JPH0570933A - Manufacture of slender bar-like raw material for vapor-deposition - Google Patents

Manufacture of slender bar-like raw material for vapor-deposition

Info

Publication number
JPH0570933A
JPH0570933A JP5515391A JP5515391A JPH0570933A JP H0570933 A JPH0570933 A JP H0570933A JP 5515391 A JP5515391 A JP 5515391A JP 5515391 A JP5515391 A JP 5515391A JP H0570933 A JPH0570933 A JP H0570933A
Authority
JP
Japan
Prior art keywords
rod
shaped
vapor deposition
vacuum
shaped intermediate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5515391A
Other languages
Japanese (ja)
Other versions
JP2874364B2 (en
Inventor
Kazuhiko Tabei
和彦 田部井
Noboru Yonezawa
登 米澤
Sadao Saito
定雄 斉藤
Akifumi Sato
昭文 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP3055153A priority Critical patent/JP2874364B2/en
Publication of JPH0570933A publication Critical patent/JPH0570933A/en
Application granted granted Critical
Publication of JP2874364B2 publication Critical patent/JP2874364B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

(57)【要約】 【目的】 塑性加工工程数を低減して、材料歩留りを大
幅に向上すると共に、低コスト及び高品質の細棒状蒸着
用素材を製造する。 【構成】 真空中に立設された筒状の鋳型内にその上方
から高純度の金属あるいは合金の溶湯を供給して冷却固
化し、棒状の中間材を得た後、この棒状の中間材に熱間
圧延加工を施して所定寸法の細棒状蒸着用素材を製造す
る。
(57) [Summary] [Purpose] To reduce the number of plastic working steps to significantly improve the material yield and to manufacture a low-cost and high-quality thin rod-shaped vapor deposition material. [Structure] A molten metal of high-purity metal or alloy is supplied from above into a cylindrical mold set up in a vacuum and solidified by cooling to obtain a rod-shaped intermediate material. Hot rolling is performed to produce a thin rod-shaped material for vapor deposition having a predetermined size.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、例えば、フィルム表面
に、電子ビームによる蒸着法によって薄膜を形成する際
に用いられる細棒状蒸着用素材を製造する製造方法に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a manufacturing method for manufacturing a thin rod-shaped vapor deposition material used for forming a thin film on a film surface by an electron beam vapor deposition method.

【0002】[0002]

【従来の技術】一般に、情報記録体としてのVTR,D
AT用磁気テープ,あるいはコンピュータ用のフロッピ
ーディスク等はポリエチレンテレフタレート(PET)
等のプラスチックフィルム上に、Ni基合金やCo基合
金等を、例えば、電子ビームによる蒸着法等により薄膜
として付着している。この場合、Ni基合金やCo基合
金は、板や棒状の形態で素材として用いられるか、ある
いはペレットの形態で素材として用いられている。そし
て、細棒状素材の製造方法としては、従来、不純物の混
入を防止するために、真空中で溶解・精錬を行い、耐火
物を表面にライニングしたインゴットケースによってイ
ンゴットとして鋳造した後に、分塊鍛造などの一次加工
(粗加工)及び仕上鍛造,圧延などの二次加工(仕上加
工)を施して、所定の最終製品形状を得ているものが知
られている。
2. Description of the Related Art Generally, VTRs and Ds as information recording bodies
Polyethylene terephthalate (PET) for magnetic tape for AT or floppy disk for computer
A Ni-based alloy, a Co-based alloy, or the like is attached as a thin film on a plastic film such as, for example, by a vapor deposition method using an electron beam. In this case, the Ni-based alloy or the Co-based alloy is used as a material in the form of a plate or rod, or is used as a material in the form of pellets. And, as a method of manufacturing a thin rod-shaped material, conventionally, in order to prevent the inclusion of impurities, melting and refining are performed in a vacuum, and a refractory material is cast as an ingot by an ingot case lined on the surface, followed by slab forging. It is known that a predetermined final product shape is obtained by performing primary processing (rough processing) and secondary processing (finishing) such as finish forging and rolling.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、上記従
来の素材の製造方法にあっては、以下の問題がある。す
なわち、1)一般的に、蒸着用の金属及び合金は高純度
のため加工性に難点が多く、塑性加工で製品を得ようと
する場合所望の製品が得にくい、2)純金属及び合金の
塑性加工は、一般的には熱間で行われるため、繰り返し
行われる高温加熱の際に、素材がガスを吸収したり、素
材が酸化されることにより、高価な金属の損失が多くな
る、3)塑性加工による工程数の増加、及び材料歩留り
の低下が原因でコスト高となる。
However, the above-mentioned conventional method for producing a raw material has the following problems. That is, 1) generally, metals and alloys for vapor deposition have high workability due to high purity, and it is difficult to obtain a desired product by plastic working. 2) Pure metal and alloy Since plastic working is generally carried out hot, the material absorbs gas or is oxidized during repeated high-temperature heating, resulting in a large loss of expensive metal. ) The cost increases due to an increase in the number of steps due to plastic working and a decrease in material yield.

