JPH0551618B2 - - Google Patents
Info
- Publication number
- JPH0551618B2 JPH0551618B2 JP60272653A JP27265385A JPH0551618B2 JP H0551618 B2 JPH0551618 B2 JP H0551618B2 JP 60272653 A JP60272653 A JP 60272653A JP 27265385 A JP27265385 A JP 27265385A JP H0551618 B2 JPH0551618 B2 JP H0551618B2
- Authority
- JP
- Japan
- Prior art keywords
- formula
- siloxane
- anhydride
- mixture
- product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- -1 dimethylsiloxy units Chemical group 0.000 claims description 28
- 125000003118 aryl group Chemical group 0.000 claims description 8
- 125000000962 organic group Chemical group 0.000 claims description 7
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 5
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 18
- 239000000047 product Substances 0.000 description 18
- 239000000203 mixture Substances 0.000 description 17
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 8
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 150000004985 diamines Chemical class 0.000 description 5
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000004205 dimethyl polysiloxane Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 2
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 2
- SGEWZUYVXQESSB-UHFFFAOYSA-N 3-methylheptane-1,7-diamine Chemical compound NCCC(C)CCCCN SGEWZUYVXQESSB-UHFFFAOYSA-N 0.000 description 2
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229940018564 m-phenylenediamine Drugs 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- XGKKWUNSNDTGDS-UHFFFAOYSA-N 2,5-dimethylheptane-1,7-diamine Chemical compound NCC(C)CCC(C)CCN XGKKWUNSNDTGDS-UHFFFAOYSA-N 0.000 description 1
- YXOKJIRTNWHPFS-UHFFFAOYSA-N 2,5-dimethylhexane-1,6-diamine Chemical compound NCC(C)CCC(C)CN YXOKJIRTNWHPFS-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical compound C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- QPIOXOJERGNNMX-UHFFFAOYSA-N 3-(3-aminopropylsulfanyl)propan-1-amine Chemical compound NCCCSCCCN QPIOXOJERGNNMX-UHFFFAOYSA-N 0.000 description 1
- POTQBGGWSWSMCX-UHFFFAOYSA-N 3-[2-(3-aminopropoxy)ethoxy]propan-1-amine Chemical compound NCCCOCCOCCCN POTQBGGWSWSMCX-UHFFFAOYSA-N 0.000 description 1
- GPXCORHXFPYJEH-UHFFFAOYSA-N 3-[[3-aminopropyl(dimethyl)silyl]oxy-dimethylsilyl]propan-1-amine Chemical compound NCCC[Si](C)(C)O[Si](C)(C)CCCN GPXCORHXFPYJEH-UHFFFAOYSA-N 0.000 description 1
- YEEIWUUBRYZFEH-UHFFFAOYSA-N 3-methoxyhexane-1,6-diamine Chemical compound NCCC(OC)CCCN YEEIWUUBRYZFEH-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- ZWIBGDOHXGXHEV-UHFFFAOYSA-N 4,4-dimethylheptane-1,7-diamine Chemical compound NCCCC(C)(C)CCCN ZWIBGDOHXGXHEV-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- XZOQPRNOAGCWNT-UHFFFAOYSA-N 4-[[(3,4-dicarboxyphenyl)-dimethylsilyl]oxy-dimethylsilyl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1[Si](C)(C)O[Si](C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 XZOQPRNOAGCWNT-UHFFFAOYSA-N 0.000 description 1
- CCSINQLTXLABIQ-UHFFFAOYSA-N 4-dimethylsilyloxy-2-benzofuran-1,3-dione Chemical group C[SiH](OC1=C2C(C(=O)OC2=O)=CC=C1)C CCSINQLTXLABIQ-UHFFFAOYSA-N 0.000 description 1
- IPDXWXPSCKSIII-UHFFFAOYSA-N 4-propan-2-ylbenzene-1,3-diamine Chemical compound CC(C)C1=CC=C(N)C=C1N IPDXWXPSCKSIII-UHFFFAOYSA-N 0.000 description 1
- FKUZSYAAZQXXHT-UHFFFAOYSA-N 4-silyl-2-benzofuran-1,3-dione Chemical group [SiH3]C1=C2C(C(=O)OC2=O)=CC=C1 FKUZSYAAZQXXHT-UHFFFAOYSA-N 0.000 description 1
- FXANMBAQBXMBFJ-UHFFFAOYSA-N 5-(dichloromethylsilyl)-2-benzofuran-1,3-dione Chemical compound ClC(Cl)[SiH2]C1=CC=C2C(=O)OC(=O)C2=C1 FXANMBAQBXMBFJ-UHFFFAOYSA-N 0.000 description 1
- MBRGOFWKNLPACT-UHFFFAOYSA-N 5-methylnonane-1,9-diamine Chemical compound NCCCCC(C)CCCCN MBRGOFWKNLPACT-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- 125000000068 chlorophenyl group Chemical group 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229920006037 cross link polymer Polymers 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- YQLZOAVZWJBZSY-UHFFFAOYSA-N decane-1,10-diamine Chemical compound NCCCCCCCCCCN YQLZOAVZWJBZSY-UHFFFAOYSA-N 0.000 description 1
- 125000006159 dianhydride group Chemical group 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- CBLAIDIBZHTGLV-UHFFFAOYSA-N dodecane-2,11-diamine Chemical compound CC(N)CCCCCCCCC(C)N CBLAIDIBZHTGLV-UHFFFAOYSA-N 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000011067 equilibration Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- DUJKMJZZYGMSQR-UHFFFAOYSA-N fluoromethylsulfonyl fluoromethanesulfonate Chemical compound FCS(=O)(=O)OS(=O)(=O)CF DUJKMJZZYGMSQR-UHFFFAOYSA-N 0.000 description 1
