JPH055823B2 - - Google Patents
Info
- Publication number
- JPH055823B2 JPH055823B2 JP62253067A JP25306787A JPH055823B2 JP H055823 B2 JPH055823 B2 JP H055823B2 JP 62253067 A JP62253067 A JP 62253067A JP 25306787 A JP25306787 A JP 25306787A JP H055823 B2 JPH055823 B2 JP H055823B2
- Authority
- JP
- Japan
- Prior art keywords
- rhodium
- group
- reaction
- hydrocarbons
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010948 rhodium Substances 0.000 claims description 20
- 229910052703 rhodium Inorganic materials 0.000 claims description 15
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 15
- 229930195733 hydrocarbon Natural products 0.000 claims description 12
- 150000002430 hydrocarbons Chemical class 0.000 claims description 12
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 10
- 150000002903 organophosphorus compounds Chemical class 0.000 claims description 10
- 239000002262 Schiff base Substances 0.000 claims description 8
- 150000004753 Schiff bases Chemical class 0.000 claims description 8
- 150000002527 isonitriles Chemical class 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 150000003284 rhodium compounds Chemical class 0.000 claims description 6
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 5
- 125000005538 phosphinite group Chemical group 0.000 claims description 4
- XRBCRPZXSCBRTK-UHFFFAOYSA-N phosphonous acid Chemical compound OPO XRBCRPZXSCBRTK-UHFFFAOYSA-N 0.000 claims description 4
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 description 15
- XYZMOVWWVXBHDP-UHFFFAOYSA-N cyclohexyl isocyanide Chemical compound [C-]#[N+]C1CCCCC1 XYZMOVWWVXBHDP-UHFFFAOYSA-N 0.000 description 8
- -1 aromatic halides Chemical class 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 5
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- QKSQEJXIILKPDX-UHFFFAOYSA-N n-cyclohexyl-1-phenylmethanimine Chemical compound C1CCCCC1N=CC1=CC=CC=C1 QKSQEJXIILKPDX-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- QIMMUPPBPVKWKM-UHFFFAOYSA-N 2-methylnaphthalene Chemical compound C1=CC=CC2=CC(C)=CC=C21 QIMMUPPBPVKWKM-UHFFFAOYSA-N 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- LTEQMZWBSYACLV-UHFFFAOYSA-N Hexylbenzene Chemical compound CCCCCCC1=CC=CC=C1 LTEQMZWBSYACLV-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 150000001491 aromatic compounds Chemical class 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- CBFCDTFDPHXCNY-UHFFFAOYSA-N icosane Chemical compound CCCCCCCCCCCCCCCCCCCC CBFCDTFDPHXCNY-UHFFFAOYSA-N 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- ZRKSVHFXTRFQFL-UHFFFAOYSA-N isocyanomethane Chemical compound C[N+]#[C-] ZRKSVHFXTRFQFL-UHFFFAOYSA-N 0.000 description 2
- QWTDNUCVQCZILF-UHFFFAOYSA-N isopentane Chemical compound CCC(C)C QWTDNUCVQCZILF-UHFFFAOYSA-N 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- FYRXIYRIBCDWOA-UHFFFAOYSA-N methylidyne-(4-methylphenyl)azanium Chemical compound CC1=CC=C([N+]#C)C=C1 FYRXIYRIBCDWOA-UHFFFAOYSA-N 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 239000005297 pyrex Substances 0.000 description 2
- 150000003283 rhodium Chemical class 0.000 description 2
