JPH0583064A - Manufacture of crystal vibrator - Google Patents
Manufacture of crystal vibratorInfo
- Publication number
- JPH0583064A JPH0583064A JP24147091A JP24147091A JPH0583064A JP H0583064 A JPH0583064 A JP H0583064A JP 24147091 A JP24147091 A JP 24147091A JP 24147091 A JP24147091 A JP 24147091A JP H0583064 A JPH0583064 A JP H0583064A
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- oscillator
- manufacturing
- substrate
- heat treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
(57)【要約】
【目的】 品質が安定し、特性の経時変化が小さい水晶
振動子の製造方法を提供する。
【構成】 水晶振動子の製造方法において、水晶基板の
変形層を取り除く熱処理を施した後、水晶基板上に電極
を形成することを特徴とする。(57) [Abstract] [Purpose] To provide a method for manufacturing a crystal unit, which is stable in quality and has little change in characteristics over time. According to a method of manufacturing a crystal resonator, a heat treatment for removing a deformed layer of a crystal substrate is performed, and then an electrode is formed on the crystal substrate.
Description
【0001】[0001]
【産業上の利用分野】本発明は、電子機器等に使用され
る水晶振動子の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a crystal unit used in electronic equipment and the like.
【0002】[0002]
【従来の技術】従来の水晶振動子の製造方法は、水晶基
板を所定の厚みにラッピングした後に、加工変質層を取
り除くためにフッ酸等でエッチングしてから、電極とし
て銀、ニッケル、アルミニウムなどを水晶基板上に、真
空蒸着、スパッタリングなどの真空薄膜形成方法により
成膜していた。2. Description of the Related Art A conventional method of manufacturing a crystal unit is to wrap a crystal substrate to a predetermined thickness, etch it with hydrofluoric acid or the like to remove a work-affected layer, and then use silver, nickel, aluminum, etc. as electrodes. Was formed on a quartz substrate by a vacuum thin film forming method such as vacuum deposition or sputtering.
【0003】[0003]
【発明が解決しようとする課題】しかし従来の技術で
は、エッチングにより水晶基板最表面の加工変質層を取
り除くことはできるが、水晶基板表面の数十ミクロンの
水晶の変形層を取り除くことはできない。このような水
晶基板に電極を形成して水晶振動子とした場合、水晶振
動子が振動する時の損失、すなわちCI値が大きくなっ
たり、水晶の変形層が経時変化することにより、振動周
波数が変化するため、高精度な水晶振動子を得ることが
できない。また、水晶への変形層の入り方が常に一定で
はないため、製造工程において品質の安定した水晶振動
子を得ることができない。However, according to the conventional technique, the work-affected layer on the outermost surface of the quartz substrate can be removed by etching, but the deformed layer of quartz of several tens of microns on the surface of the quartz substrate cannot be removed. When electrodes are formed on such a crystal substrate to form a crystal oscillator, the vibration frequency is increased due to the loss when the crystal oscillator vibrates, that is, the CI value increases or the deformation layer of the crystal changes with time. Since it changes, it is not possible to obtain a highly accurate crystal unit. In addition, since the way the deformable layer enters the crystal is not always constant, it is not possible to obtain a crystal oscillator with stable quality in the manufacturing process.
【0004】本発明は上記のような課題を解決するもの
であり、水晶振動子の特性において経時変化を防ぎ、安
定した品質を確保できる水晶振動子の製造方法を提供す
るものである。The present invention solves the above problems and provides a method of manufacturing a crystal unit, which can prevent the characteristics of the crystal unit from changing over time and ensure stable quality.
【0005】[0005]
【課題を解決するための手段】本発明の水晶振動子の製
造方法は、水晶基板を摂氏300度以上水晶の変曲点以
下の熱処理を施した後に、水晶基板上に電極を形成する
ことを特徴とする。According to a method of manufacturing a crystal unit of the present invention, a crystal substrate is subjected to heat treatment at a temperature not lower than 300 degrees Celsius and not higher than an inflection point of the crystal, and then electrodes are formed on the crystal substrate. Characterize.
【0006】熱処理温度が摂氏300度未満の場合、水
晶基板の変形層を熱処理によって再配列させ正常な状態
に戻すことはできない。また、水晶の変曲点を越える
と、水晶の圧電性が失われて振動子として使えなくなる
ため適さない。If the heat treatment temperature is less than 300 degrees Celsius, the deformed layers of the quartz substrate cannot be rearranged by the heat treatment to restore the normal state. Further, if the inflection point of the crystal is exceeded, the piezoelectricity of the crystal is lost and it cannot be used as a vibrator, which is not suitable.
【0007】[0007]
【実施例】本発明をバーAT振動子の製造方法を例にと
り詳細に説明する。The present invention will be described in detail by taking a method of manufacturing a bar AT oscillator as an example.
【0008】人工水晶原石をATカット方位にバンドソ
ーにより厚さ50ミクロンの水晶ウェハーに切断する。
次に両面ラッピングにより厚さ44ミクロンまで水晶ウ
ェハーを研磨し、バーAT振動子の大き2mm×4mm
にダイシングによって切断する。さらに水晶ウェハー最
表面の加工変質層を取り除くために、フッ酸によりエッ
チングを行ない、厚さ40ミクロンの水晶チップとす
る。A raw quartz crystal is cut into a quartz wafer having a thickness of 50 microns in the AT-cut direction by using a band saw.
Next, the quartz wafer is polished to a thickness of 44 microns by double-sided lapping, and the size of the bar AT oscillator is 2 mm x 4 mm.
Cut by dicing. Further, in order to remove the work-affected layer on the outermost surface of the crystal wafer, etching is performed with hydrofluoric acid to form a crystal chip having a thickness of 40 μm.
