JPH0580565A - Substrate for electrophotographic photoreceptor and method for producing the same - Google Patents

Substrate for electrophotographic photoreceptor and method for producing the same

Info

Publication number
JPH0580565A
JPH0580565A JP24005891A JP24005891A JPH0580565A JP H0580565 A JPH0580565 A JP H0580565A JP 24005891 A JP24005891 A JP 24005891A JP 24005891 A JP24005891 A JP 24005891A JP H0580565 A JPH0580565 A JP H0580565A
Authority
JP
Japan
Prior art keywords
substrate
aluminum
anodized film
electrophotographic photoreceptor
aluminum alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24005891A
Other languages
Japanese (ja)
Inventor
Masahiko Kasahara
正彦 笠原
Yukihisa Tamura
幸久 田村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP24005891A priority Critical patent/JPH0580565A/en
Publication of JPH0580565A publication Critical patent/JPH0580565A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photoreceptors In Electrophotography (AREA)

Abstract

(57)【要約】 【目的】干渉縞模様が発生しない高品質の画像が得られ
る電子写真感光体を好適に製造できる電子写真感光体用
基体およびその製造方法を提供する。 【構成】アルミニウムまたはアルミニウム合金からなる
基体の表面に陽極酸化皮膜を形成してなる電子写真感光
体用基体において、基体表面である陽極酸化皮膜表面が
表面粗さがRaで0.10μm以上0.13μm以下の
範囲内に粗面化されている電子写真感光体用基体とす
る。このような基体は、鏡面加工を施されたアルミニウ
ムまたはアルミニウム合金からなる基体の表面に液温2
0℃未満の電解液を用いて陽極酸化処理を施すことによ
って、または、三角波形形状で表面粗さがRaで0.1
5μm以上となるように粗面化されたアルミニウムまた
はアルミニウム合金からなる基体の表面に液温20℃以
上の電解液を用いて陽極酸化処理を施した後形成された
陽極酸化皮膜表面を表面粗さがRaで0.10μm以上
0.13μm以下の範囲内となるように粗面化すること
によって製造することができる。
(57) [Abstract] [PROBLEMS] To provide an electrophotographic photoreceptor substrate capable of favorably producing an electrophotographic photoreceptor capable of obtaining a high-quality image in which an interference fringe pattern does not occur, and a method for producing the same. In an electrophotographic photoreceptor substrate having an anodized film formed on the surface of a substrate made of aluminum or an aluminum alloy, the surface of the anodized film, which is the substrate surface, has a surface roughness Ra of 0.10 μm or more. The substrate for an electrophotographic photosensitive member is roughened within a range of 13 μm or less. Such a substrate has a liquid temperature of 2 on the surface of the substrate made of mirror-finished aluminum or aluminum alloy.
By performing anodizing treatment using an electrolytic solution at a temperature of less than 0 ° C., or having a triangular corrugated shape and a surface roughness Ra of 0.1.
The surface of the anodic oxide film formed after anodizing the surface of the substrate made of aluminum or aluminum alloy roughened to 5 μm or more with an electrolytic solution having a liquid temperature of 20 ° C. or higher Can be manufactured by roughening so that Ra is in the range of 0.10 μm or more and 0.13 μm or less.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、有機系光導電性材料
からなる感光層を備えた電子写真感光体の導電性基体お
よびその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive substrate for an electrophotographic photosensitive member provided with a photosensitive layer made of an organic photoconductive material and a method for producing the same.

【0002】[0002]