- FAGLEPBREOXSAC-UHFFFAOYSA-N tert-butyl isocyanide Chemical compound CC(C)(C)[N+]#[C-] FAGLEPBREOXSAC-UHFFFAOYSA-N 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- KZPYGQFFRCFCPP-UHFFFAOYSA-N 1,1'-bis(diphenylphosphino)ferrocene Chemical compound [Fe+2].C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1 KZPYGQFFRCFCPP-UHFFFAOYSA-N 0.000 description 1
- OPNUROKCUBTKLF-UHFFFAOYSA-N 1,2-bis(2-methylphenyl)guanidine Chemical compound CC1=CC=CC=C1N\C(N)=N\C1=CC=CC=C1C OPNUROKCUBTKLF-UHFFFAOYSA-N 0.000 description 1
- ZKWQSBFSGZJNFP-UHFFFAOYSA-N 1,2-bis(dimethylphosphino)ethane Chemical compound CP(C)CCP(C)C ZKWQSBFSGZJNFP-UHFFFAOYSA-N 0.000 description 1
- QFMZQPDHXULLKC-UHFFFAOYSA-N 1,2-bis(diphenylphosphino)ethane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CCP(C=1C=CC=CC=1)C1=CC=CC=C1 QFMZQPDHXULLKC-UHFFFAOYSA-N 0.000 description 1
- PRBHEGAFLDMLAL-UHFFFAOYSA-N 1,5-Hexadiene Natural products CC=CCC=C PRBHEGAFLDMLAL-UHFFFAOYSA-N 0.000 description 1
- VYXHVRARDIDEHS-UHFFFAOYSA-N 1,5-cyclooctadiene Chemical compound C1CC=CCCC=C1 VYXHVRARDIDEHS-UHFFFAOYSA-N 0.000 description 1
- 239000004912 1,5-cyclooctadiene Substances 0.000 description 1
- OFERIJCSHDJMSA-UHFFFAOYSA-N 1-fluorohexane Chemical compound CCCCCCF OFERIJCSHDJMSA-UHFFFAOYSA-N 0.000 description 1
- XQBCCNOZAODMHL-UHFFFAOYSA-N 1-isocyano-2,2-dimethylpropane Chemical compound CC(C)(C)C[N+]#[C-] XQBCCNOZAODMHL-UHFFFAOYSA-N 0.000 description 1
- KUCAPSLVHGFOHX-UHFFFAOYSA-N 1-methylphosphole Chemical compound CP1C=CC=C1 KUCAPSLVHGFOHX-UHFFFAOYSA-N 0.000 description 1
- GZDVNUHKYJNVNT-UHFFFAOYSA-N 3-dimethylphosphanylpropyl(dimethyl)phosphane Chemical compound CP(C)CCCP(C)C GZDVNUHKYJNVNT-UHFFFAOYSA-N 0.000 description 1
- FNAYAXPWEKXHQU-UHFFFAOYSA-N 4-dimethylphosphanylbutyl(dimethyl)phosphane Chemical compound CP(C)CCCCP(C)C FNAYAXPWEKXHQU-UHFFFAOYSA-N 0.000 description 1
- BCJVBDBJSMFBRW-UHFFFAOYSA-N 4-diphenylphosphanylbutyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CCCCP(C=1C=CC=CC=1)C1=CC=CC=C1 BCJVBDBJSMFBRW-UHFFFAOYSA-N 0.000 description 1
- XLTRLRBXMJBVPL-UHFFFAOYSA-N 9,10-dibutylanthracene Chemical compound C1=CC=C2C(CCCC)=C(C=CC=C3)C3=C(CCCC)C2=C1 XLTRLRBXMJBVPL-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- HXTGGPKOEKKUQO-VQHVLOKHSA-N N-BENZYLIDENEMETHYLAMINE Chemical compound C\N=C\C1=CC=CC=C1 HXTGGPKOEKKUQO-VQHVLOKHSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical compound CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- GGRQQHADVSXBQN-FGSKAQBVSA-N carbon monoxide;(z)-4-hydroxypent-3-en-2-one;rhodium Chemical compound [Rh].[O+]#[C-].[O+]#[C-].C\C(O)=C\C(C)=O GGRQQHADVSXBQN-FGSKAQBVSA-N 0.000 description 1
- 230000006315 carbonylation Effects 0.000 description 1
- 238000005810 carbonylation reaction Methods 0.000 description 1
- 150000007942 carboxylates Chemical group 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- URYYVOIYTNXXBN-UPHRSURJSA-N cyclooctene Chemical compound C1CCC\C=C/CC1 URYYVOIYTNXXBN-UPHRSURJSA-N 0.000 description 1
- 239000004913 cyclooctene Substances 0.000 description 1
- UBLCREXFPCOOSX-UHFFFAOYSA-N cyclopenta-1,4-dien-1-yl(dimethyl)phosphane iron(2+) Chemical compound [Fe++].CP(C)[c-]1cccc1.CP(C)[c-]1cccc1 UBLCREXFPCOOSX-UHFFFAOYSA-N 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- ZXMSTCRBSAVFDO-UHFFFAOYSA-N dimethoxy(methyl)phosphane Chemical compound COP(C)OC ZXMSTCRBSAVFDO-UHFFFAOYSA-N 0.000 description 1