- PWSKHLMYTZNYKO-UHFFFAOYSA-N heptane-1,7-diamine Chemical compound NCCCCCCCN PWSKHLMYTZNYKO-UHFFFAOYSA-N 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000005462 imide group Chemical group 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229940100630 metacresol Drugs 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- KMBPCQSCMCEPMU-UHFFFAOYSA-N n'-(3-aminopropyl)-n'-methylpropane-1,3-diamine Chemical compound NCCCN(C)CCCN KMBPCQSCMCEPMU-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- SXJVFQLYZSNZBT-UHFFFAOYSA-N nonane-1,9-diamine Chemical compound NCCCCCCCCCN SXJVFQLYZSNZBT-UHFFFAOYSA-N 0.000 description 1
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical compound C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000006884 silylation reaction Methods 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- HIFJUMGIHIZEPX-UHFFFAOYSA-N sulfuric acid;sulfur trioxide Chemical compound O=S(=O)=O.OS(O)(=O)=O HIFJUMGIHIZEPX-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229920006352 transparent thermoplastic Polymers 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
- C08G73/106—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/452—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences
- C08G77/455—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences containing polyamide, polyesteramide or polyimide sequences
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/303—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups H01B3/38 or H01B3/302
- H01B3/306—Polyimides or polyesterimides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/46—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes silicones
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
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- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
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Description
【発明の詳細な説明】
関連出願の表示
同時係属米国出願第647301号「芳香族イミドの
シリル化方法及びそれより得られるイミド」及び
米国出願第647332号「シリル化方法」と関連があ
り、これら両者はともに1984年9月4日に出願さ
れ、本発明と同じ譲受人に譲渡されたものであ
る。DETAILED DESCRIPTION OF THE INVENTION Indication of related applications Related to and related to co-pending U.S. Application No. 647301 ``Process for Silylating Aromatic Imides and Imides Obtained Therefrom'' and U.S. Application No. 647332 ``Process for Silylation'' Both applications were filed on September 4, 1984 and are assigned to the same assignee as the present invention.
発明の背景
本出願前、ポリジオルガノシロキサンとポリイ
ミドとの化学的に結合されたブロツクから実質的
に構成されるポリイミド−シロキサンを製造する
のに種々の方法が用いられた。ホラブ(Holub)
の米国特許第3325450号には、末端にジオルガノ
オルガノアミノシロキシ単位を有するポリジオル
ガノシロキサンとベンゾフエノンジ無水物との相
互縮合でポリイミド−シロキサンが生成すること
が示されている。他の方法としてはヒース
(Heath)らの米国特許第3847867号に示されるよ
うに、アルキルアミノ末端基を有するポリジオル
ガノシロキサンを芳香族ビス(エーテル無水物)
の縮合がある。ポリイミド−シロキサンのその他
の例はライアング(Ryang)の米国特許第
4404350号に示されており、これは有機ジアミン
と縮合したノルボルナン無水物末端停止オルガノ
ポリシロキサン(任意成分としてのその他芳香族
ビス無水物)を用いるものである。BACKGROUND OF THE INVENTION Prior to this application, various methods were used to produce polyimide-siloxanes consisting essentially of chemically bonded blocks of polydiorganosiloxane and polyimide. Holub
U.S. Pat. No. 3,325,450 teaches that polyimide-siloxanes are formed by intercondensation of polydiorganosiloxanes having diorganoorganoaminosiloxy terminal units with benzophenone dianhydride. Another method is to convert polydiorganosiloxanes with alkylamino end groups into aromatic bis(ether anhydrides) as shown in U.S. Pat. No. 3,847,867 to Heath et al.
There is a condensation of Other examples of polyimide-siloxanes are provided by Ryang, US Pat.
No. 4,404,350, which utilizes a norbornane anhydride-terminated organopolysiloxane (optional other aromatic bisanhydride) condensed with an organic diamine.
本発明は、式
を有するビス(芳香族無水物)オルガノシロキサ
ンが、式
(2) NH2R2NH2
を有する有機ジアミンとの縮合によつてポリイミ
ド−シロキサンを製造するのに用いることができ
るという発見に基づいている。式中RはC(1-13)/
価炭化水素基又は置換C(1-13)/価炭化水素基、R1
はC(6-13)3価芳香族有機基、R2はC(2-13)2価有機
基、nは1〜2000の整数である。 The present invention is based on the formula Based on the discovery that bis(aromatic anhydride) organosiloxanes having the formula (2) can be used to prepare polyimide-siloxanes by condensation with organic diamines having the formula ( 2 ) There is. In the formula, R is C (1-13) /
valence hydrocarbon group or substituted C (1-13) / valence hydrocarbon group, R 1
is a C (6-13) trivalent aromatic organic group, R 2 is a C (2-13) divalent organic group, and n is an integer of 1 to 2000.
