JPH0568962A - Waste liquid dilution device - Google Patents
Waste liquid dilution deviceInfo
- Publication number
- JPH0568962A JPH0568962A JP3235249A JP23524991A JPH0568962A JP H0568962 A JPH0568962 A JP H0568962A JP 3235249 A JP3235249 A JP 3235249A JP 23524991 A JP23524991 A JP 23524991A JP H0568962 A JPH0568962 A JP H0568962A
- Authority
- JP
- Japan
- Prior art keywords
- waste liquid
- diluting
- water
- dilution
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】
【目的】 高温の薬液などを廃液の対象とした廃液希釈
装置に関し、構造が単純で然も希釈の確実性が確保され
る廃液希釈装置の提供を目的とする。
【構成】 廃液を希釈水で希釈して流出させる装置であ
って、希釈前の廃液Ａを入れる廃液槽１と、希釈水Ｂを
駆動用に流すアスピレータ２とを有し、アスピレータ２
の真空吸引口2cが、廃液槽１内の廃液Ａの水面より高く
位置して、一端を該廃液Ａ中に挿入した吸入管３の他端
に接続されてなり、アスピレータ２が希釈水Ｂの流れに
より吸入した該廃液Ａを該希釈水Ｂで希釈して希釈後の
廃液Ｃとなし流出させるように構成する。
(57) [Abstract] [Purpose] It is an object of the present invention to provide a waste liquid diluting device having a simple structure and ensuring the certainty of diluting, regarding a waste liquid diluting device for waste liquids such as high-temperature chemical liquids. A device for diluting waste liquid with diluting water to flow out, which has a waste liquid tank 1 for storing undiluted waste liquid A, and an aspirator 2 for flowing diluting water B for driving, and an aspirator 2
The vacuum suction port 2c of is located higher than the water surface of the waste liquid A in the waste liquid tank 1 and has one end connected to the other end of the suction pipe 3 inserted into the waste liquid A. The waste liquid A sucked by the flow is diluted with the dilution water B so as not to be the diluted waste liquid C and flow out.
Description
【０００１】[0001]
【産業上の利用分野】本発明は高温の薬液などを廃液の
対象とした廃液希釈装置に関する。半導体装置の製造に
用いる処理用の薬液の中には、高温に加熱された硫酸な
どがある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a waste liquid diluting device for waste liquid such as high temperature chemical liquid. Among processing chemicals used for manufacturing semiconductor devices, there is sulfuric acid heated to a high temperature.
【０００２】使用済みにより廃液となったこのような薬
液を廃液処理場へ送る際には、事前に希釈水で希釈する
必要がある。この希釈には上記廃液希釈装置を用いる。
そしてその廃液処理装置は、構造が単純で然も希釈の確
実性が確保されることが望ましい。When sending such a chemical liquid which has become a waste liquid due to being used, to a waste liquid treatment plant, it is necessary to dilute it with dilution water in advance. The above-mentioned waste liquid diluting device is used for this dilution.
Further, it is desirable that the waste liquid treatment device has a simple structure and secures certainty of dilution.
【０００３】[0003]
【従来の技術】図２は上記廃液希釈装置の従来例の要部
構成図であり、図中、11は廃液槽、12は廃液弁、13は希
釈タンク、14は希釈槽、Ａは希釈前の廃液、Ｂは希釈
水、Ｃは希釈後の廃液、である。2. Description of the Related Art FIG. 2 is a schematic view of a main part of a conventional example of a waste liquid diluting apparatus. In the figure, 11 is a waste liquid tank, 12 is a waste liquid valve, 13 is a diluting tank, 14 is a diluting tank, and A is before dilution. Waste liquid, B is dilution water, and C is a waste liquid after dilution.
【０００４】廃液槽11は、希釈前の廃液Ａを入れる槽で
ある。この廃液Ａは、例えば 110℃熱硫酸などである。
廃液弁12は、廃液槽11から希釈タンク13に送られる廃液
Ａの流量を調節する。The waste liquid tank 11 is a tank for storing the waste liquid A before dilution. The waste liquid A is, for example, 110 ° C. hot sulfuric acid.