- LMZLQYYLELWCCW-UHFFFAOYSA-N dimethoxy(phenyl)phosphane Chemical compound COP(OC)C1=CC=CC=C1 LMZLQYYLELWCCW-UHFFFAOYSA-N 0.000 description 1
- AFABGHUZZDYHJO-UHFFFAOYSA-N dimethyl butane Natural products CCCC(C)C AFABGHUZZDYHJO-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical compound C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 1
- 238000007037 hydroformylation reaction Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- OAADXJFIBNEPLY-UHFFFAOYSA-N methoxy(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(OC)C1=CC=CC=C1 OAADXJFIBNEPLY-UHFFFAOYSA-N 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- MSFVFFZPHJPOHP-UHFFFAOYSA-N n-(4-methylphenyl)-1-phenylmethanimine Chemical compound C1=CC(C)=CC=C1N=CC1=CC=CC=C1 MSFVFFZPHJPOHP-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- CMYNJSCNISRWAR-UHFFFAOYSA-N n-cyclohexyl-2-methylpentan-1-imine Chemical compound CCCC(C)C=NC1CCCCC1 CMYNJSCNISRWAR-UHFFFAOYSA-N 0.000 description 1
- IWTCYHMMDLMKDZ-UHFFFAOYSA-N n-cyclohexylhexan-1-imine Chemical compound CCCCCC=NC1CCCCC1 IWTCYHMMDLMKDZ-UHFFFAOYSA-N 0.000 description 1
- KFLSWDVYGSSZRX-UHFFFAOYSA-N n-tert-butyl-1-phenylmethanimine Chemical compound CC(C)(C)N=CC1=CC=CC=C1 KFLSWDVYGSSZRX-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000002872 norbornadienyl group Chemical group C12=C(C=C(CC1)C2)* 0.000 description 1
- 229940078552 o-xylene Drugs 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- SWMBQMGPRYJSCI-UHFFFAOYSA-N octylphosphane Chemical compound CCCCCCCCP SWMBQMGPRYJSCI-UHFFFAOYSA-N 0.000 description 1
- RCIBIGQXGCBBCT-UHFFFAOYSA-N phenyl isocyanide Chemical compound [C-]#[N+]C1=CC=CC=C1 RCIBIGQXGCBBCT-UHFFFAOYSA-N 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 150000003138 primary alcohols Chemical class 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000858 thiocyanato group Chemical group *SC#N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 description 1
- RAVACSWYIIPFFV-UHFFFAOYSA-N tris[(4-methoxyphenyl)methyl]phosphane Chemical compound C1=CC(OC)=CC=C1CP(CC=1C=CC(OC)=CC=1)CC1=CC=C(OC)C=C1 RAVACSWYIIPFFV-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はシツフ塩基類の製造方法に関し、より
詳細には炭化水素類とイソニトリルからシツフ塩
基類を直接製造する方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for producing Schiff bases, and more particularly to a method for producing Schiff bases directly from hydrocarbons and isonitrile.
シツフ塩基類は、一般には対応するアルデヒド
と第1級アミンとを脱水縮合させることによつて
好収率で製造することができる。
Schiff bases can generally be produced in good yields by dehydration condensation of the corresponding aldehyde and a primary amine.
しかしながら原料アルデヒドは、1級アルコー
ルの酸化、オレフインのヒドロホルミル化、メチ
ル置換芳香族化合物の酸化、芳香族ハロゲン化物
のカルボニル化、芳香族化合物のKoch反応また
はVilsmeyer反応などによつて製造しなければな
らず、しかも、シツフ塩基を製造するためには、
このようにして得られたアルデヒドを更にアミン
と反応させなければならない欠点があつた。 However, raw aldehydes must be produced by oxidation of primary alcohols, hydroformylation of olefins, oxidation of methyl-substituted aromatic compounds, carbonylation of aromatic halides, Koch reaction or Vilsmeyer reaction of aromatic compounds, etc. Furthermore, in order to produce Schiff base,
A disadvantage was that the aldehyde thus obtained had to be further reacted with an amine.
