a predetermined height, that is, a guide. It has a height adjusting mechanism for each guide roller 62 using the eccentric shaft of the roller 62, and a collective height adjusting mechanism for the guide rollers 62 using these guide roller support bases 63. Here, since the main parts of the downstream work guide 61, such as the guide roller 62 and the support base 63, have the same configuration as the upstream work guide part 41 shown in FIGS. 10 to 12, the description thereof will be omitted. .

(Work Ejection Section) As shown in FIGS. 4 and 5, in the film forming apparatus 11 of this example, the work ejection section 71 is used.
Is disposed on the most downstream side of the conveyance path of the glass substrate 21, and the glass substrate 21 subjected to the film formation is discharged from the film forming apparatus 11 to the next step by the discharging mechanism. Immediately before being discharged from the film forming apparatus 11, a liquid draining mechanism 72 that is in contact with the front end side or the rear end side of the glass substrate 21 and removes the excessive colored resist attached thereto is arranged. The structure of this draining mechanism is shown in FIGS. 18 and 19. Since a known mechanism can be used for the discharging mechanism, its illustration and description are omitted.

FIG. 18 is a front view of the liquid draining mechanism, and FIG. 19 is a side view thereof.

In these figures, the liquid draining mechanism 72 is
A cylinder mechanism 72a (drainage member moving means) fixed to the stone surface plate 11b side, a support plate 72b fixed to the tip end side thereof, and a roller raised upward from both ends of the support plate 72b. It has receiving plates 72c and 72d and a liquid draining roller 73 (a liquid draining member) whose shaft ends are supported by these roller receiving plates 72c and 72d. Here, in the middle position of one roller receiving plate 72d,
The support piece 72 that is raised from the middle position of the support plate 72b
Bearings 74a and 74b are attached to e and the transmission shaft 7 by these bearings 74a and 74b, respectively.
4c is supported. At the shaft end of this transmission shaft 74c,
A step pulley 74d is fixed, and as shown in FIG. 19, a rotation timing belt 73c is provided between one step surface of the step pulley 74d and a pulley 73b fixed to the shaft end of the liquid draining roller 73. On the other hand, the rotation timing belt 75c is also stretched between the other step surface of the step pulley 74d and the pulley 75b fixed to the output shaft 75a of the liquid draining roller drive motor 75. The roller surface 73a of the cutting roller 73 is capable of contacting the rear end side of the glass substrate 21 and, if necessary, the front end side while rotating. Further, with respect to the roller surface 73a of the liquid draining roller 73, the doctor squeegee 7 shown in FIG.
6 is arranged so that the colored resist adhering to the roller surface 73a of the liquid draining roller 73 can be removed. The doctor squeegee 76 is also shown in FIGS.
Similar to the doctor squeegee 53 shown in (b), the tip portion 76 having a width corresponding to the roller surface of the liquid draining roller 73.
a and a fixed portion 76b which is a base end side having a width narrower than the width a, and the distance between the liquid draining roller 73 and the tip portion 76a is adjusted to a predetermined distance via the fixed portion 76b, Fixed. Instead of the doctor squeegee 76 or in addition to the doctor squeegee 76, a cleaning pad such as a suction pad may be provided.

When the rear end portion of the glass substrate 21 and the front end portion of the glass substrate 21 are located above the liquid draining mechanism 72, the liquid draining mechanism 72 comes into contact with the rear end portion or the front end portion of the glass substrate 21 when the rear end portion or the front end portion is excessive. The colored resist is removed, but the other surfaces are not touched.

That is, when the liquid draining process is performed, the glass substrate 21 is raised to the transport reference surface 13 by the cylinder mechanism 72a, but when the liquid draining process is unnecessary, the glass substrate 21 is moved downward from the transport path 13. It is designed to be retracted to the position.

(Liquid Storage Tank and Piping System) The liquid storage tank and piping system in which the colored resist is stored will be described with reference to FIGS. 21 to 23.

FIG. 21 is a front sectional view of the liquid storage tank, FIG. 22 is a side sectional view thereof, and FIG. 23 is a schematic view of a piping system.

In these figures, the liquid storage tank 91 is a rectangular parallelepiped container which is used by placing it on a tank receiving table 93 whose lower surface is connected to the elevating mechanism 92, and the inside of which is the liquid supply roller 52. The roller surface 52a of the above is soaked to collect the color resist and the liquid supply unit 91a (first storage unit), and the liquid recovery for collecting the color resist falling below the doctor roller 54 and the doctor squeegee 53. Section 91b
(Second storage part). Here, the lifting mechanism 92 is the cylinder mechanism 9 fixed to the stone surface plate 11b side.
2a and guide shafts 92b and 92c. A supply port 91c is formed in the liquid supply unit 91a, while a liquid discharge port 91d is formed in the liquid recovery unit 91b. Further, a tubular nozzle 91e connected to the supply port 91c is arranged inside the liquid supply part 91a, and the colored resist is replenished at each part of the liquid supply part 91a from the ejection holes formed on the side surface thereof. The components of the colored resist inside the liquid supply unit 91a are homogenized, and replenishment is realized while suppressing the ripples of the colored resist. The pipe path 94a connected to the liquid discharge port 91d is connected to a liquid storage tank 96 installed in the cooling tank 95 to avoid evaporation of unnecessary solvent components. From the above to the supply port 91c via a high-pressure liquid-feeding means such as a bellows pump 97 (pressure-feeding means).
Are arranged. Further, between the bellows pump 97 and the supply port 91c in this piping path 94b, a filter 98 for removing foreign matters in the colored resist, for example, solid matters of the colored resist produced in the previous use. The filter 98 allows the colored resist to be regenerated and reused.

