JPH0536736A - Hybrid integrated circuit - Google Patents

Hybrid integrated circuit

Info

Publication number
JPH0536736A
JPH0536736A JP3188863A JP18886391A JPH0536736A JP H0536736 A JPH0536736 A JP H0536736A JP 3188863 A JP3188863 A JP 3188863A JP 18886391 A JP18886391 A JP 18886391A JP H0536736 A JPH0536736 A JP H0536736A
Authority
JP
Japan
Prior art keywords
resin layer
insulating resin
substrate
chip
hybrid integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3188863A
Other languages
Japanese (ja)
Inventor
Noriaki Sakamoto
則明 阪本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP3188863A priority Critical patent/JPH0536736A/en
Publication of JPH0536736A publication Critical patent/JPH0536736A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/05Insulated conductive substrates, e.g. insulated metal substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/18Printed circuits structurally associated with non-printed electric components
    • H05K1/181Printed circuits structurally associated with non-printed electric components associated with surface mounted components
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistors
    • H05K3/303Assembling printed circuits with electric components, e.g. with resistors with surface mounted components
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistors
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/341Surface mounted components
    • H05K3/3431Leadless components
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/531Shapes of wire connectors
    • H10W72/5363Shapes of wire connectors the connected ends being wedge-shaped
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/884Die-attach connectors and bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/734Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked insulating package substrate, interposer or RDL
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/754Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
  • Die Bonding (AREA)

Abstract

(57)【要約】 【目的】 大出力回路と小出力回路とが形成された大出
力用の混成集積回路の大出力用回路の熱放散を向上させ
且つ小出力回路を形成するチップ部品の半田接合部にお
ける温度サイクルによる半田接合部へのクラック発生を
防止し、且つチップ部品の熱放散性を向上させる。 【構成】 基板(1)の一主面上に低熱抵抗の第1の絶
縁樹脂層(2)と所定位置に孔(7B)を有した延性特
性を有する第2の絶縁樹脂層(5)を設け、第1の絶縁
樹脂層(2)上にパワー半導体素子(6)を搭載し、チ
ップ部品(4)を孔(7B)領域内に配置した接着剤層
(12)で基板(1)上に固定されるように第2の絶縁
樹脂層(5)上に搭載する。
(57) [Abstract] [Purpose] Improves heat dissipation of a large output circuit of a large output hybrid integrated circuit in which a large output circuit and a small output circuit are formed and solders chip parts forming the small output circuit. This prevents cracks from occurring in the solder joint due to the temperature cycle at the joint, and improves the heat dissipation of the chip component. [Structure] A first insulating resin layer (2) having a low thermal resistance and a second insulating resin layer (5) having ductility having holes (7B) at predetermined positions are provided on one main surface of a substrate (1). The power semiconductor element (6) is mounted on the first insulating resin layer (2), and the chip component (4) is arranged on the substrate (1) with the adhesive layer (12) arranged in the hole (7B) region. It is mounted on the second insulating resin layer (5) so as to be fixed to.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は混成集積回路に関し、特
にパワー素子が搭載された混成集積回路の改良に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hybrid integrated circuit, and more particularly to improvement of a hybrid integrated circuit having a power device.

【0002】[0002]

【従来の技術】従来の混成集積回路を図5に示す。混成
集積回路基板(21)は表面をアルマイト処理したアル
ミニウム基板を用い、基板(21)上に絶縁樹脂層を介
して所望形状の導電路(22)が形成されている。かか
る導電路(22)上あるいは導電路(22)間に半導体
チップ、チップコンデンサー及び印刷抵抗体等の回路素
子(23)が搭載され、導電路(22)を介して相互接
続されている。尚、図示されないが導電路(22)は基
板(21)に貼着されたエポキシ樹脂等の絶縁性接着剤
層を介して形成されている。
2. Description of the Related Art A conventional hybrid integrated circuit is shown in FIG. The hybrid integrated circuit substrate (21) is an aluminum substrate whose surface is anodized, and a conductive path (22) having a desired shape is formed on the substrate (21) via an insulating resin layer. Circuit elements (23) such as semiconductor chips, chip capacitors and printed resistors are mounted on or between the conductive paths (22) and are interconnected via the conductive paths (22). Although not shown, the conductive path (22) is formed via an insulating adhesive layer such as an epoxy resin adhered to the substrate (21).