本発明は上記従来の欠点を解消し、炭化水素類
に直接炭素−窒素二重結合を導入することからな
る直接的なシツフ塩基の製造方法を提供すること
を目的とする。
The object of the present invention is to overcome the above-mentioned conventional drawbacks and to provide a method for directly producing Schiff's base, which comprises directly introducing a carbon-nitrogen double bond into hydrocarbons.
上記目的を達成する本発明のシツフ塩基類の製
造法は、ホスフイン、ホスホナイト、ホスフイナ
イトおよびホスフアイトからなる群から選ばれた
少なくとも一種の有機リン化合物のロジウム錯体
の存在下、または少なくとも1種の該有機リン化
合物とロジウム化合物との共存下に、炭化水素類
とイソニトリルを光照射下に反応させることを特
徴とするものである。
The method for producing Schiff bases of the present invention which achieves the above object is carried out in the presence of a rhodium complex of at least one organic phosphorus compound selected from the group consisting of phosphine, phosphonite, phosphinite and phosphite, or at least one organic This method is characterized by reacting hydrocarbons and isonitrile under light irradiation in the coexistence of a phosphorus compound and a rhodium compound.
シツフ塩基類は、含窒素化合物の合成中間体と
して、あるいは液晶等の樹脂材料として用いられ
る重要な化合物群である。 Schiff bases are an important group of compounds that are used as synthetic intermediates for nitrogen-containing compounds or as resin materials for liquid crystals and the like.
本発明のシツフ塩基の製造方法は、ホスフイ
ン、ホスホナイト、ホスフイナイトおよびホスフ
アイトからなる群から選ばれた少なくとも1種の
有機リン化合物のロジウム錯体の存在下に行われ
る。 The method for producing Schiff's base of the present invention is carried out in the presence of a rhodium complex of at least one organic phosphorus compound selected from the group consisting of phosphine, phosphonite, phosphinite, and phosphite.
これらの有機リン化合物におけるリンは、すべ
て3価であり、具体的には、単座配位性の有機リ
ン化合物(PR′3で示す)として例えばトリメチ
ルホスフイン、トリエチルホスフイン、トリブチ
ルホスフイン、トリオクチルホスフイン、トリフ
エニルホスフイン、トリ(p−トリル)ホスフイ
ン、トリ(p−アニシル)ホスフイン等の鎖状ホ
スフイン、P−メチルホスホレン、P−メチルホ
スホール等の環状ホスフイン、ジメチル メチル
ホスホナイト、ジメチル フエニルホスホナイト
等のホスホナイト、メチルジメチルホスフイナイ
ト、メチル ジフエニルホスフイナイト等のホス
フイナイト、およびトリエチルホスフアイト、ト
リフエニルホスフアイト、トリメチロールプロパ
ンホスフアイト等のホスフアイトを挙げることが
でき、また2座配位性の有機リン化合物(R2 2P
−PR2 2で示す)として、例えば1,2−ビス
(ジメチルホスフイノ)エタン、1,3−ビス
(ジメチルホスフイノ)プロパン、1,4−ビス
(ジメチルホスフイノ)ブタン、1,2−ビス
(ジフエニルホスフイノ)エタン、1,4−ビス
(ジフエニルホスフイン)ブタン、1,1′−ビス
(ジメチルホスフイノ)フエロセン、1,1′−ビ
ス(ジフエニルホスフイノ)フエロセン、α,
α′−ビス(ジメチルホスフイノ)−ο−キシレン、
1,2−ビス(ジメチルホスフイノ)ヘンゼン等
のビスホスフインが挙げられる。 Phosphorus in these organic phosphorus compounds is all trivalent, and specifically, monodentate organic phosphorus compounds (indicated by PR' 3 ) such as trimethylphosphine, triethylphosphine, tributylphosphine, trivalent Chain phosphine such as octylphosphine, triphenylphosphine, tri(p-tolyl)phosphine, tri(p-anisyl)phosphine, cyclic phosphine such as P-methylphosphorene, P-methylphosphole, dimethyl methylphosphonite , phosphonites such as dimethyl phenylphosphonite, phosphinites such as methyl dimethyl phosphinite, methyl diphenyl phosphinite, and phosphites such as triethyl phosphite, triphenyl phosphite, trimethylolpropane phosphite, Also, bidentate organophosphorus compounds (R 2 2 P
-PR 2 2 ), for example, 1,2-bis(dimethylphosphino)ethane, 1,3-bis(dimethylphosphino)propane, 1,4-bis(dimethylphosphino)butane, 1,2- Bis(diphenylphosphino)ethane, 1,4-bis(diphenylphosphine)butane, 1,1'-bis(dimethylphosphino)ferrocene, 1,1'-bis(diphenylphosphino)ferrocene, α ,
α′-bis(dimethylphosphino)-ο-xylene,
Examples include bisphosphine such as 1,2-bis(dimethylphosphino)henzen.