1,3−ビス(3,4−ジカルボキシフエニ
ル)−1,1,3,3−テトラメチルジシロキサ
ンジ無水物の合成は、J.R.プラツト(I.R.Pratt)
らのジヤーナルオブオーガニツクケミストリー
(Journal of Organic Chemistry)第38巻第25
号、1973(4271−4274)に報告されている。以後
“シロキサンジ無水物”と呼ばれる式(1)のビス
(芳香族無水物)シロキサの合成は本発明者の米
国出願にも示されている。シロキサンジ無水物
は、有効量の遷移金属触媒の存在下で官能化ジシ
ランと芳香族ハロゲン化アシルの間で反応を行わ
せることにより製造しうる。得られるハロシリル
芳香族無水物をその後容易に相当するジシロキサ
ンジ無水物へ加水分解することができる。 The synthesis of 1,3-bis(3,4-dicarboxyphenyl)-1,1,3,3-tetramethyldisiloxane dianhydride was carried out by JR Pratt.
Journal of Organic Chemistry Volume 38, No. 25
No., 1973 (4271-4274). The synthesis of bis(aromatic anhydride) siloxas of formula (1), hereinafter referred to as "siloxane dianhydrides", is also presented in the inventor's US application. Siloxane dianhydrides may be prepared by the reaction between a functionalized disilane and an aromatic acyl halide in the presence of an effective amount of a transition metal catalyst. The resulting halosilyl aromatic anhydride can then be readily hydrolyzed to the corresponding disiloxane dianhydride.
発明の記載
本発明により、式
のシロキサンイミド基が化学的に結合したもの、
あるいは上記シロキサンイミド基と式
のイミド基の混合から成るポリイミド−シロキサ
ンが提供される(但し、R、R1、R2及びnは前
記定義の通りであり、R3は以下に定義される4
価C(6-13)芳香族有機基、aは1〜200の整数であ
る)。DESCRIPTION OF THE INVENTION According to the present invention, the formula chemically bonded siloxane imide groups,
Or the above siloxane imide group and formula A polyimide-siloxane is provided consisting of a mixture of imide groups, where R, R 1 , R 2 and n are as defined above and R 3 is 4 as defined below.
valence C (6-13) aromatic organic group, a is an integer from 1 to 200).
式(1)のRに含まれる基は好ましくは、フエニ
ル、クロロフエニル、トリル、キシリル、ビフエ
ニル、ナフチル等のアリール基及びハロゲン化ア
リール基、ビニル、アリル、シクロヘキセニル等
のアルケニル基、メチル、エチル、プロピル、ブ
チル、オクチル、トリフルオロプロピル等の
C(1-8)アルキル基及びハロゲン化アルキル基であ
る。 The groups contained in R in formula (1) are preferably aryl groups and halogenated aryl groups such as phenyl, chlorophenyl, tolyl, xylyl, biphenyl, and naphthyl, alkenyl groups such as vinyl, allyl, and cyclohexenyl, methyl, ethyl, Propyl, butyl, octyl, trifluoropropyl, etc.
C (1-8) alkyl group and halogenated alkyl group.
R1に含まれる基は、例えば
(式中Rは前記定義通りであり、aは1〜3の値
を有する整数)である。 The group contained in R 1 is, for example, (wherein R is as defined above, and a is an integer having a value of 1 to 3).
R2に含まれる基は例えば、(a)炭素数6〜20の
芳香族炭化水素基及びそれらのハロゲン化誘導
体、(b)炭素数2〜20のアルキレン基及びシクロア
ルキレン基、C(2-8)有機基末端停止ポリジオルガ
ノシロキサン及び(c)式
(式中Q′は−O−、
−S−及び−CxH2xから成る群より選ばれた基で
あり、xは1〜5の整数である)に含まれる2価
の基から成る群より選ばれた2価のC(2-20)有機基
である。 Groups included in R 2 are, for example, (a) aromatic hydrocarbon groups having 6 to 20 carbon atoms and their halogenated derivatives, (b) alkylene groups and cycloalkylene groups having 2 to 20 carbon atoms, C (2- 8) Organic group-terminated polydiorganosiloxane and formula (c) (In the formula, Q' is -O-, -S- and -C x H 2x , where x is an integer from 1 to 5) . -20) It is an organic group.
式(4)のR3に含まれる基は例えば
及び
〔式中Dは−O−、−S−、
−OR5O−及び
(式中R2は前記定義の通り、R4は水素及びRよ
り選ばれ、R5は
及び一般式(X)n
(式中Xは式
−CyH2y−、
及び−S−
の2価の基から成る群より選ばれた基であり、
m0は又は1、yは1〜5の整数である)
の2価有機基から選ばれた基である〕
である。 For example, the group contained in R 3 in formula (4) is as well as [In the formula, D is -O-, -S-, −OR 5 O− and (In the formula, R 2 is as defined above, R 4 is selected from hydrogen and R, and R 5 is and general formula (X) n (wherein X is the formula −C y H 2y −, is a group selected from the group consisting of divalent groups of and -S-,
m0 is a group selected from the divalent organic groups of (or 1, y is an integer from 1 to 5).
