JPH0585896B2 - - Google Patents

Info

Publication number
JPH0585896B2
JPH0585896B2 JP59176852A JP17685284A JPH0585896B2 JP H0585896 B2 JPH0585896 B2 JP H0585896B2 JP 59176852 A JP59176852 A JP 59176852A JP 17685284 A JP17685284 A JP 17685284A JP H0585896 B2 JPH0585896 B2 JP H0585896B2
Authority
JP
Japan
Prior art keywords
exposure
film thickness
light source
amount
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59176852A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6155649A (ja
Inventor
Yoshio Kawai
Masanobu Doken
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP59176852A priority Critical patent/JPS6155649A/ja
Publication of JPS6155649A publication Critical patent/JPS6155649A/ja
Publication of JPH0585896B2 publication Critical patent/JPH0585896B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59176852A 1984-08-27 1984-08-27 パタン形成法 Granted JPS6155649A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59176852A JPS6155649A (ja) 1984-08-27 1984-08-27 パタン形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59176852A JPS6155649A (ja) 1984-08-27 1984-08-27 パタン形成法

Publications (2)

Publication Number Publication Date
JPS6155649A JPS6155649A (ja) 1986-03-20
JPH0585896B2 true JPH0585896B2 ( ) 1993-12-09

Family

ID=16020956

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59176852A Granted JPS6155649A (ja) 1984-08-27 1984-08-27 パタン形成法

Country Status (1)

Country Link
JP (1) JPS6155649A ( )

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07306726A (ja) * 1994-05-13 1995-11-21 Nec Data Terminal Ltd 電源投入制御回路

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2534795C3 (de) * 1975-08-04 1978-05-24 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung von Strukturen aus Positiv-Fotolackschichten

Also Published As

Publication number Publication date
JPS6155649A (ja) 1986-03-20

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term