JPH0592949U - Electron microscope sample equipment - Google Patents

Electron microscope sample equipment

Info

Publication number
JPH0592949U
JPH0592949U JP3840292U JP3840292U JPH0592949U JP H0592949 U JPH0592949 U JP H0592949U JP 3840292 U JP3840292 U JP 3840292U JP 3840292 U JP3840292 U JP 3840292U JP H0592949 U JPH0592949 U JP H0592949U
Authority
JP
Japan
Prior art keywords
sample
guide hole
electron microscope
optical axis
pressing member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3840292U
Other languages
Japanese (ja)
Other versions
JP2577448Y2 (en
Inventor
史生 細川
敏和 本田
義範 鷹羽
秀雄 小林
亨 河西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP1992038402U priority Critical patent/JP2577448Y2/en
Publication of JPH0592949U publication Critical patent/JPH0592949U/en
Application granted granted Critical
Publication of JP2577448Y2 publication Critical patent/JP2577448Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

(57)【要約】 【目的】 電子線に対して試料面が45°を成し、且つ
試料面の角部がユーセントリック位置に簡単に位置づけ
られる電子顕微鏡の試料装置を提供する。 【構成】 傾斜ホルダーのベース部材16に支持部材8
が固定されており、支持部材8にはガイド穴4が穿たれ
ている。ガイド穴4の上面及び下面は光軸に対して夫々
略45°及び−45°を成している。試料8をその角部
9が突出するようにガイド穴4に挿入し、コイルバネ1
2により押圧部材10を介して試料8をガイド穴4に向
けて押圧するだけで、試料8の角部9は最適位置に位置
づけられる。
(57) [Abstract] [PROBLEMS] To provide a sample device for an electron microscope in which a sample surface forms 45 ° with respect to an electron beam and corners of the sample surface are easily positioned at a eucentric position. [Structure] Support member 8 is attached to base member 16 of the tilt holder.
Are fixed, and the support member 8 has a guide hole 4 formed therein. The upper surface and the lower surface of the guide hole 4 form approximately 45 ° and −45 ° with respect to the optical axis, respectively. Insert the sample 8 into the guide hole 4 so that the corner portion 9 thereof projects, and
By simply pressing the sample 8 toward the guide hole 4 via the pressing member 10 by means of 2, the corner portion 9 of the sample 8 is positioned at the optimum position.

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【産業上の利用分野】[Industrial applications]

本考案は半導体試料等を観察するのに適した電子顕微鏡の試料装置に関する。 The present invention relates to a sample device for an electron microscope suitable for observing a semiconductor sample or the like.

【0002】[0002]

【従来の技術】[Prior Art]

半導体製造分野では、薄膜製造技術が進歩し、ガリウム砒素(GaAs)基板 上に単原子層オーダーで原子層を積層して部品を製作することが可能になった。 図1はこのような部品を劈開して得られた板状の試料を示している。図1におい て、30は基板を示しており、31は原子層の積層を示しており、この劈開して 得られた試料は例えば1.5mm ×1.5mm ×0.2mm 程度の極めて小さいものである。 図2に示すように、このような試料の (110)面のエッジ部33に電子線を照射し 、この照射によって得られた等厚干渉縞の強度分布の変化により組成を定量的に 測定することが行われている。このような試料を試料装置に装着するため、従来 においては、図3に示すように試料固定用治具17に試料18を接着剤等で固定 するようにしている。 In the field of semiconductor manufacturing, thin film manufacturing technology has advanced, and it has become possible to manufacture components by stacking atomic layers on the order of a single atomic layer on a gallium arsenide (GaAs) substrate. FIG. 1 shows a plate-shaped sample obtained by cleaving such a component. In FIG. 1, reference numeral 30 indicates a substrate, and 31 indicates a stack of atomic layers. The sample obtained by this cleavage is an extremely small sample of, for example, 1.5 mm × 1.5 mm × 0.2 mm. As shown in FIG. 2, the edge portion 33 of the (110) plane of such a sample is irradiated with an electron beam, and the composition is quantitatively measured by the change in the intensity distribution of the equal thickness interference fringes obtained by this irradiation. Is being done. In order to mount such a sample on the sample device, conventionally, as shown in FIG. 3, the sample 18 is fixed to the sample fixing jig 17 with an adhesive or the like.

