JPH0578894A - Liquid feed nozzle - Google Patents

Liquid feed nozzle

Info

Publication number
JPH0578894A
JPH0578894A JP24347591A JP24347591A JPH0578894A JP H0578894 A JPH0578894 A JP H0578894A JP 24347591 A JP24347591 A JP 24347591A JP 24347591 A JP24347591 A JP 24347591A JP H0578894 A JPH0578894 A JP H0578894A
Authority
JP
Japan
Prior art keywords
liquid supply
liquid
nozzle chamber
nozzle
strip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24347591A
Other languages
Japanese (ja)
Other versions
JP2625052B2 (en
Inventor
Kiyohide Tsuchiya
清秀 土屋
Tadashi Ogata
正 緒方
Katsuaki Nakagawa
勝明 中川
Kazuhiro Marumo
和裕 丸茂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Nippon Steel Plant Designing Corp
Original Assignee
Nittetsu Plant Designing Corp
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nittetsu Plant Designing Corp, Nippon Steel Corp filed Critical Nittetsu Plant Designing Corp
Priority to JP3243475A priority Critical patent/JP2625052B2/en
Priority to US07/948,180 priority patent/US5236566A/en
Priority to EP92116194A priority patent/EP0534368B1/en
Priority to DE69218708T priority patent/DE69218708T2/en
Publication of JPH0578894A publication Critical patent/JPH0578894A/en
Application granted granted Critical
Publication of JP2625052B2 publication Critical patent/JP2625052B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

(57)【要約】 【目的】 本発明は、大流量の液体を脈動や振動が非常
に小さい整流状態の液流とし、かつ、ストリップの幅方
向に対する流速分布を均一とする給液ノズルを提供す
る。 【構成】 給液ノズルを1次ノズル室と2次ノズル室と
に仕切り壁で分割し、1次ノズル室の両側に給液口をそ
れぞれ設け、1次ノズル室と2次ノズル室との間に中央
から両側へ漸増する隙間を有するスリットを設け、2次
ノズル室から通板部へ給液する平行隙間を有する噴流口
を設けた給液ノズル。
(57) [Summary] [Object] The present invention provides a liquid supply nozzle which makes a large flow of liquid into a liquid flow in a rectified state in which pulsation and vibration are very small, and has a uniform flow velocity distribution in the width direction of the strip. To do. [Structure] The liquid supply nozzle is divided into a primary nozzle chamber and a secondary nozzle chamber by a partition wall, and liquid supply ports are provided on both sides of the primary nozzle chamber, respectively, between the primary nozzle chamber and the secondary nozzle chamber. A liquid supply nozzle provided with a slit having a gap gradually increasing from the center to both sides, and a jet port having a parallel gap for supplying liquid from the secondary nozzle chamber to the plate passing portion.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、板状の表面に一方向か
ら酸液、メッキ液などの液体を供給する給液ノズルに関
するもので、さらに詳しくは、被処理面に均一な流速の
液体を供給する給液ノズルに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid supply nozzle for supplying a liquid such as an acid liquid or a plating liquid to a plate-shaped surface from one direction, and more specifically, a liquid having a uniform flow velocity on a surface to be treated. The present invention relates to a liquid supply nozzle for supplying liquid.

【0002】[0002]

【従来の技術】給液ノズルは、板状の表面に酸液、メッ
キ液などの液体を供給するなど種々の産業分野で使用さ
れている。即ち、板状の被処理表面に均一な流速の酸
液、メッキ液などの液体を供給する給液ノズルは、例え
ば特開昭61−90860号公報は、図5に示すよう
な、また特開昭61−64897号公報は、図6に示す
ような給液ノズルが知られている。
2. Description of the Related Art Liquid supply nozzles are used in various industrial fields such as supplying a liquid such as an acid liquid or a plating liquid onto a plate-shaped surface. That is, a liquid supply nozzle for supplying a liquid such as an acid liquid or a plating liquid having a uniform flow velocity to a plate-shaped surface to be processed is disclosed in, for example, Japanese Patent Laid-Open No. 61-90860, as shown in FIG. Japanese Patent Laid-Open No. 61-64897 discloses a liquid supply nozzle as shown in FIG.

【0003】[0003]

【発明が解決しようとする課題】本発明は、大流量のメ
ッキ液を供給して、高効率・高品質のメッキを行うメッ
キ装置に提供されるものである。
DISCLOSURE OF THE INVENTION The present invention is to provide a plating apparatus for supplying a large amount of plating solution to perform high efficiency and high quality plating.

【0004】すなわち、メッキタンクにおいて被メッキ
材が0.1mm程度の非常に薄いストリップにメッキを高
効率で行うためには、大流量の液体を供給しなければな
らない。また、液の脈動や振動が大きいとその脈動や振
動によってストリップに皺や折れが発生するため、脈動
や振動が非常に小さい整流状態の液流としなければなら
ない。さらに、メッキ厚さを厳格な管理基準の中で行う
場合、ストリップの幅方向に対する流速分布も均一でな
ければならない。
That is, in order to perform highly efficient plating on a very thin strip having a material to be plated of about 0.1 mm in a plating tank, a large flow rate of liquid must be supplied. Further, if the pulsation or vibration of the liquid is large, the pulsation or vibration causes wrinkles or breaks in the strip. Therefore, the liquid flow must be in a rectified state with very small pulsation or vibration. Further, when the plating thickness is controlled under a strict control standard, the flow velocity distribution in the width direction of the strip must be uniform.

【0005】本発明は、以上のような課題を解決するた
めになされたものであり、その目的とするところは、大
流量の液体を脈動や振動が非常に小さい整流状態の液流
とし、かつ、ストリップの幅方向に対する流速分布を均
一とする給液ノズルを提供することにある。
The present invention has been made to solve the above problems, and an object of the present invention is to make a large flow rate of a liquid flow in a rectified state in which pulsation and vibration are extremely small, and The purpose of the present invention is to provide a liquid supply nozzle that makes the flow velocity distribution uniform in the width direction of the strip.

【0006】[0006]

【課題を解決するための手段】本発明の要旨は、給液ノ
ズルを1次ノズル室と2次ノズル室とに仕切り壁で分割
し、1次ノズル室の両側に給液口をそれぞれ設け、1次
ノズル室と2次ノズル室との間に中央から両側へ漸増す
る隙間を有するスリットを設け、2次ノズル室から通板
部へ給液する平行隙間を有する噴流口を設けたことを特
徴とする給液ノズルである。
SUMMARY OF THE INVENTION The gist of the present invention is to divide a liquid supply nozzle into a primary nozzle chamber and a secondary nozzle chamber with a partition wall, and provide liquid supply ports on both sides of the primary nozzle chamber. A slit having a gap gradually increasing from the center to both sides is provided between the primary nozzle chamber and the secondary nozzle chamber, and a jet port having a parallel gap for supplying liquid from the secondary nozzle chamber to the plate passing portion is provided. And the liquid supply nozzle.

【0007】[0007]

【作用】図1は本発明の実施例を示す側部断面図、図2
は図1のA−A断面図、図3は図2のB−B断面図であ
る。
1 is a side sectional view showing an embodiment of the present invention, FIG.
3 is a sectional view taken along the line AA of FIG. 1, and FIG. 3 is a sectional view taken along the line BB of FIG.

【0008】図1に示すように、給液ノズル2,3はス
トリップ1の表裏に配置している。液は図3に示すよう
に、4ケ所の給液管5,5′および6′から供給され
る。1つのノズルに対して、2ケ所の給液口から供給さ
れた液は、1次ノズル室2−5あるいは3−5で合流す
る。2ケ所の給液口から供給される液は、1次ノズル室
でお互いの液が衝突する状態で合流するため、1次ノズ
ル室内の静圧力分布を考えると、必然的にノズル室の中
央部分の静圧力が高くなっている。
As shown in FIG. 1, the liquid supply nozzles 2 and 3 are arranged on the front and back of the strip 1. The liquid is supplied from four liquid supply pipes 5, 5'and 6 ', as shown in FIG. The liquid supplied from the two liquid supply ports to one nozzle joins in the primary nozzle chamber 2-5 or 3-5. The liquids supplied from the two liquid supply ports join together in a state where the liquids collide with each other in the primary nozzle chamber, so considering the static pressure distribution in the primary nozzle chamber, it is inevitable that the central portion of the nozzle chamber The static pressure of is high.

