JPH0574621B2 - - Google Patents
Info
- Publication number
- JPH0574621B2 JPH0574621B2 JP21164584A JP21164584A JPH0574621B2 JP H0574621 B2 JPH0574621 B2 JP H0574621B2 JP 21164584 A JP21164584 A JP 21164584A JP 21164584 A JP21164584 A JP 21164584A JP H0574621 B2 JPH0574621 B2 JP H0574621B2
- Authority
- JP
- Japan
- Prior art keywords
- vinyl chloride
- acid
- resin
- magnetic
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 claims description 46
- 125000003700 epoxy group Chemical group 0.000 claims description 31
- 239000002253 acid Substances 0.000 claims description 28
- 229920000642 polymer Polymers 0.000 claims description 26
- -1 methacryloyl group Chemical group 0.000 claims description 18
- 239000006247 magnetic powder Substances 0.000 claims description 14
- 239000003973 paint Substances 0.000 claims description 14
- 239000011230 binding agent Substances 0.000 claims description 12
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 11
- 238000006116 polymerization reaction Methods 0.000 claims description 7
- 229910052783 alkali metal Inorganic materials 0.000 claims description 6
- 150000001340 alkali metals Chemical group 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 229920005989 resin Polymers 0.000 description 34
- 239000011347 resin Substances 0.000 description 34
- 238000000576 coating method Methods 0.000 description 26
- 239000011248 coating agent Substances 0.000 description 24
- 239000000178 monomer Substances 0.000 description 19
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 15
- 229920001577 copolymer Polymers 0.000 description 14
- 238000010894 electron beam technology Methods 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 150000007513 acids Chemical class 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 229920002554 vinyl polymer Polymers 0.000 description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 229920000536 2-Acrylamido-2-methylpropane sulfonic acid Polymers 0.000 description 5
- XHZPRMZZQOIPDS-UHFFFAOYSA-N 2-Methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(C)(C)NC(=O)C=C XHZPRMZZQOIPDS-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000004132 cross linking Methods 0.000 description 5
- 238000001723 curing Methods 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 229920001897 terpolymer Polymers 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- 229910019142 PO4 Inorganic materials 0.000 description 4
- 150000003863 ammonium salts Chemical class 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000010452 phosphate Substances 0.000 description 4
- 230000000379 polymerizing effect Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- VJFPVACZAZLCCM-UAIGNFCESA-N (z)-but-2-enedioic acid;chloroethene;ethenyl acetate Chemical compound ClC=C.CC(=O)OC=C.OC(=O)\C=C/C(O)=O VJFPVACZAZLCCM-UAIGNFCESA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 238000007259 addition reaction Methods 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229920005749 polyurethane resin Polymers 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 238000004448 titration Methods 0.000 description 3
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- SZTBMYHIYNGYIA-UHFFFAOYSA-N 2-chloroacrylic acid Chemical compound OC(=O)C(Cl)=C SZTBMYHIYNGYIA-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 231100000987 absorbed dose Toxicity 0.000 description 2
- 150000001253 acrylic acids Chemical class 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 229910001566 austenite Inorganic materials 0.000 description 2
- YYRMJZQKEFZXMX-UHFFFAOYSA-N calcium;phosphoric acid Chemical compound [Ca+2].OP(O)(O)=O.OP(O)(O)=O YYRMJZQKEFZXMX-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229920006026 co-polymeric resin Polymers 0.000 description 2
- IQFVPQOLBLOTPF-HKXUKFGYSA-L congo red Chemical compound [Na+].[Na+].C1=CC=CC2=C(N)C(/N=N/C3=CC=C(C=C3)C3=CC=C(C=C3)/N=N/C3=C(C4=CC=CC=C4C(=C3)S([O-])(=O)=O)N)=CC(S([O-])(=O)=O)=C21 IQFVPQOLBLOTPF-HKXUKFGYSA-L 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920001228 polyisocyanate Polymers 0.000 description 2
- 239000005056 polyisocyanate Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 238000010008 shearing Methods 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- MNCGMVDMOKPCSQ-UHFFFAOYSA-M sodium;2-phenylethenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C=CC1=CC=CC=C1 MNCGMVDMOKPCSQ-UHFFFAOYSA-M 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000002426 superphosphate Substances 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 2