【従来の技術】従来、電子写真感光体の光導電性材料と
してはSe,CdS,ZnOなどの無機系材料が多く用
いられてきた。しかし、これらの無機系材料を用いた電
子写真感光体は耐熱性,耐久性,毒性などの点で要求さ
れる性能を必ずしも満足してはいなかった。近年、これ
らの無機系材料に替わって有機系材料が注目されてきて
いる。有機系材料を用いた場合、特に製造コストを低減
できる利点がある。このような有機系光導電性材料を用
いる電子写真感光体の導電性基体としては、一般に、基
体のバリなどによる画像欠陥を防止するために、アルミ
ニウムまたはアルミニウム合金からなる基体の表面をバ
イトにより三角波形形状となるように粗面化加工した後
陽極酸化処理を施して陽極酸化皮膜を形成した導電性基
体が用いられる。
2. Description of the Related Art Conventionally, inorganic materials such as Se, CdS and ZnO have been widely used as photoconductive materials for electrophotographic photoreceptors. However, electrophotographic photoreceptors using these inorganic materials have not always satisfied the performance required in terms of heat resistance, durability, toxicity and the like. In recent years, organic materials have been attracting attention in place of these inorganic materials. When an organic material is used, there is an advantage that the manufacturing cost can be particularly reduced. As a conductive substrate of an electrophotographic photosensitive member using such an organic photoconductive material, generally, in order to prevent image defects due to burrs of the substrate, the surface of the substrate made of aluminum or aluminum alloy is triangular with a bite. A conductive substrate having a corrugated surface roughened and then anodized to form an anodized film is used.

【0003】[0003]

【発明が解決しようとする課題】ところが、上述のよう
なアルミニウムまたはアルミニウム合金からなる基体の
表面に陽極酸化皮膜を形成した導電性基体を用いた電子
写真感光体においては、搭載される電子写真応用装置の
露光光(電子写真感光体への書き込み光)がレーザー
光,発光ダイオード光などのような可干渉性光である場
合、その波長によっては露光光が陽極酸化皮膜を透過し
てアルミニウムまたはアルミニウム合金からなる基体の
表面にまて到達し、そこで反射した露光光と陽極酸化皮
膜表面で反射した露光光とが干渉して、得られる画像上
に干渉縞模様が発生するという問題があり、特に半導体
レーザー光を露光光とする場合にこの干渉縞模様が発生
し易い傾向があった。さらに、感光層内で多重反射する
露光光と陽極酸化皮膜表面で反射した露光光とが干渉す
ることによっても得られる画像上に干渉縞模様が発生す
るという問題もあった。
However, in the electrophotographic photoreceptor using a conductive substrate having an anodized film formed on the surface of a substrate made of aluminum or an aluminum alloy as described above, the electrophotographic application to be mounted is carried out. When the exposure light of the device (writing light to the electrophotographic photosensitive member) is coherent light such as laser light or light emitting diode light, the exposure light may pass through the anodized film depending on the wavelength and may be aluminum or aluminum. There is a problem that the exposure light that reaches the surface of the base made of an alloy, and the exposure light reflected there interferes with the exposure light reflected on the surface of the anodized film, and an interference fringe pattern is generated on the obtained image. This interference fringe pattern tends to occur when the semiconductor laser light is used as the exposure light. Further, there is a problem that an interference fringe pattern is generated on an image obtained by the interference of the exposure light reflected multiple times in the photosensitive layer and the exposure light reflected on the surface of the anodized film.

【0004】この発明は、上述の問題点を解消して、干
渉縞模様が発生しない高品質の画像が得られる電子写真
感光体を好適に作製できる電子写真感光体用基体おびそ
の製造方法を提供することを解決しようとする課題とす
る。
The present invention solves the above-mentioned problems and provides an electrophotographic photoconductor substrate and a method for producing the same, which makes it possible to favorably produce an electrophotographic photoconductor capable of obtaining a high-quality image in which no interference fringe pattern occurs. It is a task to try to solve.

【0005】[0005]

【課題を解決するための手段】上記の課題は、この発明
によれば、アルミニウムまたはアルミニウム合金からな
る基体の表面に陽極酸化皮膜が形成されてなる電子写真
感光体用基体において、陽極酸化皮膜表面が中心線平均
粗さRaが0.10μm以上0.13μm以下の範囲内
となるように粗面化された電子写真感光体用基体とする
ことによって解決される。このような電子写真感光体用
基体は、アルミニウムまたはアルミニウム合金からなる
基体の表面を鏡面仕上げ加工した後液温20℃未満の電
解液を用いて陽極酸化処理を施すことによって製造する
ことができる。また、アルミニウムまたはアルミニウム
合金からなる基体の表面を三角波形形状で中心線平均粗
さRaが0.15μm以上となるように粗面化加工した
後陽極酸化処理を施し、さらにその陽極酸化皮膜表面を
中心線平均粗さRaが0.10μm以上0.13μm以
下の範囲内となるように粗面化加工することによっても
製造することができる。
According to the present invention, the above object is to provide an electrophotographic photoconductor substrate having an anodized film formed on the surface of a substrate made of aluminum or an aluminum alloy. Is solved by using a substrate for an electrophotographic photosensitive member that is roughened so that the centerline average roughness Ra is in the range of 0.10 μm or more and 0.13 μm or less. Such a substrate for an electrophotographic photoreceptor can be manufactured by subjecting the surface of a substrate made of aluminum or an aluminum alloy to mirror finishing and then subjecting it to an anodic oxidation treatment using an electrolytic solution having a liquid temperature of less than 20 ° C. Further, the surface of the base body made of aluminum or aluminum alloy is roughened so as to have a center line average roughness Ra of 0.15 μm or more in a triangular corrugated shape, and then anodized. It can also be manufactured by roughening the center line average roughness Ra so that it falls within the range of 0.10 μm or more and 0.13 μm or less.

【0006】[0006]

【作用】電子写真感光体用基体の最表面である陽極酸化
皮膜表面を中心線平均粗さRaが0.10μm以上0.
13μm以下の範囲内となるように粗面化したことによ
り、電子写真感光体に入射してきた露光光を陽極酸化皮
膜表面で乱反射させ、陽極酸化皮膜を透過しアルミニウ
ムまたはアルミニウム合金からなる基体の表面から反射
してくる露光光との光干渉,感光層内で多重反射する露
光光との光干渉を防止することができる。陽極酸化皮膜
表面の表面粗さがRaで0.10μm未満になると粗面
化の効果が少なくなり、Raで0.13μmを超えてく
るとその上に形成する感光層の成膜性が損なわれるので
好ましくない。
The center line average roughness Ra of the surface of the anodic oxide film, which is the outermost surface of the electrophotographic photoreceptor substrate, is 0.10 μm or more and 0.1.
By roughening the surface so that it falls within the range of 13 μm or less, the exposure light incident on the electrophotographic photosensitive member is diffusely reflected on the surface of the anodized film, passes through the anodized film, and is the surface of the substrate made of aluminum or an aluminum alloy. It is possible to prevent optical interference with the exposure light reflected from the photosensitive layer and optical interference with the exposure light reflected multiple times in the photosensitive layer. When the surface roughness Ra of the anodized film surface is less than 0.10 μm, the effect of roughening is reduced, and when Ra exceeds 0.13 μm, the film forming property of the photosensitive layer formed thereon is impaired. It is not preferable.

【0007】アルミニウムまたはアルミニウム合金から
なる基体の表面に陽極酸化処理を施すに際して、液温2
0℃以上の電解液を用いて行うと、陽極酸化皮膜の底面
と表面がほぼ平行となる陽極酸化皮膜が形成されるた
め、陽極酸化皮膜表面で反射した露光光と陽極酸化皮膜
を透過しアルミニウムまたはアルミニウム合金からなる
基体の表面から反射してくる露光光との間での光干渉を
防止するすることはできず、また、アルミニウムまたは
アルミニウム合金からなる基体の表面が鏡面に仕上げら
れている場合には、陽極酸化皮膜表面も鏡面となるた
め、陽極酸化皮膜表面で反射した露光光と感光層内で多
重反射する露光光との間での光干渉も防止することがで
きない。上述の陽極酸化処理を液温20℃未満の電解液
を用いて行うと、陽極酸化皮膜は表面があれた状態で形
成されるため、上述のどちらの光干渉も防止することが
できる。また、上述の陽極酸化処理を液温20℃以上の
電解液を用いて行った場合でも、後処理として陽極酸化
皮膜表面を粗面化することにより、上述のどちらの光干
渉も防止することが可能となる。従って、この発明の方
法に係わる電子写真感光体用基体を用いることにより、
干渉縞模様が発生しない高品質の画像が得られる電子写
真感光体を得ることが可能となる。
When anodizing the surface of a substrate made of aluminum or an aluminum alloy, the liquid temperature should be 2
When an electrolyte solution of 0 ° C or higher is used, an anodized film whose bottom surface and surface are almost parallel to each other is formed. Therefore, the exposure light reflected on the anodized film surface and the anodized film are transmitted through the aluminum. Or, it is not possible to prevent light interference with the exposure light reflected from the surface of the aluminum alloy substrate, and when the surface of the aluminum or aluminum alloy substrate is mirror-finished. In addition, since the surface of the anodic oxide film also becomes a mirror surface, it is not possible to prevent optical interference between the exposure light reflected on the surface of the anodic oxide film and the exposure light multiply reflected in the photosensitive layer. When the above-described anodizing treatment is performed using an electrolytic solution having a liquid temperature of less than 20 ° C., the anodized film is formed in a state where the surface is roughened, so that it is possible to prevent any of the above-mentioned optical interference. Even when the above-mentioned anodizing treatment is performed using an electrolytic solution having a liquid temperature of 20 ° C. or higher, roughening the surface of the anodized film as a post-treatment can prevent any of the above optical interference. It will be possible. Therefore, by using the electrophotographic photoreceptor substrate according to the method of the present invention,
It is possible to obtain an electrophotographic photosensitive member that can obtain a high-quality image in which no interference fringe pattern occurs.

【0008】[0008]

【実施例】以下、この発明の実施例について説明する。 実施例1 アルミニウムからなる円筒状基体の外表面に鏡面仕上げ
加工を施した後、液温18℃,硫酸濃度100g/lの
電解液を用い、電流密度2.5A/dm2で10分間陽
極酸化処理を施して膜厚7μmの陽極酸化皮膜を形成
し、続いて液温97℃,酢酸ニッケル濃度10g/lの
温水液により封孔処理を施して電子写真感光体用基体を
作製した。この基体の表面粗さは中心線平均粗さRaで
0.12μmであった。 実施例2 アルミニウムからなる円筒状基体の外表面を三角波形形
状で表面粗さがRaで0.16μmとなるようにバイト
により粗面化した後、陽極酸化処理の電解液の液温を2
1℃としたこと以外は実施例1と同様にして膜厚7μm
の陽極酸化皮膜を形成し、続いて実施例1と同様にして
封孔処理を施し、さらに続いて研磨テープ(スリーエム
製マイクロフィニッシングフィルム 9μm)で陽極酸
化皮膜表面を表面粗さがRaで0.11μmとなるよう
に粗面化して電子写真感光体用基体を作製した。 比較例1 実施例1において、陽極酸化処理の電解液の液温を21
℃としたこと以外は実施例1と同様にして電子写真感光
体用基体を作製した。この基体の表面粗さはRaで0.
04μmであった。 比較例2 実施例2において、研磨テープによる陽極酸化皮膜表面
の粗面化を行わなかったこと以外は実施例2と同様にし
て電子写真感光体用基体を作製した。この基体の表面粗
さはRaで0.16μmであった。
Embodiments of the present invention will be described below. Example 1 A mirror-finished surface was applied to the outer surface of a cylindrical substrate made of aluminum, and then anodization was performed for 10 minutes at a current density of 2.5 A / dm 2 using an electrolytic solution having a liquid temperature of 18 ° C. and a sulfuric acid concentration of 100 g / l. A anodic oxide film having a film thickness of 7 μm was formed by treatment, and subsequently, sealing treatment was performed with a warm water solution having a liquid temperature of 97 ° C. and a nickel acetate concentration of 10 g / l to prepare a substrate for an electrophotographic photoreceptor. The surface roughness of this substrate was 0.12 μm in terms of center line average roughness Ra. Example 2 The outer surface of a cylindrical substrate made of aluminum was roughened with a cutting tool so as to have a triangular corrugated shape and a surface roughness Ra of 0.16 μm, and then the temperature of the anodizing electrolytic solution was adjusted to 2
The film thickness was 7 μm in the same manner as in Example 1 except that the temperature was 1 ° C.
The anodized film of No. 1 was formed, and then the sealing treatment was carried out in the same manner as in Example 1. Then, the surface roughness of the anodized film was Ra with a polishing tape (Micro Finishing Film made by 3M, 9 μm). A substrate for an electrophotographic photosensitive member was produced by roughening the surface to 11 μm. Comparative Example 1 In Example 1, the liquid temperature of the electrolytic solution for the anodizing treatment was set to 21.
A substrate for an electrophotographic photosensitive member was produced in the same manner as in Example 1 except that the temperature was set to ° C. The surface roughness Ra of this substrate is 0.
It was 04 μm. Comparative Example 2 An electrophotographic photosensitive member substrate was prepared in the same manner as in Example 2 except that the surface of the anodized film was not roughened with the polishing tape. The surface roughness Ra of this substrate was 0.16 μm.