In the case of the colored resist used here, the storage temperature is about 5 ° C., and the set temperature of the cooling tank 95 is 5 so that it can be used immediately from the storage state.
It has reached ℃. Therefore, volatilization of the solvent component during use is prevented, and stable film formation can be realized.

(Film Forming Operation) The film forming operation of the film forming apparatus 11 having such a structure will be described with reference to the flow charts shown in FIGS. 24 to 26 and the process sectional views shown in FIG.

In the film forming apparatus 11, the glass substrate 21 can be manually or automatically processed for each step. The case of automatic processing will be described. The liquid storage tank 91 has a lifting mechanism 9
2, the roller surface 52a of the liquid supply roller 52 is already immersed in the colored resist inside the liquid storage portion 91a.

First, when the processing mode is set to automatic processing in step ST1, the drive motors of the roller pump 97, the liquid supply roller 52, the doctor roller 54, and the liquid draining roller 73 start rotating operation (steps ST2 to ST2).
Step ST5). As a result, as shown in FIG. 27A, after the colored resist is scraped up by the roller surface 52a of the liquid supply roller 52, the colored resist is scraped off by the doctor roller 54, and the amount corresponding to the distance d ₁₂ between them is removed. Only the colored resist of is supplied above. The colored resist adhering to the doctor roller 54 side is then scraped off by the doctor squeegee 53, and only the amount of colored resist corresponding to the distance d ₁₃ is supplied upward, resulting in the liquid supply roller 52. A colored resist layer having a constant thickness is formed around the roller surface 52a.

Next, in step ST6, after it is confirmed that the glass substrate 21 is not present in the work discharge section 71, the transport section drive motor 82f starts operating and each slider 8 is moved.
3a, 83b, 83 are moved laterally to make a chuck plate 86.
Is moved to a position directly above the work supply stage 31, the air cylinder mechanism 84b is operated, and the chuck plate 86 is lowered (steps ST7 and ST
8). Here, when the suction sensor detects the relative position between the chuck plate 86 and the glass substrate 21 (step ST9), and it can be confirmed that the suction surface 86a of the chuck plate 86 is in surface contact with the glass substrate 21, The inside of the chuck plate 86 is vacuum-sucked, and the suction surface 86a sucks the glass substrate 21.
After vacuum chucking and holding, the chuck plate 86 moves upward (step ST10 and step ST1).
1).

Next, in step ST12, the chuck plate 86 is laterally conveyed to the upstream work guide portion 41,
At that position, the chuck plate 86 is lowered based on the soft timer until the vibration is stopped, and then the chuck plate 86 is lowered (steps ST13 and ST14). Here, both ends of the glass substrate 21 have the roller surface 4 of the guide roller 42.
The position is defined as an elastic contact state with 2a (conveyance reference surface 13). Even in this state, in step ST15, after the vibration is stopped, the chuck plate 68 keeps the glass substrate 21 positioned on the roller surface 42a of the guide roller 42 and lowers it toward the coating portion 51. It laterally conveys at a speed (step ST16). Here, step ST
In FIG. 17, the glass substrate 21 was moved a distance from the time when it was confirmed that the positioning sensor had been conveyed to the predetermined position to the glass substrate 21 until the tip of the glass substrate 21 was positioned directly above the liquid supply roller 52. After that, the glass substrate 21
Is stopped for a predetermined time (step ST19). here,
As shown in FIG. 27B, a colored resist layer is formed around the roller surface 52a of the liquid supply roller 52,
As such a glass substrate 21 is in contact with the surface side, the conveyance reference surface 13 of the glass substrate 21 is at a predetermined distance d ₁₁ from the roller surface 52a. Therefore, the glass substrate 21
However, when passing through the position above the liquid supply roller 52 without stopping, due to the delay time until the tip side 21b of the coated surface 21a becomes completely wet with the colored resist, A region where the colored resist does not get wet occurs in the width direction of the glass substrate 21. Therefore, step ST1
In FIG. 9, when the colored resist is stopped for a predetermined time in FIG. 9, as shown in FIG. 27C, the colored resist spreads over the entire gap between the glass substrate 21 and the liquid supply roller 52 due to the surface tension, and the front end portion 21 b of the glass substrate 21. The entire area can be wetted with the colored resist, and the preliminary coating layer can be formed on the entire area of the tip side 21b (preliminary coating layer forming step).

Next, in step ST20, the glass substrate 21 is further moved toward the work guide part 61 on the downstream side and passed over the liquid supply roller 52.