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 description 1
- UKDKWYQGLUUPBF-UHFFFAOYSA-N 1-ethenoxyhexadecane Chemical compound CCCCCCCCCCCCCCCCOC=C UKDKWYQGLUUPBF-UHFFFAOYSA-N 0.000 description 1
- SFUDBXKBPOKIIW-ARJAWSKDSA-N 1-o-ethyl 4-o-(oxiran-2-ylmethyl) (z)-but-2-enedioate Chemical compound CCOC(=O)\C=C/C(=O)OCC1CO1 SFUDBXKBPOKIIW-ARJAWSKDSA-N 0.000 description 1
- LQZDDWKUQKQXGC-UHFFFAOYSA-N 2-(2-methylprop-2-enoxymethyl)oxirane Chemical compound CC(=C)COCC1CO1 LQZDDWKUQKQXGC-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- RFQDWHAYZBEQBY-UHFFFAOYSA-N 2-(3-methylbut-3-enyl)oxirane Chemical compound CC(=C)CCC1CO1 RFQDWHAYZBEQBY-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- SXGGTMKKTMUBTE-UHFFFAOYSA-N 3-[1-(oxiran-2-yl)ethoxycarbonyl]but-3-enoic acid Chemical compound OC(=O)CC(=C)C(=O)OC(C)C1CO1 SXGGTMKKTMUBTE-UHFFFAOYSA-N 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- VFXXTYGQYWRHJP-UHFFFAOYSA-N 4,4'-azobis(4-cyanopentanoic acid) Chemical compound OC(=O)CCC(C)(C#N)N=NC(C)(CCC(O)=O)C#N VFXXTYGQYWRHJP-UHFFFAOYSA-N 0.000 description 1
- LKVFCSWBKOVHAH-UHFFFAOYSA-N 4-Ethoxyphenol Chemical compound CCOC1=CC=C(O)C=C1 LKVFCSWBKOVHAH-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- DFLASACYPZDRDB-KTKRTIGZSA-N 4-o-benzyl 1-o-butyl (z)-but-2-enedioate Chemical compound CCCCOC(=O)\C=C/C(=O)OCC1=CC=CC=C1 DFLASACYPZDRDB-KTKRTIGZSA-N 0.000 description 1
- XAYDWGMOPRHLEP-UHFFFAOYSA-N 6-ethenyl-7-oxabicyclo[4.1.0]heptane Chemical compound C1CCCC2OC21C=C XAYDWGMOPRHLEP-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- GXBYFVGCMPJVJX-UHFFFAOYSA-N Epoxybutene Chemical compound C=CC1CO1 GXBYFVGCMPJVJX-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- SCKXCAADGDQQCS-UHFFFAOYSA-N Performic acid Chemical compound OOC=O SCKXCAADGDQQCS-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- RELHAYCBMUANQW-UHFFFAOYSA-N S(=O)(=O)(O)O.C(C=C)(=O)OCC Chemical compound S(=O)(=O)(O)O.C(C=C)(=O)OCC RELHAYCBMUANQW-UHFFFAOYSA-N 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000000746 allylic group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229920003180 amino resin Polymers 0.000 description 1
- BIGPRXCJEDHCLP-UHFFFAOYSA-N ammonium bisulfate Chemical compound [NH4+].OS([O-])(=O)=O BIGPRXCJEDHCLP-UHFFFAOYSA-N 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- DNCQWNWCEBTKGC-UHFFFAOYSA-N azane;phosphorous acid Chemical compound N.N.OP(O)O DNCQWNWCEBTKGC-UHFFFAOYSA-N 0.000 description 1
- 238000003490 calendering Methods 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- XENVCRGQTABGKY-ZHACJKMWSA-N chlorohydrin Chemical compound CC#CC#CC#CC#C\C=C\C(Cl)CO XENVCRGQTABGKY-ZHACJKMWSA-N 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007033 dehydrochlorination reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- ZWWQRMFIZFPUAA-UHFFFAOYSA-N dimethyl 2-methylidenebutanedioate Chemical compound COC(=O)CC(=C)C(=O)OC ZWWQRMFIZFPUAA-UHFFFAOYSA-N 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- ZRRLFMPOAYZELW-UHFFFAOYSA-N disodium;hydrogen phosphite Chemical compound [Na+].[Na+].OP([O-])[O-] ZRRLFMPOAYZELW-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001227 electron beam curing Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002431 hydrogen Chemical group 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- KEYZMFWOMWWJGZ-UHFFFAOYSA-N methylphosphonic acid;prop-2-enamide Chemical compound CP(O)(O)=O.NC(=O)C=C KEYZMFWOMWWJGZ-UHFFFAOYSA-N 0.000 description 1
- 238000006011 modification reaction Methods 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- YCNNCJXFNCVEOL-UHFFFAOYSA-N oxiran-2-ylmethyl ethenesulfonate Chemical compound C=CS(=O)(=O)OCC1CO1 YCNNCJXFNCVEOL-UHFFFAOYSA-N 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- AJCDFVKYMIUXCR-UHFFFAOYSA-N oxobarium;oxo(oxoferriooxy)iron Chemical compound [Ba]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O AJCDFVKYMIUXCR-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- WNOMFECKQBISOX-UHFFFAOYSA-N phosphoric acid;propan-1-ol Chemical compound CCCO.OP(O)(O)=O WNOMFECKQBISOX-UHFFFAOYSA-N 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- DJEHXEMURTVAOE-UHFFFAOYSA-M potassium bisulfite Chemical compound [K+].OS([O-])=O DJEHXEMURTVAOE-UHFFFAOYSA-M 0.000 description 1
- 229940099427 potassium bisulfite Drugs 0.000 description 1