【0004】本発明は、上記事情に鑑みてなされたもの
で、その目的とするところは、鋳造により直接棒状の中
間材を形成することによって、塑性加工工程数を低減す
ることができて、材料歩留りを大幅に向上させることが
できる上に、低コスト及び高品質の製品を円滑にかつ確
実に得ることができる細棒状蒸着用素材の製造方法を提
供することにある。
The present invention has been made in view of the above circumstances. An object of the present invention is to directly form a rod-shaped intermediate material by casting, thereby reducing the number of plastic working steps, and It is an object of the present invention to provide a method for producing a thin rod-shaped vapor deposition material capable of significantly improving the yield and smoothly and reliably obtaining a low-cost and high-quality product.

【0005】[0005]

【課題を解決するための手段】上記目的を達成するため
に、本発明の細棒状蒸着用素材の製造方法は、真空中で
溶解・精錬した高純度の金属あるいは合金を、真空中で
立設された筒状の鋳型内に該鋳型の上方から供給し、棒
状の中間材を鋳造した後、該棒状の中間材を熱間圧延に
よって所定断面形状まで加工するものである。
In order to achieve the above object, a method for producing a thin rod-shaped material for vapor deposition according to the present invention is a method in which a high-purity metal or alloy melted and refined in a vacuum is set up in a vacuum. The rod-shaped intermediate material is cast into the cylindrical mold from above and cast into a rod-shaped intermediate material, and then the rod-shaped intermediate material is hot-rolled to a predetermined cross-sectional shape.

【0006】[0006]

【作用】本発明の細棒状蒸着用素材の製造方法にあって
は、真空中に立設された筒状の鋳型内にその上方から高
純度の金属あるいは合金の溶湯を供給して冷却固化し、
棒状の中間材を得た後、この棒状の中間材に熱間圧延加
工を施して所定寸法の細棒状蒸着用素材を製造する。
In the method for manufacturing a thin rod-shaped material for vapor deposition according to the present invention, a high-purity metal or alloy melt is supplied from above to a cylindrical mold that is erected in vacuum and solidified by cooling. ,
After obtaining the rod-shaped intermediate material, the rod-shaped intermediate material is subjected to hot rolling to manufacture a thin rod-shaped vapor deposition material having a predetermined size.

【0007】[0007]

【実施例】以下、本発明の一実施例を説明する。EXAMPLE An example of the present invention will be described below.

【0008】まず、一般的な真空溶解炉によって高純度
の金属あるいは合金(例えば純Co,Co−20%N
i,Co−10%Cr,Co−15%Cr,Co−20
%Cr,Co−30%Cr,純Niなど)を溶解・精錬
した後、この高純度の金属あるいは合金の溶湯を、真空
中で、立設された円筒状の鋳型内にその上方から供給す
る。そして、鋳型内に供給された溶湯が冷却固化する
と、鋳型内から鋳造品を取り出す。この場合、鋳型内の
鋳造品は、冷却固化により収縮しているから、円滑に抜
き出すことができる。
First, a high-purity metal or alloy (for example, pure Co, Co-20% N) is prepared by a general vacuum melting furnace.
i, Co-10% Cr, Co-15% Cr, Co-20
% Cr, Co-30% Cr, pure Ni, etc.) is melted and refined, and then the molten metal of this high-purity metal or alloy is supplied from above into a vertically standing cylindrical mold. .. Then, when the molten metal supplied into the mold is cooled and solidified, the cast product is taken out from the mold. In this case, since the cast product in the mold is contracted by cooling and solidification, it can be smoothly extracted.

【0009】次いで、上述のようにして得られた鋳造品
(棒状の中間材)を熱間溝ロールによって圧延する。こ
の場合の圧延条件は、加工温度600〜1100℃,加
工度(断面減少率:1−a/A,Aは加工前の断面積,
aは加工後の断面積)75%以上に設定されている。そ
の理由は、まず、前提となる対象素材として純Co,C
o−20%Ni,Co−10〜30%Cr,純Niを想
定した場合、加工温度が1100゜C以上では表面酸化
が著しく、酸化ロスが生じる上に、熱間加工時の酸化皮
膜の巻き込み等が発生し品質に悪影響を与える一方、6
00゜C以下ではインゴット内部に引巣が生じた場合、
この巣の圧着が不完全になり蒸着特性に悪影響を及ぼす
からであり、かつ上記加工温度600〜1100゜Cに
おいて加工した場合でも加工率が75%未満の場合、イ
ンゴットの引巣の圧着が不充分になるため、75%以上
の加工率が望ましい。
Next, the cast product (bar-shaped intermediate material) obtained as described above is rolled by a hot groove roll. The rolling conditions in this case are as follows: processing temperature 600 to 1100 ° C., processing degree (reduction rate of cross section: 1-a / A, A is the cross-sectional area before processing,
(a is a cross-sectional area after processing) 75% or more. The reason is that first, pure Co, C is used as the target material to be assumed.
Assuming o-20% Ni, Co-10 to 30% Cr, and pure Ni, the surface oxidation is remarkable at a processing temperature of 1100 ° C or higher, and oxidation loss occurs, and the oxide film is involved during hot working. Etc. occurs and adversely affects the quality, while 6
If the porosity occurs inside the ingot below 00 ° C,
This is because the crimping of the cavities is incomplete and the vapor deposition characteristics are adversely affected, and when the working rate is less than 75% even when working at the working temperature of 600 to 1100 ° C, the crimping of the cavities of the ingot is unsatisfactory. Since it is sufficient, a processing rate of 75% or more is desirable.

【0010】この結果、上記棒状の中間材の内部に残る
巣がつぶされて完全に圧着し均一な材質でかつ所定断面
形状の圧延品が得られる。続いてこの圧延品を研磨等に
より酸化皮膜を除去し蒸着用素材が得られる。また、使
用条件により、この細棒をプレス等で切断してペレット
状にして使用する。
As a result, the cavities remaining inside the rod-shaped intermediate material are crushed and completely pressed to obtain a rolled product having a uniform material and a predetermined cross-sectional shape. Then, the oxide film is removed from the rolled product by polishing or the like to obtain a material for vapor deposition. Further, depending on the use conditions, the thin rod is cut by a press or the like to be used as a pellet.

【0011】なお、上記実施例においては、円筒状の鋳
型4を用いて説明したが、これに限らず、角筒状やその
他の断面形状の鋳型を用いてもよい。
In the above embodiment, the cylindrical mold 4 is used for explanation, but the invention is not limited to this, and a mold having a rectangular tube shape or other cross-sectional shape may be used.

【0012】[0012]

【発明の効果】以上説明したように、本発明の細棒状蒸
着用素材の製造方法は、真空中で溶解・精錬した高純度
の金属あるいは合金を、真空中で立設された筒状の鋳型
内に該鋳型の上方から供給し、棒状の中間材を鋳造した
後、該棒状の中間材を熱間圧延によって所定断面形状ま
で加工するものであるから、真空中に立設された筒状の
鋳型内にその上方から高純度の金属あるいは合金の溶湯
を供給して冷却固化し、棒状の中間材を得た後、この棒
状の中間材に熱間圧延加工を施して所定寸法の細棒状蒸
着用素材を製造することにより、塑性加工工程数を低減
することができて、材料歩留りを大幅に向上させること
ができる上に、低コスト及び高品質の製品を円滑にかつ
確実に得ることができる。
As described above, the method for producing a thin rod-shaped vapor deposition material of the present invention is a cylindrical mold in which a high-purity metal or alloy melted and refined in a vacuum is erected in a vacuum. Is supplied from above the mold, and after casting a rod-shaped intermediate material, the rod-shaped intermediate material is processed to a predetermined cross-sectional shape by hot rolling. A high-purity metal or alloy melt is supplied into the mold from above to solidify by cooling to obtain a rod-shaped intermediate material, and this rod-shaped intermediate material is subjected to hot rolling processing and thin rod-shaped vapor deposition of a predetermined size. By manufacturing the material for use, it is possible to reduce the number of plastic working steps, greatly improve the material yield, and smoothly and surely obtain low-cost and high-quality products. ..

───────────────────────────────────────────────────── フロントページの続き (72)発明者 佐藤 昭文 埼玉県桶川市上日出谷1230番地 三菱マテ リアル株式会社桶川第一製作所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Akifumi Sato 1230 Kamijideya, Okegawa City, Saitama Prefecture Mitsubishi Material Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 真空中で溶解・精錬した高純度の金属あ
るいは合金を、真空中で立設された筒状の鋳型内に該鋳
型の上方から供給し、棒状の中間材を鋳造した後、該棒
状の中間材を熱間圧延によって所定断面形状まで加工す
ることを特徴とする細棒状蒸着用素材の製造方法。
1. A high-purity metal or alloy melted and refined in a vacuum is supplied from above the mold into a cylindrical mold standing upright in a vacuum to cast a rod-shaped intermediate material, A method for producing a thin rod-shaped material for vapor deposition, which comprises working the rod-shaped intermediate material into a predetermined cross-sectional shape by hot rolling.
JP3055153A 1991-03-19 1991-03-19 Manufacturing method of thin rod-shaped material for vapor deposition Expired - Lifetime JP2874364B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3055153A JP2874364B2 (en) 1991-03-19 1991-03-19 Manufacturing method of thin rod-shaped material for vapor deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3055153A JP2874364B2 (en) 1991-03-19 1991-03-19 Manufacturing method of thin rod-shaped material for vapor deposition

Publications (2)

Publication Number Publication Date
JPH0570933A true JPH0570933A (en) 1993-03-23
JP2874364B2 JP2874364B2 (en) 1999-03-24

Family

ID=12990807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3055153A Expired - Lifetime JP2874364B2 (en) 1991-03-19 1991-03-19 Manufacturing method of thin rod-shaped material for vapor deposition

Country Status (1)

Country Link
JP (1) JP2874364B2 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63199844A (en) * 1987-02-12 1988-08-18 Furukawa Electric Co Ltd:The Chromium alloy for target of sputtering and its production
JPS6411967A (en) * 1987-07-06 1989-01-17 Seiko Epson Corp Sputtering target
JPH01108367A (en) * 1987-10-19 1989-04-25 Seiko Epson Corp Manufacturing method of sputtering target
JPH0262110A (en) * 1988-08-26 1990-03-02 Fujitsu Ltd Electronic circuit

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63199844A (en) * 1987-02-12 1988-08-18 Furukawa Electric Co Ltd:The Chromium alloy for target of sputtering and its production
JPS6411967A (en) * 1987-07-06 1989-01-17 Seiko Epson Corp Sputtering target
JPH01108367A (en) * 1987-10-19 1989-04-25 Seiko Epson Corp Manufacturing method of sputtering target
JPH0262110A (en) * 1988-08-26 1990-03-02 Fujitsu Ltd Electronic circuit

Also Published As

Publication number Publication date
JP2874364B2 (en) 1999-03-24

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