JPH0559033A - Epoxysuccinic acid derivative and its production - Google Patents
Epoxysuccinic acid derivative and its productionInfo
- Publication number
- JPH0559033A JPH0559033A JP3242763A JP24276391A JPH0559033A JP H0559033 A JPH0559033 A JP H0559033A JP 3242763 A JP3242763 A JP 3242763A JP 24276391 A JP24276391 A JP 24276391A JP H0559033 A JPH0559033 A JP H0559033A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- acid derivative
- salt
- reaction
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- DCEMCPAKSGRHCN-UHFFFAOYSA-N oxirane-2,3-dicarboxylic acid Chemical class OC(=O)C1OC1C(O)=O DCEMCPAKSGRHCN-UHFFFAOYSA-N 0.000 title claims abstract description 31
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 18
- 238000006735 epoxidation reaction Methods 0.000 claims abstract description 18
- 150000003839 salts Chemical class 0.000 claims abstract description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 15
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000003054 catalyst Substances 0.000 claims abstract description 11
- 150000007530 organic bases Chemical class 0.000 claims abstract description 9
- 150000007529 inorganic bases Chemical class 0.000 claims abstract description 8
- VTNBTUFKJGHHSM-UHFFFAOYSA-N 2,5-dioxofuran-3-sulfonic acid Chemical class OS(=O)(=O)C1=CC(=O)OC1=O VTNBTUFKJGHHSM-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000002904 solvent Substances 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims abstract description 3
- 239000002184 metal Substances 0.000 claims abstract description 3
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 3
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 3
- 239000000126 substance Substances 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims description 2
- 239000011734 sodium Substances 0.000 abstract description 8
- 239000002994 raw material Substances 0.000 abstract description 7
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract description 6
- 229910052708 sodium Inorganic materials 0.000 abstract description 6
- 239000003599 detergent Substances 0.000 abstract description 5
- 150000001991 dicarboxylic acids Chemical class 0.000 abstract description 5
- 239000004094 surface-active agent Substances 0.000 abstract description 5
- 239000002270 dispersing agent Substances 0.000 abstract description 4
- 239000003795 chemical substances by application Substances 0.000 abstract description 3
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 abstract description 2
- 229920006395 saturated elastomer Polymers 0.000 abstract description 2
- 150000003443 succinic acid derivatives Chemical class 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 28
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 22
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 15
- 239000002253 acid Substances 0.000 description 14
- YZCKVEUIGOORGS-IGMARMGPSA-N Protium Chemical compound [1H] YZCKVEUIGOORGS-IGMARMGPSA-N 0.000 description 12
- 239000001384 succinic acid Substances 0.000 description 11
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 8
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 8
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 8
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 4
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 4
- 229910052788 barium Inorganic materials 0.000 description 4
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 4
- 229910052791 calcium Inorganic materials 0.000 description 4
- 239000011575 calcium Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- 229910052700 potassium Inorganic materials 0.000 description 4
- 239000011591 potassium Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- -1 barium Chemical class 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Inorganic materials O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 3
- 239000013076 target substance Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000003125 aqueous solvent Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- CYUUZGXOQDCCGH-UHFFFAOYSA-N dodecyl dodecanoate Chemical compound CCCCCCCCCCCCOC(=O)CCCCCCCCCCC CYUUZGXOQDCCGH-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004811 liquid chromatography Methods 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- WLAPTSNEOUBIQO-UHFFFAOYSA-N 2-hydroxy-3-sulfobutanedioic acid Chemical compound OC(=O)C(O)C(C(O)=O)S(O)(=O)=O WLAPTSNEOUBIQO-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical class OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- 101000777220 Homo sapiens Ubiquitin carboxyl-terminal hydrolase 3 Proteins 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 102100031287 Ubiquitin carboxyl-terminal hydrolase 3 Human genes 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000001142 dicarboxylic acid group Chemical group 0.000 description 1
- AAQNGTNRWPXMPB-UHFFFAOYSA-N dipotassium;dioxido(dioxo)tungsten Chemical compound [K+].[K+].[O-][W]([O-])(=O)=O AAQNGTNRWPXMPB-UHFFFAOYSA-N 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000005805 hydroxylation reaction Methods 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- GBMDVOWEEQVZKZ-UHFFFAOYSA-N methanol;hydrate Chemical compound O.OC GBMDVOWEEQVZKZ-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 239000002455 scale inhibitor Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Epoxy Compounds (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は新規なエポキシこはく酸
誘導体及びその製法に関し、このエポキシこはく酸誘導
体は、洗剤、分散剤、洗浄剤、水処理剤、界面活性剤等
の製造原料として有用である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel epoxysuccinic acid derivative and a process for producing the same, which is useful as a raw material for producing detergents, dispersants, detergents, water treatment agents, surfactants and the like. is there.