- 235000010259 potassium hydrogen sulphite Nutrition 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- RAJUSMULYYBNSJ-UHFFFAOYSA-N prop-1-ene-1-sulfonic acid Chemical compound CC=CS(O)(=O)=O RAJUSMULYYBNSJ-UHFFFAOYSA-N 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- WBHQBSYUUJJSRZ-UHFFFAOYSA-M sodium bisulfate Chemical compound [Na+].OS([O-])(=O)=O WBHQBSYUUJJSRZ-UHFFFAOYSA-M 0.000 description 1
- 229910000342 sodium bisulfate Inorganic materials 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- NSFYPZRDTCJZAS-UHFFFAOYSA-M sodium;1-aminoethanesulfonate Chemical compound [Na+].CC(N)S([O-])(=O)=O NSFYPZRDTCJZAS-UHFFFAOYSA-M 0.000 description 1
- UKHUNTHZJPNNTR-UHFFFAOYSA-M sodium;2-aminoethyl sulfate Chemical compound [Na+].NCCOS([O-])(=O)=O UKHUNTHZJPNNTR-UHFFFAOYSA-M 0.000 description 1
- KSVSZLXDULFGDQ-UHFFFAOYSA-M sodium;4-aminobenzenesulfonate Chemical compound [Na+].NC1=CC=C(S([O-])(=O)=O)C=C1 KSVSZLXDULFGDQ-UHFFFAOYSA-M 0.000 description 1
- QDWYPRSFEZRKDK-UHFFFAOYSA-M sodium;sulfamate Chemical compound [Na+].NS([O-])(=O)=O QDWYPRSFEZRKDK-UHFFFAOYSA-M 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、塩化ビニル系樹脂、特に電子線照射
により架橋硬化する塩化ビニル系樹脂を磁性粉末
のバインダーとする磁性塗料に関するものであ
る。
〔従来の技術〕
磁気テープや磁気カードなどの磁気記録媒体
は、一般にポリエスタルフイルムのような基体上
に磁性層として磁性粉及びそのバインダーを含む
磁性塗料を塗布することによつて製造されてい
る。近年、保磁力及び最大飽和磁化量を高め、
SN比や記録密度の向上を図るために、上記の磁
性粉として比表面積の大きい微細化された磁性粉
が用いられるようになつてきた。
ところが微細磁性粉は、塩化ビニル−酢酸ビニ
ル−ビニルアルコール三元共重合体、塩化ビニル
−酢酸ビニル−マレイン酸三元共重合体やニトロ
セルロースといつた通常用いられるバインダーで
は磁性塗料を調製する際に塗料が増粘したり分散
性が未だ不足しているといつた難点がある。また
分散性改良のために低分子量の界面活性剤が分散
剤として使用されるが、これらの分散剤を多量使
用すると、磁気記録媒体の耐久性、ヘツド汚れな
どを起こすため、その使用量にはおのずと限界が
ある。
一方、磁気記録媒体の耐久性、走行特性、信頼
性を高めるために、ポリウレタン樹脂、ポリエス
テル樹脂、アクリロニトリル−ブタジエンゴムな
どの可撓性材料とともに、ポリイソシアネート化
合物に代表される熱硬化性架橋剤が磁性塗料中に
添加され、バインダー中の水酸基、カルボキシル
基、アミノ基などの活性水素を有する基との化学
反応により磁性層を架橋塗膜化することが、特に
録画用磁気記録媒体では一般的に行われている。
しかしこの様な熱硬化型のバインダーは、基本
的には、架橋剤を加えた瞬間から硬化反応が開始
するため、塗料のポツトライフの問題を生ずる。
また硬化の速度は磁性塗料中の材料と環境により
変動するうえ、その調節が難しく、塗料の保存安
定性や塗膜の表面形成処理効果の変動などの問題
を生ずる。さらに、完全硬化には長時間を要し、
硬化熟成中に塗膜表面が接する基材の裏面の表面
粗度の転移を受けやすく、高密度記録媒体にとつ
て重要な特性である磁性層の表面平滑性の低下を
まねきやすい。
以上の様な点から、これまでの熱硬化型バイン
ダーは磁気記録媒体の著しい高密度記録化及び生
産工程の安定化、合理化、自動化に対応するには
限界がある。
〔発明が解決しようとする問題点〕
本発明者は、こういつた磁気記録媒体の高性能
化及び生産工程の合理化、安定化に応えるバイン
ダーを開発すべく鋭意検討した結果、特定の塩化
ビニル共重合体を用いることにより、高い分散性
を保持し、増粘が防止され、しかも電子線により
瞬時に架橋硬化する磁性塗料が得られること、そ
してその塗料を用いて得られる磁気記録媒体は、
塗膜の表面平滑性及び耐久性が良好であり、か
つ、走行性、磁気特性、電磁変換特性が優れるこ
とを見い出し、本発明に到達した。
〔問題点を解決するための手段〕
すなわち、COOM,SO3M,SO4M,PO3M及
びPO4M2(Mは水素、アルカリ金属またはアンモ
ニウム、以下同じ)より選ばれる少くとも一種の
親水性基と、エポキシ基とを有する塩化ビニル系
重合体にアクリロイル基またはメタクリロイル基
を有する一塩基酸を反応させて得られる重合体で
あつて、該親水性基をCOO,SO3,SO4,PO3ま
たはPO4として0.1〜4.0重量%、アクリロイル基
またはメタクリロイル基を二重結合当量として
10000以下及び塩化ビニルを60重量%以上含有す
る平均重合度100〜900の重合体を磁性粉のバイン
ダーとすることを特徴とする電子線反応性磁性塗
料が本発明により提供される。なお、二重結合当
量とは、重合体に結合したアクリロイル基又はメ
タクリロイル基一個当たりの重合体の分子量を意
味する。
本発明にかかるこの樹脂は、一般にはCOOM,
SO3M,SO4M,PO3M2及びPO4M2より選ばれる
少くとも一種の親水性基とエポキシ基とを有する
塩化ビニル系重合体に、PKaで示される酸の強
さが3.5以下のアクリロイル基またはメタクリロ
イル基を有する一塩基酸を反応させて得られる。
COOM,SO3M,SO4M,PO3M2及びPO4M2
より選ばれる少くとも一種の親水性基とエポキシ
基とを有する塩化ビニル系重合体は、(1)該当する
親水性基を有するラジカル重合性単量体とエポキ
シ基を有する単量体とを、必要に応じ共重合可能
な他の単量体とともに塩化ビニルと共重合する方
法、(2)エポキシ基を有する単量体を、必要に応じ
共重合可能な他の単量体とともに、該当する親水
性基を有するラジカル発生剤を用いて塩化ビニル
と共重合する方法、(3)エポキシ基を有する単量体
と塩化ビニルと必要に応じ使用される他の単量体
とを共重合させて得られるエポキシ基含有塩化ビ
ニル系重合体、又は塩化ビニル系重合体を脱塩化
水素した後、過カルボン酸などのエポキシ化剤に
よりエポキシ化して得られるエポキシ基含有塩化
ビニル系重合体に、該当する親水性基を有する化
合物とを部分的に付加反応させる方法などによつ
て得ることができる。またこれらの方法を組合わ
せる事も可能である。
これらの親水性基とエポキシ基とをともに有す
る塩化ビニル系重合体の製造に共通して使用され
るエポキシ基を有する単量体の例としては、アリ
ルグリシジルエーテル、メタリルグリシジルエー
テルなどの不飽和アルコールのグリシジルエーテ
ル類、グリシジルアクリレート、グリシジルメタ
クリレート、グリシジル−P−ビニルベンゾエー
ト、メチルグリシジルイタコネート、グリシジル
エチルマレート、グリシジルビニルスルホネー
ト、グリシジル(メタ)アリルスルホネートなど
の不飽和酸のグリシジルエステル類、ブタジエン
モノオキサイド、ビニルシクロヘキセンモノオキ
サイド、2−メチル−5,6−エポキシヘキセン
などのエポキシドオレフイン類などがあげられ
る。
本発明における塩化ビニル系重合体の製法のう
ち、前記(1)の方法に係る親水性基を有する単量体
の例としては、COOMの例では、アクリル酸、
メタクリル酸などの不飽和モノカルボン酸類や、
フマル酸、イタコン酸などの不飽和ジカルボン酸
及びそのモノエステル類があげられる。SO3Mの
例としては、ビニルスルホン酸、メチルビニルス
ルホン酸、(メタ)アリルスルホン酸、スチレン
スルホン酸、(メタ)アクリル酸−2−スルホン
酸エチル、2−アクリルアミド−2−メチルプロ
パンスルホン酸,3−アリロキシ−2−ヒドロキ
シプロパンスルホン酸などの酸、及びこれらの酸
のアルカリ金属塩やアンモニウム塩などがあげら
れる。SO4Mの例としては、(メタ)アクリル酸
−2−硫酸エチル、3−アリロキシ−2−ヒドロ
キシプロパン硫酸などの酸、及びこれらの酸のア
ルカリ金属塩あるいはアンモニウム塩などがあ
る。PO4M2の例としては、(メタ)アルリル酸−
3−クロロ−2−リン酸プロピル、(メタ)アク
リル酸−2−リン酸エチル、3−アリロキシ−2
−ヒドロキシプロパンリン酸などの酸、及びこれ
らの酸のアルカリ金属塩あるいはアンモニウム塩
がある。PO3M2の例としては、ビニルスルホン
酸、アクリルアミドメタンホスホン酸、2−ホス
ホン酸エチル−(メタ)アクリレート、3−アリ
ロキシ−2−ヒドロキシプロパンホスホン酸など
の酸、及びこれらの酸のアルカリ金属塩あるいは
アンモニウム塩があげられる。
前記(2)の方法における親水性基を有するラジカ
ル発生剤の例としては、COOMでは4,4′−アゾ
ビス−4−シアノバレリン酸などが、SO4Mでは
過硫酸カリウム、過硫酸アンモニウムなどが、
PO4M2では過リン酸カリウム、過リン酸ナトリ
ウムなどがそれぞれあげられる。
さらに、前記(3)の方法において、エポキシ基を
有する単量体と塩化ビニルとの共重合体とポリマ
ー反応をして樹脂中に親水性基を導入させるのに
用いられる化合物の例としては、COOMでは、
マロン酸、フタル酸などが、SO3Mでは、亜硫酸
ナトリウム、亜硫酸アンモニウム、重亜硫酸ナト
リウム、重亜硫酸カリウム、チオ硫酸アンモニウ
ム、アミノエタンスルホン酸ナトリウム、スルフ
アニル酸ナトリウム、スルフアミン酸ナトリウム
