JPH0582006B2 - - Google Patents

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Publication number
JPH0582006B2
JPH0582006B2 JP60120677A JP12067785A JPH0582006B2 JP H0582006 B2 JPH0582006 B2 JP H0582006B2 JP 60120677 A JP60120677 A JP 60120677A JP 12067785 A JP12067785 A JP 12067785A JP H0582006 B2 JPH0582006 B2 JP H0582006B2
Authority
JP
Japan
Prior art keywords
resistance
layer
insulating layer
tension member
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60120677A
Other languages
Japanese (ja)
Other versions
JPS61279005A (en
Inventor
Shiro Nakayama
Nobumasa Misaki
Noboru Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikura Ltd
Original Assignee
Fujikura Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikura Ltd filed Critical Fujikura Ltd
Priority to JP12067785A priority Critical patent/JPS61279005A/en
Publication of JPS61279005A publication Critical patent/JPS61279005A/en
Publication of JPH0582006B2 publication Critical patent/JPH0582006B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

(産業上の利用分野) 本発明は、自動車等内燃機関の点火回路に用い
る雑音電波防止用抵抗電線の製造方法に関する。 (従来の技術) 自動車等の内燃機関の点火装置から発生する高
周波電波によつてテレビジヨン、ラジオ(特に
FMラジオ)、その他無線機器が雑音妨害を受け
る。この妨害を除去するための雑音電流の抑制の
一つの方法として種々の抵抗電線が用いられてい
る。 抵抗電線は所定値の導体抵抗を有するととも
に、使用環境に耐える必要から耐熱性および耐オ
ゾン性が要求される。このような要請に応じて
種々の構造の抵抗電線が考えられているが、特に
近年、抵抗電線は苛酷な使用条件に耐える必要か
ら高耐熱性材料によるテンシヨンメンバー、半導
電層、絶縁層からなる同心円断面の構造のものが
多い。 半導電層の材料は一般に炭素質の導電性フイラ
ーをマトリツクス樹脂又はゴムに配合したもので
あり、抵抗電線は高耐圧が要求されることから、
テンシヨンメンバーを含む抵抗導体の外径に比し
て絶縁層の厚さが大となり、従つて電線の可撓性
を良くするため、また耐熱性および耐オゾン性の
必要から絶縁層としてはエチレンプロピレンゴム
を使うものが多いが、周知の如くゴムの特性を発
揮させるために加硫が行なわれる。 (発明が解決しようとする問題点) 上記の如く抵抗電線の絶縁被覆及びその加硫を
行なう工程で電線に張力が加わるが、この張力は
寸法的に小さいテンシヨンメンバーが負担するこ
とになり、またテンシヨンメンバーは屈曲を受け
る。そこでテンシヨンメンバーに密着している半
導電層が引張り応力及び屈曲応力に曝されるため
に、前記の材料からなる抵抗導体の抵抗値に変動
(ばらつき及び水準の偏り)を来すことが多い。
このような抵抗値の変動を除く方法として半導電
層マトリツクスポリマーの架橋度を上げる方法、
あるいは半導電層と絶縁層の間に相互に接着性の
ない介在物を設ける方法などがあつたが、これら
の方法では品質の安定化は必ずしも十分ではなか
つた。 因みにこの種自動車用の抵抗電線としては例え
ば特公昭48−25589号公報では炭素質含有繊維導
電ゴム紐の外周に、固結した炭素質含有シリコン
導電層を定着し、その外周に絶縁層と外被層を順
次設けた雑音発生防止抵抗電線において、120〜
180℃で2〜10分間空気加熱することにより炭素
質含有シリコン導電層を導電性ゴム表面に架橋接
着させる旨の記載はあるが、この加硫工程で導電
層に応力を受け、導電性フイラーに切断が起り、
電気抵抗が高くなり好ましくない。又、特開昭60
−208009号公報は繊維束の複数を撚り合わせてト
ウ状としたテンシヨンメンバーを形成して、これ
に半導電性樹脂層を設ける抵抗電線用導体の製造
方法が記載されているが、その中の実施例におい
て、150℃×10分間乾燥と云う工程は塗料の乾燥
のための処理であり、200℃×24時間の処理も加
硫前の乾燥に過ぎず、表面側に設ける絶縁層被覆
による内部への影響例えば加硫処理による導電性
フイラーの切断に基づく電気抵抗の増大を防ぐこ
とはできない。 (問題点を解決するための手段) 本発明は上記の如き従来の技術の問題点を解決
しようとするもので、抵抗電線の少なくとも絶縁
層を被覆する工程の後に熱処理を施すことにより
内部の導電層の抵抗値の安定化をはかるものであ
る。 本発明の抵抗電線の内部な繊維を撚るか又は集
束したテンシヨンメンバー表面また繊維間〓に充
実してテンシヨンメンバー表面に、ゴムをマトリ
ツクスとし炭素質の導電性フイラーを配合してな
る抵抗導体を設けたものであり、簡単に云えば抵
抗導体は、半導電性の材料すなわちゴムをマトリ
ツクスとし、炭素質導電性フイラーを配合したも
のを、テンシヨンメンバーに直接押出被覆する
か、溶剤にて塗料とし、テンシヨンメンバーに含
浸塗布するか、あるいはこれらを併用することに
よつて形成される。 特に半導体性の材料を押出する場合は、外側の
絶縁層の押出しと同時押出法により形成すること
ができる。又、半導電層の形成と、絶縁層の形成
とを別個に行なう場合、半導体層のマトリツクス
ゴムは予め加硫処理してもよい。 本発明では安定化熱処理を行なつているので半
導電層が材料的に安定し、従つて例え絶縁・加硫
工程で張力及び屈曲を受けても抵抗値の変動が少
なくなる。また半導電層のマトリツクスポリマー
の架橋あるいは絶縁層のポストキユアを安定化熱
処理を行なうことによつて同時に実現することが
できる。 (作用) 本発明では少なくとも絶縁層の被覆後すなわち
絶縁層を被覆した直後もしくはその上にシースを
被覆した後、100℃以上、10時間以上の安定化熱
処理をするものであり、その安定化熱処理のメカ
ニズムは、テンシヨンメンバーに半導電層を塗布
または押出しによつて形成したときの半導電層の
特性値が、その外部に施される絶縁層の被覆や加
硫工程中、高温下でさまざまな応力を受けること
により、半導電層中に炭素質の導電性フイラーの
連鎖構造に切断が起るため、特性値である電気抵
抗が大きい側に変動したものを安定化処理(熱処
理)の高温度によつてマトリツクスポリマーの粘
度を低下せしめた状態で、炭素質の導電性フイラ
ーの凝集力によつて前記連鎖構造を再生、修復す
るものであり、連鎖構造の再生、修復工程には、
かなり長時間を要し、時間tと特性値Rの変化の
関係は、近似的にR=A logtで表わされる。 そしてマトリツクスポリマー材質が同一の場
合、温度が高い程、必要とされる時間は短かくな
る。 しかしながら徒に高温度の熱処理を行うと、材
料の熱劣化が起こり好ましくない。その意味で安
定化のための熱処理は低温程好ましいとも云える
が、低温になる程、指数函数的に長時間を要する
こととなり、工業的な生産技術上好ましくない。
この両者を経験的に定めたのが100℃以上10時間
以上の安定化処理であり、これは、抵抗電線に用
いられるポリマー材料の耐熱温度、工業生産上施
し得る熱処理時間を配慮したものである。 (実施例) 実施例 1 第1図は本発明による絶縁体被覆までの構造を
示し、テンシヨンメンバー素材として1500デニー
ルのケブラートウ(デユポン社芳香族ポリアミド
商品名ケブラーを用いたトウ)を用い、半導電層
の材料としてクロロスルフオン化ポリエチレンゴ
ム100重量部に、導電性カーボンブラツク(アセ
チレンブラツク)70重量部、その他加硫剤、老化
防止剤等を配合して芳香族系溶剤により塗料と
し、含浸・塗布して抵抗導体1を構成した。而し
て、異なつた条件下で加硫を行ない、後に示す第
1表の群No.1、No.2及びNo.3とした。更にこれら
の上に絶縁層2としてエチレンプロピレンゴム混
和物を押出被覆し、200℃雰囲気で連続加硫した。
このときのライン張力は最後で12Kgfであつた。
而して、これらをそれぞれ所定長に切断し、口出
し端子付け、キヤツプ等の実装を施し、各群それ
ぞれ10本の試料について抵抗値を測定しその結果
を比較例として第1表のNo.1、No.2及びNo.3に示
した。 次に群No.1、No.2及びNo.3の各10本を140℃、
15時間の熱処理(安定化)を行ない抵抗値を測定
し、その結果を実施例としてそれぞれ第1表のNo.
4、No.5及びNo.6に示した。
(Industrial Application Field) The present invention relates to a method of manufacturing a resistance wire for preventing noise radio waves used in an ignition circuit of an internal combustion engine such as an automobile. (Prior art) High-frequency radio waves generated from the ignition system of internal combustion engines in automobiles, etc.
FM radio) and other wireless devices are subject to noise interference. Various resistance wires are used as one method of suppressing noise current to eliminate this interference. Resistance wires have a predetermined conductor resistance, and are required to have heat resistance and ozone resistance in order to withstand the environment in which they are used. Resistance wires with various structures have been considered in response to these demands, but in recent years, resistance wires in particular have been made of tension members made of highly heat-resistant materials, semiconducting layers, and insulating layers because they need to withstand harsh usage conditions. Many of them have a structure with a concentric circular cross section. The material for the semiconductive layer is generally a carbonaceous conductive filler mixed with matrix resin or rubber, and since resistance wires are required to have high withstand voltage,
The thickness of the insulating layer is large compared to the outer diameter of the resistance conductor including the tension member, so ethylene is used as the insulating layer to improve the flexibility of the wire and to ensure heat resistance and ozone resistance. Many use propylene rubber, and as is well known, vulcanization is performed to bring out the properties of the rubber. (Problems to be Solved by the Invention) As mentioned above, tension is applied to the wire in the process of insulating the resistance wire and vulcanizing it, but this tension is borne by the dimensionally small tension member. The tension member also undergoes flexure. Therefore, the semiconducting layer that is in close contact with the tension member is exposed to tensile stress and bending stress, which often causes fluctuations (variations and level deviations) in the resistance value of the resistance conductor made of the above-mentioned materials. .
As a method to eliminate such fluctuations in resistance value, there is a method of increasing the degree of crosslinking of the semiconducting layer matrix polymer.
Alternatively, there has been a method of providing a non-adhesive intervening material between the semiconducting layer and the insulating layer, but these methods have not necessarily stabilized the quality sufficiently. Incidentally, for this type of resistance wire for automobiles, for example, in Japanese Patent Publication No. 48-25589, a solidified carbonaceous silicon conductive layer is fixed on the outer periphery of a carbonaceous fiber conductive rubber string, and an insulating layer and an outer layer are fixed on the outer periphery of a carbonaceous fiber conductive rubber string. In noise prevention resistance wires with sequential coating layers, 120~
Although it is stated that the carbonaceous silicon conductive layer is cross-linked and bonded to the conductive rubber surface by air heating at 180°C for 2 to 10 minutes, the conductive layer is subjected to stress during this vulcanization process, and the conductive filler is A disconnection occurs;
Electrical resistance increases, which is undesirable. Also, JP-A-60
Publication No. 208009 describes a method for manufacturing a conductor for a resistance wire, in which a plurality of fiber bundles are twisted together to form a tow-like tension member, and a semiconductive resin layer is provided on the tension member. In this example, the process of drying at 150℃ for 10 minutes is a process for drying the paint, and the process of drying at 200℃ for 24 hours is just drying before vulcanization. Internal influences such as an increase in electrical resistance due to cutting of the conductive filler due to vulcanization cannot be prevented. (Means for Solving the Problems) The present invention is an attempt to solve the problems of the conventional technology as described above.The present invention is intended to solve the problems of the conventional technology as described above. This aims to stabilize the resistance value of the layer. A resistor made of a rubber matrix and a carbonaceous conductive filler compounded on the surface of a tension member in which the fibers inside the resistance wire of the present invention are twisted or bundled, or filled between the fibers. Simply put, a resistance conductor is a semi-conductive material, that is, a rubber matrix mixed with a carbonaceous conductive filler, which is coated