【0002】[0002]
【従来の技術】α,β−不飽和ジカルボン酸無水物をス
ルホン化した後加水分解してスルホン化α,β−不飽和
ジカルボン酸を製造する方法は、たとえばRec.Tr
av.Chim.,46,473(1927) 等によって周知であ
る。また下記反応式に示す様に、スルホン化α,β−不
飽和ジカルボン酸無水物にアルカリ金属水酸化物を反応
させてα−ヒドロキシ−β−スルホこはく酸塩を製造す
る方法も、たとえばUSP3,912,663 に開示されてい
る。2. Description of the Related Art A method for producing a sulfonated .alpha.,. Beta.-unsaturated dicarboxylic acid by sulfonating an .alpha.,. Beta.-unsaturated dicarboxylic acid anhydride and then hydrolyzing it is described, for example, in Rec. Tr
av. Chim. , 46 , 473 (1927) and the like. Further, as shown in the following reaction formula, a method for producing an α-hydroxy-β-sulfosuccinate by reacting an alkali metal hydroxide with a sulfonated α, β-unsaturated dicarboxylic acid anhydride, for example, USP3, 912,663.
【0003】[0003]
【化3】 [Chemical 3]
【0004】[0004]
【発明が解決しようとする課題】本発明は、スルホン化
α,β−不飽和ジカルボン酸におけるα位とβ位の間を
エポキシ化した新規なエポキシこはく酸誘導体及びその
製法を提供しようとするものである。DISCLOSURE OF THE INVENTION The present invention aims to provide a novel epoxysuccinic acid derivative in which a sulfonated α, β-unsaturated dicarboxylic acid is epoxidized between the α-position and the β-position, and a method for producing the same. Is.
【0005】[0005]
【課題を解決するための手段】本発明は、下記一般式
[I] で示されるエポキシこはく酸誘導体もしくはその塩
である。The present invention has the following general formula:
It is an epoxysuccinic acid derivative represented by [I] or a salt thereof.
【0006】[0006]
【化4】 [Chemical 4]
【0007】このエポキシこはく酸誘導体は、下記一般
式[II]で示されるスルホ無水マレイン酸誘導体に、水溶
媒中、無機塩基もしくは有機塩基、並びにエポキシ化触
媒の存在下pH2〜8の範囲で過酸化水素を反応させる
ことによって収率良く得ることができる。This epoxysuccinic acid derivative is mixed with a sulfomaleic anhydride derivative represented by the following general formula [II] in a pH range of 2 to 8 in the presence of an inorganic base or organic base and an epoxidation catalyst in a water solvent. It can be obtained in good yield by reacting with hydrogen oxide.
【0008】[0008]
【化5】 [Chemical 5]
【0009】[0009]
【作用】本発明に係るエポキシこはく酸誘導体における
置換期Rとしては、水素原子あるいはメチル、エチル、
プロピル、ブチルなどの炭素数1〜4の飽和脂肪族炭化
水素が挙げられる。またエポキシこはく酸誘導体の塩と
しては、リチウム、ナトリウム、カリウム等のアルカリ
金属との塩、マグネシウム、カルシウム、ストロンチウ
ム、バリウム等のアルカリ土類金属との塩、亜鉛塩、ア
ンモニウム塩等の無機塩、及びメチルアミン、エチルア
ミン、エタノールアミン、アニリン、ジメチルアミン、
ピリジン、トリエチルアミン等の有機塩基との塩等が挙
げられる。尚上記塩基がたとえば2価イオンの塩基であ
る場合は、たとえば下記式に示す如く2分子間で塩を構
成し、この様な場合も本発明に含まれる。In the epoxysuccinic acid derivative according to the present invention, the substitution period R is hydrogen atom, methyl, ethyl,
Examples thereof include saturated aliphatic hydrocarbons having 1 to 4 carbon atoms such as propyl and butyl. As the salt of the epoxysuccinic acid derivative, lithium, sodium, a salt with an alkali metal such as potassium, magnesium, calcium, strontium, a salt with an alkaline earth metal such as barium, a zinc salt, an inorganic salt such as an ammonium salt, And methylamine, ethylamine, ethanolamine, aniline, dimethylamine,
Examples thereof include salts with organic bases such as pyridine and triethylamine. When the above-mentioned base is, for example, a divalent ion base, a salt is formed between two molecules as shown in the following formula, and such a case is also included in the present invention.