Here, as shown in FIG. 27D, the separation distance d ₁₁ between the conveyance reference surface 13 and the roller surface 52a is between the glass substrate 21 being conveyed and the roller surface 52a. The state in which the liquid pool layer 22a is formed is set to be able to be held, and the transport speed of the glass substrate 21 and the liquid supply amount by the liquid supply roller 52 are set to a speed at which the colored resist is not interrupted. Therefore, the colored resist is different from the transfer film forming method such as the roller coater method in that the liquid pool layer 22a is close to a non-pressure state, and the colored resist layer is developed from the preliminary coating layer 22b on the tip side 21b due to the surface tension. The coating layer 22c is extended to the end side of the glass substrate 21. That is, the formed layer of the glass substrate 21 after passing shown in FIG. 27E is formed as an expanded development film rather than a coating film and a transfer film. Here, the liquid pool layer 22a is sufficiently thick, and the shearing surface is formed at a position where the adhesive force to the roller surface 52a side hardly reaches. That is, the position of the shear plane is not affected by the adhesive force of the colored resist on the roller surface 52a side, and is defined by the balance of the shear force, the adhesive force on the glass substrate 21 side, and the surface tension of the colored resist. The change in the surface state of 52a does not affect the film thickness of the expanded spread film, so that stable film formation can be realized.

Next, in step ST21, when the position detection sensor confirms that the glass substrate 21 has been conveyed on the terminal side of the downstream side work guide portion 61, the liquid draining roller 73 is lifted by the cylinder mechanism 72a. Then, it rises to a position where the sensor switch operates (step ST21a and step ST21b), and contacts the rear end side 21c and the front end side 21b of the glass substrate 21. As a result, after the excess colored resist attached to the rear end side 21c and the front end side 21b is removed, the draining roller 7
3 descends (step ST21c). Under normal conditions, since the excessive colored resist does not adhere to the tip side 21b, the tip side 2 of the above operation is
The contact operation of the liquid draining roller 73 with 1b is omitted.

Next, in step ST22, the glass substrate 21 moves and stops while being supported by the roller surface 62a of the downstream guide roller 62 (step ST2).
3). Subsequently, in step ST24, the chuck plate 86 moves up to a position just above the work discharge part 71 (step ST26) after rising while keeping the glass substrate 21 held and stopping the vibration (step ST25). Immediately above the discharging section 71, the apparatus waits until the vibration stops (step ST27). After that, in step ST28, the chuck plate 86 descends, and here again, after waiting until the vibration stops (step ST29), step S29.
At T30, the vacuum state of the chuck plate 86 is released, and the chuck plate 86 is delivered to the discharging mechanism.

Next, in step ST28, the chuck plate 86 is stopped in that state until the vibration is stopped.
Rises and the film forming operation ends. In addition, for the coating layer of the colored resist formed as described above, after performing a leveling step of leaving the adherend surface 21b side of the glass substrate 21 facing upward, if necessary, Normal steps such as pre-baking, film thickness measurement, exposure, and development are performed. However, according to this film forming apparatus, the liquid supply roller 52
Since the roller surface 52a of No. 2 is a smooth surface, the thickness variation is suppressed to about 0.1 μm. Therefore, if this value is acceptable,
The leveling step is omitted. That is, in the case of the coating roller of the roll coater method, in order to secure the amount of the coating liquid to be applied by reversing, unevenness such as V-shape is formed by engraving or the like, so the leveling step is essential, but In the example, the leveling process is of a nature that is performed according to the required unevenness accuracy.

(Effect of Embodiment 2) As described above, in the film forming apparatus 11, the adhered surface 21a of the glass substrate 21 is conveyed downward and film formation is performed in this posture. Therefore,
Since dusts, burrs and the like falling from above do not adhere, it is possible to form a highly reliable film. Further, during film formation, a constant separation distance d ₁₁ is maintained between the glass substrate 21 and the roller surface 52a, and since the film is formed while the liquid pool layer is formed, excessive pressure such as ironing is applied to the colored resist. Since it does not exist, problems such as material deterioration, residual stress, and inclusion of fine bubbles do not occur. Here, it is extremely difficult to apply a constant pressure to the glass substrate 21 during the carrying operation, which causes variation in film thickness in the transfer film forming method. The tension expansion film forming method using the film device 11 does not require such pressure application, and thus stable film formation can be performed.

Moreover, since it is a non-contact type film forming method in which the surface other than the coating liquid does not come into contact with the surface to be coated on which the coating layer is formed, it can be used as a target member to be coated. Is
The surface to be coated is not limited to the flat surface such as the glass substrate 21, and may have irregularities. That is, in the case where a colored resist layer forming a color filter is already formed in a predetermined pattern on the surface to be coated on a glass substrate surface, when a colored resist layer is further formed, a wiring layer or the like is already formed on the semiconductor. When a photoresist layer is further formed on the substrate surface, the pressure applied to the coating liquid side by the inversion method is inevitable to fluctuate due to unevenness in the inversion method. The film-forming method is not a pressure-based film-forming method, but the coating layer is expanded while being wet with the coating liquid, so that a uniform film can be formed regardless of the unevenness of the surface to be coated. Good coverage. Moreover, it does not damage the coated surface side.
In addition, unlike the spin coater method, in which the coating liquid is developed in one direction by centrifugal force, it does not have directionality, so a streak pattern may occur behind the convex portion. Absent. For example, as shown in the cross section of the MIM type panel display substrate 301 in FIG. 28A and the cross section of the semiconductor device 302 in FIG.
An overcoat layer (surface protection layer or the like) having a uniform thickness can be formed regardless of the presence or absence of steps or irregularities, and the step coverage is good. On the other hand, in the case of the spin coating method, since the film has the film forming direction indicated by the arrow, an extremely thin layer is formed behind the convex portion as shown by the broken line in each case. Also, FIG.
As shown in FIG. 8 (c), which is a cross section of the glass substrate 21 viewed from the front end side 21b, the thickness of the coating layer is constant except for the overlapping margin with the guide roller. Therefore, according to this example, both ends of the material can be used. On the other hand, according to the reverse film forming method such as the roll coater method, as shown by the broken line, the marginal zone 21 having thick coating layers on both sides of the coating surface is formed.
Since d is formed wide, this area cannot be used.