The waste liquid valve 12 adjusts the flow rate of the waste liquid A sent from the waste liquid tank 11 to the dilution tank 13.
【０００５】希釈タンク13は、希釈槽14内に配置されて
側面に孔13a が設けられており、排気槽11から送られた
廃液Ａを孔13aからオーバーフローさせて希釈槽14内に
放出する。The diluting tank 13 is arranged in the diluting tank 14 and has a hole 13a on its side surface. The waste liquid A sent from the exhaust tank 11 is overflowed from the hole 13a and discharged into the diluting tank 14.
【０００６】希釈槽14は、その底面より高く上記孔13a
より低い位置に排出口14b が、また上方に供給口14a が
設けられており、供給口14a から希釈水Ｂが適宜な流量
で供給されて水面を排出口14b の高さに維持する。従っ
て、上記オーバーフローした廃液Ａは、希釈槽14内にて
希釈水Ｂで希釈されて廃液Ｃとなり排出口14b から流出
する。そして、廃液Ａが高温であっても希釈水Ｂにより
冷却されて廃液Ｃの温度は低い。The dilution tank 14 is higher than the bottom surface thereof and has the hole 13a.
A discharge port 14b is provided at a lower position, and a supply port 14a is provided at an upper position. The dilution water B is supplied from the supply port 14a at an appropriate flow rate to maintain the water surface at the height of the discharge port 14b. Therefore, the overflowed waste liquid A is diluted with the dilution water B in the diluting tank 14 to become the waste liquid C, which flows out from the discharge port 14b. Then, even if the waste liquid A has a high temperature, it is cooled by the dilution water B and the temperature of the waste liquid C is low.
【０００７】[0007]
【発明が解決しようとする課題】ところでこの従来例
は、次のような欠点がある。 構造が複雑であり大掛かりとなる。それに伴いメン
テナンス性が悪く且つ装置コストが高くなる。By the way, this conventional example has the following drawbacks. The structure is complicated and large-scale. Along with this, the maintainability is poor and the device cost is high.
【０００８】 希釈の確実性に欠ける。即ち、廃液Ａ
が希釈タンク13に送られ続けている状態で希釈水Ｂの供
給が停止すると、排出口14b から流出する廃液Ｃはその
濃度が次第に濃くなりついには廃液Ａに近くなる。There is a lack of certainty of dilution. That is, waste liquid A
If the supply of the dilution water B is stopped while the water is being sent to the dilution tank 13, the concentration of the waste liquid C flowing out from the discharge port 14b becomes gradually thicker and finally approaches the waste liquid A.
【０００９】そこで本発明は、高温の薬液などを廃液の
対象とした廃液希釈装置に関し、構造が単純で然も希釈
の確実性が確保される廃液希釈装置の提供を目的とす
る。Therefore, the present invention relates to a waste liquid diluting device for waste liquids such as high-temperature chemical liquids, and an object thereof is to provide a waste liquid diluting device having a simple structure and ensuring the certainty of dilution.
【００１０】[0010]
【課題を解決するための手段】上記目的を達成するため
に、本発明による廃液希釈装置は、廃液を希釈水で希釈
して流出させる装置であって、希釈前の廃液を入れる廃
液槽と、希釈水を駆動用に流すアスピレータとを有し、
該アスピレータの真空吸引口が、該廃液槽内廃液の水面
より高く位置して、一端を該廃液中に挿入した吸入管の
他端に接続されてなり、該アスピレータが希釈水の流れ
により吸入した該廃液を該希釈水で希釈して流出させる
ことを特徴としている。In order to achieve the above object, a waste liquid diluting device according to the present invention is a device for diluting a waste liquid with diluting water and flowing out the waste liquid, and a waste liquid tank for storing the waste liquid before dilution, It has an aspirator that flows dilution water for driving,
The vacuum suction port of the aspirator is located higher than the water surface of the waste liquid in the waste liquid tank, and one end of the aspirator is connected to the other end of the suction pipe inserted into the waste liquid, and the aspirator sucks by the flow of the diluting water. It is characterized in that the waste liquid is diluted with the dilution water and discharged.