【0010】[0010]
【化6】 [Chemical 6]
【0011】エポキシこはく酸誘導体の塩の具体例とし
ては、2−スルホエポキシこはく酸2水素1ナトリウ
ム、2−スルホエポキシこはく酸2水素1カリウム、2
−スルホエポキシこはく酸2水素1アンモニウム、2−
スルホエポキシこはく酸1水素2ナトリウム、2−スル
ホエポキシこはく酸1水素2カリウム、2−スルホエポ
キシこはく酸1水素2アンモニウム、、2−スルホエポ
キシこはく酸3ナトリウム、2−スルホエポキシこはく
酸3カリウム、2−スルホエポキシこはく酸3アンモニ
ウム、2−スルホエポキシこはく酸2水素1/2 カルシウ
ム、2−スルホエポキシこはく酸2水素1/2 マグネシウ
ム、2−スルホンエポキシこはく酸2水素1/2 バリウ
ム、2−スルホンエポキシこはく酸2水素1/2 亜鉛、2
−スルホエポキシこはく酸1水素1カルシウム、2−ス
ルホエポキシこはく酸1水素1マグネシウム、2−スル
ホンエポキシこはく酸1水素1バリウム、2−スルホエ
ポキシこはく酸1水素1亜鉛、2−スルホエポキシこは
く酸2水素1アリニン、2−スルホエポキシこはく酸2
水素1トリメチルアミン、2−スルホエポキシこはく酸
2水素1トリエチルアミン、2−スルホエポキシこはく
酸2水素1ピリジン、2−スルホエポキシこはく酸1水
素2アニリン、2−スルホエポキシこはく酸1水素2ト
リメチルアミン、2−スルホエポキシこはく酸1水素2
トリエチルアミン、2−スルホエポキシこはく酸1水素
2ピリジン、2−スルホエポキシこはく酸3アニリン、
2−スルホエポキシこはく酸3トリメチルアミン、2−
スルホエポキシこはく酸3トリエチルアミン、2−スル
ホエポキシこはく酸3ピリジン等の2−スルホエポキシ
こはく酸塩が挙げられる。Specific examples of the salt of the epoxysuccinic acid derivative include 2-sulfoepoxysuccinic acid dihydrogen 1 sodium, 2-sulfoepoxysuccinic acid dihydrogen 1 potassium 2
-Sulfoepoxy succinic acid dihydrogen 1 ammonium, 2-
Sulfoepoxy succinic acid monosodium hydrogen, 2-sulfoepoxy succinic acid dipotassium hydrogen, 2-sulfoepoxy succinic acid dihydrogen ammonium, 2-sulfoepoxy succinic acid 3 sodium, 2-sulfoepoxy succinic acid 3 potassium, 2-sulfo epoxy succinic acid 3 ammonium, 2-sulfo epoxy succinic acid 2 hydrogen 1/2 calcium, 2-sulfo epoxy succinic acid 2 hydrogen 1/2 magnesium, 2-sulfo epoxy succinic acid 2 hydrogen 1/2 barium, 2- Sulfone Epoxy succinic acid 2 hydrogen 1/2 zinc, 2
-Sulfoepoxy succinic acid 1 hydrogen 1 calcium, 2-sulfo epoxy succinic acid 1 hydrogen 1 magnesium, 2-sulfone epoxy succinic acid 1 hydrogen 1 barium, 2-sulfo epoxy succinic acid 1 hydrogen 1 zinc, 2-sulfo epoxy succinic acid 2 Hydrogen 1 Alinine, 2-Sulfoepoxy succinic acid 2
Hydrogen 1 trimethylamine, 2-sulfoepoxysuccinic acid 2 hydrogen 1 triethylamine, 2-sulfoepoxy succinic acid 2 hydrogen 1 pyridine, 2-sulfoepoxy succinic acid 1 hydrogen 2 aniline, 2-sulfoepoxy succinic acid 1 hydrogen 2 trimethylamine, 2- Sulfoepoxy succinic acid 1 hydrogen 2
Triethylamine, 2-sulfoepoxysuccinic acid 1 hydrogen 2 pyridine, 2-sulfoepoxy succinic acid 3 aniline,
2-sulfoepoxysuccinic acid 3 trimethylamine, 2-
Examples thereof include 2-sulfoepoxysuccinic acid salts such as sulfoepoxysuccinic acid 3 triethylamine and 2-sulfoepoxysuccinic acid 3 pyridine.