Regarding the film thickness characteristics of the tension developing film formed by using the film forming apparatus 11, the film can be used not only for forming a colored resist but also for forming an alignment film of a liquid crystal display,
As an example of the coating, a thin film having a thickness of about 0.1 μm could be formed.

[Modification of Second Embodiment] In the second embodiment described above, the transfer direction of the member to be coated is the same as the rotation direction of the liquid supply roller, that is, the coating liquid is in the transfer direction of the member to be coated. However, on the contrary, the feeding direction of the coating target member and the rotation direction of the liquid supply roller are set so that the coating liquid is fed toward the transporting direction of the coating target member. It may be in the opposite direction. In this case, in the film forming apparatus 11, the sequence of the transport mechanism 81 is changed so that the adhered member is once conveyed to the downstream side work guide section 61, and then the coated member is moved from the downstream side toward the upstream side. 29, the relative movement method of the member to be coated and the liquid supply roller may be changed, but as shown in FIG. 29, in the coating unit 101, the doctor roller 102 and the doctor squeegee 103 are connected to the liquid supply roller. The liquid supply roller 104 may be arranged on the downstream side in the transport direction of the member to be coated with respect to 104, and the rotation direction of the liquid supply roller 104 may be the direction indicated by arrow B. The film forming apparatus 100 having this configuration is suitable for forming a tension developing film having a larger thickness than the film forming apparatus 11 according to the second embodiment. The film forming apparatus 100
Since the configuration of the other parts is the same as that of the film forming apparatus of the second embodiment, its illustration and description are omitted.

The results of film formation using the film forming apparatus 100 having such a structure will be described below. Here, with respect to each part and each mechanism, those common to the second embodiment will be described by giving the same names and the same numbers.

First, the vertical length is 300 mm and the horizontal width is 300.
mm to a glass substrate 111 having a thickness of about 1.1 mm,
The film is formed using a colored resist having a viscosity of about 10 cps.

Here, the chuck plate 86 is the glass substrate 11
1, the rotation speed of the liquid supply roller 104,
Also, the rotational peripheral speed of the doctor roller 102 is set to about 5.0 mm / sec. In addition, the distance d between the liquid supply roller 104 and the conveyance reference surface of the glass substrate 111 is d.
Upstream work guide part 4 so that ₂₁ is about 20 μm
The roller surface 42a of the first guide roller 42 and the roller surface 62a of the guide roller 62 of the downstream side work guide portion 61
Position. Further, the separation distance d ₂₂ between the roller surface 104a of the liquid supply roller 104 and the roller surface 102a of the doctor roller 102 is set to about 0.35 mm, and the roller surface 102a of the doctor roller 102 and the doctor squeegee 10 are set.
The distance d ₂₃ between the third tip 103a is set to about 0.3 mm.

In this state, the glass substrate 111 is transported,
Similar to the film forming apparatus 11 of the second embodiment, it is stopped at a position above the liquid supply roller 104, the colored resist is spread over the entire tip portion 111a thereof, and the preliminary coating layer 111b is formed, and then the glass substrate 111 is again formed. Is transferred at a speed of about 5.0 mm / sec to expand and spread the coating layer from the preliminary coating layer 111b by the surface tension of the colored resist to form the coating layer.

As a result, the thickness of the coating layer formed was measured at nine points on the glass substrate 111, and the thickness was about 1.8 to
It was 2.2 μm. Moreover, the coating layer is the glass substrate 1
The film is evenly formed except for marginal zones of a slight width on both ends of the surface 11 to be coated. Therefore, even when a rectangular color filter substrate for a liquid crystal display panel is cut out from the glass substrate 111, the substantially entire region including the corners can be efficiently used.

Further, the kind of the colored resist is changed under this condition, and the relationship between the distance between the liquid supply roller 104 and the conveyance reference surface of the glass substrate 111 and the film thickness of the tension developing film is shown in FIG.

As shown in this figure, in the apparatus 100 of this embodiment, the above-mentioned separation distance is from about 4.5 μm to about 24.
If the thickness is changed to 5 μm, the film thickness will be about 4.0 μm to about 3.6 μm.
Although it can be used as a fine adjustment condition, it is smaller than the influence of the rotation speed of the liquid supply roller and the conveyance speed of the glass substrate 111 on the film thickness. Therefore, although the setting condition of the film thickness is secondary, if the predetermined separation distance d ₂₁ is set, the film thickness is unlikely to change even if the distance is slightly changed. It shows that stable film formation is possible.