【0009】1次ノズル室で合流した液は、仕切り壁と
ノズルの壁によって作ったスリットを通過して2次ノズ
ル室に流入し、噴流口からストリップ1に向かって吹き
出される。この時、スリット7は中央部分Aから給液口
付近B,B′に向かって、テーパー状に広くなってい
る。すなわち、中央部分からは液は流れ出しにくく給液
口付近からは液は流れ出しやすい構造にしている。この
構造的配慮とノズル室内の静圧力分布のバランスによっ
てノズルの幅方向に対して均一な流速分布が得られるの
である。
The liquids merged in the primary nozzle chamber pass through the slit formed by the partition wall and the wall of the nozzle, flow into the secondary nozzle chamber, and are blown out from the jet port toward the strip 1. At this time, the slit 7 widens in a taper shape from the central portion A toward the liquid supply port vicinity B and B ′. That is, the structure is such that the liquid does not easily flow out from the central portion and the liquid easily flows out from the vicinity of the liquid supply port. Due to this structural consideration and the balance of the static pressure distribution in the nozzle chamber, a uniform flow velocity distribution can be obtained in the width direction of the nozzle.

【0010】図4に仕切り壁のない従来ノズルと本発明
ノズルの流速分布を示す。
FIG. 4 shows the flow velocity distributions of the conventional nozzle having no partition wall and the nozzle of the present invention.

【0011】[0011]

【実施例】以下、本発明を図面にもとづいて説明する。
給液ノズル2,3はストリップ1の表裏に配置してい
る。すなわち、この実施例はストリップ1の表裏両方に
給液する場合のものである。ただし、説明は分かり易く
するために、給液ノズル2の方を主体として説明する。
給液ノズル3も同様の機能を有している。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the drawings.
The liquid supply nozzles 2 and 3 are arranged on the front and back of the strip 1. That is, this embodiment is for supplying liquid to both the front and back of the strip 1. However, for ease of explanation, the liquid supply nozzle 2 will be mainly described.
The liquid supply nozzle 3 also has a similar function.

【0012】給液ノズル2は槽本体4にフランジ2〜4
によって固定されている。液は図3に示すように、2ケ
所の給液管6および6′から供給される。ノズル2に対
して、2ケ所の給液口から供給された液は、1次ノズル
室2−5で合流する。
The liquid supply nozzle 2 has a tank body 4 and flanges 2-4.
Is fixed by. The liquid is supplied from two liquid supply pipes 6 and 6 ', as shown in FIG. The liquid supplied from the two liquid supply ports to the nozzle 2 joins in the primary nozzle chamber 2-5.

【0013】1次ノズル室2−5の大きさは大きくする
必要はなく、給液口の大きさとほぼ同等である。また、
給液口から供給される液の流速は約3m/sec と高速で
ある。 2ケ所の給液口から供給される液は、1次ノズ
ル室でお互いの液が衝突する状態で合流するため、1次
ノズル室内の静圧力分布を考えると、必然的にノズル室
の中央部分の静圧力が高くなっている。1次ノズル室2
−5で合流した液は、仕切り壁2−2とノズル2の壁に
よって作ったスリット7を通過して2次ノズル室に流入
する。この時、スリット7は中央部分Aから給液口付近
B,B′に向かって、テーパー状に広くなっているが、
この実施例の寸法はスリットA部で約10nm、スリット
B,B′部で約30mmである。
The size of the primary nozzle chamber 2-5 does not need to be large, and is almost the same as the size of the liquid supply port. Also,
The flow velocity of the liquid supplied from the liquid supply port is as high as about 3 m / sec. The liquids supplied from the two liquid supply ports join together in a state where the liquids collide with each other in the primary nozzle chamber, so considering the static pressure distribution in the primary nozzle chamber, it is inevitable that the central portion of the nozzle chamber The static pressure of is high. Primary nozzle chamber 2
The liquids joined at -5 pass through the partition wall 2-2 and the slit 7 formed by the wall of the nozzle 2 and flow into the secondary nozzle chamber. At this time, the slit 7 widens in a taper shape from the central portion A toward the liquid supply port vicinity B and B ′.
The dimensions of this embodiment are about 10 nm at the slit A portion and about 30 mm at the slits B and B '.