【００１１】[0011]
【作用】上記アスピレータは、その真空吸引口が廃液槽
内廃液の水面より高く位置するので、希釈水の流れが停
止すると廃液槽内廃液の吸入が止まって廃液の流出を一
切停止する。従って、本廃液希釈装置は希釈の確実性が
確保される。このことは希釈が確実に行われないことに
よる事故の発生を防止するために重要である。Since the vacuum suction port of the aspirator is located higher than the water surface of the waste liquid in the waste liquid tank, when the flow of the dilution water is stopped, the suction of the waste liquid in the waste liquid tank is stopped and the outflow of the waste liquid is stopped. Therefore, the waste liquid diluting device ensures the reliability of dilution. This is important to prevent accidents due to uncertain dilution.
【００１２】そして、そのために必要なものは配管を除
いて上記廃液槽とアスピレータで足りるので、本廃液希
釈装置は構造が単純でありそれに伴いメンテナンス性に
優れ且つ装置コストが安くなる。Since the waste liquid tank and the aspirator are sufficient for this purpose except for the piping, the waste liquid diluting device has a simple structure, which is excellent in maintainability and reduces the cost of the device.
【００１３】[0013]
【実施例】以下本発明の実施例について図１の要部構成
図を用いて説明する。図中、１は廃液槽、２はアスピレ
ータ、３は吸入管、４は開放弁、である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the main part configuration diagram of FIG. In the figure, 1 is a waste liquid tank, 2 is an aspirator, 3 is a suction pipe, 4 is an open valve.
【００１４】廃液槽１は、従来例の廃液槽11と同様に、
希釈前の廃液Ａを入れる槽である。この廃液は、従来例
の場合と同様に例えば 110℃熱硫酸などである。アスピ
レータ２は、水流ポンプとも称せられ、注入口2a, 吐出
口2b及び真空吸引口2cを有して、注入口2aから水を流し
込むと、その水流が真空吸引口2cを減圧させてそこの気
体または液体を巻き込みながら吐出口2bから流出するも
のである。即ち、流し込む水が駆動源になって上記作動
を行うものであり、実施例ではその水を冷却水Ｂにして
ある。そして真空吸引口2cは、廃液槽１内の廃液Ａの水
面より高く位置させてある。The waste liquid tank 1 is, like the waste liquid tank 11 of the conventional example,
This is a tank for containing the waste liquid A before dilution. This waste liquid is, for example, 110 ° C. hot sulfuric acid as in the conventional example. The aspirator 2 is also called a water flow pump and has an injection port 2a, a discharge port 2b and a vacuum suction port 2c. When water is poured from the injection port 2a, the water flow depressurizes the vacuum suction port 2c and the gas therein. Alternatively, the liquid flows out from the discharge port 2b while being entrained. That is, the poured water serves as a drive source to perform the above operation, and the water is used as the cooling water B in the embodiment. The vacuum suction port 2c is located higher than the water surface of the waste liquid A in the waste liquid tank 1.
【００１５】吸入管３は、一端が廃液槽１内の廃液Ａの
中に挿入され、他端が真空吸引口2cに接続されている。
また、その中間に一端を接続し他端を大気に開放した分
岐管を有し、その分岐管に開放弁４が取り付けてある。
この開放弁４を取り付けた分岐管は必ずしも必要なもの
ではない。The suction pipe 3 has one end inserted into the waste liquid A in the waste liquid tank 1 and the other end connected to the vacuum suction port 2c.
Further, a branch pipe having one end connected to the middle and the other end opened to the atmosphere is provided in the middle, and an opening valve 4 is attached to the branch pipe.