A similar film forming operation can be realized by disposing a doctor roller and a doctor squeegee on both sides of a liquid supply roller rotatable in any direction.

[Other Modifications of Second Embodiment] Further, in the film forming apparatus 100, the height position of the guide roller 42 of the upstream side work guide portion 41 and each roller of the guide roller 62 of the downstream side work guide portion 61. The heights of the surfaces are not limited to being set on the same surface, and can be used while being shifted as shown in FIG.

For example, the roller surface 42a of the guide roller 42 of the upstream work guide section 41 and the liquid supply roller 104.
The distance d ₃₁ from the roller surface 104a of the guide roller 6 is set to about 5 μm, while the guide roller 6 of the downstream side work guide portion 61 is set.
The separation distance d ₃₂ between the second roller surface 62a and the roller surface 104a of the liquid supply roller 104 may be set to about 30 μm to facilitate formation of the preliminary coating layer. The change in film thickness when the above conditions are set and other setting conditions are changed will be described below. The other setting conditions are as described above. (Relationship between Transport Speed and Film Thickness) First, FIG. 32 shows the result of investigation on the relationship between the transport speed of the glass substrate 111 by the chuck plate 86 and the coating film thickness.

In this figure, the conveying speed is about 5 mm / s.
When the thickness is increased from ec to about 12 mm / sec, the film thickness decreases from about 2.7 μm to about 1.6 μm.
Therefore, the transport speed is the first condition for setting the film thickness.

(Relationship between Rotational Speed of Liquid Supply Roller and Film Thickness) Next, FIG. 33 shows the result of investigation on the relationship between the peripheral speed of rotation of the liquid supply roller and the coating film thickness.

In this figure, the peripheral speed of rotation is about 1 mm / s.
When the thickness is increased from ec to about 10 mm / sec, the film thickness increases from about 0.3 μm to about 5.9 μm.

Therefore, the rotational peripheral speed of the liquid supply roller is the second condition for setting the film thickness.

(Relationship between separation distance between liquid supply roller and doctor roller and film thickness) Next, the roller surface 104a of the liquid supply roller 104 and the roller surface 102 of the doctor roller 102.
The separation distance from a was changed to 1.0 mm, and the relationship with the thickness of the tension spreading film was investigated. The result is shown in FIG. 34.
In FIG. 34, the condition that the distance between the roller surfaces is 0 mm means that the roller surfaces are in contact with each other.

As shown in this figure, even if the distance between the roller surfaces is set to about 0.2 to 1.0 mm, the influence on the film thickness is small, but when the roller surfaces are in contact with each other. A liquid pool is formed below the contact portion of these roller surfaces, and on the contrary, the liquid supply amount increases and the film thickness is about 5.0.
Thick up to μm. Therefore, it is shown that the variation of the film thickness is less likely to occur when the distance between the roller surfaces is fixed to be about 0.2 to 1.0 mm.

(Relationship Between Stop Time for Forming Precoat Layer and Film Thickness) To form the precoat layer, the glass substrate 1 was used.
FIG. 35 shows the result of investigation on the relationship between the time for stopping the conveyance of No. 11 and the coating film thickness.

As shown in this figure, it is shown that the film thickness does not change even if the stop time is extended from 0 seconds (without stopping) to 20 seconds.
A part where no film was formed occurred. Therefore, it is preferable to set the time during which the liquid supply roller 104 makes one rotation as the stop time.

Further, as a result of changing the above-mentioned conditions and forming a film, it was confirmed that a film having a film thickness of about 0.1 μm to about 50 μm can be formed.

As described above, in each of the film forming apparatus shown in Example 2 and its modified example, after the preliminary coating layer was formed, the glass substrate was dipped in the liquid pool layer to form a coating layer. Since it is a non-contact type film forming method for developing the coating layer, the film thickness does not change due to the pressure applied to the member to be coated or the surface condition of the coating roller as in the transfer film forming method. A stable film can be formed.

Since the roller surface of the liquid supply roller does not come into contact with the member to be coated and has a function of supplying the liquid in a substantially constant amount, it is most preferable that the roller surface is a smooth surface. The groove may be formed into a V-shaped groove, a rectangular groove or the like, or may be roughened such as a ground surface or engraving. here,
By adopting a smooth roller surface, it becomes possible to manufacture an optical compensation cell plate used for an STN type liquid crystal display panel or the like, which requires high uniformity in film thickness.

Further, it is desirable to dispose a transport reference plane setting member such as a guide roller and a rail body even near the liquid supply roller. Therefore, as shown in FIG. 36, the bearing 15 is attached to both shaft ends 151a of the liquid supply roller 151.
2, the roller surface 153a passes through the conveyance reference surface 13
You may arrange the guide roller 153 which forms.

Further, in forming the preliminary coating layer,
In addition to using the stopping operation of the transport mechanism, a method may be adopted in which, for example, the liquid supply roller is raised to narrow the gap with the glass substrate and forcibly bring the coating liquid into contact with the glass substrate. Is.

The material to be coated, the coating liquid, and the like used in the film-forming apparatus of this example are not limited in their materials, uses, etc. As an ink application to the ink ribbon of the printer,
Manufacture of color scanner film for image sensors,
It can also be used to coat magnetic tape with magnetic material.