【0014】2次ノズル室では、液の一部が渦巻き状と
なって均一になる大きさが必要だが、1次ノズル室より
小さくてよい。2次ノズル室に流入した液は、最終的
に、全幅に渡って平行隙間を有する噴流口からストリッ
プ1に向かって吹き出される。噴流口の向きは、ストリ
ップ1に対してできるだけ平行になる方が、ストリップ
1に対して振動を与えないが、構造の制約上限界があ
る。この実施例の場合、15°の角度である。
The secondary nozzle chamber is required to have a size in which a part of the liquid becomes spiral and uniform, but it may be smaller than the primary nozzle chamber. The liquid that has flowed into the secondary nozzle chamber is finally blown toward the strip 1 from the jet port having a parallel gap over the entire width. If the direction of the jet port is as parallel to the strip 1 as possible, vibration will not be applied to the strip 1, but there is a limit due to structural restrictions. In the case of this example, the angle is 15 °.

【0015】以上、実施例について説明したが、ストリ
ップ1に対して下向きに吹き出すのに限定されるもので
はなく、ストリップ1に対して上向きに吹き出したり、
水平方向に吹き出したりできる。また、給液ノズルは図
1のようにストリップの表裏面に各々設置したり、ある
いはストリップの片面のみに設置したりなど応用するこ
とができる。そして、本発明の給液ノズルは、メッキに
限らず酸洗、脱脂などの作業を行う装置においても十分
使用可能である。
Although the embodiment has been described above, the present invention is not limited to blowing the strip 1 downward, but may be blown upward with respect to the strip 1.
You can blow horizontally. Further, the liquid supply nozzle can be applied to each of the front and back surfaces of the strip as shown in FIG. 1, or can be applied to only one side of the strip. Further, the liquid supply nozzle of the present invention can be sufficiently used not only in plating but also in an apparatus for performing operations such as pickling and degreasing.

【0016】以上本発明を図面にもとづいて説明した
が、本発明はこれに限定されるものではなく、給液ノズ
ルの目的に従い設計変更が可能であり、勿論本発明の範
囲を逸脱するものではない。
The present invention has been described above with reference to the drawings, but the present invention is not limited to this, and the design can be changed according to the purpose of the liquid supply nozzle, and of course it does not depart from the scope of the present invention. Absent.

【0017】[0017]

【発明の効果】本発明によれば次のような効果がある。
第1に、被メッキ材が0.1mm程度の非常に薄いストリ
ップに液を供給した時、ストリップに皺や折れを発生さ
せない、脈動や振動が非常に小さい整流状態の液流とす
ることができる。第2に、メッキ厚さを厳格な管理基準
の中で行うような場合に必要な、ストリップの幅方向に
対する流速分布を均一することができる。
The present invention has the following effects.
First, when a liquid is supplied to a very thin strip having a material to be plated of about 0.1 mm, it is possible to form a liquid flow in a rectified state in which wrinkles and breaks do not occur in the strip and pulsation and vibration are very small. .. Secondly, it is possible to make uniform the flow velocity distribution in the width direction of the strip, which is necessary when the plating thickness is performed under strict control standards.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例を示す側部断面図である。FIG. 1 is a side sectional view showing an embodiment of the present invention.

【図2】図1のA−A断面図である。FIG. 2 is a sectional view taken along line AA of FIG.

【図3】図2のB−B断面図である。FIG. 3 is a sectional view taken along line BB of FIG.

【図4】本発明と従来技術のノズルの流速分布の図表で
ある。
FIG. 4 is a chart of the flow velocity distribution of the nozzle of the present invention and the prior art.

【図5】従来技術の給液ノズルの説明図である。FIG. 5 is an explanatory diagram of a conventional liquid supply nozzle.

【図6】(a),(b)は従来技術の他の給液ノズルの
説明図で(a)は側面図、(b)はC−C断面図であ
る。
6A and 6B are explanatory views of another conventional liquid supply nozzle, FIG. 6A is a side view, and FIG. 6B is a sectional view taken along line CC.