【0012】本発明に係る上記の2−スルホエポキシこ
はく酸誘導体及びその塩は、分子中に含まれるスルホン
酸基やジカルボン酸基及びそれらの塩並びにエポキシ基
に由来する反応活性や界面活性等を有しており、洗剤、
分散剤、洗浄剤、水処理剤、スケール防止剤、界面活性
剤等の原料として有用であるばかりでなく、塩の種類を
選定すればそれ自身で界面活性剤等として利用すること
もできる。The above-mentioned 2-sulfoepoxysuccinic acid derivatives and salts thereof according to the present invention have reaction activity and surface activity derived from sulfonic acid groups and dicarboxylic acid groups and their salts and epoxy groups contained in the molecule. Have, detergent,
Not only is it useful as a raw material for dispersants, detergents, water treatment agents, scale inhibitors, surfactants, etc., but it can also be used as a surfactant or the like by selecting the type of salt.
【0013】上記の2−スルホエポキシこはく酸誘導体
またはその塩は、前記一般式[II]で示されるスルホ無水
マレイン酸誘導体に、水性溶媒中、無機塩基もしくは有
機塩基、並びにエポキシ化触媒の存在下pH2〜8の範
囲で過酸化水素を反応させることによって収率良く製造
することができる。The above-mentioned 2-sulfoepoxysuccinic acid derivative or a salt thereof is obtained by adding the sulfomaleic anhydride derivative represented by the general formula [II] to an inorganic base or organic base and an epoxidation catalyst in an aqueous solvent. It can be produced in good yield by reacting hydrogen peroxide in the pH range of 2 to 8.
【0014】ここで使用される無機塩基としては、たと
えばリチウム、ナトリウム、カリウム等のアルカリ金
属、カルシウム、マグネシウム、バリウム等のアルカリ
土類金属、亜鉛等の金属の水酸化物、炭酸塩、重炭酸
塩、アンモニア等を挙げることができ、また有機塩基と
してはアニリン、トリメチルアミン、トリエチルアミ
ン、ピリジン等の有機アミン類が好ましいものとして例
示される。Examples of the inorganic base used here include alkali metals such as lithium, sodium and potassium, alkaline earth metals such as calcium, magnesium and barium, metal hydroxides such as zinc, carbonates and bicarbonates. Salts, ammonia and the like can be mentioned, and preferable examples of the organic base include organic amines such as aniline, trimethylamine, triethylamine and pyridine.
【0015】エポキシ化触媒としては、モリブデン、コ
バルト、チタン、バナジウム、タングステン等の金属を
含む水溶性乃至水分散性の金属化合物が使用される。エ
ポキシ化触媒の中でも特に好ましいのはタングステン酸
ナトリウムあるいはタングステン酸カリウムである。エ
ポキシ化触媒の好ましい添加量は、前記一般式[II]で示
される原料化合物に対して0.001 〜1当量の範囲であ
る。As the epoxidation catalyst, a water-soluble or water-dispersible metal compound containing a metal such as molybdenum, cobalt, titanium, vanadium, or tungsten is used. Among the epoxidation catalysts, sodium tungstate or potassium tungstate is particularly preferable. The preferred addition amount of the epoxidation catalyst is in the range of 0.001 to 1 equivalent based on the raw material compound represented by the general formula [II].
【0016】この反応は水性溶媒中で行なわれるが、反
応系のpHは2〜8、より好ましくは4〜6の範囲に設
定する必要があり、pHがこの範囲を外れて強酸性域も
しくはアルカリ性域になると、一般式[II]で示される化
合物の2重結合部分に水分子が付加したヒドロキシル化
物が多量副生し、目的物の収率が極端に低くなるばかり
でなく、pH2未満の強酸性側になると、たとえばエポ
キシ化触媒として用いられるタングステン酸ナトリウム
がタングステン酸となって触媒活性が著しく低下し、エ
ポキシ化反応の進行が著しく阻害される。エポキシ化反
応の温度は、エポキシ化触媒の種類や反応圧力等によっ
ても異なるが、通常は0〜100 ℃、好ましくは20〜90℃
の範囲で実施される。This reaction is carried out in an aqueous solvent, but the pH of the reaction system needs to be set within the range of 2 to 8, more preferably 4 to 6, and the pH is out of this range and in a strongly acidic region or alkaline. In the region, a large amount of a hydroxylated product in which a water molecule is added to the double bond portion of the compound represented by the general formula [II] is by-produced, which not only extremely lowers the yield of the target product but also causes strong acidity below pH 2. On the other hand, for example, sodium tungstate used as an epoxidation catalyst becomes tungstic acid and the catalytic activity is remarkably lowered, and the progress of the epoxidation reaction is remarkably hindered. The temperature of the epoxidation reaction varies depending on the type of the epoxidation catalyst and the reaction pressure, but is usually 0 to 100 ° C, preferably 20 to 90 ° C.