【0003】[0003]

【考案が解決しようとする課題】[Problems to be solved by the device]

従来においては、試料を接着させる場合に、以下の要求を満たすように接着位 置の調整が必要であった。 観察部位となる試料のエッジ部先端が電子顕微鏡のフォーカス可能位置に来る こと。 試料の端面が電子線に対して必要な観察角度(通常45°)の近傍にあること 。 観察部位となる試料のエッジ部先端が試料傾斜のユーセントリック位置にある こと。 In the past, when bonding the sample, it was necessary to adjust the bonding position so as to satisfy the following requirements. The tip of the edge of the sample to be observed should come to the focusable position of the electron microscope. The end face of the sample should be near the required observation angle (usually 45 °) for the electron beam. The tip of the edge of the sample to be observed should be at the eucentric position of sample inclination.

【0004】 従って上記諸条件を満たすように試料を治具に接着することは、繁雑であり長 時間を要した。Therefore, it was complicated and it took a long time to bond the sample to the jig so as to satisfy the above-mentioned various conditions.

【0005】 本考案は上述した従来の欠点を解決し、前述した諸条件を満たすように試料を 簡単に位置づけることのできる電子顕微鏡の試料装置を提供することを目的とし ている。An object of the present invention is to solve the above-mentioned conventional drawbacks and to provide a sample apparatus for an electron microscope capable of easily positioning a sample so as to satisfy the above-mentioned various conditions.

【0006】[0006]

【課題を解決するための手段】[Means for Solving the Problems]

板状試料を支持するための支持部材を試料傾斜ステージに備え、該支持部材に は前記板状部材をその角部を先にして挿入するためのガイド穴が設けられ、該ガ イド穴に挿入される板状試料を前記ガイド穴の内面に向けて押圧するための機構 を備え、前記ガイド穴の上面及び下面は光軸に対して夫々略45°及び−45° を成しており、前記ガイド穴から突出した前記試料の角部が電子顕微鏡像のユー セントリックな観察に必要な光軸上の所定位置に位置するようにガイド穴の位置 及び大きさが選択されている電子顕微鏡の試料装置を特徴としている。 A sample tilting stage is provided with a support member for supporting a plate-shaped sample, and the support member is provided with a guide hole for inserting the plate-shaped member with its corner portion first, and is inserted into the guide hole. And a mechanism for pressing the plate-shaped sample toward the inner surface of the guide hole, wherein the upper surface and the lower surface of the guide hole form approximately 45 ° and −45 ° with respect to the optical axis, respectively. Electron microscope sample in which the position and size of the guide hole are selected so that the corners of the sample protruding from the guide hole are located at the predetermined positions on the optical axis necessary for the ucentric observation of the electron microscope image. It features a device.

【0007】[0007]

【作用】[Action]

前記ガイド穴の上面及び下面は光軸に対して夫々略45°及び−45°を成し ており、また、試料の角部が電子顕微鏡像のユーセントリックな観察に必要な光 軸上の所定位置に位置するようにガイド穴の位置及び大きさが選択されているた め、ガイド穴に試料を挿入して押圧機構で試料をガイド穴に押圧するだけで、極 めて簡単に試料を必要な位置に位置づけることができる。 The upper and lower surfaces of the guide hole form approximately 45 ° and −45 ° with respect to the optical axis, respectively, and the corners of the sample have predetermined angles on the optical axis necessary for eucentric observation of the electron microscope image. Since the position and size of the guide hole are selected so that they are positioned at the desired position, simply inserting the sample into the guide hole and pressing the sample into the guide hole with the pressing mechanism makes it extremely easy to obtain the sample. It can be positioned in any position.