The branch pipe provided with the opening valve 4 is not always necessary.
【００１６】廃液槽１内の廃液Ａは、開放弁４が閉じた
状態でアスピレータ２に希釈水Ｂが流れることにより、
吸入管３を通じアスピレータ２に吸入されて希釈水Ｂで
希釈され、希釈後の廃液Ｃとなって吐出口2bから流出す
る。そして、希釈水Ｂの流れが停止すると、アスピレー
タ２に吸入されなくなり吐出口2bからの流出が停止す
る。また、希釈水Ｂが流れている状態で開放弁４を開く
とアスピレータ２の吸入が大気に切り換わり希釈が停止
する。いうまでもなく、廃液Ａが高温であっても、アス
ピレータ２内で冷却水Ｂにより冷却されて、廃液Ｃとな
って吐出口2bから流出する際に温度が下がっている。The waste liquid A in the waste liquid tank 1 is caused by the dilution water B flowing to the aspirator 2 with the open valve 4 closed.
The liquid is sucked into the aspirator 2 through the suction pipe 3, diluted with the dilution water B, and becomes the diluted waste liquid C and flows out from the discharge port 2b. Then, when the flow of the dilution water B is stopped, it is not sucked into the aspirator 2 and stops flowing out from the discharge port 2b. If the opening valve 4 is opened while the dilution water B is flowing, the suction of the aspirator 2 is switched to the atmosphere and the dilution is stopped. Needless to say, even if the waste liquid A is at a high temperature, the temperature is lowered when it is cooled by the cooling water B in the aspirator 2 to become the waste liquid C and flows out from the discharge port 2b.
【００１７】発明者は、廃液Ａが 110℃熱硫酸である場
合、希釈水Ｂに通常の工場冷却水を用いそれを 1.5Kg／
cm2 の圧力でアスピレータ２に流し込むことにより、廃
液Ａが所望に希釈されて37℃の廃液Ｃにすることができ
た。When the waste liquid A is 110 ° C. hot sulfuric acid, the inventor uses normal factory cooling water for the dilution water B and uses it for 1.5 kg / kg.
By pouring into the aspirator 2 at a pressure of cm 2 , the waste liquid A was diluted as desired to be the waste liquid C at 37 ° C.
【００１８】以上のことから理解されるようにこの実施
例は、従来例と比べると、構造が単純であり、それに伴
いメンテナンス性に優れ且つ装置コストが安い。然も、
希釈水Ｂの流れが停止すると吐出口2bからの流出が一切
停止するので、希釈の確実性が確保されている。As can be understood from the above description, this embodiment has a simpler structure than that of the conventional example, and accordingly has excellent maintainability and a low device cost. Of course,
When the flow of the dilution water B is stopped, the outflow from the discharge port 2b is stopped at all, so that the reliability of the dilution is ensured.
【００１９】[0019]
【発明の効果】以上説明したように本発明によれば、高
温の薬液などを廃液の対象とした廃液希釈装置に関し、
構造が単純で然も希釈の確実性が確保される廃液希釈装
置が提供されて、メンテナンス性の向上や装置コストの
低減と共に、希釈が確実に行われないことによる事故発
生の防止を可能にさせる効果がある。As described above, according to the present invention, there is provided a waste liquid diluting device for waste liquid such as high temperature chemical liquid,
A waste liquid diluting device that has a simple structure and ensures certainty of dilution is provided, which makes it possible to improve the maintainability and reduce the cost of the device and prevent the occurrence of accidents due to the fact that dilution is not performed reliably. effective.
【図１】 実施例の要部構成図FIG. 1 is a configuration diagram of main parts of an embodiment.
