JPH0569376B2 - - Google Patents
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- Publication number
- JPH0569376B2 JPH0569376B2 JP61043742A JP4374286A JPH0569376B2 JP H0569376 B2 JPH0569376 B2 JP H0569376B2 JP 61043742 A JP61043742 A JP 61043742A JP 4374286 A JP4374286 A JP 4374286A JP H0569376 B2 JPH0569376 B2 JP H0569376B2
- Authority
- JP
- Japan
- Prior art keywords
- phosphoric acid
- silica
- sensor
- acid silica
- water vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 48
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 46
- 239000000377 silicon dioxide Substances 0.000 claims description 24
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 23
- 239000004020 conductor Substances 0.000 claims description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 11
- 238000001514 detection method Methods 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 7
- 230000007423 decrease Effects 0.000 description 5
- AQTIRDJOWSATJB-UHFFFAOYSA-K antimonic acid Chemical compound O[Sb](O)(O)=O AQTIRDJOWSATJB-UHFFFAOYSA-K 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 3
- 239000010452 phosphate Substances 0.000 description 3
- 229910000166 zirconium phosphate Inorganic materials 0.000 description 3
- LEHFSLREWWMLPU-UHFFFAOYSA-B zirconium(4+);tetraphosphate Chemical compound [Zr+4].[Zr+4].[Zr+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LEHFSLREWWMLPU-UHFFFAOYSA-B 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 239000002228 NASICON Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 241000877463 Lanio Species 0.000 description 1
- 229910003249 Na3Zr2Si2PO12 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- GHPGOEFPKIHBNM-UHFFFAOYSA-N antimony(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Sb+3].[Sb+3] GHPGOEFPKIHBNM-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 238000007791 dehumidification Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- -1 hydrogen ions Chemical class 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- UPIXZLGONUBZLK-UHFFFAOYSA-N platinum Chemical compound [Pt].[Pt] UPIXZLGONUBZLK-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- XQMTUIZTZJXUFM-UHFFFAOYSA-N tetraethoxy silicate Chemical compound CCOO[Si](OOCC)(OOCC)OOCC XQMTUIZTZJXUFM-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
- Non-Adjustable Resistors (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Description
【発明の詳細な説明】
[発明の利用分野]
この発明は、プロトン導電体の抵抗値の変化を
用いた湿度センサに関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a humidity sensor that uses changes in the resistance value of a proton conductor.
[従来技術]
ラコンチ(LaConti)らは、プロトン導電体の
キヤリアーがプロトンの水和イオン、主として
H3O+であることを報告している(特開昭53−
115293号、米国特許出願773136)。このことは、
プロトン導電体の電気伝導度が湿度により変化す
ることを示唆する。[Prior art] LaConti et al. reported that the carrier of a proton conductor is a hydrated ion of protons, mainly
It has been reported that H 3 O +
No. 115293, U.S. Patent Application No. 773136). This means that
This suggests that the electrical conductivity of proton conductors changes with humidity.
発明者らは、各種プロトン導電体に付いて検討
し、リン酸シリカ(H2SiP2O8)が水蒸気に対し
高い感度を有することを見出した。リン酸シリカ
は、広い温度範囲で水蒸気に対し感度を有し、
500℃程度までの温度に耐えることができる。 The inventors investigated various proton conductors and found that phosphoric acid silica (H 2 SiP 2 O 8 ) has high sensitivity to water vapor. Silica phosphate is sensitive to water vapor over a wide temperature range;
It can withstand temperatures up to about 500℃.
このような特性を備えた湿度センサは、例えば
調理に伴つて発生する水蒸気を検出して、電子レ
ンジを制御することに用いることができる。また
各種のプラントや配管等での、水蒸気の検出に用
いることができる。さらに空気調和機等での、加
湿や除湿の制御に用いることができる。ここでセ
ンサが高感度で、耐熱性が有りヒートクリーニン
グが可能なことは、検出精度を高めると共に、汚
染雰囲気中での使用を可能とする。 A humidity sensor with such characteristics can be used, for example, to detect water vapor generated during cooking and to control a microwave oven. It can also be used to detect water vapor in various plants, piping, etc. Furthermore, it can be used to control humidification and dehumidification in air conditioners and the like. Here, the fact that the sensor is highly sensitive, heat resistant, and heat-cleanable improves detection accuracy and enables use in a contaminated atmosphere.