本発明の実施において式(1)のシロキサンジ無水
物と共に使用できる有機ジ無水物には例えば、ピ
ロメリト酸ジ無水物、ベンゾフエノンジ無水物、
ヒース(Heath)らの芳香族ビス(エーテル無水
物)及びライアング(Ryang)の米国特許第
4281396号に示されるシリルノルボルナン無水物
がある。 Organic dianhydrides that can be used with the siloxane dianhydride of formula (1) in the practice of this invention include, for example, pyromellitic dianhydride, benzophenone dianhydride,
Heath et al. Aromatic Bis(Ether Anhydride) and Ryang U.S. Patent No.
There is a silylnorbornane anhydride shown in No. 4281396.
式(2)の有機ジアミンには次のような化合物が含
まれる。 The organic diamine of formula (2) includes the following compounds.
m−フエニレンジアミン、
p−フエニレンジアミン、
4,4′−ジアミノジフエニルプロパン、
4,4′−ジアミノジフエニルメタン、
ベンジジン、
4,4′−ジアミノジフエニルスルフイド、
4,4′−ジアミノジフエニルスルホン、
4,4′−ジアミノジフエニルエーテル、
1,5−ジアミノナフタレン、
3,3′−ジメチルベンジジン、
3,3′−ジメトキシベンジジン、
2,4−ジアミノトルエン、
2,6−ジアミノトルエン、
2,4−ビス(p−アミノ−t−ブチル)トル
エン、
1,3−ジアミノ−4−イソプロピルベンゼ
ン、
1,2−ビス(3−アミノプロポキシ)エタ
ン、
m−キシリレンジアミン、
p−キシリレンジアミン、
ビス(4−アミノシクロヘキシル)メタン、
デカメチレンジアミン、
3−メチルヘプタメチレンジアミン、
4,4−ジメチルヘプタメチレンジアミン、
2,11−ドデカンジアミン、
2,2−ジメチルプロピレンジアミン、
オクタメチレンジアミン、
3−メトキシヘキサメチレンジアミン、
2,5−ジメチルヘキサメチレンジアミン、
2,5−ジメチルヘプタメチレンジアミン、
3−メチルヘプタメチレンジアミン、
5−メチルノナメチレンジアミン、
1,4−シクロヘキサンジアミン、
1,15−オクタデカンジアミン、
ビス(3−アミノプロピル)スルフイド、
N−メチル−ビス(3−アミノプロピル)アミ
ン、
ヘキサメチレンジアミン、
ヘプタメチレンジアミン、
2,4−ジアミノトルエン、
ノナメチレンジアミン、
2,6−ジアミノトルエン、
ビス−(3−アミノプロピル)テトラメチルジ
シロキサン等。m-phenylenediamine, p-phenylenediamine, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenylmethane, benzidine, 4,4'-diaminodiphenyl sulfide, 4,4' -diaminodiphenyl sulfone, 4,4'-diaminodiphenyl ether, 1,5-diaminonaphthalene, 3,3'-dimethylbenzidine, 3,3'-dimethoxybenzidine, 2,4-diaminotoluene, 2,6- Diaminotoluene, 2,4-bis(p-amino-t-butyl)toluene, 1,3-diamino-4-isopropylbenzene, 1,2-bis(3-aminopropoxy)ethane, m-xylylenediamine, p -xylylenediamine, bis(4-aminocyclohexyl)methane, decamethylenediamine, 3-methylheptamethylenediamine, 4,4-dimethylheptamethylenediamine, 2,11-dodecanediamine, 2,2-dimethylpropylenediamine, octa Methylenediamine, 3-methoxyhexamethylenediamine, 2,5-dimethylhexamethylenediamine, 2,5-dimethylheptamethylenediamine, 3-methylheptamethylenediamine, 5-methylnonamethylenediamine, 1,4-cyclohexanediamine, 1 , 15-octadecanediamine, bis(3-aminopropyl) sulfide, N-methyl-bis(3-aminopropyl)amine, hexamethylenediamine, heptamethylenediamine, 2,4-diaminotoluene, nonamethylenediamine, 2,6 -diaminotoluene, bis-(3-aminopropyl)tetramethyldisiloxane, etc.
式(1)のシロキサンジ無水物と共に、その無水物
当量に対して1〜1000の無水物当量の式
(式中R及びnは前記定義の通り)
を有するシロキサン無水物を用いることもでき
る。このシロキサン無水物及びその製造方法は本
発明者の米国出願第647332号に示されている。 Along with the siloxane dianhydride of formula (1), a formula with an anhydride equivalent of 1 to 1000 relative to the anhydride equivalent. A siloxane anhydride having the formula (wherein R and n are as defined above) can also be used. This siloxane anhydride and its method of preparation are disclosed in my US application Ser. No. 647,332.
本発明のポリイミド−シロキサンは、150℃〜
350℃の範囲の温度において、不活性有機溶剤の
存在下ほぼ等モルのシロキサンジ無水物又はシロ
キサンジ無水物と有機ジ無水物又は式(5)のシロキ
サン無水物との混合物を、有機ジアミンと反応さ
せることにより合成しうる。 The polyimide-siloxane of the present invention has a temperature of 150°C to
At a temperature in the range of 350°C, approximately equimolar amounts of siloxane dianhydride or a mixture of siloxane dianhydride and organic dianhydride or siloxane anhydride of formula (5) are mixed with an organic diamine in the presence of an inert organic solvent. It can be synthesized by reaction.