【0008】[0008]

【実施例】【Example】

以下、図面に基づき本考案の実施例を詳述する。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

【0009】 図4は本考案の一実施例の全体図を示しており、図5は図4における要部を拡 大して示すための斜視図である。FIG. 4 is an overall view of an embodiment of the present invention, and FIG. 5 is a perspective view showing an enlarged main part of FIG.

【0010】 図4において、1は光軸と直交する方向から挿入される試料ホルダ本体であり 、試料ホルダ本体1には紙面と垂直な軸(図示せず)の回りに回転可能な傾斜ス テージ15が取り付けられている。傾斜ステージ15には電子線を通過させるた めの孔2が設けられている。傾斜ステージ15のベース部材4には試料保持部材 3が固定されている。図5から明らかなように、試料保持部材3にはガイド穴4 が穿たれている。ガイド穴4の上面5は光軸6に対して45°を成していると共 に、ガイド穴4の下面7は光軸6に対して−45°を成している。8は板状の試 料を示しており、この試料は劈開によって角部が直角になるように半導体部品等 から切り欠かれたものである。試料8はその角部9を先にして前記ガイド穴4に 挿入されている。ガイド穴4に挿入された試料を前記ガイド穴の内面に向けて押 圧するため、押圧部材10が備えられている。押圧部材10は押圧部材支持体1 1にコイルバネ12により取り付けられている。押圧部材10には試料を受ける ための凹部を有している。前記ベース部材4には押圧部材支持体11の移動をガ イドするためのガイド溝13が設けられている。ガイド溝13の側面には弾性力 によって押圧部材支持体11の側面に押圧されるボール14が取り付けられてお り、一方、押圧部材支持体11の側面には前記ボール14に合わせた凹部が形成 されている。試料8をガイド穴4に挿入するとその角部が穴4から突出するが、 この突出した角部9がユーセントリックな電子顕微鏡像観察に必要な光軸上の所 定位置に位置するように前記ガイド穴4の位置及び大きさが選ばれている。In FIG. 4, reference numeral 1 denotes a sample holder main body which is inserted from a direction orthogonal to the optical axis, and the sample holder main body 1 has an inclined stage rotatable about an axis (not shown) perpendicular to the paper surface. 15 is attached. The tilt stage 15 is provided with a hole 2 for passing an electron beam. A sample holding member 3 is fixed to the base member 4 of the tilt stage 15. As is clear from FIG. 5, the sample holding member 3 is provided with a guide hole 4. The upper surface 5 of the guide hole 4 forms 45 ° with respect to the optical axis 6, while the lower surface 7 of the guide hole 4 forms −45 ° with respect to the optical axis 6. Reference numeral 8 shows a plate-shaped sample, which was cut out from a semiconductor component or the like so that the corners were formed at right angles by cleavage. The sample 8 is inserted into the guide hole 4 with its corner 9 first. A pressing member 10 is provided for pressing the sample inserted into the guide hole 4 toward the inner surface of the guide hole. The pressing member 10 is attached to the pressing member support 11 by a coil spring 12. The pressing member 10 has a recess for receiving the sample. The base member 4 is provided with a guide groove 13 for guiding the movement of the pressing member support 11. A ball 14 that is pressed against the side surface of the pressing member support body 11 by an elastic force is attached to the side surface of the guide groove 13, while a concave portion matching the ball 14 is formed on the side surface of the pressing member support body 11. Has been done. When the sample 8 is inserted into the guide hole 4, the corner thereof projects from the hole 4, but the projected corner 9 is positioned so as to be located at a predetermined position on the optical axis necessary for observing a eucentric electron microscope image. The position and size of the guide hole 4 are selected.