[0108]

As described above, in the present invention, the coating liquid supply means for supplying the coating liquid in a fixed amount is provided toward the conveying path of the member to be coated which is conveyed with the surface to be coated facing downward. First, the coating liquid is brought into contact with the entire area of the tip side of the coating surface to form a preliminary coating layer thereon, and then a predetermined distance is provided between the coating liquid supply means and the coating surface. It is characterized in that a holding layer is held at a separation distance to form a liquid pool layer of the coating liquid, and the member to be coated is transported while keeping this state to spread the coating layer from the preliminary coating layer. Therefore, the present invention has the following effects.

Unlike the transfer film forming method in which pressure is applied to the member to be coated so that the surface to be coated is brought into close contact with the coating liquid supply means like the roll coater method (transfer film forming method), Maintaining a constant separation distance between the coated surface and the coating liquid supply means,
The film is formed using the liquid pool layer in the non-pressure state. For this reason,
When the sheared surface is formed by the conveyance of the member to be coated, the position where the sheared surface is formed is the interaction force between the surface to be coated and the liquid pool layer, that is, the coating liquid on the surface to be coated. Of the coating liquid, the surface tension of the coating liquid, and the shear rate alone are balanced, and the adhesion of the coating liquid to the coating liquid supply means side does not reach. Therefore, of course, there is no influence of the pressure on the member to be coated, and the surface condition of the coating liquid supply means does not affect the film forming characteristics, so that a film having a uniform film thickness can be realized.

Moreover, since high pressure is not applied to the coating liquid, no stress remains inside the coating liquid during film formation, and fine bubbles may be mixed into the coating liquid. Therefore, high quality and stable film formation can be realized.

The coated surface of the coated member contacts only the liquid pool layer and does not contact the coating liquid supply means or the like. That is, since it is a non-contact type film forming method, even if another layer is already formed on the surface to be coated and there is unevenness like a semiconductor device or a color filter, the film is formed without pressure, The film is formed along the unevenness, and it is possible to realize a film with good step coverage. Moreover, the coated surface is not damaged.

When a color filter is manufactured by using a colored resist as the above coating liquid, a liquid crystal display panel having excellent display performance can be realized.

When a guide roller mounted on the guide roller support via an eccentric shaft is used as the conveyance reference surface setting member, adjustment of each guide roller is easy. Further, when the guide roller support base is provided with the upper guide roller support base and the lower guide roller support base that are in contact with each other on the inclined surface, the guide rollers can be collectively adjusted.

When the transport means transports the member to be coated with the surface to be coated directly positioned on the transport reference surface, the member to be coated can be transported based on the surface to be coated itself. Further, when the holding member for holding the member to be coated is connected to the vertical direction moving means via the universal joint, the bending of this joint can absorb the unevenness in the thickness of the member to be coated. Accordingly, since the position of the coated surface can be reliably defined with respect to the transport reference surface, the deformation of the coated member hardly affects the film formation result.

When the holding member is provided with a porous vacuum chuck surface, it holds the entire surface of the member to be coated, so that it does not cause warping or the like, and it does not locally adhere to the member to be coated. Does not cause a large temperature difference.

The coating liquid supply means includes a reflux path for refluxing the coating liquid from the second storage portion where the coating liquid is recovered to the first storage portion via the pressure-feeding means, and the coating flow path. When the coating liquid regenerating means for removing impurities from the liquid is provided, the coating liquid can be repeatedly used without deteriorating the film forming characteristics.

[Brief description of drawings]

FIG. 1 is a perspective view showing a main part of a tension expansion film forming apparatus according to a first embodiment of the present invention.

FIG. 2 is a process sectional view showing a film forming operation using the film forming apparatus shown in FIG.

FIG. 3 is a schematic configuration diagram showing a main part of a tension expansion film forming apparatus according to a second embodiment of the present invention.

FIG. 4 is a front view of a tension expansion film forming apparatus according to a second embodiment of the present invention.

FIG. 5 is a plan view of a tension expansion film forming apparatus according to a second embodiment of the present invention.

FIG. 6 is a side view of a tension expansion film forming apparatus according to a second embodiment of the present invention.

FIG. 7 is a side view showing a configuration of a transport mechanism of the tension expansion film forming apparatus shown in FIG.

8 is a front view showing the configuration of a horizontal movement mechanism of the transport mechanism shown in FIG.

9 is a plan view of a work supply stage of the tension expansion film forming apparatus shown in FIG.

FIG. 10 is a front view of an upstream work guide portion of the tension expansion film forming apparatus shown in FIG.

11 is a plan sectional view of an upstream work guide portion of the tension expansion film forming apparatus shown in FIG.

FIG. 12 is a cross-sectional view of an upstream work guide portion of the tension expansion film forming apparatus shown in FIG.

13 is a schematic configuration diagram of a coating unit of the tension expansion film forming apparatus shown in FIG.

14A is a plan view of the doctor squeegee of the coating portion shown in FIG. 13, and FIG. 14B is a plan view showing the positional relationship between the doctor squeegee and the doctor roller of the coating portion shown in FIG.

15A is a plan view of a doctor squeegee different from the doctor squeegee shown in FIG. 14, and FIG. 15B is a side view showing an arrangement structure of the doctor squeegee.