使用できる有機溶剤は例えば、オルトジクロロ
ベンゼン、メタ−クレゾール及びジメチルホルム
アミド、ジメチルアセトアミド、N−メチルピロ
リドンのような双極性非プロトン性溶媒である。
nが1より大きい、例えばnが約5〜約2000の値
を有する式(1)のシロキサンジ無水物は、慣用の平
衡化触媒の存在下でnが1である式(1)のシロキサ
ンジ無水物を、ヘキサオルガノシクロトリシロキ
サン又はオクタオルガノシクロテトラシロキサン
のようなシクロポリシロキサンと平衡化すること
により製造できる。 Organic solvents that can be used are, for example, orthodichlorobenzene, meta-cresol and dipolar aprotic solvents such as dimethylformamide, dimethylacetamide, N-methylpyrrolidone.
The siloxane dianhydride of formula (1) in which n is greater than 1, e.g. It can be prepared by equilibrating the anhydride with a cyclopolysiloxane such as hexaorganocyclotrisiloxane or octaorganocyclotetrasiloxane.
本発明のポリイミド−シロキサンブロツク重合
体は電気導体の絶縁、接着剤、成形コンパウン
ド、積層品用被膜及び強靭な弾性体として使用で
きる。 The polyimide-siloxane block polymers of this invention can be used as insulation for electrical conductors, adhesives, molding compounds, coatings for laminates, and tough elastomers.
当業者が容易に本発明を実施しうるように、次
の実施例を説明のために示すが、限定のためでは
ない。部はすべて重量による。 The following examples are presented by way of illustration, but not limitation, to enable those skilled in the art to easily practice the invention. All parts are by weight.
実施例 1
1,3−ビス(4′−フタル酸無水物)テトラメ
チルジシロキサン20.0g、メタ−フエニレンジア
ミン5.1g及びオルト−ジクロロベンゼン71mlか
ら成る混合物を還流温度に加熱する。混合物を2
時間還流し、水共沸混合物を常に取り除く。溶液
から物質が沈澱し始めたら加熱をやめる。次に、
溶液の冷却後混合物に塩化メチレン100mlを加え、
得られる均質な生成混合物を急速にかく拌したメ
タノール500mlに注ぐ。白色の生成物が沈澱する。
操作をくり返すとさらに生成物が得られ、得られ
た生成物を真空で乾燥する。23.4g即ち収率100
%の物質を得た。製造方法により、生成物は式
の単位が化学的に結合したものから実質的に構成
されるポリイミド−シロキサンである。GPCに
よる分析により、生成物は約75000の分子量を有
することが示された。またポリイミド−シロキサ
ンはTgが169であり、クロロホルム中のIVが0.76
である。ワイヤをクロロホルム中に溶かした重合
体の10%溶液に浸漬し、空気乾燥すると、銅線上
に有用な絶縁被覆が形成される。Example 1 A mixture consisting of 20.0 g of 1,3-bis(4'-phthalic anhydride)tetramethyldisiloxane, 5.1 g of meta-phenylenediamine and 71 ml of ortho-dichlorobenzene is heated to reflux temperature. 2 of the mixture
Reflux for an hour, constantly removing the water azeotrope. Stop heating when material begins to precipitate from solution. next,
After cooling the solution, add 100ml of methylene chloride to the mixture.
The resulting homogeneous product mixture is poured into 500 ml of rapidly stirred methanol. A white product precipitates out.
Further product is obtained by repeating the operation and the product obtained is dried in vacuo. 23.4g or yield 100
% of material was obtained. Depending on the manufacturing method, the product has the formula A polyimide-siloxane consisting essentially of chemically bonded units. Analysis by GPC showed the product to have a molecular weight of approximately 75,000. Polyimide-siloxane also has a Tg of 169 and an IV of 0.76 in chloroform.
It is. Dipping the wire in a 10% solution of the polymer in chloroform and air drying forms a useful insulating coating on the copper wire.
実施例 2
発煙硫酸0.5ml及び濃硫酸1.0mlを含むオルトジ
クロロベンゼン50ml中の1,3−ビス(4′−フタ
ル酸無水物)テトラメチルジシロキサン5g及び
オクタメチルシクロテトラシロキサン20.84gの
混合物を18時間110℃に加熱する。混合物を室温
に冷却し、塩化メチレン100mlを加え、過剰の炭
酸水素ナトリウムを酸を中和するために入れる。
溶液を脱色用炭素でろ過し、溶剤を減圧して除去
する。次に揮発性生成物を除去するため、生成物
を0.01トルの高度の真空下で80℃に加熱する。末
端にジメチルケイ素無水物シロキシ単位を有し平
均約16の化学的に結合したジメチルシロキシ単位
を有するポリジメチルシロキサンである透明な粘
稠油状物が得られた。製造方法及びプロトン
NMR及びIR分析に基づき、生成物は次の式を有
する。Example 2 A mixture of 5 g of 1,3-bis(4'-phthalic anhydride)tetramethyldisiloxane and 20.84 g of octamethylcyclotetrasiloxane in 50 ml of orthodichlorobenzene containing 0.5 ml of fuming sulfuric acid and 1.0 ml of concentrated sulfuric acid. Heat to 110°C for 18 hours. The mixture is cooled to room temperature, 100 ml of methylene chloride is added and excess sodium bicarbonate is added to neutralize the acid.