【0011】 このような構成において、まず、押圧部材支持体11を光軸6から離れるよう に引いた状態で、試料8をガイド穴4に挿入する。この挿入は試料8の角部9が ガイド穴4から突出するように行う。試料8をガイド穴4に挿入した後、押圧部 材支持体11を光軸6に近付く向きに移動させる。このようにすると、試料8の 角部が押圧部材10の凹部に嵌合し、コイルバネによる押圧力が押圧部材10を 介して試料8に加わり、試料8はガイド穴4の内面に押圧されて行く。更に押圧 部材支持体11を光軸6に近付く向きに移動させると、ボール14が押圧部材支 持体11の凹部に挿入され、押圧部材支持体11が固定される。In such a configuration, first, the sample 8 is inserted into the guide hole 4 with the pressing member support 11 pulled away from the optical axis 6. This insertion is performed so that the corner portion 9 of the sample 8 projects from the guide hole 4. After inserting the sample 8 into the guide hole 4, the pressing member support 11 is moved so as to approach the optical axis 6. By doing so, the corners of the sample 8 are fitted into the recesses of the pressing member 10, the pressing force of the coil spring is applied to the sample 8 via the pressing member 10, and the sample 8 is pressed against the inner surface of the guide hole 4. .. When the pressing member support 11 is further moved toward the optical axis 6, the ball 14 is inserted into the recess of the pressing member support 11 and the pressing member support 11 is fixed.

【0012】 この状態では、試料8の角部は、試料傾斜に対してユーセントリックな位置に 位置づけられているため、電子線に対して試料面が正確に45°を成すように傾 斜ステージ15の傾斜角を微調整し、試料に電子線を照射すれば、試料8によっ て回折された電子線による干渉縞が蛍光板に投影される。そこで、この干渉縞を 解析することにより、試料の分析が行われる。In this state, the corner portion of the sample 8 is located at a eucentric position with respect to the sample tilt, and therefore the tilt stage 15 is arranged so that the sample surface forms an angle of 45 ° with respect to the electron beam. When the sample 8 is irradiated with an electron beam by finely adjusting the inclination angle of, the interference fringes due to the electron beam diffracted by the sample 8 are projected on the fluorescent plate. Therefore, the sample is analyzed by analyzing the interference fringes.

【0013】 上述した実施例は本考案の一実施例に過ぎず、変形して実施できる。The above-described embodiment is only one embodiment of the present invention, and can be modified and implemented.

【0014】 例えば上述した実施例においては、押圧部材10にコイルバネにより力を与え るようにしたが、板バネを用いるようにしても良い。For example, in the above-described embodiment, the pressing member 10 is applied with the force by the coil spring, but a leaf spring may be used.

【0015】 また、押圧部材の移動ストロークを長くとれるようにコイルバネを選択すれば 、押圧部材支持体11を移動可能に作成する必要はない。If the coil spring is selected so that the moving stroke of the pressing member can be long, it is not necessary to make the pressing member support 11 movable.

【0016】[0016]

【考案の効果】[Effect of the device]

上述した説明から明らかなように、本考案に基づく電子顕微鏡の試料装置によ れば、板状試料をガイド穴に挿入して押圧部材により押圧するだけの簡単な作業 により、試料の角部をユーセントリックな観察位置に簡単に位置づけることがで き、試料面に45°の角度で電子線を照射してその回折電子線に基づき試料を分 析する作業を極めて簡単に行うことが可能になる。 As is clear from the above description, according to the electron microscope sample apparatus of the present invention, the corner portion of the sample can be removed by a simple operation of inserting the plate-shaped sample into the guide hole and pressing it with the pressing member. It can be easily positioned at the eucentric observation position, and the work of irradiating the sample surface with an electron beam at an angle of 45 ° and analyzing the sample based on the diffracted electron beam becomes extremely easy. ..

【図面の簡単な説明】[Brief description of drawings]

【図1】分析対象となる試料を例示するための図であ
る。
FIG. 1 is a diagram for illustrating a sample to be analyzed.

【図2】分析に必要な電子線と試料との位置関係を示す
ための図である。
FIG. 2 is a diagram showing a positional relationship between an electron beam necessary for analysis and a sample.

