JPH06102015B2 - High frequency heat sterilizer - Google Patents

High frequency heat sterilizer

Info

Publication number
JPH06102015B2
JPH06102015B2 JP60259884A JP25988485A JPH06102015B2 JP H06102015 B2 JPH06102015 B2 JP H06102015B2 JP 60259884 A JP60259884 A JP 60259884A JP 25988485 A JP25988485 A JP 25988485A JP H06102015 B2 JPH06102015 B2 JP H06102015B2
Authority
JP
Japan
Prior art keywords
equipment
high frequency
drainage
water
frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60259884A
Other languages
Japanese (ja)
Other versions
JPS62122578A (en
Inventor
研一郎 齋藤
Original Assignee
株式会社青木建設
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社青木建設 filed Critical 株式会社青木建設
Priority to JP60259884A priority Critical patent/JPH06102015B2/en
Publication of JPS62122578A publication Critical patent/JPS62122578A/en
Publication of JPH06102015B2 publication Critical patent/JPH06102015B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、例えばウイルスおよび細菌等を取り扱う実験
室、研究所および病院等の施設において、汚染された実
験機材等の汚染物を滅菌する装置に関するものである。
TECHNICAL FIELD The present invention relates to an apparatus for sterilizing contaminated experimental materials such as laboratories, laboratories and hospitals handling viruses and bacteria. It is about.

(従来の技術) バイオテクノロジー産業における実験室に対する実験機
材等の搬入は、殺菌灯付のパスボックスを通じて行われ
ており、また使用済の実験機材等の汚染物を搬出する場
合は、すべてオートクレーブで高圧蒸気滅菌処理を施し
た後室外へ搬出している。そしてその実験機材を再利用
するには、殺菌洗浄後乾燥したものをパスボックスを介
してクリーンルーム内に持ち込んでいる。
(Prior art) Laboratory equipment in the biotechnology industry is brought in through a pass box equipped with a germicidal lamp, and when carrying out contaminants such as used laboratory equipment, all must be autoclaved. After being subjected to high-pressure steam sterilization, it is carried out of the room. Then, in order to reuse the experimental equipment, what is dried after sterilization cleaning is brought into the clean room via the pass box.

(発明が解決しようとする問題点) 上述したオートクレーブ等の従来の滅菌設備は、高圧蒸
気を使用するものであるため設備が大がかりなものとな
る上に、滅菌時間および滅菌後の冷却時間も長くかかる
から、ランニングコストが高くなるという問題点があ
る。
(Problems to be Solved by the Invention) The conventional sterilization equipment such as the autoclave described above uses high-pressure steam, so that the equipment becomes large-scale, and the sterilization time and the cooling time after sterilization are long. Therefore, there is a problem that running cost becomes high.

また再利用する実験機材については、洗浄、乾燥といっ
た多くの作業を必要とするため、実験者自から洗浄滅菌
を行うことが不可能であるので、実験機材を密封容器に
入れパスボックスを通して実験室外に出し、実験室外で
洗浄滅菌を行つてから再びパスボックスを通して実験室
内で利用している。このため、実験機材の再利用に多く
の人手と時間をついやす上に、また必然的に機材の数も
増えるという問題点があつた。
In addition, it is impossible for the experimenter to clean and sterilize the experimental equipment to be reused because it requires a lot of work such as washing and drying.Therefore, put the experimental equipment in a sealed container and pass it outside the laboratory through a pass box. It is used in the laboratory through the pass box again after cleaning and sterilization outside the laboratory. For this reason, there is a problem that it takes a lot of manpower and time to reuse the experimental equipment, and inevitably the number of the equipment also increases.