【0003】上述した混成集積回路は一般的に小電力用
に用いられる。これは、基板(21)上に絶縁樹脂層
(図示しない)を介して回路形成されるため熱抵抗が大
きくなるからである。そこで、かかる混成集積回路構造
の絶縁樹脂層中にアルミナ、シリカ、ボロン等のフィラ
ーを含有させて熱抵抗を小さくした混成集積回路が種々
提案されている。従って、大出力用あるいは大出力回路
とその周辺の小信号回路を有する混成集積回路にあって
は、一般的に熱抵抗を優先させたフィラー入り樹脂層を
有した基板上にそれらの回路が形成される。
The hybrid integrated circuits described above are commonly used for low power applications. This is because a circuit is formed on the substrate (21) via an insulating resin layer (not shown), so that the thermal resistance increases. Therefore, various hybrid integrated circuits have been proposed in which a filler such as alumina, silica, or boron is contained in the insulating resin layer of the hybrid integrated circuit structure to reduce the thermal resistance. Therefore, in the case of a hybrid integrated circuit having a large output circuit or a large output circuit and a small signal circuit around the large output circuit, those circuits are generally formed on a substrate having a resin layer containing a filler giving priority to thermal resistance. To be done.

【0004】[0004]

【発明が解決しようとする課題】斯上した混成集積回路
上に搭載されるチップ抵抗、チップコンデンサー等のチ
ップ部品は一般に半田で導電路上に接続されているため
に以下の問題が発生する。即ち、アルミニウム基板をベ
ース基板とした基板の熱膨張係数αが23×10 -6/℃
であり、上記したチップ部品、例えばチップ抵抗の熱膨
張係数αが7×10-6/℃、チップコンデンサーの熱膨
張係数αが10×10-6/℃であるため両者の膨張係数
αが著しく異なるために温度サイクルによってチップ部
品と導電路を接続する半田固着部分に温度サイクルによ
るストレスが加わり、半田固着部分にクラックが発生し
接続不良となる問題がある。
SUMMARY OF THE INVENTION A hybrid integrated circuit as described above.
Chips such as chip resistors and chip capacitors mounted on top
Since the plug-in parts are generally connected on the conductive path with solder,
The following problems occur. That is, an aluminum substrate is
The thermal expansion coefficient α of the substrate used as the base substrate is 23 × 10 -6/ ° C
And the thermal expansion of the above-mentioned chip component, such as a chip resistor.
Expansion coefficient α is 7 × 10-6/ ° C, thermal expansion of chip capacitors
Expansion coefficient α is 10 × 10-6/ ° C, so both expansion coefficients
Due to the significant difference in α
The temperature of the soldered part that connects the
Stress is applied and cracks occur in the soldered part.
There is a problem of poor connection.

【0005】次にクラックが発生するメカニズムについ
て説明する。上記したようにアルミニウム基板の膨張係
数αが23×10-6/℃、チップ部品の膨張係数αが7
〜10×10-6/℃であり、チップ部品を接合する半田
の膨張係数αが約23×10 -6/℃であるため、室温状
態では図6のAの如く、基板、半田、チップ部に応力が
加わらない。しかし、高温状態では図6のBの如く、基
板と半田のαがチップ部品より大きいため矢印方向に引
張られ、その結果、接合半田は矢印の方向にのみすそが
広がるように変形する。又、低温状態では図6のCに示
す如く、反対の矢印方向に圧縮力が加えられその結果、
接合半田は矢印方向にのみすそが広がる。例えば、−5
0〜+150℃の条件の厳しい温度サイクル条件で数十
〜数百サイクルくり返すことにより、上述したようにα
の著しく異なるチップ部品と半田の接合面にクラックが
発生する。何故なら、温度サイクルにより微結晶状態に
ある半田成分のスズと鉛成分が分離し凝集して半田内に
連続的な鉛層を形成するため機械的強度を低下させるか
らである。
Next, the mechanism by which cracks occur
Explain. As described above, the expansion coefficient of the aluminum substrate
The number α is 23 × 10-6/ ° C, expansion coefficient α of chip parts is 7
~ 10 x 10-6/ ° C, solder for joining chip components
Expansion coefficient α is about 23 × 10 -6/ ° C, so room temperature
In the state, as shown in A of FIG. 6, stress is applied to the substrate, the solder, and the chip part.
Do not join. However, in the high temperature state, as shown in FIG.
Since α of the plate and solder is larger than the chip component, pull in the direction of the arrow.
As a result, the joint solder is only laid in the direction of the arrow.
It transforms to spread. In the low temperature state, it is shown in Fig. 6C.
As a result, compressive force is applied in the opposite arrow direction, and as a result,
The hem of the bonding solder spreads only in the direction of the arrow. For example, -5
Dozens under severe temperature cycle conditions of 0 to + 150 ° C
~ By repeating several hundred cycles, as described above, α
Cracks on the joint surface of chip parts and solder
Occur. The reason is that a temperature cycle produces a microcrystalline state.
Tin and lead components of a certain solder component are separated and aggregated in the solder
Does it reduce mechanical strength to form a continuous lead layer?
It is.