これら有機リン化合物のロジウム錯体として
は、種々の構造のものを用いることができるが、
1価のロジウム錯体が好ましい。 These rhodium complexes of organophosphorus compounds can have various structures, but
Monovalent rhodium complexes are preferred.
具体的には例えばRhX(PR′3)3(PR′3は前記内
容を示す。またXは水素、ハロゲン原子、水酸
基、シアノ基、アルコキシ基、カルボキシラト基
およびチオシアナト基からなる群から選ばれる基
を示す。以下同様)、RhX(CO)(PR′3)2、RhX
(CO)2(PR′3)、RhX(CO)2(PR′3)2、RhX
(PR′3)4、〔Rh(PR′3)4〕Y(YはPF6、B
(C6H5)4、BF4、CIO4および前記Xからなる群か
ら選ばれる基を示す。以下同様)、〔Rh(PR′3)2
(CNR2)2〕Y(CNR2はイソニトリルを、R2はア
ルキルまたはアリール基を示す。以下、同様)、
〔Rh(PR′3)2(CNR2)3〕Y、RhX(CO)(R2 2P−
PR2 2)などを挙げることができる。 Specifically, for example, RhX (PR' 3 ) 3 (PR' 3 indicates the above content, and X is selected from the group consisting of hydrogen, a halogen atom, a hydroxyl group, a cyano group, an alkoxy group, a carboxylate group, and a thiocyanato group) (hereinafter the same), RhX (CO) (PR′ 3 ) 2 , RhX
(CO) 2 (PR′ 3 ), RhX (CO) 2 (PR′ 3 ) 2 , RhX
(PR′ 3 ) 4 , [Rh(PR′ 3 ) 4 ]Y (Y is PF 6 , B
It represents a group selected from the group consisting of (C 6 H 5 ) 4 , BF 4 , CIO 4 and the above X. (Same below), [Rh (PR′ 3 ) 2
(CNR 2 ) 2 ]Y (CNR 2 represents isonitrile, R 2 represents an alkyl or aryl group. The same applies hereinafter),
[Rh(PR′ 3 ) 2 (CNR 2 ) 3 ]Y, RhX(CO)(R 2 2 P−
PR 2 2 ), etc.
本発明のシツフ塩基類の製造法においては、必
ずしも上記した有機リン化合物のロジウム錯体を
予め調整して用いる必要はなく、上記有機リン化
合物と適当なロジウム化合物とを反応系に共存さ
せ、系中においてロジウム錯体を形成させる方法
によつても、好ましく実施することができる。 In the method for producing Schiff's bases of the present invention, it is not necessarily necessary to prepare the rhodium complex of the above-mentioned organophosphorus compound in advance and use the above-mentioned organophosphorus compound and an appropriate rhodium compound in the reaction system. It can also be preferably carried out by a method of forming a rhodium complex in .