などが、SO4Mでは、重硫酸ナトリウム、重硫酸
アンモニウム、2−アミノエチル硫酸ナトリウム
などが、PO3M2では、亜リン酸水素ナトリウム、
亜リン酸水素アンモニウムなどが、PO4M2では、
リン酸水素二カリウム、リン酸水素二ナトリウム
などがそれぞれあげられる。
また、エポキシ基を有する単量体、塩化ビニル
及び親水性基を有する単量体以外の必要に応じ使
用される単量体の例としては、酢酸ビニル、プロ
ピオン酸ビニルなどのカルボン酸ビニルエステ
ル;メチルビニルエーテル、イソブチルビニルエ
ーテル、セチルビニルエーテルなどのビニルエー
テル;塩化ビニリデン、弗化ビニリデンなどのビ
ニリデン;マレイン酸ジエチル、マレイン酸ブチ
ルベンジル、マレイン酸−ジ−2−ヒドロキシエ
チル、イタコン酸ジメチル、(メタ)アクリル酸
メチル、(メタ)アクリル酸エチル、(メタ)アク
リル酸ラウリル、(メタ)アクリル酸−2−ヒド
ロキシプロピルなどの不飽和カルボン酸エステ
ル;エチレン、プロピレンなどのオレフイン;
(メタ)アクリロニトリルなどの不飽和ニトリ
ル;スチレン、α−メチルスチレン、p−メチル
スチレンなどの芳香族ビニルなどがあげられる。
これらの単量体は、本発明にかかる樹脂と他の樹
脂とを混合したときの両者の相溶性及び軟化点を
調節しつつ樹脂の溶解性を向上させる目的のほ
か、塗膜の特性や塗工工程の改善などの必要性に
応じて適当に選択される。
エポキシ基を有する単量体と塩化ビニルとの共
重合、あるいは、エポキシ基を有する単量体と親
水性基を有する単量体と塩化ビニルとの共重合
は、他の単量体をさらに共重合する場合も含めて
広く公知の重合方法が使用し得る。また、エポキ
シ基を有する単量体として塩化ビニルと必要に応
じ使用される他の単量体との共重合体と、親水性
基を有する化合物との部分的なポリマー反応も、
原料の性状や生成物の分離など工程上の都合によ
り、公知の方法が広く使用可能である。
以上の様にして得られるCOOM,SO3M,SO4
M,PO3M2及びPO4M2より選ばれる少くとも一
種の親水性基とエポギシ基とを有する塩化ビニル
系重合体は、0.5重量%以上のエポキシ基を有し
ている必要がある。0.5重量%未満ではアクリロ
イル基またはメタクリロイル基を有する一塩基酸
との反応により樹脂に結合するアクリロイル基ま
たはメタクリロイル基の量が少く電子線による架
橋反応が不充分になりやすく、電子線照射後磁性
層の耐久性が不充分である。
また、親水性基とエポキシ基とを有する塩化ビ
ニル系重合体と反応させるアクリロイル基または
メタクリロイル基を有する一塩基酸は、PKaで
示される酸の強さが3.5以下の強酸である必要が
ある。PKaが3.5より大きい弱酸では、温和な条
件ではエポキシ基との付加反応が進みにくいた
め、より高温、長時間あるいは4級アンモニウム
塩の併用を要する。ところが、塩化ビニル系重合
体は熱により脱塩化水素を起しやすいため、目的
とするアクリロイル変性反応よりも重合体の脱塩
化水素と塩化水素のエポキシ基への付加反応が先
行し、目的変性物が効果的に得られないうえに、
反応中に塩化ビニル系重合体が劣化し、生成樹脂
の熱安定性が大幅に低下してしまう。
本発明に係る樹脂の製造に使用されるアクリロ
イル基またはメタクリロイル基を有するPKaが
3.5以下の一塩基酸は、該基の水素原子が他の元
素と置換したものも含むものとして定義される。
具体例として、クロルアクリル酸などのハロゲン
置換(メタ)アクリル酸類、(メタ)2−アクリ
ルアミド−2−メチルプロパンスルホン酸、(メ
タ)アクリル酸−2−スルホン酸エチルなどのス
ルホン酸含有(メタ)アクリレート類、(メタ)
アクリル酸−2−硫酸エチルなどの硫酸含有(メ
タ)アクリレート類、ジ−2−(メタ)アクリロ
キシエチルアシツドフオスフエートなどのリン酸
含有ジ(メタ)アクリレート類などがあげられ
る。
親水性基とエポキシ基とを含む塩化ビニル系重
合体と、PKa3.5以下の一塩基酸との反応は、両
者をともに溶解する様な溶媒中で常温ないし、80
℃までの比較的温和な条件のもとに容易に進行す
る。むろん、この塩化ビニル系重合体を水系の分
散液の形で反応させることも可能であり、また、
一塩基酸が重合体に溶解する様なものであれば両
者をバンバリーやロール上で直接混練し反応させ
ることも可能である。いずれの場合にも、一塩基
酸の使用量は、塩化ビニル系重合体中のエポキシ
基の当モル量以下とすることが望ましい。あまり
過剰量使用すると、未反応の一塩基酸が残ること
による、生成樹脂の吸湿性の増大や金属腐食性の
発現などの危険性が増大するばかりでなく、この
塩化ビニル系重合体中の親水性基とエポキシ基と
の反応を誘つて、生成樹脂が不溶化を起す危険が
ある。なお、反応に際してハイドロキノン、ハイ
ドロキノンモノメチルエーテル、t−ブチルカテ
コールなどの重合禁止剤が常識的範囲で添加され
る。
このようにして得られた本発明にかかる樹脂
は、平均重合度が100〜900、好ましくは200〜
500、塩化ビニルの含有量が60重量%以上のもの
である。重合度が100未満では、いかに電子線架
橋を行つても磁性層の耐摩耗性が不充分であり、
900を越えると塗料の粘度が高く、磁性粉の分散
が不充分になりやすい。また、塩化ビニルの含有
量が60重量%より少ないと、可撓性材料との相溶
性が低下したり、塗膜の溶剤離れの低下が著しく
なつたりして不都合を生ずる。
また、樹脂に結合した親水性基の量はCOO,
SO3,SO4,PO3またはPO4として0.1〜4.0重量%
であることが必要である。0.1重量%未満では磁
性粉の分散性が不充分となり、4.0重量%を越え
ると樹脂の親水性が強くなり、溶剤への溶解性が
不充分になるばかりか、塗膜の耐湿性が低下し、
さらには磁性粉の凝集が起きてかえつて分散性が
悪くなる。
一塩基酸との反応により本発明にかかる樹脂中
には一塩基酸のvic−グリコールモノエステルの
形で電子線硬化性の二重結合が導入され、反応中
に生成するクロルヒドリンとともにイソシアネー
ト化合物による架橋も可能にしている。電子線硬
化に寄与する二重結合の量は、二重結合当量とし
て10000以下であることが必要である。二重結合
当量として10000を越えるような少ない二重結合
量であると、電子線照射後の磁性層の走行性、耐
久性が不充分である。
本発明にかかる樹脂は、通常の磁性塗料用塩化
ビニル系樹脂バインダーと同様、一般には、ポリ
ウレタン樹脂、ポリエステル樹脂、アクリロニト
リル−ブタジエン共重合体などの可撓性材料とと
もにバインダーシステムを構成するほか、これら
の可撓性材料の一部または全てを電子線反応性の
不飽和結合を1つ以上有する他の樹脂、オリゴマ
ー、単量体に置きかえて、磁性粉、さらに必要に
応じ潤滑剤、、分散剤、帯電防止剤、研摩剤など
の公知の材料と混合し、任意の溶剤分散液として
使用に供せられる。また必要に応じて、本発明に
かかる樹脂と共に、塩化ビニル−酢酸ビニル−マ
レイン酸共重合体樹脂、塩化ビニル−ビニルアル
コール−酢酸ビニル共重合体樹脂、繊維素樹脂、
フエノキシ樹脂、アミノ樹脂、エポキシ樹脂、ブ
チラール樹脂およびアクリル樹脂などの通常の磁
性塗料用樹脂バインダーを本発明の目的が達成さ
れる範囲で併用することも可能である。
また、磁性粉としては、Fe粉末、Co粉末など
の金属磁性粉末をはじめ、γ−Fe2O3,Fe3O4,
Co含有γ−Fe2O3、Co含有Fe3O4、バリウムフエ
ライトなどの酸化鉄の粉末及びCrO2粉末が使用
される。
本発明にかかる樹脂を用いた磁性塗膜の架橋に
使用する活性エネルギー線としては、吸収線量の
制御、製造工程ラインへの導入の容易さの点より
電子線加速器による電子線が使用される。磁性塗
膜を硬化する際に使用する電子線は、透過力の面
から、加速電圧100〜750KV、好ましくは150〜
300KVの電子線加速器を用い吸収線量が0.5−20
メガラドになる様に照射するのが良い。
〔実施例〕
以下に本発明を実施例によつて具体的に説明す
る。なお、部数及び%は重量基準である。
また、塩化ビニル量は燃焼による塩素量の定量
により、二重結合量は滴定により、エポキシ基の
量は滴定により、親水性基の量は元素分析、滴定
及び赤外吸光分析の併用によりそれぞれ求めた。
(樹脂合成例)
参考例 1
アリルグリシジルエーテルと塩化ビニルとを過
硫酸カリウムにより、乳化重合することにより、
エポキシ基が4%、SO4が0.5%、塩化ビニルが
82%の塩化ビニル共重合体を得た。この共重合体
100部と2−アクリルアミド−2−メチルプロパ
ンスルホン酸(PKa2.0)7部とハイドロキノン
モノエチルエーテル0.01部とを200部のジメチル
ホルムアミドに溶解し、65℃で3時間攪拌混合し
た後、大量の水中へ反応液を滴下し、樹脂を回収
するとともに強攪拌下に水洗、湯洗を繰りかえし
樹脂をよく洗滌し、乾燥して樹脂Aを得た。
参考例 2
2−アクリルアミド−2−メチルプロパンスル
ホン酸にかえて、α−クロロアクリル酸
(PKa2.5)を用いた以外は実施例1と同様に操作
して樹脂Bを得た。
参考例 3
グリシジルメタクリレート、スチレンスルホン
酸ナトリウム、酢酸ビニル及び塩化ビニルをアゾ
ビスイソブチロニトリルによりメタノール中で重
合することにより、エポキシ基の量が3%、SO3
が0.5%、塩化ビニルが72%の塩化ビニル共重合
体を得た。この共重合体100部とジ−2−アクリ
ロキシエチル−アシツドフオスフエート
(PKa2.3)10部とをハイドロキノンモノメチルエ
ーテル0.015部とともに高速混合機中で混合した
後、90℃の混練ロールにて10分間混練して得たシ
ート状物を水とともに高速攪拌機中で粉砕し、充
分に湯洗を繰りかえした後、乾燥して樹脂Cを得
た。
参考例 4
ブタジエンモノオキサイド、グリシジルメタク
リレート、酢酸ビニル及び塩化ビニルを過酸化ラ
ウロイルにより懸濁重合して得た共重合体をマロ
ン酸によりカルボキシ変性することによりエポキ
シ基が3.5%、COOが0.9%、塩化ビニルが78%の
塩化ビニル共重合体を得た。この樹脂100部を用
い実施例1と同じ操作により樹脂Dを得た。
比較参考例 1
2−アクリルアミド−2−メチルプロパンスル
ホン酸にかえて、アクリル酸(PKa4.2)を用い
た以外は実施例1と同様に操作して樹脂Eを得
た。
比較参考例 2