directly on the tension member by extrusion, or by coating it in a solvent. It is formed by impregnating and coating the tension member with a paint, or by using a combination of these. In particular, when extruding a semiconducting material, it can be formed by a co-extrusion method with the extrusion of the outer insulating layer. Further, when forming the semiconducting layer and forming the insulating layer separately, the matrix rubber of the semiconductor layer may be vulcanized in advance. In the present invention, since stabilization heat treatment is performed, the semiconducting layer is materially stable, and therefore, even if it is subjected to tension and bending during the insulation/vulcanization process, fluctuations in resistance value are reduced. Further, cross-linking of the matrix polymer of the semiconducting layer or post-curing of the insulating layer can be simultaneously achieved by performing stabilizing heat treatment. (Function) In the present invention, at least after coating the insulating layer, that is, immediately after coating the insulating layer or after coating the sheath thereon, stabilization heat treatment is performed at 100°C or more for 10 hours or more. The mechanism behind this is that when a semiconductive layer is formed on a tension member by coating or extrusion, the characteristic values of the semiconductive layer vary under high temperatures during the coating or vulcanization process with an insulating layer applied to the outside. When exposed to such stress, the chain structure of the carbonaceous conductive filler in the semiconducting layer is broken, so if the characteristic value of electrical resistance changes to the large side, stabilization treatment (heat treatment) is required. The chain structure is regenerated and repaired by the cohesive force of the carbonaceous conductive filler while the viscosity of the matrix polymer is lowered by temperature, and the regeneration and repair process of the chain structure includes the following steps:
It takes quite a long time, and the relationship between time t and change in characteristic value R is approximately expressed as R=A logt. And for the same matrix polymer material, the higher the temperature, the shorter the time required. However, unnecessarily high-temperature heat treatment causes thermal deterioration of the material, which is undesirable. In this sense, it can be said that the lower the temperature, the more preferable the heat treatment for stabilization is, but the lower the temperature, the longer it takes in an exponential manner, which is not preferable from an industrial production technology point of view.
Both of these were determined empirically as a stabilization treatment of 100°C or more for 10 hours or more, which takes into consideration the heat-resistant temperature of the polymer material used in resistance wires and the heat treatment time that can be applied in industrial production. . (Example) Example 1 Figure 1 shows the structure up to the insulator coating according to the present invention, using 1500 denier Kevlar tow (tow using Dupont's aromatic polyamide trade name Kevlar) as the tension member material. As a material for the conductive layer, 100 parts by weight of chlorosulfonated polyethylene rubber, 70 parts by weight of conductive carbon black (acetylene black), and other vulcanizing agents, anti-aging agents, etc. are mixed, and the mixture is made into a paint using an aromatic solvent and impregnated. - The resistive conductor 1 was formed by coating. Therefore, vulcanization was carried out under different conditions to form groups No. 1, No. 2 and No. 3 in Table 1 shown below. Furthermore, an ethylene propylene rubber mixture was extruded and coated on top of these as an insulating layer 2, and continuously vulcanized in an atmosphere of 200°C.
The line tension at this time was 12Kgf at the end.
Then, each of these was cut to a predetermined length, and the lead terminals were attached and caps were mounted.The resistance values were measured for 10 samples in each group, and the results were used as a comparative example for No. 1 in Table 1. , No. 2 and No. 3. Next, 10 pieces each of groups No. 1, No. 2, and No. 3 were heated at 140°C.
After heat treatment (stabilization) for 15 hours, the resistance values were measured, and the results were used as examples and No. 1 in Table 1.
4, No. 5 and No. 6.

