JPH0594939A - X-ray lead-out member and x-ray aligner - Google Patents

Abstract

PURPOSE:To lead out X-rays in gas without breaking a vacuum window film by heating. CONSTITUTION:X-rays 1 of a wavelength of 2 to 8nm from an electron storage ring are made to pass through a diamond film 2 of a thickness of 1um, whereby 2 to 4.5-nm wavelength X-rays and 6 to 8-nm wavelength X-rays, which are unnecessary for exposure and make a vacuum window film 3 heat, are made to attenuate to one 10000ths and are made to pass through the diamond vacuum window film 3 of a thickness of 2um. Accordingly, the film 3 is never heated with the X-rays 1.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an X-ray extraction member and an X-ray exposure apparatus used for manufacturing integrated circuits and the like.

[0002]

2. Description of the Related Art A conventional pattern exposure method is a mask original image transfer technique using an optical exposure mask. However, when the pattern size becomes finer to about the wavelength of the light used for exposure or smaller, it is theoretically limited to form a pattern by such a method.

In recent years, an X-ray exposure technique using X-rays having a shorter wavelength than light has come to be used as a technique for forming a finer pattern than the conventional chemical exposure technique. Among the X-rays, the synchrotron radiation emitted from the electrons accumulated in the electron storage ring has a high irradiation intensity and the irradiation light has good parallelism, so that exposure per unit time is performed. It is most used because it has a large number of wafers (throughput) and can form finer patterns.

[0004]

Synchrotron radiation is emitted in a vacuum, is guided into a gas to be exposed, and is irradiated onto a wafer through a mask. To this end, a vacuum window membrane is provided which isolates the gas from the vacuum. Synchrotron radiation comprises X-rays of continuous wavelength. X-rays of the wavelength used for exposure pass through the vacuum window film, but X-rays of other wavelengths are absorbed by the vacuum window film and heat the vacuum window film, resulting in a problem that its strength is impaired and damaged. there were. Also,
The mask pattern supporting film constituting the mask also transmits X-rays of wavelengths used for exposure, but absorbs X-rays of wavelengths other than that and is heated and expanded, and the pattern position is distorted.

An object of the present invention is to solve the above problems and to provide an X-ray extraction member and an X-ray exposure apparatus which prevent the vacuum window film or the mask pattern supporting film from being heated.

[0006]

The present invention relates to an X-ray extraction member for extracting X-rays emitted from an X-ray source in a vacuum into a gas through a vacuum window film that separates the gas from the vacuum. An X-ray extraction member characterized in that a film having an X-ray absorption characteristic equal to or close to that of the vacuum window film is provided in a vacuum closer to the X-ray source than the vacuum window film. The present invention also relates to X using synchrotron radiation.
In the X-ray exposure apparatus, a film having an X-ray absorption characteristic that is the same as or close to the support film is provided on the light source side of the mask pattern support film.

[0007]

By passing through a film having an X-ray absorption characteristic which is the same as or close to that of the vacuum window film or the mask pattern supporting film, X-rays having a wavelength for heating the vacuum window film or the mask pattern supporting film which is unnecessary for exposure are generated Since it is absorbed, X-rays do not heat the vacuum window film and the mask pattern supporting film.

[0008]

Embodiments of the present invention will now be described with reference to the drawings. FIG. 1 is an explanatory diagram of the first embodiment of the present invention. X-rays obtained by operating the electron storage ring with an electron energy of 500 MeV and an electron orbit radius of 1 m are oblique incident angles of 80.
X-rays 1 having a wavelength of 2 nm to 8 nm were obtained by reflecting the light with a mrad SiC mirror. After passing this X-ray 1 through a diamond film 2 having a thickness of 1 μm and attenuating the X-rays having a wavelength of 2 nm to 4.5 nm and an wavelength of 6 nm to 8 nm to 1 / 10,000, a diamond vacuum window film having a thickness of 2 μm As a result, the X-ray 1 ′ having a wavelength of 4.5 nm to 6 nm could be taken out into the gas without damaging the vacuum window film 3 by passing the X-ray 3.

FIG. 2 is a diagram for explaining the second embodiment.
X-rays 1 obtained in the same manner as in FIG. 1 are passed through a diamond film 2 having a thickness of 1 μm, and X-rays having a wavelength of 2 nm to 4.5 nm and wavelengths of 6 nm to 8 nm are attenuated to 1 / 10,000.
By passing the mask pattern supporting film 3 of diamond having a thickness of 1 μm, it was possible to perform exposure with X-rays having a wavelength of 4.5 nm to 6 nm without expanding the mask pattern supporting film 4. In the examples of FIGS. 1 and 2, as the film 2 having the same X-ray absorption characteristics as the vacuum window film 3 and the support film 4, the same constituent material (diamond) as 3 and 4 was used. It is obvious that a film containing as an element may be used.

[0010]

As described above, according to the present invention, the vacuum window film will not be heated and damaged, and the mask pattern support film will not be heated and distorted.

[Brief description of drawings]

FIG. 1 is an explanatory diagram of a first embodiment of the present invention.

FIG. 2 is an explanatory diagram of a second embodiment of the present invention.

[Explanation of reference numerals] 1, 1'X-ray 2 film 3 vacuum window film 4 mask pattern support film

Claims (2)

[Claims] 1. An X-ray extraction member for extracting X-rays emitted from an X-ray source in a vacuum into a gas through a vacuum window film that separates the gas from a vacuum, and the X-ray source more than the vacuum window film. An X-ray extraction member, characterized in that a film having X-ray absorption characteristics which is the same as or close to that of the vacuum window film is provided in a vacuum close to the above. 2. An X-ray exposure apparatus using synchrotron radiation, wherein a film having an X-ray absorption characteristic which is the same as or close to that of the mask pattern supporting film is provided on the light source side of the mask pattern supporting film. Line exposure device.