このような目的のために好ましく用いられるロ
ジウム化合物としては、Rh(acac)(CO)2(acac
はアセチルアセトナト基を示す)、〔RhX
(CO)2〕2、〔RhX(DE)〕2(DEはノルボルナジエ
ン、1,5−シクロオクタジエン、または1,5
−ヘキサジエンを示す)、〔RhX(EN)2〕2(ENは
エチレンまたはシクロオクテンを示す)、RhX
(CO)(PR′3)2などが挙げられる。 Rhodium compounds preferably used for this purpose include Rh(acac)(CO) 2 (acac
represents acetylacetonato group), [RhX
(CO) 2 ] 2 , [RhX(DE)] 2 (DE is norbornadiene, 1,5-cyclooctadiene, or 1,5
-Hexadiene), [RhX (EN) 2 ] 2 (EN indicates ethylene or cyclooctene), RhX
Examples include (CO)(PR′ 3 ) 2 .
本発明の方法に好適な原料化合物は、炭素数30
以下の炭化水素類であるが、アルコキシ基、アシ
ル基、アシルオキシ基、カルボアルコキシ基、シ
ノア基、ハロゲン等で置換されていても良い。 The raw material compound suitable for the method of the present invention has 30 carbon atoms.
The following hydrocarbons may be substituted with an alkoxy group, an acyl group, an acyloxy group, a carbalkoxy group, a cynoa group, a halogen, or the like.
本発明で用いられる炭化水素類およびそる置換
体の具体例としては、例えばメタン、エタン、プ
ロパン、ブタン、ペンタン、ヘキサン、オクタ
ン、イソペンタン、イソオンタン、デカン、エイ
コサン、ジエチルエーテル、1−フルオロヘキサ
ン、ベンゼン、トルエン、エチルベンゼン、n−
ヘキシルベンゼン、o−キシレン、m−キシレ
ン、テトラリン、ナフタレン、2−メチルナフタ
レン、9,10−ジブチルアントラセン、クロロベ
ンゼン、アニソール等を挙げることができる。 Specific examples of hydrocarbons and substituted products used in the present invention include methane, ethane, propane, butane, pentane, hexane, octane, isopentane, iso-ontane, decane, eicosane, diethyl ether, 1-fluorohexane, and benzene. , toluene, ethylbenzene, n-
Examples include hexylbenzene, o-xylene, m-xylene, tetralin, naphthalene, 2-methylnaphthalene, 9,10-dibutylanthracene, chlorobenzene, and anisole.
これら炭化水素類のロジウム錯体またはロジウ
ム化合物に対する使用量は、任意に選ぶことがで
き、これら炭化水素類が液体である場合には、こ
の炭化水素類自体を溶媒量用いることも有利な方
法である。 The amount of these hydrocarbons to be used relative to the rhodium complex or rhodium compound can be selected arbitrarily, and when these hydrocarbons are liquid, it is also advantageous to use the amount of the hydrocarbons themselves as a solvent. .
しかしながら、反応温度において炭化水素類が
固体である場合には、シクロヘキサン、デカリン
等の溶媒が有利に使用される。 However, if the hydrocarbons are solid at the reaction temperature, solvents such as cyclohexane, decalin, etc. are advantageously used.
また、本発明で使用されるイソニトリルの構造
には制限がなく、例えばメチルイソニトリル、t
−ブチルイソニトリル、ネオペンチルイソニトリ
ル、シクロヘキシルイソニトリル、フエニルイソ
ニトリル、p−トリルイソニトリル等が用いられ
る。 Furthermore, there are no limitations on the structure of the isonitrile used in the present invention, such as methylisonitrile, t
-Butylisonitrile, neopentylisonitrile, cyclohexylisonitrile, phenylisonitrile, p-tolylisonitrile, etc. are used.
イソニトリルの添加量は、反応の生起にとつて
制限的ではないが、反応系中のイソニトリルの存
在量がロジウム錯体またはロジウム化合物の存在
量に対して著しく多くなると、反応速度を低下さ
せる傾向が認められる場合があり、このような場
合にはイソニトリルを小量づつ分割して添加する
のが好ましい。 The amount of isonitrile added is not critical to the occurrence of the reaction, but if the amount of isonitrile present in the reaction system is significantly greater than the amount of rhodium complex or rhodium compound present, it has been recognized that the reaction rate tends to decrease. In such cases, it is preferable to add isonitrile in small portions.