It is carried out in the range of.
【0017】以下、一般式[I] で示される目的化合物の
製法について説明する。まず前記一般式[II]で示される
原料化合物は、無水マレイン酸と無水硫酸から公知の方
法によって製造される下記化合物[III]The method for producing the target compound represented by the general formula [I] will be described below. First, the starting compound represented by the general formula [II] is the following compound [III] produced by a known method from maleic anhydride and sulfuric anhydride.
【0018】[0018]
【化7】 [Chemical 7]
【0019】を、−5〜50℃に調整された純水中に滴下
し、5〜120分程度攪拌することによって容易に得るこ
とができる。このとき、化合物[III] は、少なくとも30
℃以上の温度に保持された液体の状態で冷水中に滴下す
るのがよい。化合物[III] を純水中に滴下すると、加水
分解に伴なう反応熱によって液温が上昇し、温度が上り
過ぎると化合物[III] の2重結合部分に水の付加が起こ
ってヒドロキシル化物が副生するので、加水分解に当た
っては反応系を冷却し、反応系の温度が50℃を超えない
様にすべきである。このときの水溶液濃度は、化合物[I
II] に対して水溶媒を10〜500 重量%、より好ましくは
150 〜300 重量%の範囲に設定するのがよい。濃度が高
過ぎると、反応系の攪拌が困難になって温度制御がむつ
かしくなり、一方濃度が薄過ぎる場合は、その後の濃縮
に多大なエネルギーを要することになるので実用性を欠
く。It can be easily obtained by adding dropwise to pure water adjusted to -5 to 50 ° C and stirring for about 5 to 120 minutes. At this time, the compound [III] is at least 30
It is advisable to drop the solution in cold water in a liquid state maintained at a temperature of ℃ or more. When compound [III] is dropped into pure water, the liquid temperature rises due to the reaction heat associated with hydrolysis, and if the temperature rises too much, water is added to the double bond portion of compound [III] to form a hydroxylated product. As a by-product, the reaction system should be cooled during hydrolysis so that the temperature of the reaction system does not exceed 50 ° C. The aqueous solution concentration at this time was
II] to 10-500% by weight of water solvent, more preferably
It is recommended to set it in the range of 150 to 300% by weight. If the concentration is too high, it becomes difficult to stir the reaction system and the temperature control becomes difficult. On the other hand, if the concentration is too low, a large amount of energy is required for the subsequent concentration, which is not practical.
【0020】かくして得られる一般式[II]で示される化
合物を含む水溶液に、前述の様な無機塩基もしくは有機
塩基を1〜2当量滴下することによってpHを2〜8に
調整する。この間、反応温度は−5〜50℃に保持し、ヒ
ドロキシル化物の生成を防止しつつ、適度の反応速度を
確保する。To the thus obtained aqueous solution containing the compound represented by the general formula [II], 1 to 2 equivalents of the above-mentioned inorganic base or organic base is added dropwise to adjust the pH to 2 to 8. During this period, the reaction temperature is maintained at -5 to 50 ° C to prevent the formation of hydroxylated product and ensure an appropriate reaction rate.