16 is a plan view of a doctor roller, a liquid supply roller, and their drive system in the coating section shown in FIG.

FIG. 17 is a side view of the doctor roller and the liquid supply roller in the coating section shown in FIG.

18 is a front view of the liquid draining mechanism of the tension expansion film forming apparatus shown in FIG.

19 is a side view of the liquid draining mechanism shown in FIG. 18. FIG.

20 is a plan view of a doctor squeegee arranged in the liquid draining mechanism shown in FIG. 18. FIG.

21 is a front cross-sectional view of a liquid storage tank used in the tension expansion film forming apparatus shown in FIG.

22 is a side sectional view of the liquid storage tank of FIG. 21. FIG.

23 is a schematic configuration diagram of a piping system arranged in the tension development film forming apparatus shown in FIG.

24 is a flowchart showing a part of a flowchart of a film forming operation of the tension expansion film forming apparatus shown in FIG.

25 is a flowchart showing a part of a flowchart of a film forming operation of the tension expansion film forming apparatus shown in FIG.

26 is a flowchart showing a part of a flowchart of a film forming operation of the tension expansion film forming apparatus shown in FIG.

FIG. 27 is a process sectional view showing a film forming operation of the tension expansion film forming apparatus shown in FIG.

28A is a cross-sectional view of a panel display substrate formed by using the tension expansion film forming apparatus shown in FIG. 3, and FIG. 28B is formed by using the tension expansion film forming apparatus shown in FIG. 3C is a cross-sectional view of the semiconductor device, and FIG. 3C is a cross-section of a glass substrate formed by using the tension expansion film forming apparatus shown in FIG.

FIG. 29 is a schematic configuration diagram of a coating unit of a tension expansion film forming apparatus according to a modified example of Example 2 of the present invention.

30 is a graph showing the relationship between the distance between the liquid supply roller and the conveyance reference surface of the glass substrate and the film thickness of the tension developing film in the tension developing film forming apparatus shown in FIG.

FIG. 31 is a schematic configuration diagram of a coating unit of a tension expansion film forming apparatus according to another modification of Example 2 of the present invention.

32 is a graph showing the relationship between the transport speed of the glass substrate and the coating film thickness in the tension development film forming apparatus shown in FIG. 31.

33 is a graph showing the relationship between the rotational peripheral speed of the liquid supply roller and the coating film thickness in the tension development film forming apparatus shown in FIG.

34 is a graph showing the relationship between the distance between the liquid supply roller and the doctor roller and the coating film thickness in the tension expansion film forming apparatus shown in FIG.

FIG. 35 is a graph showing the relationship between the stop time for forming the preliminary coating layer and the coating film thickness in the tension development film forming apparatus shown in FIG. 31.

FIG. 36 is a sectional view of an improved example of the liquid supply roller shown in FIG. 16.

FIG. 37 is a schematic configuration diagram of a conventional roll coater device.

FIG. 38 is a schematic configuration diagram of a film forming apparatus according to a reference example of the present invention.

[Explanation of symbols]

1, 11 ... Tension expansion film forming device 1a, 13 ... Transport reference plane 1b, 11c ... transportation route 2 ... Coated member 2a, 21a ... Coating surface 2b, 21b ... Tip side 3a, 22a ... Liquid pool layer 4 ... Coating liquid supply means 5a, 22b ... Precoat layer 5b, 22c ... Coating layer 21 ... Glass substrate (coated member) 42, 62, 153 ... Guide roller 43 ... Guide roller support 51 ... Coated part 52, 104, 151 ... Liquid supply roller 53, 56, 103 ... Doctor squeegee 54, 102 ... Doctor roller 72 ... Liquid draining mechanism 81 ... Transport mechanism 85: Universal joint 86 ... Chuck plate

─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. ⁵ Identification code Office reference number FI technical display location G02B 5/20 101 7724-2K

Claims (17)