本発明における反応は、光照射下に進行する
が、光の波長領域はいわゆる紫外・可視光領域で
あれば良く、水銀燈、タングステンランプ、ハロ
ゲンランプ、キセノンランプ、太陽光などの照射
が好ましく用いられる。 The reaction in the present invention proceeds under light irradiation, but the wavelength range of light may be in the so-called ultraviolet/visible light range, and irradiation with mercury lamps, tungsten lamps, halogen lamps, xenon lamps, sunlight, etc. is preferably used. .
反応は0℃以下でも進行するが、好ましい反応
速度を達成するために250℃まで加熱することも
できる。 Although the reaction proceeds below 0°C, it can also be heated to 250°C to achieve favorable reaction rates.
反応後の生成物の分離は、未反応の炭化水素類
や溶媒を蒸留等で除去した後に、クロマトグラフ
イー、蒸留、再結晶等に付することによつて容易
に行うことができる。 The product after the reaction can be easily separated by removing unreacted hydrocarbons and solvent by distillation or the like, and then subjecting the product to chromatography, distillation, recrystallization, or the like.
本発明によれば、炭化水素類から一工程で直接
シツフ塩基を得ることができ、生成物の分離も容
易である。
According to the present invention, Schiff's base can be obtained directly from hydrocarbons in one step, and the product can be easily separated.
従つて本発明によれば、シツフ塩基を効率良く
製造することができる。 Therefore, according to the present invention, Schiff's base can be efficiently produced.
シツフ塩基類は、含窒素化合物の合成中間体と
して、あるいは液晶等の機能材料として用いられ
る重要な化合物群である。 Schiff bases are an important group of compounds that are used as intermediates for the synthesis of nitrogen-containing compounds or as functional materials for liquid crystals and the like.
以下、本発明の実施例を述べる。 Examples of the present invention will be described below.
〔実施例)
実施例 1
内容積70mlのPyrex製内部照射型光反応容器
に、RpCI(CO)(P(CH3)3)26.7mgのベンゼン溶
液を仕込み、シクロヘキシルイソニトリル180mg
を加えて100W高圧水銀燈で光照射しながら、室
温で16.5時間撹拌した。[Example] Example 1 A benzene solution of 6.7 mg of RpCI(CO)(P(CH 3 ) 3 ) 2 was charged into a Pyrex internal irradiation type photoreaction vessel with an internal volume of 70 ml, and 180 mg of cyclohexylisonitrile was charged.
was added and stirred at room temperature for 16.5 hours while irradiating with a 100W high-pressure mercury lamp.
ガスクロマトグラフイ−で分析した結果、N−
ベンジリデンシクロヘキシルアミンがロジウム錯
体に対して9%の収率で生成していることが判明
した。 As a result of gas chromatography analysis, N-
It was found that benzylidenecyclohexylamine was produced in a yield of 9% based on the rhodium complex.
実施例 2
シクロヘキシルイソニトリルの使用量を16.9mg
とした以外は実施例1と同様の操作を繰り返し
た。Example 2 The amount of cyclohexylisonitrile used was 16.9mg
The same operation as in Example 1 was repeated except that.
N−ベンジリデンシクロヘキシルアミンの収率
はロジウム基準で245%であつた。 The yield of N-benzylidenecyclohexylamine was 245% based on rhodium.
実施例 3
シクロヘキシルイソニトリルに代えてp−トリ
ルイソニトリル28.8mgを用い、実施例1と同様の
反応を行つた。Example 3 The same reaction as in Example 1 was carried out using 28.8 mg of p-tolylisonitrile in place of cyclohexylisonitrile.
N−ベンジリデン−p−トルイジンの収率はロ
ジウム基準で4%であつた。 The yield of N-benzylidene-p-toluidine was 4% based on rhodium.
実施例 4
シクロヘキシルイソニトリルに代えてメチルイ
ソニトリル5.8mgを用い、実施例1と同様の反応
を行つた。Example 4 The same reaction as in Example 1 was carried out using 5.8 mg of methylisonitrile in place of cyclohexylisonitrile.
N−ベンジリデンメチルアミンの収率はロジウ
ム基準で38%であつた。 The yield of N-benzylidenemethylamine was 38% based on rhodium.