リン酸シリカはチロや(E.Thiro et.al無機・
一般化学誌 Zeitschrift fur Anorganishe und
Allgemein Chemie346巻92頁1966年)、マカート
(H・Makartヘルベチカ キミカ アクタ
Helvetica Chimica Acta Vol50Fasciculus2、
No.47、399、1967)らにより、発見された化合物
である。そして発明者らは、この化合物がプロト
ン導電体であり、湿度センサとして用い得ること
を見出だした。 Phosphated silica is an inorganic
General Chemistry Journal Zeitschrift fur Anorganishe und
Allgemein Chemie Vol. 346, p. 92, 1966), H. Makart Helvetica Chimica Acta
Helvetica Chimica Acta Vol 50 Fasciculus2,
No. 47, 399, 1967) et al. The inventors have discovered that this compound is a proton conductor and can be used as a humidity sensor.
プロトン導電体による湿度の検出では、雰囲気
中の水蒸気分圧の変化に伴い、導電体内部のキヤ
リアー、主としてH3O+、が増減することを用
い、吸着水による表面伝導や、水の化学吸着によ
る電子やホールの増減を用いない。 Humidity detection using a proton conductor uses the increase or decrease of carriers, mainly H 3 O + , inside the conductor as the partial pressure of water vapor changes in the atmosphere. It does not use the increase or decrease of electrons or holes due to
[発明の課題]
この発明は、高密度で、耐熱性に優れたプロト
ン導電体湿度センサを提供することを目的とす
る。[Problem of the Invention] An object of the present invention is to provide a proton conductor humidity sensor that has high density and excellent heat resistance.
[発明の構成]
この発明では、リン酸シリカ(H2SiP2O8)か
らなるプロトン導電体の内部抵抗から、湿度を検
出する。[Structure of the Invention] In the present invention, humidity is detected from the internal resistance of a proton conductor made of phosphoric acid silica (H 2 SiP 2 O 8 ).
リン酸シリカは、例えばデイスク状等に成型
し、その表裏に通気性の貴金属電極を被覆して内
部抵抗を測定する。リン酸シリカは膜状等の任意
のものを用いることができ、また電極も任意のも
のを用いることができる。 The phosphoric acid silica is molded into a disk shape, for example, and the internal resistance is measured by covering the front and back surfaces of the disk with breathable noble metal electrodes. Any film-like silica phosphate can be used, and any electrode can be used.
リン酸シリカの抵抗値は、直流、交流のいずれ
でも測定できるが、水素による検出誤差を除き、
過電圧による劣化を防止するため、30〜1MHz程
度の交流で測定するのが好ましい。 The resistance value of phosphoric acid silica can be measured using either direct current or alternating current, but excluding detection errors due to hydrogen,
In order to prevent deterioration due to overvoltage, it is preferable to measure with an alternating current of about 30 to 1 MHz.
[実施例]
(リン酸シリカの合成)
テトラエトキシシリケイト(Si(OC2H5)4)を、
リン酸と水とで、1:15:15のモル比で混合・撹
拌し、塩酸を滴下してゲル状の化合物を得た。反
応液をそのまま150℃に15時間保ち、リン酸シリ
カを沈でんさせ、アセトンで洗浄して試料とし
た。リン酸シリカの製法には、他の任意のものを
用いることができる。[Example] (Synthesis of phosphoric acid silica) Tetraethoxysilicate (Si(OC 2 H 5 ) 4 ) was
Phosphoric acid and water were mixed and stirred at a molar ratio of 1:15:15, and hydrochloric acid was added dropwise to obtain a gel-like compound. The reaction solution was kept at 150°C for 15 hours to precipitate the phosphoric acid silica, which was then washed with acetone and used as a sample. Any other method for producing phosphoric acid silica can be used.
得られた試料のX線回折を行い、ASTMカー
ドによる文献値と比較し、試料がリン酸シリカ
(H2SiP2O8)であることを確認した。結果を、第
1図に示す。ASTMカードによるピークは全て
試料に含まれるが、他に弱いピークが存在する。
また発明者らは、反応液の反応時間や洗浄条件を
変え、数種の試料を調整したが、特性は同等であ
つた。 The obtained sample was subjected to X-ray diffraction, and compared with literature values using an ASTM card, it was confirmed that the sample was phosphoric acid silica (H 2 SiP 2 O 8 ). The results are shown in FIG. All the peaks from the ASTM card are included in the sample, but there are other weak peaks.
In addition, the inventors prepared several types of samples by changing the reaction time and washing conditions of the reaction solution, but the characteristics were the same.