【0021】この水溶液に、0.001 〜1当量程度のエポ
キシ化触媒を添加し、続いて1〜10当量程度の過酸化水
素を加えてエポキシ化反応を行なう。このとき過酸化水
素の添加と共にエポキシ化反応が進行し、反応系のpH
は徐々に酸性側へ移行してくるので、反応初期にpH調
整用として用いた前記無機塩基もしくは有機塩基の水溶
液を逐次追加し、反応系を前述の好適pH域に維持す
る。またこのエポキシ化反応工程でも、反応熱によって
反応系の温度が徐々に上昇するので、温度が過度に高温
とならない様に冷却することが望まれる。このときの好
ましい反応温度は0〜100 ℃、より好ましくは20〜90℃
であるが、エポキシ化反応の初期乃至前半期において
は、2重結合への水付加によるヒドロキシル化反応が起
こり易いので反応温度を低めに制御すべきであり、エポ
キシ化の進んだ後半期においては、反応温度を高めて反
応収率を高めることが望まれる。To this aqueous solution, 0.001 to 1 equivalent of an epoxidation catalyst is added, and subsequently 1 to 10 equivalents of hydrogen peroxide is added to carry out an epoxidation reaction. At this time, the epoxidation reaction proceeds with the addition of hydrogen peroxide, and the pH of the reaction system
Since it gradually shifts to the acidic side, the aqueous solution of the inorganic base or organic base used for pH adjustment at the initial stage of the reaction is sequentially added to maintain the reaction system in the above-mentioned suitable pH range. Also in this epoxidation reaction step, the temperature of the reaction system gradually rises due to the heat of reaction, so it is desirable to cool it so that the temperature does not become excessively high. The preferred reaction temperature at this time is 0 to 100 ° C, more preferably 20 to 90 ° C.
However, in the early to the first half of the epoxidation reaction, the hydroxylation reaction due to the addition of water to the double bond is likely to occur, so the reaction temperature should be controlled lower, and in the latter half of the epoxidation reaction, It is desired to increase the reaction temperature to increase the reaction yield.
【0022】反応終了後、反応液をメタノール、エタノ
ール、アセトン等の有機溶剤に注入すると、目的物質が
析出してくるので、これを再結晶法等により常法に従っ
て精製すると、高純度の目的物質を結晶として得ること
ができる。また反応終了後塩化水素等の酸で処理してか
ら精製を行なうと、目的物質を有機酸の状態で得ること
ができる。After completion of the reaction, when the reaction solution is poured into an organic solvent such as methanol, ethanol or acetone, the target substance is precipitated. Therefore, if this is purified by a conventional method such as recrystallization method, the target substance of high purity can be obtained. Can be obtained as crystals. Further, when the reaction is completed and then treated with an acid such as hydrogen chloride and then purified, the target substance can be obtained in the form of an organic acid.
【0023】[0023]
【発明の効果】本発明は以上の様に構成されており、分
子中にスルホン酸基、エポキシ基及びカルボン酸基を含
み、界面活性剤、分散剤等の原料として有用な化合物を
提供し得ることになった。INDUSTRIAL APPLICABILITY The present invention is constituted as described above and can provide a compound containing a sulfonic acid group, an epoxy group and a carboxylic acid group in the molecule and useful as a raw material for a surfactant, a dispersant and the like. is what happened.
【0024】[0024]
【実施例】以下、実施例を挙げて本発明を具体的に説明
するが、本発明はもとより下記実施例に限定されるもの
ではない。実施例1 攪拌機、pHメーター、滴下ロート、および冷却装置を
備えた1リットル容量のフラスコに、445ml の純水を入
れて0℃に調整しておき、これに60℃に保持した液状の
スルホ無水マレイン酸178gを滴下ロートより徐々に添加
した。この間、水溶液の温度が20℃を超えないように冷
却しながら、他の滴下ロートよりNaOH水溶液を滴下
し、反応系のpHを4.5 に調整した。次いでこの水溶液
を60℃に昇温し、0.1 NのNaOH水溶液を用いてpH
=4.5 に調整しながらタングステン酸ナトリウム3.3gを
添加し、20分間攪拌した後、滴下ロートを用いて60%過
酸化水素水56.7g を20分間かけて滴下した。同温度で更
に3時間攪拌した後、5リットルのビーカーに入れたメ
タノール4リットルの中に反応液を投入して晶析させ、
更に水−メタノール溶液(水/メタノール重量比=50/
50)を用いて再結晶を2回行い325gの白色結晶(目的化
合物)を得た。白色結晶の収率は、用いた原料のスルホ
無水マレイン酸に対して、98.0モル%に相当する。上記
白色結晶の分析結果は下記の通りであった。 NMR :1H−NMR(D20) δ 3.9(s,1H)ppm (図1参照) 13C−NMR(D20) δ 171.8,168.1 ,72.5,59.1ppm IR(KBr):1220 cm-1 (エポキシ環の対称伸縮) (図2参照) 940 cm-1 (エポキシ環の逆対称伸縮) 815 cm-1 (エポキシ環の12μ吸収帯) 元素分析: 実験式 C4 HO8 SNa3 ・3H2 Oとして 計算値 C:14.47 ,H:2.12,S:9.65 ,Na:20.77 実測値 C:14.46 ,H:2.23,S:9.69 ,Na:20.83 上記の分析結果より、得られた白色結晶は目的化合物で
あるスルホエポキシこはく酸ナトリウムであることが確
認された。EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to the following examples. Example 1 A liter-volume flask equipped with a stirrer, a pH meter, a dropping funnel, and a cooling device was charged with 445 ml of pure water and adjusted to 0 ° C. 178 g of maleic acid was gradually added from the dropping funnel. During this time, while cooling the temperature of the aqueous solution so as not to exceed 20 ° C., an aqueous NaOH solution was added dropwise from another dropping funnel to adjust the pH of the reaction system to 4.5. Then, the temperature of this aqueous solution is raised to 60 ° C., and the pH is adjusted with 0.1 N NaOH aqueous solution.