【0009】これらの電子写真感光体用基体上にそれぞ
れ有機材料からなる電荷発生層,電荷輸送層を順次積層
してなる感光層を設けて、実施例1,実施例2,比較例
1,比較例2の電子写真感光体を作製した。このように
して得られた電子写真感光体を市販の半導体レーザービ
ームプリンタに装着して画像出しを行い、陽極酸化皮膜
表面で反射する露光光と、陽極酸化皮膜を透過しアルミ
ニウム基体の表面から反射してくる露光光との光干渉に
よる干渉縞模様(干渉縞模様Aとする)、陽極酸化皮膜
表面で反射する露光光と感光層内で多重反射する露光光
との光干渉による干渉縞模様(干渉縞模様Bとする)の
発生の有無を調べた。その結果を、電子写真感光体用基
体の主な製造条件であるアルミニウムからなる円筒状基
体の外表面の加工仕上げ状態(仕上げと記す),陽極酸
化処理に用いる電解液の液温(電解液温と記す),研磨
テープによる陽極酸化皮膜表面粗面化(表面粗面化と記
す)の有無および陽極酸化皮膜表面の粗面度を示すRa
(Raと記す)と共に表1に示す。
A photosensitive layer formed by sequentially stacking a charge generation layer and a charge transport layer made of an organic material on each of these electrophotographic photoreceptor substrates is provided, and Example 1, Example 2, Comparative Example 1, Comparative An electrophotographic photosensitive member of Example 2 was produced. The electrophotographic photoreceptor thus obtained is mounted on a commercially available semiconductor laser beam printer to display an image, and the exposure light reflected on the surface of the anodized film and the light transmitted through the anodized film and reflected from the surface of the aluminum substrate. An interference fringe pattern due to optical interference with the incoming exposure light (referred to as an interference fringe pattern A), and an interference fringe pattern due to optical interference between the exposure light reflected on the surface of the anodic oxide film and the exposure light multiply reflected within the photosensitive layer ( The occurrence of interference fringe pattern B) was examined. The results are the processed and finished state (referred to as finish) of the outer surface of the cylindrical substrate made of aluminum, which is the main manufacturing condition of the electrophotographic photoreceptor substrate, the temperature of the electrolytic solution used for the anodizing treatment (electrolyte temperature Ra) indicating the presence or absence of roughening of the surface of the anodized film (referred to as surface roughening) with a polishing tape and the roughness of the surface of the anodized film.
It is shown in Table 1 together with (denoted as Ra).

【0010】[0010]

【表1】 [Table 1]

【0011】表1に見られるとおり、実施例1の電子写
真感光体では画像上に干渉縞模様(A),干渉縞模様
(B)ともに発生しないが比較例1の電子写真感光体で
は画像上に干渉縞模様(A),干渉縞模様(B)ともに
発生している。両者とも鏡面加工の施されたアルミニウ
ム基体の表面に陽極酸化処理を施した基体を使用したに
もかかわらずこのような差が生じるのは、陽極酸化処理
条件が異なるためである。液温20℃以上の電解液を用
いた場合には膜の底面と表面とがほぼ平行な皮膜が形成
されるが、液温20℃未満の電解液を用いた場合には膜
の底面が平滑であっても表面があれた皮膜が形成され
る。その結果、比較例1に用いた基体はアルミニウム基
体表面,陽極酸化皮膜表面ともにほぼ鏡面でその粗さは
Raで0.04μmと極めて小さく干渉縞模様がA,B
ともに発生するが、実施例1に用いた基体の陽極酸化皮
膜表面はRaで0.12μmと適切にあれており干渉縞
模様は発生しなくなる。鏡面加工の施されたアルミニウ
ム基体の表面に液温20℃未満の電解液を用いて陽極酸
化処理を施すこの発明の電子写真感光体用基体の製造方
法およびその方法で得られた基体の効果は明らかであ
る。また、実施例2の電子写真感光体では実施例1の電
子写真感光体と同様に画像上に干渉縞模様(A),干渉
縞模様(B)ともに発生しないが、比較例2の電子写真
感光体では干渉縞模様(A)が発生している。比較例2
では三角波形形状でRaが0.16μm程度に粗面化さ
れたアルミニウム基体の表面に液温21℃の電解液を用
いて陽極酸化処理を施した基体を用いているが、実施例
2では比較例2の基体の表面である陽極酸化皮膜表面を
さらに研磨テープで適切にあらした基体を用いている。
従って、前者の基体の陽極酸化皮膜表面とアルミニウム
基体表面とはほぼ平行に同程度にあれており、基体表面
である陽極酸化皮膜表面で反射した露光光と陽極酸化皮
膜を透過してアルミニウム基体の表面で反射した露光光
とが干渉して画像上に干渉縞模様(A)が発生するが、
後者の基体表面はアルミニウム基体の表面の粗面形状と
は関係なくRaで0.11μmと適切にあれており光干
渉は起こらず画像上に干渉縞模様(A)も干渉縞模様
(B)も発生しない。三角波形形状でRaが0.16μ
m程度に粗面化されたアルミニウム基体の表面に液温2
1℃の電解液を用いて陽極酸化処理を施して陽極酸化皮
膜を形成しその表面を研磨テープで粗面化するこの発明
の電子写真感光体用基体の製造方法およびその方法で得
られた基体の効果も明らかである。上述の実施例2にお
いては、陽極酸化皮膜表面の粗面化は研磨テープにより
行ったが、粗面化の方法はこれに限定されるものではな
い。
As shown in Table 1, in the electrophotographic photosensitive member of Example 1, neither the interference fringe pattern (A) nor the interference fringe pattern (B) is generated on the image, but the electrophotographic photosensitive member of Comparative Example 1 is on the image. Both the interference fringe pattern (A) and the interference fringe pattern (B) are generated. The difference occurs because both of them use a mirror-finished aluminum substrate whose surface has been subjected to anodizing treatment, because the anodizing conditions are different. When an electrolytic solution having a liquid temperature of 20 ° C or higher is used, a film whose bottom surface and surface are substantially parallel is formed, but when an electrolytic solution having a liquid temperature of less than 20 ° C is used, the bottom surface of the film is smooth. Even with this, a film with a rough surface is formed. As a result, the substrate used in Comparative Example 1 was almost mirror-like both on the surface of the aluminum substrate and on the surface of the anodic oxide film, and the roughness Ra was 0.04 μm, which was extremely small, and interference fringe patterns A and B were observed.
Both of them occur, but the surface of the anodized film of the substrate used in Example 1 has a Ra of 0.12 μm, and the interference fringe pattern does not occur. The method for producing the electrophotographic photoreceptor substrate of the present invention in which the surface of the mirror-finished aluminum substrate is subjected to anodizing treatment using an electrolytic solution having a liquid temperature of less than 20 ° C., and the effect of the substrate obtained by the method are it is obvious. Further, in the electrophotographic photosensitive member of Example 2, neither the interference fringe pattern (A) nor the interference fringe pattern (B) is generated on the image as in the electrophotographic photosensitive member of Example 1, but the electrophotographic photosensitive member of Comparative Example 2 An interference fringe pattern (A) is generated on the body. Comparative example 2
In this example, a triangular corrugated aluminum substrate roughened to a Ra of about 0.16 μm is anodized on the surface of the aluminum substrate using an electrolytic solution having a liquid temperature of 21 ° C. The surface of the anodized film, which is the surface of the substrate of Example 2, was further appropriately treated with an abrasive tape.
Therefore, the surface of the anodized film of the former substrate and the surface of the aluminum substrate are substantially parallel and at substantially the same level, and the exposure light reflected by the surface of the anodized film, which is the surface of the substrate, and the anodized film pass through the aluminum substrate. Interference with the exposure light reflected on the surface causes an interference fringe pattern (A) on the image,
The latter substrate surface has an Ra of 0.11 μm, which is appropriate regardless of the rough surface shape of the aluminum substrate, so that no optical interference occurs and no interference fringe pattern (A) or interference fringe pattern (B) appears on the image. Does not occur. Ra is 0.16μ in triangular waveform
Liquid temperature 2 on the surface of the aluminum substrate roughened to about m
A method for producing a substrate for an electrophotographic photoreceptor of the present invention, in which an anodized film is formed by using an electrolytic solution at 1 ° C. to form an anodized film, and the surface thereof is roughened with a polishing tape, and a substrate obtained by the method. The effect of is also clear. In Example 2 described above, the surface of the anodic oxide film was roughened with a polishing tape, but the roughening method is not limited to this.