【表】 実施例 2 第1図に従い、テンシヨンメンバーとして撚外
径0.5mmのガラスフアイバーひもを用い、半導電
層の材料としてシリコンゴム−カーボンブラツク
系混和物(加硫…パーオキサイド系)を用いて抵
抗導体1を構成し、絶縁層2の材料としてエチレ
ンプロピレンゴム混和物を用いて半導電層と絶縁
層とを同時押出によつて形成しかつ加硫を行なつ
た。この加硫程度は次工程で変形を生じない程度
の範囲に止めた。而して実施例1と同様に試料を
作成した後160℃、12時間の熱処理を行なつた。
熱処理前の抵抗値は平均29.8kΩ/m、標準偏差
5.7kΩ/mであつた。熱処理後の抵抗値は平均
16.4kΩ/m、標準偏差0.83kΩ/mであつた。 (発明の効果) 本発明に従い100℃以上、10時間以上(これら
の温度・時間の範囲でも半導電層材料の組成によ
つて実際の熱処理温度・時間は異なる)の安定化
熱処理を行なうことにより実施例1及び実施例2
に示す如く抵抗値の標準偏差即ち変動が大幅に減
少し、安定化熱処理の効果が明白である。 なお、実施例2において、半導電層及び絶縁層
の前加硫程度を次工程で変形を生じない程度の範
囲に止めておいても、安定化熱処理の熱によつて
半導電層及び絶縁層に用いられているマトリツク
スゴムは十分に加硫されることが判明した。
[Table] Example 2 According to Fig. 1, a twisted glass fiber string with an outer diameter of 0.5 mm was used as the tension member, and a silicone rubber-carbon black type mixture (vulcanized... peroxide type) was used as the material for the semiconductive layer. A semiconductive layer and an insulating layer were formed by coextrusion using an ethylene propylene rubber mixture as the material for the insulating layer 2, and vulcanization was performed. The degree of vulcanization was kept within a range that would not cause deformation in the next step. A sample was prepared in the same manner as in Example 1, and then heat treated at 160°C for 12 hours.
The resistance value before heat treatment is average 29.8kΩ/m, standard deviation
It was 5.7kΩ/m. Resistance value after heat treatment is average
The resistance was 16.4kΩ/m, with a standard deviation of 0.83kΩ/m. (Effects of the invention) By performing stabilization heat treatment at 100°C or more for 10 hours or more (even within these temperature and time ranges, the actual heat treatment temperature and time vary depending on the composition of the semiconducting layer material) according to the present invention. Example 1 and Example 2
As shown in Figure 2, the standard deviation or fluctuation of the resistance value is significantly reduced, and the effect of the stabilizing heat treatment is obvious. In Example 2, even if the degree of pre-vulcanization of the semiconducting layer and the insulating layer is kept within a range that does not cause deformation in the next step, the semiconducting layer and the insulating layer may be damaged by the heat of the stabilization heat treatment. It has been found that the matrix rubber used in this invention is sufficiently vulcanized.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は抵抗電線の絶縁層被覆までの実施例の
模型的斜視図である。 1:テンシヨンメンバーと半導電層からなる抵
抗導体、2:絶縁層。
FIG. 1 is a schematic perspective view of an embodiment up to coating the resistance wire with an insulating layer. 1: Resistance conductor consisting of a tension member and a semiconducting layer, 2: Insulating layer.