【符号の説明】[Explanation of symbols]

1 ストリップ 2 給液ノズル 2−1 給液口 2−1′ 給液口 2−2 仕切り壁 2−3 噴流口 2−4 フランジ 2−5 1次ノズル室 2−6 2次ノズル室 3 給液ノズル 4 槽本体 5 給液管 5′ 給液管 6 給液管 6′ 給液管 7 スリット 1 Strip 2 Liquid Supply Nozzle 2-1 Liquid Supply Port 2-1 'Liquid Supply Port 2-2 Partition Wall 2-3 Jet Port 2-4 Flange 2-5 Primary Nozzle Chamber 2-6 Secondary Nozzle Chamber 3 Liquid Supply Nozzle 4 Tank body 5 Liquid supply pipe 5 ′ Liquid supply pipe 6 Liquid supply pipe 6 ′ Liquid supply pipe 7 Slit

───────────────────────────────────────────────────── フロントページの続き (72)発明者 中川 勝明 北九州市戸畑区大字中原46−59 日鐵プラ ント設計株式会社内 (72)発明者 丸茂 和裕 北九州市戸畑区大字中原46−59 日鐵プラ ント設計株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Katsuaki Nakagawa 46-59 Nakahara, Tobata-ku, Kitakyushu City Nittetsu Plant Design Co., Ltd. Into Design Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 給液ノズルを1次ノズル室と2次ノズル
室とに仕切り壁で分割し、1次ノズル室の両側に給液口
をそれぞれ設け、1次ノズル室と2次ノズル室との間に
中央から両側へ漸増する隙間を有するスリットを設け、
2次ノズル室から通板部へ給液する平行隙間を有する噴
流口を設けたことを特徴とする給液ノズル。
1. A liquid supply nozzle is divided into a primary nozzle chamber and a secondary nozzle chamber by a partition wall, and liquid supply ports are provided on both sides of the primary nozzle chamber, and a primary nozzle chamber and a secondary nozzle chamber are provided. Provide a slit with a gap that gradually increases from the center to both sides,
A liquid supply nozzle having a jet port having a parallel gap for supplying liquid from the secondary nozzle chamber to the plate passing portion.
JP3243475A 1991-09-24 1991-09-24 Liquid supply nozzle Expired - Fee Related JP2625052B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP3243475A JP2625052B2 (en) 1991-09-24 1991-09-24 Liquid supply nozzle
US07/948,180 US5236566A (en) 1991-09-24 1992-09-21 Vertical type stream plating apparatus
EP92116194A EP0534368B1 (en) 1991-09-24 1992-09-22 Vertical type stream plating plating apparatus
DE69218708T DE69218708T2 (en) 1991-09-24 1992-09-22 Vertical flow plating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3243475A JP2625052B2 (en) 1991-09-24 1991-09-24 Liquid supply nozzle

Publications (2)

Publication Number Publication Date
JPH0578894A true JPH0578894A (en) 1993-03-30
JP2625052B2 JP2625052B2 (en) 1997-06-25

Family

ID=17104444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3243475A Expired - Fee Related JP2625052B2 (en) 1991-09-24 1991-09-24 Liquid supply nozzle

Country Status (1)

Country Link
JP (1) JP2625052B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100451253B1 (en) * 2001-11-09 2004-10-06 엘지전선 주식회사 Electrolytic Copper foil manufacturing apparatus
JP2011219834A (en) * 2010-04-13 2011-11-04 Nippon Steel Engineering Co Ltd Vertical jet plating apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60199238A (en) * 1984-03-23 1985-10-08 Nissin Electric Co Ltd Scale converting device
JPS6199695A (en) * 1984-10-18 1986-05-17 Kawasaki Steel Corp Nozzle for supplying plating liquid

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60199238A (en) * 1984-03-23 1985-10-08 Nissin Electric Co Ltd Scale converting device
JPS6199695A (en) * 1984-10-18 1986-05-17 Kawasaki Steel Corp Nozzle for supplying plating liquid

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100451253B1 (en) * 2001-11-09 2004-10-06 엘지전선 주식회사 Electrolytic Copper foil manufacturing apparatus
JP2011219834A (en) * 2010-04-13 2011-11-04 Nippon Steel Engineering Co Ltd Vertical jet plating apparatus

Also Published As

Publication number Publication date
JP2625052B2 (en) 1997-06-25

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