【0012】[0012]

【発明の効果】この発明によれば、アルミニウムまたは
アルミニウム合金からなる基体の表面に陽極酸化皮膜が
形成されてなる電子写真感光体用基体において、基体表
面である陽極酸化皮膜表面が中心線平均粗さRaが0.
10μm以上0.13μm以下の範囲内となるように粗
面化された電子写真感光体用基体とする。このような電
子写真感光体用基体は、アルミニウムまたはアルミニウ
ム合金からなる基体の表面を鏡面仕上げ加工した後液温
20℃未満の電解液を用いて陽極酸化処理を施すことに
よって、また、アルミニウムまたはアルミニウム合金か
らなる基体の表面を三角波形形状で中心線平均粗さRa
が0.15μm以上となるように粗面化加工した後陽極
酸化処理を施し、さらにその陽極酸化皮膜表面を中心線
平均粗さRaが0.10μm以上0.13μm以下の範
囲内となるように粗面化加工することによって製造する
ことができるが、このよう電子写真感光体用基体を用い
ることにより、干渉縞模様が発生しない高品質の画像が
得られる電子写真感光体を好適に製造することが可能と
なる。
According to the present invention, in an electrophotographic photoconductor substrate having an anodized film formed on the surface of a substrate made of aluminum or an aluminum alloy, the surface of the anodized film, which is the substrate surface, has a center line average roughness. Ra is 0.
The electrophotographic photoreceptor substrate is roughened so as to be in the range of 10 μm or more and 0.13 μm or less. Such a substrate for an electrophotographic photoreceptor is obtained by subjecting the surface of a substrate made of aluminum or an aluminum alloy to mirror finishing and then subjecting it to anodization treatment using an electrolytic solution having a liquid temperature of less than 20 ° C. The surface of the base body made of an alloy has a triangular wavy shape and a center line average roughness Ra.
Is roughened to 0.15 μm or more and then anodized, and then the center line average roughness Ra of the anodized film surface is adjusted to be in the range of 0.10 μm or more and 0.13 μm or less. It can be produced by roughening, but by using such a substrate for an electrophotographic photoreceptor, it is preferable to produce an electrophotographic photoreceptor capable of obtaining a high-quality image in which an interference fringe pattern does not occur. Is possible.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】アルミニウムまたはアルミニウム合金から
なる基体の表面に陽極酸化皮膜が形成されてなる電子写
真感光体用基体において、陽極酸化皮膜表面が中心線平
均粗さRaで0.10μm以上0.13μm以下の範囲
内に粗面化されていることを特徴とする電子写真感光体
用基体。
1. An electrophotographic photosensitive substrate comprising an aluminum or aluminum alloy substrate having an anodized film formed on the surface thereof, wherein the anodized film has a center line average roughness Ra of 0.10 μm to 0.13 μm. A substrate for an electrophotographic photosensitive member, which is roughened within the following range.
【請求項2】アルミニウムまたはアルミニウム合金から
なる基体の表面を鏡面仕上げ加工した後液温20℃未満
の電解液を用いて陽極酸化処理を施すことを特徴とする
電子写真感光体用基体の製造方法。
2. A method for producing a substrate for an electrophotographic photoreceptor, which comprises subjecting the surface of a substrate made of aluminum or an aluminum alloy to mirror finishing and then subjecting the substrate to an anodic oxidation treatment using an electrolytic solution having a liquid temperature of less than 20 ° C. ..
【請求項3】アルミニウムまたはアルミニウム合金から
なる基体の表面を三角波形形状で中心線平均粗さRaが
0.15μm以上となるように粗面化加工した後陽極酸
化処理を施し、さらにその表面を中心線平均粗さRaが
0.10μm以上0.13μm以下の範囲内となるよう
に粗面化加工することを特徴とする電子写真感光体用基
体の製造方法。
3. A surface of a substrate made of aluminum or aluminum alloy is roughened so as to have a center line average roughness Ra of 0.15 μm or more in a triangular corrugated shape, and then anodized. A method for producing a substrate for an electrophotographic photosensitive member, which comprises performing a roughening process so that a center line average roughness Ra is within a range of 0.10 μm or more and 0.13 μm or less.
JP24005891A 1991-09-20 1991-09-20 Substrate for electrophotographic photoreceptor and method for producing the same Pending JPH0580565A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24005891A JPH0580565A (en) 1991-09-20 1991-09-20 Substrate for electrophotographic photoreceptor and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24005891A JPH0580565A (en) 1991-09-20 1991-09-20 Substrate for electrophotographic photoreceptor and method for producing the same