【0006】上述した問題は金属基板、特にアルミニウ
ム基板をベースとした集積回路特有の問題であり、プリ
ント基板等の他の基板をベースとした集積回路では問題
にならない。何故なら、そのようなベース基板であって
はチップ部品あるいは印刷抵抗体の膨張係数αと基板の
膨張係数αの差による上述した問題が発生しないからで
ある。
The above-mentioned problems are peculiar to integrated circuits based on metal substrates, particularly aluminum substrates, and do not occur on integrated circuits based on other substrates such as printed boards. This is because such a base substrate does not cause the above-mentioned problems due to the difference between the expansion coefficient α of the chip component or the printed resistor and the expansion coefficient α of the substrate.

【0007】[0007]

【課題を解決するための手段】本発明は、上述した課題
に鑑みて為されたものであり、金属基板の同一主面に低
熱抵抗樹脂層と延性特性を有する絶縁樹脂層が存在し、
前記両樹脂層上に所望形状の導電路が形成され、前記低
熱抵抗樹脂層上にパワー半導体素子を固着搭載し前記絶
縁樹脂層上にチップ抵抗等の回路素子を固着搭載した混
成集積回路において、前記回路素子は前記絶縁樹脂層に
設けられた孔をまたぎ、前記孔内に配置されたフィラー
入りの接着樹脂層を介して基板上に搭載したことを特徴
とする。
The present invention has been made in view of the above-mentioned problems, and a low thermal resistance resin layer and an insulating resin layer having ductility are present on the same main surface of a metal substrate,
In a hybrid integrated circuit in which a conductive path having a desired shape is formed on both the resin layers, a power semiconductor element is fixedly mounted on the low thermal resistance resin layer, and a circuit element such as a chip resistor is fixedly mounted on the insulating resin layer, The circuit element is characterized in that it is mounted on a substrate through a hole provided in the insulating resin layer and an adhesive resin layer containing a filler arranged in the hole.

【0008】また、前記延性特性を有した絶縁樹脂層と
してポリイミド樹脂を用いたことを特徴とする。
Further, a polyimide resin is used as the insulating resin layer having the ductility characteristic.

【0009】[0009]

【作用】以上のように構成される混成集積回路において
は、パワー半導体素子が低熱抵抗樹脂層上に搭載され、
それ以外の他の回路素子、例えばチップ抵抗、チップコ
ンデンサー等のチップ部分は延性特性を有する絶縁樹脂
層上に搭載された構造となるために、混成集積回路の使
用等により、厳しい条件下の温度サイクルが生じたとし
ても延性特性を有する絶縁樹脂層上に搭載されたチップ
抵抗、チップコンデンサー等のチップ部品状の回路素子
にあっては、温度サイクルにより生じるチップ部品の半
田接合部のストレスは延性特性を有する絶縁樹脂層によ
って緩和することができるとともにチップ部品がフィラ
ー入りの接着樹脂層を介して基板上に仮接着されるため
チップ部品の熱放散性を向上することができる。
In the hybrid integrated circuit configured as described above, the power semiconductor element is mounted on the low thermal resistance resin layer,
Other circuit elements such as chip resistors, chip capacitors, and other chip parts are mounted on an insulating resin layer that has ductility characteristics. Even if a cycle occurs, in the case of chip resistors, chip capacitors, and other chip component-shaped circuit elements mounted on an insulating resin layer that has ductility, the stress on the solder joints of chip components caused by temperature cycling is ductile. This can be alleviated by the insulating resin layer having characteristics, and the heat dissipation of the chip component can be improved because the chip component is temporarily adhered to the substrate via the adhesive resin layer containing the filler.

【0010】[0010]

【実施例】以下に図1に示した実施例に基づいて本発明
の混成集積回路を説明する。図1は本発明の混成集積回
路を示す要部拡大断面図であり、(1)は金属基板、
(2)は第1の絶縁樹脂層、(3)は導電路、(4)は
チップ抵抗、チップコンデンサー等のチップ部品、(1
2)はチップ部品を仮接着する仮接着剤層、(5)は第
2の絶縁樹脂層、(6)はパワー半導体素子である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A hybrid integrated circuit of the present invention will be described below based on the embodiment shown in FIG. FIG. 1 is an enlarged sectional view of an essential part showing a hybrid integrated circuit of the present invention. (1) is a metal substrate,
(2) is a first insulating resin layer, (3) is a conductive path, (4) is a chip component such as a chip resistor or a chip capacitor, (1)
Reference numeral 2) is a temporary adhesive layer for temporarily bonding the chip component, (5) is a second insulating resin layer, and (6) is a power semiconductor element.

