JPH0572755A - Electrophotographic sensitive body - Google Patents
Electrophotographic sensitive bodyInfo
- Publication number
- JPH0572755A JPH0572755A JP26053191A JP26053191A JPH0572755A JP H0572755 A JPH0572755 A JP H0572755A JP 26053191 A JP26053191 A JP 26053191A JP 26053191 A JP26053191 A JP 26053191A JP H0572755 A JPH0572755 A JP H0572755A
- Authority
- JP
- Japan
- Prior art keywords
- group
- resin
- general formula
- polymer
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005989 resin Polymers 0.000 claims abstract description 213
- 239000011347 resin Substances 0.000 claims abstract description 213
- 229920000642 polymer Polymers 0.000 claims abstract description 101
- 229920001577 copolymer Polymers 0.000 claims abstract description 34
- 239000000178 monomer Substances 0.000 claims abstract description 30
- 239000011230 binding agent Substances 0.000 claims abstract description 24
- 125000005647 linker group Chemical group 0.000 claims abstract description 13
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 12
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 9
- 239000000126 substance Substances 0.000 claims description 81
- 150000002430 hydrocarbons Chemical group 0.000 claims description 48
- 239000000463 material Substances 0.000 claims description 40
- 125000004432 carbon atom Chemical group C* 0.000 claims description 28
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 21
- 239000004215 Carbon black (E152) Substances 0.000 claims description 16
- 229930195733 hydrocarbon Natural products 0.000 claims description 16
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 16
- 230000001235 sensitizing effect Effects 0.000 claims description 15
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 14
- 125000005843 halogen group Chemical group 0.000 claims description 14
- 238000006116 polymerization reaction Methods 0.000 claims description 14
- 230000003595 spectral effect Effects 0.000 claims description 13
- 229910052801 chlorine Inorganic materials 0.000 claims description 11
- 125000003118 aryl group Chemical group 0.000 claims description 10
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 4
- 125000004429 atom Chemical group 0.000 claims description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 4
- 125000004018 acid anhydride group Chemical group 0.000 claims description 2
- 125000004122 cyclic group Chemical group 0.000 claims description 2
- 239000007788 liquid Substances 0.000 abstract description 7
- 229910052736 halogen Inorganic materials 0.000 abstract description 2
- 150000002367 halogens Chemical class 0.000 abstract description 2
- 229920001400 block copolymer Polymers 0.000 abstract 2
- -1 for example Chemical group 0.000 description 98
- 239000010410 layer Substances 0.000 description 49
- 239000000975 dye Substances 0.000 description 45
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 42
- 230000015572 biosynthetic process Effects 0.000 description 42
- 238000003786 synthesis reaction Methods 0.000 description 40
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 36
- 238000000034 method Methods 0.000 description 36
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 28
- 229910052757 nitrogen Inorganic materials 0.000 description 25
- 238000007639 printing Methods 0.000 description 25
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 24
- 239000000203 mixture Substances 0.000 description 23
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 18
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 18
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 16
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 15
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 15
- 108091008695 photoreceptors Proteins 0.000 description 15
- 125000001424 substituent group Chemical group 0.000 description 15
- 125000000217 alkyl group Chemical group 0.000 description 14
- 239000011259 mixed solution Substances 0.000 description 14
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 13
- 239000000243 solution Substances 0.000 description 12
- 239000011787 zinc oxide Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 11
- 230000007613 environmental effect Effects 0.000 description 11
- 238000003384 imaging method Methods 0.000 description 11
- 230000014759 maintenance of location Effects 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 10
- 239000002245 particle Substances 0.000 description 10
- 206010016807 Fluid retention Diseases 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 9
- 239000003999 initiator Substances 0.000 description 9
- 239000000123 paper Substances 0.000 description 9
- 125000003710 aryl alkyl group Chemical group 0.000 description 8
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 8
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 8
- 239000002244 precipitate Substances 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 7
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 7
- 206010034972 Photosensitivity reaction Diseases 0.000 description 7
- 238000001816 cooling Methods 0.000 description 7
- 238000007334 copolymerization reaction Methods 0.000 description 7
- 230000036211 photosensitivity Effects 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 6
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 6
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 6
- 239000007795 chemical reaction product Substances 0.000 description 6
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- 238000007645 offset printing Methods 0.000 description 6
- 230000002829 reductive effect Effects 0.000 description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 5
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 125000000068 chlorophenyl group Chemical group 0.000 description 5
- 229920006026 co-polymeric resin Polymers 0.000 description 5
- 238000010908 decantation Methods 0.000 description 5
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 125000006178 methyl benzyl group Chemical group 0.000 description 5
- 125000001624 naphthyl group Chemical group 0.000 description 5
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 125000006239 protecting group Chemical group 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 125000003944 tolyl group Chemical group 0.000 description 5
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 5
- YKZMWXJHPKWFLS-UHFFFAOYSA-N (2-chlorophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1Cl YKZMWXJHPKWFLS-UHFFFAOYSA-N 0.000 description 4
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 4
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 4
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 125000002723 alicyclic group Chemical group 0.000 description 4
- 125000006278 bromobenzyl group Chemical group 0.000 description 4
- 125000004799 bromophenyl group Chemical group 0.000 description 4
- 125000004803 chlorobenzyl group Chemical group 0.000 description 4
- 125000004188 dichlorophenyl group Chemical group 0.000 description 4
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 4
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 239000003505 polymerization initiator Substances 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- 238000012552 review Methods 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 230000002194 synthesizing effect Effects 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- 125000005023 xylyl group Chemical group 0.000 description 4
- 125000006039 1-hexenyl group Chemical group 0.000 description 3
- 125000006023 1-pentenyl group Chemical group 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 3
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 3
- 125000005999 2-bromoethyl group Chemical group 0.000 description 3
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 3
- WJCCNRRUTSLHLJ-UHFFFAOYSA-N 2-ethenyl-1,4-dioxane Chemical compound C=CC1COCCO1 WJCCNRRUTSLHLJ-UHFFFAOYSA-N 0.000 description 3
- 125000006040 2-hexenyl group Chemical group 0.000 description 3
- 125000004924 2-naphthylethyl group Chemical group C1=C(C=CC2=CC=CC=C12)CC* 0.000 description 3
- 125000006024 2-pentenyl group Chemical group 0.000 description 3
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 3
- ORNUPNRNNSVZTC-UHFFFAOYSA-N 2-vinylthiophene Chemical compound C=CC1=CC=CS1 ORNUPNRNNSVZTC-UHFFFAOYSA-N 0.000 description 3
- KXFHZSFZCQPLPW-UHFFFAOYSA-N 3-ethenyl-2h-oxazine Chemical compound C=CC1=CC=CON1 KXFHZSFZCQPLPW-UHFFFAOYSA-N 0.000 description 3
- YPIINMAYDTYYSQ-UHFFFAOYSA-N 5-ethenyl-1h-pyrazole Chemical compound C=CC=1C=CNN=1 YPIINMAYDTYYSQ-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 235000010724 Wisteria floribunda Nutrition 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 3
- 125000001246 bromo group Chemical group Br* 0.000 description 3
- 125000004802 cyanophenyl group Chemical group 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 125000006182 dimethyl benzyl group Chemical group 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 3
- 229920000578 graft copolymer Polymers 0.000 description 3
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000005842 heteroatom Chemical group 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 3
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 3
- LGRFSURHDFAFJT-UHFFFAOYSA-N phthalic anhydride Chemical group C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 3
- 229920001225 polyester resin Polymers 0.000 description 3
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- 238000010526 radical polymerization reaction Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 2
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 2
- PMNLUUOXGOOLSP-UHFFFAOYSA-N 2-mercaptopropanoic acid Chemical compound CC(S)C(O)=O PMNLUUOXGOOLSP-UHFFFAOYSA-N 0.000 description 2
- 125000006020 2-methyl-1-propenyl group Chemical group 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 2
- 125000006050 3-methyl-2-pentenyl group Chemical group 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
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- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 206010034960 Photophobia Diseases 0.000 description 2
- 241000519995 Stachys sylvatica Species 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical group 0.000 description 2
- 150000003926 acrylamides Chemical class 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 229950005228 bromoform Drugs 0.000 description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 125000005626 carbonium group Chemical group 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000012986 chain transfer agent Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N chloroform Substances ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 229960001701 chloroform Drugs 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 2
- UFULAYFCSOUIOV-UHFFFAOYSA-N cysteamine Chemical compound NCCS UFULAYFCSOUIOV-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010511 deprotection reaction Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 230000003292 diminished effect Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
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- MUTGBJKUEZFXGO-UHFFFAOYSA-N hexahydrophthalic anhydride Chemical group C1CCCC2C(=O)OC(=O)C21 MUTGBJKUEZFXGO-UHFFFAOYSA-N 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000007327 hydrogenolysis reaction Methods 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- JDNTWHVOXJZDSN-UHFFFAOYSA-N iodoacetic acid Chemical compound OC(=O)CI JDNTWHVOXJZDSN-UHFFFAOYSA-N 0.000 description 1
- 229910052981 lead sulfide Inorganic materials 0.000 description 1
- 229940056932 lead sulfide Drugs 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical group O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 230000010534 mechanism of action Effects 0.000 description 1
- 229960003151 mercaptamine Drugs 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 1
- OJURWUUOVGOHJZ-UHFFFAOYSA-N methyl 2-[(2-acetyloxyphenyl)methyl-[2-[(2-acetyloxyphenyl)methyl-(2-methoxy-2-oxoethyl)amino]ethyl]amino]acetate Chemical compound C=1C=CC=C(OC(C)=O)C=1CN(CC(=O)OC)CCN(CC(=O)OC)CC1=CC=CC=C1OC(C)=O OJURWUUOVGOHJZ-UHFFFAOYSA-N 0.000 description 1
- CCRCUPLGCSFEDV-UHFFFAOYSA-N methyl cinnamate Chemical compound COC(=O)C=CC1=CC=CC=C1 CCRCUPLGCSFEDV-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 1
- PJUIMOJAAPLTRJ-UHFFFAOYSA-N monothioglycerol Chemical compound OCC(O)CS PJUIMOJAAPLTRJ-UHFFFAOYSA-N 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- YWWNNLPSZSEZNZ-UHFFFAOYSA-N n,n-dimethyldecan-1-amine Chemical compound CCCCCCCCCCN(C)C YWWNNLPSZSEZNZ-UHFFFAOYSA-N 0.000 description 1
- YWFWDNVOPHGWMX-UHFFFAOYSA-N n,n-dimethyldodecan-1-amine Chemical compound CCCCCCCCCCCCN(C)C YWFWDNVOPHGWMX-UHFFFAOYSA-N 0.000 description 1
- WVFLGSMUPMVNTQ-UHFFFAOYSA-N n-(2-hydroxyethyl)-2-[[1-(2-hydroxyethylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCO WVFLGSMUPMVNTQ-UHFFFAOYSA-N 0.000 description 1
- 150000002790 naphthalenes Chemical group 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- STZOTKNJQXZFFR-UHFFFAOYSA-N oxamoylcarbamic acid Chemical compound NC(=O)C(=O)NC(O)=O STZOTKNJQXZFFR-UHFFFAOYSA-N 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 150000004989 p-phenylenediamines Chemical class 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical class C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 238000010094 polymer processing Methods 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- ARJOQCYCJMAIFR-UHFFFAOYSA-N prop-2-enoyl prop-2-enoate Chemical compound C=CC(=O)OC(=O)C=C ARJOQCYCJMAIFR-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 125000004309 pyranyl group Chemical group O1C(C=CC=C1)* 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229930187593 rose bengal Natural products 0.000 description 1
- 229940081623 rose bengal Drugs 0.000 description 1
- STRXNPAVPKGJQR-UHFFFAOYSA-N rose bengal A Natural products O1C(=O)C(C(=CC=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 STRXNPAVPKGJQR-UHFFFAOYSA-N 0.000 description 1
- VDNLFJGJEQUWRB-UHFFFAOYSA-N rose bengal free acid Chemical compound OC(=O)C1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C(O)=C(I)C=C21 VDNLFJGJEQUWRB-UHFFFAOYSA-N 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000005017 substituted alkenyl group Chemical group 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- FIDKFEIEZJGDBE-UHFFFAOYSA-N thieno[2,3-c]furan-4,6-dione Chemical group S1C=CC2=C1C(=O)OC2=O FIDKFEIEZJGDBE-UHFFFAOYSA-N 0.000 description 1
- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
- 229940103494 thiosalicylic acid Drugs 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- YIYBQIKDCADOSF-ONEGZZNKSA-N trans-pent-2-enoic acid Chemical compound CC\C=C\C(O)=O YIYBQIKDCADOSF-ONEGZZNKSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- PGQNYIRJCLTTOJ-UHFFFAOYSA-N trimethylsilyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)O[Si](C)(C)C PGQNYIRJCLTTOJ-UHFFFAOYSA-N 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical compound OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は電子写真感光体に関し、
詳しくは静電特性及び耐湿性に優れた電子写真感光体に
関する。FIELD OF THE INVENTION The present invention relates to an electrophotographic photoreceptor,
Specifically, it relates to an electrophotographic photoreceptor having excellent electrostatic characteristics and moisture resistance.
【0002】[0002]
【従来の技術】電子写真感光体は、所定の特性を得るた
め、あるいは適用される電子写真プロセスの種類に応じ
て、種々の構成をとる。2. Description of the Related Art Electrophotographic photoreceptors have various structures in order to obtain predetermined characteristics or depending on the type of electrophotographic process applied.
【0003】電子写真感光体の代表的なものとして、支
持体上に光導電層が形成されている感光体及び表面に絶
縁層を備えた感光体があり、広く用いられている。支持
体と少なくとも1つの光導電層から構成される感光体
は、最も一般的な電子写真プロセスによる、即ち帯電、
画像露光及び現像、更に必要に応じて転写による画像形
成に用いられる。Typical of electrophotographic photoreceptors are a photoreceptor having a photoconductive layer formed on a support and a photoreceptor having an insulating layer on the surface thereof, which are widely used. Photoreceptors composed of a support and at least one photoconductive layer are produced by the most common electrophotographic process, namely charging.
It is used for image exposure and development and, if necessary, for image formation by transfer.
【0004】更には、ダイレクト製版用のオフセット原
版として電子写真感光体を用いる方法が広く実用されて
いる。特に近年、ダイレクト電子写真平版は数百枚から
数千枚程度の印刷枚数で高画質の印刷物を印刷する方式
として重要となってきている。こうした状況の中で、電
子写真感光体の光導電層を形成するために使用する結着
樹脂は、それ自体の成膜性および光導電性粉体の結着樹
脂への分散能力が優れるとともに、形成された記録体層
の基材に対する接着性が良好であり、しかも記録体層の
光導電層は帯電能力に優れ、暗減衰が小さく、光減衰が
大きく、前露光疲労が少なく、且つ、撮影時の湿度の変
化によってこれら特性を安定に保持していることが必要
である等の各種の静電特性および優れた撮像性を具備す
る必要がある。Further, a method of using an electrophotographic photosensitive member as an offset original plate for direct plate making is widely used. In recent years, in particular, direct electrophotographic lithographic printing plates have become important as a method of printing high-quality printed matter with a printing number of several hundreds to several thousands. In such a situation, the binder resin used to form the photoconductive layer of the electrophotographic photosensitive member has excellent film-forming property of itself and dispersibility in the binder resin of the photoconductive powder, The formed recording layer has good adhesion to the substrate, and the photoconductive layer of the recording layer has excellent charging ability, small dark decay, large light decay, little pre-exposure fatigue, and shooting It is necessary to have various electrostatic characteristics such as that these characteristics need to be stably maintained due to changes in humidity with time, and excellent image pickup properties.
【0005】更に、電子写真感光体を用いた平版印刷用
原版の研究が鋭意行なわれており、電子写真感光体とし
ての静電特性と印刷原版としての印刷特性を両立させた
光導電層用の結着樹脂が必要である。Further, research on a lithographic printing original plate using an electrophotographic photosensitive member has been earnestly carried out, and a photoconductive layer for a photoconductive layer having both electrostatic characteristics as an electrophotographic photosensitive member and printing characteristics as a printing original plate has been made. Binder resin is required.
【0006】無機光導電材料、分光増感色素及び結着樹
脂を少なくとも含有する光導電層において、結着樹脂の
化学構造によって、平滑性のみならず静電特性が大きく
影響を受けることが判ってきた。特に静電特性におい
て、暗中電荷保持率(D.R.R.)や光感度が大きく
左右される。In a photoconductive layer containing at least an inorganic photoconductive material, a spectral sensitizing dye and a binder resin, it has been found that not only smoothness but also electrostatic properties are greatly affected by the chemical structure of the binder resin. It was Particularly in the electrostatic characteristics, the charge retention ratio in the dark (D.R.R.) and the photosensitivity are greatly influenced.
【0007】これに対し、特開昭63−217354
号、同64−70761号、特開平2−67563号及
び同2−247656号等に記載の技術によれば、酸性
基含有重合成分が重合体主鎖にランダムに存在する低分
子量の樹脂、重合体主鎖の片末端に酸性基を結合して成
る低分子量の樹脂あるいは酸性基を重合体主鎖の片末端
に結合して成る低分子量のグラフト型共重合体の樹脂、
酸性基をグラフト部に含有する低分子量のグラフト型共
重合体の樹脂等を結着樹脂として用いる事で平滑性及び
静電特性を良化できる様になった。これらは、該低分子
量の樹脂が、光導電体の分散を充分に行ない光導電体同
志の凝集を抑制する効果を有すること及び光導電体と分
光増感色素との吸着を疎外しないで該無機光導電体の化
学量論的な欠陥に充分に吸着するとともに光導電体の表
面をゆるやかに且つ充分に被覆していることによると推
定される。On the other hand, Japanese Unexamined Patent Publication No. 63-217354
According to the techniques described in JP-A No. 64-70761, JP-A Nos. 2-67563 and 2-247656, a low molecular weight resin in which an acidic group-containing polymerization component is randomly present in the polymer main chain, A low molecular weight resin having an acidic group bonded to one end of the polymer main chain or a low molecular weight graft copolymer resin having an acidic group bonded to one end of the polymer main chain,
It has become possible to improve smoothness and electrostatic properties by using a low molecular weight graft copolymer resin containing an acidic group in the graft portion as a binder resin. These are such that the low molecular weight resin has an effect of sufficiently dispersing the photoconductor and suppressing the aggregation of the photoconductors, and the adsorption of the photoconductor and the spectral sensitizing dye is not excluded from the inorganic substance. It is presumed that this is due to the fact that the photoconductor is sufficiently adsorbed to the stoichiometric defects and the surface of the photoconductor is covered gently and sufficiently.
【0008】その作用機構により、無機光導電体の化学
量論的な欠陥部が多少変動しても、充分な吸着領域をも
つ事から比較的安定した無機光導電体、分光増感色素及
び樹脂同志の相互作用が保たれると推論される。Due to its mechanism of action, the inorganic photoconductor, the spectral sensitizing dye, and the resin are relatively stable because they have a sufficient adsorption area even if the stoichiometric defects of the inorganic photoconductor fluctuate to some extent. It is inferred that mutual interaction is maintained.
【0009】そして、これらの低分子量の樹脂のみでは
不充分な光導電層の機械的強度を充分ならしめるため
に、中〜高分子量の他の樹脂を併用する技術あるいは硬
化性基を含有した樹脂を併用して成膜後に硬化する技術
等が特開昭64−564号、同63−220149号、
同63−220148号、特開平1−280761号、
同1−116643号、同1−169455号、同1−
211766号、同2−34859号、同2−5306
4号、同2−56558号、特願平1−163796
号、同1−212994号、同1−229379号、同
1−189245号等に記載されている。In order to make the mechanical strength of the photoconductive layer insufficient by using only these low molecular weight resins, a technique of using another resin of medium to high molecular weight or a resin containing a curable group is used. Japanese Patent Application Laid-Open Nos. 64-564, 63-220149, and 63-220149, which are used together to cure after film formation,
63-220148, JP-A-1-280761,
No. 1-116643, No. 1-169455, No. 1-
No. 211766, No. 2-34859, No. 2-5306
No. 4, No. 2-56558, and Japanese Patent Application No. 1-163796.
No. 1-212994, No. 1-2229379, No. 1-189245, and the like.
【0010】[0010]
【発明が解決しようとする課題】しかしながら、これら
の樹脂又は樹脂の組合せを用いても、環境が高温・高湿
から低温・低湿まで著しく変動した場合における安定し
た性能の維持においてはいまだ不充分であることが判っ
た。半導体レーザー光を用いたスキャンニング露光方式
では、従来の可視光による全面同時露光方式に比べ、露
光時間が長くなり、また露光強度にも制約があることか
ら、静電特性、特に暗電荷保持特性、光感度に対して、
より高い性能が要求される。However, even if these resins or combinations of resins are used, they are still insufficient in maintaining stable performance when the environment changes significantly from high temperature / high humidity to low temperature / low humidity. I knew it was. The scanning exposure method that uses a semiconductor laser beam has a longer exposure time than the conventional simultaneous full-exposure method that uses visible light, and also has a limited exposure intensity, so electrostatic characteristics, especially dark charge retention characteristics, are used. , For light sensitivity,
Higher performance is required.
【0011】特に、電子写真式平版印刷用原版におい
て、半導体レーザー光を用いたスキャンニング露光方式
を採用した場合,従来の感光体で実際に試験してみる
と、上記の静電特性が十分に満足できるものでなく、特
にE1/2 とE1/10との差が大きく複写画像の階調が軟調
となり、更には露光後の残留電位を小さくするのが困難
となり、複写画像のカブリが顕著となってしまい、又、
オフセットマスターとして印刷しても、印刷物に印刷原
稿の貼り込み跡が出てしまう等の問題が現れた。In particular, when the scanning exposure method using a semiconductor laser beam is adopted in the electrophotographic lithographic printing plate precursor, when actually tested with a conventional photosensitive member, the above electrostatic characteristics are sufficiently obtained. This is not satisfactory, and especially the difference between E 1/2 and E 1/10 is large and the gradation of the copied image becomes soft, and it becomes difficult to reduce the residual potential after exposure, causing fog in the copied image. Became noticeable, and again
Even when printing as an offset master, problems such as a printed original sticking traces on the printed matter appeared.
【0012】更に、近年、線画及び網点から成る画像の
複写画像のみならず、連続階調から成る高精細な画像を
液体現像剤を用いて忠実に再現する技術の実現が望まれ
ているが、前記公知の技術はこれらの要望まで十分に満
足できるものではなかった。Further, in recent years, it has been desired to realize a technique for faithfully reproducing not only a copied image of an image composed of line drawings and halftone dots but also a high-definition image composed of continuous gradations by using a liquid developer. However, the above-mentioned known technology has not been able to sufficiently satisfy these demands.
【0013】従来公知の技術においては、低分子量の樹
脂と併用する中〜高分子量の樹脂によって、上記低分子
量の樹脂で高性能化された静電特性が低下することがあ
り、実際に前記した様なこれら公知の樹脂の組合せで用
いた光導電層を有する電子写真感光体は、前述の様な高
精細な画像(特に連続階調画像)の忠実な複写画像の再
現性あるいは、低出力のレーザー光を用いたスキャンニ
ング露光方式による撮像性に対して、問題を生じ得るこ
とが明らかになった。In the conventionally known technique, the medium-to-high molecular weight resin used in combination with the low-molecular weight resin may lower the electrostatic properties of the low-molecular weight resin, which has been improved in performance. The electrophotographic photosensitive member having a photoconductive layer used in combination with these known resins as described above has high reproducibility of reproduced images of high definition images (especially continuous tone images) or low output. It was clarified that a problem can occur with respect to the imaging property of the scanning exposure method using laser light.
【0014】本発明は、以上の様な従来公知の電子写真
感光体の有する課題を改良するものである。本発明の目
的は、複写画像形成時の環境が低温低湿あるいは高温高
湿の如く変動した場合でも、常に安定して良好な静電特
性を維持し、鮮明で良質な画像を有する電子写真感光体
を提供することである。The present invention is to improve the problems of the above-described conventionally known electrophotographic photosensitive members. An object of the present invention is to provide an electrophotographic photosensitive member having a clear and high-quality image, which constantly maintains good electrostatic properties even when the environment during copy image formation changes such as low temperature and low humidity or high temperature and high humidity. Is to provide.
【0015】本発明の他の目的は、静電特性に優れ且つ
環境依存性の小さいCPC電子写真感光体を提供するこ
とである。本発明の他の目的は、半導体レーザー光を用
いたスキャンニング露光方式に有効な電子写真感光体を
提供することである。Another object of the present invention is to provide a CPC electrophotographic photosensitive member which is excellent in electrostatic characteristics and has little environmental dependence. Another object of the present invention is to provide an electrophotographic photosensitive member effective for a scanning exposure system using a semiconductor laser beam.
【0016】本発明の更なる目的は、電子写真式平版印
刷原版として、静電特性(特に暗電荷保持性及び光感
度)に優れ、原画(特に高精細な連続階調画像)に対し
て忠実な複写画像を再現し、且つ、印刷物の全面一様な
地汚れはもちろん点状の地汚れをも発生させず、また耐
刷性の優れた平版印刷原版を提供することである。A further object of the present invention is an electrophotographic lithographic printing original plate which is excellent in electrostatic properties (particularly dark charge retention and photosensitivity) and is faithful to an original image (particularly a high-definition continuous tone image). Another object of the present invention is to provide a lithographic printing original plate which reproduces a simple copy image, does not cause spot stains as well as uniform stains on the entire surface of a printed matter, and has excellent printing durability.
【0017】[0017]
【課題を解決するための手段】上記目的は無機光導電材
料、分光増感色素及び結着樹脂を少なくとも含有する光
導電層を有する電子写真感光体において、該結着樹脂
が、下記樹脂〔A1 〕及び樹脂〔A2 〕のうちの少なく
とも1種並びに下記樹脂〔B〕のうちの少なくとも1種
を含有して成ることを特徴とする電子写真感光体により
達成されることが見出された。 樹脂〔A1 〕 1×103 〜2×104 の重量平均分子量を有し、下記
一般式(I)で示される繰り返し単位を重合体成分とし
て30重量%以上含有する重合体主鎖の一方の末端にの
み下記一般式(II)で示される重合性二重結合基を結
合して成る重量平均分子量2×104 以下の一官能性マ
クロモノマー(M1 )と、該一般式(I)で示される繰
り返し単位に相当するモノマーとから少なくとも成る共
重合体であって、且つ該共重合体主鎖の片末端に−PO
3 H2 、−SO3 H、−COOH、−P(=O)(O
H)R1 〔R1 は炭化水素基又は−OR2 (R2 は炭化
水素基を表す)を表す〕及び環状酸無水物基から選択さ
れる少なくとも1種の極性基を結合して成る樹脂。 樹脂〔A2 〕 1×103 〜2×104 の重量平均分子量を有し、下記
一般式(I)で示される繰り返し単位を重合体成分とし
て30重量%以上及び上記樹脂〔A1 〕で示しされる特
定の極性基から選択される少なくとも一種の極性基を含
有する重合体成分を1〜50重量%含有する重合体主鎖
の一方の末端にのみ下記一般式(II)で示される重合
性二重結合基を結合して成る重量平均分子量2×104
以下の一官能性マクロモノマー(M2 )と、該一般式
(I)で示される繰り返し単位に相当するモノマーとか
ら少なくとも成る共重合体である樹脂。The above object is to provide an electrophotographic photoreceptor having a photoconductive layer containing at least an inorganic photoconductive material, a spectral sensitizing dye and a binder resin, wherein the binder resin is 1 ] and at least one of the resins [A 2 ] and at least one of the following resins [B], and it has been found to be achieved by an electrophotographic photoreceptor. .. Resin [A 1 ] One of the polymer main chains having a weight average molecular weight of 1 × 10 3 to 2 × 10 4 and containing a repeating unit represented by the following general formula (I) as a polymer component in an amount of 30% by weight or more. A monofunctional macromonomer (M 1 ) having a weight average molecular weight of 2 × 10 4 or less, which is formed by bonding a polymerizable double bond group represented by the following general formula (II) only to the terminal of the general formula (I) Is a copolymer comprising at least a monomer corresponding to the repeating unit represented by
3 H 2 , -SO 3 H, -COOH, -P (= O) (O
H) R 1 [R 1 represents a hydrocarbon group or —OR 2 (R 2 represents a hydrocarbon group)] and a resin formed by bonding at least one polar group selected from a cyclic acid anhydride group .. Resin [A 2 ] having a weight average molecular weight of 1 × 10 3 to 2 × 10 4 and containing a repeating unit represented by the following general formula (I) as a polymer component in an amount of 30% by weight or more and the above resin [A 1 ]. Polymerization represented by the following general formula (II) only at one end of a polymer main chain containing 1 to 50% by weight of a polymer component containing at least one polar group selected from the specific polar groups shown. Weight average molecular weight of 2 × 10 4
A resin, which is a copolymer comprising at least the following monofunctional macromonomer (M 2 ) and a monomer corresponding to the repeating unit represented by the general formula (I).