実施例 5
シクロヘキシルイソニトリルに代えてt−ブチ
ルイソニトリル17mgを用い、実施例1と同様の反
応を行つた。Example 5 The same reaction as in Example 1 was carried out using 17 mg of t-butylisonitrile in place of cyclohexylisonitrile.
N−ベンジリデン−t−ブチルアミンの収率は
ロジウム基準で3%であつた。 The yield of N-benzylidene-t-butylamine was 3% based on rhodium.
実施例 6
ロジウム錯体としてRhCl(CO)(P(CH3)3)2の
代りに等グラム原子Rhの(RhCl(CO)2)2を用い、
さらにトリメチルホスフインをRhに対して2当
量添加して、実施例2の反応を繰り返したとこ
ろ、N−ベンジリデンシクロヘキシルアミンの収
率はロジウムに対して207%であつた。Example 6 Using isogram atom Rh (RhCl ( CO) 2 ) 2 instead of RhCl(CO)(P(CH 3 ) 3 ) 2 as a rhodium complex,
Furthermore, when 2 equivalents of trimethylphosphine was added to Rh and the reaction of Example 2 was repeated, the yield of N-benzylidenecyclohexylamine was 207% based on rhodium.
実施例 7
内容積70mlのPyrex製内部照射型光反応容器
に、クロロカルボニルビス(トリブチルホスフイ
ン)ロジウム12mg、シクロヘキシルイソニトリル
18.3mgおよびペンタン30mlを仕込み、100W高圧
水銀燈で光照射しながら窒素下に室温で22.5時間
撹拌した。反応時間3時間の時点で、シクロヘキ
シルイソニトリル11.7mgを追加した。Example 7 12 mg of chlorocarbonylbis(tributylphosphine) rhodium and cyclohexylisonitrile were placed in a Pyrex internal irradiation type photoreaction vessel with an internal volume of 70 ml.
18.3 mg and 30 ml of pentane were charged, and the mixture was stirred at room temperature under nitrogen for 22.5 hours while being irradiated with light using a 100 W high-pressure mercury lamp. At 3 hours of reaction time, 11.7 mg of cyclohexylisonitrile was added.
ガスクロマトグラフイ−およびGC−MSで分
析した結果、以下の生成物が検出された(収率は
ロジウム基準)。 As a result of analysis by gas chromatography and GC-MS, the following products were detected (yields are based on rhodium).
生成物 収率(%)
N−ヘキシリデンシクロヘキシルアミン6
N−(2−メチルペンチリデン)シクロヘキシル
アミン 12
N−(2−メチルブチリデン)シクロヘキシルア
ミン 12 。 Products Yield (%) N-hexylidenecyclohexylamine 6 N-(2-methylpentylidene)cyclohexylamine 12 N-(2-methylbutylidene)cyclohexylamine 12.
Claims (1)
およびホスフアイトからなる群から選ばれた少な
くとも一種の有機リン化合物のロジウム錯体の存
在下、または少なくとも1種の該有機リン化合物
とロジウム化合物との共存下に、炭化水素類とイ
ソニトリルを光照射下に反応させることを特徴と
するシツフ塩基類の製造法。1. In the presence of a rhodium complex of at least one organic phosphorus compound selected from the group consisting of phosphine, phosphonite, phosphinite, and phosphite, or in the coexistence of at least one organic phosphorus compound and a rhodium compound, hydrocarbons and A method for producing Schiff bases, which comprises reacting isonitrile under light irradiation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62253067A JPH0196162A (en) | 1987-10-07 | 1987-10-07 | Production of schiff bases |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62253067A JPH0196162A (en) | 1987-10-07 | 1987-10-07 | Production of schiff bases |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0196162A JPH0196162A (en) | 1989-04-14 |
| JPH055823B2 true JPH055823B2 (en) | 1993-01-25 |
Family
ID=17246029
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62253067A Granted JPH0196162A (en) | 1987-10-07 | 1987-10-07 | Production of schiff bases |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0196162A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4572391B2 (en) * | 2006-01-11 | 2010-11-04 | 独立行政法人産業技術総合研究所 | Process for producing bisphosphinoylaminomethanes |
-
1987
- 1987-10-07 JP JP62253067A patent/JPH0196162A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0196162A (en) | 1989-04-14 |
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