Claims (1)

【特許請求の範囲】[Claims] 1 繊維を撚るか又は集束したテンシヨンメンバ
ーとテンシヨンメンバー表面にまたは繊維間〓に
充実してテンシヨンメンバー表面に、ゴムをマト
リツクスとした炭素質導電性フイラーを配合して
なる半導電層を設けて抵抗導体を形成し、その上
に絶縁層を被覆し、更にその上に合成ゴム混和物
からなるシースを施す抵抗電線の製造方法におい
て、少なくとも絶縁層の被覆後100℃以上10時間
以上の安定化処理を行なうことを特徴とする抵抗
電線の製造方法。
1. A semiconductive layer comprising a tension member made of twisted or bundled fibers and a carbonaceous conductive filler with a rubber matrix on the surface of the tension member or between the fibers. In the method of manufacturing a resistance wire, the resistance conductor is formed by forming a resistance conductor, an insulating layer is coated on top of the resistance conductor, and a sheath made of a synthetic rubber mixture is further applied on top of the resistance conductor, and the temperature is at least 100°C or higher for 10 hours or more after the insulation layer is coated. A method for manufacturing a resistance wire, characterized by performing a stabilization treatment.
JP12067785A 1985-06-05 1985-06-05 Resistance wire Granted JPS61279005A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12067785A JPS61279005A (en) 1985-06-05 1985-06-05 Resistance wire

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12067785A JPS61279005A (en) 1985-06-05 1985-06-05 Resistance wire

Publications (2)

Publication Number Publication Date
JPS61279005A JPS61279005A (en) 1986-12-09
JPH0582006B2 true JPH0582006B2 (en) 1993-11-17

Family

ID=14792208

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12067785A Granted JPS61279005A (en) 1985-06-05 1985-06-05 Resistance wire

Country Status (1)

Country Link
JP (1) JPS61279005A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150114945A (en) * 2013-01-31 2015-10-13 유니챰 가부시키가이샤 Absorbent article

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60208009A (en) * 1984-03-31 1985-10-19 藤倉ゴム工業株式会社 Noise preventing high voltage resistance wire conductor and method of producing same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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