The solution is filtered through decolorizing carbon and the solvent is removed under reduced pressure. The product is then heated to 80° C. under a high vacuum of 0.01 Torr to remove volatile products. A clear viscous oil was obtained which was a polydimethylsiloxane with terminal dimethylsilicon anhydride siloxy units and an average of about 16 chemically bonded dimethylsiloxy units. Production method and proton
Based on NMR and IR analysis, the product has the following formula:
実施例 3
トルエン50ml、ビス(フタル酸無水物)テトラ
メチルジシロキサン7g、オクタメチルシクロテ
トラシロキサン29g、フルオロメタンスルホン酸
無水物75μ及び水26μの混合物を67°に加熱す
る。48時間後、得られる均質な溶液を室温に冷却
し、酸を無水酸化マグネシウム300mgで中和する。
塩化メチレン約100mlを混合物に入れ、脱色用炭
素を用いて溶液をろ過する。混合物から減圧で溶
剤を放散させ、得られる粘稠油状物を揮発性シク
ロシロキサンを除去するために0.01トルの真空下
で80℃に加熱する。無水フタル酸の昇華はみられ
ず、末端基の開裂なしに平衡化が起つたことを示
す。59%の収率である21.4gの透明な粘稠油状物
が得られた。製造方法及びプロトンNMR及び赤
外線分析により、生成物は平均約27個の化学的に
結合したジメチルシロキシ単位及び末端のジメチ
ルシロキシフタル酸無水物シロキシ単位を有する
ポリジメチルシロキサンである。 Example 3 A mixture of 50 ml of toluene, 7 g of bis(phthalic anhydride)tetramethyldisiloxane, 29 g of octamethylcyclotetrasiloxane, 75 μ of fluoromethanesulfonic anhydride and 26 μ of water is heated to 67°. After 48 hours, the resulting homogeneous solution is cooled to room temperature and the acid is neutralized with 300 mg of anhydrous magnesium oxide.
About 100 ml of methylene chloride is added to the mixture and the solution is filtered using decolorizing carbon. The mixture is stripped of the solvent under reduced pressure and the resulting viscous oil is heated to 80° C. under a vacuum of 0.01 torr to remove volatile cyclosiloxanes. No sublimation of phthalic anhydride was observed, indicating that equilibration occurred without cleavage of the end groups. 21.4 g of clear viscous oil was obtained, a yield of 59%. According to the method of preparation and proton NMR and infrared analysis, the product is a polydimethylsiloxane with an average of about 27 chemically bonded dimethylsiloxy units and terminal dimethylsiloxyphthalic anhydride siloxy units.
上記平衡化シロキサンジ無水物5g、1,3−
ビス(4′−フタル酸無水物)テトラメチルジシロ
キサン4g及びメタフエニレンジアミン1.24gの
混合物を加熱して、触媒量の4−N,N−ジメチ
ルアミノピリジンの存在下で30mlのオルトジクロ
ロベンゼン中で還流させる。反応中に水が生成
し、2時間の加熱の間に連続的に除去する。冷却
後、沈澱した生成物を再溶解させるため混合物に
塩化メチレン75mlをさらに加える。次に混合物を
メタノール中に注ぎ、生成物を2度沈澱させ、分
解し次いで乾燥する。2gの生成物が得られ、ク
ロロホルム10mlに溶かす。生成物を注型すると10
ミクロンの透明な熱可塑性弾性体フイルムが得ら
れる。生成物の製造方法により、生成物は式
(式中x及びyは前に定義されたようにnの定義
の範囲にある正の整数である)
の化学的に結合した単位から実質的に成るポリイ
ミド−シロキサンである。GPC分析により、ポ
ロイミド−シロキサンは約173000の分子量及びク
ロロホルム中で1.2の固有粘度を有することが確
かめられた。ポリイミド−シロキサンは容易に銅
線上に押出され、有用な絶縁性を示すことが見出
された。 5 g of the above equilibrated siloxane dianhydride, 1,3-
A mixture of 4 g of bis(4'-phthalic anhydride)tetramethyldisiloxane and 1.24 g of metaphenylenediamine is heated to form 30 ml of orthodichlorobenzene in the presence of a catalytic amount of 4-N,N-dimethylaminopyridine. Reflux inside. Water is formed during the reaction and is continuously removed during the 2 hours of heating. After cooling, a further 75 ml of methylene chloride are added to the mixture in order to redissolve the precipitated product. The mixture is then poured into methanol and the product is precipitated twice, decomposed and dried. 2 g of product are obtained and dissolved in 10 ml of chloroform. 10 when casting the product
A transparent thermoplastic elastic film of micron size is obtained. Depending on how the product is manufactured, the product has the formula (where x and y are positive integers within the definition of n as defined above) consisting essentially of chemically linked units. GPC analysis determined that the polyimide-siloxane had a molecular weight of approximately 173,000 and an intrinsic viscosity of 1.2 in chloroform. It has been found that polyimide-siloxanes are easily extruded onto copper wire and exhibit useful insulating properties.
実施例 4
実施例3に記載された平衡化シロキサンジ無水
物5g、ベンゾフエノンジ無水物1.7g及びm−
フエニレンジアミン1.24gを含む混合物を加熱し
て、触媒量の4−ジメチルアミノピリジンと存在
下で30mlのo−クロロベンゼン中で還流させる。
2時間の加熱の間水を連続的に除去する。生成物
を実施例3に記載のものと同様の方法で単離す
る。製造方法によつて、生成物は式
(式中x、y及びzは実施例3に記載の通り)
の化学的に結合した単位から実質的に成るポリイ
ミド−シロキサンである。Example 4 5 g of equilibrated siloxane dianhydride as described in Example 3, 1.7 g of benzophenone dianhydride and m-
A mixture containing 1.24 g of phenylenediamine is heated to reflux in 30 ml of o-chlorobenzene in the presence of a catalytic amount of 4-dimethylaminopyridine.
Water is continuously removed during the 2 hour heating period. The product is isolated in a manner similar to that described in Example 3. Depending on the manufacturing method, the product has the formula A polyimide-siloxane consisting essentially of chemically bonded units of the formula (where x, y, and z are as described in Example 3).
実施例 5
4−ジクロロメチルシリルフタル酸無水物0.5
gを含む塩化メチレン溶液25mlへ5倍モルの過剰
の水を加える。乾燥及び真空中での溶剤の除去の
後、NMR及びIR分析で示されるように、式5の
範囲内のシリルフタル酸無水側鎖を有するメチル
シロキサンを好収率で得た。末端にジメチルシロ
キシフタル酸無水物単位を有し、平均27個の化学
的に結合したジメチルシロキシ単位を有するポリ
ジメチルシロキサン液状物5gにこのメチルシロ
キサンを加える。混合物を50mlのトルエンに溶か
し、次に濃硫酸2滴を加える。得られる溶液を80
℃で4時間加熱する。冷却後、塩化メチレン50ml
を加え、溶液を炭酸水素ナトリウムで中和し、次
に乾燥及び真空下での溶剤の除去を行う。得られ
るシリコーン液状物へm−フエニレンジアミン
0.5gを加え、混合物を加熱して水を除去する。
生成する架橋重合体は有用な絶縁性を備えた強靭
なゴムである。Example 5 4-dichloromethylsilyl phthalic anhydride 0.5
A 5-fold molar excess of water is added to 25 ml of a methylene chloride solution containing g. After drying and removal of the solvent in vacuo, methylsiloxane with silyl phthalic anhydride side chains within the range of formula 5 was obtained in good yield as shown by NMR and IR analysis. This methylsiloxane is added to 5 g of a polydimethylsiloxane liquid having terminal dimethylsiloxyphthalic anhydride units and an average of 27 chemically bonded dimethylsiloxy units. Dissolve the mixture in 50 ml of toluene and then add 2 drops of concentrated sulfuric acid. The resulting solution is 80
Heat at ℃ for 4 hours. After cooling, add 50 ml of methylene chloride.
is added and the solution is neutralized with sodium bicarbonate, followed by drying and removal of the solvent under vacuum. Add m-phenylenediamine to the resulting silicone liquid.
Add 0.5g and heat the mixture to remove water.
The resulting crosslinked polymer is a tough rubber with useful insulating properties.
上記実施例は本発明のポリイミド−シロキサン
製造に用いられる非常に多くの変形のうちの少数
に係るにすぎないが、本発明はこれらの実施例の
前の記載で示されるように、式(1)のシロキサンジ
無水物及び式(2)の有機ジアミンを、任意の有機ジ
無水物の存在下で、反応を行うことにより製造し
うる広範な種類のポリイミド−シロキサンに係る
ことは当然である。 Although the above examples relate to only a few of the numerous variations used in the preparation of the polyimide-siloxanes of the present invention, the present invention, as shown in the preceding description of these examples, Of course, this relates to a wide variety of polyimide-siloxanes which can be prepared by reacting the siloxane dianhydride of formula (2) and the organic diamine of formula (2) in the presence of any organic dianhydride.