第2図に、加熱・脱水による重量変化のデータ
を示す。脱水のピークはなだらかで、結晶内部の
層間水や構造水の脱離によるものであり、試料は
この範囲の温度変化に対しては可逆的で破壊され
ない。従つてセンサは500℃程度までであれば、
加熱して用いることができる。また起電力等から
リン酸シリカがプロトン導電体であることを確認
した。 Figure 2 shows data on weight changes due to heating and dehydration. The dehydration peak is gradual and is due to the desorption of interlayer water and structural water inside the crystal, and the sample is reversible and will not be destroyed by temperature changes within this range. Therefore, if the sensor is up to about 500℃,
It can be heated and used. Furthermore, it was confirmed from electromotive force etc. that phosphoric acid silica is a proton conductor.
(センサの構造)
プロトン導電体湿度センサ2の構造を第3図に
示す。図において、4は、直径10mm、厚さ2mmの
デイスク状のリン酸シリカの成型体で、その表裏
に白金粉末を圧着した膜状の通気性電極6,8を
取り付けた。電極6,8には白金のリード線1
0,12を接続し、リン酸シリカの抵抗値を外部
へ取り出せるようにする。 (Structure of sensor) The structure of the proton conductor humidity sensor 2 is shown in FIG. In the figure, reference numeral 4 denotes a disk-shaped phosphoric acid silica molded body with a diameter of 10 mm and a thickness of 2 mm, and film-shaped gas permeable electrodes 6 and 8 having platinum powder pressed onto the front and back surfaces thereof were attached. Platinum lead wire 1 is attached to electrodes 6 and 8.
Connect 0 and 12 so that the resistance value of phosphoric acid silica can be taken out.
14は白金−白金・ロジウム等の熱電対で、デ
イスク4の側部に取り付けてある。16はコイル
状のヒータで、センサ2を適宜の温度に加熱する
ためのものである。これらのリード線10,12
や熱電対14等を、ベース18に設けたステムに
熔接し、センサ2を完成する。 14 is a thermocouple made of platinum-platinum/rhodium, etc., and is attached to the side of the disk 4. 16 is a coil-shaped heater for heating the sensor 2 to an appropriate temperature. These lead wires 10, 12
and thermocouple 14 are welded to the stem provided on the base 18 to complete the sensor 2.
このセンサ2は、リード線10、白金粉末、リ
ン酸シリカの粉末、白金粉末、リード線12の順
に積層し、2700Kg/cm2でプレスして製造した。ま
た熱電対14は白金ペーストにより、取り付け
た。 This sensor 2 was manufactured by laminating lead wire 10, platinum powder, phosphoric acid silica powder, platinum powder, and lead wire 12 in this order, and pressing at 2700 kg/cm 2 . Further, the thermocouple 14 was attached using platinum paste.
リン酸シリカには、リン酸シリカの抵抗値が主
となる範囲で、他の物質、例えばアンチモン酸等
の他のプロトン導電体を混合しても良く、各種の
有機バインダー等を混合しても良い。リン酸シリ
カの形状は、基盤上に膜状に塗布したもの等任意
のものを用いることができ、成型は焼結等により
行つても良い。 Phosphoric acid silica may be mixed with other substances, such as other proton conductors such as antimonic acid, or various organic binders, etc., as long as the resistance value of phosphoric acid silica is the main one. good. The phosphoric acid silica may be in any shape, such as one coated in a film form on a substrate, and the shaping may be performed by sintering or the like.
電極6,8には白金の他に、金や銀、あるいは
SnO2やLaNiO3等の金属酸化物半導体等の任意の
ものを用いることができ、その形状も櫛状電極等
の任意のものを用いることができる。 In addition to platinum, the electrodes 6 and 8 are made of gold, silver, or
Any metal oxide semiconductor such as SnO 2 or LaNiO 3 can be used, and any shape such as a comb-shaped electrode can be used.
熱電対14はサーミスタや白金測温抵抗等に代
えることができ、また熱電対14やヒータ16は
設けなくても良い。 The thermocouple 14 can be replaced with a thermistor, a platinum temperature measuring resistor, or the like, and the thermocouple 14 and heater 16 may not be provided.
第4図に検出回路の例を示す。リン酸シリカ4
に、検出抵抗R1と、30Hz〜1MHz程度の交流電
源20を接続し、検出抵抗R1への電圧を電圧計
22で取り出す。熱電対14の起電力を比較回路
24で基準値と比較し、アナログスイツチ26を
オン−オフさせる。ヒータ16には、アナログス
イツチ26を介して電源28を接続し、センサ2
を一定温度に加熱する。 FIG. 4 shows an example of the detection circuit. Silica phosphate 4
The detection resistor R1 is connected to an AC power source 20 of about 30 Hz to 1 MHz, and the voltage to the detection resistor R1 is taken out with a voltmeter 22. The electromotive force of the thermocouple 14 is compared with a reference value by a comparator circuit 24, and an analog switch 26 is turned on and off. A power supply 28 is connected to the heater 16 via an analog switch 26, and the sensor 2
is heated to a constant temperature.
実際には電源20は直流でも良いが、水素の存
在による起電力を避け、過電圧の印加による電極
や導電体4の劣化を避けるため、交流が好まし
い。 In reality, the power source 20 may be a direct current, but an alternating current is preferable in order to avoid electromotive force due to the presence of hydrogen and to avoid deterioration of the electrodes and conductor 4 due to the application of overvoltage.
(特性)
50〜250℃での、1torr,20torr,100torrの水蒸
気中での、センサ2の電気伝導度を第5図に示
す。また、代表的な温度に付いて、このデータを
相対温度に換算したものを、第6図に示す。なお
交流電源20は周波数200Hzのものを用い、測定
値は定常値を意味し、他の雰囲気は空気である。 (Characteristics) Fig. 5 shows the electrical conductivity of the sensor 2 in water vapor of 1 torr, 20 torr, and 100 torr at 50 to 250°C. Further, regarding typical temperatures, this data is converted into relative temperature and is shown in FIG. Note that the AC power source 20 used has a frequency of 200 Hz, the measured values mean steady values, and the other atmosphere is air.
第5図から、センサ2の特性は150℃程度を境
に変化することが判る。これよりも低温側では、
温度依存性は小さく、1torrと20torrとの間の出
力は大きいが、20torrと100torrとの間の出力は
相対的に小さい。次に150℃以上では、出力は温
度と共に直線的に減少するが、各水蒸気圧間の出
力の差は大きい。150℃以下での温度依存性が小
さいことは、吸着水による表面伝動からは考えら
れず、150℃以上での鋭い電気伝動度の減少は、
金属酸化物半導体の特性とは著しく異なる。 From FIG. 5, it can be seen that the characteristics of the sensor 2 change at about 150°C. At lower temperatures than this,
The temperature dependence is small, and the output between 1 torr and 20 torr is large, but the output between 20 torr and 100 torr is relatively small. Next, above 150°C, the output decreases linearly with temperature, but the difference in output between each water vapor pressure is large. The small temperature dependence below 150°C cannot be considered from surface conduction due to adsorbed water, and the sharp decrease in electrical conductivity above 150°C is
The properties are significantly different from those of metal oxide semiconductors.
第6図から、電気伝導度の対数は、相対湿度の
対数と共に直線的に変化することが判る。また80
〜150℃での各直線は良く似ており、温度依存性
は小さい。例えば、電気伝導度1/104S/cmでの
相対湿度は、80〜150℃で10倍変化するに過ぎな
い。従つて熱電対14やヒータ16等を用いれ
ば、センサ2の温度依存性の補償は容易である。
次に約200℃では、湿度へのこう配が減少するが、
感度自身は大きい。 It can be seen from FIG. 6 that the logarithm of electrical conductivity varies linearly with the logarithm of relative humidity. 80 again
The straight lines at ~150°C are very similar, and the temperature dependence is small. For example, the relative humidity at an electrical conductivity of 1/10 4 S/cm only changes by a factor of 10 from 80 to 150°C. Therefore, by using the thermocouple 14, heater 16, etc., it is easy to compensate for the temperature dependence of the sensor 2.
Next, at about 200℃, the gradient to humidity decreases,
The sensitivity itself is great.
リン酸シリカの抵抗値が水蒸気により変化する
原因は、実際のキヤリアーがプロトンではなく、
H3O+等であるためと考えられる。キヤリアーの
移動度は結晶内部の含水量に依存し、含水量は雰
囲気の湿度に依存するため、リン酸シリカの抵抗
値は湿度により変化するのであろう。 The reason why the resistance value of phosphoric acid silica changes due to water vapor is that the actual carrier is not protons.
This is thought to be due to the presence of H 3 O + etc. The carrier mobility depends on the water content inside the crystal, and the water content depends on the humidity of the atmosphere, so the resistance value of phosphoric acid silica probably changes depending on the humidity.
リン酸シリカ以外のプロトン導電体を合成し、
特性を評価した。最初に、酸化アンチモン
(Sb2O3)を15倍当量の過酸化水素と反応させ、
アンチモン酸(Sb2O5・2H2O)を得た。 Synthesizing proton conductors other than phosphoric acid silica,
Characteristics were evaluated. First, antimony oxide (Sb 2 O 3 ) was reacted with 15 equivalents of hydrogen peroxide,
Antimonic acid (Sb 2 O 5 .2H 2 O) was obtained.
105℃でのアンチモン酸の抵抗値への水蒸気分
圧の影響を、第7図に示す。(a)の単味のものでの
水蒸気感度は、リン酸シリカに比べで低い。また
アンチモン酸の水素の一部をナトリウムイオンで
置換したものを合成したが、感度は増さなかつた
(試料(b),(c)、(d))。 The influence of water vapor partial pressure on the resistance value of antimonic acid at 105°C is shown in Figure 7. The water vapor sensitivity of the plain material (a) is lower than that of phosphoric acid silica. We also synthesized antimonic acid in which some of the hydrogen atoms were replaced with sodium ions, but the sensitivity did not increase (samples (b), (c), and (d)).
第8図に、リン酸ジルコニウムの水蒸気感度を
示す。リン酸(H3PO4)と塩化水素と塩化ジル
コニウムとを反応させ、リン酸ジルコニウム
(Zr(HPO4)2)のゲルを得た。ゲルをリン酸中
120℃で1週間還流し、結晶性のリン酸ジルコニ
ウムとした。105℃と220℃での感度を測定した
が、低い値しか得られなかつた。 FIG. 8 shows the water vapor sensitivity of zirconium phosphate. Phosphoric acid (H 3 PO 4 ), hydrogen chloride, and zirconium chloride were reacted to obtain a gel of zirconium phosphate (Zr(HPO 4 ) 2 ). gel in phosphoric acid
The mixture was refluxed at 120°C for one week to obtain crystalline zirconium phosphate. Sensitivity was measured at 105°C and 220°C, but only low values were obtained.
Na2CO3、ZrO2、SiO2、NH4H2PO4とから、
NASICON(Na3Zr2Si2PO12)を合成した。
NASICONに0.1Nの硫酸を滴下し、ナトリウム
イオンの一部を水素イオンで置換し、プロトン導
電体とした。100℃での水蒸気圧と抵抗値との関
係を第9図に示す。抵抗値の変化は小さく、ヒス
テリシスが有る。 From Na 2 CO 3 , ZrO 2 , SiO 2 , NH 4 H 2 PO 4 ,
NASICON (Na 3 Zr 2 Si 2 PO 12 ) was synthesized.
0.1N sulfuric acid was dropped into NASICON to replace some of the sodium ions with hydrogen ions, making it a proton conductor. Figure 9 shows the relationship between water vapor pressure and resistance value at 100°C. Changes in resistance value are small and there is hysteresis.
[発明の効果]
この発明では、高感度で、耐熱性の高いプロト
ン導電体湿度センサが得られる。[Effects of the Invention] According to the present invention, a proton conductor humidity sensor with high sensitivity and high heat resistance can be obtained.
第1図、第2図は実施例のプロトン導電体湿度
センサの特性図、第3図は実施例の湿度センサの
一部切り欠き部付き正面図、第4図は実施例に用
いる検出回路の回路図である。第5図、第6図は
実施例の特性図、第7図〜第9図は従来例の特性
図である。
Figures 1 and 2 are characteristic diagrams of the proton conductor humidity sensor of the example, Figure 3 is a front view with a partial cutout of the humidity sensor of the example, and Figure 4 is the detection circuit used in the example. It is a circuit diagram. 5 and 6 are characteristic diagrams of the embodiment, and FIGS. 7 to 9 are characteristic diagrams of the conventional example.
Claims (1)
センサにおいて、 前記プロトン導電体は、リン酸シリカ
(H2SiP2O8)であることを特徴とする、 プロトン導電体湿度センサ。[Claims] 1. A humidity sensor using a change in the resistance value of a proton conductor, characterized in that the proton conductor is phosphoric acid silica (H 2 SiP 2 O 8 ). Humidity sensor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61043742A JPS62200258A (en) | 1986-02-27 | 1986-02-27 | Proton conductor moisture sensor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61043742A JPS62200258A (en) | 1986-02-27 | 1986-02-27 | Proton conductor moisture sensor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62200258A JPS62200258A (en) | 1987-09-03 |
| JPH0569376B2 true JPH0569376B2 (en) | 1993-09-30 |
Family
ID=12672218
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61043742A Granted JPS62200258A (en) | 1986-02-27 | 1986-02-27 | Proton conductor moisture sensor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62200258A (en) |
-
1986
- 1986-02-27 JP JP61043742A patent/JPS62200258A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62200258A (en) | 1987-09-03 |
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