JPH059708A - Production of infrared ray radiating member having excellent workability - Google Patents

Abstract

PURPOSE:To produce an IR radiating member having excellent workability by vacuum-depositing an IR radiating component made of an inorg. oxide on the surface of a heated metallic substrate. CONSTITUTION:A metallic sheet 1 as a substrate is introduced into a vacuum deposition device and heated to a high temp. While horizontally moving the substrate 1, a middle layer and an IR radiating component layer 3 are formed on the surface of the substrate 1 with a crucible 2a contg. Al for the middle layer and a crucible 2b contg. an inorg. oxide having excellent IR radiating property such as SiO2 Since the middle layer of Al, Zn, etc., having low hardness and satisfactory workability is interposed between the layer 3 and the substrate 1, an IR radiating member having excellent IR radiating property and satisfactory workability is obtd.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a heating member which is used in heating appliances and the like used in the fields of home appliances and manufacturing, and which has excellent infrared radiation and workability.

[0002]

2. Description of the Related Art In the field of home appliances, such as heating appliances and cooking appliances,
In the manufacturing field, various heat sources and heating members are frequently used in dryers and baking ovens. As a heating method in these fields, since the object to be heated can be efficiently heated, a heating method using infrared radiation has been widely used in recent years.
When adopting the heating method, a heating member excellent in infrared radiation is required.

Infrared rays are electromagnetic waves having a wavelength of about 0.75 to 1000 μm, and infrared rays emitted from a heating member are absorbed by a substance and converted into heat. In this case, if the heating member itself has infrared radiation, it can be used as it is,
Infrared radiation needs to be imparted to the heating member that does not have infrared radiation. At present, a method of applying a paint having excellent infrared radiation is mainly used.

[0004]

Since the above-mentioned coating material excellent in infrared radiation requires heat resistance, it is made of an inorganic material. Therefore, the obtained coating film is an inorganic coating film, which is harder and more brittle than an organic coating film, and thus has a drawback of poor workability. Therefore, the coating of the coating material on the heating member is limited after the molding, and when the heating member has a complicated shape, uniform coating becomes difficult. Also, the heating member after coating has a drawback that the coating film is likely to be peeled off due to plastic deformation caused by an impact caused by dropping or the like.

[0005]

The method for producing an infrared radiating member having excellent workability according to the present invention is characterized in that a coating having excellent infrared radiating property is formed on a heated substrate by a vacuum deposition method. .

[0006]

As a result of various investigations by the inventors of the present invention on a method for producing a heating member in which the infrared radiation coating does not peel off even after being processed, when the infrared radiation coating is formed on the heated substrate by the vacuum deposition method, the substrate It was found that a coating film having excellent adhesion with and having good workability was formed. The heated substrate is preferably an electron beam heated, an infrared ray heated or a high frequency induction heated in a vacuum. Although the heating temperature depends on the type of substrate and plating, it is preferably 150 ° C. or higher, which is considered to facilitate desorption and decomposition of organic substances unavoidably adsorbed on the substrate surface to ensure good plating adhesion. On the other hand, if the temperature is too high, the substrate is oxidized by a trace amount of oxygen and water in a vacuum, which causes poor plating adhesion. Therefore, the temperature is preferably about 400 ° C. or less.

The heating atmosphere other than the above-mentioned vacuum can be carried out in a reducing atmosphere containing hydrogen or the like. However, this method requires a facility which does not bring the substrate into contact with the oxidizing atmosphere until the vacuum deposition plating is performed after heating. .

The reason why the coating having excellent adhesion is formed by the above method is considered to be as follows. Since it is carried out in a vacuum, formation of an oxide film on the surface of the base material is suppressed, the vapor deposition component and the atoms on the surface of the base material are easily brought into direct contact with each other, and the bonding reaction between them is facilitated. The vapor deposition component has a large kinetic energy, and when the vapor deposition component collides with the substrate, the energy is consumed in the binding reaction between the two. By heating the base material, thermal energy is applied to the base material, and the bonding reaction between the vapor deposition components after the collision with the base material is promoted.

Examples of the vapor deposition component having excellent infrared radiation properties include various inorganic oxides such as silica, alumina and titania. The infrared radiation coating is 0.2 μm
If it has a thickness of about 10 μm or more, its performance will be exhibited, but if it has a thickness of about 10 μm or more, cohesive failure in the plating layer becomes prominent during processing, and the plating adhesion deteriorates. Therefore, the coating preferably has a thickness of 0.2 to 10 μm.

In the present invention, the oxide coating layer can obtain a good workability even if it is a single layer. However, when a further excellent workability is required depending on the application, A between the oxide coating layer and the substrate is
It is effective to form a multi-layer structure with a coating layer having a low hardness such as 1 or Zn and having excellent workability. The thickness of the intermediate layer is
If it is about 0.1 μm or more, a sufficient buffering effect can be obtained, but if it is 50 μm or more, the layer itself cracks during processing, so 0.1 to 50 μm is preferable.

The base material used in the present invention is not particularly limited as long as it is a metal material, and in addition to iron and iron-based alloys, copper and aluminum,
Non-ferrous metals such as titanium and alloys thereof are included, and the shape thereof is not particularly limited, and includes a plate shape,
Various shapes such as a rod shape and a tubular shape can be used.

The present invention will be described in more detail with reference to the following examples, but the following examples do not limit the present invention.
All modifications and implementations that do not depart from the spirit of the description below are included in the technical scope of the present invention.

[0013]

Examples and Comparative Examples Using ultra low carbon Al killed steel plate (0.7 ^t x 150 ^w mm x coil) as a base material, after alkaline electrolytic degreasing, pressure was about 4 x 10
^The vacuum deposition plating shown in Table 1 was applied in a vacuum of ^-2 Pa. The raw material was vaporized by irradiating the crucible containing the vapor deposition raw material with an electron beam, and vapor deposition was performed through a steel plate over the raw material. The evaporation rate was controlled by controlling the output of the electron beam, and the heating of the steel plate was performed by irradiating the electron beam immediately before vapor deposition. Two-layer plating was performed by the method shown in FIG.

Further, the paint coating carried out as a comparative example is an extremely low carbon Al killed steel plate (0.7 ^t × 150 ^w × 250 ^l mm) and a commercially available infrared emitting agent (Kanpe CE manufactured by Kansai Paint Co., Ltd.).
LA-FI) was applied by spraying. The baking conditions at that time were 523K × 1800S. The infrared radiation and processability of the obtained member were investigated by the following methods.

An infrared spectroscopic emission spectrum was measured with the infrared emissive member heated to 473 K, and the emissivity for a standard black body was evaluated. ◎: emissivity of 70% or more at 700~1400cm ^-1 ○: emissivity at 700～1400Cm ^-1 is 50-70% △: emissivity at 700～1400Cm ^-1 is 30~70% ×: 700~1400cm ^- The emissivity in ¹ was 30% or less, and the peeling state of the coating film was evaluated by the workability adhesive bending tape peeling test. ⊚: No peeling ○: Slight peeling is observed Δ: Large amount of peeling ×: Whole surface peeling results are shown in Table 1.

[0016]

[Table 1]

As shown in the table, Nos. 1 to 4 which are examples
Had good infrared emissivity and processability, and particularly those having an Al coating as an intermediate layer exhibited excellent infrared emissivity and processability. On the other hand, Comparative Examples Nos. 5 to 7, in which the substrate was vacuum-deposited without heating, had good infrared radiation properties but were not sufficiently workable. Comparative Examples Nos. 8 and 9 coated with a paint were excellent in infrared radiation but inferior in workability.

[0018]

EFFECT OF THE INVENTION The present invention is constituted as described above, and provides a method capable of producing a member excellent in workability even after the formation of a coating film when applying a coating film having infrared radiation to a metal substrate. I can do it.

[Brief description of drawings]

FIG. 1 is a schematic explanatory view showing a vacuum vapor deposition multilayer plating method in Examples.

[Explanation of symbols]

1 steel plate 2a crucible 2b crucible 3 film

Claims (2)

[Claims] 1. A method for producing an infrared radiating member having excellent processability, which comprises forming a coating film having excellent infrared radiating property on a heated substrate by a vacuum deposition method. 2. The method for producing an infrared radiation member having excellent workability according to claim 1, wherein a plating layer having excellent workability is formed between the substrate and the coating film having excellent infrared radiation.