Claims (1)
ルガノシロキシ単位を有する末端が無水物基で停
止されたシロキサン (式中前記ジオルガノシロキシ単位の有機基およ
びRはC(1-13)1価炭化水素基又は置換C(1-13)1価炭
化水素基そしてR1はC(6-13)3価芳香族有機基であ
る)。 2 RがCH3でありR1が である特許請求の範囲第1項記載のシロキサン。 3 式 を有する特許請求の範囲第2項記載のシロキサ
ン。 4 式 の末端単位が化学結合された約5−約2000のジメ
チルシロキシ単位を有する特許請求の範囲第1項
記載のシロキサン。[Claims] 1 formula an anhydride-terminated siloxane having from about 5 to about 2000 diorganosiloxy units chemically bonded thereto, where the organic group of said diorganosiloxy units and R are C (1-13) a monovalent hydrocarbon group or a substituted C (1-13) monovalent hydrocarbon group and R 1 is a C (6-13) trivalent aromatic organic group). 2 R is CH 3 and R 1 is The siloxane according to claim 1. 3 formulas The siloxane according to claim 2, which has the following. 4 formula The siloxane of claim 1 having from about 5 to about 2000 dimethylsiloxy units chemically bonded to the terminal units.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US67872584A | 1984-12-05 | 1984-12-05 | |
| US678725 | 1984-12-05 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2461193A Division JPH069781A (en) | 1984-12-05 | 1993-02-15 | Anhydride group-containing siloxane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61159425A JPS61159425A (en) | 1986-07-19 |
| JPH0551618B2 true JPH0551618B2 (en) | 1993-08-03 |
Family
ID=24723992
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27265385A Granted JPS61159425A (en) | 1984-12-05 | 1985-12-05 | Polyanhydride-siloxane and polyimide-siloxane obtained therefrom |
| JP2461193A Pending JPH069781A (en) | 1984-12-05 | 1993-02-15 | Anhydride group-containing siloxane |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2461193A Pending JPH069781A (en) | 1984-12-05 | 1993-02-15 | Anhydride group-containing siloxane |
Country Status (3)
| Country | Link |
|---|---|
| JP (2) | JPS61159425A (en) |
| FR (2) | FR2581648B1 (en) |
| GB (2) | GB2168065B (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2659534B2 (en) * | 1986-05-09 | 1997-09-30 | ゼネラル・エレクトリック・カンパニイ | Polyanhydride-siloxane and polyimide-siloxane obtained therefrom |
| US4795680A (en) * | 1986-05-09 | 1989-01-03 | General Electric Company | Polyimide-siloxanes, method of making and use |
| DE3715313A1 (en) * | 1986-09-02 | 1988-03-10 | Gen Electric | IMIDOPOLYSILOXANES AND METHOD FOR THEIR PRODUCTION |
| JP2679059B2 (en) * | 1987-09-24 | 1997-11-19 | 日本合成ゴム株式会社 | Method for producing curable polymer |
| JPS6485220A (en) * | 1987-09-25 | 1989-03-30 | Hitachi Chemical Co Ltd | Protective coating material composition for semiconductor device |
| US4939223A (en) * | 1988-10-05 | 1990-07-03 | Nippon Steel Chemical Co., Ltd. | Silicon-modified polyimides |
| US4945148A (en) * | 1989-03-06 | 1990-07-31 | General Electric Company | Silicone-polycarbonate block copolymers |
| US4945147A (en) * | 1989-03-06 | 1990-07-31 | General Electric Company | Aromatic polyester-siloxane block copolymers and method for making |
| DE3927312A1 (en) * | 1989-08-18 | 1991-02-21 | Wacker Chemie Gmbh | ANHYDRIDE-FUNCTIONAL ORGANO (POLY) SILOXANE, METHOD FOR THE PRODUCTION AND USE OF THIS ORGANO (POLY) SILOXANE |
| US5104958A (en) * | 1991-01-25 | 1992-04-14 | General Electric Company | Solvent resistant silicone polyimides |
| JP2764674B2 (en) * | 1993-03-24 | 1998-06-11 | 信越化学工業株式会社 | Polyimide silicone resin precursor composition |
| GB2290299B (en) * | 1994-06-17 | 1998-01-14 | Ball Burnishing Mach Tools | Anti-lubricant compositions |
| JP4771414B2 (en) | 2006-02-15 | 2011-09-14 | 信越化学工業株式会社 | Polyimide silicone resin and thermosetting composition containing the same |
| US9926338B2 (en) | 2015-05-27 | 2018-03-27 | Wacker Chemical Corporation | Carboxylic acid functional siloxanes of defined structure |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3847867A (en) * | 1971-01-20 | 1974-11-12 | Gen Electric | Polyetherimides |
| US4404350A (en) * | 1982-07-07 | 1983-09-13 | General Electric Company | Silicone-imide copolymers and method for making |
| US4381396A (en) * | 1982-07-07 | 1983-04-26 | General Electric Company | Silynorbornane anhydrides and method for making |
| US4709054A (en) * | 1984-09-04 | 1987-11-24 | General Electric Company | Silylation method and organic silanes made therefrom |
-
1985
- 1985-08-30 GB GB8521609A patent/GB2168065B/en not_active Expired - Lifetime
- 1985-11-25 FR FR8517368A patent/FR2581648B1/en not_active Expired
- 1985-12-05 JP JP27265385A patent/JPS61159425A/en active Granted
-
1986
- 1986-04-10 FR FR8605104A patent/FR2581070B1/en not_active Expired
-
1990
- 1990-01-17 GB GB9001009A patent/GB2224742B/en not_active Expired - Lifetime
-
1993
- 1993-02-15 JP JP2461193A patent/JPH069781A/en active Pending
Non-Patent Citations (1)
| Title |
|---|
| J.ORG.CHEM=1973 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH069781A (en) | 1994-01-18 |
| GB9001009D0 (en) | 1990-03-14 |
| FR2581070A1 (en) | 1986-10-31 |
| FR2581648B1 (en) | 1989-06-30 |
| GB2224742A (en) | 1990-05-16 |
| GB2168065A (en) | 1986-06-11 |
| FR2581648A1 (en) | 1986-11-14 |
| GB8521609D0 (en) | 1985-10-02 |
| FR2581070B1 (en) | 1989-08-25 |
| GB2168065B (en) | 1990-04-25 |
| JPS61159425A (en) | 1986-07-19 |
| GB2224742B (en) | 1990-10-03 |
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