【図２】 従来例の要部構成図FIG. 2 is a configuration diagram of a main part of a conventional example
Ａ 希釈前の廃液 Ｂ 希釈水 Ｃ 希釈後の廃液 １ 廃液槽 ２ アスピレータ 2a 注入口 2b 吐出口 2c 真空吸引口 ３ 吸入管 ４ 開放弁 11 廃液槽 12 廃液弁 13 希釈タンク 13a 孔 14 希釈槽 14a 供給口 14b 排出口 A waste liquid before dilution B waste water C waste liquid after dilution 1 waste liquid tank 2 aspirator 2a inlet 2b outlet 2c vacuum suction port 3 suction pipe 4 open valve 11 waste liquid tank 12 waste liquid valve 13 dilution tank 13a hole 14 dilution tank 14a supply Mouth 14b outlet
Claims (1)
であって、 希釈前の廃液を入れる廃液槽と、希釈水を駆動用に流す
アスピレータとを有し、 該アスピレータの真空吸引口が、該廃液槽内廃液の水面
より高く位置して、一端を該廃液中に挿入した吸入管の
他端に接続されてなり、 該アスピレータが希釈水の流れにより吸入した該廃液を
該希釈水で希釈して流出させることを特徴とする廃液希
釈装置。1. A device for diluting a waste liquid with diluting water to flow out, comprising a waste liquid tank for storing the waste liquid before dilution, and an aspirator for flowing the diluting water for driving, and a vacuum suction port of the aspirator. , Located higher than the water surface of the waste liquid in the waste liquid tank and having one end connected to the other end of a suction pipe inserted into the waste liquid, wherein the waste liquid sucked by the aspirator by the flow of the dilution water is diluted with the dilution water. A waste liquid diluting device characterized by diluting and discharging.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3235249A JPH0568962A (en) | 1991-09-17 | 1991-09-17 | Waste liquid dilution device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3235249A JPH0568962A (en) | 1991-09-17 | 1991-09-17 | Waste liquid dilution device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0568962A true JPH0568962A (en) | 1993-03-23 |
Family
ID=16983286
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3235249A Pending JPH0568962A (en) | 1991-09-17 | 1991-09-17 | Waste liquid dilution device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0568962A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002239532A (en) * | 2001-02-22 | 2002-08-27 | Japan Organo Co Ltd | Liquid chemicals storage tank and water treatment equipment |
| CN116571159A (en) * | 2023-07-14 | 2023-08-11 | 天津奥利达环保设备有限公司 | Concentrated sulfuric acid dilutes handles drainage agitating unit |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5569338A (en) * | 1978-11-14 | 1980-05-24 | Stabilus Gmbh | Gas spring device having supplementary adjusting range |
| JPS55122651A (en) * | 1979-03-12 | 1980-09-20 | Hansberg Julius | Flask molding molding machine |
| JPS5687485A (en) * | 1979-12-19 | 1981-07-16 | Sigma Gijutsu Kogyo Kk | Cooling of hot sulfuric acid |
| JPS57113880A (en) * | 1980-12-29 | 1982-07-15 | Fujitsu Ltd | Treatment of hot waste liquid |
-
1991
- 1991-09-17 JP JP3235249A patent/JPH0568962A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5569338A (en) * | 1978-11-14 | 1980-05-24 | Stabilus Gmbh | Gas spring device having supplementary adjusting range |
| JPS55122651A (en) * | 1979-03-12 | 1980-09-20 | Hansberg Julius | Flask molding molding machine |
| JPS5687485A (en) * | 1979-12-19 | 1981-07-16 | Sigma Gijutsu Kogyo Kk | Cooling of hot sulfuric acid |
| JPS57113880A (en) * | 1980-12-29 | 1982-07-15 | Fujitsu Ltd | Treatment of hot waste liquid |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002239532A (en) * | 2001-02-22 | 2002-08-27 | Japan Organo Co Ltd | Liquid chemicals storage tank and water treatment equipment |
| CN116571159A (en) * | 2023-07-14 | 2023-08-11 | 天津奥利达环保设备有限公司 | Concentrated sulfuric acid dilutes handles drainage agitating unit |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 19970204 |