スチレンスルホン酸ナトリウムを使わずに実施
例3と同様にエポキシ基を含む塩化ビニル共重合
体を調製したところ、エポキシ基の量が3.7%、
塩化ビニルが77%であつた。この共重合体を用い
て実施例3と同様に操作して樹脂Fを得た。
比較参考例 3
グリシジルメタクリレートの使用量を減じて実
施例3と同様にエポキシ基を含む塩化ビニル共重
合体を調製したところ、エポキシ基が0.4%、
SO3が0.5%、塩化ビニルが84%であつた。この
共重合体を実施例3と同様に操作して樹脂Gを得
た。
比較参考例 4
市販の塩化ビニル−酢酸ビニル−ビニルアルコ
ール三元共重合体100部、トルエン150部及びシク
ロヘキサノン80部を3の4つ口フラスコに仕込
み加熱溶解し、80℃に昇温後トリレンジイソシア
ネートの2−ヒドロキシエチルメタクリレートア
ダクトを8部加え、更にオクチル酸スズ0.0015
部、ハイドロキノン0.0015部加え、80℃でN2気
流中NCO反応率が90%以上となるまで反応せし
めた。反応終了後冷却し、メチルエチルケトン
100部を加え希釈して樹脂溶液Hを得た。
これらの樹脂の性状を市販の塩化ビニル−酢酸
ビニル−マレイン酸三元共重合体(I)及び塩化
ビニル−酢酸ビニル−ビニルアルコール三元共重
合体(J)とともに表に示した。
実施例1〜4及び比較例1〜6
次に各樹脂を磁性塗料及び磁気記録媒体として
の評価に供した。その結果を表に示す。なお、評
価方法は下記に依つた。
1 溶解性
塩化ビニル樹脂100部、メチルエチルケトン200
部、トルエン200部よりなる溶液をつくり、この
溶液の透明性の程度を目視して○△×の三段階で
判定した。
2 熱安定性
塩化ビニル樹脂1.0グラムを15c.c.試験管に採り、
その開口部をコンゴーレツド試験紙をはさんだ脱
脂綿で栓をして、150℃のオイルバス中に置き、
発生する塩酸によつてコンゴーレツド試験紙が変
色するまでの時間を測定した。
3 分散安定性
金属鉄磁性粉400部、塩化ビニル樹脂100部、メ
チルエチルケトン300部、メチルイソブチルケト
ン300部、トルエン300部からなる混合物を90分間
高速剪断分散させた。この分散塗料をサンプル瓶
に採取して25℃の恒温槽内に保存し、ゲルの発生
状況を観察した。ゲルが発生しているか否かは、
分散塗料の一部をガラス板上に取出し、約5倍量
のメチルエチルケトンで希釈し、ガラス棒を用い
て混合して目視する方法によつた。ゲルの発生の
少ない順に○△×で示す。
4 光沢度
コバルト被着磁性酸化鉄粉400部、塩化ビニル
樹脂70部、ポリウレタン樹脂(日本ポリウレタン
工業(株)製ニツポラン2304)30部、メチルエチルケ
トン300部、メチルイソブチルケトン300部、トル
エン300部、シリコンオイル2部よりなる混合物
を90分間高速剪断分散させた後、得られた磁性塗
料をポリエステルフイルム上に塗膜厚5μmとなる
ように塗布し磁場配向処理した後乾燥した。その
磁性塗膜の60°反射角の反射率を光沢計を用いて
測定した。ただし、樹脂Jについては90分の分散
混合の後、ポリイソシアネート(日本ポリウレタ
ン工業(株)製コロネートL)20部を加え、さらに10
分間混合分散して磁性塗料として同様の試験を行
つた。
5 ポツトライフ
光沢度の評価に使用した磁性塗膜をカレンダー
ロールに通常の1/2の線圧で通し、60℃の反射角
の反射率を光沢計を用いて測定し、さらに1週間
23℃、50%相対湿度の条件下に放置した塗膜のカ
レンダー処理を上記と同条件で行つて光沢を測定
してその落差によりポツトライフを判定した。
6 角型比(Br/Bm)
光沢度の評価に使用した磁性塗膜を12.5mm×50
mmに切出して、磁気特性測定機により測定した。
7 耐久性、架橋性
光沢度評価に用いた磁性塗膜をカレンダーロー
ルで平滑化処理してからESI社製エレクトロカー
テン型電子線加速装置を用いて、加速電圧
168KV、照射量10Mradの条件でN2雰囲気下に電
子線を照射し塗膜を硬化処理した後、荷重100g
をかけ、研摩紙を張り付けた回転ドラムに接触さ
せて、150rpmで回転させ、磁性塗料が研摩紙に
付着した程度を目視して○△×の三段階で判定し
た。
また、硬化塗膜の一部を取り、メチルエチルケ
トンを浸み込ませた脱脂綿でこすり塗膜の脱落の
程度を○△×の三段階で判定した。
ただし、樹脂Jを用いた塗膜については、電子
線照射にかえて、65℃で65時間の加熱処理を行つ
た。
8 走行性
耐久性評価と同じ方法で塗膜と回転ドラム間に
発生する力を65℃相対湿度80%の雰囲気でUゲー
ジにより測定し、走行抵抗が少ない順に○△×の
三段階で判定した。
【表】DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a magnetic paint using a vinyl chloride resin, particularly a vinyl chloride resin crosslinked and cured by electron beam irradiation, as a binder for magnetic powder. [Prior Art] Magnetic recording media such as magnetic tapes and magnetic cards are generally manufactured by applying a magnetic paint containing magnetic powder and its binder as a magnetic layer onto a substrate such as a polyester film. . In recent years, the coercive force and maximum saturation magnetization have been increased,
In order to improve the signal-to-noise ratio and recording density, miniaturized magnetic powders with a large specific surface area have come to be used as the above-mentioned magnetic powders. However, when preparing magnetic paint, fine magnetic powder cannot be used with commonly used binders such as vinyl chloride-vinyl acetate-vinyl alcohol terpolymer, vinyl chloride-vinyl acetate-maleic acid terpolymer, and nitrocellulose. However, there are disadvantages such as thickening of the paint and insufficient dispersibility. In addition, low molecular weight surfactants are used as dispersants to improve dispersibility, but the use of large amounts of these dispersants can cause problems such as poor durability of the magnetic recording medium and head stains, so the amount used is limited. Naturally, there are limits. On the other hand, in order to improve the durability, running characteristics, and reliability of magnetic recording media, in addition to flexible materials such as polyurethane resins, polyester resins, and acrylonitrile-butadiene rubber, thermosetting crosslinking agents such as polyisocyanate compounds are used. It is common for magnetic recording media, in particular, to crosslink the magnetic layer by chemical reaction with active hydrogen-containing groups such as hydroxyl groups, carboxyl groups, and amino groups in the binder, which is added to magnetic paints. It is being done. However, with such a thermosetting binder, the curing reaction basically starts the moment the crosslinking agent is added, which causes problems with the pot life of the paint.
Furthermore, the curing speed varies depending on the material in the magnetic coating and the environment, and it is difficult to control, leading to problems such as the storage stability of the coating and variations in the surface formation treatment effect of the coating. Furthermore, it takes a long time for complete curing.