[Claims] 1. A coating solution for supplying a fixed amount of a coating liquid in a width direction of the transport path at a position below a transport path of a coating member transported in a substantially horizontal direction with a coating surface facing downward. When the leading end side of the surface to be coated is conveyed to a position above the coating liquid supply means, the coating liquid is brought into contact with the entire area of the leading end side and the preliminary coating is applied thereto. A preliminary coating layer forming step of forming a coating layer, and maintaining a predetermined distance between the coating liquid supply means and the surface to be coated, to form a liquid pool layer of the coating liquid there. A tension liquid spreading step of transporting the member to be coated while maintaining this state to spread the coating layer from the preliminary coating layer to the coating surface. Membrane method. 2. The pre-coating layer forming step according to claim 1, wherein the tip end side of the surface to be coated and the coating liquid supply means are held at a predetermined separation distance and the coating is performed there. A step of forming a liquid pool layer of the liquid to be deposited, temporarily stopping the member to be coated in this state, and extending the liquid pool layer to the entire tip side of the surface to be coated by the surface tension of the liquid to be coated. A method for forming a film by tension development, characterized in that 3. The liquid draining member according to claim 1 or 2, after the coating liquid developing step, a liquid draining member is brought into contact with at least one of a front end side and a rear end side of the coating surface. Then, a tension spreading film forming method is characterized in that a liquid draining step is carried out to remove excess coating liquid therefrom. 4. The tension-developing film forming method according to any one of claims 1 to 3, wherein the coating liquid is used by being set at a temperature equivalent to a storage temperature thereof. 5. The tension development film forming method defined in any one of claims 1 to 4, wherein the tension development film formed by using a colored resist as the coating liquid is used as a predetermined layer. A liquid crystal display panel comprising a color filter provided. 6. A transporting means for transporting a member to be coated in a substantially horizontal direction with a surface to be coated facing downward, and a lower portion of a transport path of the member to be coated, which is arranged in a width direction of the transport path. And a distance between the coating liquid supply means and the surface to be coated, at which a liquid pool layer of the coating liquid can be formed. When the tip end side of the surface to be coated is positioned above the coating liquid supply means and the separation distance adjusting and holding means for adjusting and holding, the coating liquid is brought into contact with the entire area of the tip side, and a preliminary operation is performed there. A preliminary coating layer forming means for forming a coating layer, wherein the conveying means forms the liquid pool layer by the separation distance adjusting and holding means after the preliminary coating layer is formed. While being held, the member to be coated is conveyed to spread the coating layer from the preliminary coating layer to the surface to be coated. A tension expansion film forming apparatus characterized by opening. 7. The pre-coating layer forming means according to claim 6, wherein the tip side of the surface to be coated and the coating liquid supply means are held at a predetermined separation distance, and the pre-coating layer forming means is applied thereto. A liquid pool layer of the liquid to be deposited is formed, and the member to be coated is temporarily stopped in this state, and the liquid pool layer is expanded to the entire tip side of the surface to be coated by the surface tension of the coating liquid. A tension-expanding film forming apparatus, which is a stop operation mechanism of a transfer unit. 8. The coating liquid supply roller according to claim 6 or 7, wherein the coating liquid supply means rotates while the roller surface passes through the coating liquid to scrape up the coating liquid. ,
The coating liquid which is disposed close to the scraping side of the coating liquid, removes an amount of the coating liquid corresponding to the distance between them from the roller surface of the coating liquid supply roller, and is supplied upward. A tension-developing film forming apparatus, comprising: a supply liquid amount defining unit that defines an amount. 9. The liquid supply amount regulating means according to claim 8, wherein the liquid supply amount regulating means is arranged in proximity to the coating liquid scooping side of the coating liquid supply roller with a predetermined separation distance and rotates in the same direction as the rotation direction. And a doctor squeegee for scraping off the coating liquid from the roller surface of the doctor roller. 10. The tension-developing film forming apparatus according to claim 8 or 9, wherein the roller surface of the coating liquid supply roller is a smooth surface. 11. The separation distance adjustment holding means according to claim 6, wherein the separation distance adjusting and holding means can support both end sides of the coating target member on both sides of a conveyance path of the coating target member. A conveyance reference plane setting member that is arranged and forms a conveyance reference plane of the coating target member by the guide surface, and the transporting means is a position defining means for directly defining the coating surface on the transport reference surface. A tension expansion film forming apparatus comprising: 12. The guide surface of the conveyance reference surface setting member according to claim 11, wherein the guide surface is a roller surface of a guide roller group attached to a guide roller support base via an eccentric shaft,
The tension expansion film-forming apparatus, wherein the separation distance adjusting and holding means includes a roller position adjusting mechanism that adjusts the position of the roller surface of each guide roller according to the mounting posture of the eccentric shaft. 13. The guide roller support base according to claim 12, wherein the guide roller group is attached and an upper guide roller support base having an inclined surface on a lower surface side and an inclined surface of the upper guide roller support base are provided. A lower guide roller support base having an inclined surface on the upper surface side, and a support base for sliding the upper guide roller support base on the lower guide roller support base using the inclined surface and fixing the same at a predetermined position. A tension expansion film forming apparatus comprising an adjusting and fixing means. 14. The holding means for holding the member to be coated, and the vertical moving means for moving the holding member in a vertical direction according to claim 6. And a horizontal moving means for moving the vertical moving means in the horizontal direction, wherein the holding member is connected to the vertical moving means via a universal joint. Deposition apparatus. 15. The holding member according to claim 14, wherein the holding member has a porous vacuum chuck surface on the lower surface side for adsorbing and supporting the entire back surface of the adhered member. Tension expansion film forming device. 16. The coating liquid supply means according to claim 6, wherein the coating liquid supply means stores a first storage portion in which the supplied coating liquid is stored, and the supplied coating liquid. A second storage part in which the coating liquid is recovered, a reflux path for returning the coating liquid from the second storage part to the first storage part via a pressure feeding means, the pressure feeding means and the first 1. A tension-developing film forming apparatus, comprising: a coating liquid regenerating unit that is interposed between the first storage unit and a refluxing coating liquid to remove impurities. 17. The tension-developing film forming apparatus defined in any one of claims 6 to 16 is one of a front end side and a rear end side of the adherend surface on which the coating layer is formed. A liquid draining member that contacts at least one side and removes excess coating liquid therefrom, and moves this liquid draining member to a position that can contact the surface to be coated and a position retracted therefrom. A tension-developing film forming apparatus comprising a liquid draining mechanism including a liquid draining member moving means.