【0018】[0018]
【化5】 [Chemical 5]
【0019】〔式(I)中、a1 、a2 は各々水素原
子、ハロゲン原子、シアノ基又は炭化水素基を表す。R
3 は炭化水素基を表す。好ましくはa1 が水素原子、a
2 がメチル基の場合である。〕[In the formula (I), a 1 and a 2 each represent a hydrogen atom, a halogen atom, a cyano group or a hydrocarbon group. R
3 represents a hydrocarbon group. Preferably, a 1 is a hydrogen atom, a
This is the case where 2 is a methyl group. ]
【0020】[0020]
【化6】 [Chemical 6]
【0021】〔式(II)中、R4 は−COO−、−O
CO−、−CH2 OCO−、−CH2 COO−、−O
−、−SO2 −、−CO−、−CONR5 −、−SO2
NR5 −(ここでR5 は水素原子又は炭化水素基を表わ
す)、−CONHCOO−、−CONHCONH−又は
−C6 H4−を表わす。[In the formula (II), R 4 is -COO-, -O
CO -, - CH 2 OCO - , - CH 2 COO -, - O
-, - SO 2 -, - CO -, - CONR 5 -, - SO 2
NR 5 — (wherein R 5 represents a hydrogen atom or a hydrocarbon group), —CONHCOO—, —CONHCONH— or —C 6 H 4 —.
【0022】b1 及びb2 は、互いに同じでも異なって
もよく、各々水素原子、ハロゲン原子、シアノ基、炭化
水素基、−COOR6 又は炭化水素を介した−COOR
6 (ここでR6 は置換されてもよい炭化水素基を表す)
を表す。〕 樹脂〔B〕 2×104 〜1×106 の重量平均分子量を有し、上記
樹脂〔A1 〕における一般式(I)で示される繰り返し
単位を重合体成分として少なくとも含有するAブロック
と上記樹脂〔A1 〕で示される特定の極性基のうちから
選択される少なくとも1種の極性基を含有する少なくと
も1つの重合体成分を少なくとも含有するBブロックと
から構成されるAB型ブロック高分子鎖が、有機分子中
に少なくとも3個結合して成るスタ−型共重合体から成
る樹脂。B 1 and b 2 may be the same or different and each is a hydrogen atom, a halogen atom, a cyano group, a hydrocarbon group, —COOR 6 or —COOR 6 via a hydrocarbon.
6 (wherein R 6 represents an optionally substituted hydrocarbon group)
Represents. Resin [B] An A block having a weight average molecular weight of 2 × 10 4 to 1 × 10 6 and containing at least the repeating unit represented by the general formula (I) in the above resin [A 1 ] as a polymer component. AB type block polymer composed of a B block containing at least one polymer component containing at least one polar group selected from the specific polar groups represented by the resin [A 1 ]. A resin composed of a star-type copolymer in which at least three chains are bound in an organic molecule.
【0023】即ち、本発明の結着樹脂は、上記マクロモ
ノマー(M1 )と上記一般式(I)に相当するモノマー
とを含有する共重合体の片末端に特定の極性基を結合し
て成る樹脂〔A1 〕及び/又は特定の極性基含有成分を
含有する上記マクロモノマー(M2 )と上記一般式
(I)に相当するモノマーとを含有する共重合体である
樹脂〔A2 〕(以下、マクロモノマー(M1 )及び(M
2 )をマクロモノマー(M)と総称し、樹脂〔A1 〕及
び〔A2 〕を樹脂〔A〕と総称することもある)と上記
一般式(I)で示される重合体成分を含有するAブロッ
クと上記特定の極性基含有成分を含有するBブロックと
のAB型ブロック高分子鎖が有機分子中に少なくとも3
個結合して成るスタ−型共重合体(樹脂〔B〕)とから
少なくとも構成される。That is, the binder resin of the present invention has a specific polar group bonded to one end of a copolymer containing the macromonomer (M 1 ) and the monomer corresponding to the general formula (I). Resin [A 1 ] and / or resin [A 2 ] which is a copolymer containing the macromonomer (M 2 ) containing a specific polar group-containing component and the monomer corresponding to the general formula (I). (Hereinafter, macromonomer (M 1 ) and (M
2 ) is collectively referred to as macromonomer (M), and resins [A 1 ] and [A 2 ] may be collectively referred to as resin [A]) and a polymer component represented by the above general formula (I). An AB type block polymer chain of the A block and the B block containing the specific polar group-containing component has at least 3 in the organic molecule.
It is composed of at least a star-type copolymer (resin [B]) formed by bonding the individual pieces.
【0024】種々検討の結果、前述の如く、公知の低分
子量の極性基含有樹脂を中〜高分子量の樹脂と併用する
技術においては、併用する中〜高分子量の樹脂により、
上記低分子量の樹脂で高性能化された静電特性が低下し
てしまうことのあることが判った。そして、これらの中
〜高分子量樹脂が、該光導電層中で、光導電体、分光増
感色素及び低分子量の樹脂同志の相互作用に更に適切に
相互作用させることも、予想以上に重要な原因であるこ
とが明らかになってきた。As a result of various studies, as described above, in the technique of using a known low molecular weight polar group-containing resin in combination with a medium to high molecular weight resin, depending on the medium to high molecular weight resin used in combination,
It has been found that the low-molecular weight resin described above may deteriorate the electrostatic characteristics of which performance has been improved. It is also more important than expected that these medium to high molecular weight resins interact more appropriately with the photoconductor, the spectral sensitizing dye and the low molecular weight resin in the photoconductive layer. It has become clear that it is the cause.
【0025】かかる検討を重ねた結果、極性基を含有す
る低分子量の樹脂〔A〕と併用すべき中〜高分子量の樹
脂として、本発明に従う極性基非含有のブロックAと極
性基含有のブロックBとを有するAB型ブロックで構成
される高分子鎖を少なくとも3個有機分子鎖中に有する
スタ−型共重合体を用いることにより、前記課題が有効
に解決されることが見出されたものである。As a result of repeated studies, a polar group-free block A and a polar group-containing block according to the present invention are used as a medium to high molecular weight resin to be used in combination with a low molecular weight resin [A] containing a polar group. It has been found that the above problems can be effectively solved by using a star-type copolymer having at least three polymer chains composed of an AB-type block having B in an organic molecular chain. Is.
【0026】この事は、本発明の結着樹脂〔A〕及び
〔B〕の相乗効果により、光導電体粒子が充分に分散さ
れ且つ凝縮しない状態で存在し、更に分光増感色素が光
導電体粒子表面に充分に吸着されていること及び光導電
体表面の余分な活性サイトを結着樹脂が充分に吸着して
トラップを補償していること等によるものと推定され
る。This is due to the synergistic effect of the binder resins [A] and [B] of the present invention, in which the photoconductor particles are present in a state in which they are sufficiently dispersed and not condensed, and the spectral sensitizing dye is photoconductive. It is presumed that this is due to the fact that it is sufficiently adsorbed on the surface of the body particles and that the binder resin sufficiently adsorbs the extra active sites on the surface of the photoconductor to compensate the traps.
【0027】即ち、特定の極性基を含有する低分子量の
グラフト型共重合体の樹脂〔A〕は、光導電体粒子に充
分吸着して該粒子を均一に分散し、その高分子鎖が非常
に短いことにより凝集を抑制すること、又、分光増感色
素の吸着疎外を起こさないこと等の重要な作用を有す
る。That is, the low molecular weight graft type copolymer resin [A] containing a specific polar group is sufficiently adsorbed on the photoconductor particles to uniformly disperse the particles, and the polymer chain is The extremely short length has an important effect of suppressing aggregation and preventing adsorption of the spectral sensitizing dye.
【0028】又、特定の極性基含有のBブロックと該極
性基非含有のAブロックとのABブロックで構成される
高分子鎖を含むスタ−型共重合体を用いることで、光導
電層の機械的強度が充分に保持された。これは、この樹
脂のブロックBの部分が光導電体粒子と樹脂〔A〕より
も弱い相互作用であること及びブロックAの部分同志の
高分子鎖間の絡み合い効果等によるものと考えられる。Further, by using a star-type copolymer containing a polymer chain composed of an AB block of a B block containing a specific polar group and an A block not containing the polar group, The mechanical strength was sufficiently retained. It is considered that this is because the block B portion of the resin has a weaker interaction than the photoconductor particles and the resin [A], and the entanglement effect between the polymer chains of the block A portions.
【0029】更には、公知の併用された中〜高分子量の
樹脂に比べて静電特性がより良化する効果を有すること
は光導電体粒子と相互作用をもつブロックB部分が極性
を有することから分光増感色素の吸着疎外を抑制する働
きをしているものと考えられる。Further, it has the effect of improving the electrostatic characteristics as compared with the known medium-to-high molecular weight resin used in combination, that the block B portion which interacts with the photoconductor particles has polarity. Therefore, it is considered that it has a function of suppressing the adsorption of the spectral sensitizing dye.
【0030】この作用は、近赤外〜赤外光の分光増感用
色素として特に有効なポリメチン色素あるいはフタロシ
アニン系顔料で特に顕著な効果を示した。一方、光導電
体として光導電性酸化亜鉛を用いた本発明の電子写真感
光体を従来公知のダイレクト刷版として用いた場合には
優れた撮像性とともに著しく良好な保水性を示す。This effect was particularly remarkable with polymethine dyes or phthalocyanine pigments which are particularly effective as dyes for spectral sensitization from near infrared to infrared light. On the other hand, when the electrophotographic photoreceptor of the present invention using photoconductive zinc oxide as the photoconductor is used as a conventionally known direct printing plate, it exhibits excellent image pick-up property and remarkably good water retention.
【0031】即ち、電子写真感プロセスを経て複写画像
を形成した本発明の感光体を、従来公知の不感脂化処理
液により非画像部を化学処理により不感脂化して、印刷
用原版とし、これをオフセット印刷により印刷した時に
優れた印刷用原版としての性能を示すものである。That is, the photoconductor of the present invention, on which a copied image is formed through an electrophotographic process, is desensitized by chemically treating the non-image area with a conventionally known desensitizing solution to obtain a printing original plate. Shows excellent performance as an original plate for printing when printed by offset printing.
【0032】本発明の感光体を不感脂化処理すると、非
画像部の親水化が充分になされ、保水性が向上すること
から印刷枚数が飛躍的に向上した。これは、上記した酸
化亜鉛粒子が均一に分散されていること及び酸化亜鉛粒
子表面に存在する結着樹脂の存在状態が適切で不感脂化
処理液との不感脂化反応が疎外されず迅速に且つ効果的
に進行することによるものと考えられる。When the photosensitizer of the present invention is desensitized, the non-image area is sufficiently hydrophilized and the water retention is improved, so that the number of printed sheets is dramatically improved. This is because the zinc oxide particles are uniformly dispersed and the presence state of the binder resin present on the surface of the zinc oxide particles is appropriate and the desensitizing reaction with the desensitizing treatment liquid is not alienated rapidly. It is considered that this is due to effective progress.
【0033】更には本発明では、低分子量の樹脂〔A〕
において、マクロモノマ−中に含有される一般式(I)
及び/又はマクロモノマ−と共重合する一般式(I)と
して、下記一般式(Ia)及び一般式(Ib)で示され
る、2位に、及び/又は2位と6位に、特定の置換基を
有するベンゼン環又は無置換のナフタレン環を含有す
る、特定の置換基をもつメタクリレート成分を含有する
樹脂(以降この低分子量体をとくに樹脂〔AA〕と称す
る)であることが好ましい。Furthermore, in the present invention, a low molecular weight resin [A] is used.
In the general formula (I) contained in the macromonomer,
And / or as a general formula (I) copolymerized with a macromonomer, a specific substituent at the 2-position and / or at the 2-position and 6-position represented by the following general formula (Ia) and general formula (Ib). A resin containing a methacrylate component having a specific substituent and containing a benzene ring or an unsubstituted naphthalene ring having a (hereinafter, this low molecular weight compound is particularly referred to as a resin [AA]) is preferable.
【0034】[0034]
【化7】 [Chemical 7]
【0035】[0035]
【化8】 [Chemical 8]
【0036】〔式(Ia)及び(Ib)中、R7 及びR
8 は互いに独立に、それぞれ水素原子、炭素数1〜10
の炭化水素基、塩素原子、臭素原子、−COR11又は−
COOR11(ここでR11は炭素数1〜10の炭化水素基
を示す)を表す。[In the formulas (Ia) and (Ib), R 7 and R
8 are each independently a hydrogen atom and a carbon number of 1-10.
Hydrocarbon group, chlorine atom, bromine atom, -COR 11 or-
COOR 11 (wherein R 11 represents a hydrocarbon group having 1 to 10 carbon atoms) is represented.
【0037】R9 及びR10はそれぞれ−COO−とベン
ゼン環を結合する、単結合又は連結原子数1〜4個の連
結基を表わす。〕 上記特定の樹脂〔AA〕を用いると樹脂〔A〕の場合よ
りもより一層電子写真特性(特にV10、D.R.R、E
1/10)の向上が達成できる。R 9 and R 10 each represent a single bond or a linking group having 1 to 4 linking atoms, which bonds --COO-- and the benzene ring. ] When the above-mentioned specific resin [AA] is used, the electrophotographic characteristics (particularly V 10 , DRR, E) are further improved as compared with the case of the resin [A].
1/10 ) improvement can be achieved.
【0038】この事の理由は不明であるが、1つの理由
として、メタクリレートのエステル成分である、オルト
位に置換基を有する平面性のベンゼン環又はナフタレン
環の効果により、膜中の酸化亜鉛界面でのこれらポリマ
ー分子鎖の配列が適切に行なわれることによるものと考
えられる。The reason for this is unknown, but one reason is that the effect of the planar benzene ring or naphthalene ring having a substituent at the ortho position, which is the ester component of methacrylate, causes the zinc oxide interface in the film. It is thought that this is due to the proper arrangement of these polymer molecular chains in.
【0039】以下に、本発明の結着樹脂について詳しく
説明する。まず、本発明の樹脂〔A〕について説明す
る。樹脂〔A〕は、一般式(I)で示される重合体成分
に相当する単量体と一官能性マクロモノマー(M)とを
少なくとも含有するグラフト型共重合体であり、更に特
定の極性基を該重合体の主鎖の片末端(樹脂〔A1 〕)
あるいはグラフト部分中(樹脂〔A2 〕)に各々含有す
ることを特徴とする重量平均分子量1×103 〜2×1
04 の低分子量の樹脂である。The binder resin of the present invention will be described in detail below. First, the resin [A] of the present invention will be described. The resin [A] is a graft copolymer containing at least a monomer corresponding to the polymer component represented by the general formula (I) and a monofunctional macromonomer (M), and further has a specific polar group. At one end of the main chain of the polymer (resin [A 1 ])
Alternatively, each of them is contained in the graft portion (resin [A 2 ]), and has a weight average molecular weight of 1 × 10 3 to 2 × 1.
It is a low molecular weight resin of 0 4 .
【0040】樹脂〔A〕の分子量が1×103 より小さ
くなると、皮膜形成能が低下し充分な膜強度を保てず、
一方分子量が2×104 より大きくなると本発明の樹脂
であっても、特に近赤外〜赤外分光増感色素を用いた感
光体において、高温・高湿、低温・低湿の苛酷な条件下
での暗減衰保持率及び光感度の変動が多少大きくなり、
安定した複写画像が得られるという本発明の効果が薄れ
てしまう。When the molecular weight of the resin [A] is less than 1 × 10 3 , the film forming ability is deteriorated and sufficient film strength cannot be maintained.
On the other hand, when the molecular weight is more than 2 × 10 4 , even in the case of the resin of the present invention, particularly in a photoreceptor using a near infrared to infrared spectral sensitizing dye, high temperature / high humidity, low temperature / low humidity under severe conditions. Fluctuations in dark decay retention rate and light sensitivity at
The effect of the present invention that a stable copy image is obtained is diminished.
【0041】樹脂〔A〕のガラス転移点は好ましくは−
30℃〜110℃、より好ましくは−20℃〜90℃で
ある。樹脂〔A〕における一般式(I)の繰り返し単位
に相当する重合体成分の存在割合は樹脂〔A〕中30重
量%以上、好ましくは50重量%以上であり、極性基を
含有する成分の総量は、樹脂〔A〕中0.5〜15重量
%、好ましくは1〜10重量%である。The glass transition point of the resin [A] is preferably −
It is 30 ° C to 110 ° C, and more preferably -20 ° C to 90 ° C. The proportion of the polymer component corresponding to the repeating unit of the general formula (I) in the resin [A] is 30% by weight or more, preferably 50% by weight or more in the resin [A], and the total amount of the components containing a polar group. Is 0.5 to 15% by weight, preferably 1 to 10% by weight in the resin [A].
【0042】樹脂〔A〕における極性基含有量が0.5
重量%より少ないと、初期電位が低くて充分な画像濃度
を得ることができない。一方、該極性基含有量が15重
量%よりも多いと、いかに低分子量体といえども分散性
が低下し、更にオフセットマスターとして用いるときに
地汚れが増大する。The content of polar groups in the resin [A] is 0.5
If it is less than wt%, the initial potential is low and a sufficient image density cannot be obtained. On the other hand, when the content of the polar group is more than 15% by weight, dispersibility of the low molecular weight compound decreases, and scumming increases when used as an offset master.
【0043】樹脂〔A〕におけるマクロモノマー(M)
の含有量は、樹脂〔A〕中1〜70重量%、好ましくは
5〜50重量%である。マクロモノマー(M)に相当す
る共重合成分が1重量%未満では、グラフト型共重合体
の特徴が失われ、静電特性(特に暗中電荷保持率、感
度)の低下が生じ、またオフセット印刷用原版として用
いたときに保水性も低下する。該含有量が70重量%を
超えると、グラフト型共重合体の共重合性が充分に進行
しにくくなり、その結果として上記のような静電特性及
び保水性の低下が生じる。Macromonomer (M) in resin [A]
Is 1 to 70% by weight, preferably 5 to 50% by weight in the resin [A]. When the amount of the copolymerization component corresponding to the macromonomer (M) is less than 1% by weight, the characteristics of the graft type copolymer are lost and the electrostatic properties (particularly the charge retention ratio in the dark and the sensitivity) are deteriorated, and the offset printing is performed. When used as an original plate, water retention is also reduced. If the content exceeds 70% by weight, the copolymerizability of the graft-type copolymer will not sufficiently proceed, and as a result, the above-mentioned electrostatic properties and water retention will be deteriorated.
【0044】次に樹脂〔A〕の共重合体中に30重量%
以上含有される、前記一般式(I)で示される繰り返し
単位を更に説明する。a1 及びa2 は各々水素原子、ハ
ロゲン原子(例えば塩素原子、臭素原子)、シアノ基又
は炭素数1〜4のアルキル基(例えばメチル基、エチル
基、プロピル基、ブチル基等)等を表す。Next, 30% by weight in the copolymer of resin [A]
The repeating unit represented by the general formula (I) contained above will be further described. a 1 and a 2 each represent a hydrogen atom, a halogen atom (eg, chlorine atom, bromine atom), a cyano group, or an alkyl group having 1 to 4 carbon atoms (eg, methyl group, ethyl group, propyl group, butyl group, etc.) and the like. ..
【0045】R3 は炭化水素基を表し、具体的にはアル
キル基、アラルキル基又は芳香族基を表し、好ましくは
ベンゼン環又はナフタレン環を含有する炭化水素基であ
るアラルキル基又は芳香族基である。R 3 represents a hydrocarbon group, specifically an alkyl group, an aralkyl group or an aromatic group, preferably an aralkyl group or an aromatic group which is a hydrocarbon group containing a benzene ring or a naphthalene ring. is there.
【0046】更に、R3 は好ましくは炭素数1〜18の
置換されていてもよい炭化水素基を表わす。置換基とし
ては樹脂〔A〕における上記該極性基含有の重合体成分
に含有される前記極性基以外の置換基であればいずれで
もよく、例えば、ハロゲン原子(例えばフッ素原子、塩
素原子、臭素原子等)、−OR12、−COOR12、−O
COR12(R12は炭素数1〜22のアルキル基を表わ
し、例えばメチル基、エチル基、プロピル基、ブチル
基、ヘキシル基、オクチル基、デシル基、ドデシル基、
ヘキサデシル基、オクタデシル基等である)等の置換基
が挙げられる。好ましい炭化水素基としては、炭素数1
〜18の置換されてもよいアルキル基(例えば、メチル
基、エチル基、プロピル基、ブチル基、ヘプチル基、ヘ
キシル基、オクチル基、デシル基、ドデシル基、ヘキサ
デシル基、オクタデシル基、2−クロロエチル基、2−
ブロモエチル基、2−シアノエチル基、2−メトキシカ
ルボニルエチル基、2−メトキシエチル基、3−ブロモ
プロピル基等)、炭素数4〜18の置換されてもよいア
ルケニル基(例えば、2−メチル−1−プロペニル基、
2−ブテニル基、2−ぺンテニル基、3−メチル−2−
ぺンテニル基、1−ぺンテニル基、1−ヘキセニル基、
2−ヘキセニル基、4−メチル−2−ヘキセニル基
等)、炭素数7〜12の置換されてもよいアラルキル基
(例えば、ベンジル基、フェネチル基、3−フェニルプ
ロピル基、ナフチルメチル基、2−ナフチルエチル基、
クロロベンジル基、ブロモベンジル基、メチルベンジル
基、エチルベンジル基、メトキシベンジル基、ジメチル
ベンジル基、ジメトキシベンジル基等)、炭素数5〜8
の置換されてもよい脂環式基(例えば、シクロヘキシル
基、2−シクロヘキシルエチル基、2−シクロぺンチル
エチル基等)又は炭素数6〜12の置換されてもよい芳
香族基(例えば、フェニル基、ナフチル基、トリル基、
キシリル基、プロピルフェニル基、ブチルフェニル基、
オクチルフェニル基、ドデシルフェニル基、メトキシフ
ェニル基、エトキシフェニル基、ブトキシフェニル基、
デシルオキシフェニル基、クロロフェニル基、ジクロロ
フェニル基、ブロモフェニル基、シアノフェニル基、ア
セチルフェニル基、メトキシカルボニルフェニル基、エ
トキシカルボニルフェニル基、ブトキシカルボニルフェ
ニル基、アセトアミドフェニル基、プロピオアミドフェ
ニル基、ドデシロイルアミドフェニル基等)等があげら
れる。Further, R 3 preferably represents an optionally substituted hydrocarbon group having 1 to 18 carbon atoms. The substituent may be any substituent other than the polar group contained in the polar group-containing polymer component in the resin [A], and examples thereof include a halogen atom (eg, fluorine atom, chlorine atom, bromine atom). Etc.), -OR 12 , -COOR 12 , -O.
COR 12 (R 12 represents an alkyl group having 1 to 22 carbon atoms, for example, methyl group, ethyl group, propyl group, butyl group, hexyl group, octyl group, decyl group, dodecyl group,
Hexadecyl group, octadecyl group, etc.) and the like. The preferred hydrocarbon group has 1 carbon atom.
To 18 optionally substituted alkyl groups (eg, methyl group, ethyl group, propyl group, butyl group, heptyl group, hexyl group, octyl group, decyl group, dodecyl group, hexadecyl group, octadecyl group, 2-chloroethyl group) , 2-
A bromoethyl group, a 2-cyanoethyl group, a 2-methoxycarbonylethyl group, a 2-methoxyethyl group, a 3-bromopropyl group, and the like, an alkenyl group having 4 to 18 carbon atoms which may be substituted (for example, 2-methyl-1 A propenyl group,
2-butenyl group, 2-pentenyl group, 3-methyl-2-
Pentenyl group, 1-pentenyl group, 1-hexenyl group,
2-hexenyl group, 4-methyl-2-hexenyl group, etc.), aralkyl group having 7 to 12 carbon atoms and optionally substituted (for example, benzyl group, phenethyl group, 3-phenylpropyl group, naphthylmethyl group, 2- Naphthylethyl group,
Chlorobenzyl group, bromobenzyl group, methylbenzyl group, ethylbenzyl group, methoxybenzyl group, dimethylbenzyl group, dimethoxybenzyl group, etc.), carbon number 5-8
An optionally substituted alicyclic group (for example, a cyclohexyl group, a 2-cyclohexylethyl group, a 2-cyclopentylethyl group, etc.) or an optionally substituted aromatic group having 6 to 12 carbon atoms (for example, a phenyl group). , Naphthyl group, tolyl group,
Xylyl group, propylphenyl group, butylphenyl group,
Octylphenyl group, dodecylphenyl group, methoxyphenyl group, ethoxyphenyl group, butoxyphenyl group,
Decyloxyphenyl group, chlorophenyl group, dichlorophenyl group, bromophenyl group, cyanophenyl group, acetylphenyl group, methoxycarbonylphenyl group, ethoxycarbonylphenyl group, butoxycarbonylphenyl group, acetamidophenyl group, propioamidophenyl group, dodecyl Roylamidophenyl group, etc.) and the like.
【0047】R3 の示す炭化水素基において、R3 が脂
肪族基の場合には好ましくは炭素数1〜5の炭化水素基
を式(I)で表わされる成分中の60重量%以上含有す
ることが好ましい。[0047] In the hydrocarbon group represented by R 3, preferably when R 3 is an aliphatic group containing more than 60 wt% in component represented a hydrocarbon group having 1 to 5 carbon atoms in formula (I) Preferably.
【0048】このような置換基R3 を有する成分である
一般式(I)の繰り返し単位において、より好ましくは
前記一般式(Ia)及び/又は一般式(Ib)で示され
る繰り返し単位の重合体成分が挙げられる。In the repeating unit of the general formula (I) which is a component having such a substituent R 3 , a polymer of the repeating unit represented by the general formula (Ia) and / or the general formula (Ib) is more preferable. Ingredients are included.
【0049】式(Ia)において、好ましいR7 及びR
8 として、互いに独立に各々水素原子、塩素原子及び臭
素原子の外に、炭素数1〜10の炭化水素基として、好
ましくは炭素数1〜4のアルキル基(例えばメチル基、
エチル基、プロピル基、ブチル基、炭素数7〜9のアラ
ルキル基(例えばベンジル基、フェネチル基、3−フェ
ニルプロピル基、クロロベンジル基、ジクロロベンジル
基、ブロモベンジル基、メチルベンジル基、メトキシベ
ンジル基、クロロメチルベンジル基)及びアリール基
(例えばフェニル基、トリル基、キシリル基、ブロモフ
ェニル基、メトキシフェニル基、クロロフェニル基、ジ
クロロフェニル基)、並びに−COR11及び−COOR
11(好ましいR11としては上記の炭素数1〜10の好ま
しい炭化水素基として記載したものを挙げることができ
る)を挙げることができる。In formula (Ia), preferred R 7 and R
As 8 are each a hydrogen atom independently of one another, out of the chlorine atom and a bromine atom, a hydrocarbon group having 1 to 10 carbon atoms, preferably an alkyl group (e.g. methyl group having 1 to 4 carbon atoms,
Ethyl group, propyl group, butyl group, aralkyl group having 7 to 9 carbon atoms (for example, benzyl group, phenethyl group, 3-phenylpropyl group, chlorobenzyl group, dichlorobenzyl group, bromobenzyl group, methylbenzyl group, methoxybenzyl group) , Chloromethylbenzyl group) and aryl groups (for example, phenyl group, tolyl group, xylyl group, bromophenyl group, methoxyphenyl group, chlorophenyl group, dichlorophenyl group), and -COR 11 and -COOR.
11 (preferable R 11 includes those described as the above-mentioned preferable hydrocarbon group having 1 to 10 carbon atoms).
【0050】式(Ia)及び(Ib)において、R9 及
びR10は各々−COO−とベンゼン環を結合する単結合
又は−(CH2 )a −(aは1〜3の整数を表す)、−
CH2 OCO−、−CH2 CH2 OCO−、−(C
H2 )b −(bは1又は2の整数を表す)、−CH2 C
H2 O−等の如き連結原子数1〜4個の連結基であり、
より好ましくは単結合又は結合原子数1〜2個の連結基
を挙げることができる。In the formulas (Ia) and (Ib), R 9 and R 10 are each a single bond connecting —COO— and the benzene ring or — (CH 2 ) a — (a represents an integer of 1 to 3). ,-
CH 2 OCO -, - CH 2 CH 2 OCO -, - (C
H 2) b - (b represents an integer of 1 or 2), - CH 2 C
A connecting group having 1 to 4 connecting atoms such as H 2 O-,
More preferably, a single bond or a linking group having 1 to 2 bonding atoms can be mentioned.
【0051】本発明の樹脂〔A〕で用いられる式(I
a)又は(Ib)で示される繰り返し単位の具体例を以
下に挙げる。しかし、本発明の範囲はこれに限定される
ものではない。また、以下の(a−1)〜(a−20)
において、cは1〜4の整数、dは0又は1〜3の整
数、eは1〜3の整数、R13はいずれも−CcH2c+1又
は−(CH2 )d −C6 H5 (ただし、c、dは上記と
同じ)を表し、R14及びR15は同じでも異なってもよ
く、水素原子、−Cl、−Br、−Iのいずれかを表
す。The formula (I) used in the resin [A] of the present invention is
Specific examples of the repeating unit represented by a) or (Ib) are shown below. However, the scope of the present invention is not limited to this. In addition, the following (a-1) to (a-20)
In, c is an integer of 1 to 4, d is 0 or an integer of 1 to 3, e is an integer of 1-3, R 13 are both -CCH 2c + 1 or - (CH 2) d -C 6 H 5 (However, c and d are the same as the above), R 14 and R 15 may be the same or different and each represents a hydrogen atom, —Cl, —Br, or —I.
【0052】[0052]
【化9】 [Chemical 9]
【0053】[0053]
【化10】 [Chemical 10]
【0054】[0054]
【化11】 [Chemical 11]
【0055】[0055]
【化12】 [Chemical formula 12]
【0056】[0056]
【化13】 [Chemical 13]
【0057】次に低分子量の樹脂〔A〕が含有する極性
基について説明する。該極性基は、−PO3 H2 、−S
O3 H、−COOH、−P(=O)(OH)R1 −及び
環状酸無水物含有基から少なくとも1種選ばれるもので
あることが好ましい。Next, the polar group contained in the low molecular weight resin [A] will be described. Polar group, -PO 3 H 2, -S
At least one selected from O 3 H, —COOH, —P (═O) (OH) R 1 — and cyclic acid anhydride-containing groups is preferred.
【0058】ここで、−P(=O)(OH)R1 は、下
記化14で表わされる基を示し、ここにおいて該R1 は
炭化水素基又は−OR2 基(R2 は炭化水素基を表す)
を表し、具体的にはR1 は炭素数1〜6の置換されてい
てもよい炭化水素基(例えばメチル基、エチル基、プロ
ピル基、ブチル基、2−クロロエチル基、2−ブロムエ
チル基、2−フロロエチル基、3−クロロプロピル基、
3−メトキシプロピル基、2−メトキシブチル基、ベン
ジル基、フェニル基、プロペニル基、メトキシメチル
基、エトキシメチル基、2−エトキシエチル基)等であ
り、R2 はR1 と同一の内容を表す。Here, -P (= O) (OH) R 1 represents a group represented by the following chemical formula 14, wherein R 1 is a hydrocarbon group or a -OR 2 group (R 2 is a hydrocarbon group. Represents)
Specifically, R 1 is a hydrocarbon group having 1 to 6 carbon atoms which may be substituted (for example, methyl group, ethyl group, propyl group, butyl group, 2-chloroethyl group, 2-bromoethyl group, 2 -Fluoroethyl group, 3-chloropropyl group,
3-methoxypropyl group, 2-methoxybutyl group, benzyl group, phenyl group, propenyl group, methoxymethyl group, ethoxymethyl group, 2-ethoxyethyl group) and the like, and R 2 represents the same content as R 1. ..
【0059】[0059]
【化14】 [Chemical 14]
【0060】また、環状酸無水物含有基とは、少なくと
も1つの環状酸無水物を含有する基であり、含有される
環状酸無水物としては、脂肪族ジカルボン酸無水物、芳
香族ジカルボン酸無水物が挙げられる。The cyclic acid anhydride-containing group is a group containing at least one cyclic acid anhydride, and examples of the cyclic acid anhydride to be contained include aliphatic dicarboxylic acid anhydride and aromatic dicarboxylic acid anhydride. Things can be mentioned.
【0061】脂肪族ジカルボン酸無水物の例としては、
コハク酸無水物、、グルタコン酸無水物環、マレイン酸
無水物環、シクロぺンタン−1,2−ジカルボン酸無水
物環、シクロヘキサン−1,2−ジカルボン酸無水物
環、シクロヘキセン−1,2−ジカルボン酸無水物環、
2,3−ビシクロ〔2.2.2〕オクタジカルボン酸無
水物環等が挙げられ、これらの環は、例えば塩素原子、
臭素原子等のハロゲン原子、メチル基、エチル基、ブチ
ル基、ヘキシル基等のアルキル基等が置換されていても
よい。Examples of the aliphatic dicarboxylic acid anhydride include:
Succinic anhydride, glutaconic anhydride ring, maleic anhydride ring, cyclopentane-1,2-dicarboxylic acid anhydride ring, cyclohexane-1,2-dicarboxylic acid anhydride ring, cyclohexene-1,2- Dicarboxylic acid anhydride ring,
2,3-bicyclo [2.2.2] octadicarboxylic acid anhydride ring and the like can be mentioned, and these rings are, for example, chlorine atom,
A halogen atom such as a bromine atom, an alkyl group such as a methyl group, an ethyl group, a butyl group and a hexyl group may be substituted.
【0062】また、芳香族ジカルボン酸無水物の例とし
ては、フタル酸無水物環、ナフタレン−ジカルボン酸無
水物環、ピリジン−ジカルボン酸無水物環、チオフェン
−ジカルボン酸無水物環等が挙げられ、これらの環は、
例えば塩素原子、臭素原子等のハロゲン原子、メチル
基、エチル基、プロピル基、ブチル基等のアルキル基、
ヒドロキシル基、シアノ基、ニトロ基、アルコキシカル
ボニル基(アルコキシ基としては、例えばメトキシ基、
エトキシ基等)等が置換されていてもよい。Examples of aromatic dicarboxylic acid anhydrides include phthalic anhydride ring, naphthalene-dicarboxylic acid anhydride ring, pyridine-dicarboxylic acid anhydride ring, thiophene-dicarboxylic acid anhydride ring, and the like. These rings are
For example, chlorine atom, halogen atom such as bromine atom, alkyl group such as methyl group, ethyl group, propyl group and butyl group,
Hydroxyl group, cyano group, nitro group, alkoxycarbonyl group (as the alkoxy group, for example, methoxy group,
Ethoxy group etc.) may be substituted.
【0063】樹脂〔A1 〕の場合には、該極性基は重合
体主鎖の末端に結合されて含有される。該極性基の含有
量は、特に限定的ではないが、0.5〜15重量%であ
ることが好ましい。該極性基は重合体主鎖の末端に直接
結合してもよいし、連結基を介して結合してもよい。か
かる連結基としては、いずれの結合する基でもよいが、
例えば具体的に挙げるとすれば、−CR16R17−〔ここ
でR16、R17は同じでも異なっていてもよく、各々水素
原子、ハロゲン原子(塩素原子、臭素原子等)、OH
基、シアノ基、アルキル基(メチル基、エチル基、2−
クロロエチル基、2−ヒドロキシエチル基、プロピル
基、ブチル基、ヘキシル基等)、アラルキル基(ベンジ
ル基、フェネチル基等)、フェニル基等を表す〕、−
(CHR16−CHR17)−、−C6 H10−、−C6 H4
−、−O−、−S−、−NR18−〔ここでR18は水素原
子又は炭化水素基{炭化水素基として具体的には炭素数
1〜12の炭化水素基(例えばメチル基、エチル基、プ
ロピル基、ブチル基、ヘキシル基、オクチル基、デシル
基、ドデシル基、2−メトキシエチル基、2−クロロエ
チル基、2−シアノエチル基、ベンジル基、メチルベン
ジル基、フェネチル基、フェニル基、トリル基、クロロ
フェニル基、メトキシフェニル基、ブチルフェニル基
等)が挙げられる}を表す〕、−CO−、−COO−、
−OCO−、−CONR18−、−SO2 NR18−、−S
O2 −、−NHCONH−、−NHCOO−、−NHS
O2−、−CONHCOO−、−CONHCONH−、
複素環(ヘテロ原子としてO、S、N等を少なくとも一
種含有する5もしくは6員環又はこれらの縮合環であれ
ばいずれでもよく、例えばチオフェン環、ピリジン環、
フラン環、イミダゾール環、ピペリジン環、モルホリン
環等が挙げられる)又は−Si R 19R20 ここでR19、
R20は同じでも異なっていてもよく、各々炭化水素基又
は−OR21(ここでR21は炭化水素基を表す)を表す。
これらの炭化水素基としては、R18で挙げたものと同様
のものを挙げることができる〕等の結合基の単独又はこ
れらの2以上の組合せにより構成された連結基等が挙げ
られる。Resin [A1], The polar group is polymerized.
It is bound to the end of the main chain and contained. Inclusion of the polar group
The amount is not particularly limited, but is 0.5 to 15% by weight.
Preferably. The polar group is directly attached to the end of the polymer main chain.
It may be bonded or may be bonded via a linking group. Or
The linking group may be any bonding group,
For example, -CR16R17-[Here
And R16, R17May be the same or different, each hydrogen
Atom, halogen atom (chlorine atom, bromine atom, etc.), OH
Group, cyano group, alkyl group (methyl group, ethyl group, 2-
Chloroethyl group, 2-hydroxyethyl group, propyl
Group, butyl group, hexyl group, etc.), aralkyl group (benzyl
Group, phenethyl group, etc.), phenyl group, etc.], −
(CHR16-CHR17)-, -C6HTen-, -C6HFour
-, -O-, -S-, -NR18-[Here R18Is hydrogen
Child or hydrocarbon group (specifically, carbon number as hydrocarbon group
1-12 hydrocarbon groups (eg methyl, ethyl,
Ropyl group, butyl group, hexyl group, octyl group, decyl group
Group, dodecyl group, 2-methoxyethyl group, 2-chloroethyl group
Cyl group, 2-cyanoethyl group, benzyl group, methylben
Zyl group, phenethyl group, phenyl group, tolyl group, chloro
Phenyl group, methoxyphenyl group, butylphenyl group
And the like)}, -CO-, -COO-,
-OCO-, -CONR18-, -SO2NR18-, -S
O2-, -NHCONH-, -NHCOO-, -NHS
O2-, -CONHCOO-, -CONHCONH-,
Heterocycle (at least one of O, S, N, etc. as a hetero atom)
Seed-containing 5- or 6-membered ring or condensed ring thereof
It may be any, for example, thiophene ring, pyridine ring,
Furan ring, imidazole ring, piperidine ring, morpholine
Ring and the like) or -SiR 19R20 Where R19,
R20May be the same or different and each is a hydrocarbon group or
Is -ORtwenty one(Where Rtwenty oneRepresents a hydrocarbon group).
These hydrocarbon groups include R18Similar to those listed in
Or a bonding group such as
Examples include linking groups composed of a combination of two or more of these.
Be done.
【0064】一方、樹脂〔A2 〕の場合には、上記極性
基は一官能性マクロモノマー(M2 )中における重合体
成分中に含有される。樹脂〔A2 〕における極性基を含
有する共重合成分は、例えば一般式(I)〔一般式(I
a)、(Ib)も含む〕で示される繰り返し単位に相当
する単量体と共重合し得る該極性基を含有するビニル系
化合物であればいずれでもよく、例えば、高分子学会編
「高分子データ・ハンドブック〔基礎編〕」培風館(1
986年刊)等に記載されている。具体的には、アクリ
ル酸、α及び/又はβ置換アクリル酸(例えばα−アセ
トキシ体、α−アセトキシメチル体、α−(2−アミ
ノ)メチル体、α−クロロ体、α−ブロモ体、α−フロ
ロ体、α−トリブチルシリル体、α−シアノ体、β−ク
ロロ体、β−ブロモ体、α−クロロ−β−メトキシ体、
α,β−ジクロロ体等)、メタクリル酸、イタコン酸、
イタコン酸半エステル類、イタコン酸半アミド類、クロ
トン酸、2−アルケニルカルボン酸類(例えば2−ペン
テン酸、2−メチル−2−ヘキセン酸、2−オクテン
酸、4−メチル−2−ヘキセン酸、4−エチル−2−オ
クテン酸等)、マレイン酸、マレイン酸半エステル類、
マレイン酸半アミド類、ビニルベンゼンカルボン酸、ビ
ニルベンゼンスルホン酸、ビニルスルホン酸、ビニルホ
スホン酸、ジカルボン酸類のビニル基又はアリル基の半
エステル誘導体及びこれらのカルボン又はスルホン酸の
エステル誘導体、アミド誘導体の置換基中に該極性基を
含有する化合物等が挙げられる。On the other hand, in the case of the resin [A 2 ], the polar group is contained in the polymer component in the monofunctional macromonomer (M 2 ). The copolymerizable component containing a polar group in the resin [A 2 ] is, for example, represented by the general formula (I) [the general formula (I
a) and (Ib)], any vinyl-based compound containing the polar group that can be copolymerized with the monomer corresponding to the repeating unit represented by the formula: Data Handbook [Basic] "Baifukan (1
986) and the like. Specifically, acrylic acid, α- and / or β-substituted acrylic acid (for example, α-acetoxy form, α-acetoxymethyl form, α- (2-amino) methyl form, α-chloro form, α-bromo form, α -Fluoro form, α-tributylsilyl form, α-cyano form, β-chloro form, β-bromo form, α-chloro-β-methoxy form,
α, β-dichloro form, etc.), methacrylic acid, itaconic acid,
Itaconic acid half-esters, itaconic acid half-amides, crotonic acid, 2-alkenylcarboxylic acids (for example, 2-pentenoic acid, 2-methyl-2-hexenoic acid, 2-octenoic acid, 4-methyl-2-hexenoic acid, 4-ethyl-2-octenoic acid, etc.), maleic acid, maleic acid half-esters,
Maleic acid half amides, vinylbenzenecarboxylic acid, vinylbenzenesulfonic acid, vinylsulfonic acid, vinylphosphonic acid, half-ester derivatives of vinyl group or allyl group of dicarboxylic acids and ester derivatives and amide derivatives of these carboxylic or sulfonic acids Examples thereof include compounds having the polar group in the substituent.
【0065】以下に極性基含有の共重合成分について例
示する。ここで、R22はH又はCH3 を示し、R23は
H、CH3 又はCHCOOCH3 を示し、R24は炭素数
1〜4のアルキル基を示し、R25は炭素数1〜6のアル
キル基、ベンジル基又はフェニル基を示し、fは1〜3
の整数を示し、gは2〜11の整数を示し、hは1〜1
1の整数を示し、iは2〜4の整数を示し、jは2〜1
0の整数を示す。The polar group-containing copolymerization component will be exemplified below. Here, R 22 represents H or CH 3 , R 23 represents H, CH 3 or CHCOOCH 3 , R 24 represents an alkyl group having 1 to 4 carbon atoms, and R 25 represents alkyl group having 1 to 6 carbon atoms. Group, benzyl group or phenyl group, and f is 1 to 3
Is an integer, g is an integer of 2 to 11, and h is 1 to 1.
1 represents an integer, i represents an integer of 2 to 4, and j represents 2-1.
Indicates an integer of 0.
【0066】[0066]
【化15】 [Chemical 15]
【0067】[0067]
【化16】 [Chemical 16]
【0068】[0068]
【化17】 [Chemical 17]
【0069】[0069]
【化18】 [Chemical 18]
【0070】[0070]
【化19】 [Chemical 19]
【0071】[0071]
【化20】 [Chemical 20]
【0072】[0072]
【化21】 [Chemical 21]
【0073】[0073]
【化22】 [Chemical formula 22]
【0074】[0074]
【化23】 [Chemical formula 23]
【0075】[0075]
【化24】 [Chemical formula 24]
【0076】[0076]
【化25】 [Chemical 25]
【0077】[0077]
【化26】 [Chemical formula 26]
【0078】また、本発明ではマクロモノマー中に極性
基を含有する樹脂〔A2 〕が、更に上記極性基のなかの
いずれか少なくとも一種を重合体主鎖の末端に結合して
いてもよい(かかる樹脂を特に樹脂〔A12〕と呼ぶこと
もある)。In the present invention, the resin [A 2 ] containing a polar group in the macromonomer may further have at least one of the polar groups bonded to the end of the polymer main chain ( Such a resin is sometimes called a resin [A 12 ]).
【0079】樹脂〔A12〕において、マクロモノマーに
おける共重合成分として含有される極性基と、重合体主
鎖の片末端に結合される極性基とは同じでも異なってい
てもよく、またその存在割合は、本発明の光導電層を構
成する他の結着樹脂、分光増感色素、化学増感剤又はそ
れ以外の添加剤の種類、量によって異なり、その割合は
任意に調節することが好ましい。重要なことは、両者の
極性基の総量が0.5〜15重量%の範囲内で使用され
ることである。In the resin [A 12 ], the polar group contained as a copolymerization component in the macromonomer and the polar group bonded to one end of the polymer main chain may be the same or different, and their presence The ratio varies depending on the kind and amount of other binder resin, spectral sensitizing dye, chemical sensitizer or other additive constituting the photoconductive layer of the present invention, and the ratio is preferably adjusted arbitrarily. .. What is important is that the total amount of both polar groups is used within the range of 0.5 to 15% by weight.
【0080】更に、発明のグラフト型共重合樹脂の共重
合成分として供せられる、一官能性マクロモノマー
(M)について詳述する。一官能性マクロモノマー(M
1 )は、一般式(II)で示される重合性二重結合基
を、前記一般式(I)〔一般式(Ia)及び(Ib)も
含む〕で示される重合体成分のうちの少なくとも一種を
含有する重合体主鎖の一方の末端にのみ結合してなる、
重量平均分子量2×104 以下のものであり、マクロモ
ノマー(M2)は、上記マクロモノマー(M1 )の繰り
返し単位である重合体成分として更に前記したと同様の
特定の極性基を含有する重合体成分のうちの少なくとも
一種を含有するものである。Further, the monofunctional macromonomer (M) to be used as a copolymerization component of the graft type copolymer resin of the present invention will be described in detail. Monofunctional macromonomer (M
1 ) is at least one of the polymer components represented by the above general formula (I) [also includes the general formulas (Ia) and (Ib)], the polymerizable double bond group represented by the general formula (II). Formed by bonding only to one end of the polymer main chain containing
The weight average molecular weight is 2 × 10 4 or less, and the macromonomer (M 2 ) further contains the same specific polar group as described above as a polymer component which is a repeating unit of the macromonomer (M 1 ). It contains at least one of the polymer components.
【0081】[0081]
【化27】 [Chemical 27]
【0082】〔式(II)中、R4 は−COO−、−O
CO−、−CH2 OCO−、−CH2 COO−、−O
−、−SO2 −、−CO−、−CONR5 −、−SO2
NR5 −(ここでR5 は水素原子又は炭化水素基を表わ
す)、−CONHCOO−、−CONHCONH−又は
−C6 H4−を表わす。[In the formula (II), R 4 is —COO—, —O
CO -, - CH 2 OCO - , - CH 2 COO -, - O
-, - SO 2 -, - CO -, - CONR 5 -, - SO 2
NR 5 — (wherein R 5 represents a hydrogen atom or a hydrocarbon group), —CONHCOO—, —CONHCONH— or —C 6 H 4 —.
【0083】b1 及びb2 は、互いに同じでも異なって
もよく、各々水素原子、ハロゲン原子、シアノ基、炭化
水素基、−COOR6 又は炭化水素を介した−COOR
6 (ここでR6 は置換されてもよい炭化水素基を表す)
を表す。〕 マクロモノマー(M)の重量平均分子量が2×104 を
越えると、式(I)に相当する単量体との共重合性が低
下するため好ましくない。他方重量平均分子量が小さす
ぎると、感光層の電子写真特性の向上効果が小さくなる
ため、1×103 以上であることが好ましい。B 1 and b 2 may be the same as or different from each other, and each is a hydrogen atom, a halogen atom, a cyano group, a hydrocarbon group, —COOR 6 or —COOR 6 via a hydrocarbon.
6 (wherein R 6 represents an optionally substituted hydrocarbon group)
Represents. When the weight average molecular weight of the macromonomer (M) exceeds 2 × 10 4 , the copolymerizability with the monomer corresponding to the formula (I) decreases, which is not preferable. On the other hand, when the weight average molecular weight is too small, the effect of improving the electrophotographic characteristics of the photosensitive layer becomes small, so that it is preferably 1 × 10 3 or more.
【0084】該重合性二重結合基を片末端に結合してな
る一官能性マクロモノマー(M)の繰り返し単位を構成
する重合体成分として、一般式(I)、(Ia)及び/
又は(Ib)で表される成分が挙げられ、その含有量は
マクロモノマー中30重量%以上、好ましくは50重量
%以上である。As the polymer component constituting the repeating unit of the monofunctional macromonomer (M) having the polymerizable double bond group bonded to one end, one of the general formulas (I), (Ia) and / or
Alternatively, the component represented by (Ib) may be mentioned, and the content thereof is 30% by weight or more, preferably 50% by weight or more in the macromonomer.
【0085】これらの一般式(I)、(Ia)及び(I
b)で表される重合体成分の具体的記載は前記したマク
ロモノマーと共重合し得る共重合成分として記載した通
りであり、具体例としても、前記と同様の物が挙げられ
る。樹脂〔A〕において、樹脂〔A〕の共重合体成分と
して含まれる式(I)の成分と、マクロモノマー(M)
中の重合成分として含まれる式(I)の成分とは同じで
も異なっていてもよい。These general formulas (I), (Ia) and (I)
The specific description of the polymer component represented by b) is as described for the above-mentioned copolymerizable component that can be copolymerized with the macromonomer, and specific examples thereof include the same ones as described above. In the resin [A], the component of the formula (I) contained as a copolymer component of the resin [A] and the macromonomer (M)
It may be the same as or different from the component of formula (I) contained as a polymerization component therein.
【0086】更にマクロモノマー(M)中の重合体成分
として上記以外の他の重合体成分を含有していてもよ
く、例えば重合し得る他の繰り返し単位に相当する単量
体として、アクリロニトリル、メタクリロニトリル、ア
クリルアミド類、メタクリルアミド類、スチレン及びそ
の誘導体(例えばビニルトルエン、クロロスチレン、ブ
ロモスチレン、ヒドロキシメチルスチレン、N,N−ジ
メチルアミノメチルスチレン等)、複素環ビニル類(例
えばビニルピリジン、ビニルイミダゾール、ビニルピロ
リドン、ビニルチオフェン、ビニルピラゾール、ビニル
ジオキサン、ビニルオキサジン等)等が挙げられる。Further, as the polymer component in the macromonomer (M), a polymer component other than the above may be contained. For example, as a monomer corresponding to another polymerizable repeating unit, acrylonitrile or methacrylic acid may be used. Ronitrile, acrylamides, methacrylamides, styrene and derivatives thereof (eg vinyltoluene, chlorostyrene, bromostyrene, hydroxymethylstyrene, N, N-dimethylaminomethylstyrene, etc.), heterocyclic vinyls (eg vinylpyridine, vinyl) Imidazole, vinylpyrrolidone, vinylthiophene, vinylpyrazole, vinyldioxane, vinyloxazine, etc.) and the like.
【0087】これら他の単量体が含有される場合には、
マクロモノマー(M)の全重合体成分中1〜30重量%
であることが好ましい。また、マクロモノマー(M2 )
において更に含有される特定の極性基含有成分は、マク
ロモノマー中好ましくは1〜50重量%、より好ましく
は3〜30重量%である。When these other monomers are contained,
1 to 30% by weight in all polymer components of macromonomer (M)
Is preferred. In addition, macromonomer (M 2 )
In the macromonomer, the specific polar group-containing component further contained in 1 is preferably 1 to 50% by weight, more preferably 3 to 30% by weight.
【0088】一方、一般式(II)において、炭化水素
基の具体的内容は、一般式(I)におけるR3 で記載し
た炭化水素基の内容と同様である。R4 が−C6 H4 −
を表わす場合、ベンゼン環は置換基を有してもよい。置
換基としては、ハロゲン原子(例えば塩素原子、臭素原
子等)、アルキル基(例えばメチル基、エチル基、プロ
ピル基、ブチル基、クロロメチル基、メトキシメチル基
等)、アルコキシ基(例えばメトキシ基、エトキシ基、
プロピオキシ基、ブトキシ基等)等が挙げられる。On the other hand, in the general formula (II), the specific content of the hydrocarbon group is the same as the content of the hydrocarbon group described for R 3 in the general formula (I). R 4 is -C 6 H 4 -
When represented by, the benzene ring may have a substituent. As the substituent, a halogen atom (eg, chlorine atom, bromine atom, etc.), an alkyl group (eg, methyl group, ethyl group, propyl group, butyl group, chloromethyl group, methoxymethyl group, etc.), an alkoxy group (eg, methoxy group, Ethoxy group,
Propoxy group, butoxy group, etc.) and the like.
【0089】b1 及びb2 は互いに同じでも異なってい
てもよく、好ましくは水素原子、ハロゲン原子(例えば
塩素原子、臭素原子)、シアノ基、炭素数1〜4のアル
キル基(例えばメチル基、エチル基、プロピル基、ブチ
ル基等)、−COOR6 又は炭化水素を介した−COO
R6 (R6 は好ましくは炭素数1〜18のアルキル基、
アルケニル基、アラルキル基、脂環式基又はアリール基
を表し、これらは置換されていてもよく、具体的には上
記R3 にて説明したと同様のものを挙げることができ
る。B 1 and b 2 may be the same or different from each other, and preferably a hydrogen atom, a halogen atom (eg chlorine atom, bromine atom), a cyano group, an alkyl group having 1 to 4 carbon atoms (eg methyl group, (Ethyl group, propyl group, butyl group, etc.), -COOR 6 or -COO via hydrocarbon
R 6 (R 6 is preferably an alkyl group having 1 to 18 carbon atoms,
It represents an alkenyl group, an aralkyl group, an alicyclic group or an aryl group, which may be substituted, and specific examples thereof include those described for R 3 .