【図3】従来の電子顕微鏡の試料装置を例示するための
図である。
FIG. 3 is a diagram for illustrating a sample device of a conventional electron microscope.

【図4】本考案の一実施例の全体図を示すための図であ
る。
FIG. 4 is a diagram showing an overall view of an embodiment of the present invention.

【図5】本考案の一実施例の要部を拡大して示すための
図である。
FIG. 5 is an enlarged view showing a main part of an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 試料ホルダ本体 2 電子線通過孔 3 試料保持部材 4 ガイド穴 5 ガイド穴上面 6 光軸 7 ガイド穴下面 8 試料 9 角部 10 押圧部材 11 押圧部材支持体 12 コイルバネ 13 ガイド溝 14 ボール 15 傾斜ステージ 16 ベース部材 1 sample holder body 2 electron beam passage hole 3 sample holding member 4 guide hole 5 guide hole upper surface 6 optical axis 7 guide hole lower surface 8 sample 9 corner portion 10 pressing member 11 pressing member support 12 coil spring 13 guide groove 14 ball 15 tilt stage 16 Base member

───────────────────────────────────────────────────── フロントページの続き (72)考案者 小林 秀雄 東京都昭島市武蔵野3丁目1番2号 日本 電子株式会社内 (72)考案者 河西 亨 東京都昭島市武蔵野3丁目1番2号 日本 電子株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Hideo Kobayashi, 3-1-2 Musashino, Akishima-shi, Tokyo Nihon Denshi Co., Ltd. (72) Inventor, Toru Kasai 3-1-2, Musashino, Akishima-shi, Tokyo JEOL Within the corporation

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】 板状試料を支持するための支持部材を試
料傾斜ステージに備え、該支持部材には前記板状部材を
その角部を先にして挿入するためのガイド穴が設けら
れ、該ガイド穴に挿入される板状試料を前記ガイド穴の
内面に向けて押圧するための機構を備え、前記ガイド穴
の上面及び下面は光軸に対して夫々略45°及び−45
°を成しており、前記ガイド穴から突出した前記試料の
角部が電子顕微鏡像のユーセントリックな観察に必要な
光軸上の所定位置に位置するようにガイド穴の位置及び
大きさが選択されている電子顕微鏡の試料装置。
1. A supporting member for supporting a plate-shaped sample is provided on a sample tilting stage, and the supporting member is provided with a guide hole for inserting the plate-shaped member with its corner portion first. A mechanism for pressing the plate-shaped sample inserted into the guide hole toward the inner surface of the guide hole is provided, and the upper surface and the lower surface of the guide hole are approximately 45 ° and −45 with respect to the optical axis, respectively.
The position and size of the guide hole are selected so that the corner of the sample protruding from the guide hole is located at a predetermined position on the optical axis necessary for eucentric observation of an electron microscope image. Electron microscope sample device.
JP1992038402U 1992-05-13 1992-05-13 Electron microscope sample equipment Expired - Lifetime JP2577448Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1992038402U JP2577448Y2 (en) 1992-05-13 1992-05-13 Electron microscope sample equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1992038402U JP2577448Y2 (en) 1992-05-13 1992-05-13 Electron microscope sample equipment

Publications (2)

Publication Number Publication Date
JPH0592949U true JPH0592949U (en) 1993-12-17
JP2577448Y2 JP2577448Y2 (en) 1998-07-30

Family

ID=12524305

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1992038402U Expired - Lifetime JP2577448Y2 (en) 1992-05-13 1992-05-13 Electron microscope sample equipment

Country Status (1)

Country Link
JP (1) JP2577448Y2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010056078A (en) * 2008-07-28 2010-03-11 Hitachi High-Technologies Corp Sample holder for charged particle beam device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010056078A (en) * 2008-07-28 2010-03-11 Hitachi High-Technologies Corp Sample holder for charged particle beam device

Also Published As

Publication number Publication date
JP2577448Y2 (en) 1998-07-30

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Effective date: 19980407