Publications (1)

Publication Number Publication Date
JPH0580565A true JPH0580565A (en) 1993-04-02

Family

ID=17053861

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24005891A Pending JPH0580565A (en) 1991-09-20 1991-09-20 Substrate for electrophotographic photoreceptor and method for producing the same

Country Status (1)

Country Link
JP (1) JPH0580565A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6331371B1 (en) 1998-08-19 2001-12-18 Nec Corporation Electrophotographic photoreceptor and its manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6331371B1 (en) 1998-08-19 2001-12-18 Nec Corporation Electrophotographic photoreceptor and its manufacturing method

Similar Documents

Publication Publication Date Title
US4123267A (en) Photoconductive element having a barrier layer of aluminum hydroxyoxide
JPS60159093A (en) Method of electrochemically surface-roughening aluminum or aluminum alloy
JP2682188B2 (en) Manufacturing method of photoreceptor for electrophotography
JP3224836B2 (en) Manufacturing method of photosensitive image member
CN103238184B (en) Method for producing hard disk substrate and hard disk substrate
US20170261869A1 (en) Method for producing metal cylinder, method for producing substrate for electrophotographic photoreceptor, method for manufacturing electrophotographic photoreceptor, and metal slug for impact pressing
US5215853A (en) Photosensitive imaging member and process for making same
JP2925750B2 (en) Electrophotographic photoreceptor and method of manufacturing the same
JP2980107B1 (en) Electroconductive substrate for electrophotographic photoreceptor and method for producing the same
JPH07295241A (en) Method of manufacturing organic photoreceptor for electrophotography
JPH02242264A (en) Production of electrophotographic sensitive body
JP3126177B2 (en) Method of manufacturing aluminum substrate for photosensitive drum
JPH01312554A (en) Electrophotographic sensitive body
JP2844929B2 (en) Support for electrophotographic photosensitive member and method for producing the same
JPS58136043A (en) Electrophotographic photosensitive drum base
JP2666501B2 (en) Electrophotographic photoreceptor
JPS5811944A (en) Production of photosensitive element for electrophotography
JP2718066B2 (en) Electrophotographic photoreceptor
JP3215830B2 (en) Method of manufacturing aluminum substrate for photosensitive drum
JP3107658B2 (en) Underlayer treatment method for organic photoreceptor for electrophotography
EP0606147B1 (en) Metal coated photoreceptor substrate
JPS6038724A (en) Magnetic disk device
JPH0784391A (en) Method for producing support for electrophotographic photoreceptor and electrophotographic photoreceptor
JPH03259267A (en) Manufacture of electrophotographic sensitive body
JP3189563B2 (en) Method for producing support for electrophotographic photoreceptor