【0090】上記炭化水素を介した−COOR6 基にお
ける炭化水素基としては、メチレン基、エチレン基、プ
ロピレン基等が挙げられる。更に好ましくは、一般式
(II)において、R4 は−COO−、−OCO−、−
CH2 OCO−、−CH2 COO−、−O−、−CON
H−、−SO2 NH−又は−C6 H4 −を表し、b1 及
びb2 は互いに同じでも異なっていてもよく、各々水素
原子、メチル基、−COOR6 又は−CH2 COOR6
〔R6 はより好ましくは炭素数1〜6のアルキル基(例
えばメチル基、エチル基、プロピル基、ブチル基、ヘキ
シル基等)を表す〕を表す。更に好ましくはb1 及びb
2 においていずれか一方が水素原子を表す。Examples of the hydrocarbon group in the —COOR 6 group through the above hydrocarbon include a methylene group, an ethylene group, a propylene group and the like. More preferably, in the general formula (II), R 4 is -COO -, - OCO -, -
CH 2 OCO -, - CH 2 COO -, - O -, - CON
H -, - SO 2 NH- or -C 6 H 4 - represents, b 1 and b 2 may be the same as or different from each other, each represents a hydrogen atom, a methyl group, -COOR 6 or -CH 2 COOR 6
[R 6 more preferably represents an alkyl group having 1 to 6 carbon atoms (eg, methyl group, ethyl group, propyl group, butyl group, hexyl group, etc.)]. More preferably b 1 and b
In 2 , one of them represents a hydrogen atom.
【0091】本発明に供されるマクロモノマーは、上記
の如き一般式(I)、(Ia)及び/又は(Ib)で示
される繰り返し単位、及びマクロモノマー(M2 )の場
合には更に特定の極性基を含有する繰り返し単位から少
なくともなるランダムな重合体主鎖の一方の末端にの
み、一般式(II)で示される重合性二重結合基が直接
結合するか或いは任意の連結基で結合された化学構造を
有するものである。The macromonomer used in the present invention is further specified in the case of the repeating unit represented by the general formula (I), (Ia) and / or (Ib) as described above, and the macromonomer (M 2 ). The polymerizable double bond group represented by the general formula (II) is bonded directly to only one terminal of the main chain of the random polymer including at least repeating units containing a polar group of It has a defined chemical structure.
【0092】式(II)成分と重合体成分部分とを連結
する連結基としては、炭素ー炭素結合(単結合又は二重
結合)、炭素ーヘテロ原子結合及びヘテロ原子ーヘテロ
原子結合(上記においてヘテロ原子としては、例えば酸
素原子、イオウ原子、窒素原子、ケイ素原子等)の原子
団の任意の組合せで構成されるものである。The linking group for linking the component of the formula (II) and the polymer component part includes a carbon-carbon bond (single bond or double bond), a carbon-heteroatom bond and a heteroatom-heteroatom bond (in the above, a heteroatom). As, for example, any combination of atomic groups of oxygen atom, sulfur atom, nitrogen atom, silicon atom, etc.).
【0093】更に具体的な連結基としては、前記樹脂
〔A1 〕において重合体主鎖と極性基とを連結する連結
基として記載したものと同様のものを挙げることがで
き、これらの連結基のうちの単独又は二以上の連結基の
組合せである。Specific examples of the linking group include the same as those described as the linking group for linking the polymer main chain and the polar group in the resin [A 1 ]. Or a combination of two or more linking groups.
【0094】本発明に供されるマクロモノマー(M)
は、従来公知の合成方法によって製造することができ
る。具体的には、分子中にカルボキシル基、カルボキシ
ハライド基、ヒドロキシル基、アミノ基、ハロゲン原
子、エポキシ基等の反応性基を含有する重合開始剤及び
/又は連鎖移動剤を用いてラジカル重合して得られる末
端反応性基結合のオリゴマーと種々の試薬を反応させて
マクロマーにするラジカル重合法による方法等により合
成される。Macromonomer (M) used in the present invention
Can be produced by a conventionally known synthesis method. Specifically, radical polymerization using a polymerization initiator and / or a chain transfer agent containing a reactive group such as a carboxyl group, a carboxyhalide group, a hydroxyl group, an amino group, a halogen atom and an epoxy group in a molecule. It is synthesized by a method such as a radical polymerization method in which the obtained oligomer having a terminal reactive group bond is reacted with various reagents to form a macromer.
【0095】具体的には、P.Dreyfuss an
d R.P.Quirk、Encycl.Polym.
Sci.Eng.、7、551(1987)、P.F.
Rempp、E.Franta、Adu.Polym.
Sci,58、1(1984)、川上雄資、化学工業、
38、56(1987)、山下雄也、高分子、31、9
88(1982)、小林四郎、高分子、30、伊藤浩
一、高分子加工、35、262(1986)、東貴四
郎、津田隆、機能材料、1987、No.10、5等の
総説及びそれに引例の文献、特許等に記載の方法にした
がって合成することができる。Specifically, P. Dreyfuss an
d R. P. Quirk, Encycl. Polym.
Sci. Eng. 7, 551 (1987), p. F.
Rempp, E .; Franta, Adu. Polym.
Sci, 58, 1 (1984), Yusuke Kawakami, Chemical Industry,
38, 56 (1987), Yuya Yamashita, Polymer, 31, 9
88 (1982), Shiro Kobayashi, High Polymer, 30, Koichi Ito, Polymer Processing, 35,262 (1986), Kishiro Azuma, Takashi Tsuda, Functional Materials, 1987, No. It can be synthesized according to the methods described in the review articles of 10, 5 and the like and references therein, patents and the like.
【0096】但し、本発明のマクロモノマー(M2 )
は、その繰り返し単位の成分として前記極性基を含有す
ることから、合成上、例えば次の配慮をして合成され
る。その一つの方法としては、例えば反応式(A)で示
される様に、該極性基を保護した官能基の形で含有する
単量体を用いて上記の方法でラジカル重合及び末端反応
性基を導入するものである。However, the macromonomer (M 2 ) of the present invention
Contains the above polar group as a component of its repeating unit, and is thus synthesized in consideration of the following points. As one of the methods, for example, as shown in the reaction formula (A), a radical polymerization and a terminal reactive group are carried out by the above method using a monomer containing a functional group in which the polar group is protected. It is to be introduced.
【0097】[0097]
【化28】 [Chemical 28]
【0098】本発明のマクロモノマー(M2 )中にラン
ダムに含有される該極性基の保護反応及び脱保護反応
(例えば加水分解反応、加水素分解反応、酸化分解反応
等)については、従来公知の方法により行うことができ
る。具体的には、J.F.W.McOmie、「Pro
tective Groups in Organic
Chemistry」Plenum Press(19
73)、T.W.Greene、「Protectiv
e Groups in Organic Synth
esis」、John Wiley and Sous
(1981)、小田良平「高分子ファインケミカル」講
談社(1976)、岩倉義男、栗田恵輔「反応性高分
子」講談社(1977)、G.Berner eta
l、J.Radiation Curing、198
6、No.10、p10、特開昭62−212669
号、同62−286064号、同62−210475
号、同62−195684号、同62−258476
号、同63−260439号、特願昭62−22052
0号、同62−226692号等に記載の方法を用いて
合成することができる。The protection reaction and deprotection reaction (eg, hydrolysis reaction, hydrogenolysis reaction, oxidative decomposition reaction, etc.) of the polar group randomly contained in the macromonomer (M 2 ) of the present invention are conventionally known. It can be performed by the method of. Specifically, J. F. W. McOmie, "Pro
tective Groups in Organic
Chemistry "Plenum Press (19
73), T.W. W. Greene, "Protectiv
e Groups in Organic Synth
sis ", John Wiley and Sous
(1981), Ryohei Oda "Polymer Fine Chemicals" Kodansha (1976), Yoshio Iwakura, Keisuke Kurita "Reactive Polymer" Kodansha (1977), G.I. Berner eta
1, J.I. Radiation Curing, 198
6, No. 10, p10, JP-A-62-212669
No. 62-286064, No. 62-210475.
No. 62-195648, 62-258476.
No. 63-260439, Japanese Patent Application No. 62-22052
It can be synthesized using the method described in No. 0, No. 62-226692 and the like.
【0099】他の一つの方法としては、例えば反応式
(B)で示される様に、前記のようにしてオリゴマーを
合成した後、オリゴマーの片末端に結合した特定の反応
性基とオリゴマー中に含有される該極性基の反応性の差
を利用して、特定の反応性基とのみ反応する重合性二重
結合基含有の試薬と反応させることで合成する方法であ
る。As another method, for example, as shown in the reaction formula (B), after synthesizing an oligomer as described above, a specific reactive group bonded to one end of the oligomer and It is a method of synthesizing by reacting with a reagent containing a polymerizable double bond group, which reacts only with a specific reactive group, by utilizing the difference in reactivity of the contained polar groups.
【0100】[0100]
【化29】 [Chemical 29]
【0101】反応式(B)に示したように、各特定の官
能基の組合せについての具体例を下記表ー1に示す。し
かし、本発明はこれらに限定されるものではなく、重要
なことは通常の有機化学反応における反応の選択性を利
用することで、オリゴマー中の該極性基を保護すること
なくマクロモノマー化が達成されればよいものである。As shown in the reaction formula (B), specific examples of combinations of specific functional groups are shown in Table 1 below. However, the present invention is not limited to these, and importantly, by utilizing the selectivity of the reaction in a normal organic chemical reaction, macromonomerization can be achieved without protecting the polar group in the oligomer. It should be done.
【0102】[0102]
【表1】 [Table 1]
【0103】用いることのできる連鎖移動剤としては、
例えば該極性基又は後に該極性基に誘導しうる置換基含
有のメルカプト化合物(例えばチオグリコール酸、チオ
リンゴ酸、チオサリチル酸、2−メルカプトプロピオン
酸、3−メルカプトプロピオン酸、3−メルカプト酪
酸、N−(2−メルカプトプロピオニル)グリシン、2
−メルカプトニコチン酸、3−〔N−(2−メルカプト
エチル)カルバモイル〕プロピオン酸、3−〔N−(2
−メルカプトエチル)アミノ〕プロピオン酸、N−(3
−メルカプトプロピオニル)アラニン、2−メルカプト
エタンスルホン酸、3−メルカプトプロパンスルホン
酸、4−メルカプトブタンスルホン酸、2−メルカプト
エタノール、3−メルカプト−1,2−プロパンジオー
ル、1−メルカプト−2−プロパノール、3−メルカプ
ト−2−ブタノール、メルカプトフェノール、2−メル
カプトエチルアミン、2−メルカプトイミダゾール、2
−メルカプト−3−ピリジノール等)又はこれらのメル
カプト化合物の酸化体であるジスルフィド化合物、ある
いは上記極性基又は置換基含有のヨード化アルキル化合
物(例えばヨード酢酸、ヨードプロピオン酸、2−ヨー
ドエタノール、2−ヨードエタンスルホン酸、3−ヨー
ドプロパンスルホン酸等)等が挙げられる。好ましくは
メルカプト化合物である。As chain transfer agents that can be used,
For example, the polar group or a substituent-containing mercapto compound that can be induced to the polar group later (for example, thioglycolic acid, thiomalic acid, thiosalicylic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, 3-mercaptobutyric acid, N- (2-mercaptopropionyl) glycine, 2
-Mercaptonicotinic acid, 3- [N- (2-mercaptoethyl) carbamoyl] propionic acid, 3- [N- (2
-Mercaptoethyl) amino] propionic acid, N- (3
-Mercaptopropionyl) alanine, 2-mercaptoethanesulfonic acid, 3-mercaptopropanesulfonic acid, 4-mercaptobutanesulfonic acid, 2-mercaptoethanol, 3-mercapto-1,2-propanediol, 1-mercapto-2-propanol , 3-mercapto-2-butanol, mercaptophenol, 2-mercaptoethylamine, 2-mercaptoimidazole, 2
-Mercapto-3-pyridinol or the like) or a disulfide compound which is an oxidized form of these mercapto compounds, or an iodinated alkyl compound having the polar group or the substituent (for example, iodoacetic acid, iodopropionic acid, 2-iodoethanol, 2- Iodoethanesulfonic acid, 3-iodopropanesulfonic acid, etc.) and the like. Preferred are mercapto compounds.
【0104】用いることのできる特定の反応性基含有の
重合開始剤としては、例えば、2,2’−アゾビス(2
−シアノプロパノール)、2,2’−アゾビス(2−シ
アノペンタノール)、4,4’−アゾビス(4−シアノ
吉草酸)、4,4’−アゾビス(4−シアノ吉草酸クロ
ライド)、2,2’−アゾビス〔2−(5−メチル−2
−イミダゾリン−2−イル)プロパン〕、2,2’−ア
ゾビス〔2−(3,4,5,6−テトラヒドロピリミジ
ン−2−イル)プロパン〕、2,2’−アゾビス{2−
〔1−(2−ヒドロキシエチル)−2−イミダゾリン−
2−イル〕プロパン}、2,2’−アゾビス〔2−メチ
ル−N−(2−ヒドロキシエチル)プロピオンアミド〕
等又はこれらの誘導体等が挙げられる。Specific examples of the reactive group-containing polymerization initiator that can be used include 2,2′-azobis (2
-Cyanopropanol), 2,2'-azobis (2-cyanopentanol), 4,4'-azobis (4-cyanovaleric acid), 4,4'-azobis (4-cyanovaleric acid chloride), 2, 2'-azobis [2- (5-methyl-2
-Imidazolin-2-yl) propane], 2,2'-azobis [2- (3,4,5,6-tetrahydropyrimidin-2-yl) propane], 2,2'-azobis {2-
[1- (2-hydroxyethyl) -2-imidazoline-
2-yl] propane}, 2,2'-azobis [2-methyl-N- (2-hydroxyethyl) propionamide]
Etc. or their derivatives and the like.
【0105】これらの連鎖移動剤又は重合開始剤は、各
々全単量体に対して好ましくは0.1〜15重量%、よ
り好ましくは0.5〜10重量%である。The amount of each of these chain transfer agents or polymerization initiators is preferably 0.1 to 15% by weight, more preferably 0.5 to 10% by weight, based on all monomers.
【0106】本発明のマクロモノマー(M)は、具体的
に下記の化合物を例として挙げることができる。但し、
マクロモノマー(M1 )は、以下の具体例に極性基含有
成分を含まないものとして同様のものが挙げられる。Specific examples of the macromonomer (M) of the present invention include the following compounds. However,
As the macromonomer (M 1 ), the same as the following specific examples may be mentioned as those containing no polar group-containing component.
【0107】また、以下の各例において、R26は−H又
は−CH3 を示し、R27、R28又はR29は各々−H、−
CH3 又は−CH2 COOCH3 を示し、R30は−Ck
H2k+1(kは1〜18の整数を示す)、−CH2 C6 H
5 、−C6 H5 (R31)(R32)、(R31、R32は各々−
H、−Cl、−Br、−CH3又は−COOCH3 を示
す)、−C10H7 又は−CH2 −C10H7 を示し、R33
は−CN、−OCOCH3 、−CONH2 又は−C6 H
5 を示し、R34は−Cl、−Br、−CN又は−OCH
3 を示し、mは2〜18の整数を示し、nは2〜12の
整数を示し、pは2〜4の整数を示す。In each of the following examples, R 26 represents -H or -CH 3 , and R 27 , R 28 or R 29 represent -H or -H, respectively.
CH 3 or indicates -CH 2 COOCH 3, R 30 is -C k
H 2k + 1 (k represents an integer of 1 to 18), —CH 2 C 6 H
5, -C 6 H 5 (R 31) (R 32), (R 31, R 32 are each -
Shows H, -Cl, -Br, and -CH 3 or -COOCH 3), - C 10 H 7 or indicates -CH 2 -C 10 H 7, R 33
-CN is, -OCOCH 3, -CONH 2 or -C 6 H
5 shows a, R 34 is -Cl, -Br, -CN or -OCH
3 , m is an integer of 2 to 18, n is an integer of 2 to 12, and p is an integer of 2 to 4.
【0108】[0108]
【化30】 [Chemical 30]
【0109】[0109]
【化31】 [Chemical 31]
【0110】[0110]
【化32】 [Chemical 32]
【0111】[0111]
【化33】 [Chemical 33]
【0112】[0112]
【化34】 [Chemical 34]
【0113】[0113]
【化35】 [Chemical 35]
【0114】また、本発明の樹脂〔A〕は、前記した一
般式(I)及びマクロモノマー(M)に相当する単量体
とともにこれら以外の単量体を更なる共重合成分として
含有してもよい。Further, the resin [A] of the present invention contains a monomer corresponding to the above-mentioned general formula (I) and macromonomer (M) together with a monomer other than these as a further copolymerization component. Good.
【0115】このような他の共重合成分としては、例え
ば一般式(I)で説明した以外の置換基を含有するメタ
クリル酸エステル類、アクリル酸エステル類、クロトン
酸エステル類に加え、α−オレフィン類、カルボン酸ビ
ニル又はアリル酸エステル類(例えばカルボン酸とし
て、酢酸、プロピオン酸、酪酸、吉草酸、安息香酸、ナ
フタレンカルボン酸等)、アクリロニトリル、メタクリ
ロニトリル、ビニルエーテル類、イタコン酸エステル類
(例えばジメチルエステル、ジエチルエステル等)、ア
クリルアミド類、メタクリルアミド類、スチレン類(例
えばスチレン、ビニルトルエン、クロロスチレン、ヒド
ロキシスチレン、N,N−ジメチルアミノメチルスチレ
ン、メトキシカルボニルスチレン、メタンスルホニルオ
キシスチレン、ビニルナフタレン等)、ビニルスルホン
含有化合物、ビニルケトン含有化合物、複素環ビニル類
(例えばビニルピロリドン、ビニルピリジン、ビニルイ
ミダゾール、ビニルチオフェン、ビニルイミダゾリン、
ビニルピラゾール、ビニルジオキサン、ビニルキノリ
ン、ビニルテトラゾール、ビニルオキサジン等)等が挙
げられる。但し、これら他の単量体は、樹脂〔A〕の共
重合体中20重量%を越えないことが好ましい。Examples of such other copolymerization component include, in addition to methacrylic acid esters, acrylic acid esters, crotonic acid esters containing a substituent other than those described in the general formula (I), α-olefins. , Vinyl carboxylates or allyl esters (for example, as carboxylic acid, acetic acid, propionic acid, butyric acid, valeric acid, benzoic acid, naphthalenecarboxylic acid, etc.), acrylonitrile, methacrylonitrile, vinyl ethers, itaconic acid esters (for example, Dimethyl ester, diethyl ester, etc., acrylamides, methacrylamides, styrenes (for example, styrene, vinyltoluene, chlorostyrene, hydroxystyrene, N, N-dimethylaminomethylstyrene, methoxycarbonylstyrene, methanesulfonyloxystyrene, vinyl chloride) Naphthalene), vinyl sulfone-containing compounds, vinyl ketones containing compounds, heterocyclic vinyl compounds (e.g., vinylpyrrolidone, vinylpyridine, vinylimidazole, vinylthiophene, vinylimidazoline,
Vinylpyrazole, vinyldioxane, vinylquinoline, vinyltetrazole, vinyloxazine, etc.) and the like. However, it is preferable that these other monomers do not exceed 20% by weight in the copolymer of the resin [A].
【0116】本発明に供される樹脂〔A〕において、重
合体主鎖の末端に上記極性基を結合してなる樹脂
〔A1 〕又は樹脂〔A12〕を合成するには、少なくとも
前記したマクロモノマー(M)と一般式(I)に相当す
る単量体との重合反応時に、該極性基又はこれに誘導で
きる特定の反応基を分子中に含有した重合開始剤又は連
鎖移動剤を併用することで達成される。In the resin [A] used in the present invention, at least the above-mentioned method is required for synthesizing the resin [A 1 ] or the resin [A 12 ] in which the polar group is bonded to the terminal of the polymer main chain. During the polymerization reaction of the macromonomer (M) and the monomer corresponding to the general formula (I), a polymerization initiator or a chain transfer agent containing the polar group or a specific reactive group that can be induced in the polar group is used in combination. It is achieved by doing.
【0117】具体的には、マクロモノマーの合成におい
て前記した様に片末端反応結合のオリゴマーの方法と同
様にして得ることができる。次に本発明の樹脂〔B〕に
ついて説明する。Specifically, it can be obtained in the same manner as in the method of oligomers with one end reactive bond as described above in the synthesis of macromonomers. Next, the resin [B] of the present invention will be described.
【0118】樹脂〔B〕は、前記一般式(I)で示され
る重合体成分を少なくとも含有するブロックAと、樹脂
〔A〕において示される特定の極性基から選択される少
なくとも一種の極性基を含有する重合体成分を少なくと
も含有するブロックBとから構成されるAB型ブロック
高分子鎖が有機分子中に少なくとも3個結合してなるス
ター型共重合体である。The resin [B] comprises a block A containing at least the polymer component represented by the general formula (I) and at least one polar group selected from the specific polar groups represented by the resin [A]. It is a star-type copolymer in which at least three AB-type block polymer chains composed of a block B containing at least the polymer component contained therein are bound in an organic molecule.
【0119】ここにおいて、ブロックAとブロックBの
高分子鎖中における配列の順序はいずれでもよい。即
ち、該重合体を模式的に示す下記の如くになる。Here, the order of arrangement of the block A and the block B in the polymer chain may be any. That is, the following is a schematic representation of the polymer.
【0120】[0120]
【化36】 [Chemical 36]
【0121】[0121]
【化37】 [Chemical 37]
【0122】〔ここで、Xは有機分子を表し、(A)は
ブロックAを、(B)はブロックBを表し、(A)−
(B)は高分子鎖を表す。〕 また、かかるAB型ブロック高分子鎖は、有機分子中に
含まれる上限は多くても15個、通常10個程度であ
る。[Wherein X represents an organic molecule, (A) represents block A, (B) represents block B, and (A)-
(B) represents a polymer chain. Further, the upper limit of such AB type block polymer chains contained in the organic molecule is at most 15, usually about 10.
【0123】樹脂〔B〕における特定の極性基含有成分
の含有量は、樹脂〔B〕100重量部当り好ましくは
0.05〜15重量部、より好ましくは0.1〜10重
量部の割合で含有される。The content of the specific polar group-containing component in the resin [B] is preferably 0.05 to 15 parts by weight, more preferably 0.1 to 10 parts by weight, per 100 parts by weight of the resin [B]. Contained.
【0124】結着樹脂〔B〕における極性基含有量が
0.05重量%より少ないと、初期電位が低くて充分な
画像濃度を得ることができず、該極性基含有量が15重
量%よりも多いと、分散性が低下し、膜平滑度及び電子
写真特特性の高温高湿が低下し、更にオフセットマスタ
ーとして用いるときに地汚れが増大するため、好ましく
ない。When the content of the polar group in the binder resin [B] is less than 0.05% by weight, the initial potential is low and a sufficient image density cannot be obtained, and the content of the polar group is less than 15% by weight. If it is too much, the dispersibility is lowered, the film smoothness and the high temperature and high humidity of the electrophotographic characteristic are lowered, and further, the background stain is increased when it is used as an offset master, which is not preferable.
【0125】また,樹脂[B]において,全共重合体中
に含有される特定の極性基含有重合体成分の総量が,前
記樹脂[A]中に含有される特定の極性基含有重合体成
分の総量に対し10重量%〜50重量%であることが好
ましい.樹脂[B]における該総量が樹脂[A]のそれ
の10重量%未満であると,電子写真特性(特に暗中電
荷保持率),光感度の低下が著しく,膜の強度も低下す
る.また,50重量%を越えると,分散の均一化が不十
分となり,電子写真特性が低下し,オフセット原版とし
ては保水性が低下する.In the resin [B], the total amount of the specific polar group-containing polymer component contained in all the copolymers is equal to the specific polar group-containing polymer component contained in the resin [A]. Is preferably 10% by weight to 50% by weight with respect to the total amount of. When the total amount of the resin [B] is less than 10% by weight of that of the resin [A], the electrophotographic properties (especially the charge retention in the dark) and the photosensitivity are significantly lowered, and the film strength is also lowered. On the other hand, when it exceeds 50% by weight, the homogenization of dispersion becomes insufficient, the electrophotographic characteristics are deteriorated, and the water retention property is lowered as an offset master plate.
【0126】樹脂〔B〕の重量平均分子量は2×104
〜1×106 、好ましくは3×104 〜5×105 であ
る。樹脂〔B〕の分子量が2×104 より小さくなる
と、皮膜形成能が低下し充分な膜強度が保てず、また分
子量が1×106 より大きくなると本発明の樹脂〔B〕
の効果が少なくなり、従来公知の樹脂と同程度の電子特
性になってしまう。The weight average molecular weight of the resin [B] is 2 × 10 4.
˜1 × 10 6 , preferably 3 × 10 4 to 5 × 10 5 . When the molecular weight of the resin [B] is less than 2 × 10 4 , the film forming ability is lowered and sufficient film strength cannot be maintained, and when the molecular weight is more than 1 × 10 6 , the resin [B] of the present invention is used.
Is less effective, and the electronic characteristics are the same as those of conventionally known resins.
【0127】該樹脂〔B〕のガラス転移点は、−10℃
〜100℃の範囲のものが好ましいが、より好ましくは
0℃〜90℃である。本発明のスター型共重合体(樹脂
〔B〕)の高分子鎖を構成する各ブロックは以下の特徴
を有する。The glass transition point of the resin [B] is −10 ° C.
The temperature is preferably in the range of -100 to 100 ° C, more preferably 0 to 90 ° C. Each block constituting the polymer chain of the star type copolymer (resin [B]) of the present invention has the following characteristics.
【0128】Aブロック成分は、前記一般式(I)で示
される繰り返し単位で示される重合体成分を少なくとも
含有し、該式(I)で示される成分はAブロック成分中
好ましくは30〜100重量%、より好ましくは50〜
100重量%含有される。また、ブロックAにおいて
は、ブロックBで含有される特定の極性基含有成分を含
有しないことを特徴とする。The A block component contains at least a polymer component represented by the repeating unit represented by the general formula (I), and the component represented by the formula (I) is preferably 30 to 100% by weight in the A block component. %, More preferably 50 to
100% by weight is contained. Further, the block A is characterized by not containing the specific polar group-containing component contained in the block B.
【0129】一般式(I)の成分の具体的内容について
は、樹脂〔A〕で説明したと同様のものに準じる。他に
含有され得る重合体成分としては、例えば下記一般式
(III)で示される成分が挙げられる。The specific contents of the component of the general formula (I) are the same as those described for the resin [A]. Examples of other polymer components that can be contained include components represented by the following general formula (III).
【0130】[0130]
【化38】 [Chemical 38]
【0131】〔式(III)中、D1 は−COO−、−
OCO−、−(CH2 )q −OCO−、−(CH2 )q
−COO−(qは1〜3の整数を表す)、−O−、−S
O2 −、−CO−、−CON−D3 −、−SO2 N−D
3 −、−CONHCOO−、−CONHCONH−又は
−C6 H4 −を表す(ここでD3 は水素原子又は炭化水
素基を表す)。[In the formula (III), D 1 is -COO-,-
OCO -, - (CH 2) q -OCO -, - (CH 2) q
-COO- (q represents an integer of 1 to 3), -O-, -S.
O 2 -, - CO -, - CON-D 3 -, - SO 2 N-D
3 -, - CONHCOO -, - CONHCONH- or -C 6 H 4 - are expressed (here D 3 represents a hydrogen atom or a hydrocarbon group).
【0132】D2 は炭化水素基を表す。m1 及びm
2 は、互いに同じでも異なってもよく、前記式(I)中
のa1、a2 とそれぞれ同一の内容を表す。〕 ここで、D3 は水素原子のほか、好ましい炭化水素基と
しては、炭素数1〜18の置換されてもよいアルキル基
(例えば、メチル基、エチル基、プロピル基、ブチル
基、ヘプチル基、ヘキシル基、オクチル基、デシル基、
ドデシル基、ヘキサデシル基、オクタデシル基、2−ク
ロロエチル基、2−ブロモエチル基、2−シアノエチル
基、2−メトキシカルボニルエチル基、2−メトキシエ
チル基、3−ブロモプロピル基等)、炭素数4〜18の
置換されてもよいアルケニル基(例えば、2−メチル−
1−プロペニル基、2−ブテニル基、2−ぺンテニル
基、3−メチル−2−ぺンテニル基、1−ぺンテニル
基、1−ヘキセニル基、2−ヘキセニル基、4−メチル
−2−ヘキセニル基等)、炭素数7〜12の置換されて
もよいアラルキル基(例えば、ベンジル基、フェネチル
基、3−フェニルプロピル基、ナフチルメチル基、2−
ナフチルエチル基、クロロベンジル基、ブロモベンジル
基、メチルベンジル基、エチルベンジル基、メトキシベ
ンジル基、ジメチルベンジル基、ジメトキシベンジル基
等)、炭素数5〜8の置換されてもよい脂環式基(例え
ば、シクロヘキシル基、2−シクロヘキシルエチル基、
2−シクロぺンチルエチル基等)又は炭素数6〜12の
置換されてもよい芳香族基(例えば、フェニル基、ナフ
チル基、トリル基、キシリル基、プロピルフェニル基、
ブチルフェニル基、オクチルフェニル基、ドデシルフェ
ニル基、メトキシフェニル基、エトキシフェニル基、ブ
トキシフェニル基、デシルオキシフェニル基、クロロフ
ェニル基、ジクロロフェニル基、ブロモフェニル基、シ
アノフェニル基、アセチルフェニル基、メトキシカルボ
ニルフェニル基、エトキシカルボキシフェニル基、ブト
キシカルボニルフェニル基、アセトアミドフェニル基、
プロピオアミドフェニル基、ドデシロイルアミドフェニ
ル基等)が挙げられる。D 2 represents a hydrocarbon group. m 1 and m
2 may be the same as or different from each other, and have the same contents as a 1 and a 2 in the formula (I). Here, in addition to a hydrogen atom, D 3 is preferably a hydrocarbon group having 1 to 18 carbon atoms which may be substituted (for example, a methyl group, an ethyl group, a propyl group, a butyl group, a heptyl group, Hexyl group, octyl group, decyl group,
Dodecyl group, hexadecyl group, octadecyl group, 2-chloroethyl group, 2-bromoethyl group, 2-cyanoethyl group, 2-methoxycarbonylethyl group, 2-methoxyethyl group, 3-bromopropyl group, etc.), C4-18 An optionally substituted alkenyl group (eg, 2-methyl-
1-propenyl group, 2-butenyl group, 2-pentenyl group, 3-methyl-2-pentenyl group, 1-pentenyl group, 1-hexenyl group, 2-hexenyl group, 4-methyl-2-hexenyl group Etc.), and optionally substituted aralkyl groups having 7 to 12 carbon atoms (for example, benzyl group, phenethyl group, 3-phenylpropyl group, naphthylmethyl group, 2-
Naphthylethyl group, chlorobenzyl group, bromobenzyl group, methylbenzyl group, ethylbenzyl group, methoxybenzyl group, dimethylbenzyl group, dimethoxybenzyl group, etc.), alicyclic group having 5 to 8 carbon atoms which may be substituted ( For example, a cyclohexyl group, a 2-cyclohexylethyl group,
2-cyclopentylethyl group, etc.) or an optionally substituted aromatic group having 6 to 12 carbon atoms (eg, phenyl group, naphthyl group, tolyl group, xylyl group, propylphenyl group,
Butylphenyl group, octylphenyl group, dodecylphenyl group, methoxyphenyl group, ethoxyphenyl group, butoxyphenyl group, decyloxyphenyl group, chlorophenyl group, dichlorophenyl group, bromophenyl group, cyanophenyl group, acetylphenyl group, methoxycarbonylphenyl Group, ethoxycarboxyphenyl group, butoxycarbonylphenyl group, acetamidophenyl group,
Propioamidophenyl group, dodecyloylamidophenyl group, etc.).
【0133】D1 が−C6 H4 −を表わす場合、ベンゼ
ン環は置換基を有してもよい。置換基としては、ハロゲ
ン原子(例えば塩素原子、臭素原子等)、アルキル基
(例えばメチル基、エチル基、プロピル基、ブチル基、
クロロメチル基、メトキシメチル基等)、アルコキシ基
(例えばメトキシ基、エトキシ基、プロピオキシ基、ブ
トキシ基等)等が挙げられる。[0133] D 1 is -C 6 H 4 - may represent a benzene ring may have a substituent. As the substituent, a halogen atom (eg, chlorine atom, bromine atom, etc.), an alkyl group (eg, methyl group, ethyl group, propyl group, butyl group,
Chloromethyl group, methoxymethyl group, etc.), alkoxy group (eg, methoxy group, ethoxy group, propoxy group, butoxy group, etc.) and the like.
【0134】D2 は、炭化水素基を表わし、好ましい炭
化水素基としては、炭素数1〜22の置換されてもよい
アルキル基(例えば、メチル基、エチル基、プロピル
基、ブチル基、ヘプチル基、ヘキシル基、オクチル基、
デシル基、ドデシル基、トリデシル基、テトラデシル
基、ヘキサデシル基、オクタデシル基、2−クロロエチ
ル基、2−ブロモエチル基、2−シアノエチル基、2−
メトキシカルボニルエチル基、2−メトキシエチル基、
3−ブロモプロピル基等)、炭素数4〜18の置換され
てもよいアルケニル基(例えば、2−メチル−1−プロ
ペニル基、2−ブテニル基、2−ペンテニル基、3−メ
チル−2−ぺンテニル基、1−ぺンテニル基、1−ヘキ
セニル基、2−ヘキセニル基、4−メチル−2−ヘキセ
ニル基等)、炭素数7〜12の置換されてもよいアラル
キル基(例えば、ベンジル基、フェネチル基、3−フェ
ニルプロピル基、ナフチルメチル基、2−ナフチルエチ
ル基、クロロベンジル基、ブロモベンジル基、メチルベ
ンジル基、エチルベンジル基、メトキシベンジル基、ジ
メチルベンジル基、ジメトキシベンジル基等)、炭素数
5〜8の置換されてもよい脂環式基(例えば、シクロヘ
キシル基、2−シクロヘキシルエチル基、2−シクロぺ
ンチルエチル基等)、炭素数6〜12の置換されてもよ
い芳香族基(例えば、フェニル基、ナフチル基、トリル
基、キシリル基、プロピルフェニル基、ブチルフェニル
基、オクチルフェニル基、ドデシルフェニル基、メトキ
シフェニル基、エトキシフェニル基、ブトキシフェニル
基、デシルオキシフェニル基、クロロフェニル基、ジク
ロロフェニル基、ブロモフェニル基、シアノフェニル
基、アセチルフェニル基、メトキシカルボニルフェニル
基、エトキシカルボニルフェニル基、ブトキシカルボニ
ルフェニル基、アセトアミドフェニル基、プロピオアミ
ドフェニル基、ドデシロイルアミドフェニル基等)が挙
げられる。D 2 represents a hydrocarbon group, and a preferable hydrocarbon group is an optionally substituted alkyl group having 1 to 22 carbon atoms (eg, methyl group, ethyl group, propyl group, butyl group, heptyl group). , Hexyl group, octyl group,
Decyl group, dodecyl group, tridecyl group, tetradecyl group, hexadecyl group, octadecyl group, 2-chloroethyl group, 2-bromoethyl group, 2-cyanoethyl group, 2-
Methoxycarbonylethyl group, 2-methoxyethyl group,
3-bromopropyl group, etc.), an alkenyl group having 4 to 18 carbon atoms and which may be substituted (for example, 2-methyl-1-propenyl group, 2-butenyl group, 2-pentenyl group, 3-methyl-2-perenyl group). Mentenyl group, 1-pentenyl group, 1-hexenyl group, 2-hexenyl group, 4-methyl-2-hexenyl group, etc.) and optionally substituted aralkyl group having 7 to 12 carbon atoms (eg, benzyl group, phenethyl group). Group, 3-phenylpropyl group, naphthylmethyl group, 2-naphthylethyl group, chlorobenzyl group, bromobenzyl group, methylbenzyl group, ethylbenzyl group, methoxybenzyl group, dimethylbenzyl group, dimethoxybenzyl group, etc.), carbon number 5-8 optionally substituted alicyclic groups (eg, cyclohexyl group, 2-cyclohexylethyl group, 2-cyclopentylethyl group, etc. An optionally substituted aromatic group having 6 to 12 carbon atoms (eg, phenyl group, naphthyl group, tolyl group, xylyl group, propylphenyl group, butylphenyl group, octylphenyl group, dodecylphenyl group, methoxyphenyl group, Ethoxyphenyl group, butoxyphenyl group, decyloxyphenyl group, chlorophenyl group, dichlorophenyl group, bromophenyl group, cyanophenyl group, acetylphenyl group, methoxycarbonylphenyl group, ethoxycarbonylphenyl group, butoxycarbonylphenyl group, acetamidophenyl group, Propioamidophenyl group, dodecyloylamidophenyl group, etc.).
【0135】更に好ましくは、一般式(III)におい
て、D1 は−COO−、−OCO−、−CH2 OCO
−、−CH2 COO−、−O−、−CONH−、−SO
2 NH−又は−C6 H4 −を表す。More preferably, in the general formula (III), D 1 is -COO-, -OCO-, -CH 2 OCO.
-, - CH 2 COO -, - O -, - CONH -, - SO
2 NH- or -C 6 H 4 - represents a.
【0136】更には、式(III)に示される重合体成
分とともに該Aブロック中に含有され得る重合体成分と
して、該式(III)の重合体成分と共重合しうる他の
繰り返し単位に相当する単量体、例えばアクリロニトリ
ル、メタクリロニトリル、複素環ビニル類(例えばビニ
ルピリジン、ビニルイミダゾール、ビニルピロリドン、
ビニルチオフェン、ビニルピラゾール、ビニルジオキサ
ン、ビニルオキサジン等)等が挙げられる。これら他の
単量体はAブロックの全重合体成分100重量部中20
重量部を超えない範囲で用いられる。Further, as a polymer component which can be contained in the A block together with the polymer component represented by the formula (III), it corresponds to another repeating unit copolymerizable with the polymer component represented by the formula (III). Monomers, such as acrylonitrile, methacrylonitrile, heterocyclic vinyls (eg vinyl pyridine, vinyl imidazole, vinyl pyrrolidone,
Vinyl thiophene, vinyl pyrazole, vinyl dioxane, vinyl oxazine, etc.) and the like. These other monomers are 20 parts in 100 parts by weight of the total polymer component of the A block.
It is used within the range of not exceeding parts by weight.
【0137】次にスター型共重合体〔B〕の高分子鎖を
構成するBブロック成分について詳しく説明する。ブロ
ックBを構成する特定の極性基を含有する重合成分の具
体例としては、前記した樹脂〔A〕の特定の極性基を含
有する重合体成分と同様のものを挙げることができる。Next, the B block component constituting the polymer chain of the star type copolymer [B] will be described in detail. Specific examples of the polymer component containing a specific polar group that constitutes the block B include the same as the polymer component containing a specific polar group of the resin [A] described above.
【0138】上記の如き特定の極性基を含有する重合成
分は該Bブロック中に2種以上含有されていてもよく、
その場合における該2種以上の極性基含有成分は該Aブ
ロック中においてランダム共重合又はブロック共重合の
いずれの態様で含有されていてもよい。Two or more kinds of the polymerization component containing a specific polar group as described above may be contained in the B block,
In that case, the two or more polar group-containing components may be contained in the A block in any of random copolymerization and block copolymerization.
【0139】また、上記極性基含有の重合体成分以外の
重合体成分をブロックB中に含有していてもよく、かか
る重合体成分としては好ましくは前記一般式(I)及び
(III)の繰り返し単位に相当する重合体成分、更に
はその他の成分として記載したものと同様のものが挙げ
られる。Further, a polymer component other than the above-mentioned polar group-containing polymer component may be contained in the block B, and such a polymer component is preferably a repeating unit of the above general formulas (I) and (III). The polymer component corresponding to the unit, and the same components as those described as other components can be mentioned.
【0140】一方、本発明に従う、高分子鎖を少なくと
も3本以上結合して成る有機分子としては、該分子の分
子量が1000以下のものであれば特に限定されるもの
ではない。例をあげれば、化39等の3価の炭化水素残
基が挙げられる。On the other hand, the organic molecule according to the present invention formed by bonding at least three polymer chains is not particularly limited as long as the molecular weight of the molecule is 1,000 or less. Examples include trivalent hydrocarbon residues such as Chemical formula 39.
【0141】[0141]
【化39】 [Chemical Formula 39]
【0142】(ここで、r1 〜r6 は水素原子又は炭化
水素基を表す。但しr1 及びr2 又はr3 〜r6 のうち
少なくとも1つは高分子鎖に連結する。) これらの有機残基は単独又はこれらの任意の組み合わせ
の構成からなり、組み合わせの場合は、−O−、−S
−、−N(r7 )−、−COO−、−CON(r7 )
−、−SO2 −、−SO2 N(r7 )−(ここでr7 は
それぞれ水素原子又は炭化水素基を表す),−NHCO
O−、−NHCONH−,酸素原子、イオウ原子、窒素
原子等のヘテロ原子含有の複素環基(例えば、チオフェ
ン環、ピリジン環、ピラン環、イミダゾ−ル環、ベンゾ
イミダゾ−ル環、フラン環、ピペリジン環、ピラジン
環、ピロ−ル環、ピペラジン環等)等の結合単位の組み
合わせを含んでいてもよい。(Here, r 1 to r 6 represent a hydrogen atom or a hydrocarbon group, provided that at least one of r 1 and r 2 or r 3 to r 6 is linked to the polymer chain.) The organic residue is composed of one or a combination of any of these, and in the case of a combination, -O-, -S
-, - N (r 7) -, - COO -, - CON (r 7)
-, - SO 2 -, - SO 2 N (r 7) - ( wherein each represent r 7 hydrogen atom or a hydrocarbon group), - NHCO
O-, -NHCONH-, a heterocyclic group containing a hetero atom such as an oxygen atom, a sulfur atom and a nitrogen atom (for example, a thiophene ring, a pyridine ring, a pyran ring, an imidazole ring, a benzimidazole ring, a furan ring, A piperidine ring, a pyrazine ring, a pyrrole ring, a piperazine ring, etc.) and the like.
【0143】他の該高分子鎖を結合する有機分子として
は、化40又は化41と上記結合単位との組み合わせか
ら構成されるものが挙げられる。しかしながら、本発明
に従う有機分子の具体例としては、これらに限定される
ものではない。Other organic molecules which bond the polymer chains include those formed by a combination of Chemical formula 40 or Chemical formula 41 and the above-mentioned bonding unit. However, specific examples of the organic molecule according to the present invention are not limited to these.
【0144】[0144]
【化40】 [Chemical 40]
【0145】[0145]
【化41】 [Chemical 41]
【0146】本発明のスター型共重合体〔B〕は、従来
公知の極性基含有で且つ重合性二重結合基をもつ単量体
のスター型ポリマーの合成法を利用して合成することが
できる。例えばその一つとしてカルバニオンを開始剤と
する重合反応が挙げられる。具体的には、M.Mort
on、T.E.Helminiak etal、J.P
olym.Sci.、57、471(1962)、B.
GordonIII、M.Blumenthal、J.
E.Loftus、etal、Polym.Bul
l.、11、349(1984)、R.B.Bate
s、W.A.Beavers、etal、J.Org.
Chem.、44、3800(1979)に記載の方法
に従って合成できる。The star type copolymer [B] of the present invention can be synthesized by utilizing a conventionally known method for synthesizing a star type polymer of a monomer containing a polar group and having a polymerizable double bond group. it can. For example, one of them is a polymerization reaction using carbanion as an initiator. Specifically, M. Mort
on, T.W. E. Helminiak et al. P
olym. Sci. 57, 471 (1962), B.I.
Gordon III, M .; Blumenthal, J. et al.
E. Loftus, et al, Polym. Bul
l. 11, 349 (1984), R.I. B. Bate
S.W. A. Beavers, et al. Org.
Chem. , 44, 3800 (1979).
【0147】但し、本反応を用いる際には、本発明の
「特定の極性基」は、保護した官能基として用いて重合
させた後、保護基の脱離を行う。これらの、本発明の特
定の極性基の保護基による保護及びその保護基の脱離
(脱保護反応)については、従来公知の知見を利用して
容易に行なうことができる。例えば前記引用文献にも種
々記載されており、更には、岩倉義男、栗田恵輔、「反
応性高分子」(株)講談社刊(1977年)、T.W.
Greene、「Protective Groups
in Organic Synthesis」,Jo
hnWiley & Sons(1981年)、J.
F.W.McOmie、「Protective Gr
oups in Organic Chemistr
y」Plenum Press、(1973年)等の総
説に詳細に記載されている方法を適宜選択して行なうこ
とができる。However, when this reaction is used, the "specific polar group" of the present invention is used as a protected functional group and polymerized, and then the protective group is eliminated. The protection of the specific polar group of the invention with a protecting group and the elimination of the protecting group (deprotection reaction) can be easily carried out by utilizing the conventionally known knowledge. For example, various references are given in the above cited document, and further, Yoshio Iwakura, Keisuke Kurita, "Reactive Polymer" Kodansha Co., Ltd. (1977), T.S. W.
Greene, "Protective Groups
in Organic Synthesis ”, Jo
hnWiley & Sons (1981), J. Am.
F. W. McOmie, "Protective Gr
oops in Organic Chemistr
The method described in detail in the review article such as "y" Plenum Press, (1973) can be appropriately selected and performed.
【0148】他の方法としては、本発明の特定の極性基
を保護しないままの単量体を用い、ジシオカーバメント
基を含有する化合物及び/又はザンテート基を含有する
化合物を開始剤として、光照射下に重合反応を行なって
合成することもできる。例えば、大津隆行、高分子、3
7,248(1988)、檜森俊一、大津隆一、Pol
ym.Rep.Jap.37.3508(1988)、
特開昭64−111号、特開昭64−26619号、東
信行等、Polymer Preprints、Jap
an、36、(6)、1511(1987)、M.Ni
wa、N.Higashi、etal、J.Macro
mol.Sci.Chem.A24(5)、567(1
987)等に記載の合成方法に従って合成することがで
きる。As another method, a monomer of the present invention which does not protect a specific polar group is used, and a compound containing a dithiocarbament group and / or a compound containing a xanthate group is used as an initiator. It can also be synthesized by performing a polymerization reaction under light irradiation. For example, Takayuki Otsu, Polymer, 3
7 , 248 (1988), Shunichi Hinomori, Ryuichi Otsu, Pol
ym. Rep. Jap. 37 . 3508 (1988),
JP-A-64-111, JP-A-64-26619, Nobuyuki Higashi, etc., Polymer Preprints, Jap
an, 36 , (6), 1511 (1987), M.A. Ni
wa, N.W. Higashi, et al. Macro
mol. Sci. Chem. A24 (5), 567 (1
987) and the like.
【0149】本発明の光導電層に供される結着樹脂とし
て、本発明の樹脂〔A〕及び樹脂〔B〕以外に前記した
無機光導電体用の公知の樹脂を併用することもできる。
但し、これらの他の樹脂の使用割合は、全結着樹脂10
0重量部中30重量部を越えない範囲が好ましい。この
割合を越えると、本発明の効果は著しく低下してしま
う。As the binder resin used for the photoconductive layer of the present invention, in addition to the resins [A] and [B] of the present invention, known resins for inorganic photoconductors described above can be used in combination.
However, the proportion of these other resins used is the total amount of the binder resin 10
A range not exceeding 30 parts by weight in 0 parts by weight is preferable. If this ratio is exceeded, the effect of the present invention will be significantly reduced.
【0150】併用可能な他の樹脂としては例えば、代表
的なものは塩化ビニル−酢酸ビニル共重合体、スチレン
−ブタジエン共重合体、スチレン−メタクリレート共重
合体、メタクリレート共重合体、アクリレート共重合
体、酢酸ビニル共重合体、ポリビニルブチラール、アル
キド樹脂、シリコーン樹脂、エポキシ樹脂、エポキシエ
ステル樹脂、ポリエステル樹脂等である。Typical other resins that can be used in combination are, for example, vinyl chloride-vinyl acetate copolymer, styrene-butadiene copolymer, styrene-methacrylate copolymer, methacrylate copolymer, acrylate copolymer. , Vinyl acetate copolymer, polyvinyl butyral, alkyd resin, silicone resin, epoxy resin, epoxy ester resin, polyester resin and the like.
【0151】具体的には、柴田隆治・石綿次郎「高分
子」第17巻、第278頁(1968年)、宮本晴視・
武井英彦「イメージング」1973(No.8)第9
頁、中村孝一編「絶縁材料用バインダーの実際技術」第
10章、C.H.C.出版(1985年刊)、D.D.
Tatt、S.C.Heidecker、Tappi、
49(No.10)、439(1966)、E.S.B
altazzi、R.G.Blanclotte et
al、Photo.Sci.Eng.16(No.
5)、354(1972)、グエン・チャン・ケー、清
水 勇、井上英一、電子写真学会誌18(No.2)、
28(1980)、特公昭50−31011号、特開昭
53−54027号、同54−20735号、同57−
202544号、同58−68046号各号公報等に開
示の樹脂が挙げられる。Specifically, Ryuji Shibata and Jiro Ishiwata, “Polymer”, Vol. 17, p. 278 (1968), Harumi Miyamoto.
Hidehiko Takei "Imaging" 1973 (No.8) 9th
P., Koichi Nakamura, "Practical Technology of Binders for Insulating Materials," Chapter 10, C.I. H. C. Published (1985), D.M. D.
Tatt, S. C. Heidecker, Tappi,
49 (No. 10), 439 (1966), E.I. S. B
Altazzi, R .; G. Blanklotte et
al, Photo. Sci. Eng. 16 (No.
5), 354 (1972), Nguyen Chan Kay, Isamu Shimizu, Eiichi Inoue, The Institute of Electrophotography 18 (No. 2),
28 (1980), JP-B-50-31011, JP-A-53-54027, 54-20735, 57-.
The resins disclosed in JP-A-202544 and JP-A-58-68046 are cited.
【0152】本発明の光導電層において用いられる結着
樹脂の総量は、無機光導電体100重量部に対して、1
0重量部〜100重量部であることが好ましく、より好
ましくは15重量部〜50重量部である。The total amount of the binder resin used in the photoconductive layer of the present invention is 1 with respect to 100 parts by weight of the inorganic photoconductor.
The amount is preferably 0 to 100 parts by weight, more preferably 15 to 50 parts by weight.
【0153】本発明の樹脂〔A〕と樹脂〔B〕の使用割
合は、樹脂〔A〕/樹脂〔B〕の重量比で0.05〜
0.8/0.95〜0.20であることが好ましく、よ
り好ましくは0.10〜0.50/0.90〜0.50
である。The ratio of the resin [A] and the resin [B] used in the present invention is from 0.05 to 0.05 in terms of the resin [A] / resin [B] weight ratio.
It is preferably 0.8 / 0.95 to 0.20, more preferably 0.10 to 0.50 / 0.90 to 0.50.
Is.
【0154】結着樹脂の総量比が10重量部以下となる
と、光導電層の膜強度が維持できなくなる。又100重
量部以上になると、静電特性が低下し、実際の撮像性に
おいても複写画像の悪化を生じてしまう。If the total amount ratio of the binder resin is 10 parts by weight or less, the film strength of the photoconductive layer cannot be maintained. On the other hand, when the amount is 100 parts by weight or more, the electrostatic characteristics are deteriorated and the copy image is deteriorated in the actual image pickup property.
【0155】又、本発明の樹脂〔A〕と樹脂〔B〕の使
用割合において樹脂〔A〕の重量比が0.05以下にな
ると、静電特性向上の効果が薄れてしまう。一方0.8
以上になると光導電層の膜強度が充分維持できなくなる
場合(特に電子写真式平版印刷用原版として)が生じ
る。Further, when the weight ratio of the resin [A] to the resin [A] and the resin [B] used in the present invention is 0.05 or less, the effect of improving the electrostatic characteristics is diminished. On the other hand, 0.8
If the above is the case, the film strength of the photoconductive layer cannot be sufficiently maintained (particularly as an electrophotographic lithographic printing plate precursor).
【0156】本発明に使用する無機光導電材料として
は、酸化亜鉛、酸化チタン、硫化亜鉛、硫化カドミウ
ム、炭酸カドミウム、セレン化亜鉛、セレン化カドミウ
ム、セレン化テルル、硫化鉛等が挙げられる。Examples of the inorganic photoconductive material used in the present invention include zinc oxide, titanium oxide, zinc sulfide, cadmium sulfide, cadmium carbonate, zinc selenide, cadmium selenide, tellurium selenide and lead sulfide.
【0157】本発明に使用する分光増感色素としては、
必要に応じて各種の色素を単独又は併用して用いる。例
えば、宮本晴視、武井英彦、イメージング1973(N
o.8)第12頁、C.J.Young等、RCA R
eview 15、469(1054)、清田航平等、
電気通信学会論文誌J63 −C(No.2)、97
(1980)、原崎勇次等、工業科学雑誌6678及び
188(1963)、谷忠昭、日本写真学会誌35、2
08(1972)等の総説引例のカーボニウム系色素、
ジフェニルメタン色素、トリフェニルメタン色素、キサ
ンテン系色素、フタレイン系色素、ポリメチン色素(例
えば、オキソノール色素、メロシアニン色素、シアニン
色素、ロダシアニン色素、スチリル色素等)、フタロシ
アニン色素(金属を含有してもよい)等が挙げられる。The spectral sensitizing dye used in the present invention includes
If necessary, various dyes are used alone or in combination. For example, Harumi Miyamoto, Hidehiko Takei, Imaging 1973 (N
o. 8) Page 12, C.I. J. Young et al., RCA R
view 15 , 469 (1054), Kyohei Kiyota,
IEICE Transactions J63 - C (No. 2 ), 97
(1980), Yuji Harasaki et al., Industrial Science Magazines 66 78 and 188 (1963), Tadaaki Tani, Journal of the Photographic Society of Japan 35 , 2
08 (1972) and other general reference carbonium dyes,
Diphenylmethane dye, triphenylmethane dye, xanthene dye, phthalein dye, polymethine dye (for example, oxonol dye, merocyanine dye, cyanine dye, rhodacyanine dye, styryl dye, etc.), phthalocyanine dye (may contain metal), etc. Is mentioned.
【0158】更に具体的には、カーボニウム系色素、ト
リフェニルメタン色素、キサンテン系色素、フタレイン
系色素を中心に用いたものとしては、特公昭51−45
2号、特開昭50−90334号、同50−11422
7号、同53−39130号、同53−82353号、
米国特許第3,052,540号、同4,054,45
0号、特開昭57−16456号等に記載のものが挙げ
られる。More specifically, those mainly containing carbonium dyes, triphenylmethane dyes, xanthene dyes, and phthalein dyes are described in JP-B-51-45.
No. 2, JP-A Nos. 50-90334 and 50-11422.
No. 7, No. 53-39130, No. 53-82353,
U.S. Pat. Nos. 3,052,540 and 4,054,45
No. 0, those described in JP-A-57-16456, and the like.
【0159】オキソノール色素、メロシアニン色素、シ
アニン色素、ロダシアニン色素等のポリメチン色素とし
ては、F.M.Harmmer 「The Cyani
neDyes and Related Compou
nd」等に記載の色素類が使用可能であり、更に具体的
には、米国特許第3,047,384号、同3,11
0,591号、同3,121,008号、同3,12
5,447号、同3,128,179号、同3,13
2,942号、同3,622,317号、英国特許第
1,226,892号、同1,309,274号、同
1,405,898号、特公昭48−7814号、同5
5−18892号等に記載の色素が挙げられる。Examples of polymethine dyes such as oxonol dyes, merocyanine dyes, cyanine dyes and rhodacyanine dyes include F.I. M. Harmmer "The Cyani
neDyes and Related Compou
The dyes described in "nd" and the like can be used, and more specifically, U.S. Pat. Nos. 3,047,384 and 3,11.
0,591, 3,121,008, 3,12
No. 5,447, No. 3,128,179, No. 3,13
2,942, 3,622,317, British Patents 1,226,892, 1,309,274, 1,405,898, Japanese Patent Publication Nos. 48-7814, 5
Examples thereof include dyes described in No. 5-18892.
【0160】更に700nm以上の長波長の近赤外〜赤
外光域を分光増感するポリメチン色素として、特開昭4
7−840号、同47−44180号、特公昭51−4
1061号、特開昭49−5034号、同49−451
22号、同57−46245号、同56−35141
号、同57−157254号、同61−26044号、
同61−27551号、米国特許第3,619,154
号、同4,175,956号、「Research D
isclosure」1982年、216、第117〜
118頁等に記載のものが挙げられる。本発明の感光体
は種々の増感色素を併用させても、その性能が増感色素
により変動しにくい点において優れている。更には、必
要に応じて、化学増感剤等の従来知られている電子写真
感光層用各種添加剤を併用することもできる。例えば、
前記した総説:イメージング1973(No.8)第1
2頁等の総説引例の電子受容性化合物(例えば、ハロゲ
ン、ベンゾキノン、クロラニル、酸無水物有機カルボン
酸等)、小門宏等、「細菌の光導電材料と感光体の開発
・実用化」第4章〜第6章・日本科学情報(株)出版部
(1986年)の総説引例のポリアリールアルカン化合
物、ヒンダートフェノール化合物、p−フェニレンジア
ミン化合物等が挙げられる。Further, as a polymethine dye for spectrally sensitizing near-infrared to infrared light region having a long wavelength of 700 nm or more, Japanese Patent Application Laid-Open Publication No. 4 (1999) -43
No. 7-840, No. 47-44180, Japanese Patent Publication No. 51-4
1061, JP-A-49-5034, and JP-A-49-451.
No. 22, No. 57-46245, No. 56-35141.
No. 57-157254, No. 61-26044,
No. 61-27551, U.S. Pat. No. 3,619,154.
No. 4,175,956, "Research D
isclosure ", 1982, 216, 117-
Examples thereof include those described on page 118. The photoconductor of the present invention is excellent in that its performance does not easily change depending on the sensitizing dye even when various sensitizing dyes are used in combination. Furthermore, if necessary, various conventionally known additives for electrophotographic photosensitive layers such as chemical sensitizers may be used in combination. For example,
Review Article: Imaging 1973 (No. 8) No. 1
Electron-accepting compounds (for example, halogen, benzoquinone, chloranil, acid anhydride organic carboxylic acid, etc.) in the review article on page 2, etc., Hiroshi Komon, et al., "Development and practical application of bacterial photoconductive materials and photoconductors" Chapters 4 to 6 • Polyarylalkane compounds, hindered phenol compounds, p-phenylenediamine compounds, and the like, which are the reference examples of the Japanese Science Information Publishing Co., Ltd. (1986).
【0161】これら各種添加剤の添加量は、特に限定的
ではないが、通常光導電体100重量部に対して0.0
001〜2.0重量部である。光導電層の厚さは1〜1
00μ、特に10〜50μが好適である。The addition amount of these various additives is not particularly limited, but usually 0.0 to 100 parts by weight of the photoconductor.
001 to 2.0 parts by weight. The thickness of the photoconductive layer is 1 to 1
00μ, particularly 10 to 50μ is suitable.
【0162】また、電荷発生層と電荷輸送層の積層型感
光体の電荷発生層として光導電層を使用する場合は電荷
発生層の厚さは0.01〜1μ、特に0.05〜0.5
μが好適である。When the photoconductive layer is used as the charge generation layer of the laminated type photoreceptor having the charge generation layer and the charge transport layer, the thickness of the charge generation layer is 0.01 to 1 .mu.m, particularly 0.05 to 0. 5
μ is preferred.
【0163】感光体の保護および耐久性、暗減衰特性の
改善等を主目的として絶縁層を付設させる場合もある。
この時は絶縁層は比較的薄く設定され、感光体を特定の
電子写真プロセスに用いる場合に設けられる絶縁層は比
較的厚く設定される。In some cases, an insulating layer may be additionally provided for the purpose of protecting the photoreceptor and improving durability and dark decay characteristics.
At this time, the insulating layer is set to be relatively thin, and the insulating layer provided when the photoconductor is used in a specific electrophotographic process is set to be relatively thick.
【0164】後者の場合、絶縁層の厚さは、5〜70
μ、特には、10〜50μに設定される。積層型感光体
の電荷輸送材料としてはポリビニルカルバゾール、オキ
サゾール系色素、ピラゾリン系色素、トリフェニルメタ
ン系色素などがある。電荷輸送層の厚さとしては5〜4
0μ、特には10〜30μが好適である。In the latter case, the insulating layer has a thickness of 5 to 70.
It is set to μ, particularly 10 to 50 μ. Examples of the charge transport material of the laminated type photoreceptor include polyvinyl carbazole, oxazole dyes, pyrazoline dyes, triphenylmethane dyes and the like. The thickness of the charge transport layer is 5 to 4
0 μ, particularly 10 to 30 μ is suitable.
【0165】絶縁層あるいは電荷輸送層の形成に用いる
樹脂としては、代表的なものは、ポリスチレン樹脂、ポ
リエステル樹脂、セルロース樹脂、ポリエーテル樹脂、
塩化ビニル樹脂、酢酸ビニル樹脂、塩ビー酸ビ共重合体
樹脂、ポリアクリル樹脂、ポリオレフィン樹脂、ウレタ
ン樹脂、ポリエステル樹脂、エポキシ樹脂、メラミン樹
脂、シリコン樹脂の熱可塑性樹脂及び効果性樹脂が適宜
用いられる。Typical resins used for forming the insulating layer or the charge transport layer are polystyrene resin, polyester resin, cellulose resin, polyether resin,
Thermoplastic resin and effective resin such as vinyl chloride resin, vinyl acetate resin, vinyl chloride vinyl chloride copolymer resin, polyacrylic resin, polyolefin resin, urethane resin, polyester resin, epoxy resin, melamine resin, and silicone resin are appropriately used. ..
【0166】本発明による光導電層は、従来公知の支持
体上に設けることができる。一般に云って電子写真感光
層の支持体は、導電性であることが好ましく、導電性支
持体としては、従来と全く同様、例えば、金属、紙、プ
ラスチックシート等の基本に低抵抗性物質を含浸させる
などして導電処理したもの、基本の裏面(感光層を設け
る面と反対面)に導電性を付与し、更にはカール防止を
図る等の目的で少なくとも1層以上をコートしたもの、
前記支持体の表面に耐水性接着層を設けたもの、前記支
持体の表面層に必要に応じて少なくとも1層以上のプレ
コート層が設けられたもの、Al等を蒸着した基体導電
化プラスチックを紙にラミネートしたもの等が使用でき
る。The photoconductive layer according to the present invention can be provided on a conventionally known support. Generally speaking, the support of the electrophotographic photosensitive layer is preferably conductive, and as the conductive support, just as in the conventional case, for example, metal, paper, plastic sheet or the like is basically impregnated with a low resistance substance. Conductive treated by, for example, a basic back surface (surface opposite to the surface on which the photosensitive layer is provided) to have conductivity, and at least one layer coated for the purpose of preventing curling,
Paper having a water-resistant adhesive layer provided on the surface of the support, one having at least one precoat layer provided on the surface layer of the support as required, and a substrate made of electroconductive plastic such as Al vapor-deposited into paper. Those laminated to can be used.
【0167】具体的に、導電性基体あるいは導電化材料
の例としては、坂本幸男、電子写真、14(No.
1)、P2〜11(1975)、森賀弘之、「入門特殊
紙の化学」高分子刊行会(1975)、M.F.Hoo
ver,J.Macromol.Sci.Chem.A
−4(6)、第1327〜第1417頁(1970)等
に記載されているもの等を用いる。Specifically, as examples of the conductive substrate or the conductive material, Yukio Sakamoto, Electrophotography, 14 (No.
1), P2-11 (1975), Hiroyuki Moriga, "Introduction to Special Paper Chemistry", Polymer Publishing (1975), M.P. F. Hoo
ver., J. Macromol. Sci. Chem. A
-4 (6), 1327 to 1417 (1970) and the like are used.
【0168】本発明の電子写真感光体は、従来公知のあ
らゆる電子写真プロセスを利用した用途において利用す
ることができる。即ち、本発明の感光体はPPC方式お
よびCPC方式のいずれの記録方式にも利用でき、又、
現像剤として乾式現像剤あるいは液体現像剤のいずれの
組合せにも用いることができる。The electrophotographic photosensitive member of the present invention can be used in applications utilizing any conventionally known electrophotographic process. That is, the photoconductor of the present invention can be used for both PPC and CPC recording systems, and
As the developer, any combination of a dry developer and a liquid developer can be used.
【0169】特に、高精細なオリジナルの忠実な複写画
像形成が可能なことから、液体現像剤との組合せで利用
すると、本発明の効果がより発揮される。又カラー現像
剤との組合せとすることで、黒白複写画像のみならず、
カラー複写画像にも応用することができる(例えば、滝
沢九郎、「写真工業」33、34(1975年)、安西
正保、「電子通信学会技術研究報告」77、17(19
77年)等に記載の方法)。In particular, since it is possible to form a copy image of a high-definition original faithfully, the effect of the present invention is more exerted when it is used in combination with a liquid developer. Also, by combining with a color developer, not only black and white copy images,
It can also be applied to color reproduction images (for example, Kuro Takizawa, "Photo Industry" 33 , 34 (1975), Masayasu Anzai, "Technical Report of IEICE" 77 , 17 (19).
1977) etc.).
【0170】更に近年の電子写真プロセスを利用した他
の用途への利用のシステムにおいても有効である。例え
ば光導電体として光導電性酸化亜鉛を用いた本発明の感
光体は、オフセット平版印刷用原版として、又無公害で
白色度の良好な光導電性酸化亜鉛あるいは光導電性酸化
チタンを用いた感光体は、オフセット印刷プロセスで用
いられる版下用記載材料あるいはカラープループ等に用
いることができる。Further, it is effective in a system used for other purposes using the electrophotographic process in recent years. For example, the photoconductor of the present invention using photoconductive zinc oxide as a photoconductor is used as an offset lithographic printing plate precursor and is made of photoconductive zinc oxide or photoconductive titanium oxide which is pollution-free and has a good whiteness. The photoconductor can be used as an underprinting material used in an offset printing process, a color group, or the like.
【0171】[0171]
【実施例】以下に本発明の実施例を例示するが、本発明
の内容がこれらに限定されるものではない。 〔マクロモノマー(M)の合成〕 マクロモノマーの合成例1:(MM−1) メチルメタクリレート75g、メチルアクリレート25
g、チオグリコール酸5g及びトルエン200gの混合
溶液を、窒素気流下攪拌しながら、温度75℃に加温し
た。2,2′−アゾビスイソブチロニトリル(略称A.
I.B.N.)1.0gを加え、8時間反応した。次に
この反応溶液にグリシジルメタクリレート8g、N,N
−ジメチルドデシルアミン1.0g及びt−ブチルハイ
ドロキノン0.5gを加え、温度100℃にて12時間
攪拌した。冷却後この反応溶液をn−ヘキサン2リット
ル中に再沈し、白色粉末を82g得た。重合体の重量平
均分子量(Mw)は3.8×103 であった。EXAMPLES Examples of the present invention will be illustrated below, but the contents of the present invention are not limited thereto. [Synthesis of macromonomer (M)] Synthesis example of macromonomer 1: (MM-1) 75 g of methyl methacrylate, 25 methyl acrylate
A mixed solution of g, 5 g of thioglycolic acid and 200 g of toluene was heated to a temperature of 75 ° C. while stirring under a nitrogen stream. 2,2'-azobisisobutyronitrile (abbreviation A.
I. B. N. ) 1.0 g was added and reacted for 8 hours. Next, 8 g of glycidyl methacrylate, N, N was added to this reaction solution.
-1.0 g of dimethyldodecylamine and 0.5 g of t-butylhydroquinone were added, and the mixture was stirred at a temperature of 100 ° C for 12 hours. After cooling, the reaction solution was reprecipitated in 2 liters of n-hexane to obtain 82 g of white powder. The weight average molecular weight (Mw) of the polymer was 3.8 × 10 3 .
【0172】[0172]
【化42】 [Chemical 42]
【0173】マクロモノマーの合成例2:(MM−2) ブチルメタクリレート90g、メタアクリル酸10g、
2−メルカプトエタノール4g、テトラヒドロフラン2
00gの混合溶液を窒素気流下温度70℃に加温した。
A.I.B.N. 1.2gを加え、8時間反応した。Synthesis Example 2 of Macromonomer: (MM-2) 90 g of butyl methacrylate, 10 g of methacrylic acid,
2-mercaptoethanol 4 g, tetrahydrofuran 2
00 g of the mixed solution was heated to a temperature of 70 ° C. under a nitrogen stream.
A. I. B. N. 1.2 g was added and reacted for 8 hours.
【0174】次に反応溶液を水浴中で冷却して温度20
℃とし、トリエチルアミン10.2gを加え、メタクリ
ル酸クロライド14.5gを温度25℃以下で攪拌して
滴下した。滴下後そのまま1時間更に攪拌した。その
後、t−ブチルハイドロキノン0.5gを加え温度60
℃に加温し、4時間攪拌した。冷却後、水1リットル中
に攪拌しながら滴下し(約10分間)、そのまま1時間
攪拌して静置後、水をデカンテーションで除去した。水
での洗浄を更に2回行なった後、テトラヒドロフラン1
00mlに溶解し、石油エーテル2リットル中に再沈し
た。沈澱物をデカンテーションで捕集し、減圧下に乾燥
した。得られた粘稠物の収量は65gでMw3.3×1
03 であった。Then, the reaction solution is cooled in a water bath to a temperature of 20.
C., 10.2 g of triethylamine was added, and 14.5 g of methacrylic acid chloride was stirred and added dropwise at a temperature of 25.degree. After dropping, the mixture was further stirred for 1 hour as it was. Then, 0.5 g of t-butyl hydroquinone was added and the temperature was adjusted to 60.
The mixture was heated to ℃ and stirred for 4 hours. After cooling, the mixture was dropped into 1 liter of water with stirring (about 10 minutes), stirred for 1 hour as it was, and allowed to stand, and then water was removed by decantation. After washing with water twice more, tetrahydrofuran 1
It was dissolved in 00 ml and reprecipitated in 2 liters of petroleum ether. The precipitate was collected by decantation and dried under reduced pressure. The obtained viscous product had a yield of 65 g and had a Mw of 3.3 × 1.
It was 0 3 .
【0175】[0175]
【化43】 [Chemical 43]
【0176】マクロモノマーの合成例3:(MM−3) ベンジルメタクリレート95g、2−ホスホノエチルメ
タクリレート5g、2−アミノエチルメルカプタン6g
及びテトラヒドロフラン200gの混合物を、窒素気流
下攪拌下に温度70℃に加温した。Macromonomer Synthesis Example 3: (MM-3) benzyl methacrylate 95 g, 2-phosphonoethyl methacrylate 5 g, 2-aminoethyl mercaptan 6 g
And a mixture of 200 g of tetrahydrofuran were heated to a temperature of 70 ° C. with stirring under a nitrogen stream.
【0177】A.I.B.N. 1.5gを加え4時間
反応させ、更にA.I.B.N.0.5gを加え4時間
反応させた。次に、この反応溶液を温度20℃に冷却
し、アクリル酸無水物10gを加えて温度20〜25℃
で1時間攪拌した。次にt−ブチルハイドロキノン1.
0gを加え温度50〜60℃で4時間攪拌した。冷却
後、水1リットル中に攪拌しながら、この反応混合物を
約10分間で滴下し、そのまま1時間攪拌した後静置し
て、水をデカンテーションで除去した。水での洗浄を更
に2回繰り返した後、テトラヒドロフラン100mlに
溶解し、石油エーテル2リットル中に再沈した。沈澱物
をデカンテーションで捕集し、減圧下に乾燥した。得ら
れた粘稠物の収量は70gでMw6×103 であった。A. I. B. N. 1.5 g was added and the reaction was carried out for 4 hours. I. B. N. 0.5 g was added and reacted for 4 hours. Next, this reaction solution is cooled to a temperature of 20 ° C., 10 g of acrylic anhydride is added, and the temperature is 20 to 25 ° C.
It was stirred for 1 hour. Then t-butyl hydroquinone 1.
0 g was added and the mixture was stirred at a temperature of 50 to 60 ° C. for 4 hours. After cooling, the reaction mixture was added dropwise to water (1 liter) with stirring for about 10 minutes, and the mixture was stirred for 1 hour and allowed to stand, and water was removed by decantation. The washing with water was repeated twice more, then, the residue was dissolved in 100 ml of tetrahydrofuran and reprecipitated in 2 liters of petroleum ether. The precipitate was collected by decantation and dried under reduced pressure. The yield of the obtained viscous product was 70 g, and the Mw was 6 × 10 3 .
【0178】[0178]
【化44】 [Chemical 44]
【0179】マクロモノマーの合成例4:(MM−4) 2−クロロフェニルメタクリレート90g、下記構造
(I)の単量体10g、チオグリコール酸4g及びトル
エン200gの混合溶液を、窒素気流下温度70℃に加
温した。A.I.B.N. 1.5gを加え5時間反応
し、更にA.I.B.N. 0.5gを加え4時間反応
した。次にグリシジルメタクリレート12.4g、N,
N−ジメチルドデシルアミン1.0g及びt−ブチルハ
イドロキノン1.5gを加え温度110℃で8時間反応
した。冷却後この反応混合物をp−トルエンスルホン酸
3g、90vol%テトラヒドロフラン水溶液100m
lに溶液を加え、温度30〜35℃で1時間攪拌した。
水/エタノール〔(1/3)容積地〕混合溶液2リット
ル中に、上記混合物を再沈し、デカンテーションで沈澱
物を捕集した。この沈澱物をテトラヒドロフラン200
mlに溶解しn−ヘキサン2リットル中に再沈し、粉末
58gを得た。Mwは7.6×103 であった。Macromonomer Synthesis Example 4: (MM-4) A mixed solution of 90 g of 2-chlorophenyl methacrylate, 10 g of the monomer of the following structure (I), 4 g of thioglycolic acid and 200 g of toluene was heated at 70 ° C. under a nitrogen stream. Warmed to. A. I. B. N. 1.5 g was added and reacted for 5 hours. I. B. N. 0.5 g was added and reacted for 4 hours. Next, 12.4 g of glycidyl methacrylate, N,
1.0 g of N-dimethyldodecylamine and 1.5 g of t-butylhydroquinone were added and the reaction was carried out at a temperature of 110 ° C. for 8 hours. After cooling, the reaction mixture was added with p-toluenesulfonic acid 3 g, 90 vol% tetrahydrofuran aqueous solution 100 m.
The solution was added to 1 and stirred at a temperature of 30 to 35 ° C. for 1 hour.
The above mixture was reprecipitated in 2 liters of a mixed solution of water / ethanol [(1/3) volume), and the precipitate was collected by decantation. This precipitate was added to tetrahydrofuran 200
It was dissolved in ml and reprecipitated in 2 liters of n-hexane to obtain 58 g of powder. The Mw was 7.6 × 10 3 .
【0180】[0180]
【化45】 [Chemical 45]
【0181】[0181]
【化46】 [Chemical 46]
【0182】マクロモノマーの合成例5:(MM−5) 2,6−ジクロロフェニルメタクリレート95g、3−
(2′−ニトロベンジルオキシスルホニル)プロピルメ
タクリレート5g、トルエン150g及びイソプロピル
アルコール50gの混合溶液を窒素気流下に温度80℃
に加温した。2,2′−アゾビス(2−シアノ吉草酸)
(略称:A.C.V.)5.0gを加え5時間反応し、
更にA.C.V. 1.0gを加えて4時間反応した。
冷却後、メタノール2リットル中にこの反応物を再沈
し、粉末を濾集し、減圧乾燥した。Macromonomer Synthesis Example 5: (MM-5) 2,6-dichlorophenyl methacrylate 95 g, 3-
A mixed solution of 5 g of (2′-nitrobenzyloxysulfonyl) propyl methacrylate, 150 g of toluene and 50 g of isopropyl alcohol was placed under a nitrogen stream at a temperature of 80 ° C.
Warmed to. 2,2'-azobis (2-cyanovaleric acid)
(Abbreviation: ACV) 5.0 g was added and reacted for 5 hours,
Furthermore, A. C. V. 1.0g was added and it reacted for 4 hours.
After cooling, the reaction product was reprecipitated in 2 liters of methanol, the powder was collected by filtration, and dried under reduced pressure.
【0183】上記粉末50g、グリシジルメタクリレー
ト14g、N,N−ジメチルデシルアミン0.6g、t
−ブチルハイドロキノン1.0g及びトルエン100g
の混合物を温度110℃で10時間攪拌した。室温に冷
却後80Wの高圧水銀灯にて、この混合物を攪拌下に1
時間光照射した。その後反応混合物をメタノール1リッ
トル中に再沈し、粉末を濾集・減圧乾燥した。収量34
gでMw7.3×103 であった。50 g of the above powder, 14 g of glycidyl methacrylate, 0.6 g of N, N-dimethyldecylamine, t
-Butyl hydroquinone 1.0 g and toluene 100 g
The mixture was stirred at a temperature of 110 ° C. for 10 hours. After cooling to room temperature, the mixture was stirred with an 80W high pressure mercury lamp for 1 hour.
Irradiated for hours. Then, the reaction mixture was reprecipitated in 1 liter of methanol, and the powder was collected by filtration and dried under reduced pressure. Yield 34
Mw was 7.3 × 10 3 in g.
【0184】[0184]
【化47】 [Chemical 47]
【0185】マクロモノマーの合成例6:(MM−6) エチルメタクリレート80g、N−ビニルピロリドン5
g、トリメチルシリルメタクリレート29g、β−メル
カプトエタノール3g及びテトラヒドロフラン200g
の混合溶液を、窒素気流下攪拌しながら温度70℃に加
温した。これにA.I.B.N. 1gを加え4時間反
応し、更にA.I.B.N. 0.5gを加え4時間反
応した。この反応混合物を冷却し、温度25℃に設定し
た後メタクリル酸6.6 gを加え、これにジカルボキシル
カルボンジイミド(D.C.C.)8g、4−(N,N
−ジメチルアミノ)ピリジン0.2g及び塩化メチレン
20gの混合溶液を温度25〜30℃で滴下し、更にそ
のまま4時間攪拌した。次にこの反応混合物にギ酸10
gを加え1時間攪拌した。析出した不溶物を濾別した
後、濾液をメタノール1リットル中に再沈し油状物を濾
集した。更に、この油状物をテトラヒドロフラン200
gに溶解し、不溶物を濾別後再びメタノール1リットル
中に再沈し、油状物を捕集し乾燥した。収量65gでM
w7×103 であった。Synthesis Example 6 of Macromonomer: (MM-6) 80 g of ethyl methacrylate, 5 of N-vinylpyrrolidone
g, trimethylsilyl methacrylate 29 g, β-mercaptoethanol 3 g and tetrahydrofuran 200 g
The mixed solution of (1) was heated to 70 ° C while stirring under a nitrogen stream. A. I. B. N. 1 g was added and the reaction was carried out for 4 hours. I. B. N. 0.5 g was added and reacted for 4 hours. After the reaction mixture was cooled and the temperature was set to 25 ° C., 6.6 g of methacrylic acid was added, to which 8 g of dicarboxylcarboxylic diimide (D.C.C.) and 4- (N, N) were added.
A mixed solution of 0.2 g of dimethylamino) pyridine and 20 g of methylene chloride was added dropwise at a temperature of 25 to 30 ° C., and the mixture was further stirred as it was for 4 hours. The reaction mixture was then charged with formic acid 10
g was added and the mixture was stirred for 1 hour. The precipitated insoluble matter was filtered off, the filtrate was reprecipitated in 1 liter of methanol, and an oily matter was collected by filtration. Furthermore, this oily substance was added to tetrahydrofuran 200
It was dissolved in g, the insoluble matter was filtered off, and then reprecipitated again in 1 liter of methanol, and an oily matter was collected and dried. Yield 65g M
It was w7 × 10 3 .
【0186】[0186]
【化48】 [Chemical 48]
【0187】〔樹脂〔A〕の合成〕 樹脂〔A〕の合成例1:〔A−1〕 ベンジルメタクリレート70g、マクロモノマー(MM
−1)30g、トルエン150g及びイソプロパノール
50gの混合溶液を、窒素気流下に温度80℃に加温し
た。これにA.C.V. 5gを加え4時間反応させ、
更にA.C.V.0.5gを加え4時間反応させた。得
られた共重合体の重量平均分子量(Mw)は1.0×1
04 であった。[Synthesis of Resin [A]] Synthesis Example 1 of Resin [A] 1: [A-1] 70 g of benzyl methacrylate, macromonomer (MM
-1) A mixed solution of 30 g, 150 g of toluene and 50 g of isopropanol was heated to a temperature of 80 ° C under a nitrogen stream. A. C. V. 5g was added and reacted for 4 hours,
Furthermore, A. C. V. 0.5 g was added and reacted for 4 hours. The weight average molecular weight (Mw) of the obtained copolymer is 1.0 × 1.
It was 0 4 .
【0188】[0188]
【化49】 [Chemical 49]
【0189】樹脂〔A〕の合成例2:〔A−2〕 2−クロロフェニルメタクリレート80g、下記構造に
相当するマクロモノマー(Mw5×103 )20g、β
−メルカプトプロピオン酸3g及びトルエン200gの
混合溶液を窒素気流下に温度75℃に加温した。これ
に、A.I.B.N. 1.5gを加え4時間反応し、
更に0.5gを加え4時間反応させた。得られた共重合
体のMwは8.8×103 であった。Synthesis Example 2 of Resin [A]: [A-2] 80 g of 2-chlorophenyl methacrylate, 20 g of macromonomer (Mw 5 × 10 3 ) corresponding to the following structure, β
-A mixed solution of 3 g of mercaptopropionic acid and 200 g of toluene was heated to a temperature of 75 ° C under a nitrogen stream. In addition to this, I. B. N. 1.5g was added and reacted for 4 hours,
Further, 0.5 g was added and reacted for 4 hours. The Mw of the obtained copolymer was 8.8 × 10 3 .
【0190】[0190]
【化50】 [Chemical 50]
【0191】樹脂〔A〕の合成例3〜9:〔A−3〕〜
〔A−9〕 樹脂〔A〕の合成例において、2−クロロメタクリレー
ト80g、マクロモノマー20gの代わりに、下記表−
Aに相当する各単量体及びマクロモノマーに代えた他は
樹脂〔A〕の合成例2と同様にして各共重合体を製造し
た。各重合体のMwは7.5×103 〜9×103 の範
囲であった。Synthesis Examples 3 to 9 of Resin [A]: [A-3] to
[A-9] In the synthesis example of the resin [A], instead of 2-chloromethacrylate 80 g and macromonomer 20 g, the following table-
Copolymers were produced in the same manner as in Synthesis Example 2 of Resin [A] except that each monomer corresponding to A and the macromonomer were replaced. The Mw of each polymer was in the range of 7.5 × 10 3 to 9 × 10 3 .
【0192】又、用いた各マクロモノマーのMwは3.
5×103 〜5×103 の範囲であった。The Mw of each macromonomer used was 3.
It was in the range of 5 × 10 3 to 5 × 10 3 .
【0193】[0193]
【表2】 [Table 2]
【0194】[0194]
【表3】 [Table 3]
【0195】樹脂〔A〕の合成例10:〔A−10〕 ベンジルメタクリレート70g、マクロモノマー(MM
−4)30g及びトルエン200gの混合溶液を、窒素
気流下温度80℃に加温した。2,2′−アゾビスバレ
ロニトリル(A.I.V.N.)8gを加え3時間反応
し、更にA.I.V.N. 1gを加えて4時間反応し
た。Synthesis Example 10 of Resin [A]: [A-10] 70 g of benzyl methacrylate, macromonomer (MM
-4) A mixed solution of 30 g and 200 g of toluene was heated to a temperature of 80 ° C under a nitrogen stream. 8 g of 2,2'-azobisvaleronitrile (AIVN) was added and reacted for 3 hours. I. V. N. 1 g was added and reacted for 4 hours.
【0196】得られた重合体のMwは8.5×103 で
あった。The Mw of the obtained polymer was 8.5 × 10 3 .
【0197】[0197]
【化51】 [Chemical 51]
【0198】樹脂〔A〕の合成例11:〔A−11〕 2−クロロフェニルメタクリレート60g、マクロモノ
マー(MM−2)35g、2−メトキシエチルメタクリ
レート5g、オクタデシルメタクリレート3g及びトル
エン200gの混合溶液を窒素気流下温度75℃に加温
した。A.I.B.N. 1.0gを加え3時間反応
し、更に、A.I.B.N. 0.5gを加え3時間反
応する操作を2回続けた。Synthesis Example 11 of Resin [A]: [A-11] A mixed solution of 60 g of 2-chlorophenyl methacrylate, 35 g of macromonomer (MM-2), 5 g of 2-methoxyethyl methacrylate, 3 g of octadecyl methacrylate and 200 g of toluene was added with nitrogen. The temperature was raised to 75 ° C. under an air stream. A. I. B. N. 1.0 g was added and the reaction was carried out for 3 hours. I. B. N. The operation of adding 0.5 g and reacting for 3 hours was continued twice.
【0199】冷却後、エーテル1リットル中にこの反応
物を再沈し、沈澱物を捕集・乾燥し、Mw6.5×10
3 の粘稠物を63g得た。After cooling, the reaction product was reprecipitated in 1 liter of ether, the precipitate was collected and dried, and the Mw was 6.5 × 10.
63 g of a viscous product of 3 was obtained.
【0200】[0200]
【化52】 [Chemical 52]
【0201】樹脂〔A〕の合成例12〜19:〔A−1
2〕〜〔A−19〕 樹脂〔A〕の合成例11において、各単量体及びマクロ
モノマーの代わりに下記表−Bに示される重合成分に相
当する各単量体及びマクロモノマーに代えた他は、該合
成例11と同様にして反応して、各重合体を製造した。Synthesis Examples 12 to 19 of Resin [A]: [A-1
2] to [A-19] In Synthesis Example 11 of resin [A], instead of each monomer and macromonomer, each monomer and macromonomer corresponding to the polymerization component shown in Table B below was used. Others were reacted in the same manner as in Synthesis Example 11 to produce each polymer.
【0202】各共重合体のMwは6×103 〜8×10
3 の範囲であった。The Mw of each copolymer is 6 × 10 3 to 8 × 10.
It was in the range of 3 .
【0203】[0203]
【表4】 [Table 4]
【0204】[0204]
【表5】 [Table 5]
【0205】樹脂〔A〕の合成例20:〔A−20〕 2−クロロフェニルメタクリレート70g、マクロモノ
マー(MM−3)30g、チオグリコール酸3.0g及
びトルエン150gの混合溶液を窒素気流下に温度80
℃に加温した。A.I.B.N. 1.0gを加え4時
間反応し、後A.I.B.N. 0.5gを加え2時
間、更にA.I.B.N. 0.3gを加え3時間反応
した。Synthesis Example 20 of Resin [A]: [A-20] A mixed solution of 70 g of 2-chlorophenyl methacrylate, 30 g of macromonomer (MM-3), 3.0 g of thioglycolic acid and 150 g of toluene was heated under a nitrogen stream at a temperature. 80
Warmed to ° C. A. I. B. N. 1.0 g was added and reacted for 4 hours. I. B. N. 0.5 g was added for 2 hours, and A. I. B. N. 0.3 g was added and reacted for 3 hours.
【0206】得られた共重合体のMwは8.5×103
であった。The Mw of the obtained copolymer was 8.5 × 10 3.
Met.
【0207】[0207]
【化53】 [Chemical 53]
【0208】樹脂〔A〕の合成例21〜28:〔A−2
1〕〜〔A−28〕 樹脂〔A〕の合成例20と同様にして、下記表−Cに示
す成分に相当する単量体60g、マクロモノマー40g
及びメルカプト化合物0.04モルを用いて重合反応を
行なった。Synthesis Examples 21 to 28 of Resin [A]: [A-2
1] to [A-28] In the same manner as in Synthesis Example 20 of Resin [A], 60 g of a monomer corresponding to the components shown in Table C below and 40 g of a macromonomer.
And 0.04 mol of the mercapto compound was used to carry out the polymerization reaction.
【0209】得られた共重合体のMwは6×103 〜9
×103 であった。Mw of the obtained copolymer was 6 × 10 3 to 9
It was × 10 3 .
【0210】[0210]
【表6】 [Table 6]
【0211】[0211]
【表7】 [Table 7]
【0212】[0212]
【表8】 [Table 8]
【0213】本発明の樹脂〔A〕の合成例29:〔A−
29〕 2−クロロ−6−メチルフェニルメタクリレート60
g、マクロモノマー(MM−4)25g、メチルアクリ
レート15g、トルエン150g及びイソプロパノール
50gの混合溶液を窒素気流下温度80℃に加温した。
A.C.V. 5gを加え5時間反応し更にA.C.
V. 1.0gを加え4時間反応した。得られた共重合
体のMwは9.8×103 であった。Synthesis Example 29 of Resin [A] of the Present Invention: [A-
29] 2-chloro-6-methylphenyl methacrylate 60
A mixed solution of g, 25 g of macromonomer (MM-4), 15 g of methyl acrylate, 150 g of toluene and 50 g of isopropanol was heated to a temperature of 80 ° C. under a nitrogen stream.
A. C. V. 5 g was added and reacted for 5 hours. C.
V. 1.0 g was added and reacted for 4 hours. The Mw of the obtained copolymer was 9.8 × 10 3 .
【0214】[0214]
【化54】 [Chemical 54]
【0215】〔樹脂〔B〕の合成〕 樹脂〔B〕の合成例:〔B−1〕 メチルメタクリレート74g及び下記構造の開始剤〔I
−1〕12.4gの混合物を、窒素気流下に温度50℃
に加温した。この溶液に400Wの高圧水銀灯で10c
mの距離からガラスフィルターを通して5時間光照射し
光重合した。[Synthesis of Resin [B]] Synthesis Example of Resin [B]: [B-1] 74 g of methyl methacrylate and an initiator of the following structure [I
-1] The mixture of 12.4 g was heated at a temperature of 50 ° C under a nitrogen stream.
Warmed to. 10c of this solution with 400W high pressure mercury lamp
Photopolymerization was carried out by irradiating with light from a distance of m through a glass filter for 5 hours.
【0216】この重合物に、テトラヒドロフラン100
gを加えて溶解し、更にメチルアクリレート25g及び
アクリル酸1.0gを加えた後、窒素気流下に再び温度
50℃に加温した。Tetrahydrofuran 100 was added to this polymer.
g was added and dissolved, 25 g of methyl acrylate and 1.0 g of acrylic acid were further added, and then the mixture was heated again to a temperature of 50 ° C. under a nitrogen stream.
【0217】[0217]
【化55】 [Chemical 55]
【0218】次に、上記と同様にして、光照射を10時
間行なった後、得られた反応物をメタノール2リットル
中に再沈し、沈澱物を捕集し乾燥して、収量78gで重
量平均分子量(Mw:Mwはポリスチレン換算によるG
PC法による値)6×104 の重合体を得た。Then, after irradiating with light for 10 hours in the same manner as described above, the obtained reaction product was reprecipitated in 2 liters of methanol, and the precipitate was collected and dried to obtain a weight of 78 g. Average molecular weight (Mw: Mw is G in terms of polystyrene)
A value of 6 × 10 4 by PC method was obtained.
【0219】[0219]
【化56】 [Chemical 56]
【0220】樹脂〔B〕の合成例2:〔B−2〕 樹脂〔B−1〕の合成例において、開始剤〔I−1〕1
2.4gの代わりに下記構造の開始剤〔I−2〕16.
0gを用いた他は、合成例1と同様の条件で操作した。
得られた重合体の収量は72gでMwは6×104 であ
った。Synthesis Example 2 of Resin [B]: [B-2] In the synthesis example of Resin [B-1], the initiator [I-1] 1
In place of 2.4 g, an initiator [I-2] having the structure shown below 16.
It operated on the same conditions as the synthesis example 1 except having used 0g.
The yield of the obtained polymer was 72 g, and the Mw was 6 × 10 4 .
【0221】[0221]
【化57】 [Chemical 57]
【0222】[0222]
【化58】 [Chemical 58]
【0223】樹脂〔B〕の合成例3〜9:〔B−3〕〜
〔B−9〕 メチルメタクリレート65g及び下記表−Dの開始剤各
0.013モルの混合物を、樹脂〔B〕の合成例1と同
様にして光重合反応を行なった。Synthesis Examples 3 to 9 of Resin [B]: [B-3] to
[B-9] A mixture of 65 g of methyl methacrylate and 0.013 mol of each initiator shown in Table D below was subjected to a photopolymerization reaction in the same manner as in Synthesis Example 1 of Resin [B].
【0224】次にこれにテトラヒドロフラン100gを
加えて溶解し、更に、メチルアクリレート30g、N−
ビニルピロリドン4g及びメタクリル酸1gを加えた
後、合成例1と同様に、光重合及び再沈を行なった。得
られた重合体のMwは5×104 〜8×104 の範囲で
あった。Next, 100 g of tetrahydrofuran was added to and dissolved in this, and further 30 g of methyl acrylate and N-
After adding 4 g of vinylpyrrolidone and 1 g of methacrylic acid, photopolymerization and reprecipitation were carried out in the same manner as in Synthesis Example 1. The Mw of the obtained polymer was in the range of 5 × 10 4 to 8 × 10 4 .
【0225】[0225]
【表9】 [Table 9]
【0226】[0226]
【表10】 [Table 10]
【0227】[0227]
【表11】 [Table 11]
【0228】樹脂〔B〕の合成例10〜15:〔B−1
0〕〜〔B−15〕 樹脂〔B〕の合成例1において、メチルメタクリレー
ト、メチルアクリレート及びアクリル酸の代わりに、表
−Eに記載の重合成分に相当する各単量体を用いた他
は、合成例1と同様の条件で操作して各重合体を得た。
得られた重合体のMwは5×104 〜6×104 の範囲
であった。Synthesis Examples 10 to 15 of Resin [B]: [B-1
0] to [B-15] In Synthesis Example 1 of resin [B], each monomer corresponding to the polymerization component shown in Table-E was used instead of methyl methacrylate, methyl acrylate and acrylic acid. Each polymer was obtained by operating under the same conditions as in Synthesis Example 1.
The Mw of the obtained polymer was in the range of 5 × 10 4 to 6 × 10 4 .
【0229】[0229]
【表12】 [Table 12]
【0230】[0230]
【表13】 [Table 13]
【0231】樹脂〔B〕の合成例16〜21:〔B−1
6〕〜〔B−21〕 メチルアクリレート16.5g、アクリロニトリル2.
5g、アクリル酸1.0g、下記表−Fの開始剤を0.
0072モル及びテトラヒドロフラン20gの混合溶液
を、合成例1と同様にして、光照射を15時間行なっ
た。次に、この反応物に、メチルメタクリレート60
g、メチルアクリレート20g及びテトラヒドロフラン
80gを加えた後合成例1と同様にして重合反応及び再
沈を行なった。得られた重合体のMwは5×104 〜8
×104 の範囲であった。Synthesis Examples 16 to 21 of Resin [B]: [B-1
6] to [B-21] 16.5 g of methyl acrylate, acrylonitrile 2.
5 g, 1.0 g of acrylic acid, and the initiator of the following Table-F were added to 0.5 g.
A mixed solution of 0072 mol and 20 g of tetrahydrofuran was irradiated with light in the same manner as in Synthesis Example 1 for 15 hours. Then, to this reaction product, methyl methacrylate 60 was added.
g, 20 g of methyl acrylate and 80 g of tetrahydrofuran were added, and then a polymerization reaction and reprecipitation were performed in the same manner as in Synthesis Example 1. The Mw of the obtained polymer was 5 × 10 4 to 8
It was in the range of × 10 4 .
【0232】[0232]
【表14】 [Table 14]
【0233】[0233]
【表15】 [Table 15]
【0234】[0234]
【表16】 [Table 16]
【0235】樹脂〔B〕の合成例22〜26:〔B−2
2〕〜〔B−26〕 下記表−Gの重合体成分に相当する単量体及び前記開始
剤〔I−2〕14gの混合物を、窒素気流下温度40℃
に加温し、以下の操作を実施例1と同様にして、光照射
し、5時間重合させた。Synthesis Examples 22 to 26 of Resin [B]: [B-2
2] to [B-26] A mixture of a monomer corresponding to the polymer component shown in Table G below and 14 g of the above initiator [I-2] was added at a temperature of 40 ° C. under a nitrogen stream.
The mixture was heated to, and the following operations were carried out in the same manner as in Example 1 to irradiate with light and polymerize for 5 hours.
【0236】固形物を取り出し、テトラヒドロフラン1
00gに溶解した後、メチルアクリレート25g及びア
クリル酸1.5gを加え、更に窒素気流下温度50℃に
加温し、上記と同様にして光照射して重合させた。得ら
れた反応物をメタノール1リットル中に再沈し、沈澱物
を捕集・乾燥した。各重合体の収量は65〜75gでM
wは5×104 〜7×104 であった。The solid is taken out and tetrahydrofuran 1
After dissolving in 00 g, 25 g of methyl acrylate and 1.5 g of acrylic acid were added, and the mixture was further heated to a temperature of 50 ° C. under a nitrogen stream and irradiated with light to polymerize in the same manner as above. The obtained reaction product was reprecipitated in 1 liter of methanol, and the precipitate was collected and dried. The yield of each polymer is 65-75 g and M
w was 5 × 10 4 to 7 × 10 4 .
【0237】[0237]
【表17】 [Table 17]
【0238】樹脂〔B〕の合成例27〜33:〔B−2
7〕〜〔B−33〕 メチルメタクリレート56g、メチルアクリレート24
g及び下記構造の開始剤〔I−16〕10gの混合物
を、窒素気流下温度40℃に加温後、以下の操作を実施
例1と同様にして、光照射し4時間重合させた。Synthesis Examples 27 to 33 of Resin [B]: [B-2
7] to [B-33] methyl methacrylate 56 g, methyl acrylate 24
A mixture of g and 10 g of the initiator [I-16] having the following structure was heated to a temperature of 40 ° C. under a nitrogen stream, and the following operations were carried out in the same manner as in Example 1 to irradiate with light for polymerization for 4 hours.
【0239】固形物を、テトラヒドロフラン100gに
溶解した後、下記表−Hの重合成分に相当する各単量体
を加え、更に窒素気流下温度50℃に加温し、上記と同
様にして光照射して重合させた。得られた反応物をメタ
ノール1リットル中に再沈し、沈澱物を捕集・乾燥し
た。各重合体の収量は65〜75gでMwは4×104
〜7×104 であった。After dissolving the solid substance in 100 g of tetrahydrofuran, each monomer corresponding to the polymerization component shown in Table H below was added, and the mixture was further heated to a temperature of 50 ° C. under a nitrogen stream and irradiated with light in the same manner as above. And polymerized. The obtained reaction product was reprecipitated in 1 liter of methanol, and the precipitate was collected and dried. The yield of each polymer was 65 to 75 g, and the Mw was 4 × 10 4.
Was about 7 × 10 4 .
【0240】[0240]
【化59】 [Chemical 59]
【0241】[0241]
【表18】 [Table 18]
【0242】[0242]
【表19】 [Table 19]
【0243】実施例1並びに比較例1及び2 樹脂〔A−7〕8g(固形分量として)、樹脂〔B−
1〕32g(固形分量として)、光導電極酸化亜鉛20
0g下記構造のシアニン色素〔I〕0.018gサリチ
ル酸0.45g及びトルエン300gの混合物をホモジ
ナイザー(日本精機(株)製)中、回転数7×103 r
pmで10分間分散して、感光層形成物を調製し、これ
を導電処理した紙に、乾燥付着量が25g/m2となる
様に、ワイヤーバーで塗布し、110℃で10秒間乾燥
し、ついで暗所で20℃、65%RHの条件下で24時
間放置することにより、電子写真感光材料を作製した。Example 1 and Comparative Examples 1 and 2 8 g of resin [A-7] (as solid content), resin [B-
1] 32 g (as solid content), optical electrode zinc oxide 20
0g Cyanine dye [I] having the following structure 0.018g A mixture of 0.45g salicylic acid and 300g toluene in a homogenizer (manufactured by Nippon Seiki Co., Ltd.), rotation speed 7 × 10 3 r
Dispersion was carried out for 10 minutes at pm to prepare a photosensitive layer-formed product, which was applied to a conductive-treated paper with a wire bar so that the dry adhesion amount was 25 g / m 2, and dried at 110 ° C. for 10 seconds. Then, it was left in the dark at 20 ° C. and 65% RH for 24 hours to prepare an electrophotographic photosensitive material.
【0244】[0244]
【化60】 [Chemical 60]
【0245】比較例1:実施例1において、樹脂〔B−
1〕32gの代わりに下記構造の樹脂〔R−1〕32g
を用いた他は、実施例1と同様に操作して電子写真感光
材料を作製した。Comparative Example 1: In Example 1, the resin [B-
1] 32 g of resin [R-1] having the following structure instead of 32 g
An electrophotographic light-sensitive material was produced in the same manner as in Example 1 except that was used.
【0246】[0246]
【化61】 [Chemical formula 61]
【0247】比較例2:実施例1において、樹脂〔B−
1〕32gの代わりに下記構造の樹脂〔R−2〕32g
とした他は、実施例1と同様に操作して電子写真感光材
料を作製した。Comparative Example 2: In Example 1, the resin [B-
1] 32 g of resin [R-2] having the following structure instead of 32 g
An electrophotographic photosensitive material was prepared in the same manner as in Example 1 except that
【0248】[0248]
【化62】 [Chemical formula 62]
【0249】これらの感光材料について、静電特性、撮
像性及び環境条件(20℃、65%RH)、(30℃、
80%RH)及び(15℃、30%RH)とした時の撮
像性を調べた。With respect to these photosensitive materials, electrostatic characteristics, image pick-up properties and environmental conditions (20 ° C., 65% RH), (30 ° C.,
The image pick-up property at 80% RH) and (15 ° C., 30% RH) was examined.
【0250】以上の結果を表−Iに示す。The above results are shown in Table-I.
【0251】[0251]
【表20】 [Table 20]
【0252】表−Iに示した評価項目の実施の態様は以
下の通りである。 注1)静電特性:温度20℃、65%RHの暗室中で、
各感光材料にペーパーアナライザー(川口電機(株)製
ペーパーアナライザーSP−428型)を用いて−6k
Vで20秒間コロナ放電させた後、10秒間放置し、こ
の時の表面電位V10を測定した。次いでそのまま暗中で
90秒間静置させた後の電位V100 を測定し、90秒間
暗減衰させた後の電位の保持性、即ち、暗減衰保持率
〔DRR(%)〕を(V100 /V10)×100(%)で
求めた。Embodiments of the evaluation items shown in Table-I are as follows. Note 1) Electrostatic characteristics: In a dark room at a temperature of 20 ° C and 65% RH,
-6k using a paper analyzer (Paper analyzer SP-428 type manufactured by Kawaguchi Electric Co., Ltd.) for each light-sensitive material
After corona discharge was performed for 20 seconds at V, the surface potential V 10 at this time was measured after standing for 10 seconds. Then, the potential V 100 after standing still in the dark for 90 seconds was measured, and the potential retention after dark decay for 90 seconds, that is, the dark decay retention rate [DRR (%)] was calculated as (V 100 / V 10 ) × 100 (%).
【0253】又コロナ放電により光導電層表面を−40
0Vに帯電させた後、該光導電層表面をガリウム−アル
ミニウム−ヒ素半導体レーザー(発振波長780nm)
光で照射し、表面電位(V10)が1/10に減衰するま
での時間を求め、これから露光量E1/10(erg/cm
2 )を算出する。又、同様に表面電位(V10)が1/1
00に減衰するまでの時間を求め、これから露光量E
1/10(erg/cm2 )を算出する。測定時の環境条件
は、20℃、65%RH(I)、30℃、80%RH
(II)及び15℃、30%RH(III)で行なった。 注2)撮像性:各感光材料を以下の環境条件で1昼夜放
置した後、各感光材料を−6kVで帯電し、光源として
2.8mW出力のガリウム−アルミニウム−ヒ素、半導
体レーザー(発振波長780nm)を用いて、感光材料
表面上で64erg/cm2 の照射量下、ピッチ25μ
m及びスキャニング速度300m/secのスピード露
光後液体現像剤として、ELP−T(富士写真フイルム
(株)製)を用いて現像し、イソパラフィンアイソパー
G(エッソ化学(株)製)溶媒のリンス液で洗浄後定着
することで得られた複写画像(カブリ、画像の画質)を
目視評価した。Further, the surface of the photoconductive layer was -40 by corona discharge.
After being charged to 0 V, the surface of the photoconductive layer was gallium-aluminum-arsenic semiconductor laser (oscillation wavelength 780 nm).
The time until the surface potential (V 10 ) is attenuated to 1/10 by irradiation with light is calculated, and from this, the exposure amount E 1/10 (erg / cm
2 ) is calculated. Similarly, the surface potential (V 10 ) is 1/1
The time until it decays to 00 is calculated, and the exposure amount E
Calculate 1/10 (erg / cm 2 ). Environmental conditions at the time of measurement are 20 ° C, 65% RH (I), 30 ° C, 80% RH
(II) and 15 ° C., 30% RH (III). Note 2) Imaging property: After leaving each light-sensitive material under the following environmental conditions for one day and night, charge each light-sensitive material at −6 kV, and use 2.8 mW output gallium-aluminum-arsenic as a light source and a semiconductor laser (oscillation wavelength 780 nm). ), A pitch of 25 μm on the surface of the photosensitive material under an irradiation amount of 64 erg / cm 2.
m and a scanning speed of 300 m / sec. After speed exposure, ELP-T (manufactured by Fuji Photo Film Co., Ltd.) was used as a liquid developer, and was developed, and an isoparaffin Isopar G (manufactured by Esso Chemical Co., Ltd.) solvent rinse solution was used. The copied image (fogging, image quality of the image) obtained by fixing after washing with (1) was visually evaluated.
【0254】撮像時の環境条件は20℃65%RH
(I)、30℃80%RH(II)及び15℃、30%R
H(III)で実施した。表−Iに示す様に、本発明の感光
材料は、静電特性が良好で、実際の複写画像も地カブリ
がなく複写画質も鮮明であった。一方比較例1,2は、
環境条件が変化すると、光感度E1/10及びE1/100 の低
下が生じ、実際の複写画像でも細線・文字等のカスレ
や、リンス処理した後でも微かな地カブリが除去されず
に残存してしまった。The environmental conditions at the time of imaging are 20 ° C. and 65% RH.
(I), 30 ° C 80% RH (II) and 15 ° C, 30% R
Performed with H (III). As shown in Table I, the light-sensitive material of the present invention had good electrostatic characteristics, and the actual copied image was free of background fog and the copied image quality was clear. On the other hand, Comparative Examples 1 and 2
If the environmental conditions change, the photosensitivity E 1/10 and E 1/100 will drop, and even in the actual copy image, fine lines, letters, etc. will not be removed, and even after rinsing, slight background fog remains without being removed. have done.
【0255】又、静電特性とは一致しないが、特に環境
条件(II)で、複写原稿の連続階調部分の中間濃度での
ムラ発生が生じてしまい、又環境条件(III)では、ベタ
部に微小の白ヌケが生じた。Although it does not match the electrostatic characteristic, unevenness occurs in the intermediate density of the continuous tone part of the copy original especially under the environmental condition (II). A slight white drop was generated in the area.
【0256】本発明の感光体と比較例の感光体とではE
1/100 値が大きく異なる。E1/100 値は、実際の撮像性
において、露光後、非画像部(既に露光された部位)に
どれだけの電位が残っているかを示すものであり、この
値が小さい程現像後の非画像部の地汚れが生じなくなる
事を示す。When the photoconductor of the present invention and the photoconductor of the comparative example are E
1/100 value is greatly different. The E 1/100 value indicates how much potential remains in the non-image portion (exposed portion) after exposure in the actual image pickup property. It indicates that the image area is free of background stains.
【0257】具体的には−10V以下の残留電位にする
ことが必要となり、即ち実際にはVR −10V以下とす
るために、どれだけ露光量が必要となるかということ
で、半導体レーザー光によるスキャンニング露光方式で
は、小さい露光量でVR を−10V以下にすることは、
複写機の光学系の設計上(装置のコスト、光学系光路の
精度等)非常に重要なことである。Specifically, it is necessary to set the residual potential to −10 V or less, that is, how much exposure dose is required to set V R −10 V or less. In the scanning exposure method according to ( 1), setting VR to −10 V or less with a small exposure amount is
This is very important in designing the optical system of the copying machine (cost of the device, accuracy of optical path of optical system, etc.).
【0258】以上のことより、本発明の樹脂を用いた場
合にのみ静電特性及び撮像性を満足する電子写真感光体
が得られ、特に半導体レーザー光スキャニング露光方式
の感光体システムに優位になることが明らかとなった。 実施例2並びに比較例3及び比較例4 樹脂〔A−23〕6g(固形分量として)、樹脂〔B−
2〕34g(固形分量として)、光導電性酸化亜鉛20
0g、下記構造のメチン色素(II)0.020g、N−
ヒドロキシフタルイミド0.23g及びトルエン300
gの混合物を、実施例1と同様に操作して、電子写真感
光材料を作製した。From the above, an electrophotographic photosensitive member satisfying the electrostatic characteristics and the image pick-up property can be obtained only when the resin of the present invention is used, which is particularly advantageous for a semiconductor laser light scanning exposure type photosensitive system. It became clear. Example 2 and Comparative Examples 3 and 4 6 g of resin [A-23] (as solid content), resin [B-
2] 34 g (as solid content), photoconductive zinc oxide 20
0 g, 0.020 g of methine dye (II) having the following structure, N-
Hydroxyphthalimide 0.23 g and toluene 300
The mixture of g was operated in the same manner as in Example 1 to prepare an electrophotographic photosensitive material.
【0259】[0259]
【化63】 [Chemical 63]
【0260】比較例3:実施例2において、樹脂〔B−
2〕34gの代わりに、下記構造の樹脂〔R−3〕34
gを用いる以外は、実施例2と同様の操作で電子写真感
光材料を作製した。Comparative Example 3: In Example 2, the resin [B-
2] 34 g instead of resin [R-3] 34 having the following structure
An electrophotographic photosensitive material was produced in the same manner as in Example 2 except that g was used.
【0261】[0261]
【化64】 [Chemical 64]
【0262】比較例4:実施例2において、樹脂〔B−
2〕34gの代わりに、下記構造の樹脂〔R−4〕34
gを用いる以外は、実施例2と同様の操作で、電子写真
感光材料を作製した。Comparative Example 4: In Example 2, the resin [B-
2] 34 g instead of resin [R-4] 34 having the following structure
An electrophotographic photosensitive material was produced in the same manner as in Example 2 except that g was used.
【0263】[0263]
【化65】 [Chemical 65]
【0264】この感光材料の皮膜性(表面の平滑度)、
静電特性、撮像性及び環境条件を30℃、80%RH及
び15℃、30%RHとした時の静電特性、撮像性を調
べた。更に、電子写真式平版印刷用原版として用いた時
の印刷性を調べた。The film properties (surface smoothness) of this photosensitive material,
The electrostatic characteristics, the imaging characteristics and the imaging characteristics were examined when the environmental conditions were 30 ° C., 80% RH and 15 ° C., 30% RH. Further, the printability when used as an electrophotographic lithographic printing plate precursor was investigated.
【0265】[0265]
【表21】 [Table 21]
【0266】表−Jに示した評価項目の実施の態様は以
下の通りである。 注3)表面層の平滑性:得られた感光材料は、ベック平
滑度試験機(熊谷理工(株)製)を用い、空気容量1c
cの条件にて、その平滑度(sec/cc)を測定し
た。 注4)光導電層の機械的強度:得られた感光材料表面を
ヘイドン−14型表面性試験材(新東化学(株)製)を
用いて荷重75g/cm2 のものでエメリ−紙(♯10
00)で1000回繰り返し探り摩耗粉を取り除き感光
層の重量減少から残膜率(%)を求め機械的強度とし
た。 注5)生版保水性:各感光材料(製版しないもの)を不
感脂化処理液EPL−EX(富士写真フイルム(株)
製)を蒸留水で5倍に希釈した溶液を用いて、エッチン
グプロセッサーに2回通して光導電層面を不感脂化処理
した後、湿し水として蒸留水を用いて、オフセット印刷
機((株)浜田印刷機械製造所製、611XLA−II
型)にかけ、刷り出しから50枚目の印刷機の地汚れの
程度を評価した(不感脂化処理された原版の保水性の度
合いを調べる強制条件に相当)。 注6)耐刷性:前記注2)の撮像性と同条件にして、製
版して、トナー画像を形成した後、ELP−EXを用い
て、エッチングプロセッサ−に2回通して不感脂化処理
し、これをオフセットマスターとして、オフセット印刷
機(桜井製作所(株)製オリバー52型)にかけ、印刷
物の非画像部の地汚れ及び画像部の画質に問題が生じな
いで印刷できる枚数を示す(印刷枚数が多い程、耐刷性
が良好なことを表わす)。表−Jに示す様に、本発明の
感光材料は、光導電層の平滑性膜の機械的強度及び静電
特性が良好で、実際の複写画像も地カブリがなく複写画
質も鮮明であった。このことは光導電体と結着樹脂が充
分に吸着し、且つ、粒子表面を被覆していることによる
ものと推定される。同様の理由で、オフセットマスター
原版として用いた場合でも不感脂化処理液による不感脂
化処理が充分に進行し、強制条件での保水性を評価して
も充分に親水化され、インキ付着が全く認められなかっ
た。実際に印刷して印刷物の地汚れを観察しても地汚れ
は全く認められず、鮮明な画質の印刷物が1万枚得られ
た。Embodiments of the evaluation items shown in Table-J are as follows. Note 3) Smoothness of surface layer: The obtained light-sensitive material was measured using a Beck's smoothness tester (produced by Kumagai Riko Co., Ltd.) with an air capacity of 1 c.
The smoothness (sec / cc) was measured under the condition of c. Note 4) Mechanical strength of photoconductive layer: The surface of the obtained light-sensitive material was tested with Haydon-14 type surface test material (manufactured by Shinto Chemical Co., Ltd.) under a load of 75 g / cm 2 with emery paper ( # 10
00) was repeated 1000 times to remove the abrasion powder, and the residual film rate (%) was calculated from the weight reduction of the photosensitive layer and defined as the mechanical strength. Note 5) Raw plate water retention: Desensitizing solution EPL-EX (Fuji Photo Film Co., Ltd.)
Solution) was diluted 5 times with distilled water and passed through an etching processor twice to desensitize the surface of the photoconductive layer. Then, distilled water was used as fountain solution to prepare an offset printing machine (( ) Hamada Printing Machine Co., Ltd., 611XLA-II
Then, the degree of background stain of the printing press on the 50th sheet after printing was evaluated (corresponding to the forced condition for examining the degree of water retention of the desensitized original plate). Note 6) Printing durability: Under the same conditions as in Note 2) above, after making a plate to form a toner image, ELP-EX is used to pass twice through an etching processor to desensitize. Then, using this as an offset master, it is applied to an offset printing machine (Oliver 52 type manufactured by Sakurai Mfg. Co., Ltd.) to show the number of prints that can be made without causing scumming in the non-image area of the printed matter and in the image quality of the image area (printing). The larger the number, the better the printing durability.) As shown in Table-J, in the light-sensitive material of the present invention, the smooth film of the photoconductive layer had good mechanical strength and electrostatic properties, and the actual copied image was free of background fog and the copied image quality was clear. .. It is presumed that this is because the photoconductor and the binder resin are sufficiently adsorbed and the particle surface is covered. For the same reason, even when used as an offset master original plate, the desensitizing treatment with the desensitizing treatment liquid proceeds sufficiently, and even if the water retention under the forced condition is evaluated, it is sufficiently hydrophilized, and the ink adhesion does not occur at all. I was not able to admit. Even when the print was actually printed and the print stain was observed, the print stain was not observed at all, and 10,000 prints with clear image quality were obtained.
【0267】一方、比較例3及び比較例4は、撮像時の
条件が過酷になると、非画像部に微かではあるが地汚れ
が発生し、又高精細な連続階調画像部でムラの発生ある
いはベタ画像部の白ヌケ、ムラ等の問題を生じた。On the other hand, in Comparative Example 3 and Comparative Example 4, when the conditions at the time of image pickup are severe, the non-image part is slightly stained, and unevenness is generated in the high-definition continuous tone image part. Alternatively, problems such as white spots and unevenness in the solid image portion occurred.
【0268】又、オフセットマスタ−原版として、不感
脂化処理した生版保水性は、インキ付着が現れた。実際
の耐刷性も、4〜6千枚止まりであった。以上の事は、
本発明の樹脂〔A〕と樹脂〔B〕が適切に酸化亜鉛粒子
と相互作用し、不感脂化処理液による不感脂化反応が容
易に且つ充分に進行し易すい状態を形成している事及び
樹脂〔B〕の働きによる膜強度の著しい向上を達成して
いることを示すものである。 実施例3〜22 実施例2において、樹脂〔A−23〕及び樹脂〔B−
2〕に代えて、下記表−Kの各樹脂〔A〕及び各樹脂
〔B〕に代えた他は、実施例2と同様に操作して、各電
子写真感光体を作製した。Further, in the offset master-original plate, the degreasing-processed plate water retention showed ink adhesion. The actual printing durability was 4 to 6,000 sheets. The above is
The resin [A] and the resin [B] of the present invention properly interact with the zinc oxide particles to form a pan state in which the desensitizing reaction by the desensitizing treatment solution easily and sufficiently proceeds. And that the film strength is remarkably improved by the action of the resin [B]. Examples 3 to 22 In Example 2, the resin [A-23] and the resin [B-
Each electrophotographic photosensitive member was produced in the same manner as in Example 2 except that each resin [A] and each resin [B] shown in Table K below were used instead of 2].
【0269】実施例2と同様にして静電特性を測定し
た。結果を表−Kに示す。The electrostatic characteristics were measured in the same manner as in Example 2. The results are shown in Table-K.
【0270】[0270]
【表22】 [Table 22]
【0271】各感光材料の静電特性及び撮像性を実施例
1と同様にして測定した。いずれの感光材料も静電特性
良好で、又これらの感光材料の実際の撮像性を調べた
所、細線・文字の再現性良好で中間調のムラの発生もな
く、地カブリの全くない鮮明な複写画像のものが得られ
た。The electrostatic characteristics and the image pickup property of each light-sensitive material were measured in the same manner as in Example 1. All of the photosensitive materials have good electrostatic characteristics, and when the actual imaging properties of these photosensitive materials were examined, the reproducibility of fine lines and characters was good, there was no unevenness in the halftone, and there was no clear background fog. A duplicate image was obtained.
【0272】又、オフセットマスター原版として用い
て、実施例2と同様にして印刷した所、いずれも少なく
とも1万枚以上印刷することができた。以上から、本発
明の各感光材料は光導電層の平滑性、膜強度、静電特性
及び印刷性の全ての点において良好なものであった。 実施例23〜26 実施例1において用いた、メチン色素〔I〕の代わりに
下記表−Lの色素に代えた他は、実施例1と同様の条件
で電子写真感光材料を作製した。When used as an offset master original plate and printed in the same manner as in Example 2, at least 10,000 or more sheets could be printed. From the above, each of the light-sensitive materials of the present invention was good in all of the smoothness, film strength, electrostatic properties and printability of the photoconductive layer. Examples 23 to 26 Electrophotographic photosensitive materials were produced under the same conditions as in Example 1 except that the methine dye [I] used in Example 1 was replaced with the dyes shown in Table L below.
【0273】[0273]
【表23】 [Table 23]
【0274】[0274]
【表24】 [Table 24]
【0275】本発明の感光材料は、いずれも帯電性、暗
電荷保持率、光感度に優れ、実際の複写画像も高温・高
湿の(30℃、80%RH)及び低温・低湿の(15
℃、30%RH)の過酷な条件においても、地カブリの
発生のない、鮮明な画像を与えた。 実施例27及び28並びに比較例5 樹脂〔A−1〕(実施例27)又は樹脂〔A−22〕
(実施例28)のいずれか6.5g、樹脂〔B−26〕
33.5g、酸化亜鉛200g、ウラニン0.02g、
下記構造のメチン色素〔VII〕0.03g、下記構造の
メチン色素〔VIII〕0.03g、無水フタル酸0.18
g及びトルエン300gの混合物をホモジナイザー中で
回転数7×103 rpmで8分間分散して感光層形成物
を調整し、これを導電処理した紙に、乾燥付着量が20
g/m2 となる様にワイヤーバーで塗布し、110℃で
20秒間乾燥した。次いで暗所で20℃、65%RHの
条件下で24時間放置することにより各電子写真感光体
を作製した。The light-sensitive materials of the present invention are all excellent in chargeability, dark charge retention rate, and photosensitivity, and actually copied images are high temperature / high humidity (30 ° C., 80% RH) and low temperature / low humidity (15).
Even under severe conditions (° C., 30% RH), a clear image with no background fog was obtained. Examples 27 and 28 and Comparative Example 5 Resin [A-1] (Example 27) or Resin [A-22]
6.5 g of any of (Example 28), resin [B-26]
33.5 g, zinc oxide 200 g, uranine 0.02 g,
0.03 g of methine dye [VII] having the following structure, 0.03 g of methine dye [VIII] having the following structure, 0.18 phthalic anhydride
g and 300 g of toluene were dispersed in a homogenizer at a rotation speed of 7 × 10 3 rpm for 8 minutes to prepare a photosensitive layer-formed product, which was applied to a conductive-treated paper with a dry adhesion amount of 20.
It was coated with a wire bar so as to be g / m 2 and dried at 110 ° C. for 20 seconds. Next, each electrophotographic photosensitive member was prepared by leaving it in the dark at 20 ° C. and 65% RH for 24 hours.
【0276】[0276]
【化66】 [Chemical 66]
【0277】[0277]
【化67】 [Chemical 67]
【0278】比較例5 実施例27において、樹脂〔B−26〕33.5gの代
わりに、下記構造の樹脂〔R−5〕33.5gを用いた
他は、実施例27と同様にして、感光材料を作製した。Comparative Example 5 In the same manner as in Example 27 except that 33.5 g of the resin [R-5] having the following structure was used instead of 33.5 g of the resin [B-26] in Example 27. A photosensitive material was prepared.
【0279】実施例1と同様に、各感光材料の各特性を
調べた。その結果を下記表−Mにまとめた。In the same manner as in Example 1, each characteristic of each photosensitive material was examined. The results are summarized in Table-M below.
【0280】[0280]
【化68】 [Chemical 68]
【0281】[0281]
【表25】 [Table 25]
【0282】上記の測定において、静電特性及び撮像性
については下記の操作に従った他は、実施例1と同様の
操作で行なった。 注7)静電特性のE1/10の測定方法 コロナ放電により光導電層表面を−400Vに帯電させ
た後、該光導電層表面を照度2.0ルックスの可視光で
照射し、表面電位(V10)が1/10に減衰するまでの
時間を求め、これから露光量E1/10(ルックス・秒)を
算出する。 注8)撮像性 各感光材料を以下の環境条件で1昼夜放置した後、全自
動製版機EPL−404V(富士写真フイルム(株)
製)でEPL−Tをトナーとして用いて製版して得られ
た複写画像(カブリ、画像の画質)を目視評価した。撮
像時の環境条件は、20℃65%RH(I)、30℃8
0%RH(II)及び15℃、30%RH(III)で
実施した。但し、複写用の原稿(即ち、版下原稿)に
は、ほかの原稿を切り抜いて、貼り込みを行なって作成
したものを用いた。In the above measurement, the electrostatic properties and the image pickup properties were the same as in Example 1 except that the following operations were performed. Note 7) Method for measuring E 1/10 of electrostatic characteristics After charging the surface of the photoconductive layer to −400 V by corona discharge, the surface of the photoconductive layer was irradiated with visible light having an illuminance of 2.0 lux to obtain the surface potential. The time required for (V 10 ) to decay to 1/10 is calculated, and the exposure dose E 1/10 (lux · sec) is calculated from this. Note 8) Imaging property After leaving each light-sensitive material for 1 day under the following environmental conditions, fully automatic plate-making machine EPL-404V (Fuji Photo Film Co., Ltd.)
Manufactured by EPL-T as a toner, and the copy image (fog, image quality of the image) obtained by plate making was visually evaluated. Environmental conditions at the time of imaging are 20 ° C 65% RH (I), 30 ° C 8
Performed at 0% RH (II) and 15 ° C., 30% RH (III). However, the original for copying (that is, the original copy) was prepared by cutting out and pasting other originals.
【0283】本発明の感光材料は、いずれも光導電層の
機械的強度は良好であったが、比較例5は、これらに比
べて低下した。静電特性は、常温・常湿(I)では、い
ずれも良好な性能を示したが、特に、低温・低湿(II
I)では、E1/10が低下した。In each of the light-sensitive materials of the present invention, the mechanical strength of the photoconductive layer was good, but in Comparative Example 5, it was lower than these. The electrostatic properties showed good performance at room temperature and humidity (I), but especially at low temperature and low humidity (II).
In I), E 1/10 decreased.
【0284】本発明の感光材料の静電特性は良好であ
り、更に、特定の置換基を有する樹脂〔A〕を用いた実
施例28は、非常に良好であり、特にE1/100 の値が小
さくなった。 実際の撮像性を調べて見ると、比較例5
は、複写画像として原稿以外に、切り抜いて貼り込んだ
部分の枠(即ち、貼り込み跡)が非画像部の地汚れとし
て認められた。更に撮像時の環境条件が、高温・高湿
(II)、低温・低湿(III)下で、複写画像の連続
階調部の中間調域にムラの発生、ベタ画像部の白ヌケの
微小のムラの発生等が見られた。The light-sensitive material of the present invention has good electrostatic characteristics, and Example 28 using the resin [A] having a specific substituent is very good, and particularly, the value of E 1/100 . Has become smaller. As a result of examining the actual image pickup property, Comparative Example 5
In addition to the original as a copy image, the frame of the cut-out portion (that is, the trace of attachment) was recognized as the background stain of the non-image portion. Furthermore, when the environmental conditions at the time of image pickup are high temperature / high humidity (II) and low temperature / low humidity (III), unevenness occurs in the halftone region of the continuous tone part of the copy image, and white spots in the solid image part are minute. Occurrence of unevenness was observed.
【0285】更に、これらをオフセット印刷用原版とし
て不感脂化処理して印刷した所、本発明のものはいずれ
も地汚れのない鮮明な画質の印刷物が1万枚得られた。
しかし、比較例5は、上記の貼り込み跡が、不感脂化処
理でも除去されず、刷り出しの印刷物から発生してしま
った。Further, when these were subjected to desensitizing treatment as offset printing original plates and printed, all of the present invention produced 10,000 printed matters with clear image quality without scumming.
However, in Comparative Example 5, the above-mentioned sticking trace was not removed even by the desensitizing treatment, and was generated from the printed matter printed out.
【0286】以上のことより、本発明の感光材料のみ
が、良好な特性を与えることができた。 実施例29 樹脂〔A−7〕5g及び樹脂〔B−8〕35g、酸化亜
鉛200g、ウラニン0.02g、ローズベンガル0.
04g、ブロムフェノールブルー0.03g、無水フタ
ル酸0.40g及びトルエン300gの混合物を、実施
例27と同様に以下操作して、感光材料を作成した。From the above, only the light-sensitive material of the present invention can provide good characteristics. Example 29 Resin [A-7] 5 g and resin [B-8] 35 g, zinc oxide 200 g, uranine 0.02 g, rose bengal 0.
A mixture of 04 g, bromphenol blue 0.03 g, phthalic anhydride 0.40 g and toluene 300 g was treated in the same manner as in Example 27 to prepare a light-sensitive material.
【0287】本発明の感光材料を、実施例27と同様に
操作して各性能を調べた所、いずれも帯電性、暗電荷保
持率、光感度に優れ、実際の複写画像も高温・高湿の
(30℃、80%RH)及び低温・低湿(15℃、30
%RH)の過酷な条件においても、地カブリの発生のな
い、鮮明な画像を与えた。The performance of the light-sensitive material of the present invention was examined in the same manner as in Example 27. As a result, all were excellent in chargeability, dark charge retention rate and photosensitivity. (30 ℃, 80% RH) and low temperature / low humidity (15 ℃, 30
% RH), a clear image with no background fog was obtained even under severe conditions.
【0288】更に、これをオフセットマスターの原版と
して用いて印刷した所、1万枚の所でも鮮明な画質の印
刷物を得た。 実施例30〜53 実施例29において、樹脂〔A−7〕5g及び樹脂〔B
−8〕35gの代わりに、下記表−Nの樹脂〔A〕5g
及び樹脂〔B〕35gを用いた他は、実施例27と同様
にして各感光材料を作製した。Further, when this was used as an original plate of an offset master and printed, a printed matter having clear image quality was obtained even at 10,000 sheets. Examples 30 to 53 In Example 29, 5 g of resin [A-7] and resin [B
-8] 5 g of resin [A] shown in Table N below instead of 35 g
Each photosensitive material was prepared in the same manner as in Example 27 except that 35 g of Resin [B] was used.
【0289】[0289]
【表26】 [Table 26]
【0290】本発明の感光材料はいずれも帯電性、暗電
荷保持率、光感度に優れ、実際の複写画像も高温高湿
(30℃、80%RH)及び低温・低湿(15℃、30
%RH)の過酷な条件においても地カブリの発生や細線
飛びの発生等のない鮮明な画像を与えた。The light-sensitive materials of the present invention are all excellent in chargeability, dark charge retention rate and photosensitivity, and the actual copied images are high temperature and high humidity (30 ° C., 80% RH) and low temperature and low humidity (15 ° C., 30).
% RH), a clear image with no background fog or fine line skipping was provided even under severe conditions.
【0291】更にオフセットマスター原版として印刷し
た所、1万枚印刷しても地汚れの発生のない鮮明な画質
の印刷物が得られた。Further, when printing was carried out as an offset master original plate, a printed matter of clear image quality without generation of scumming was obtained even after printing 10,000 sheets.
【0292】[0292]
【発明の効果】本発明によれば、静電特性(とくに厳し
い条件下での静電特性)に優れた、鮮明で良質な画像を
有し、更に優れた機械的強度を有する電子写真感光体を
得ることができる。特に、半導体レーザー光を用いたス
キャニング露光方式に有効である。According to the present invention, an electrophotographic photoreceptor having a clear and high-quality image having excellent electrostatic characteristics (electrostatic characteristics under particularly severe conditions) and further having excellent mechanical strength. Can be obtained. In particular, it is effective for a scanning exposure method using semiconductor laser light.
【0293】式(Ia)又は(Ib)で示される特定の
メタクリレート成分を含有する繰り返し単位を本発明の
樹脂に用いることにより、更に静電特性が向上する。By using the repeating unit containing the specific methacrylate component represented by the formula (Ia) or (Ib) in the resin of the present invention, the electrostatic property is further improved.
Claims (4)
樹脂を少なくとも含有する光導電層を有する電子写真感
光体において、該結着樹脂が、下記樹脂〔A1 〕及び樹
脂〔A2 〕のうちの少なくとも1種並びに下記樹脂
〔B〕のうちの少なくとも1種を含有して成ることを特
徴とする電子写真感光体。 樹脂〔A1 〕 1×103 〜2×104 の重量平均分子量を有し、下記
一般式(I)で示される繰り返し単位を重合体成分とし
て30重量%以上含有する重合体主鎖の一方の末端にの
み下記一般式(II)で示される重合性二重結合基を結
合して成る重量平均分子量2×104 以下の一官能性マ
クロモノマー(M1 )と、該一般式(I)で示される繰
り返し単位に相当するモノマーとから少なくとも成る共
重合体であって、且つ該共重合体主鎖の片末端に−PO
3 H2 、−SO3 H、−COOH、−P(=O)(O
H)R1 〔R1 は炭化水素基又は−OR2 (R2 は炭化
水素基を表す)を表す〕及び環状酸無水物基から選択さ
れる少なくとも1種の極性基を結合して成る樹脂。 樹脂〔A2 〕 1×103 〜2×104 の重量平均分子量を有し、下記
一般式(I)で示される繰り返し単位を重合体成分とし
て30重量%以上及び上記樹脂〔A1 〕で示しされる特
定の極性基から選択される少なくとも一種の極性基を含
有する重合体成分を1〜50重量%含有する重合体主鎖
の一方の末端にのみ下記一般式(II)で示される重合
性二重結合基を結合して成る重量平均分子量2×104
以下の一官能性マクロモノマー(M2 )と、該一般式
(I)で示される繰り返し単位に相当するモノマーとか
ら少なくとも成る共重合体である樹脂。 【化1】 〔式(I)中、a1 、a2 は各々水素原子、ハロゲン原
子、シアノ基又は炭化水素基を表す。R3 は炭化水素基
を表す。〕 【化2】 〔式(II)中、R4 は−COO−、−OCO−、−C
H2 OCO−、−CH2 COO−、−O−、−SO
2 −、−CO−、−CONR5 −、−SO2 NR5 −
(ここでR5 は水素原子又は炭化水素基を表わす)、−
CONHCOO−、−CONHCONH−又は−C6 H
4 −を表わす。b1 及びb2 は、互いに同じでも異なっ
てもよく、各々水素原子、ハロゲン原子、シアノ基、炭
化水素基、−COOR6又は炭化水素を介した−COO
R6 (ここでR6 は置換されてもよい炭化水素基を表
す)を表す。〕 樹脂〔B〕 2×104 〜1×106 の重量平均分子量を有し、上記
樹脂〔A1 〕における一般式(I)で示される繰り返し
単位を重合体成分として少なくとも含有するAブロック
と上記樹脂〔A1 〕で示される特定の極性基のうちから
選択される少なくとも1種の極性基を含有する少なくと
も1つの重合体成分を少なくとも含有するBブロックと
から構成されるAB型ブロック高分子鎖が、有機分子中
に少なくとも3個結合して成るスタ−型共重合体から成
る樹脂。1. An electrophotographic photosensitive member having a photoconductive layer containing at least an inorganic photoconductive material, a spectral sensitizing dye and a binder resin, wherein the binder resin is the following resin [A 1 ] or resin [A 2 ] ] And at least one of the following resins [B], an electrophotographic photosensitive member comprising: Resin [A 1 ] One of the polymer main chains having a weight average molecular weight of 1 × 10 3 to 2 × 10 4 and containing a repeating unit represented by the following general formula (I) as a polymer component in an amount of 30% by weight or more. A monofunctional macromonomer (M 1 ) having a weight average molecular weight of 2 × 10 4 or less, which is formed by bonding a polymerizable double bond group represented by the following general formula (II) only to the terminal of the general formula (I) Is a copolymer comprising at least a monomer corresponding to the repeating unit represented by
3 H 2 , -SO 3 H, -COOH, -P (= O) (O
H) R 1 [R 1 represents a hydrocarbon group or —OR 2 (R 2 represents a hydrocarbon group)] and a resin formed by bonding at least one polar group selected from a cyclic acid anhydride group .. Resin [A 2 ] having a weight average molecular weight of 1 × 10 3 to 2 × 10 4 and containing a repeating unit represented by the following general formula (I) as a polymer component in an amount of 30% by weight or more and the above resin [A 1 ]. Polymerization represented by the following general formula (II) only at one end of a polymer main chain containing 1 to 50% by weight of a polymer component containing at least one polar group selected from the specific polar groups shown. Weight average molecular weight of 2 × 10 4
A resin, which is a copolymer comprising at least the following monofunctional macromonomer (M 2 ) and a monomer corresponding to the repeating unit represented by the general formula (I). [Chemical 1] [In the formula (I), a 1 and a 2 each represent a hydrogen atom, a halogen atom, a cyano group or a hydrocarbon group. R 3 represents a hydrocarbon group. ] [Chemical 2] [In the formula (II), R 4 is —COO—, —OCO—, —C
H 2 OCO -, - CH 2 COO -, - O -, - SO
2 -, - CO -, - CONR 5 -, - SO 2 NR 5 -
(Wherein R 5 represents a hydrogen atom or a hydrocarbon group),
CONHCOO -, - CONHCONH- or -C 6 H
4 - represents a. b 1 and b 2 may be the same or different from each other, and each is a hydrogen atom, a halogen atom, a cyano group, a hydrocarbon group, —COOR 6 or —COO via a hydrocarbon.
R 6 (wherein R 6 represents an optionally substituted hydrocarbon group) is represented. Resin [B] An A block having a weight average molecular weight of 2 × 10 4 to 1 × 10 6 and containing at least the repeating unit represented by the general formula (I) in the above resin [A 1 ] as a polymer component. AB type block polymer composed of a B block containing at least one polymer component containing at least one polar group selected from the specific polar groups represented by the resin [A 1 ]. A resin composed of a star-type copolymer in which at least three chains are bound in an organic molecule.
1 〕で示される特定の極性基のうちから選択される少な
くとも1種の極性基を共重合体主鎖の末端に結合して成
ることを特徴とする請求項1記載の電子写真感光体。2. The resin [A 2 ] further comprises the resin [A 2 ].
[1 ] The electrophotographic photosensitive member according to claim 1, wherein at least one polar group selected from the specific polar groups represented by [ 1 ] is bonded to the terminal of the main chain of the copolymer.
式(I)で示される重合体成分として下記一般式(I
a)及び下記一般式(Ib)で示されるアリール基含有
のメタクリレート成分のうちの少なくとも1つを含有す
ることを特徴とする請求項1又は2記載の電子写真感光
体。 【化3】 【化4】 〔式(Ia)及び(Ib)中、R7 及びR8 は互いに独
立に各々水素原子、炭素数1〜10の炭化水素基、塩素
原子、−COR11又は−COOR11(ここでR11は炭素
数1〜10の炭化水素基を表す)を表し、R9 及びR10
は各々−COO−とベンゼン環を結合する単結合又は連
結原子数1〜4個の連結基を表す。〕3. The resin [A 1 ] or [A 2 ] as a polymer component represented by the general formula (I) is represented by the following general formula (I
The electrophotographic photosensitive member according to claim 1 or 2, containing at least one of a) and an aryl group-containing methacrylate component represented by the following general formula (Ib). [Chemical 3] [Chemical 4] [In formulas (Ia) and (Ib), R 7 and R 8 are each independently a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, a chlorine atom, —COR 11 or —COOR 11 (wherein R 11 is Represents a hydrocarbon group having 1 to 10 carbon atoms), R 9 and R 10
Each represent a single bond or a linking group having 1 to 4 linking atoms for linking -COO- and the benzene ring. ]
に含有される特定の極性基含有重合体成分の総量が、上
記樹脂〔A1 〕及び〔A2 〕中に含有される特定の極性
基含有重合体成分の総量に対し10重量%〜50重量%
であることを特徴とする請求項1〜3のいずれかに記載
の電子写真感光体。4. In the resin [B], the total amount of the specific polar group-containing polymer component contained in all the copolymers is specified in the resins [A 1 ] and [A 2 ]. 10% to 50% by weight based on the total amount of the polar group-containing polymer component
The electrophotographic photosensitive member according to claim 1, wherein
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26053191A JPH0572755A (en) | 1991-09-12 | 1991-09-12 | Electrophotographic sensitive body |
| US08/357,150 US5580690A (en) | 1991-08-07 | 1994-12-15 | Electrophotographic light-sensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26053191A JPH0572755A (en) | 1991-09-12 | 1991-09-12 | Electrophotographic sensitive body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0572755A true JPH0572755A (en) | 1993-03-26 |
Family
ID=17349264
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26053191A Pending JPH0572755A (en) | 1991-08-07 | 1991-09-12 | Electrophotographic sensitive body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0572755A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03151658A (en) * | 1989-11-08 | 1991-06-27 | Tokai Rubber Ind Ltd | Cooling sheet |
-
1991
- 1991-09-12 JP JP26053191A patent/JPH0572755A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03151658A (en) * | 1989-11-08 | 1991-06-27 | Tokai Rubber Ind Ltd | Cooling sheet |
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