【0011】金属基板(1)としては、例えば、アルミ
ニウム基板あるいはアルミニウム基板表面をアルマイト
処理したものを用い、ここでは後者のアルミニウム基板
を用いるものとする。その基板(1)の一主面上には絶
縁樹脂層を介して所望形状の導電路が形成され、その導
電路上に種々の回路素子が固着搭載される。さて、本発
明においては基板(1)上に材質の異なる二種類の絶縁
樹脂層(2)(5)が存在する。即ち、パワートランジ
スタ等のパワー半導体素子(6)が搭載される第1の絶
縁樹脂層(2)とパワー半導体素子(6)以外の回路素
子(4)が搭載される第2の絶縁樹脂層(5)を有す
る。
As the metal substrate (1), for example, an aluminum substrate or an aluminum substrate whose surface is anodized is used, and the latter aluminum substrate is used here. A conductive path having a desired shape is formed on one main surface of the substrate (1) via an insulating resin layer, and various circuit elements are fixedly mounted on the conductive path. In the present invention, two kinds of insulating resin layers (2) and (5) made of different materials are present on the substrate (1). That is, the first insulating resin layer (2) on which the power semiconductor element (6) such as a power transistor is mounted and the second insulating resin layer (on which the circuit element (4) other than the power semiconductor element (6) is mounted ( 5).

【0012】第1の絶縁樹脂層(2)はパワー半導体素
子(6)の熱放散を向上させるために低熱抵抗タイプの
絶縁樹脂層が用いられている。かかる第1の絶縁樹脂層
(2)は、例えばエポキシ樹脂、フェノール樹脂、キシ
レン樹脂等の樹脂中に、所定重量比、例えば30〜80
%の割合のBeO,MgO,Al23等の酸化物セラミ
ックス,AIN,BN等の窒化物セラミックスの所定粒
径のフィラーが混入されており、第1の絶縁樹脂層
(2)の熱抵抗を低く設定している。
As the first insulating resin layer (2), a low thermal resistance type insulating resin layer is used in order to improve heat dissipation of the power semiconductor element (6). The first insulating resin layer (2) is formed of a resin such as an epoxy resin, a phenol resin, or a xylene resin in a predetermined weight ratio, for example, 30 to 80.
% Of BeO, MgO, Al 2 O 3 and other oxide ceramics, AIN, BN and other nitride ceramics fillers of a predetermined particle size are mixed, and the thermal resistance of the first insulating resin layer (2) is increased. Is set low.

【0013】一方、第2の絶縁樹脂層(5)はヒートサ
イクル時に基板(1)と第2の絶縁樹脂層(5)上に搭
載する回路素子(4)の熱膨張率αの差によるストレス
を吸収緩和できる延性特性を有する絶縁樹脂層が用いら
れる。第2の絶縁樹脂層(5)としてカプトン(商品
名)等のポリイミド樹脂が用いられる。かかるポリイミ
ド樹脂の延性特性は約80〜85%位有し、十分にヒー
トサイクルによるストレスを吸収緩和できるものであ
る。
On the other hand, the second insulating resin layer (5) is stressed due to the difference in the coefficient of thermal expansion α of the circuit element (4) mounted on the substrate (1) and the second insulating resin layer (5) during the heat cycle. An insulating resin layer having a ductile characteristic capable of absorbing and relaxing is used. A polyimide resin such as Kapton (trade name) is used as the second insulating resin layer (5). The ductility of such a polyimide resin is about 80 to 85%, and is capable of sufficiently absorbing and relaxing stress due to heat cycle.

【0014】ところで、パワー半導体素子(6)が搭載
される第1の絶縁樹脂層(2)は基板(1)の全面に貼
着される。このとき、第1の絶縁樹脂層(2)のパワー
半導体素子(6)の固着領域には、あらかじめ銅箔が一
体化されている。そして、その銅箔をエッチングしてパ
ワー半導体素子(6)が固着される固着パッド(3)と
その固着パッド(3)から延在されたパワー用導電路
(図示しない)が形成される。
By the way, the first insulating resin layer (2) on which the power semiconductor element (6) is mounted is attached to the entire surface of the substrate (1). At this time, a copper foil is previously integrated in the fixing region of the power semiconductor element (6) of the first insulating resin layer (2). Then, the copper foil is etched to form a fixing pad (3) to which the power semiconductor element (6) is fixed and a power conductive path (not shown) extending from the fixing pad (3).

【0015】パワー半導体素子(6)の固着領域以外の
第1の絶縁樹脂層(2)上に接着剤層(6A)を介して
上記した第2の絶縁樹脂層(5)が貼着される。第2の
絶縁樹脂層(5)上にはあらかじめ接着剤層(6B)を
介して銅箔が一体化され、上述した、パワー半導体素子
(6)の固着領域を囲むような孔(7A)とチップ部品
(4)を仮接着するための孔(7B)が設けられてい
る。この孔(7)により先に形成した固着パッド(3)
及びパワー用導電路及び第1の絶縁樹脂層(2)の一部
が露出されることになる。第1の絶縁樹脂層(2)上に
第2の絶縁樹脂層(5)を貼着した後、第2の絶縁樹脂
層(5)上の銅箔をエッチングして所望形状の導電路
(3)が形成される。このとき、第1の絶縁樹脂層
(2)の露出部分、即ち、パワー半導体固着パッド
(3)及びパワー用導電路上には保護用のレジストイン
クが塗布されているために何んら悪影響は発生しない。
The above-mentioned second insulating resin layer (5) is adhered on the first insulating resin layer (2) other than the fixing region of the power semiconductor element (6) via the adhesive layer (6A). . A copper foil is previously integrated on the second insulating resin layer (5) via an adhesive layer (6B), and has a hole (7A) surrounding the fixing region of the power semiconductor element (6). A hole (7B) is provided for temporarily adhering the chip component (4). The fixing pad (3) previously formed by this hole (7)
Also, a part of the power conductive path and the first insulating resin layer (2) is exposed. After sticking the second insulating resin layer (5) on the first insulating resin layer (2), the copper foil on the second insulating resin layer (5) is etched to form a conductive path (3) having a desired shape. ) Is formed. At this time, no adverse effect occurs because the protective resist ink is applied to the exposed portion of the first insulating resin layer (2), that is, the power semiconductor fixing pad (3) and the power conductive path. do not do.

【0016】基板(1)上に第1の絶縁樹脂層(2)及
び第2の絶縁樹脂層(5)を貼着し、夫々の樹脂層
(2)(5)上に所定の導電路(3)(3)を形成した
後、かかる導電路(3)(3)上に所定の回路素子が搭
載される。即ち、第1の絶縁樹脂層(2)上の固着パッ
ド(3)にはろう材により固着された銅片等のヒートシ
ンク(8)を介してパワー半導体素子(6)が搭載接続
される。一方、第2の絶縁樹脂層(5)上の導電路
(3)にはチップ抵抗、チップコンデンサー等のチップ
部品(4)及び図示はされないがその他の小信号系の半
導体素子が半田等のろう材により固着搭載されている。
A first insulating resin layer (2) and a second insulating resin layer (5) are adhered to a substrate (1), and a predetermined conductive path (on the respective resin layers (2) and (5)). 3) After forming (3), predetermined circuit elements are mounted on the conductive paths (3) and (3). That is, the power semiconductor element (6) is mounted and connected to the fixing pad (3) on the first insulating resin layer (2) via a heat sink (8) such as a copper piece fixed by a brazing material. On the other hand, in the conductive path (3) on the second insulating resin layer (5), chip parts (4) such as a chip resistor and a chip capacitor, and other small signal type semiconductor elements (not shown) may be solder or the like. It is fixedly mounted by the material.

【0017】ところで、本発明にあっては、チップコン
デンサー、チップ抵抗のチップ部品(4)を導電路
(3)上に接続する場合、上述したようにそれらのチッ
プ部品(4)が搭載される領域の第2の絶縁樹脂層
(5)の孔(7B)によって露出された第1の絶縁樹脂
層(2)とチップ部品(4)とが固定されている。即
ち、チップ部品(4)の接続電極と導電路とを半田接合
する前に基板(1)上にチップ部品(4)を仮接着する
仮接着剤(12)によって低熱抵抗の第1の絶縁樹脂層
(2)とチップ部品(4)とが仮接着される。仮接着剤
(12)はチップ部品(4)を仮接着するだけでなく、
チップ部品(4)の発熱を効果的に放熱させるためにア
クリル樹脂、シリコン樹脂等の接着剤中に所望重量比の
フィラーが混入されている。この構造によれば、チップ
部品(4)を基板(1)上に仮接着できるとともにチッ
プ部品(4)が発熱したとしてもその熱を効果的に外部
へ放出することができる。
By the way, according to the present invention, when the chip components (4) of the chip capacitor and the chip resistor are connected on the conductive path (3), the chip components (4) are mounted as described above. The chip component (4) and the first insulating resin layer (2) exposed by the holes (7B) of the second insulating resin layer (5) in the region are fixed. That is, the first insulating resin having a low thermal resistance by the temporary adhesive (12) for temporarily adhering the chip component (4) on the substrate (1) before soldering the connection electrode of the chip component (4) and the conductive path. The layer (2) and the chip component (4) are temporarily bonded. The temporary adhesive (12) not only temporarily bonds the chip component (4),
In order to effectively dissipate the heat generated by the chip component (4), a filler having a desired weight ratio is mixed in an adhesive such as acrylic resin or silicon resin. According to this structure, the chip component (4) can be temporarily adhered to the substrate (1), and even if the chip component (4) generates heat, the heat can be effectively released to the outside.

【0018】また、パワー半導体素子(6)は第2の絶
縁樹脂層(5)の孔(7)の周端部に延材された導電路
(3)とワイヤ線(9)により接続され、パワー半導体
素子(6)と他の回路素子(4)とが相互に電気接続さ
れることになる。このとき、導電路(3)上にはワイヤ
ボンディングを容易にするためにNiメッキ(10)処
理が施されている。
The power semiconductor element (6) is connected by a wire line (9) to the conductive path (3) extended at the peripheral end of the hole (7) of the second insulating resin layer (5), The power semiconductor element (6) and the other circuit element (4) are electrically connected to each other. At this time, Ni plating (10) treatment is applied to the conductive path (3) to facilitate wire bonding.

【0019】本発明の構造に依れば、基板(1)上に上
述したように低熱抵抗樹脂層の第1の絶縁樹脂層(2)
と延性特性を有する第2の絶縁樹脂層(5)とを備えて
いるために発熱を有するパワー半導体素子の熱量を十分
に放散できると共に厳しい温度サイクル、例えば−50
〜+150℃範囲であってもαの差によるチップ抵抗、
チップコンデンサー等のチップ部品(4)の半田接合部
に生ずるストレスは第2の絶縁樹脂層(5)によって吸
収されるため、従来の如き、半田接合部のクラック発生
を著しく抑制することができる。
According to the structure of the present invention, the first insulating resin layer (2) of the low thermal resistance resin layer is formed on the substrate (1) as described above.
And the second insulating resin layer (5) having ductility, the heat quantity of the heat-generating power semiconductor element can be sufficiently dissipated and a severe temperature cycle, for example, -50.
Chip resistance due to the difference of α even in the range of + 150 ° C,
Since the stress generated in the solder joint portion of the chip component (4) such as the chip capacitor is absorbed by the second insulating resin layer (5), it is possible to remarkably suppress the crack generation in the solder joint portion as in the conventional case.

【0020】それでは、本発明構造を用いると何故チッ
プコンデンサー、チップ抵抗等のチップ部品(4)の半
田接合部にクラックが生じにくくなることを図2を示し
て説明する。チップ部品(4)を固着した基板(1)を
約150℃の高温状態に放置すると基板(1)のαが2
3×10-6/℃と大きいために基板(1)には矢印に示
す大きな応力が生じる。そして、第1の絶縁樹脂層
(2)も所定含有量のフィラーが混入されているために
αが約23×10-6/℃と大きくなるため基板(1)と
同様に大きな応力が生じる。この第1の絶縁樹脂層
(2)に生じる応力は、膜厚が約数十μと薄いため実質
的には基板(1)の応力がそのまま第1の絶縁樹脂層
(2)に伝達される。しかし、チップ部品(4)は延性
特性を有する第2の絶縁樹脂層(5)上に搭載されてい
るため、基板(1)で生じた大きな応力は第2の絶縁樹
脂層(5)内で厚み方向に従って矢印の如く吸収緩和さ
れ、半田接合部(11)には基板(1)で生じた大きな
応力が加わらないことになる。このとき、第2の絶縁樹
脂層(5)の膜厚が約10μ以下だと基板(1)で生じ
た応力を有効に緩和することができないために、第2の
絶縁樹脂層(5)の膜厚を約10μ以上に設定すると十
分に基板(1)で発生した応力を緩和することができ
る。以上に述べたように基板(1)で発生した応力は第
2の絶縁樹脂層(5)内で緩和されるために、半田接合
部(11)の半田成分の微結晶状態が保持され半田接合
部とコンデンサー等のチップ部品(4)の界面にクラッ
クが発生しないものである。
Now, it will be explained with reference to FIG. 2 why the use of the structure of the present invention makes cracks less likely to occur at the solder joints of the chip component (4) such as a chip capacitor and a chip resistor. When the substrate (1) to which the chip parts (4) are fixed is left at a high temperature of about 150 ° C, α of the substrate (1) becomes 2
Since it is as large as 3 × 10 −6 / ° C., a large stress indicated by an arrow is generated on the substrate (1). Then, since the first insulating resin layer (2) also has a predetermined content of the filler mixed therein, α becomes as large as about 23 × 10 −6 / ° C., and thus a large stress is generated as in the case of the substrate (1). Since the stress generated in the first insulating resin layer (2) is as thin as several tens of μ, the stress of the substrate (1) is substantially transmitted to the first insulating resin layer (2) as it is. . However, since the chip component (4) is mounted on the second insulating resin layer (5) having ductility, a large stress generated in the substrate (1) is generated in the second insulating resin layer (5). Absorption is relaxed as indicated by the arrow in the thickness direction, and the large stress generated in the substrate (1) is not applied to the solder joint portion (11). At this time, if the film thickness of the second insulating resin layer (5) is about 10 μm or less, the stress generated in the substrate (1) cannot be effectively relieved. When the film thickness is set to about 10 μm or more, the stress generated in the substrate (1) can be relaxed sufficiently. As described above, the stress generated in the substrate (1) is relaxed in the second insulating resin layer (5), so that the microcrystalline state of the solder component of the solder joint portion (11) is maintained and the solder joint is performed. No crack is generated at the interface between the part and the chip component (4) such as the capacitor.

【0021】一方、図3は本発明の構造(A)と従来の
構造(B)上にチップコンデンサー(4)を搭載したと
きの温度サイクル試験での半田接合部へのクラック発生
不良率を示した特性図である。尚、温度サイクル条件は
−40℃(30分)〜+125℃(30分)で行い、ア
ルミニウム基板上に3.2×1.6mmのチップコンデ
ンサーを搭載した。図から明らかな如く、従来の(B)
では670サイクルで不良が発生し始め、1000サイ
クルでは試験サンプル数8個中全てのサンプルで半田ク
ラックによる接続不良が発生した。それに対して、本発
明の(A)では1500サイクルにおいても半田接合部
のクラックの発生が全くないことが確認された。
On the other hand, FIG. 3 shows the defective crack generation rate at the solder joint in the temperature cycle test when the chip capacitor (4) is mounted on the structure (A) of the present invention and the conventional structure (B). FIG. The temperature cycle condition was −40 ° C. (30 minutes) to + 125 ° C. (30 minutes), and a 3.2 × 1.6 mm chip capacitor was mounted on an aluminum substrate. As is clear from the figure, the conventional (B)
In 670 cycles, a defect started to occur, and in 1000 cycles, a connection defect due to a solder crack occurred in all of the 8 test samples. On the other hand, in (A) of the present invention, it was confirmed that no cracks were generated at the solder joint even after 1500 cycles.

【0022】図4は他の実施例を示す断面図であり、基
板(1)の同一主面の同一層に略同一膜厚の第1の絶縁
樹脂層(2)と第2の絶縁樹脂層(5)とを形成したも
のである。かかる構造によれば第2の絶縁樹脂層(5)
に孔(7B)を設けると基板(1)のアルマイト層が露
出され放熱作用は向上するものの耐圧を考慮すれば先に
述べた実施例の方が好ましい。
FIG. 4 is a sectional view showing another embodiment, in which the first insulating resin layer (2) and the second insulating resin layer having substantially the same film thickness are formed on the same layer on the same main surface of the substrate (1). (5) and are formed. According to this structure, the second insulating resin layer (5)
When the hole (7B) is provided in the substrate (1), the alumite layer of the substrate (1) is exposed to improve the heat radiation function, but the above-mentioned embodiment is preferable in consideration of the breakdown voltage.

【0023】[0023]

【発明の効果】以上に詳述した如く、本発明に依れば、
厳い条件下の温度サイクルにおいても、チップコンデン
サー、チップ抵抗等のチップ部品の半田接合部に生じて
いたクラック発生を略完全に防止することができる。そ
の結果、パワー半導体素子の熱放散性に優れかつ極めて
厳い温度サイクル条件下に適合した高信頼性の大出力用
の混成集積回路を実現することができる。
As described in detail above, according to the present invention,
Even in a temperature cycle under severe conditions, it is possible to almost completely prevent the occurrence of cracks at the solder joints of chip components such as chip capacitors and chip resistors. As a result, it is possible to realize a highly reliable hybrid integrated circuit for high output which is excellent in heat dissipation of the power semiconductor element and which is suitable for extremely severe temperature cycle conditions.