【0009】次にアルゴン雰囲気中で表1に示す条件で
熱処理を行なった後、真空蒸着により電極として銀を3
000Aの厚さで水晶チップの両面に1.5mm×3.
5mmの大きさで形成する。なお比較例として本発明の
熱処理における温度範囲から外れるサンプルおよび熱処
理を施さないサンプルを作成した。Next, after heat treatment was performed under the conditions shown in Table 1 in an argon atmosphere, silver was deposited as an electrode by vacuum evaporation.
The thickness of 000A is 1.5mm × 3.
It is formed with a size of 5 mm. As comparative examples, a sample outside the temperature range of the heat treatment of the present invention and a sample not subjected to the heat treatment were prepared.
【0010】次に、上記のサンプルにリード線をハンダ
付けをし、真空雰囲気中でケースに圧入しバーAT振動
子とした。Next, a lead wire was soldered to the above sample and press-fitted into a case in a vacuum atmosphere to form a bar AT oscillator.
【0011】このようにして得られたバーAT振動子の
特性を発振法により振動周波数fおよびCI値をそれぞ
れの水準について、100ケずつ測定した後、エージン
グ特性として摂氏130度で1000時間放置して再度
fおよびCI値を測定した。この結果を表2に示す。The characteristics of the bar AT oscillator thus obtained were measured by the oscillation method at each of the vibration frequency f and the CI value at 100 levels, and then the aging characteristics were left for 1000 hours at 130 degrees Celsius. Then, f and CI values were measured again. The results are shown in Table 2.
【0012】表2から明かなように本発明によるバーA
T振動子は、エージング特性が優れていると同時に、特
性のばらつきが小さく、高精度で品質の安定したバーA
T振動子を得ることができる。As can be seen from Table 2, bar A according to the invention
The T-oscillator has excellent aging characteristics and, at the same time, has a small variation in characteristics, and is a highly accurate and stable bar A.
A T oscillator can be obtained.
【0013】本発明では、水晶基板に熱処理を施してか
ら電極を形成しているが、電極を形成した後熱処理を行
うと電極が酸化したり、電極の密着性の劣化、電極材の
水晶基板への拡散が起こるため適さない。In the present invention, the electrodes are formed after heat-treating the quartz substrate. However, when the heat treatment is performed after forming the electrodes, the electrodes are oxidized, the adhesion of the electrodes is deteriorated, and the quartz substrate of the electrode material is used. Is not suitable because it will diffuse into
【0014】なお、実施例ではバーAT振動子について
述べたが、水晶基板を使う振動子についても同様な効果
が得られるのは言うまでもない。Although the bar AT oscillator is described in the embodiment, it is needless to say that the same effect can be obtained also in the oscillator using a crystal substrate.
【0015】[0015]
【表1】 [Table 1]
【0016】[0016]
【表2】 [Table 2]
【0017】[0017]
【発明の効果】以上述べたように、本発明によれば品質
が安定し、経時変化が小さい高精度な水晶振動子を得る
ことができる。特にAT振動子のように振動周波数が高
く、水晶基板の厚さが小さい程、本発明の効果が著し
い。As described above, according to the present invention, it is possible to obtain a highly accurate crystal oscillator which is stable in quality and has little change over time. In particular, the effect of the present invention is more remarkable as the vibration frequency is higher and the thickness of the crystal substrate is smaller as in the AT vibrator.
【0018】また、水晶振動子に限らず、水晶基板を使
用するフィルタについても水晶基板の変形層を取り除く
ことにより、品質が安定し経時変化が少ない製品を得る
ことができるという効果も有する。Further, not only the crystal oscillator but also the filter using the crystal substrate can be obtained by removing the deformed layer of the crystal substrate, so that a product with stable quality and less change with time can be obtained.
Claims (1)
板を摂氏300度以上水晶の変曲点以下の熱処理を施し
た後、水晶基板上に電極を形成することを特徴とする水
晶振動子の製造方法。1. A method for manufacturing a crystal resonator, comprising: subjecting the crystal substrate to heat treatment at a temperature of 300 ° C. or higher and at an inflection point of the crystal or lower, and then forming electrodes on the crystal substrate. Production method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24147091A JPH0583064A (en) | 1991-09-20 | 1991-09-20 | Manufacture of crystal vibrator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24147091A JPH0583064A (en) | 1991-09-20 | 1991-09-20 | Manufacture of crystal vibrator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0583064A true JPH0583064A (en) | 1993-04-02 |
Family
ID=17074795
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24147091A Pending JPH0583064A (en) | 1991-09-20 | 1991-09-20 | Manufacture of crystal vibrator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0583064A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995011548A1 (en) * | 1993-10-18 | 1995-04-27 | Seiko Epson Corporation | Rectangular at-cut quartz crystal plate, quartz crystal unit, and quartz oscillator and manufacture of quartz crystal plate |
| US6469423B2 (en) | 1993-10-18 | 2002-10-22 | Seiko Epson Corporation | Rectangular at-cut quartz element, quartz resonator, quartz resonator unit and quartz oscillator, and method of producing quartz element |
-
1991
- 1991-09-20 JP JP24147091A patent/JPH0583064A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995011548A1 (en) * | 1993-10-18 | 1995-04-27 | Seiko Epson Corporation | Rectangular at-cut quartz crystal plate, quartz crystal unit, and quartz oscillator and manufacture of quartz crystal plate |
| DE4497992C2 (en) * | 1993-10-18 | 1998-05-07 | Seiko Epson Corp | Rectangular AT-cut quartz crystal plate of quartz crystal unit |
| US6469423B2 (en) | 1993-10-18 | 2002-10-22 | Seiko Epson Corporation | Rectangular at-cut quartz element, quartz resonator, quartz resonator unit and quartz oscillator, and method of producing quartz element |
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