= 4.5, sodium tungstate (3.3 g) was added, the mixture was stirred for 20 minutes, and then 60% hydrogen peroxide solution (56.7 g) was added dropwise over 20 minutes using a dropping funnel. After stirring for 3 hours at the same temperature, the reaction solution was added to 4 liters of methanol in a 5 liter beaker for crystallization,
Further water-methanol solution (water / methanol weight ratio = 50 /
50) was recrystallized twice to obtain 325 g of white crystals (target compound). The yield of white crystals corresponds to 98.0 mol% based on the raw material sulfomaleic anhydride used. The analysis results of the white crystals are as follows. NMR: 1H-NMR (D20) δ 3.9 (s, 1H) ppm (see FIG. 1) 13C-NMR (D20) δ 171.8, 168.1, 72.5, 59.1ppm IR (KBr): 1220 cm -1 (epoxy ring symmetry Stretching (see Fig. 2) 940 cm -1 (reverse symmetrical stretching of the epoxy ring) 815 cm -1 (12μ absorption band of the epoxy ring) Elemental analysis: Empirical formula C 4 HO 8 SNa 3 · 3H 2 O Calculated value C : 14.47, H: 2.12, S: 9.65, Na: 20.77 Actual value C: 14.46, H: 2.23, S: 9.69, Na: 20.83 From the above analysis results, the obtained white crystals were the target compound, sulfoepoxy amber. It was confirmed to be sodium acid.
【0025】比較例1 攪拌機、滴下ロートおよび冷却装置を備えた1リットル
容量のフラスコに、330gのジオキサンを入れて0℃に調
整しておき、これに粉末状のシスエポキシこはく酸132g
を徐々に添加した。次いで、溶液の温度が5℃を超えな
いように冷却しながら、滴下ロートを用いて無水硫酸80
g を1時間かけて滴下し、同温度に保って更に2時間攪
拌した。反応終了後、減圧下で溶媒を除去したところ13
1gの茶褐色結晶がえられた。この結晶を液体クロマトグ
ラフィーで分析したところ、シスエポキシこはく酸であ
ることが確認され、スルホエポキシこはく酸は生成して
いなかった。この実験からも明らかである様に、エポキ
シこはく酸を原料としてこれをスルホン化して本発明の
目的化合物を得ようとしても、目的を果たすことはでき
ない。 Comparative Example 1 In a 1 liter flask equipped with a stirrer, a dropping funnel and a cooling device, 330 g of dioxane was added and adjusted to 0 ° C., and 132 g of powdered cis-epoxysuccinic acid was added thereto.
Was gradually added. Then, while cooling so that the temperature of the solution does not exceed 5 ° C, 80% sulfuric acid was added using a dropping funnel.
g was added dropwise over 1 hour, and the mixture was stirred at the same temperature for 2 hours. After the reaction was completed, the solvent was removed under reduced pressure.
1 g of dark brown crystals were obtained. When the crystals were analyzed by liquid chromatography, they were confirmed to be cis-epoxysuccinic acid, and sulfoepoxysuccinic acid was not produced. As is apparent from this experiment, even if an epoxysuccinic acid is used as a raw material and sulfonated to obtain the objective compound of the present invention, the objective cannot be achieved.
【0026】比較例2 上記比較例1における無水硫酸滴下後の反応温度を60℃
に代えた以外は全く同様にして反応を行なったところ、
タール状の物質が得られた。これを液体クロマトグラフ
ィーで分析を行なったところ、同定困難な化合物の混合
物であり、スルホエポキシこはく酸の存在は確認できな
かった。上記比較例1,2の結果からも明らかである様
に、エポキシこはく酸を出発原料とし、これを無水硫酸
によりスルホン化して本発明の目的化合物を得ようとし
ても、目的を果たすことはできない。 Comparative Example 2 The reaction temperature after the dropwise addition of sulfuric anhydride in Comparative Example 1 was 60 ° C.