During curing and aging, the surface roughness of the back surface of the substrate that the coating surface comes into contact with tends to change, which tends to cause a decrease in the surface smoothness of the magnetic layer, which is an important property for high-density recording media. From the above points, conventional thermosetting binders have limitations in responding to the remarkable increase in recording density of magnetic recording media and the stabilization, rationalization, and automation of production processes. [Problems to be Solved by the Invention] As a result of intensive study to develop a binder that can improve the performance of such magnetic recording media and rationalize and stabilize the production process, the present inventor discovered that a specific type of vinyl chloride By using a polymer, it is possible to obtain a magnetic coating material that maintains high dispersibility, prevents thickening, and is instantly crosslinked and cured by electron beams, and that a magnetic recording medium obtained using the coating material is
The inventors have discovered that the coating film has good surface smoothness and durability, and has excellent running properties, magnetic properties, and electromagnetic conversion properties, and has thus arrived at the present invention. [Means for solving the problem] That is, at least one kind selected from COOM, SO 3 M, SO 4 M, PO 3 M and PO 4 M 2 (M is hydrogen, alkali metal or ammonium, the same applies hereinafter). A polymer obtained by reacting a vinyl chloride polymer having a hydrophilic group and an epoxy group with a monobasic acid having an acryloyl group or a methacryloyl group, wherein the hydrophilic group is converted into COO, SO 3 , SO 4 , 0.1-4.0% by weight as PO 3 or PO 4 , acryloyl group or methacryloyl group as double bond equivalent
The present invention provides an electron beam-reactive magnetic paint characterized in that the binder of the magnetic powder is a polymer having an average degree of polymerization of 100 to 900 and containing vinyl chloride in an amount of 60% by weight or less. In addition, double bond equivalent means the molecular weight of a polymer per acryloyl group or methacryloyl group bonded to the polymer. The resin according to the invention is generally COOM,
A vinyl chloride polymer having at least one hydrophilic group selected from SO 3 M, SO 4 M, PO 3 M 2 and PO 4 M 2 and an epoxy group has an acid strength expressed by PKa of 3.5. It is obtained by reacting the following monobasic acids having an acryloyl group or a methacryloyl group. COOM, SO 3 M, SO 4 M, PO 3 M 2 and PO 4 M 2
A vinyl chloride polymer having at least one kind of hydrophilic group and an epoxy group selected from (1) a radically polymerizable monomer having the corresponding hydrophilic group and a monomer having an epoxy group, (2) A method of copolymerizing vinyl chloride with other monomers that can be copolymerized as necessary; (3) a method of copolymerizing vinyl chloride using a radical generator having an epoxy group; (3) a method of copolymerizing vinyl chloride with a monomer having an epoxy group; or an epoxy group-containing vinyl chloride polymer obtained by dehydrochlorinating a vinyl chloride polymer and then epoxidizing it with an epoxidizing agent such as percarboxylic acid. It can be obtained by a method such as a partial addition reaction with a compound having a functional group. It is also possible to combine these methods. Examples of monomers having epoxy groups commonly used in the production of vinyl chloride polymers having both hydrophilic groups and epoxy groups include unsaturated monomers such as allyl glycidyl ether and methallyl glycidyl ether. Glycidyl ethers of alcohols, glycidyl esters of unsaturated acids such as glycidyl acrylate, glycidyl methacrylate, glycidyl-P-vinylbenzoate, methylglycidyl itaconate, glycidyl ethyl maleate, glycidyl vinyl sulfonate, glycidyl (meth)allylsulfonate, butadiene Examples include epoxide olefins such as monooxide, vinylcyclohexene monooxide, and 2-methyl-5,6-epoxyhexene. Among the methods for producing vinyl chloride polymers in the present invention, examples of monomers having hydrophilic groups according to the method (1) above include acrylic acid,
unsaturated monocarboxylic acids such as methacrylic acid,
Examples include unsaturated dicarboxylic acids such as fumaric acid and itaconic acid, and their monoesters. Examples of SO3M include vinylsulfonic acid, methylvinylsulfonic acid, (meth)allylsulfonic acid, styrenesulfonic acid, ethyl (meth)acrylate-2-sulfonate, and 2-acrylamido-2-methylpropanesulfonic acid. , 3-allyloxy-2-hydroxypropanesulfonic acid, and alkali metal salts and ammonium salts of these acids. Examples of SO 4 M include acids such as ethyl (meth)acrylate-2-sulfate and 3-allyloxy-2-hydroxypropane sulfate, and alkali metal salts or ammonium salts of these acids. An example of PO4M2 is (meth)allylic acid-
Propyl 3-chloro-2-phosphate, ethyl (meth)acrylate-2-phosphate, 3-allyloxy-2
-Acids such as hydroxypropane phosphoric acid, and alkali metal or ammonium salts of these acids. Examples of PO3M2 include acids such as vinylsulfonic acid, acrylamide methanephosphonic acid, ethyl 2 - phosphonate-(meth)acrylate, 3-allyloxy-2-hydroxypropanephosphonic acid, and the alkali metals of these acids. Examples include salts and ammonium salts. Examples of radical generators having a hydrophilic group in the method (2) above include 4,4'-azobis-4-cyanovaleric acid for COOM, potassium persulfate, ammonium persulfate, etc. for SO4M ,
Examples of PO 4 M 2 include potassium superphosphate and sodium superphosphate. Further, in the method (3) above, examples of compounds used to introduce hydrophilic groups into the resin by polymerizing the copolymer of a monomer having an epoxy group and vinyl chloride include: At COOM,
Malonic acid, phthalic acid, etc. are used in SO 3 M, sodium sulfite, ammonium sulfite, sodium bisulfite, potassium bisulfite, ammonium thiosulfate, sodium aminoethanesulfonate, sodium sulfanilate, sodium sulfamate, etc. are used in SO 4 M. , sodium bisulfate, ammonium bisulfate, sodium 2-aminoethyl sulfate, etc., but for PO 3 M 2 , sodium hydrogen phosphite,
Ammonium hydrogen phosphite etc., but in PO 4 M 2 ,
Examples include dipotassium hydrogen phosphate and disodium hydrogen phosphate. In addition, examples of monomers that may be used as necessary other than monomers having an epoxy group, vinyl chloride, and monomers having a hydrophilic group include carboxylic acid vinyl esters such as vinyl acetate and vinyl propionate; Vinyl ethers such as methyl vinyl ether, isobutyl vinyl ether, and cetyl vinyl ether; vinylidenes such as vinylidene chloride and vinylidene fluoride; diethyl maleate, butyl benzyl maleate, di-2-hydroxyethyl maleate, dimethyl itaconate, (meth)acrylic acid Unsaturated carboxylic acid esters such as methyl, ethyl (meth)acrylate, lauryl (meth)acrylate, and 2-hydroxypropyl (meth)acrylate; olefins such as ethylene and propylene;
Examples include unsaturated nitriles such as (meth)acrylonitrile; aromatic vinyls such as styrene, α-methylstyrene, and p-methylstyrene.
These monomers are used not only to improve the solubility of the resin by controlling the compatibility and softening point of the resin according to the present invention and other resins when they are mixed, but also to improve the properties of the coating film and the coating. Appropriate selection is made depending on the need for improving the manufacturing process. In the copolymerization of a monomer having an epoxy group and vinyl chloride, or the copolymerization of a monomer having an epoxy group and a monomer having a hydrophilic group, and vinyl chloride, other monomers are further copolymerized. A wide variety of known polymerization methods can be used, including the case of polymerization. In addition, a partial polymer reaction between a copolymer of vinyl chloride as a monomer having an epoxy group and other monomers used as necessary, and a compound having a hydrophilic group,
A wide range of known methods can be used depending on process considerations such as the properties of raw materials and separation of products. COOM, SO 3 M, SO 4 obtained as above
The vinyl chloride polymer having at least one hydrophilic group selected from M, PO 3 M 2 and PO 4 M 2 and an epoxy group must contain 0.5% by weight or more of epoxy groups. If it is less than 0.5% by weight, the amount of acryloyl or methacryloyl groups bonded to the resin due to reaction with monobasic acid having acryloyl or methacryloyl groups is small, and the crosslinking reaction by electron beam tends to be insufficient, resulting in the magnetic layer being damaged after electron beam irradiation. durability is insufficient. Further, the monobasic acid having an acryloyl group or a methacryloyl group to be reacted with the vinyl chloride polymer having a hydrophilic group and an epoxy group needs to be a strong acid with an acid strength expressed by PKa of 3.5 or less. Weak acids with a PKa greater than 3.5 do not undergo addition reactions with epoxy groups under mild conditions, so higher temperatures, longer times, or the use of quaternary ammonium salts are required. However, since vinyl chloride polymers are easily dehydrochlorinated by heat, dehydrochlorination of the polymer and addition reaction of hydrogen chloride to epoxy groups precede the desired acryloyl modification reaction, resulting in the formation of the desired modified product. can not be obtained effectively, and
During the reaction, the vinyl chloride polymer deteriorates, resulting in a significant decrease in the thermal stability of the resulting resin. PKa having an acryloyl group or a methacryloyl group used in the production of the resin according to the present invention is
Monobasic acids of 3.5 or less are defined as including those in which the hydrogen atom of the group is replaced with another element.
Specific examples include halogen-substituted (meth)acrylic acids such as chloroacrylic acid, sulfonic acid-containing (meth)acrylic acids such as (meth)2-acrylamido-2-methylpropanesulfonic acid, and ethyl (meth)acrylate-2-sulfonate. Acrylates, (meth)
Examples include sulfuric acid-containing (meth)acrylates such as 2-ethyl acrylate sulfate, and phosphoric acid-containing di(meth)acrylates such as di-2-(meth)acryloxyethyl acid phosphate. The reaction between a vinyl chloride polymer containing a hydrophilic group and an epoxy group and a monobasic acid with a PKa of 3.5 or less can be carried out at room temperature or at 80°C in a solvent that dissolves both.