【0024】また、本発明によれば、延性特性を有する
第1の絶縁樹脂層上に搭載されるチップ部品は第1の絶
縁樹脂層に設けられた孔領域内に配置された熱伝性の優
れた接着剤を介して基板と固定されることにより、チッ
プ部品が発熱したとしてもその熱を効率よく放出するこ
とができる。
Further, according to the present invention, the chip component mounted on the first insulating resin layer having the ductility characteristic has the thermal conductivity arranged in the hole region provided in the first insulating resin layer. By being fixed to the substrate via the excellent adhesive, even if the chip component generates heat, the heat can be efficiently released.

【図面の簡単な説明】[Brief description of drawings]

【図1】図1は本発明の一の実施例を示す要部拡大断面
図である。
FIG. 1 is an enlarged sectional view of an essential part showing an embodiment of the present invention.

【図2】図2は本発明の実施例の半田接合部における応
力を説明する図である。
FIG. 2 is a diagram illustrating stress in a solder joint portion according to an embodiment of the present invention.

【図3】図3は温度サイクル試験における半田接合部の
クラック発生不良率を示す特性図である。
FIG. 3 is a characteristic diagram showing a crack generation defect rate of a solder joint portion in a temperature cycle test.

【図4】図4は他の実施例を示す要部拡大断面図であ
る。
FIG. 4 is an enlarged cross-sectional view of a main part showing another embodiment.

【図5】図5は従来の混成集積回路を示す断面図であ
る。
FIG. 5 is a cross-sectional view showing a conventional hybrid integrated circuit.

【図6】図6は従来の半田接合部における応力を説明す
る図である。
FIG. 6 is a diagram illustrating stress in a conventional solder joint.

【符号の説明】[Explanation of symbols]

(1) 金属基板 (2) 第1の絶縁樹脂層 (3) 導電路 (4) チップ部品 (5) 第2の絶縁樹脂層 (6) パワー半導体素子 (12) 仮接着剤層 (1) Metal substrate (2) First insulating resin layer (3) Conductive path (4) Chip parts (5) Second insulating resin layer (6) Power semiconductor element (12) Temporary adhesive layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 金属基板の同一主面に低熱抵抗樹脂層と
延性特性を有する絶縁樹脂層が存在し、前記両樹脂層上
に所望形状の導電路が形成され、前記低熱抵抗樹脂層上
にパワー半導体素子を固着搭載し前記絶縁樹脂層上にチ
ップ抵抗等の回路素子を固着搭載した混成集積回路にお
いて、 前記回路素子は前記絶縁樹脂層に設けられた孔をまた
ぎ、前記孔内に配置されたフィラー入りの接着樹脂層を
介して基板上に搭載固定したことを特徴とする混成集積
回路。
1. A low thermal resistance resin layer and an insulating resin layer having ductility are present on the same main surface of a metal substrate, and a conductive path having a desired shape is formed on both of the resin layers, and the low thermal resistance resin layer is formed on the low thermal resistance resin layer. In a hybrid integrated circuit in which a power semiconductor element is fixedly mounted and a circuit element such as a chip resistor is fixedly mounted on the insulating resin layer, the circuit element straddles a hole provided in the insulating resin layer and is arranged in the hole. A hybrid integrated circuit characterized by being mounted and fixed on a substrate through an adhesive resin layer containing a filler.
【請求項2】 前記延性特性を有した絶縁樹脂層として
ポリイミド樹脂を用いたことを特徴とする請求項1記載
の混成集積回路。
2. The hybrid integrated circuit according to claim 1, wherein a polyimide resin is used as the insulating resin layer having the ductility characteristic.
JP3188863A 1991-07-29 1991-07-29 Hybrid integrated circuit Pending JPH0536736A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3188863A JPH0536736A (en) 1991-07-29 1991-07-29 Hybrid integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3188863A JPH0536736A (en) 1991-07-29 1991-07-29 Hybrid integrated circuit

Publications (1)

Publication Number Publication Date
JPH0536736A true JPH0536736A (en) 1993-02-12

Family

ID=16231186

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3188863A Pending JPH0536736A (en) 1991-07-29 1991-07-29 Hybrid integrated circuit

Country Status (1)

Country Link
JP (1) JPH0536736A (en)

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