JPH0541698B2 - - Google Patents

Info

Publication number
JPH0541698B2
JPH0541698B2 JP13750988A JP13750988A JPH0541698B2 JP H0541698 B2 JPH0541698 B2 JP H0541698B2 JP 13750988 A JP13750988 A JP 13750988A JP 13750988 A JP13750988 A JP 13750988A JP H0541698 B2 JPH0541698 B2 JP H0541698B2
Authority
JP
Japan
Prior art keywords
crucible
crucible body
evaporation source
aluminum
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP13750988A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01306555A (ja
Inventor
Kenichiro Yamanishi
Takashi Tsukasaki
Masashi Yasunaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP13750988A priority Critical patent/JPH01306555A/ja
Publication of JPH01306555A publication Critical patent/JPH01306555A/ja
Publication of JPH0541698B2 publication Critical patent/JPH0541698B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
JP13750988A 1988-06-06 1988-06-06 蒸発源用るつぼ Granted JPH01306555A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13750988A JPH01306555A (ja) 1988-06-06 1988-06-06 蒸発源用るつぼ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13750988A JPH01306555A (ja) 1988-06-06 1988-06-06 蒸発源用るつぼ

Publications (2)

Publication Number Publication Date
JPH01306555A JPH01306555A (ja) 1989-12-11
JPH0541698B2 true JPH0541698B2 (pt) 1993-06-24

Family

ID=15200332

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13750988A Granted JPH01306555A (ja) 1988-06-06 1988-06-06 蒸発源用るつぼ

Country Status (1)

Country Link
JP (1) JPH01306555A (pt)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG10201608496UA (en) * 2016-10-11 2018-05-30 Au Optronics Corp Crucible

Also Published As

Publication number Publication date
JPH01306555A (ja) 1989-12-11

Similar Documents

Publication Publication Date Title
US5180477A (en) Thin film deposition apparatus
JP2710670B2 (ja) 蒸気発生源用るつぼ
JPH0236673B2 (pt)
JPH01306555A (ja) 蒸発源用るつぼ
JPH0830265B2 (ja) 薄膜形成装置
JPS60262963A (ja) 化合物薄膜蒸着装置
JPH0735569B2 (ja) 薄膜形成装置
JPS60125368A (ja) 薄膜蒸着装置
JPS6329925A (ja) 化合物薄膜形成装置
JPH0215630B2 (pt)
JPS62287617A (ja) 薄膜形成装置
JPS60158619A (ja) 薄膜蒸着装置
JPS60124929A (ja) 薄膜蒸着装置
JPS60124923A (ja) 薄膜蒸着装置
JPH0510423B2 (pt)
JPS60124915A (ja) 薄膜蒸着装置
JPH03158458A (ja) クラスターイオンビーム装置
JPS634060A (ja) 薄膜形成装置
JPS6320820A (ja) 薄膜蒸着装置
JPH0351087B2 (pt)
JPH0443412B2 (pt)
JPH0447969B2 (pt)
JPH05311407A (ja) 薄膜形成装置
JPH0215629B2 (pt)
JPS60124916A (ja) 薄膜蒸着装置

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term