It progresses easily under relatively mild conditions up to ℃. Of course, it is also possible to react this vinyl chloride polymer in the form of an aqueous dispersion;
If the monobasic acid is soluble in the polymer, it is also possible to directly knead and react the two on a Banbury or roll. In either case, the amount of monobasic acid used is desirably equal to or less than the equivalent molar amount of epoxy groups in the vinyl chloride polymer. If too much excess is used, unreacted monobasic acid remains, which not only increases the risk of increased hygroscopicity of the resulting resin and development of metal corrosive properties, but also increases the risk of the hydrophilic acid in this vinyl chloride polymer. There is a risk that the resulting resin will become insolubilized by inducing a reaction between the functional group and the epoxy group. In addition, during the reaction, a polymerization inhibitor such as hydroquinone, hydroquinone monomethyl ether, and t-butylcatechol is added within a common sense range. The resin according to the present invention thus obtained has an average degree of polymerization of 100 to 900, preferably 200 to 900.
500, the content of vinyl chloride is 60% by weight or more. If the degree of polymerization is less than 100, the wear resistance of the magnetic layer will be insufficient no matter how much electron beam crosslinking is performed.
If it exceeds 900, the viscosity of the paint is high and the magnetic powder tends to be insufficiently dispersed. Furthermore, if the content of vinyl chloride is less than 60% by weight, disadvantages may occur, such as a decrease in compatibility with flexible materials and a marked decrease in solvent removal from the coating film. In addition, the amount of hydrophilic groups bonded to the resin is COO,
0.1-4.0% by weight as SO 3 , SO 4 , PO 3 or PO 4
It is necessary that If it is less than 0.1% by weight, the dispersibility of the magnetic powder will be insufficient, and if it exceeds 4.0% by weight, the hydrophilicity of the resin will become strong, and not only will the solubility in solvents be insufficient, but the moisture resistance of the coating film will decrease. ,
Furthermore, agglomeration of the magnetic powder occurs, which worsens the dispersibility. By reaction with a monobasic acid, an electron beam-curable double bond is introduced into the resin according to the present invention in the form of vic-glycol monoester of the monobasic acid, and cross-linking with the isocyanate compound along with chlorohydrin generated during the reaction. It also makes it possible. The amount of double bonds contributing to electron beam curing needs to be 10,000 or less in terms of double bond equivalent. If the amount of double bonds is small, such as exceeding 10,000 double bond equivalents, the running properties and durability of the magnetic layer after electron beam irradiation will be insufficient. The resin according to the present invention, like the ordinary vinyl chloride resin binder for magnetic coatings, generally constitutes a binder system together with flexible materials such as polyurethane resin, polyester resin, and acrylonitrile-butadiene copolymer. By replacing part or all of the flexible material with other resins, oligomers, or monomers having one or more electron beam-reactive unsaturated bonds, magnetic powder and, if necessary, lubricants, dispersants, etc. It can be used as a dispersion in any solvent by mixing with known materials such as , antistatic agents, and abrasives. If necessary, in addition to the resin according to the present invention, vinyl chloride-vinyl acetate-maleic acid copolymer resin, vinyl chloride-vinyl alcohol-vinyl acetate copolymer resin, cellulose resin,
It is also possible to use common resin binders for magnetic coatings, such as phenoxy resins, amino resins, epoxy resins, butyral resins, and acrylic resins, as long as the object of the present invention is achieved. In addition, magnetic powders include metal magnetic powders such as Fe powder and Co powder, as well as γ-Fe 2 O 3 , Fe 3 O 4 ,
Co-containing γ-Fe 2 O 3 , Co-containing Fe 3 O 4 , iron oxide powder such as barium ferrite, and CrO 2 powder are used. As the active energy ray used for crosslinking the magnetic coating film using the resin according to the present invention, an electron beam produced by an electron beam accelerator is used from the viewpoint of controlling the absorbed dose and ease of introduction into the manufacturing process line. The electron beam used to cure the magnetic coating film has an accelerating voltage of 100 to 750 KV, preferably 150 to 750 KV, in terms of penetrating power.
The absorbed dose is 0.5-20 using a 300KV electron beam accelerator.
It is best to irradiate it so that it becomes a megarad. [Example] The present invention will be specifically explained below using Examples. Note that parts and percentages are based on weight. In addition, the amount of vinyl chloride was determined by quantifying the amount of chlorine through combustion, the amount of double bonds was determined by titration, the amount of epoxy groups was determined by titration, and the amount of hydrophilic groups was determined by a combination of elemental analysis, titration, and infrared absorption analysis. Ta. (Resin synthesis example) Reference example 1 By emulsion polymerizing allyl glycidyl ether and vinyl chloride with potassium persulfate,
4% epoxy group, 0.5% SO4 , vinyl chloride
An 82% vinyl chloride copolymer was obtained. This copolymer
100 parts of 2-acrylamido-2-methylpropanesulfonic acid (PKa2.0) and 0.01 part of hydroquinone monoethyl ether were dissolved in 200 parts of dimethylformamide, stirred and mixed at 65°C for 3 hours, and then a large amount of The reaction solution was dropped into water, the resin was recovered, and the resin was thoroughly washed by repeatedly washing with water and hot water with strong stirring, and then dried to obtain Resin A. Reference Example 2 Resin B was obtained in the same manner as in Example 1 except that α-chloroacrylic acid (PKa2.5) was used instead of 2-acrylamido-2-methylpropanesulfonic acid. Reference Example 3 By polymerizing glycidyl methacrylate, sodium styrene sulfonate, vinyl acetate and vinyl chloride in methanol with azobisisobutyronitrile, the amount of epoxy groups was 3% and SO 3
A vinyl chloride copolymer containing 0.5% of vinyl chloride and 72% of vinyl chloride was obtained. 100 parts of this copolymer and 10 parts of di-2-acryloxyethyl acid phosphate (PKa2.3) were mixed together with 0.015 part of hydroquinone monomethyl ether in a high-speed mixer, and then transferred to a kneading roll at 90°C. The sheet-like material obtained by kneading for 10 minutes was pulverized with water in a high-speed stirrer, thoroughly washed with hot water, and then dried to obtain Resin C. Reference Example 4 A copolymer obtained by suspension polymerizing butadiene monooxide, glycidyl methacrylate, vinyl acetate, and vinyl chloride with lauroyl peroxide was carboxy-modified with malonic acid to create a copolymer with 3.5% epoxy groups and 0.9% COO. A vinyl chloride copolymer containing 78% vinyl chloride was obtained. Resin D was obtained using 100 parts of this resin in the same manner as in Example 1. Comparative Reference Example 1 Resin E was obtained in the same manner as in Example 1 except that acrylic acid (PKa4.2) was used instead of 2-acrylamido-2-methylpropanesulfonic acid. Comparative Reference Example 2 When a vinyl chloride copolymer containing epoxy groups was prepared in the same manner as in Example 3 without using sodium styrene sulfonate, the amount of epoxy groups was 3.7%.
Vinyl chloride accounted for 77%. Resin F was obtained using this copolymer in the same manner as in Example 3. Comparative Reference Example 3 When a vinyl chloride copolymer containing epoxy groups was prepared in the same manner as in Example 3 by reducing the amount of glycidyl methacrylate used, the amount of epoxy groups was 0.4%.
SO 3 was 0.5% and vinyl chloride was 84%. This copolymer was operated in the same manner as in Example 3 to obtain resin G. Comparative Reference Example 4 100 parts of a commercially available vinyl chloride-vinyl acetate-vinyl alcohol terpolymer, 150 parts of toluene and 80 parts of cyclohexanone were placed in a four-necked flask from step 3, heated to dissolve, heated to 80°C, and then placed in a tolyorange. Add 8 parts of 2-hydroxyethyl methacrylate adduct of isocyanate and add 0.0015 parts of tin octylate.