When the reaction was carried out in exactly the same manner except that
A tar-like substance was obtained. When this was analyzed by liquid chromatography, it was a mixture of compounds that were difficult to identify, and the presence of sulfoepoxysuccinic acid could not be confirmed. As is clear from the results of Comparative Examples 1 and 2, even if an epoxysuccinic acid is used as a starting material and this is sulfonated with sulfuric anhydride to obtain the object compound of the present invention, the object cannot be achieved.
【図1】本発明に係るエポキシこはく酸誘導体のNMR
チャートである。FIG. 1 is an NMR of an epoxysuccinic acid derivative according to the present invention.
It is a chart.
【図2】本発明に係るエポキシこはく酸誘導体のIRチ
ャートである。FIG. 2 is an IR chart of an epoxysuccinic acid derivative according to the present invention.
Claims (3)
するエポキシこはく酸誘導体またはその塩。 【化1】 1. An epoxysuccinic acid derivative or salt thereof represented by the following general formula [I]: [Chemical 1]
レイン酸誘導体に、水溶媒中、無機塩基もしくは有機塩
基、並びにエポキシ化触媒の存在下pH2〜8の範囲で
過酸化水素を反応させて、請求項1記載のエポキシこは
く酸誘導体またはその塩を得ることを特徴とするエポキ
シこはく酸誘導体の製法。 【化2】 2. A sulfomaleic anhydride derivative represented by the following general formula [II] is reacted with hydrogen peroxide in a water solvent in the presence of an inorganic base or an organic base and an epoxidation catalyst in the range of pH 2 to 8. A method for producing an epoxysuccinic acid derivative, comprising obtaining the epoxysuccinic acid derivative according to claim 1 or a salt thereof. [Chemical 2]
ト、チタン、バナジウム、タングステンよりなる群から
選択される1種以上の金属の化合物である請求項2記載
の製法。3. The method according to claim 2, wherein the epoxidation catalyst is a compound of at least one metal selected from the group consisting of molybdenum, cobalt, titanium, vanadium, and tungsten.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3242763A JPH0559033A (en) | 1991-08-27 | 1991-08-27 | Epoxysuccinic acid derivative and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3242763A JPH0559033A (en) | 1991-08-27 | 1991-08-27 | Epoxysuccinic acid derivative and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0559033A true JPH0559033A (en) | 1993-03-09 |
Family
ID=17093915
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3242763A Withdrawn JPH0559033A (en) | 1991-08-27 | 1991-08-27 | Epoxysuccinic acid derivative and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0559033A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010106009A (en) * | 2008-09-30 | 2010-05-13 | Sanyo Chem Ind Ltd | Method for producing epoxy compound |
| WO2010110151A1 (en) * | 2009-03-25 | 2010-09-30 | 昭和電工株式会社 | Method for producing epoxy compound |
| JP2011001287A (en) * | 2009-06-18 | 2011-01-06 | National Institute Of Advanced Industrial Science & Technology | Method for producing styrene oxide |
| CN116060129A (en) * | 2022-10-18 | 2023-05-05 | 新兴能源科技有限公司 | Catalyst system for synthesizing epoxysuccinic acid sodium salt and application thereof |
-
1991
- 1991-08-27 JP JP3242763A patent/JPH0559033A/en not_active Withdrawn
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010106009A (en) * | 2008-09-30 | 2010-05-13 | Sanyo Chem Ind Ltd | Method for producing epoxy compound |
| WO2010110151A1 (en) * | 2009-03-25 | 2010-09-30 | 昭和電工株式会社 | Method for producing epoxy compound |
| US8664414B2 (en) | 2009-03-25 | 2014-03-04 | Showa Denko K.K. | Process for producing epoxy compound |
| JP5800709B2 (en) * | 2009-03-25 | 2015-10-28 | 昭和電工株式会社 | Method for producing epoxy compound |
| JP2011001287A (en) * | 2009-06-18 | 2011-01-06 | National Institute Of Advanced Industrial Science & Technology | Method for producing styrene oxide |
| CN116060129A (en) * | 2022-10-18 | 2023-05-05 | 新兴能源科技有限公司 | Catalyst system for synthesizing epoxysuccinic acid sodium salt and application thereof |
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| A300 | Withdrawal of application because of no request for examination |
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