(問題点を解決するための手段) 上述の問題点を解決するため本発明においては、開閉扉
を有する密閉容器の内面に反射板を設け、その天板部に
複数個の高周波照射設備の高周波照射ユニットを設け、
両側壁部にそれぞれ水噴射設備の水噴射ノズルを設け、
密閉容器内の底部に排水設備の排水槽を設けると共に、
その上面に水抜き孔を有する汚染物載置板を設け、この
容器内で高周波加熱滅菌、洗浄および乾燥をするように
した高周波加熱滅菌装置を構成する。
(Means for Solving Problems) In order to solve the above problems, in the present invention, a reflection plate is provided on the inner surface of a closed container having an opening / closing door, and a high frequency of a plurality of high frequency irradiation equipment is provided on the top plate part. Provide an irradiation unit,
Water injection nozzles for water injection equipment are installed on both side walls.
In addition to installing a drainage tank for drainage equipment at the bottom of the closed container,
A high-frequency heating sterilization apparatus is provided in which a contaminant mounting plate having a drainage hole is provided on the upper surface, and high-frequency heating sterilization, cleaning and drying are performed in this container.

(作用) 上述のように構成した本発明の高周波加熱滅菌装置によ
れば、汚染物に高周波を照射することにより短時間に高
温滅菌ができる。この場合汚染物が乾燥状態にある場合
は水噴射によつて汚染物に水分を与え、それに高周波を
照射することによつて有効に加熱することができる。
(Operation) According to the high-frequency heat sterilization apparatus of the present invention configured as described above, high temperature sterilization can be performed in a short time by irradiating contaminants with high frequency. In this case, when the contaminant is in a dry state, it can be effectively heated by giving water to the contaminant by jetting water and irradiating it with a high frequency.

また水噴射設備によつて装置内で洗浄することもできる
し、また、洗浄したものを高周波加熱によつて乾燥させ
ることもできる。
Further, it is possible to wash the inside of the apparatus by using a water jet facility, and it is also possible to dry the washed one by high frequency heating.

(実施例) 以下、図面について本発明装置の一実施例を説明する。
図中1は開閉扉2(第2図参照)を有する密閉容器で、
3は開閉扉2の開閉ハンドルである。
(Embodiment) An embodiment of the device of the present invention will be described below with reference to the drawings.
In the figure, 1 is a closed container having an opening / closing door 2 (see FIG. 2),
Reference numeral 3 is an opening / closing handle of the opening / closing door 2.

本実施例においては、第1図に示すように、密閉容器1
の内面に反射板4を設け、その天板部に複数個(本実施
例では3個)の高周波照射設備の高周波照射ユニット5
を設け、両側壁部にそれぞれ水噴射設備の水噴射ノズル
6を設け、密閉容器1内の底部に排水設備の排水槽7を
設けると共に、その上面に水抜き孔(図示せず)を有す
る汚染物載置板8を設ける。
In this embodiment, as shown in FIG.
The reflection plate 4 is provided on the inner surface of the device, and a plurality of (three in the present embodiment) high-frequency irradiation units 5 of high-frequency irradiation equipment are provided on the top plate portion.
The water injection nozzle 6 of the water injection equipment is provided on both side walls, the drainage tank 7 of the drainage equipment is provided at the bottom of the closed container 1, and the top surface thereof has a drain hole (not shown) for contamination. An object mounting plate 8 is provided.

なお、図中9は排水槽7に接続した排水管、10は載置板
8上に載置した汚染物、11は密閉容器1の天板部に設け
た圧力センサー、12は温度センサー、13は高周波照射ユ
ニット5、水噴射ノズル6、圧力センサー11、温度セン
サー12にそれぞれ電気的に接続したA/D変換器、14はこ
のA/D変換器13と接続したコンピュータ、15はこのコン
ピュータ14と接続した操作盤である。
In the figure, 9 is a drain pipe connected to the drainage tank 7, 10 is a contaminant placed on the placing plate 8, 11 is a pressure sensor provided on the top plate of the closed container 1, 12 is a temperature sensor, and 13 is a temperature sensor. Is an A / D converter electrically connected to the high-frequency irradiation unit 5, the water jet nozzle 6, the pressure sensor 11, and the temperature sensor 12, respectively, 14 is a computer connected to this A / D converter 13, and 15 is this computer 14 It is an operation panel connected with.

すなわちこの操作盤15を操作することによつて、前記各
設備を電子制御できるようになっている。
That is, by operating the operation panel 15, the respective facilities can be electronically controlled.

また第3図は、第1図に示した装置の排水管9による排
水の滅菌処理装置の一例を示すもので、16は排水管9に
接続した貯水タンク、17は送水ポンプ、18は排水管、19
は高周波照射滅菌装置、20は温度圧力センサー、21は水
冷却装置である。
Further, FIG. 3 shows an example of an apparatus for sterilizing waste water by means of the drain pipe 9 of the device shown in FIG. 1, where 16 is a water storage tank connected to the drain pipe 9, 17 is a water pump, and 18 is a drain pipe. , 19
Is a high frequency irradiation sterilizer, 20 is a temperature and pressure sensor, and 21 is a water cooling device.

次に上述のように構成した本発明装置の作用を説明す
る。
Next, the operation of the device of the present invention configured as described above will be described.

汚染物10を滅菌処理するには、密閉容器1の開閉蓋2を
開けて汚染物10を載置板8上に載せ、開閉扉2を閉じて
から、操作盤15を操作して高周波照射設備を作動させ、
高周波照射ユニット5より高周波を照射する。この照射
された高周波は、第1図の点線で示すように直接または
反射板4により反射された間接的に汚染物10にあたるか
ら、汚染物10は短時間で高温に加熱されて滅菌される。
In order to sterilize the contaminants 10, the opening / closing lid 2 of the closed container 1 is opened, the contaminants 10 are placed on the placing plate 8, the opening / closing door 2 is closed, and then the operation panel 15 is operated to operate the high frequency irradiation equipment. To activate
A high frequency is irradiated from the high frequency irradiation unit 5. This irradiated high frequency directly hits the contaminant 10 as shown by the dotted line in FIG. 1 or indirectly reflected by the reflector 4, so that the contaminant 10 is heated to a high temperature in a short time and sterilized.

なおこの場合汚染物10が乾燥状態で加熱しにくい場合
は、あらかじめ水噴射ノズル6より水を噴射して汚染物
10に水分を付与しておけばよい。
In this case, if it is difficult to heat the contaminants 10 in a dry state, water is sprayed from the water jet nozzle 6 in advance.
Moisture should be added to 10.

つぎに汚染物10の洗浄を行うには、操作盤15を操作し
て、水噴射設備を作動させ、水噴射ノズル6から第1図
の実線で示すように水を噴射して汚染物10にあてればよ
い。この場合排水は汚染物載置板8の水抜き孔より下方
の排水槽7に溜り、排水管9を介して外部へ排出され
る。
Next, in order to wash the contaminants 10, the operation panel 15 is operated to operate the water injection equipment, and water is injected from the water injection nozzles 6 as shown by the solid line in FIG. Just hit it. In this case, the drainage is collected in the drainage tank 7 below the drainage hole of the contaminant mounting plate 8 and discharged to the outside through the drainage pipe 9.

洗浄が終つた汚染物10を乾燥するには、再び高周波照射
設備を作動させて加熱乾燥させればよい。
In order to dry the pollutant 10 that has been washed, the high-frequency irradiation equipment is activated again to heat and dry it.

また排水管9より外部に排出された排水は、例えば第3
図に示す装置によれば、高周波照射による加熱滅菌によ
り容易に滅菌して一般排水として処理することができ
る。
Further, the drainage discharged from the drainage pipe 9 to the outside is, for example, the third
According to the apparatus shown in the figure, it is possible to easily sterilize by heat sterilization by high frequency irradiation and treat it as general waste water.

(発明の効果) 上述のように構成した本発明の高周波加熱滅菌装置は、
従来の装置と比較してコンパクトである上に、これによ
れば、汚染物に高周波を照射することにより短時間に高
温滅菌ができるから、ランニングコストが低下すると共
に、非常に効率がよくなる。この場合汚染物が乾燥状態
にある場合は水噴射によつて汚染物に水分を与え、それ
に高周波を照射することによつて有効に加熱することが
できる。
(Effect of the invention) The high-frequency heat sterilizer of the present invention configured as described above,
In addition to being more compact than conventional devices, this also allows high temperature sterilization in a short time by irradiating contaminants with a high frequency, which reduces running costs and improves efficiency. In this case, when the contaminant is in a dry state, it can be effectively heated by giving water to the contaminant by jetting water and irradiating it with a high frequency.

また水噴射設備によつて装置内で洗浄することもできる
し、また洗浄したものを高周波加熱によつて乾燥させる
こともできるから、本発明装置を例えば実験室内に設置
すれば、実験室内で汚染物の滅菌、洗浄、および乾燥を
容易に行うことができるため、従来のように繁雑な手数
を要せず、しかも短時間で実験機材の再利用ができるよ
うになるから、本発明によれば、省力化を促進すると共
に、作業能率を向上できるというすぐれた効果が得られ
る。
Further, since it is possible to wash the inside of the apparatus with a water jetting facility and to dry the washed one by high frequency heating, if the apparatus of the present invention is installed in, for example, a laboratory, it will be contaminated in the laboratory. Since it is possible to easily sterilize, wash, and dry the object, it is possible to reuse the experimental equipment in a short time without requiring complicated labor as in the past. The excellent effect that the labor efficiency is promoted and the work efficiency can be improved is obtained.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明装置の縦断正面図、 第2図は本発明装置の外観を示す斜視図、 第3図は排水の滅菌装置の一例を示す説明図である。 1…密閉容器、2…開閉扉 4…反射板 5…高周波照射設備の高周波照射ユニット 6…水噴射設備の水噴射ノズル 7…排水設備の排水槽、8…汚染物載置板 9…排水管、10…汚染物 FIG. 1 is a vertical sectional front view of the device of the present invention, FIG. 2 is a perspective view showing the appearance of the device of the present invention, and FIG. 3 is an explanatory view showing an example of a drainage sterilizer. DESCRIPTION OF SYMBOLS 1 ... Airtight container 2, Opening / closing door 4 ... Reflector 5 ... High-frequency irradiation unit of high-frequency irradiation equipment 6 ... Water injection nozzle of water-injection equipment 7 ... Drainage tank of drainage equipment, 8 ... Pollutant placement plate 9 ... Drain pipe , 10 ... contaminants

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】開閉扉を有する密閉容器の内面に反射板を
設け、その天板部に複数個の高周波照射設備の高周波照
射ユニットを設け、両側壁部にそれぞれ水噴射設備の水
噴射ノズルを設け、密閉容器内の底部に排水設備の排水
槽を設けると共に、その上面に水抜き孔を有する汚染物
載置板を設け、この容器内で高周波加熱滅菌、洗浄およ
び乾燥をするようにしたことを特徴とする高周波加熱滅
菌装置。
1. A reflection plate is provided on the inner surface of a closed container having an opening / closing door, a plurality of high-frequency irradiation units of high-frequency irradiation equipment are provided on the top plate portion, and water injection nozzles of the water injection equipment are provided on both side wall portions. Provide a drainage tank for the drainage equipment at the bottom of the closed container, and a contaminant mounting plate with a drainage hole on the top surface for high-frequency heat sterilization, cleaning and drying in this container. High frequency heat sterilizer.
JP60259884A 1985-11-21 1985-11-21 High frequency heat sterilizer Expired - Lifetime JPH06102015B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60259884A JPH06102015B2 (en) 1985-11-21 1985-11-21 High frequency heat sterilizer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60259884A JPH06102015B2 (en) 1985-11-21 1985-11-21 High frequency heat sterilizer

Publications (2)

Publication Number Publication Date
JPS62122578A JPS62122578A (en) 1987-06-03
JPH06102015B2 true JPH06102015B2 (en) 1994-12-14

Family

ID=17340275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60259884A Expired - Lifetime JPH06102015B2 (en) 1985-11-21 1985-11-21 High frequency heat sterilizer

Country Status (1)

Country Link
JP (1) JPH06102015B2 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59222286A (en) * 1983-06-01 1984-12-13 株式会社テシカ Container washing apparatus
JPS6096879A (en) * 1983-10-31 1985-05-30 松下電工株式会社 High-frequency drying method
JPS60120970A (en) * 1983-12-05 1985-06-28 Sozaburo Uemura Method and apparatus for continuous processing of food with high-frequency heating under pressure

Also Published As

Publication number Publication date
JPS62122578A (en) 1987-06-03

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