1 part and 0.0015 part of hydroquinone were added, and the mixture was allowed to react at 80°C in a N 2 stream until the NCO reaction rate reached 90% or more. After the reaction is completed, cool and methyl ethyl ketone
A resin solution H was obtained by adding 100 parts for dilution. The properties of these resins are shown in the table together with commercially available vinyl chloride-vinyl acetate-maleic acid terpolymer (I) and vinyl chloride-vinyl acetate-vinyl alcohol terpolymer (J). Examples 1 to 4 and Comparative Examples 1 to 6 Next, each resin was evaluated as a magnetic coating material and a magnetic recording medium. The results are shown in the table. The evaluation method was as follows. 1 Solubility Vinyl chloride resin 100 parts, methyl ethyl ketone 200 parts
A solution consisting of 1 part and 200 parts of toluene was prepared, and the degree of transparency of this solution was visually observed and judged on a three-grade scale of ○△x. 2 Thermal stability 1.0g of vinyl chloride resin was placed in a 15cc test tube.
Plug the opening with absorbent cotton sandwiched with Congo Red test paper and place it in an oil bath at 150℃.
The time required for the Congo Red test paper to change color due to the generated hydrochloric acid was measured. 3. Dispersion Stability A mixture consisting of 400 parts of metallic iron magnetic powder, 100 parts of vinyl chloride resin, 300 parts of methyl ethyl ketone, 300 parts of methyl isobutyl ketone, and 300 parts of toluene was dispersed under high-speed shearing for 90 minutes. This dispersed paint was collected in a sample bottle and stored in a constant temperature bath at 25°C, and the state of gel formation was observed. Whether a gel is generated or not,
A portion of the dispersed paint was taken out onto a glass plate, diluted with about 5 times the amount of methyl ethyl ketone, mixed using a glass rod, and visually observed. The results are indicated by ○△× in order of decreasing gel formation. 4 Glossiness 400 parts of cobalt magnetic iron oxide powder, 70 parts of vinyl chloride resin, 30 parts of polyurethane resin (Nituporan 2304 manufactured by Nippon Polyurethane Industries Co., Ltd.), 300 parts of methyl ethyl ketone, 300 parts of methyl isobutyl ketone, 300 parts of toluene, silicon After a mixture consisting of 2 parts of oil was dispersed under high-speed shearing for 90 minutes, the resulting magnetic paint was applied onto a polyester film to a film thickness of 5 μm, subjected to magnetic orientation treatment, and then dried. The reflectance of the magnetic coating film at a reflection angle of 60° was measured using a gloss meter. However, for Resin J, after 90 minutes of dispersion mixing, 20 parts of polyisocyanate (Coronate L manufactured by Nippon Polyurethane Industries Co., Ltd.) was added, and then 10 parts of
A similar test was conducted as a magnetic paint by mixing and dispersing the mixture for minutes. 5 Pot Life The magnetic coating film used for gloss evaluation was passed through a calendar roll with 1/2 the normal linear pressure, the reflectance at a reflection angle of 60°C was measured using a gloss meter, and the film was kept for another week.
The coating film left at 23° C. and 50% relative humidity was calendered under the same conditions as above, the gloss was measured, and the pot life was determined by the difference in drop. 6 Squareness ratio (Br/Bm) The magnetic coating film used for gloss evaluation was 12.5 mm x 50
It was cut into mm pieces and measured using a magnetic property measuring machine. 7 Durability, crosslinking The magnetic coating used for gloss evaluation was smoothed with a calendar roll, and then subjected to acceleration voltage using an electrocurtain type electron beam accelerator manufactured by ESI.
After curing the coating film by irradiating electron beam under N2 atmosphere at 168KV and irradiation dose of 10Mrad, the load was 100g.
The sample was placed in contact with a rotating drum covered with abrasive paper and rotated at 150 rpm, and the extent to which the magnetic paint adhered to the abrasive paper was visually observed and judged on a three-grade scale of ○, Δ, and ×. Further, a part of the cured coating film was taken and rubbed with absorbent cotton impregnated with methyl ethyl ketone, and the degree of shedding of the coating film was evaluated on a three-grade scale of ○, Δ, and ×. However, for the coating film using Resin J, heat treatment was performed at 65° C. for 65 hours instead of electron beam irradiation. 8 Running performance The force generated between the coating film and the rotating drum was measured using a U gauge at 65°C and a relative humidity of 80% using the same method as the durability evaluation, and the running resistance was evaluated in three grades: ○△× in descending order of running resistance. . 【table】
Claims (1)
M2(Mは水素、アルカリ金属またはアンモニウ
ム)より選ばれる少くとも一種の親水性基とエポ
キシ基とを有する塩化ビニル系重合体にアクリロ
イル基またはメタクリロイル基を有する一塩基酸
を反応させて得られる重合体であつて、該親水性
基をCOO,SO3,SO4,PO3またはPO4として0.1
〜4.0重量%、アクリロイル基またはメタクリロ
イル基を二重結合当量として10000以下及び塩化
ビニルを60重量%以上含有する平均重合度100〜
900の重合体を磁性粉のバインダーとすることを
特徴とする電子線反応性磁性塗料。1 COOM, SO 3 M, SO 4 M, PO 3 M 2 and PO 4
Obtained by reacting a vinyl chloride polymer having at least one hydrophilic group selected from M 2 (M is hydrogen, alkali metal, or ammonium) and an epoxy group with a monobasic acid having an acryloyl group or a methacryloyl group. A polymer, wherein the hydrophilic group is COO, SO 3 , SO 4 , PO 3 or PO 4 0.1
~4.0% by weight, an average degree of polymerization of 100~ containing acryloyl group or methacryloyl group as double bond equivalent of 10000 or less and vinyl chloride 60% by weight or more
An electron beam-reactive magnetic paint characterized by using a 900 polymer as a binder for magnetic powder.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21164584A JPS6189207A (en) | 1984-10-09 | 1984-10-09 | magnetic paint |
| US06/784,660 US4600521A (en) | 1984-10-09 | 1985-10-04 | Electron-beam reactive magnetic coating composition for magnetic recording media |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21164584A JPS6189207A (en) | 1984-10-09 | 1984-10-09 | magnetic paint |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP35128892A Division JPH0689057B2 (en) | 1992-12-07 | 1992-12-07 | Method for producing vinyl chloride resin |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6189207A JPS6189207A (en) | 1986-05-07 |
| JPH0574621B2 true JPH0574621B2 (en) | 1993-10-18 |
Family
ID=16609212
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21164584A Granted JPS6189207A (en) | 1984-10-09 | 1984-10-09 | magnetic paint |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6189207A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61106605A (en) * | 1984-10-31 | 1986-05-24 | Nippon Zeon Co Ltd | magnetic paint |
| JP2654955B2 (en) * | 1987-12-01 | 1997-09-17 | 日本ゼオン株式会社 | Magnetic recording media |
-
1984
- 1984-10-09 JP JP21164584A patent/JPS6189207A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6189207A (en) | 1986-05-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4600521A (en) | Electron-beam reactive magnetic coating composition for magnetic recording media | |
| JPS6153368A (en) | Resin for magnetic coating | |
| US4851465A (en) | Resin for magnetic paint | |
| US4784913A (en) | Magnetic recording medium | |
| JPH026787B2 (en) | ||
| JP2821754B2 (en) | Magnetic recording media | |
| US6139982A (en) | Magnetic recording medium having a binder system including a polyurethane polymer having both phosphonate and quaternary ammonium pendant groups | |
| JPS6153367A (en) | Resin for magnetic paint | |
| JPH0126626B2 (en) | ||
| US4789599A (en) | Magnetic recording medium | |
| JPH036195B2 (en) | ||
| JPS6189207A (en) | magnetic paint | |
| JP2704259B2 (en) | Magnetic recording media | |
| JPH0689057B2 (en) | Method for producing vinyl chloride resin | |
| US5221582A (en) | Magnetic recording medium containing a binder consisting essentially of a specified vinyl chloride polymer and a specified polyurethane polymer | |
| JPH0572431B2 (en) | ||
| JPS62197471A (en) | Resin for magnetic paint | |
| JPH0363125B2 (en) | ||
| JP2654955B2 (en) | Magnetic recording media | |
| JPS63195823A (en) | magnetic recording medium | |
| JP2652182B2 (en) | Manufacturing method of resin for magnetic paint | |
| JPS60185226A (en) | Resin for magnetic paint | |
| JPS62149027A (en) | magnetic recording medium | |
| JPS6316416A (en) | magnetic recording medium | |
| JPS62208422A (en) | Magnetic recording medium |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |