JPS6155649A - パタン形成法 - Google Patents
パタン形成法Info
- Publication number
- JPS6155649A JPS6155649A JP59176852A JP17685284A JPS6155649A JP S6155649 A JPS6155649 A JP S6155649A JP 59176852 A JP59176852 A JP 59176852A JP 17685284 A JP17685284 A JP 17685284A JP S6155649 A JPS6155649 A JP S6155649A
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- light source
- pattern
- film thickness
- wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59176852A JPS6155649A (ja) | 1984-08-27 | 1984-08-27 | パタン形成法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59176852A JPS6155649A (ja) | 1984-08-27 | 1984-08-27 | パタン形成法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6155649A true JPS6155649A (ja) | 1986-03-20 |
| JPH0585896B2 JPH0585896B2 ( ) | 1993-12-09 |
Family
ID=16020956
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59176852A Granted JPS6155649A (ja) | 1984-08-27 | 1984-08-27 | パタン形成法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6155649A ( ) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07306726A (ja) * | 1994-05-13 | 1995-11-21 | Nec Data Terminal Ltd | 電源投入制御回路 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5219531A (en) * | 1975-08-04 | 1977-02-14 | Siemens Ag | Method of producing positive photosensitive resin layer structure |
-
1984
- 1984-08-27 JP JP59176852A patent/JPS6155649A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5219531A (en) * | 1975-08-04 | 1977-02-14 | Siemens Ag | Method of producing positive photosensitive resin layer structure |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07306726A (ja) * | 1994-05-13 | 1995-11-21 | Nec Data Terminal Ltd | 電源投入制御回路 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0585896B2 ( ) | 1993-12-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |